CN211836375U - Vacuum buffer tank for laboratory - Google Patents
Vacuum buffer tank for laboratory Download PDFInfo
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- CN211836375U CN211836375U CN201922329071.7U CN201922329071U CN211836375U CN 211836375 U CN211836375 U CN 211836375U CN 201922329071 U CN201922329071 U CN 201922329071U CN 211836375 U CN211836375 U CN 211836375U
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Abstract
The utility model discloses a vacuum buffer tank for a laboratory, wherein a first opening, a second opening and a third opening are arranged at the top of the vacuum buffer tank which is horizontally arranged at intervals, and a fourth opening is arranged at the bottom of the vacuum buffer tank; the vacuum pipe of the rectification system with a first valve is communicated with the first opening in a sealing way, the nitrogen pipe with a second valve is communicated with the second opening in a sealing way, the vacuum access pipe with a third valve is communicated with the third opening in a sealing way, and the low-position exhaust pipe with a fourth valve is communicated with the fourth opening in a sealing way; one end of a nitrogen balance pipe with a fifth valve is in sealing connection with a vacuum pipe of the rectification system between the first valve and the vacuum buffer tank, the other end of the nitrogen balance pipe is in sealing connection with a nitrogen pipe between the second valve and the vacuum buffer tank, and a sixth valve is arranged on the nitrogen pipe between the nitrogen balance pipe and the vacuum buffer tank. The structure can improve the stability of vacuum degree control, and can also carry out rectification experiments with different vacuum degrees on the premise of not changing the vacuum degree of the vacuum pump end.
Description
Technical Field
The utility model relates to a vacuum buffer tank especially relates to a vacuum buffer tank is used in laboratory.
Background
In the synthesis development process of a chemical laboratory, the vacuum rectification is a conventional and effective purification mode. Wherein, the vacuum buffer tank is necessary corollary equipment for vacuum rectification, and the performance of the vacuum buffer tank has certain influence on the vacuum rectification process and the quality of products of the vacuum rectification.
The conventional vacuum buffer tank has single function, inaccurate pressure control and large fluctuation in the rectification process; in addition, the vacuum tube orifice and the nitrogen tube orifice of the rectification system on the vacuum buffer tank are positioned on the same surface with the inner wall surface above the vacuum buffer tank body, if the rectified material has slight viscosity or is easy to attach to the inner wall of the vacuum buffer tank body under the normal temperature and pressure state, when nitrogen balance is carried out in the rectification process, the material attached to the inner wall above the vacuum buffer tank body is easily brought into a receiving bottle of the rectification system to pollute the vacuum rectification product.
SUMMERY OF THE UTILITY MODEL
The utility model discloses the technical problem that needs to solve is: the utility model provides a vacuum buffer tank is used in laboratory that vacuum control stability is good, this vacuum buffer tank matches when using in rectifying system, can carry out the rectification experiment of different vacuums under the prerequisite that does not change the vacuum of vacuum pump end, uses effectively, the simple operation.
In order to solve the above problem, the utility model adopts the following technical scheme: the laboratory vacuum buffer tank comprises: the vacuum buffer tank is horizontally arranged, a first opening, a second opening and a third opening are arranged at the top of the vacuum buffer tank at intervals, and a fourth opening is arranged at the bottom of the vacuum buffer tank; the vacuum pipe of the rectification system is communicated with the first opening in a sealing way, and a first valve is arranged on the vacuum pipe of the rectification system outside the vacuum buffer tank body; the nitrogen pipe is communicated with the second opening in a sealing way, and a second valve is arranged on the nitrogen pipe outside the vacuum buffer tank body; the vacuum access pipe is communicated with the third opening in a sealing way, and a third valve is arranged on the vacuum access pipe; the lower row is communicated with the fourth opening in a sealing way, and a fourth valve is arranged on the lower row; the vacuum tube of the rectification system between the first valve and the vacuum buffer tank is provided with a first connecting hole, the nitrogen tube between the second valve and the vacuum buffer tank is provided with a second connecting hole, one end of the nitrogen balancing tube is in sealing connection with the first connecting hole, the other end of the nitrogen balancing tube is in sealing connection with the second connecting hole, the nitrogen balancing tube is provided with a fifth valve, and the nitrogen tube between the second connecting hole and the vacuum buffer tank is provided with a sixth valve.
