CN211985095U - Frying and baking machine - Google Patents

Frying and baking machine Download PDF

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Publication number
CN211985095U
CN211985095U CN201922259028.8U CN201922259028U CN211985095U CN 211985095 U CN211985095 U CN 211985095U CN 201922259028 U CN201922259028 U CN 201922259028U CN 211985095 U CN211985095 U CN 211985095U
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heating
temperature
substrate
controller
baking tray
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CN201922259028.8U
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杨华
龚圆杰
张涛
褚天
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Chunmi Technology Shanghai Co Ltd
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Shanghai Chunmi Electronics Technology Co Ltd
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Abstract

The present disclosure relates to a frying and baking machine, which comprises an upper plate assembly and a lower plate assembly, wherein the upper plate assembly is rotatably connected with the lower plate assembly, and the lower plate assembly comprises: the baking device comprises a lower shell, a baking tray and a heating component positioned between the lower shell and the baking tray; the upper plate assembly includes: an upper cover; the heating substrate is positioned in the accommodating space formed by the upper cover and is fixedly connected with the upper cover; the nanometer heating film is positioned on one side of the heating substrate facing the upper cover; the electrode is positioned on the nano heating film and is connected with a power supply through a conducting wire so as to supply power to the nano heating film to heat the nano heating film; and the controller is connected with the heating part and the electrode and is used for controlling the heating part and the electrode to work and heating the articles on the baking tray. This technical scheme can utilize the characteristics that nanometer heating film electrothermal efficiency is high, rate of heating is fast, concentrates the heating to the food top surface rapidly at last look stage, colors food with higher speed, promotes the culinary art quality of food.

