CN212319415U - Liquid transmission pipeline of cleaning equipment after CMP - Google Patents
Liquid transmission pipeline of cleaning equipment after CMP Download PDFInfo
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- CN212319415U CN212319415U CN202020645757.7U CN202020645757U CN212319415U CN 212319415 U CN212319415 U CN 212319415U CN 202020645757 U CN202020645757 U CN 202020645757U CN 212319415 U CN212319415 U CN 212319415U
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Abstract
The utility model relates to a cleaning equipment's liquid transmission pipeline behind CMP, include: one end of a liquid outlet of the liquid supply device is connected with a liquid inlet pipe, and the tail end of the liquid inlet pipe is inverted L-shaped; a cavity is arranged below the tail end of the liquid inlet pipe, and the liquid supply device conveys liquid into the cavity through the liquid inlet pipe; the front part of the liquid inlet pipe is provided with a suck-back valve and a filter; the filter is also communicated with a liquid discharge assembly for discharging liquid remained in the filter; the liquid discharge assembly comprises a liquid discharge pipe, and a pressure monitor is arranged on the liquid discharge pipe; one side that lies in pressure monitor on the fluid-discharge tube still is equipped with the drain valve, and the drain valve is controlled by feedback system, the utility model discloses set up the resorption valve in the feed liquor pipe, utilized the resorption valve to carry out the backward flow with remaining liquid medicine in the feed liquor pipe and absorb, utilize feedback system and pressure monitor control filter's internal pressure simultaneously to opening of real time control drain valve guarantees that the liquid medicine in the filter in time discharges, ensures that there is not the liquid medicine to cause the corruption to the silicon chip.
Description
Technical Field
The utility model relates to a liquid transmission pipeline especially relates to a cleaning equipment's liquid transmission pipeline behind CMP.
Background
Silicon wafer cleaning is the most important and frequent step in the semiconductor device manufacturing process. In order to avoid the pollution of trace particles and metal impurities to a semiconductor device and influence the performance and the qualification rate of the device, the silicon wafer needs to be repeatedly and repeatedly cleaned in the semiconductor manufacturing process; at present, the chemical mechanical polishing process, i.e. CMP, is widely applied in deep submicron technology (< 0.25 um).
The silicon wafer is cleaned after CMP, and a corresponding liquid transmission pipeline is needed to be used for transmitting liquid medicine and pure water in the cleaning process, the current liquid transmission pipeline is shown as figure 1, the liquid supply device 1 enters the liquid inlet pipe 2 through the first valve 10 and the filter 5 and then transmits the liquid medicine into the cavity 3, and a small amount of liquid medicine still remains in the liquid inlet pipe 2 after the liquid supply device 1 is closed, so that the liquid discharge pipeline 13 is additionally arranged at the tail end of the liquid inlet pipe 2, when the liquid supply device 1 stops supplying liquid, the second valve 11 is opened, and the liquid medicine remaining in the liquid inlet pipe is discharged through the second valve 11 and the needle valve 12 in the liquid discharge pipeline, so that the silicon wafer in the cavity is prevented from being corroded when the subsequent liquid supply device transmits the pure water, and the silicon wafer is prevented from being damaged.
However, in practical use, it is found that after the filter 5 filters the liquid medicine, a liquid pressure is generated inside the filter 5, and after a long time, the inside of the filter 5 contracts, so that the liquid medicine inside the filter 5 is squeezed out, and the second valve 11 and the needle valve 12 in the liquid discharge pipeline 13 are closed again only after the liquid supply device is opened when the liquid supply device is closed, so that a small amount of liquid medicine still remains in the liquid supply pipe, which may damage the silicon wafer in subsequent cleaning, and may bring a damage risk to the silicon wafer production.
SUMMERY OF THE UTILITY MODEL
The utility model aims at overcoming prior art not enough and providing a simple structure, improve with low costs, can be automatically with the intraductal liquid medicine of feed liquor through the resorption valve suck back, remaining liquid medicine also can discharge in the filter simultaneously, guarantee not to have the liquid medicine to remain and cause the liquid transmission pipeline of corrosion damage's post-CMP cleaning equipment to the silicon chip in the feed liquor pipe.
