CN212128303U - Etching solution circulating device applied to etching equipment - Google Patents
Etching solution circulating device applied to etching equipment Download PDFInfo
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- CN212128303U CN212128303U CN202020604024.9U CN202020604024U CN212128303U CN 212128303 U CN212128303 U CN 212128303U CN 202020604024 U CN202020604024 U CN 202020604024U CN 212128303 U CN212128303 U CN 212128303U
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Abstract
The utility model discloses a be applied to etching equipment's etching solution circulating device, including the negative pressure liquid pumping mechanism of crane span structure on the transport revolving stage, negative pressure liquid pumping mechanism includes the negative pressure liquid suction pipe that a plurality of looks intervals set up, and the negative pressure power supply, and the discharge end of negative pressure power supply is equipped with etching solution and retrieves the cabin, and the negative pressure liquid suction pipe parallels and sets up perpendicularly mutually with operation platform traffic direction with the mesa of transport revolving stage, is equipped with a plurality of negative pressure liquid suction pipe mouths of pipe on the negative pressure liquid suction pipe, the linear looks interval arrangement of a plurality of negative pressure liquid suction pipe mouths of pipe. The utility model discloses a design of negative pressure drawing liquid mechanism can take out the surplus etching solution on the panel from, satisfies the homogeneity demand of etching solution on the panel, improves product etching quality, realizes the circulation of surplus etching solution simultaneously and retrieves. The negative pressure liquid suction pipe has the anti-backflow cavity design, the stability of the negative pressure suction force of the negative pressure liquid suction pipe opening is improved, the uniformity of etching liquid on the plate is further improved, and the etching precision of the product is improved remarkably.
Description
Technical Field
The utility model relates to a be applied to etching equipment's etching solution circulating device belongs to etching equipment auxiliary device's technical field.
Background
Etching (etching) is a technique in which material is removed using a chemical reaction or physical impact. The etching techniques can be classified into wet etching (wet etching) and dry etching (dry etching).
Can be used for manufacturing printing concave-convex plates such as copperplate and zinc plate at the earliest time, and is also widely used for processing Weight-saving (Weight Reduction) instrument panels, nameplates, thin workpieces which are difficult to process by the traditional processing method, and the like; through continuous improvement and development of process equipment, the method can also be used for processing precision etching products of electronic thin-sheet parts in aviation, machinery and chemical industries, and particularly, etching is an indispensable technology in semiconductor manufacturing processes.
The etching equipment generally comprises a belt type conveying table for bearing the plate and a spraying pipeline for spraying etching liquid, wherein the plate is subjected to exposure and development and then subjected to etching liquid spraying etching to obtain the etched plate.
In the prior art, the etching solution sprays and can the natural levelling on panel, in order to ensure that the etching solution can be covered with the etching trench, can have generally and spray the surplus, and too much etching solution can appear piling up to a certain extent, causes excessive etching on the one hand, and on the other hand has the poor problem of homogeneity, influences the etching quality of etching the board.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving the not enough of above-mentioned prior art, to the relatively poor problem of homogeneity appears easily in the flat unstability of traditional etching solution, propose the etching solution circulating device who is applied to etching equipment.
In order to achieve the above purpose, the utility model discloses the technical scheme who adopts is:
the etching solution circulating device applied to the etching equipment is arranged on a transport turntable of the etching equipment and comprises a negative pressure liquid pumping mechanism which is bridged on the transport turntable and is positioned at the bottom of a spraying pipeline of the etching equipment,
the negative pressure liquid pumping mechanism comprises a plurality of negative pressure liquid pumping pipes arranged at intervals and a negative pressure power source used for communicating the negative pressure liquid pumping pipes, the discharge end of the negative pressure power source is provided with an etching liquid recovery cabin,
the negative pressure liquid pumping pipe is parallel to the table surface of the operation table and is vertical to the operation direction of the operation table,
the negative pressure liquid pumping pipe is provided with a plurality of negative pressure liquid pumping pipe orifices which vertically face the table surface of the conveying turntable, the plurality of negative pressure liquid pumping pipe orifices are linearly arranged at intervals,
and a gap is reserved between the negative pressure liquid pumping pipe orifice and the plate on the table top of the operating table.