Description

Frying and baking machine
Technical Field
The present disclosure relates to the field of kitchen utensils, and more particularly, to a frying and baking machine.
Background
Most frying and baking machines on the market adopt an aluminum baking tray bottom to set a heating pipe heating mode, and the work heat of the product is conducted to the food material in the frying and baking machine through the heat conduction of the aluminum tray. Because of the characteristics of large heat storage of aluminum materials and large thermal deformation caused by high temperature heating, the power of the product of a general frying and baking machine is generally not high. In the scene that the cake-type food materials need to be colored during cooking, the waiting time is long, the coloring effect is general, and the user experience is not good.
SUMMERY OF THE UTILITY MODEL
The embodiment of the disclosure provides a frying and baking machine. The technical scheme is as follows:
according to a first aspect of the embodiments of the present disclosure, there is provided a frying and baking machine, including an upper plate assembly and a lower plate assembly, the upper plate assembly being rotatably connected with the lower plate assembly, the lower plate assembly including: the baking device comprises a lower shell, a baking tray and a heating component positioned between the lower shell and the baking tray; the upper plate assembly includes:
an upper cover;
the heating substrate is positioned in the accommodating space formed by the upper cover and is fixedly connected with the upper cover;
the nanometer heating film is positioned on one side of the heating substrate facing the upper cover;
the electrode is positioned on the nano heating film and is connected with a power supply through a conducting wire so as to supply power to the nano heating film to heat the nano heating film;
and the controller is connected with the heating part and the electrode and is used for controlling the heating part and the electrode to work and heating the articles on the baking tray.
In one embodiment, the frying and baking machine further comprises a temperature limiting protection device, wherein:
the temperature limiting protection device is arranged on the heating substrate and used for limiting the temperature of the heating substrate not to exceed a preset maximum temperature.
In one embodiment, the frying and baking machine further comprises a temperature limiting protection device, wherein:
the temperature limiting protection device comprises a kick type temperature controller, wherein:
and the kick type temperature controller is connected between the electrode and the power supply and is used for disconnecting the electrode from the power supply when the temperature of the heating substrate reaches the highest temperature.
In one embodiment, the temperature limiting protection device comprises a thermistor, wherein:
the thermistor is connected with the controller and used for sending the detected temperature signal to the controller;
the controller is connected with the electrode and used for controlling the power supply to stop supplying power to the electrode when the temperature signal is received and indicates that the temperature of the heating substrate reaches the maximum temperature.
In one embodiment, the thickness of the heated substrate is 3mm or greater.
The area of the upper cover corresponding to the baking tray is a transparent area;
the heating substrate is a transparent substrate;
the nanometer heating film is a transparent film.
In one embodiment, a transparent protective layer is arranged at the transparent area and is used for heat insulation and electrical safety protection.
In one embodiment, the distance between the transparent protective layer and the nanometer heating film is greater than or equal to 10 mm.
In one embodiment, the thickness of the transparent protective layer is greater than or equal to 3 mm.
In one embodiment, the grill includes a first temperature sensor and a second temperature sensor coupled to the controller;
the first temperature sensor is in contact with the baking tray and used for detecting the temperature of the baking tray and sending the detected temperature of the baking tray to the controller;
the second temperature sensor is in contact with the heating substrate and used for detecting the temperature of the heating substrate and sending the detected temperature of the heating substrate to the controller;
the controller is used for adjusting the heating power of the heating component and the nanometer heating film according to the temperature fed back by the first temperature sensor and the second temperature sensor.
According to a second aspect of the embodiments of the present disclosure, there is provided a method for controlling a grill, the method being applied to the grill, and when a predetermined food is electrically cooked on the grill, the method includes:
in the temperature rise stage, the heating part is controlled to heat the baking tray with first power, the nanometer heating film is controlled to heat the heating substrate with second power, and the first power is larger than the second power;
when the temperature of the baking tray reaches a preset temperature, a heating stabilization stage is started, the heating part is controlled to heat the baking tray with first adjustable power, so that the temperature of the baking tray is within a first preset temperature range, and the nano heating film is controlled to heat the heating substrate with second adjustable power, so that the temperature of the heating substrate is within a second preset temperature range; wherein the temperature of the baking tray is higher than that of the heating substrate, and the temperature difference between the baking tray and the heating substrate is between 5 ℃ and 30 ℃;
