CN211636468U - Liquid phase pulse discharge plasma processing reaction device - Google Patents
Liquid phase pulse discharge plasma processing reaction device Download PDFInfo
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- CN211636468U CN211636468U CN201922323092.8U CN201922323092U CN211636468U CN 211636468 U CN211636468 U CN 211636468U CN 201922323092 U CN201922323092 U CN 201922323092U CN 211636468 U CN211636468 U CN 211636468U
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Abstract
The utility model relates to a plasma processing reaction device, in particular to a liquid phase pulse discharge plasma processing reaction device. The pulse discharge plasma treatment system is communicated with a top return port of the gas-liquid mixing system through a fifth connecting pipe. The utility model has the advantages of effect: utilize the utility model discloses a liquid phase pulse discharge plasma handles reaction unit and processing method when carrying out liquid material pulse discharge plasma and handle, have the advantage that the handling capacity is big, the continuity is good.
Description
Technical Field
The utility model relates to a plasma processing reaction device, in particular to a liquid phase pulse discharge plasma processing reaction device.
Background
The pulse discharge plasma processing technology is a novel advanced oxidation processing technology, is widely applied to the fields of water treatment, sterilization, biological macromolecule degradation modification and the like, and has very wide application prospect. However, the existing treatment reaction device for treating liquid materials by the pulse discharge plasma technology has the problems of small treatment amount, poor continuity and the like. Therefore, it is an urgent technical problem for those skilled in the art to develop a pulsed discharge plasma processing reactor and a processing method thereof for liquid phase discharge applied to liquid material processing.
Disclosure of Invention
The utility model aims at overcoming the defects and providing a liquid phase pulse discharge plasma processing reaction device for continuously processing liquid materials.
In order to realize the purpose of the utility model, the technical scheme of the utility model is as follows:
the liquid phase pulse discharge plasma treatment reaction device comprises a stirring tank, a gas-liquid mixing system and a pulse discharge plasma treatment system, wherein the stirring tank is communicated with the gas-liquid mixing system through a first connecting pipe, the gas-liquid mixing system is communicated with the pulse discharge plasma treatment system through a fourth connecting pipe, and the pulse discharge plasma treatment system is communicated with a top return port of the gas-liquid mixing system through a fifth connecting pipe.
The structure of the gas-liquid mixing system is as follows: the gas-liquid mixer is arranged on the gas inlet system; the stirring tank is connected with the gas-liquid mixer through a first connecting pipe, the gas inlet system is communicated with the gas-liquid mixer through a second connecting pipe, and the gas-liquid mixer is communicated with the high-pressure gas-liquid storage tank through a third connecting pipe.
The air inlet system supplies air by one or two of an air bottle and an air pump; and a valve is arranged at the outlet of the gas cylinder, an air filter is arranged at the air inlet end of the air pump, and a fifth valve is arranged at the outlet of the air pump.
The structure of the pulse discharge plasma processing system is as follows: consists of a processing chamber and a high pulse power supply generator; the lower part of the high-pressure gas-liquid storage tank is communicated with the inlet of the treatment chamber through a fourth connecting pipe, the outlet of the treatment chamber is communicated with the backflow port at the top of the high-pressure gas-liquid storage tank through a fifth connecting pipe, the fifth connecting pipe is provided with a discharge port, and the high-pulse power generator is connected with the treatment chamber through a lead; a second material conveying pump is arranged on the fourth connecting pipe, and a seventh valve is arranged at the feed end of the second material conveying pump; an eighth valve is arranged at the feeding end of the discharge hole; and a sixth valve is arranged at a return port at the top of the high-pressure gas-liquid storage tank.
The treatment chamber by transfer the plate electrode, go up discharge electrode and ground electrode and constitute, transfer the plate electrode, go up discharge electrode and ground electrode and be circular shape, the ground electrode is arranged in and is transferred the plate electrode and go up the discharge electrode in the middle of, two-layer discharge region about forming, all placed the conveying pipeline in upper layer discharge region, the conveying pipeline has all been placed down in lower layer discharge region, go up the conveying pipeline and be compressed tightly by two polar plate direct contact that correspond with lower conveying pipeline.
