CN211339684U - Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism - Google Patents
Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism Download PDFInfo
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- CN211339684U CN211339684U CN201921818733.0U CN201921818733U CN211339684U CN 211339684 U CN211339684 U CN 211339684U CN 201921818733 U CN201921818733 U CN 201921818733U CN 211339684 U CN211339684 U CN 211339684U
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- reaction
- reaction kettle
- copper powder
- guide hole
- partition
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 106
- 239000000463 material Substances 0.000 title claims abstract description 68
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 238000009700 powder processing Methods 0.000 title claims description 8
- 238000005192 partition Methods 0.000 claims abstract description 81
- 238000007789 sealing Methods 0.000 claims abstract description 7
- 238000000926 separation method Methods 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 9
- 230000002265 prevention Effects 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 230000002337 anti-port Effects 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- 238000007373 indentation Methods 0.000 claims description 2
- 238000007747 plating Methods 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- VFYPSWGDJSPEQI-UHFFFAOYSA-N [B].[P].[Ni] Chemical compound [B].[P].[Ni] VFYPSWGDJSPEQI-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
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- Manufacture And Refinement Of Metals (AREA)
Abstract
The utility model relates to a reaction device with a vacuum suction leakage-proof material separating mechanism for processing copper powder, which comprises a base, wherein a reaction kettle is fixed on the base, a charging valve is arranged at the top of the reaction kettle, a discharge valve is arranged at the bottom of the reaction kettle, a partition plate fixedly connected with the inner wall of the reaction kettle is arranged in the reaction kettle, the partition plate divides the interior of the reaction kettle into a charging cavity and a reaction cavity, one end of the reaction kettle close to the charging valve is the charging cavity, one end of the reaction kettle close to the discharge valve is the reaction cavity, a material guide hole for communicating the charging cavity and the reaction cavity is arranged at the center of the partition plate, the partition plate is provided with the leakage-proof material separating mechanism for controlling whether the material guide hole is conducted, the partition plate is arranged in the reaction kettle, the material guide hole is arranged on the partition plate, the opening and the sealing of the material guide hole are realized by matching a screw rod and, through setting up the vacuum pump, the feed time of copper powder is accelerated, further strengthens reation kettle's leak protection performance.
Description
Technical Field
The utility model relates to a copper powder processing technology field, concretely relates to copper powder processing has vacuum to inhale and prevents leaking reaction unit that separates material mechanism.
Background
The main application of the copper powder is as follows: the method is widely applied to the fields of powder metallurgy, electric carbon products, electronic materials, metal coatings, chemical catalysts, filters, radiating pipes and other electromechanical parts and electronic aviation. In recent years, with the miniaturization and integration of electronic devices, resin multilayer substrates have become popular as substrates for electronic circuits, but copper powder, which can reduce material cost and has excellent conductivity, is suitably used as a conductive material for conductive paste for wiring on the substrate. When copper powder is used as a material of the conductive paste, in order not to deteriorate the conductivity due to oxidation of copper, when copper is refined to a certain degree, it is necessary to prevent oxidation of copper powder at the same time. Therefore, a layer of nickel needs to be plated on the surface of the copper powder, and a chemical immersion plating (chemical plating for short) technology is generally adopted, and the chemical immersion plating principle is as follows: electroless plating is a method for forming a dense plating layer by reducing metal ions into metal and depositing the metal ions on the surface of various materials by using a strong reducing agent in a solution containing the metal ions according to the redox reaction principle without electrifying, and the conventional solution for electroless plating is as follows: chemical silver plating, nickel plating, copper plating, cobalt plating, nickel phosphorus plating solution, nickel phosphorus boron plating solution and the like.
The existing copper is processed in a chemical immersion plating process in a reaction kettle generally, and in the immersion plating process, due to the adoption of a chemical solvent, toxic and harmful gases can be emitted, so that when copper powder is added into the reaction kettle by a copper powder feeding worker, the harmful gases are easily leaked from a feeding valve, and the physical health of the worker is harmed.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the technical problem that to the not enough of above-mentioned prior art, provide a reaction unit with prevent leaking material separating mechanism and vacuum suction mechanism to solve the problem that harmful gas leaked.