entering a coloring stage when the heating stabilization stage reaches a preset time, controlling the nanometer heating film to heat the heating substrate at a third power for the preset time, and then turning off the frying and baking machine; the third power is greater than the second adjustable power.
In one embodiment, the first predetermined temperature range includes 120 ℃ to 200 ℃.
In one embodiment, the second predetermined temperature range comprises 100 ℃ to 180 ℃.
In one embodiment, the preset time comprises 10s ≦ t ≦ 180 s.
In one embodiment, the frying and baking machine comprises a first temperature sensor and a second temperature sensor which are connected with the controller, wherein the first temperature sensor is contacted with the baking tray and used for detecting the temperature of the baking tray, and the second temperature sensor is contacted with the heating base plate and used for detecting the temperature of the heating base plate;
in the temperature raising stage, the heating part is controlled to heat the baking tray with a first power, and the nanometer heating film is controlled to heat the heating substrate with a second power, including:
in the temperature rise stage, the heating part is controlled to heat the baking tray with first power, and the nanometer heating film is controlled to heat the heating substrate with second power; and adjusting the first power and the second power according to the temperature of the baking tray detected by the first temperature sensor and the temperature of the heating substrate detected by the second temperature sensor, so that the temperature rise speed of the baking tray is higher than that of the heating substrate.
This embodiment can utilize the characteristics that nanometer heating film electrothermal efficiency is high, rate of heating is fast in the scene that culinary art cake class edible material need color, control nanometer heating film with the heating power heating of predetermineeing, to food top surface concentrated heating rapidly, let food color with higher speed.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the disclosure.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the present disclosure and together with the description, serve to explain the principles of the disclosure.
Fig. 1 is a schematic diagram illustrating a structure of a grill machine according to an exemplary embodiment.
Fig. 2 is a schematic diagram illustrating a structure of a grill machine according to an exemplary embodiment.
Fig. 3 is a flowchart illustrating a method of controlling a grill in accordance with an exemplary embodiment of the present disclosure.
Fig. 4 is a schematic temperature diagram illustrating a cooking process of a grill according to an exemplary embodiment of the present disclosure.
Detailed Description
Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The implementations described in the exemplary embodiments below are not intended to represent all implementations consistent with the present disclosure. Rather, they are merely examples of apparatus and methods consistent with certain aspects of the present disclosure, as detailed in the appended claims.
In the description of the present disclosure, it is to be understood that the terms "upper", "lower", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present invention.
Fig. 1 is a schematic structural diagram of a frying and baking machine according to an exemplary embodiment, as shown in fig. 1, the frying and baking machine includes an upper plate assembly 1 and a lower plate assembly 2, the upper plate assembly 1 is rotatably connected to the lower plate assembly 2, so that when a user uses the frying and baking machine, the user can rotate the upper plate assembly 1, open the frying and baking machine, place food to be fried and baked into a cavity between the upper plate assembly 1 and the lower plate assembly 2, then rotate the upper plate assembly 1 again to close the frying and baking machine, and finally start the frying and baking machine to fry and bake the food in the cavity.
As shown in fig. 1, in the frying and roasting machine provided in this embodiment, the lower plate assembly 2 includes: a lower case 21, a grill pan 22, and a heating member 23 positioned between the lower case 21 and the grill pan 22; the heating member 23 is located below the grill pan 22 and heats the food on the grill pan 22. For example, as shown in fig. 1, the heating components 23 may be heating pipes uniformly distributed under the baking tray 22, and a groove may be provided under the baking tray 22, and the heating pipes may be disposed in the groove. The heating tube is a tubular electric heating element which can generate heat. The material can be divided into metal tubes, glass tubes, ceramic tubes, carbon fiber tubes, silicone tubes and the like. Taking a metal tube as an example, spiral electrothermal alloy wires (nickel-chromium alloy and iron-chromium alloy) can be uniformly distributed in the metal tube along the central axial direction in the tube, after the electrothermal alloy wires are electrified, electric energy can be converted into heat energy, the baking tray 22 is heated through heat transfer of the metal tube, and food on the baking tray 22 is baked.
As shown in fig. 1, the upper disc assembly 1 includes: an upper cover 11, a heating substrate 12, a nanometer heating film 13 and an electrode 14.
The heating substrate 12 is located in the accommodating space formed by the upper cover 11 and is fixedly connected with the upper cover 11; for example, as shown in fig. 1, the upper cover 11 includes a top plate and a side plate, the top plate and the side plate form an accommodating space, a groove plate may be disposed on the upper cover 11 in the accommodating space, and the heating substrate 12 is fixed in the groove of the groove plate. Of course, the heating plate can also be directly fixed on the side wall of the upper cover 11 by a fixing device (such as a slot, etc.) on the inner side wall of the upper cover 11, which is not illustrated here. Here, the material of the heating substrate 12 may be microcrystalline glass, tempered glass, or quartz glass, which have high temperature resistance and are suitable as the heating substrate 12.