A circular hole is formed in the center of the grounding polar plate, and the centers of the upper conveying pipe and the lower conveying pipe are connected with the conveying pipe and penetrate through the circular hole; the lower material conveying pipes of the lower discharging area are arranged spirally from the edge to the center, the upper material conveying pipes of the upper discharging area are arranged spirally from the center to the edge, and the diameter of the spirally arranged upper material conveying pipes and lower material conveying pipes is the same as the distance between the lower electrode plate and the upper discharging electrode plate and the distance between the upper discharging electrode plate and the grounding electrode plate; the gaps of the upper material conveying pipes which are spirally arranged are filled with insulating materials, the gaps of the lower material conveying pipes which are spirally arranged are filled with insulating materials, and the grounding polar plate is grounded.
Agitator tank bottom head be the toper, be equipped with dog-house and inlet at the top of agitator tank, be equipped with stirring paddle leaf in the agitator tank, stirring paddle leaf is connected with the agitator motor at agitator tank top, the liquid outlet of agitator tank bottom is connected with first conveying pump through a connecting pipe.
A process for preparing the liquid-phase pulse discharge plasma reactor includes such steps as mixing liquid or solid material in stirring tank, delivering it to gas-liquid mixer by the first pump, mixing it with the gas from gas inlet system to form gas-liquid mixture, storing it in high-pressure gas-liquid tank, delivering it to treating chamber by the second pump, pulse discharging, plasma treating, and discharging.
When liquid is added into the stirring tank, oxidant can be added into the stirring tank at the same time; the air inlet system adopts an air pump and/or an air bottle to supply air.
The opening size of the seventh valve is controlled to control the conveying speed of the liquid material, so that the retention time of the liquid material in the treatment chamber is controlled, and if the liquid material is not treated, the material flows back to the high-pressure gas-liquid storage tank to be treated again.
The utility model has the advantages of effect: utilize the utility model discloses a liquid phase pulse discharge plasma handles reaction unit and processing method when carrying out liquid material pulse discharge plasma and handle, have the advantage that the handling capacity is big, the continuity is good.
Drawings
Fig. 1 is a schematic connection diagram of the present invention.
FIG. 2 is a plan view of the arrangement of the lower feed conveyor in the treatment chamber.
FIG. 3 is a plan view of the arrangement of the upper feed conveyor in the treatment chamber.
In the figure, 1, a stirring tank, 2, a gas-liquid mixing system, 3, a pulse discharge plasma processing system, 101, a feed inlet, 102, a liquid inlet, 103, a stirring motor, 104, a stirring paddle, 105, a liquid outlet, 201, a first delivery pump 1, 202, an air inlet system, 203, a gas cylinder, 204, a second valve, 205, a third valve, 206, a fourth valve, 207, an air filter, 208, an air pump, 209, a fifth valve, 210, a gas-liquid mixer, 211, a high-pressure gas-liquid storage tank, 212, a sixth valve, 301, a seventh valve, 302, a second delivery pump 2, 303, a lower delivery pipe, 304, a lower electrode plate, 305, a grounding electrode plate, 306, an upper discharge electrode plate, 307, an upper delivery pipe, 308, a processing chamber, 309, a high pulse power generator, 310, an eighth valve, 311, and a discharge outlet.
The specific implementation mode is as follows:
the present invention will be described in further detail with reference to the following examples. The following embodiments are only specific embodiments of the present invention, but the design concept of the present invention is not limited thereto, and the present invention is not limited to the above embodiments, and all the embodiments should be considered to infringe the scope of the present invention when the design concept is modified immaterial.
Example 1
As shown in the figure, the utility model relates to a liquid phase pulse discharge plasma handles reaction unit, it comprises agitator tank 1, gas-liquid hybrid system 2 and pulse discharge plasma processing system 3, and agitator tank 1 communicates with gas-liquid hybrid system 2 through a connecting pipe 11, and gas-liquid hybrid system 2 communicates with pulse discharge plasma processing system 3 through No. four connecting pipes 14, and pulse discharge plasma processing system 3 communicates through No. five connecting pipes 15 and 2 top backward flows of gas-liquid hybrid system.
