CN212349692U

CN212349692U - Wafer cleaning centrifuge

Info

Publication number: CN212349692U
Application number: CN201922450698.8U
Authority: CN
Inventors: 陈正; 刘昭; 周亮亮
Original assignee: Jiangsu Guoyuan Laser Intelligent Equipment Manufacturing Co ltd
Current assignee: Jiangsu Guoyuan Laser Intelligent Equipment Manufacturing Co ltd
Priority date: 2019-12-30
Filing date: 2019-12-30
Publication date: 2021-01-15
Anticipated expiration: 2029-12-30

Abstract

A centrifugal machine for cleaning wafers comprises an equipment base, wherein a machine shell is arranged above the base and is divided into a shell body and a shell top. Has the advantages that: the project organization that this scheme of use aimed at places the wafer after wasing the box, presses the switch, and the telescopic link sinks to the washing dish that is equipped with the washing liquid in, and the drive of driving motor circular telegram back drives the washing dish and rotates, reaches the purpose of wasing the wafer, later restarts the telescopic link, and the hot-blast drying that cooperates the air heater lifts up the shell top after whole set of flow finishes and just can take out the wafer, and drying effect is good.

Description

Wafer cleaning centrifuge

Technical Field

The utility model belongs to the technical field of the wafer is dry, in particular to wafer cleaning centrifuge.

Background

The wafer is processed by cutting a crystal bar according to the design size, turning, grinding, corroding and the like. The surface of a wafer always has a damage layer composed of abrasive materials and quartz particles, and the wafer is formed by corrosion, after the corrosion process is finished, a cleaning process is needed, and then dehydrated by absolute ethyl alcohol and finally dried, but the wafer is not thoroughly cleaned due to the influence of wafer stacking in the prior art, so that the problems of watermarks, dirt and the like are caused, and the drying is influenced, so that the wafer is not thoroughly dried.

Therefore, manufacturers desire to develop a cleaning centrifuge which can achieve the wafer cleaning function and sufficiently dehydrate and dry the wafer after cleaning, while minimizing waste of resources and loss of parts.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a wafer cleaning centrifuge, this cleaning centrifuge can make inside wafer can also obtain the drying when obtaining abundant abluent, reduces the resource loss and not fragile to a certain extent.

In order to solve the technical problem, the utility model adopts the following technical scheme:

a wafer cleaning centrifugal machine comprises an equipment base, wherein a casing is arranged above the base and is divided into a casing body and a casing top, the casing body is connected with the casing top and the base, concave grains with semicircular sections are arranged on the surface of the base, supporting balls are arranged in the concave grains, a driving motor is arranged below the base and is linked with a supporting shaft, the supporting shaft penetrates through the base, a cleaning chassis is arranged at the top end of the supporting shaft and is attached to the supporting balls, side plates are arranged on the side surfaces of the cleaning chassis, a liquid outlet pipe is arranged at the position, close to the cleaning chassis, of the side plates, a drain pipe and a water inlet pipe are arranged on the casing body, the water outlet pipe is connected with a filtering device through a hose, one end of the filtering device is connected with the drain pipe through a hose, the other end of the filtering device is connected with the, the bottom surface of the shell top is provided with a groove, the shell top is clamped on the shell body through the groove, the shell top is provided with an air heater, the air heater is provided with a plurality of air channels, the air channels penetrate through the shell top to be horizontally vertical to the base, the tail ends of the air channels are located above the side plates, a motor base is arranged between the air heater and the shell top, the motor base is linked with an electric control telescopic rod, the telescopic rod penetrates through the shell top, a supporting piece is arranged on the telescopic rod, and the tail end of the supporting piece is provided with a cleaning box.

Furthermore, a sealing ring is arranged in the groove.

Furthermore, the cleaning box is a hollow mesh cleaning box.

Furthermore, a plurality of air outlet pipe orifices are arranged on the air duct, and the air outlet pipe orifices are arranged towards the axis of the telescopic rod.

Further, a stabilizing support is arranged below the base.