Further, in the vacuum buffer tank for the laboratory, a mouth of the vacuum tube of the rectification system hermetically penetrates through the first opening and then extends into an inner cavity of the vacuum buffer tank; the opening of the nitrogen pipe penetrates through the second opening in a sealing manner and then extends into the inner cavity of the vacuum buffer tank.
Further, in the vacuum buffer tank for the laboratory, the distance H from the pipe orifice of the vacuum pipe of the rectification system extending into the inner cavity of the vacuum buffer tank to the top end of the inner wall of the vacuum buffer tank is 2-3 cm; the distance H' from the opening of the nitrogen pipe extending into the inner cavity of the vacuum buffer tank to the top end of the inner wall of the vacuum buffer tank is 2-3 cm.
Further, aforementioned laboratory is with vacuum buffer tank, wherein, vacuum buffer tank bottoms is the arc curved surface profile that both ends are high, the centre is low, and the fourth opening is seted up in vacuum buffer tank bottoms minimum point position.
Further, aforementioned laboratory vacuum buffer tank, wherein, first valve, second valve, third valve, fourth valve, fifth valve and sixth valve are the ball valve.
Further, the vacuum buffer tank for the laboratory is further provided with a mechanical vacuum meter for measuring the vacuum degree in the inner cavity of the vacuum buffer tank and a digital display pressure transmitter for measuring the pressure in the inner cavity of the vacuum buffer tank.
Further, in the vacuum buffer tank for the laboratory, a data output line of the digital display pressure transmitter is connected to a central control system.
The utility model has the advantages that: when the vacuum buffer tank is used in a rectification system in a matching way, the stability of vacuum degree control can be improved, rectification experiments with different vacuum degrees can be carried out on the premise of not changing the vacuum degree of a vacuum pump end, and the rectification experiments in a laboratory can be conveniently carried out; the distance for the vacuum tube and the nitrogen tube of the rectification system to extend into the vacuum buffer tank is set, so that the defect that materials in the vacuum buffer tank are easily brought into a receiving bottle of the rectification system when nitrogen is balanced is overcome, and the quality of decompressed and rectified products is better ensured.
Drawings
Fig. 1 is a schematic structural diagram of the vacuum buffer tank for the laboratory according to the present invention.
Fig. 2 is a partial structural schematic view of fig. 1.
Fig. 3 is a partial structural schematic view of fig. 1.
Detailed Description
The technical solution of the present invention will be described in further detail with reference to the accompanying drawings and preferred embodiments.
Example one
As shown in fig. 1, the vacuum buffer tank for laboratory in this embodiment includes: the vacuum buffer tank 1 is arranged horizontally, and in practical operation, the vacuum buffer tank 1 can be placed horizontally through a support or a bracket. The top of the vacuum buffer tank 1 is provided with a first opening 11, a second opening 12 and a third opening 13 at intervals, and the bottom of the vacuum buffer tank 1 is provided with a fourth opening 14. The first opening 11, the second opening 12, the third opening 13 and the fourth opening 14 are all communicated with the inner cavity of the vacuum buffer tank 1.