The structure of the gas-liquid mixing system 2 is as follows: the gas-liquid mixer comprises a gas inlet system 202, a gas-liquid mixer 210 and a high-pressure gas-liquid storage tank 211; the stirring tank 1 is connected with a gas-liquid mixer 210 through a first connecting pipe 11, the gas inlet system 202 is communicated with the gas-liquid mixer 210 through a second connecting pipe 12, and the gas-liquid mixer 210 is communicated with a high-pressure gas-liquid storage tank 211 through a third connecting pipe 13.
The air inlet system 202 is supplied with air by an air bottle 203 and an air pump 208; the outlet of the air bottle 203 is provided with valves (204, 205, 206), the inlet end of the air pump 208 is provided with an air filter 207, and the outlet of the air pump 208 is provided with a fifth valve 209.
The structure of the pulse discharge plasma processing system 3 is as follows: consists of a processing chamber 308 and a high pulse power generator 309; the lower part of the high-pressure gas-liquid storage tank 211 is communicated with an inlet of the treatment chamber 308 through a fourth connecting pipe 14, an outlet of the treatment chamber 308 is communicated with a return port at the top of the high-pressure gas-liquid storage tank 211 through a fifth connecting pipe 15, a discharge port 311 is arranged on the fifth connecting pipe 15, and the high-pulse power generator 309 is connected with upper and lower discharge electrode plates of the treatment chamber 308 through conducting wires; a second material conveying pump 302 is arranged on the fourth connecting pipe 14, and a seventh valve 301 is arranged at the feeding end of the second material conveying pump 302; an eighth valve 310 is arranged at the feeding end of the discharging hole 311; a sixth valve 212 is arranged at a return port at the top of the high-pressure gas-liquid storage tank 211.
The treatment chamber 308 comprises a lower discharge electrode plate 304, an upper discharge electrode plate 306 and a ground electrode plate 305, the lower discharge electrode plate 304, the upper discharge electrode plate 306 and the ground electrode plate 305 are circular, the ground electrode plate 305 is arranged between the lower discharge electrode plate 304 and the upper discharge electrode plate 306 to form an upper discharge area and a lower discharge area, the upper feed delivery pipe 307 is arranged in the upper discharge area, the lower feed delivery pipe 303 is arranged in the lower discharge area, and the upper feed delivery pipe 307 and the lower feed delivery pipe 303 are directly contacted and pressed by the corresponding two electrode plates.
A circular hole is formed in the center of the grounding polar plate 305, and the centers of the upper material conveying pipe 307 and the lower material conveying pipe 303 are connected with the centers of the material conveying pipes and penetrate through the circular hole; the lower material conveying pipes of the lower layer discharging area are arranged in a spiral mode from the edge to the center, the upper material conveying pipes of the upper layer discharging area are arranged in a spiral mode from the center to the edge, and the diameter of the spiral arrangement of the upper material conveying pipes 307 and the lower material conveying pipes 303 is the same as the distance among the lower electrode plate 304, the upper discharging electrode plate 306 and the grounding electrode plate 305; the gaps of the upper feed conveyor pipes arranged in a spiral are filled with an insulating material, the gaps of the lower feed conveyor pipes arranged in a spiral are filled with an insulating material, and the ground plate 305 is grounded.
1 bottom head of agitator tank be the toper, be equipped with dog-house 101 and inlet 102 at agitator tank 1's top, be equipped with stirring paddle 104 in the agitator tank 1, stirring paddle 104 is connected with agitator motor 103 at agitator tank 1 top, the liquid outlet 105 of agitator tank 1 bottom is connected with first defeated material pump 201 through a connecting pipe 11.