Preferably, the negative pressure liquid pumping pipe comprises a round tubular main body, the negative pressure liquid pumping pipe opening is provided with an extension pipe end extending to the inner cavity of the round tubular main body, and a backflow prevention cavity is formed between the extension pipe end and the inner cavity of the round tubular main body.
Preferably, the negative pressure liquid pumping pipe orifice is a rectangular pipe body.
Preferably, the negative pressure liquid pumping mechanism comprises a communicating pipeline communicated with any negative pressure liquid pumping pipe, and the communicating pipeline is connected with the negative pressure power source.
Preferably, the negative pressure liquid pumping pipe, the communication pipeline and the negative pressure liquid pumping pipe orifice are respectively provided with a corrosion-resistant coating.
Preferably, the communicating pipeline and the plurality of negative pressure liquid pumping pipes are of an integrated pipe network structure.
Preferably, the base of the transportation rotary table is provided with a plurality of groups of upright columns which are arranged in pairs and used for supporting the negative pressure liquid pumping pipe.
Preferably, the spraying pipeline comprises a plurality of spraying pipes which are parallel to each other and arranged in the same direction with the running direction of the running platform.
The beneficial effects of the utility model are mainly embodied in that:
1. through the design of negative pressure drawing liquid mechanism, can take out the surplus etching solution on the panel away, satisfy the homogeneity demand of etching solution on the panel, improve product etching quality, realize the circulation of surplus etching solution simultaneously and retrieve.
2. The negative pressure liquid suction pipe has the anti-backflow cavity design, the stability of the negative pressure suction force of the negative pressure liquid suction pipe opening is improved, the uniformity of etching liquid on the plate is further improved, and the etching precision of the product is improved remarkably.
3. Adopt integral type pipe network structure, conveniently construct at the operation bench, reduced assembly cost.
Drawings
Fig. 1 is a schematic structural diagram of an etching solution circulating device applied to an etching apparatus.
Fig. 2 is a schematic structural view of the medium-negative pressure liquid suction pipe of the present invention.
Fig. 3 is a schematic cross-sectional structure diagram of the negative pressure liquid suction pipe of the present invention.
Detailed Description
The utility model provides an etching solution circulating device applied to etching equipment. The technical solution of the present invention will be described in detail below with reference to the accompanying drawings so as to be easier to understand and grasp.
As shown in fig. 1 to 3, the etching solution circulating device applied to the etching equipment is arranged on a transport turntable 1 of the etching equipment, and comprises a negative pressure solution pumping mechanism 2 bridged on the transport turntable 1, wherein the negative pressure solution pumping mechanism 2 is located at the bottom of a spraying pipeline 3 of the etching equipment.
This negative pressure liquid pumping mechanism 2 includes the negative pressure liquid pumping pipe 4 that a plurality of looks intervals set up, and is used for communicateing the negative pressure power supply 5 of a plurality of negative pressure liquid pumping pipes 4, and the discharge end of negative pressure power supply 5 is equipped with etching liquid and retrieves cabin 6.
The negative pressure liquid pumping pipe 4 is parallel to the table top of the operation table 1 and is perpendicular to the operation direction of the operation table, a plurality of negative pressure liquid pumping pipe orifices 41 are arranged on the negative pressure liquid pumping pipe 4 and perpendicularly face the table top of the operation table 1, the negative pressure liquid pumping pipe orifices are linearly arranged at intervals, and gaps are reserved between the negative pressure liquid pumping pipe orifices 41 and the plates on the table top of the operation table 1.