Furthermore, an electric control switch is arranged beside the motor base and controls the electric control telescopic rod.

The beneficial effects of the utility model reside in that: the project organization that this scheme of use aimed at places the wafer after wasing the box, presses the switch, and the telescopic link sinks to the washing dish that is equipped with the washing liquid in, and the drive of driving motor circular telegram back drives the washing dish and rotates, reaches the purpose of wasing the wafer, later restarts the telescopic link, and the hot-blast drying that cooperates the air heater lifts up the shell top after whole set of flow finishes and just can take out the wafer, and drying effect is good.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a top view of the telescopic rod of the present invention;

labeled as: 1-base, 2-machine shell, 3-filtering device, 11-supporting ball, 12-driving motor, 13-supporting shaft, 14-cleaning chassis, 15-side plate, 16-liquid outlet pipe, 21-shell body, 22-shell top, 23-drain pipe, 24-water inlet pipe, 25-hot air blower, 26-air duct, 27-motor base, 28-telescopic rod, 261-air outlet pipe orifice, 281-supporting piece and 282-cleaning box.

Detailed Description

In order to make the technical solution of the present invention better understood, the technical solution of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall belong to the protection scope of the present invention.

Referring to fig. 1-2, the present invention provides a technical solution: a wafer cleaning centrifuge comprises an equipment base 1, a machine shell 2 is arranged above the base 1, the machine shell 2 is divided into a shell body 21 and a shell top 22, the shell body 21 is connected with the shell top 22 and the base 1, the base 1 and the shell body 21 are fixedly connected or detachably connected, and the shell top 22 and the shell body 21 are detachably connected;

the surface of the base 1 is provided with concave grains with semicircular sections, the concave grains are internally provided with supporting balls 11, and the supporting balls 11 are half embedded in the base 1 through the concave grains, so that the supporting balls can roll without displacement, and a certain support is provided for an upper structure;

a driving motor 12 is arranged below the base 1, the driving motor 12 is linked with a supporting shaft 13, the supporting shaft 13 penetrates through the base 1, a cleaning chassis 14 is arranged at the top end of the supporting shaft 13, the cleaning chassis 14 is attached to the supporting balls 11, a side plate 15 is arranged on the side surface of the cleaning chassis 14, the driving motor 12 drives the supporting shaft 13 and is linked with the cleaning chassis 14 through the supporting shaft 13, and the side plate 15 of the cleaning chassis 14 can store and retain cleaning liquid for the cleaning chassis;

a drain pipe 16 is arranged at the position, close to the cleaning chassis 14, of the side plate 15, a drain pipe 23 and a water inlet pipe 24 are arranged on the shell body 21, the drain pipe 23 is connected with the filtering device 3 through a hose, one end of the filtering device 3 is connected with the drain pipe 23 through a hose, the other end of the filtering device is connected with the water inlet pipe 24 through a hose, the drain pipe 16 is used for discharging liquid used inside, the drain pipe 23 is used for discharging discharged cleaning liquid, and the water inlet pipe 24 is used for adding cleaning;

shell 21 is fixedly connected with base 1, the bottom surface of shell top 22 is provided with a groove, shell top 22 is clamped on shell 21 through the groove, shell top 22 can be disassembled to facilitate the operation of the internal structure, the taking out of the wafer, the liquid prevention and the liquid change, etc.;

the air heater 25 is arranged on the shell top 22, the air heater 25 is a blowing device with heating wires, the air heater 25 is provided with a plurality of air ducts 26 used for discharging heat flow to dry the interior of the equipment, the air ducts 26 penetrate through the shell top 22 to be horizontally vertical to the base 1, the tail ends of the air ducts 26 are located above the side plates 15 so as to facilitate the mutual matching of the cleaning boxes 282, a motor base 27 is arranged between the air heater 25 and the shell top 22, the motor base 27 is linked with an electric control telescopic rod 28, the telescopic rod 28 penetrates through the shell top 22, a support 281 is arranged on the telescopic rod 28, a cleaning box 282 is arranged at the tail end of the support 281, and the support 281 is distributed.