The treatment method of the liquid phase pulse discharge plasma treatment reaction device comprises the following steps: the liquid material and the blending solvent respectively enter the stirring tank 1 from a feeding port 101 and a liquid inlet 102 of the stirring tank 1, and the liquid material to be treated is obtained under the stirring action of a stirring motor 103 and a stirring blade 104. After the stirring and dissolving are completed, the first valve on the liquid outlet 105 is opened, the material is conveyed to the gas-liquid mixer 210 by the first conveying pump 201, meanwhile, the gas inlet system 202 is started, the gas is supplied by the gas pump 208 or the gas cylinder 202, the gas pump 208 supplies air, and the gas cylinder 202 supplies oxygen, nitrogen and argon. In the gas-liquid mixer 210, the gas and the material are fully mixed and enter the high-pressure gas-liquid storage tank 211 for storage. After all the materials in the stirring tank 1 enter the high-pressure gas-liquid storage tank 211, the seventh valve 301 is opened, and the gas-liquid mixed liquid is conveyed to the treatment chamber feeding hole 303 by the second conveying pump 302 and enters the treatment chamber 308. Meanwhile, a high-pulse power generator 309 is started, the lower discharge electrode plate 304, the upper discharge electrode plate 306 and the grounding electrode plate 305 are electrified, the gas-liquid mixed liquid in the material conveying pipe is discharged, gas in the material is ionized, plasma substances with high oxidation activity are generated, and pulse discharge plasma processing is realized on the material. After the material is treated by the pulse discharge plasma, the material is output from the treatment chamber 308 through the treatment chamber discharge port 307. Meanwhile, the eighth valve 310 is opened to discharge the material from the discharge hole 311.
Example 2
The oxidizing agent is added to the stirring tank 1 in example 1, and the treatment by the synergistic measure of the pulse discharge plasma and the oxidizing agent is realized, so that the treatment effect is enhanced. Otherwise, the same procedure as in example 1 was repeated.
Example 3
In example 1, when the supplied air is air, the fifth valve 209 is opened, the air pump 208 is started, and the air is filtered into clean air by the air filter 207 and then is delivered into the air-liquid mixer 210 by the air pump. Otherwise, the same procedure as in example 1 was repeated.
Example 4
The inlet gas in the embodiment 1 is a specific gas, and the gas enters the gas-liquid mixer 210 under the pressure of the gas cylinder 202 by opening the second valve 204, the third valve 205 or the fourth valve 206 corresponding to the specific gas. Otherwise, the same procedure as in example 1 was repeated.
Example 5
In example 1, the duration of the treatment of the liquid material by the pulsed discharge plasma is short, and the conveying speed of the material can be controlled by adjusting the opening size of the seventh valve 301, so as to control the conveying time of the material in the treatment chamber 308, thereby achieving the purpose of controlling the treatment time of the pulsed discharge plasma. Otherwise, the same procedure as in example 1 was repeated.
Claims (7)
1. The liquid phase pulse discharge plasma treatment reaction device is characterized by comprising a stirring tank (1), a gas-liquid mixing system (2) and a pulse discharge plasma treatment system (3), wherein the stirring tank (1) is communicated with the gas-liquid mixing system (2) through a first connecting pipe (11), the gas-liquid mixing system (2) is communicated with the pulse discharge plasma treatment system (3) through a fourth connecting pipe (14), and the pulse discharge plasma treatment system (3) is communicated with a top return port of the gas-liquid mixing system (2) through a fifth connecting pipe (15).
2. The liquid phase pulse discharge plasma processing reaction apparatus according to claim 1, wherein the gas-liquid mixing system (2) is structured as follows: the gas-liquid mixer comprises a gas inlet system (202), a gas-liquid mixer (210) and a high-pressure gas-liquid storage tank (211); the stirring tank (1) is connected with a gas-liquid mixer (210) through a first connecting pipe (11), the gas inlet system (202) is communicated with the gas-liquid mixer (210) through a second connecting pipe (12), and the gas-liquid mixer (210) is communicated with a high-pressure gas-liquid storage tank (211) through a third connecting pipe (13).