The vacuum tube 2 of the rectification system is hermetically communicated with the first opening 11, and a first valve 61 is arranged on the vacuum tube 2 of the rectification system outside the tank body of the vacuum buffer tank 1. The nitrogen gas pipe 3 is hermetically communicated with the second opening 12, and a second valve 62 is arranged on the nitrogen gas pipe 3 outside the tank body of the vacuum buffer tank 1. The vacuum inlet pipe 4 is in sealed communication with the third opening 13, and a third valve 63 is provided in the vacuum inlet pipe 4. The lower level bank pipe 5 is in sealed communication with the fourth opening 14, and a fourth valve 64 is provided on the lower level bank pipe 5. The pipe wall of the vacuum pipe 2 of the rectification system between the first valve 61 and the vacuum buffer tank 1 is provided with a first connecting hole 21, the pipe wall of the nitrogen pipe 3 between the second valve 62 and the vacuum buffer tank 1 is provided with a second connecting hole 31, one end of the nitrogen balancing pipe 7 is hermetically connected with the first connecting hole 21, the other end of the nitrogen balancing pipe 7 is hermetically connected with the second connecting hole 31, the nitrogen balancing pipe 7 is provided with a fifth valve 65, and the nitrogen pipe 7 between the second connecting hole and the vacuum buffer tank 1 is provided with a sixth valve 66.
In this embodiment, ball valves are used for the first valve 61, the second valve 62, the third valve 63, the fourth valve 64, the fifth valve 65, and the sixth valve 66. The vacuum buffer tank 1 is also provided with a mechanical vacuum meter 8 for measuring the vacuum degree in the inner cavity of the vacuum buffer tank 1 and a digital display pressure transmitter 9 for measuring the pressure in the inner cavity of the vacuum buffer tank 1. In the actual use process, data can be directly read from the mechanical vacuum gauge 8 and the digital display pressure transmitter 9, a hollow system can be additionally arranged, and a data output line of the digital display pressure transmitter 9 is connected into the central control system. The central control system is a device for centrally controlling various devices such as sound, light, electricity and measurement elements, and belongs to a mature control device, in the embodiment, the central control system is applied to monitor data on the digital display pressure transmitter 9, and is not designed and improved, so that detailed structure and working principle of the central control system are not explained herein.
The conventional decompression rectification operation process is as follows:
before the rectification operation is started, a first valve 61, a second valve 62, a third valve 63, a fourth valve 64, a fifth valve 65 and a sixth valve 66 are closed, a vacuum pipe 2 of the rectification system is connected into the rectification system through a hose, a nitrogen pipe 3 is connected with a nitrogen source through a hose, and a vacuum connecting pipe 4 is connected into a vacuum main pipe of a vacuum pump through a hose.
When the rectification operation is started, the first valve 61 and the third valve 63 are opened to start the rectification operation, when the distillation is switched in the rectification process or the rectification is finished and the balance vacuum is needed, the third valve 63 is closed, the fifth valve 65 is opened and then the second valve 62 is slowly opened, so that nitrogen enters the rectification system and the vacuum buffer tank 1 through the nitrogen pipe 3 and the nitrogen balance pipe 2, the vacuum of the whole rectification system is balanced to the normal pressure, and the operation is repeated when the rectification is performed again.
The decompression rectification operation process needing to control the vacuum degree of the system is as follows:
before the rectification operation is started, a first valve 61, a second valve 62, a third valve 63, a fourth valve 64, a fifth valve 65 and a sixth valve 66 are closed, a vacuum pipe 2 of the rectification system is connected into the rectification system through a hose, a nitrogen pipe 3 is connected with a nitrogen source through a hose, and a vacuum connecting pipe 4 is connected into a vacuum main pipe of a vacuum pump through a hose.
When the rectification operation is started, the first valve 61 and the third valve 63 are opened to access vacuum, then the sixth valve 66 is opened, after the second valve 62 is opened, the opening degrees of the second valve 62 and the third valve 63 are adjusted to enable the vacuum degrees of the vacuum buffer tank 1 and the rectification system to reach target values, and the rectification operation is started. And when the distillation is switched or the distillation is finished in the distillation process and the balance vacuum is needed, closing the third valve 63, the sixth valve 66 and the second valve 62, opening the fifth valve 65 and then slowly opening the second valve 62, so that nitrogen enters the distillation system and the vacuum buffer tank 1 through the nitrogen pipe 3 and the nitrogen balance pipe 2, balancing the vacuum of the whole system to the normal pressure, and repeating the operation when the distillation is carried out again.