Specifically, during the operation of the operation table 1, the operating plate passes through the negative pressure liquid pumping pipe 4, the spraying pipeline 3 performs continuous spraying operation, the negative pressure liquid pumping pipe port 41 performs negative pressure liquid pumping, the negative pressure liquid pumping has a certain negative pressure suction force, when etching liquid exceeding a certain height appears on the plate, the excessive etching liquid is pumped by the negative pressure liquid pumping pipe port 41 and conveyed to the etching liquid recovery cabin 6, so that the etching liquid on the plate is leveled uniformly, and the etching quality is improved.
The recovered etching solution can be circularly supplied to the etching solution supply cabin position of the spraying pipeline 3 from the etching solution recovery cabin 6, thereby meeting the requirement of etching solution allowance recovery.
In one embodiment, the negative pressure liquid pumping pipe 4 comprises a round tubular body 42, the negative pressure liquid pumping pipe nozzle 41 is provided with an extension pipe end 43 extending to the inner cavity of the round tubular body 42, and a backflow prevention cavity 44 is formed between the extension pipe end 43 and the inner cavity of the round tubular body 42.
Specifically, the negative pressure suction force of the negative pressure liquid pumping pipe orifice 41 is generally constant, and once the extracted accumulated liquid is not timely discharged from the negative pressure liquid pumping pipe 4, the stability of the negative pressure liquid pumping is affected, so the anti-backflow cavity 44 is designed to realize the buffer storage of the extracted etching liquid, and the buffer storage etching liquid does not affect the stability of the negative pressure suction force of the negative pressure liquid pumping pipe orifice 41.
In one embodiment, the negative pressure fluid extraction nozzle 41 is a rectangular tube. The distance between the adjacent negative pressure liquid pumping pipe openings 41 is smaller than 1/2 of the rectangular pipe body along the direction and the size of the negative pressure liquid pumping pipe 4, so that the negative pressure liquid pumping pipe openings 41 which are linearly arranged are relatively coherent linear adsorption channels, and the liquid pumping uniformity can be further improved.
In one embodiment, the negative pressure pumping mechanism 2 comprises a communication pipeline 7 communicated with any negative pressure pumping pipe 41, and the communication pipeline 7 is connected with the negative pressure power source 5.
Namely, the confluence can be realized through the communication pipeline 7, and the requirement of the negative pressure liquid pumping confluence of the branch negative pressure liquid pumping pipes 41 is met.
In one embodiment, the negative pressure liquid pumping pipe, the communication pipeline and the negative pressure liquid pumping pipe orifice are respectively provided with a corrosion-resistant coating.
Namely, the outer surface and the inner surface are coated with the corrosion-resistant coating, so that the resistance to the etching solution can be improved, and the service life can be prolonged.
In one embodiment, the communication pipeline 7 and the plurality of negative pressure liquid extraction pipes 4 are of an integrated pipe network structure.
The integrated pipe network structure is easy to assemble and construct, convenient to produce, process and arrange on site, reduces construction difficulty, reduces excessive pipe end butt joint sealing operation, reduces leakage probability and improves liquid pumping stability.
In a specific embodiment, the base of the transportation turntable 1 is provided with a plurality of sets of columns 8 which are arranged in pairs and used for supporting the negative pressure liquid suction pipe.
Design through stand 8 is convenient for carry on the support to negative pressure liquid suction pipe, and this stand can further optimize, and it can possess the lift adjustment function, satisfies the regulation that different boards are thick, reach different clearance demands.
In one embodiment, the shower pipe 3 includes a plurality of shower pipes 31 arranged in parallel and in the same direction as the running direction of the running board.
Namely, the spray pipe 31 and the negative pressure liquid extracting pipe 4 are designed to be vertical to each other, so that the liquid extracting uniformity of the negative pressure liquid extracting pipe 4 can be improved, the interval relation between the spray pipe 31 and the spray pipe 31 does not need to be calculated, and the interval arrangement of the negative pressure liquid extracting pipe 4 is easy.