The nanometer heating film 13 is positioned on one side of the heating substrate 12 facing the upper cover 11, so that the nanometer heating film 13 is positioned between the heating substrate 12 and the upper cover 11, and the nanometer heating film 13 is prevented from being polluted and burning a user too hot. The electrode 14 is positioned on the nanometer heating film 13. The electrode 14 is connected with a power supply through a conducting wire so as to supply power to the nanometer heating film 13 to heat the nanometer heating film.
In the embodiment of the present disclosure, the nano heating film 13 is a new polysilicon semiconductor material, and the characteristics of ultra-low resistivity of silicon are utilized, metal and non-metal elements are proportionally added into silicon elements, the heating material is refined into nano particles by adopting a nano technology, and a conductive heating layer with a thickness of 3 to 5 micrometers can be prepared by sintering, depositing and other steps through a complex process, so as to prepare the nano heating film 13. The nanometer heating film 13 has the characteristics of high electric heating efficiency, high heating speed, far infrared radiation heating function and the like, and also has the characteristics of no scale formation, acid and alkali resistance and the like, so that the thermal efficiency ratio of more than 99 percent can be kept for a long time, and the working voltage can work at 4V-400V.
In the embodiment of the present disclosure, the electrodes 14 may be printed on the nano heating film 13 to serve as power input and output electrodes, so as to supply power to the nano heating film 13, and after the power is turned on, the nano heating film 13 between the two electrodes 14 generates current to heat, so as to heat the food on the baking tray 22 located below the nano heating film 13. The power supply voltage can be 4-400V, the frying and baking machine provided by the embodiment is usually used in household occasions, and the voltage is usually 220V. It should be noted that the frying and baking machine may be provided with a controller to control the power supply of the power supply to the electrode 14, so as to control the heating power of the nano heating film 13, and facilitate the user to adjust different heating powers to cook different foods.
In the embodiment of the present disclosure, the area and the thickness of the nano heating film 13 may be determined according to actual conditions, and the area of the nano heating film 13 may be the area of a region to be heated in the frying and baking machine; the resistance of the nano-film may then be determined using the voltage of the scene according to the heating power, and then the thickness of the nano-heating film 13 may be determined according to the resistance of the nano-film and the area of the nano-heating film 13.
In the embodiment of the present disclosure, the frying and roasting machine further includes a controller (not shown), which may be disposed in the upper cover assembly or the lower cover assembly, but is not limited thereto. The controller is connected with the heating part and the electrodes and is used for controlling the heating part and the electrodes to work and heating the articles on the baking tray, the heating part heats the bottom surfaces of the articles by heating the baking tray, and the electrodes are electrified to enable the nanometer heating film 13 to heat the top surfaces of the articles. So, in the scene that culinary art cake class edible material need color, can utilize the characteristics that nanometer heating film electrothermal efficiency is high, rate of heating is fast, the controller can control heating film with the heating power heating of predetermineeing of nanometer, heats face cake top surface centralized rapidly, lets the face cake color with higher speed, promotes product scone culinary art quality.
In one embodiment, the area of the upper cover 11 corresponding to the baking tray 22 is a transparent area, the heating substrate 12 is a transparent substrate, and the nano-heating film 13 is a transparent film, so that when the user uses the frying and baking machine, the user can see the cooking state of the objects on the baking tray 22 through the transparent parts without wasting actions, dirtying and losing heat by frequently opening the upper cover 11.
It should be noted here that when the heating substrate 12 is mounted in the groove as shown in fig. 1, the groove area of the groove plate is a transparent area.
In an embodiment, fig. 2 is a schematic structural diagram of a frying and baking machine according to an exemplary embodiment, the frying and baking machine further includes a temperature limiting protection device 15, wherein the temperature limiting protection device 15 is disposed on the heating substrate 12, and is capable of detecting a temperature on the heating substrate 12, and when the temperature on the heating substrate 12 reaches a preset maximum temperature, the operation of the nano heating film 13 is stopped, and the heating of the heating substrate is stopped, so that the temperature of the heating substrate is limited not to exceed the preset maximum temperature. Here, since the nano heater film 13 is disposed on the heating substrate 12, the temperature limit protection device 15 detects that the temperature of the heating substrate is the operating temperature of the nano heater film 13. The temperature of the heating substrate limited by the temperature limiting protection device 15 is equivalent to the highest temperature of the nanometer heating film 13, so that the temperature of the nanometer heating film 13 during working can be prevented from being too high, the use of the frying and baking machine is safer, the service time of the nanometer heating film 13 is prolonged, and the service life of the frying and baking machine is prolonged.