In order to achieve the above purpose, the utility model provides a following technical scheme: the utility model provides a copper powder processing has vacuum to inhale prevents leaking separator mechanism's reaction unit, including the base, be fixed with reation kettle on the base, the reation kettle top is equipped with the charge valve, and the bottom is equipped with bleeder valve, its characterized in that: the reaction kettle is internally provided with a partition plate fixedly connected with the inner wall of the reaction kettle, the partition plate divides the interior of the reaction kettle into a feeding cavity and a reaction cavity, one end of the reaction kettle, which is close to a feeding valve, is the feeding cavity, one end of the reaction kettle, which is close to a discharging valve, is the reaction cavity, the center of the partition plate is provided with a material guide hole for communicating the feeding cavity with the reaction cavity, and the partition plate is provided with a leakage-proof material separation mechanism for controlling whether the material guide hole is communicated or not.
Adopt above-mentioned technical scheme, set up the partition panel in reation kettle, prevent that the harmful gas in the reation kettle bottom reaction chamber from leaking to on the feeding chamber, then leak away when opening from the charging valve, through seting up the guide hole at the partition panel center, make the copper powder can enter into the reaction intracavity through the guide hole, through setting up on the partition panel and preventing leaking the material separating mechanism, make reinforced workman when reinforced, can be sealed with the guide hole through preventing leaking the material separating mechanism, make the reaction chamber and feed chamber do not switch on the back, open the charging valve again reinforced, after the charging completion closes the charging valve, open the guide hole through preventing leaking the material separating mechanism, make the interior processing of copper powder entering reaction chamber of guide hole, after the copper powder gets into completely, sealed guide hole of rethread leakage-proof material separating mechanism, thereby prevent that toxic gas from revealing outside reation kettle.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: prevent leaking material mechanism at a distance from including setting up driving motor on reation kettle, driving motor's drive shaft is towards the partition panel, be equipped with the screw rod with driving motor meshing in the partition panel, the outside cover of screw rod is equipped with the screwed pipe, the one end that the screwed pipe corresponds the stock guide is equipped with the partition piece, when driving motor one direction was rotated, the screwed pipe will drive the partition piece and stretch out the partition panel until totally airtight stock guide, and during driving motor antiport, the screwed pipe will drive the partition piece and return indentation partition panel and switch on completely until the stock guide.
Adopt above-mentioned technical scheme, set up a driving motor on reation kettle, be equipped with the gear on driving motor's the drive shaft, inside at the partition panel is equipped with the screw rod, screw rod one end and driving motor meshing, another pot head is equipped with the screwed pipe, the screwed pipe is equipped with the partition piece towards the one end of guide hole, when driving motor corotation, driving motor drives the screw rod, screw rod linkage screwed pipe moves towards the guide hole direction along the partition panel, then stretch out the partition piece from the partition panel, until completely sealed with the guide hole, when driving motor reversal, driving motor drives the screw rod, screw rod linkage screwed pipe retracts towards the guide hole along the partition panel in the opposite direction, then remove the partition piece from the guide hole and after entering into the partition panel completely, make the guide hole switch on completely, realize preventing leaking the material that material mechanism separates the material effect.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: the reaction chamber is internally provided with a vacuum suction mechanism, the vacuum suction mechanism comprises a fixing frame fixedly connected with the inner wall of the reaction kettle and a vacuum pump arranged on the fixing frame, one end of the vacuum pump faces to the partition plate and is connected with the material guide hole to form a suction pipe, and the other end of the vacuum pump faces to the bottom of the reaction chamber to form an exhaust pipe.
Adopt above-mentioned technical scheme, when preventing leaking partition mechanism drive partition panel and retrieving into the partition panel, harmful gas in the reation kettle still can enter into reinforced chamber through the guide hole, through set up the vacuum pump in the reaction chamber, the suction tube of vacuum pump is connected with the guide hole, the blast pipe is towards the reaction chamber, can accelerate the time that the copper powder got into the reaction chamber from reinforced chamber, thereby make the harmful gas of reaction intracavity can't enter into reinforced chamber from the reaction chamber, can pass through the vacuum pump with the copper powder of remaining in reinforced intracavity again and get into, guarantee copper powder make full use of processing.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: the feeding cavity is internally provided with a material guide plate fixedly connected with the reaction kettle, one end of the material guide plate is connected with the inner wall of the reaction kettle, and the other end of the material guide plate is connected with the material guide hole, so that the material guide plate is obliquely arranged from the reaction kettle to the material guide hole.