3. The liquid phase pulse discharge plasma processing reaction apparatus according to claim 2, wherein the gas inlet system (202) is supplied with gas from one or both of a gas cylinder (203) and a gas pump (208); the outlet of the air bottle (203) is provided with a valve, the air inlet end of the air pump (208) is provided with an air filter (207), and the outlet of the air pump (208) is provided with a fifth valve (209).
4. A liquid phase pulse discharge plasma processing reaction apparatus as claimed in claim 1, wherein the pulse discharge plasma processing system (3) is constructed as follows: consists of a processing chamber (308) and a high pulse power supply generator (309); the lower part of the high-pressure gas-liquid storage tank (211) is communicated with an inlet of a treatment chamber (308) through a fourth connecting pipe (14), an outlet of the treatment chamber (308) is communicated with a return port at the top of the high-pressure gas-liquid storage tank (211) through a fifth connecting pipe (15), a discharge port (311) is arranged on the fifth connecting pipe (15), and a high-pulse power supply generator (309) is connected with the treatment chamber (308) through a lead; a second material conveying pump (302) is arranged on the fourth connecting pipe (14), and a seventh valve (301) is arranged at the feed end of the second material conveying pump (302); an eighth valve (310) is arranged at the feeding end of the discharging hole (311); a sixth valve (212) is arranged at a return port at the top of the high-pressure gas-liquid storage tank (211).
5. The liquid phase pulse discharge plasma processing reaction device according to claim 4, wherein the processing chamber (308) is composed of a lower electrode plate (304), an upper discharge electrode plate (306) and a ground electrode plate (305), the lower electrode plate (304), the upper discharge electrode plate (306) and the ground electrode plate (305) are circular, the ground electrode plate (305) is arranged between the lower electrode plate (304) and the upper discharge electrode plate (306) to form an upper and a lower discharge regions, the upper feed delivery pipe (307) is arranged in the upper discharge region, the lower feed delivery pipe (303) is arranged in the lower discharge region, and the upper feed delivery pipe (307) and the lower feed delivery pipe (303) are directly contacted and compressed by the corresponding two electrode plates.
6. A liquid phase pulse discharge plasma processing reaction apparatus as claimed in claim 5, wherein the center of the ground electrode plate (305) is provided with a circular hole, and the centers of the upper feed delivery pipe (307) and the lower feed delivery pipe (303) are connected with the feed delivery pipe to pass through the circular hole; the lower material conveying pipes of the lower discharging area are arranged spirally from the edge to the center, the upper material conveying pipes of the upper discharging area are arranged spirally from the center to the edge, and the diameter of the spirally arranged upper material conveying pipes (307) and lower material conveying pipes (303) is the same as the distance among the lower electrode plate (304), the upper discharging electrode plate (306) and the grounding electrode plate (305); gaps of the spirally arranged upper feed delivery pipes are filled with insulating materials, gaps of the spirally arranged lower feed delivery pipes are filled with insulating materials, and the grounding polar plate (305) is grounded.
7. The liquid phase pulse discharge plasma processing reaction device according to claim 1, wherein a bottom end socket of the stirring tank (1) is conical, a feeding port (101) and a liquid inlet (102) are arranged at the top of the stirring tank (1), a stirring blade (104) is arranged in the stirring tank (1), the stirring blade (104) is connected with a stirring motor (103) at the top of the stirring tank (1), and a liquid outlet (105) at the bottom of the stirring tank (1) is connected with a first material conveying pump (201) through a first connecting pipe (11).
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| Application Number | Priority Date | Filing Date | Title |
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| CN201922323092.8U CN211636468U (en) | 2019-12-23 | 2019-12-23 | Liquid phase pulse discharge plasma processing reaction device |
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| CN201922323092.8U CN211636468U (en) | 2019-12-23 | 2019-12-23 | Liquid phase pulse discharge plasma processing reaction device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112058194A (en) * | 2019-12-23 | 2020-12-11 | 沈阳农业大学 | Liquid phase pulse discharge plasma processing reaction device and processing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN112058194A (en) * | 2019-12-23 | 2020-12-11 | 沈阳农业大学 | Liquid phase pulse discharge plasma processing reaction device and processing method |
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