Example two
The orifice of the vacuum tube 2 and the orifice of the nitrogen tube 3 of the rectification system on the vacuum buffer tank 1 are both positioned on the same surface with the inner wall surface above the tank body of the vacuum buffer tank 1, if the rectified material has slight viscosity or is easy to attach to the inner wall of the tank body of the vacuum buffer tank 1 under the normal temperature and pressure state, when nitrogen balance is carried out in the rectification process, the material attached to the inner wall above the tank body of the vacuum buffer tank 1 is easily brought into a receiving bottle of the rectification system to pollute a vacuum rectification product. In view of this drawback, the present embodiment is further improved on the basis of the first embodiment. As shown in fig. 2 and fig. 3, the mouth seal of the vacuum tube 2 of the rectification system passes through the first opening 11 and then extends into the inner cavity of the vacuum buffer tank 1, and the mouth seal of the nitrogen tube 3 passes through the second opening 12 and then extends into the inner cavity of the vacuum buffer tank 1. And the distance H from the pipe orifice of the vacuum pipe 2 of the rectification system extending into the inner cavity of the vacuum buffer tank 1 to the top end of the inner wall of the vacuum buffer tank 1 is 2-3 cm, and the distance H' from the pipe orifice of the nitrogen pipe 3 extending into the inner cavity of the vacuum buffer tank 1 to the top end of the inner wall of the vacuum buffer tank 1 is 2-3 cm. The device overcomes the defect that the material in the vacuum buffer tank is easily brought into the receiving bottle of the rectification system when the nitrogen is balanced, and better ensures the quality of the decompressed rectification product.
During the use process of the vacuum buffer tank, the condensed liquid is discharged out of the vacuum buffer tank 1 from the low-level exhaust pipe 5 after passing through the fourth opening 14. In the cleaning process of the vacuum buffer tank, the cleaning liquid for cleaning the vacuum buffer tank is discharged out of the vacuum buffer tank 1 from the low-level exhaust pipe 5 after passing through the fourth opening 14. In order to make the condensed liquid and the cleaning liquid completely discharged out of the vacuum buffer tank 1 without being accumulated in the vacuum buffer tank 1, as shown in fig. 1, in the present embodiment, the tank bottom contour of the vacuum buffer tank 1 is set to be an arc-shaped curved contour with two high ends and a low middle, and the fourth opening 14 is opened at the lowest point of the tank bottom of the vacuum buffer tank 1. The bottom surface of the arc-shaped curved surface profile has no dead angle for storing liquid, so that the condensed liquid in the vacuum buffer tank 1 can be collected at the fourth opening 14 along the arc-shaped curved surface profile and then is discharged out of the vacuum buffer tank 1 from the low-level exhaust pipe 5 in the rectification process. In the cleaning process, the cleaning liquid for cleaning the vacuum buffer tank 1 can be collected at the fourth opening 14 along the arc-shaped curved surface contour and then is discharged out of the vacuum buffer tank 1 from the low-position exhaust pipe 5.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and any modifications or equivalent changes made in accordance with the technical spirit of the present invention are also within the scope of the present invention.
The utility model has the advantages that: when the vacuum buffer tank 1 is matched with a rectification system for use, the stability of vacuum degree control can be improved, rectification experiments with different vacuum degrees can be carried out on the premise of not changing the vacuum degree of a vacuum pump end, and the rectification experiments can be conveniently carried out in a laboratory; secondly, the distance for the vacuum tube 2 and the nitrogen tube 3 of the rectification system to extend into the vacuum buffer tank 1 is set, so that the defect that materials in the vacuum buffer tank 1 are easily brought into a receiving bottle of the rectification system when nitrogen is balanced is overcome, and the quality of decompressed and rectified products is better ensured.