Here, the maximum temperature at which the nano heat generating film 13 operates is 300 ℃ or less, so the preset maximum temperature is 300 ℃ or less.
In one embodiment, the temperature limiting protection device 15 comprises a snap-action thermostat, wherein the snap-action thermostat may be connected between the electrode 14 and a power source for disconnecting the electrode 14 from the power source when the temperature of the heating substrate 12 reaches the maximum temperature.
For example, the kick thermostat may use a bimetal disc after temperature setting as a thermal sensitive reaction component, when the temperature of a heating substrate increases, heat generated is transferred to the bimetal disc, when the temperature of the bimetal disc as a temperature sensing element rises to a maximum temperature, a kick action is instantly generated, the action is transferred to an elastic part, namely a movable contact support by an action rod, the movable contact and a fixed contact are respectively riveted on the movable contact support and a horn, and after the movable contact support is pushed by the action rod, the movable contact and the fixed contact are separated, so that a circuit is disconnected, and the connection between an electrode 14 and a power supply is disconnected, so that the nano heating film 13 stops generating heat. When the temperature of the heating substrate is reduced to the recovery temperature of the bimetal wafer, the bimetal wafer recovers the original shape instantly, the pressure applied on the action rod is eliminated, the movable contact and the fixed contact are recovered to be connected, and the electrode 14 is reconnected with the power supply, so that the nanometer heating film 13 continues to work; thus, the temperature of the heating substrate can be automatically limited not to exceed the preset maximum temperature.
In one embodiment, the temperature limiting protection device 15 comprises a thermistor.
The thermistor is connected with the controller and used for sending the detected temperature signal to the controller; and the controller is connected with the electrode 14 and used for controlling the power supply to stop supplying power to the electrode 14 when the temperature signal is received to indicate that the temperature of the heating substrate reaches the maximum temperature.
The thermistor is sensitive to temperature and shows different resistance values at different temperatures, the controller can determine whether the temperature of the heating substrate 12 reaches the highest temperature according to the resistance value at the highest temperature, and when the temperature of the heating substrate 12 reaches the highest temperature, the controller controls the power supply to stop supplying power to the electrode 14, so that the nano heating film 13 stops heating the heating substrate.
In a possible embodiment, the thickness of the heating substrate 12 is greater than or equal to 3mm, so that the impact resistance protection can be achieved, the quality of the frying and baking machine can be improved, and the service life of the frying and baking machine can be prolonged.
In one possible embodiment, as shown in fig. 2, a protective layer 17 is provided on the upper cover 11 in the area corresponding to the baking pan 22, and the protective layer 17 is used for thermal insulation and electrical safety protection. The protective layer 17 may be a transparent protective layer in order to facilitate the user to observe the state of the food 16.
For example, as shown in fig. 2, a concave groove may be disposed at a region of the upper cover 11 corresponding to the baking tray 22, and the transparent protection layer 17 is disposed in the concave groove. Of course, the transparent protection layer 17 may be a transparent region of the upper cover 11, that is, the region of the upper cover 11 corresponding to the bakeware 22 is directly formed by the transparent protection layer 17, and a through hole may be provided on the upper cover 11 corresponding to the region of the bakeware 22, and the transparent protection layer 17 may be fixed (e.g., fastened or adhered) at the through hole.
Here, the transparent protective layer 17 can have a heat insulation function to prevent the lower nano heating film 13 from overheating and burning a user; meanwhile, the transparent protective layer 17 is made of insulating materials, so that safety protection of an electric appliance can be performed, and electric shock of a user can be prevented.
Here, the transparent protective layer 17 may be one of tempered glass, quartz glass, and microcrystalline glass.
Here, this toughened glass security is high, and when glass received external force to destroy, the piece can become the obtuse angle of similar cellular shape and smash the tiny particle, is difficult for causing serious injury to the human body. The strength is high, the impact strength of toughened glass with the same thickness is 3-5 times that of common glass, and the bending strength is 3-5 times that of the common glass. The thermal stability is good, the temperature difference which can be borne by the glass is 3 times that of common glass, and the temperature difference change of 300 ℃ can be borne. The quartz glass has high temperature resistance, excellent electrical insulation property and good transmittance, and is convenient for users to observe. The microcrystalline glass has high mechanical strength, excellent insulating property, chemical corrosion resistance, wear resistance, good thermal stability and high use temperature. The toughened glass, the quartz glass and the microcrystalline glass can well achieve the effects of heat insulation and safety protection of electric appliances.
