CN211513683U - Circuit board etching film sediment treatment facility - Google Patents
Circuit board etching film sediment treatment facility Download PDFInfo
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- CN211513683U CN211513683U CN201921584366.2U CN201921584366U CN211513683U CN 211513683 U CN211513683 U CN 211513683U CN 201921584366 U CN201921584366 U CN 201921584366U CN 211513683 U CN211513683 U CN 211513683U
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- liquid medicine
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- rotating cylinder
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Abstract
The utility model discloses a circuit board etching membrane sediment treatment facility, include: a liquid medicine tank; the side wall of the rotating cylinder is a hollow net, and the diameter of the mesh of the hollow net is smaller than that of the membrane residues; the rotating motor is fixed on one side of the liquid medicine cylinder, is connected with one end of the rotating cylinder and is used for driving the rotating cylinder to rotate; the liquid medicine inlet is connected to one end of a rotary cylinder provided with a rotary motor and used for recovering liquid medicine in the rotary cylinder. In this embodiment, the liquid medicine entry will be retrieved in liquid medicine inflow rotary drum, rotary drum passes through centrifugal force in rotatory, and the fretwork net filters liquid medicine, flows into the liquid medicine jar, and the membrane sediment is kept somewhere in rotary drum to realized the filtration of liquid medicine, overcome among the prior art manual handling liquid medicine in the membrane sediment, the treatment effeciency is low, shut down influence productivity ratio.
Description
Technical Field
The utility model relates to a circuit board preparation field, specifically speaking relates to a circuit board etching membrane sediment treatment facility.
Background
When the PCB is produced, the PCB needs to be etched by liquid medicine, and wiring can be formed after etching. When etching, the liquid medicine is required to be sprayed out through the spray head, and the liquid medicine is required to be collected for recycling. It is common that the liquid medicine is stored in a liquid medicine tank, the liquid medicine is extracted from the liquid medicine tank through a liquid medicine spray head, and then the liquid medicine is returned to the liquid medicine tank.
However, after the chemical liquid is used for a long time, the recovered chemical liquid contains etched film residues, and the film residues and the chemical liquid are recovered to the liquid medicine tank together. When the liquid medicine shower nozzle is extracted from the liquid medicine jar, can lead to the shower nozzle to block up to influence etching process, the defective products easily appear. Therefore, the production line must be stopped at intervals, and the film residues of the gasket are collected and removed in the liquid medicine tank in a manual mode. And then still standing for a period of time to restart the production. The membrane slag is handled to this manual mode, and is inefficient, produces the line and shuts down productivity reduction, and again, manual mode also can't the clean up.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a circuit board etching membrane sediment treatment facility aims at solving current circuit board etching medicine water film sediment treatment effeciency low, shuts down the technical problem who influences productivity ratio.
The utility model provides a circuit board etching membrane sediment treatment facility, include:
a liquid medicine tank;
the side wall of the rotating cylinder is a hollow net, and the diameter of the mesh of the hollow net is smaller than that of the membrane residues;
the rotating motor is fixed on one side of the liquid medicine cylinder, is connected with one end of the rotating cylinder and is used for driving the rotating cylinder to rotate;
the liquid medicine inlet is connected to one end of a rotary cylinder provided with a rotary motor and used for recovering liquid medicine in the rotary cylinder.
In this embodiment, the liquid medicine entry will be retrieved in liquid medicine inflow rotary drum, rotary drum passes through centrifugal force in rotatory, and the fretwork net filters liquid medicine, flows into the liquid medicine jar, and the membrane sediment is kept somewhere in rotary drum to realized the filtration of liquid medicine, overcome among the prior art manual handling liquid medicine in the membrane sediment, the treatment effeciency is low, shut down influence productivity ratio.
Drawings
FIG. 1 is a schematic structural view of the apparatus for treating the etching film residue on the circuit board of the present invention.
Detailed Description
The invention will be further elucidated and described with reference to the following embodiments and drawings in which:
referring to fig. 1, the present invention discloses a processing apparatus for etching film residue on a circuit board, comprising: a liquid medicine tank 100; a rotary cylinder 200 horizontally disposed in the liquid medicine tank 100; a rotary motor 400 fixed to one side of the liquid medicine tank 100, and a liquid medicine inlet 300. The rotating motor 400 is connected with one end of the rotating cylinder 200 and is used for driving the rotating cylinder 200 to rotate; the liquid medicine inlet 300 is connected to one end of the rotary drum 200 provided with the rotary motor 400, for recovering the liquid medicine into the rotary drum 200.
Wherein, the lateral wall of the rotary cylinder 200 is a hollow net, and the diameter of the mesh of the hollow net is smaller than that of the membrane residues. After the recovered liquid medicine passes through the rotary cylinder 200, the liquid medicine flows into the liquid medicine tank 100 through the hollow net, and the film residue in the liquid medicine is retained in the rotary cylinder 200. When rotary drum 200 is rotatory under the drive of rotating electrical machines 400, the rotatory centrifugal force on rotary drum 200 fretwork net can accelerate the filtration of liquid medicine, can filter liquid medicine in the time of short.