In order to achieve the above purpose, the utility model adopts the technical scheme that: a liquid delivery line for a post-CMP cleaning apparatus, comprising:
one end of a liquid outlet of the liquid supply device is connected with a liquid inlet pipe, and the tail end of the liquid inlet pipe is inverted L-shaped; a cavity is arranged below the tail end of the liquid inlet pipe, and the liquid supply device conveys liquid into the cavity through the liquid inlet pipe;
the front part of the liquid inlet pipe is provided with a suck-back valve and a filter which are arranged in sequence; the filter is also communicated with a liquid discharge assembly for discharging liquid remained in the filter.
Further, the liquid discharge assembly comprises a liquid discharge pipe, and a pressure monitor is arranged on the liquid discharge pipe and used for monitoring the pressure of the filter and transmitting corresponding information to the feedback system; and a drain valve is also arranged on one side of the liquid discharge pipe, which is positioned on the pressure monitor, and is controlled by a feedback system.
Further, the suck-back valve and the filter are positioned on one side of the liquid supply device.
Because of above-mentioned technical scheme's application, compared with the prior art, the utility model have the following advantage:
the utility model discloses cleaning equipment's liquid transmission line behind CMP of scheme, overall structure is simple, and the improvement is with low costs, has add the resorption valve in the feed liquor pipe, utilizes the resorption valve to carry out the backward flow with remaining liquid medicine in the feed liquor pipe and absorbs, utilizes feedback system and pressure monitor to monitor the pressure in the filter simultaneously to opening of real time control drain valve guarantees that the liquid medicine in the filter can in time be discharged, can not have the liquid medicine to carry out corrosion damage to the silicon chip, has better practicality and spreading value.
Drawings
The technical scheme of the utility model is further explained by combining the attached drawings as follows:
FIG. 1 is a schematic diagram of a prior art structure;
FIG. 2 is a schematic structural view of the present invention;
wherein: 1. a liquid supply device; 2. a liquid inlet pipe; 3. a cavity; 4. a suck-back valve; 5. a filter; 6. a pressure monitor; 7. a drain valve; 8. a liquid discharge pipe; 9. a feedback system; 10. a first valve; 11. a second valve; 12. a needle valve; 13. a liquid discharge pipeline.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Referring to fig. 2, the liquid transmission pipeline of the post-CMP cleaning apparatus of the present invention includes: one end of a liquid outlet of the liquid supply device 1 is connected with a liquid inlet pipe 2, and the tail end of the liquid inlet pipe is inverted L-shaped; a cavity 3 is arranged below the tail end of the liquid inlet pipe 2, a rotatable silicon wafer is placed in the cavity 3, the liquid supply device 1 conveys liquid into the cavity 3 through the liquid inlet pipe 2, and the silicon wafer in the cavity 3 is cleaned; the front part of the liquid inlet pipe 2 is provided with a suck-back valve 4 and a filter 5 which are arranged in sequence; the filter 5 is also communicated with a liquid discharge assembly for discharging liquid remained in the filter 5.
Specifically, the liquid discharge assembly comprises a liquid discharge pipe 8, and a pressure monitor 6 is arranged on the liquid discharge pipe 8 and used for monitoring the pressure of the filter 5 and transmitting corresponding information to a feedback system 9; and a drain valve 7 is also arranged on one side of the drain pipe, which is positioned on the pressure monitor 6, and the drain valve 7 is controlled by a feedback system 9.
As a further preferred embodiment, the suckback valve 4 and the filter 5 are located in the front part of the liquid supply device 1.
When the liquid supply device works, the liquid supply device 1 conveys liquid medicine into the liquid inlet pipe 2, when the liquid medicine flows through the filter 4, the filter 4 filters impurities in the liquid medicine, the filtered liquid medicine is continuously conveyed forwards, and when the liquid medicine is positioned at the tail end of the liquid inlet pipe 2, the liquid medicine automatically flows into the cavity to clean the silicon wafer because the tail end of the liquid inlet pipe 2 is in an inverted L shape; after the silicon wafer is cleaned, the liquid supply device 1 automatically stops supplying the liquid medicine, and the liquid medicine remained in the liquid inlet pipe does not return to the liquid supply device 1, at the moment, the suck-back valve 4 is opened, and the suck-back valve 4 sucks the remained liquid medicine back into the liquid supply device 1; meanwhile, in the filtering process of the filter, the pressure of liquid is generated inside the filter, and after a long time, the inside of the filter 5 can shrink to extrude the liquid medicine in the filter out, and although the amount of the extruded liquid medicine is small, a small amount of silicon wafers are corroded by the residual liquid medicine in actual production to cause damage.