In one embodiment, the distance between the transparent protective layer 17 and the nanometer heating film 13 is greater than or equal to 10mm, so that the distance between the transparent protective layer 17 and the heat source-nanometer heating film 13 exceeds 10mm, and the heat insulation effect is better.
In one embodiment, the thickness of the transparent protective layer 17 is greater than or equal to 3mm, so that the protection against impact can be realized, the quality of the frying and baking machine can be improved, and the service life of the frying and baking machine can be prolonged.
The present disclosure also provides a method for controlling a grill, the method being applied to any one of the above-mentioned grills, and fig. 3 is a flowchart illustrating a method for controlling a grill according to an exemplary embodiment of the present disclosure, where the grill electrically cooks a predetermined food, the method includes the following steps 301, 302, and 303:
in step 301, in the temperature raising stage, the heat generating component is controlled to heat the baking tray with a first power, and the nano heat generating film is controlled to heat the heating substrate with a second power, where the first power is greater than the second power.
When the food is fried and baked, the frying and baking machine needs to enter a temperature rising stage first, and the heating part is controlled to heat the baking tray with first power, so as to heat the bottom surface of the food on the baking tray; and meanwhile, the nanometer heating film is controlled to heat the heating substrate with a second power, so that the top surface of food on the baking tray is heated.
In the embodiment of the disclosure, the baking tray is mainly used for heating before coloring food, and the food is gelatinized once through the heating temperature of the baking tray below, so that the influence of dryness and hardness caused by too fast water loss due to too high temperature at the upper part of the food on the taste is avoided.
In step 302, when the temperature of the baking tray reaches a preset temperature, a heating stabilization stage is performed, the heating component is controlled to heat the baking tray with a first adjustable power, so that the temperature of the baking tray is within a first preset temperature range, and the nano heating film is controlled to heat the heating substrate with a second adjustable power, so that the temperature of the heating substrate is within a second preset temperature range; wherein the temperature of the baking tray is higher than that of the heating substrate, and the temperature difference between the baking tray and the heating substrate is between 5 ℃ and 30 ℃.
Here, when the temperature of the bakeware reaches the preset temperature, the temperature rising stage is finished, and the heating stabilization stage is entered, in which the temperature of the bakeware is ensured to be stabilized within the first preset temperature range and the temperature of the heating substrate is ensured to be stabilized within the second preset temperature range. In order to ensure that the bakeware is heated mainly, the temperature of the bakeware is higher than that of the heating substrate, and the temperature difference between the bakeware and the heating substrate can be preferably between 5 ℃ and 30 ℃.
Here, temperature sensors may be disposed on the bakeware and the heating substrate (for example, the thermistor on the heating substrate in the above embodiment may be used as the temperature sensor on the heating substrate) to detect the temperatures of the bakeware and the heating substrate, when the temperature sensor on the bakeware detects that the temperature of the bakeware exceeds the first preset temperature range, the first adjustable power is adjusted to be 0, and when the temperature sensor on the bakeware detects that the temperature of the bakeware is less than the first preset temperature range, the first adjustable power is adjusted to be high, so as to ensure that the temperature of the bakeware is within the first preset temperature range. Meanwhile, when the temperature sensor on the heating substrate detects that the temperature of the heating substrate exceeds the second preset temperature range, the second adjustable power is adjusted to be 0 if the second adjustable power is reduced, and when the temperature sensor on the heating substrate detects that the temperature of the heating substrate is smaller than the second preset temperature range, the first adjustable power is increased, so that the temperature of the baking tray is ensured to be within the second preset temperature range.
Preferably, the first predetermined temperature range includes 120 ℃ to 200 ℃. For example, when the temperature of the bakeware is 120 ℃, the temperature of the heating substrate may be 90 ℃ to 117 ℃, when the temperature of the bakeware is 170 ℃, the temperature of the heating substrate may be 120 ℃ to 145 ℃, and when the temperature of the bakeware is 200 ℃, the temperature of the heating substrate may be 170 ℃ to 195 ℃.
Preferably, the second predetermined temperature range comprises 100 ℃ to 180 ℃. For example, when the temperature of the bakeware is 120 ℃, the temperature of the heating substrate may be 100 ℃ to 117 ℃, when the temperature of the bakeware is 170 ℃, the temperature of the heating substrate may be 120 ℃ to 145 ℃, and when the temperature of the bakeware is 200 ℃, the temperature of the heating substrate may be 170 ℃ to 180 ℃. Of course, the temperature of the heating substrate may be between 100 ℃ and 180 ℃ and the temperature difference between the bakeware and the heating substrate may be between 5 ℃ and 30 ℃ as long as the temperature of the bakeware is between 120 ℃ and 200 ℃.