Claims (7)
1. Vacuum buffer tank is used in laboratory includes: the vacuum buffer tank that crouches and set up, its characterized in that: a first opening, a second opening and a third opening are arranged at the top of the vacuum buffer tank at intervals, and a fourth opening is arranged at the bottom of the vacuum buffer tank; the vacuum tube of the rectification system is communicated with the first opening in a sealing way, and a first valve is arranged on the vacuum tube of the rectification system; the nitrogen pipe is communicated with the second opening in a sealing way, and a second valve is arranged on the nitrogen pipe; the vacuum access pipe is communicated with the third opening in a sealing way, and a third valve is arranged on the vacuum access pipe; the lower row is communicated with the fourth opening in a sealing way, and a fourth valve is arranged on the lower row; the vacuum tube of the rectification system between the first valve and the vacuum buffer tank is provided with a first connecting hole, the nitrogen tube between the second valve and the vacuum buffer tank is provided with a second connecting hole, one end of the nitrogen balancing tube is in sealing connection with the first connecting hole, the other end of the nitrogen balancing tube is in sealing connection with the second connecting hole, the nitrogen balancing tube is provided with a fifth valve, and the nitrogen tube between the second connecting hole and the vacuum buffer tank is provided with a sixth valve.
2. The laboratory vacuum buffer vessel of claim 1, wherein: the mouth of the vacuum tube of the rectification system hermetically penetrates through the first opening and then extends into the inner cavity of the vacuum buffer tank; the opening of the nitrogen pipe penetrates through the second opening in a sealing manner and then extends into the inner cavity of the vacuum buffer tank.
3. The laboratory vacuum buffer vessel of claim 2, wherein: the distance H from the pipe orifice of the vacuum pipe of the rectification system extending into the inner cavity of the vacuum buffer tank to the top end of the inner wall of the vacuum buffer tank is 2-3 cm; the distance H' from the opening of the nitrogen pipe extending into the inner cavity of the vacuum buffer tank to the top end of the inner wall of the vacuum buffer tank is 2-3 cm.
4. The laboratory vacuum buffer vessel of claim 1, 2 or 3, wherein: the bottom of the vacuum buffer tank is an arc-shaped curved surface profile with high two ends and low middle, and the fourth opening is arranged at the lowest point position of the bottom of the vacuum buffer tank.
5. The laboratory vacuum buffer vessel of claim 1, 2 or 3, wherein: the first valve, the second valve, the third valve, the fourth valve, the fifth valve and the sixth valve are all ball valves.
6. The laboratory vacuum buffer vessel of claim 1, wherein: the vacuum buffer tank is also provided with a mechanical vacuum meter for measuring the vacuum degree in the inner cavity of the vacuum buffer tank and a digital display pressure transmitter for measuring the pressure in the inner cavity of the vacuum buffer tank.
7. The laboratory vacuum buffer vessel of claim 6, wherein: and a data output line of the digital display pressure transmitter is connected into a central control system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922329071.7U CN211836375U (en) | 2019-12-23 | 2019-12-23 | Vacuum buffer tank for laboratory |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922329071.7U CN211836375U (en) | 2019-12-23 | 2019-12-23 | Vacuum buffer tank for laboratory |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211836375U true CN211836375U (en) | 2020-11-03 |
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ID=73217771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922329071.7U Active CN211836375U (en) | 2019-12-23 | 2019-12-23 | Vacuum buffer tank for laboratory |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211836375U (en) |
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2019
- 2019-12-23 CN CN201922329071.7U patent/CN211836375U/en active Active
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Address after: 215600 No.35 Nanhai Road, Jiangsu Yangzijiang International Chemical Industrial Park, Zhangjiagang, Suzhou, Jiangsu Province Patentee after: Zhangjiagang Guotai-Huarong New Chemical Materials Co.,Ltd. Address before: 215600 Zhangjiagang Guotai Huarong chemical new material Co., Ltd., No.9 Nanhai Road, Yangzijiang International Chemical Industry Park, Zhangjiagang City, Suzhou City, Jiangsu Province Patentee before: Zhangjiagang Guotai-Huarong New Chemical Materials Co.,Ltd. |