In this embodiment, liquid medicine entry 300 will retrieve in liquid medicine flows into a rotatory section of thick bamboo 200, and rotatory section of thick bamboo 200 is through centrifugal force in rotatory, and the fretwork net filters liquid medicine, flows into liquid medicine jar 100, and the membrane sediment is kept somewhere in a rotatory section of thick bamboo 200 to realize the filtration of liquid medicine, overcome among the prior art manual handling liquid medicine membrane sediment, the treatment effeciency is low, shut down and influence productivity ratio.
Further, the rotary cylinder 200 is a cylinder body with one end sealed and the other end open, and one end of the seal is connected with the rotary motor 400; the diameter that a rotatory section of thick bamboo 200 sealed one end is less than the diameter of opening one end, a rotatory section of thick bamboo 200 lateral wall certainly seal one end and extend to opening one end.
In this embodiment, the membrane sediment that is in rotatory section of thick bamboo 200 still is in and glues thick state, has certain mobility, and when rotatory section of thick bamboo 200 was rotatory this moment, the centrifugal force that is located rotatory section of thick bamboo 200 both ends was of different size, and the centrifugal force that is located the one end of sealing is less than the centrifugal force that is located opening one end, and the membrane sediment that is in this moment and glues thick state can flow from sealing one end towards opening one end, until the outflow opening, has realized taking out of membrane sediment automatically, and reasonable in design practices thrift the cost and does not need manual operation.
Further, the film slag processing equipment further comprises a containing shell 500 and a drying device 600 arranged in the containing shell 500, wherein the containing shell 500 is arranged on one side of the opening of the rotary drum 200, and the drying device 600 is arranged below one side of the opening of the rotary drum 200. An outflow port 700 is reserved between the drying device 600 and the accommodating case 500, the outflow port 700 is communicated with the inside of the accommodating case 500, and the other end is communicated with the outside of the accommodating case 500.
After the membrane slag flows out, the membrane slag flows into the accommodating shell 500 to be temporarily stored, at the moment, the drying device 600 is used for drying the membrane slag in the accommodating shell 500 to enable the membrane slag to be powdery, and then the membrane slag flows out through the outflow port 700 to be collected.
It should be finally noted that the above embodiments are only intended to illustrate the technical solutions of the present invention, and not to limit the scope of the present invention, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solutions of the present invention can be modified or replaced with equivalents without departing from the spirit and scope of the technical solutions of the present invention.
Claims (5)
1. The utility model provides a circuit board etching film sediment treatment facility which characterized in that includes:
a liquid medicine tank;
the side wall of the rotating cylinder is a hollow net, and the diameter of the mesh of the hollow net is smaller than that of the membrane residues;
the rotating motor is fixed on one side of the liquid medicine cylinder, is connected with one end of the rotating cylinder and is used for driving the rotating cylinder to rotate;
the liquid medicine inlet is connected to one end of a rotary cylinder provided with a rotary motor and used for recovering liquid medicine in the rotary cylinder.
2. The apparatus for treating etching film slag on circuit board according to claim 1, wherein the rotating cylinder is a cylinder body with one end sealed and the other end open, and one end of the seal is connected with the rotating motor.
3. The apparatus of claim 2, wherein the diameter of the end of the seal of the spin basket is smaller than the diameter of the end of the opening, and the sidewall of the spin basket extends from the end of the seal to the end of the opening.
4. The apparatus for treating etching film residue on circuit board according to claim 3, further comprising a housing case, and a drying device disposed in the housing case, wherein the housing case is disposed at one side of the opening of the spin basket, and the drying device is disposed below one side of the opening of the spin basket.
5. The apparatus for treating etching film residue on circuit board according to claim 4, wherein an outflow port is reserved between the drying device and the housing, the outflow port is communicated with the inside of the housing, and the other end is communicated with the outside of the housing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921584366.2U CN211513683U (en) | 2019-09-23 | 2019-09-23 | Circuit board etching film sediment treatment facility |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921584366.2U CN211513683U (en) | 2019-09-23 | 2019-09-23 | Circuit board etching film sediment treatment facility |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211513683U true CN211513683U (en) | 2020-09-18 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921584366.2U Active CN211513683U (en) | 2019-09-23 | 2019-09-23 | Circuit board etching film sediment treatment facility |
Country Status (1)
| Country | Link |
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| CN (1) | CN211513683U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113050564A (en) * | 2021-03-12 | 2021-06-29 | 中国科学院近代物理研究所 | Nuclear track membrane etching line self-feedback linkage production control device |
-
2019
- 2019-09-23 CN CN201921584366.2U patent/CN211513683U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113050564A (en) * | 2021-03-12 | 2021-06-29 | 中国科学院近代物理研究所 | Nuclear track membrane etching line self-feedback linkage production control device |
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