Can discover through the above description, the utility model discloses be applied to etching solution circulating device of etching equipment, through the design of negative pressure drawing liquid mechanism, can take out the surplus etching solution on the panel away, satisfy the homogeneity demand of etching solution on the panel, improve product etching quality, realize the circulation of surplus etching solution simultaneously and retrieve. The negative pressure liquid suction pipe has the anti-backflow cavity design, the stability of the negative pressure suction force of the negative pressure liquid suction pipe opening is improved, the uniformity of etching liquid on the plate is further improved, and the etching precision of the product is improved remarkably. Adopt integral type pipe network structure, conveniently construct at the operation bench, reduced assembly cost.
The above technical solutions of the present invention have been fully described, and it should be noted that the present invention is not limited by the above description, and all technical solutions formed by equivalent transformation or equivalent transformation adopted by the spirit of the present invention in the aspects of structure, method or function by those of ordinary skill in the art all fall within the protection scope of the present invention.
Claims (8)
1. Be applied to etching equipment's etching solution circulating device, set up on etching equipment's transport table, its characterized in that:
comprises a negative pressure liquid pumping mechanism which is arranged on a transfer table and is positioned at the bottom of a spraying pipeline of the etching equipment,
the negative pressure liquid pumping mechanism comprises a plurality of negative pressure liquid pumping pipes arranged at intervals and a negative pressure power source used for communicating the negative pressure liquid pumping pipes, the discharge end of the negative pressure power source is provided with an etching liquid recovery cabin,
the negative pressure liquid pumping pipe is parallel to the table surface of the operation table and is vertical to the operation direction of the operation table,
the negative pressure liquid pumping pipe is provided with a plurality of negative pressure liquid pumping pipe orifices which vertically face the table surface of the conveying turntable, the plurality of negative pressure liquid pumping pipe orifices are linearly arranged at intervals,
and a gap is reserved between the negative pressure liquid pumping pipe orifice and the plate on the table top of the operating table.
2. The etching solution circulating apparatus applied to an etching apparatus according to claim 1, wherein:
the negative pressure liquid suction pipe comprises a circular pipe-shaped main body, an extension pipe end extending to the inner cavity of the circular pipe-shaped main body is arranged at the opening of the negative pressure liquid suction pipe, and an anti-backflow cavity is formed between the extension pipe end and the inner cavity of the circular pipe-shaped main body.
3. The etching solution circulating apparatus applied to the etching apparatus as set forth in claim 2, wherein:
the negative pressure liquid pumping pipe orifice is a rectangular pipe body.
4. The etching solution circulating apparatus applied to an etching apparatus according to claim 1, wherein:
the negative pressure liquid pumping mechanism comprises a communicating pipeline communicated with any negative pressure liquid pumping pipe, and the communicating pipeline is connected with the negative pressure power source.
5. The etching solution circulating apparatus applied to the etching apparatus as set forth in claim 4, wherein:
the negative pressure liquid pumping pipe, the communicating pipeline and the negative pressure liquid pumping pipe orifice are respectively provided with a corrosion-resistant coating.
6. The etching solution circulating apparatus applied to the etching apparatus as set forth in claim 4, wherein:
the communicating pipeline and the negative pressure liquid pumping pipes are of an integrated pipe network structure.
7. The etching solution circulating apparatus applied to an etching apparatus according to claim 1, wherein:
and a plurality of groups of upright columns which are arranged in pairs and used for supporting the negative pressure liquid suction pipe are arranged on the base of the conveying turntable.
8. The etching solution circulating apparatus applied to an etching apparatus according to claim 1, wherein: the spraying pipeline comprises a plurality of spraying pipes which are parallel to each other and are arranged in the same direction with the running direction of the running platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020604024.9U CN212128303U (en) | 2020-04-21 | 2020-04-21 | Etching solution circulating device applied to etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020604024.9U CN212128303U (en) | 2020-04-21 | 2020-04-21 | Etching solution circulating device applied to etching equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN212128303U true CN212128303U (en) | 2020-12-11 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202020604024.9U Active CN212128303U (en) | 2020-04-21 | 2020-04-21 | Etching solution circulating device applied to etching equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN212128303U (en) |
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2020
- 2020-04-21 CN CN202020604024.9U patent/CN212128303U/en active Active
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