At the moment, the pressure monitor 6 detects the pressure inside the filter 5 in real time, when the pressure inside the filter 5 is found to change, the pressure monitor transmits relevant information to the feedback system 9, and the feedback system 9 controls the drain valve 7 to be opened, so that liquid medicine generated by the shrinkage of the filter in the filter is discharged from the liquid discharge pipe 8, and the liquid medicine is ensured not to be remained in the liquid inlet pipe 2; therefore, when the later-stage liquid supply device conveys pure water into the liquid inlet pipe to wash and spin-dry the silicon wafer by the pure water, the residual liquid medicine cannot corrode the silicon wafer in the cavity, and the completeness and the harmlessness of the silicon wafer are ensured.
The utility model discloses a cleaning equipment's liquid transmission line behind CMP, overall structure is simple, and the improvement is with low costs, has add the resorption valve in the feed liquor pipe, utilizes the resorption valve to carry out the backward flow with remaining liquid medicine in the feed liquor pipe and absorbs, utilizes feedback system and pressure monitor to monitor the pressure in the filter simultaneously to opening of real time control drain valve guarantees that the liquid medicine in the filter in time discharges, can not have the liquid medicine to carry out corrosion damage to the silicon chip, has better practicality.
The above is only a specific application example of the present invention, and does not constitute any limitation to the protection scope of the present invention. All the technical solutions formed by equivalent transformation or equivalent replacement fall within the protection scope of the present invention.
Claims (3)
1. A liquid transport line for a post-CMP cleaning apparatus, comprising:
one end of a liquid outlet of the liquid supply device is connected with a liquid inlet pipe, and the tail end of the liquid inlet pipe is inverted L-shaped; a cavity is arranged below the tail end of the liquid inlet pipe, and the liquid supply device conveys liquid into the cavity through the liquid inlet pipe;
the front part of the liquid inlet pipe is provided with a suck-back valve and a filter which are arranged in sequence; the filter is also communicated with a liquid discharge assembly for discharging liquid remained in the filter.
2. The post-CMP cleaning apparatus fluid delivery line of claim 1, wherein: the liquid discharge assembly comprises a liquid discharge pipe, and a pressure monitor is arranged on the liquid discharge pipe and used for monitoring the pressure of the filter and transmitting corresponding information to the feedback system; and a drain valve is also arranged on one side of the liquid discharge pipe, which is positioned on the pressure monitor, and is controlled by a feedback system.
3. The post-CMP cleaning apparatus fluid delivery line of claim 1, wherein: the suck-back valve and the filter are positioned on one side of the liquid supply device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020645757.7U CN212319415U (en) | 2020-04-24 | 2020-04-24 | Liquid transmission pipeline of cleaning equipment after CMP |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020645757.7U CN212319415U (en) | 2020-04-24 | 2020-04-24 | Liquid transmission pipeline of cleaning equipment after CMP |
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| Publication Number | Publication Date |
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| CN212319415U true CN212319415U (en) | 2021-01-08 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202020645757.7U Active CN212319415U (en) | 2020-04-24 | 2020-04-24 | Liquid transmission pipeline of cleaning equipment after CMP |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113187741A (en) * | 2021-04-29 | 2021-07-30 | 长鑫存储技术有限公司 | Liquid back suction system and back suction method |
| CN113198785A (en) * | 2021-05-13 | 2021-08-03 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment and cleaning solution distribution mechanism thereof |
-
2020
- 2020-04-24 CN CN202020645757.7U patent/CN212319415U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113187741A (en) * | 2021-04-29 | 2021-07-30 | 长鑫存储技术有限公司 | Liquid back suction system and back suction method |
| CN113198785A (en) * | 2021-05-13 | 2021-08-03 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment and cleaning solution distribution mechanism thereof |
| CN113198785B (en) * | 2021-05-13 | 2023-10-13 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment and cleaning fluid distribution mechanism thereof |
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