Here, the frying time is different for each kind of the article, and the time of the heating stabilization phase may be directly set by the user or may be acquired by the controller according to the kind of the article to be fried and baked, which is input by the user.
In step 303, entering a coloring stage when the heating stabilization stage reaches a preset time, controlling the nanometer heating film to heat the heating substrate with a third power for the preset time, and then turning off the frying and baking machine; the third power is greater than the second adjustable power.
Here, the preset food that needs to color can be food such as cake, bread, and these food can color after the heating stabilization phase finishes when cooking, at this moment, can utilize characteristics such as nanometer heating film electrothermal efficiency is high, rate of heating is fast that thermal inertia is little, heightens the power of nanometer heating film, makes this nanometer heating film with the third power that is higher than the adjustable power of second right the heating substrate heats, so, heats face cake up end concentrate rapidly, lets the face cake color with higher speed, promotes the culinary art quality of cake product.
Here, in the coloring stage, too short coloring time is not good, and too long coloring time is liable to scorch the food. Therefore, the coloring stage needs a preset time of 10s ≦ t ≦ 180s, which may be set for different foods, such as 10s, 50s, 180s, and so on.
By way of example, fig. 4 is a schematic temperature diagram illustrating a cooking process of a grill according to an exemplary embodiment of the present disclosure. As shown in fig. 4, the time period of 0-T1 is a temperature rising stage, in which the temperature rising speed of the bakeware is higher than the temperature rising speed of the heating base plate, when the temperature of the bakeware rises to about 190 ℃ shown in fig. 4, the heating stabilization stage is started, the temperature range of the bakeware is ensured to be within 180 ℃ to 190 ℃, the temperature of the heating base plate is within 170 ℃ to 180 ℃, and the temperature difference Δ T between the temperature T2 of the bakeware and the temperature T1 of the heating base plate is within 5 ℃ to 30 ℃. When the time reaches t2, the heating stabilization stage is finished, the coloring stage is entered, the heating power of the nanometer heating film is increased in the coloring stage, so that the temperature of the heating substrate is rapidly increased, at the moment, the temperature of the heating substrate exceeds the temperature of the baking tray, the food is rapidly colored, and the time of the coloring stage is t3-t 2.
This embodiment can increase the heating power of nanometer heating film at the upper color stage, utilizes the little characteristics of nanometer heating film thermal inertia, concentrates the heating to the top surface of food rapidly, lets food color with higher speed, promotes the culinary art quality of food.
In a possible embodiment, in order to control the frying and roasting machine more accurately for frying and roasting, the frying and roasting machine comprises a first temperature sensor and a second temperature sensor which are connected with the controller, wherein the first temperature sensor is contacted with the roasting tray and is used for detecting the temperature of the roasting tray and sending the detected temperature of the roasting tray to the controller; the second temperature sensor is in contact with the heating substrate and is used for detecting the temperature of the heating substrate and sending the detected temperature of the heating substrate to the controller; the above step 301 may also be implemented as the following step a 1.
In step a1, in the temperature rising stage, the heat generating component is controlled to heat the baking tray with a first power, and the nano heating film is controlled to heat the heating substrate with a second power; and adjusting the first power and the second power according to the temperature of the baking tray detected by the first temperature sensor and the temperature of the heating substrate detected by the second temperature sensor, so that the temperature rise speed of the baking tray is higher than that of the heating substrate.
The first temperature sensor and the second temperature sensor can upload the detected temperatures to the controller, and the controller of the frying and baking machine can increase the first power and decrease the second power when the temperature rising speed of the baking tray is not higher than the temperature rising speed of the heating base plate until the temperature rising speed of the baking tray is higher than the temperature rising speed of the heating base plate, so that the upper heating power meter and the lower heating power meter can be accurately controlled according to the temperature condition fed back by the temperature sensors.
Other embodiments of the disclosure will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This application is intended to cover any variations, uses, or adaptations of the disclosure following, in general, the principles of the disclosure and including such departures from the present disclosure as come within known or customary practice within the art to which the disclosure pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the disclosure being indicated by the following claims.
It will be understood that the present disclosure is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the present disclosure is limited only by the appended claims.