The sealing ring is arranged in the groove, so that the buckling is more compact.

The cleaning box 282 is a hollow mesh cleaning box to facilitate cleaning of the wafer.

Be equipped with a plurality of air-out mouth of pipe 261 on the wind channel, air-out mouth of pipe 261 all sets up to the telescopic link axle center, and convenient processing and mutually support.

A stabilizing support is arranged below the base 1, and the supporting equipment is stable.

Be equipped with automatically controlled switch on the motor cabinet 27, the automatically controlled telescopic link 28 of on-off control, telescopic link 28 is downward when needs wash, and the back telescopic link 28 that finishes rises as to air-out mouth of pipe parallel and level department after the washing.

According to fig. 1, the top surface of the bottom 1 can be provided with a protruding edge with a triangular cross section, the topmost part of the protruding edge is not in contact with the supporting ball 11 and the cleaning chassis 14, the side plate 15 can be provided with a section of downward extending part which is not in surface contact with the bottom 1, the cleaning liquid can be mostly discharged along the drain pipe 23 when discharged through the structure setting of the part, without affecting the supporting ball 11, the drain pipe 16 can be provided with a throttle valve or other plugs for storing the cleaning liquid, the water inlet pipe 24 can be arranged above the side plate 15, and the pipe opening is arranged in the direct gap between the air outlet pipe opening 261 and the cleaning box 282, so that the water outlet pipe can be used as the cleaning liquid and does not affect the normal operation of the equipment, and the.

It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

It is obvious that the above described embodiments are only some examples of the present invention, and not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work all belong to the protection scope of the present invention.

Claims

1. A wafer cleaning centrifuge, comprising: including equipment base (1), base (1) top is equipped with casing (2), casing (2) divide into shell body (21) and shell top (22), shell body (21) are connected shell top (22) with base (1), base (1) surface is equipped with the cross-section for semicircular concave line, be equipped with support ball (11) in the concave line, base (1) below is equipped with driving motor (12), driving motor (12) linkage back shaft (13), back shaft (13) pass base (1), back shaft (13) top is equipped with washing chassis (14), washing chassis (14) laminating support ball (11), washing chassis (14) side is equipped with curb plate (15), curb plate (15) are close to washing chassis (14) department is equipped with drain pipe (16), shell body (21) is equipped with drain pipe (23) and inlet tube (24), the utility model discloses a water drainage pipe, including drain pipe (23) and base (1), filter equipment (3) one end is passed through the hose and is connected drain pipe (23), and the other end passes through the hose and connects inlet tube (24), shell body (21) with base (1) fixed connection, shell top (22) bottom surface is equipped with the recess, shell top (22) pass through the recess block is in on shell body (21), be equipped with air heater (25) on shell top (22), air heater (25) are equipped with a plurality of wind channels (26), wind channel (26) pass shell top (22) with base (1) level is perpendicular, wind channel (26) end is located curb plate (15) top, be equipped with motor cabinet (27) between air heater (25) and shell top (22), motor cabinet (27) automatically controlled linkage telescopic link (28), telescopic link (28) pass shell top (22), the telescopic rod (28) is provided with a supporting piece (281), and the tail end of the supporting piece (281) is provided with a cleaning box (282).

2. A wafer cleaning centrifuge as defined in claim 1, wherein: and a sealing ring is arranged in the groove.

3. A wafer cleaning centrifuge as defined in claim 1, wherein: the cleaning box (282) is a hollow mesh cleaning box.

4. A wafer cleaning centrifuge as defined in claim 1, wherein: be equipped with a plurality of air-out mouths of pipe (261) on the wind channel, air-out mouth of pipe (261) all to telescopic link axle center sets up.

5. A wafer cleaning centrifuge as defined in claim 1, wherein: and a stabilizing support is arranged below the base.

6. A wafer cleaning centrifuge as defined in claim 1, wherein: an electric control switch is arranged on the motor base (27) and controls the electric control telescopic rod (28).