Claims (10)

1. A frying and baking machine comprises an upper disc assembly and a lower disc assembly, wherein the upper disc assembly is rotatably connected with the lower disc assembly, and the lower disc assembly comprises: the baking device comprises a lower shell, a baking tray and a heating component positioned between the lower shell and the baking tray; the upper plate assembly includes:
an upper cover;
the heating substrate is positioned in the accommodating space formed by the upper cover and is fixedly connected with the upper cover;
the nanometer heating film is positioned on one side of the heating substrate facing the upper cover;
the electrode is positioned on the nano heating film and is connected with a power supply through a conducting wire so as to supply power to the nano heating film to heat the nano heating film;
and the controller is connected with the heating part and the electrode and is used for controlling the heating part and the electrode to work and heating the articles on the baking tray.
2. The fry roaster of claim 1, further comprising a temperature limit protection device, wherein:
the temperature limiting protection device is arranged on the heating substrate and used for limiting the temperature of the heating substrate not to exceed a preset maximum temperature.
3. The fry roaster of claim 2, further comprising a temperature limit protection device, wherein:
the temperature limiting protection device comprises a kick type temperature controller, wherein:
and the kick type temperature controller is connected between the electrode and the power supply and is used for disconnecting the electrode from the power supply when the temperature of the heating substrate reaches the highest temperature.
4. The grill of claim 2, wherein the temperature limiting protection device comprises a thermistor, wherein:
the thermistor is connected with the controller and used for sending the detected temperature signal to the controller;
the controller is connected with the electrode and used for controlling the power supply to stop supplying power to the electrode when the temperature signal is received and indicates that the temperature of the heating substrate reaches the maximum temperature.
5. The grill of claim 1, wherein the heating substrate has a thickness of 3mm or more.
6. The frying and roasting machine of claim 1,
the area of the upper cover corresponding to the baking tray is a transparent area;
the heating substrate is a transparent substrate;
the nanometer heating film is a transparent film.
7. The frying and roasting machine of claim 6,
and a transparent protective layer is arranged at the transparent area and is used for heat insulation and electrical appliance safety protection.
8. The frying and roasting machine of claim 7,
the distance between the transparent protective layer and the nanometer heating film is more than or equal to 10 mm.
9. The frying and roasting machine of claim 7,
the thickness of the transparent protective layer is more than or equal to 3 mm.
10. The fry roaster of claim 1, wherein the fry roaster comprises a first temperature sensor and a second temperature sensor connected to the controller;
the first temperature sensor is in contact with the baking tray and used for detecting the temperature of the baking tray and sending the detected temperature of the baking tray to the controller;
the second temperature sensor is in contact with the heating substrate and used for detecting the temperature of the heating substrate and sending the detected temperature of the heating substrate to the controller;
the controller is used for adjusting the heating power of the heating component and the nanometer heating film according to the temperature fed back by the first temperature sensor and the second temperature sensor.
CN201922259028.8U 2019-12-13 2019-12-13 Frying and baking machine Active CN211985095U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201922259028.8U CN211985095U (en) 2019-12-13 2019-12-13 Frying and baking machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201922259028.8U CN211985095U (en) 2019-12-13 2019-12-13 Frying and baking machine

Publications (1)

Publication Number Publication Date
CN211985095U true CN211985095U (en) 2020-11-24

Family

ID=73408290

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201922259028.8U Active CN211985095U (en) 2019-12-13 2019-12-13 Frying and baking machine

Country Status (1)

Country Link
CN (1) CN211985095U (en)

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Address after: Room 01-04, 1st floor, No.2 Lane 60, Naxian Road, Pudong New Area pilot Free Trade Zone, Shanghai 201203

Patentee after: Chunmi Technology (Shanghai) Co.,Ltd.

Address before: Room 01-04, 1st floor, Lane 60, Naxian Road, Pudong New Area, Shanghai, 201203

Patentee before: SHANGHAI CHUNMI ELECTRONICS TECHNOLOGY Co.,Ltd.