By adopting the technical scheme, the material guide plate is arranged at one end of the reaction kettle corresponding to the feeding valve, the material guide plate is of a leak type structure, one end with a large caliber faces the feeding valve, and one end with a small caliber is connected with the material guide hole, so that copper powder added into the feeding valve can be accurately gathered above the material guide hole through the material guide plate.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: the edge of the material guide hole is provided with a hairbrush, and the lower end of the hairbrush is in contact with one end, facing the feeding cavity, of the partition piece.
Adopt above-mentioned technical scheme, set up the round brush at the edge of guide hole, the lower extreme of brush contacts with the partition piece towards the one end in feeding chamber, makes the partition piece make retracting to advance the partition panel, and the brush can block the copper powder on the partition piece, prevents that the copper powder from entering into in the partition panel.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: and the peripheral surface of the partition piece is provided with a sealing ring.
By adopting the technical scheme, the sealing ring made of the soft rubber material is arranged on the peripheral surface of the partition piece, so that the sealing performance of the partition piece is further ensured.
The reaction device with the vacuum suction leakage-prevention material separation mechanism for processing copper powder can be further arranged as follows: the outer wall of the reaction kettle is provided with a detection ladder, and the detection ladder is arranged on one side, close to the feeding valve, of the reaction kettle.
By adopting the technical scheme, the outer arm of the reaction kettle is provided with the detection ladder for feeding and detection, so that the operation of workers is facilitated.
The utility model has the advantages that: through setting up the partition panel in reation kettle, set up the guide hole on the partition panel, realize opening and sealing of guide hole through motor cooperation screw rod, screwed pipe, make the harmful gas in the reation kettle can not reveal when reinforced, through setting up the vacuum pump, accelerate the feeding time of copper powder, further strengthen reation kettle's preventing leakage performance.
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Drawings
Fig. 1 is a schematic perspective view of an embodiment of the present invention.
Fig. 2 is a schematic diagram of an internal structure of an embodiment of the present invention.
Fig. 3 is a schematic view of the leakage-proof material-separating mechanism according to the embodiment of the present invention when it is extended out.
FIG. 4 is a schematic view of the anti-leakage material-separating mechanism according to the embodiment of the present invention when retracting
Detailed Description
As shown in fig. 1-4, a reaction apparatus with a vacuum suction leakage prevention partition mechanism for copper powder processing comprises a base 1, a reaction kettle 2 is fixed on the base 1, a feed valve 21 is arranged at the top of the reaction kettle 2, a discharge valve 22 is arranged at the bottom of the reaction kettle 2, a partition plate 3 fixedly connected with the inner wall of the reaction kettle 2 is arranged in the reaction kettle 2, the partition plate 3 partitions the interior of the reaction kettle 2 into a feed cavity 23 and a reaction cavity 24, the feed cavity 23 is arranged at one end of the reaction kettle 2 close to the feed valve 21, the reaction cavity 24 is arranged at one end close to the discharge valve 22, a material guide hole 31 communicating the feed cavity 23 with the reaction cavity 24 is arranged at the center of the partition plate 3, a leakage prevention partition mechanism for controlling whether the material guide hole 31 is communicated is arranged on the reaction kettle is arranged on the partition plate 3, the leakage prevention partition mechanism comprises a drive motor 41 arranged on the reaction kettle, the drive shaft of the drive motor 41 faces the partition plate, a screw 43 is sleeved outside the screw 42, a partition plate 44 is arranged at one end of the screw 43 corresponding to the material guiding hole 31, when the driving motor 41 rotates in one direction, the screw 43 drives the partition plate 44 to extend out of the partition plate 3 until the material guiding hole 31 is completely sealed, when the driving motor 41 rotates in the reverse direction, the screw 43 drives the partition plate 44 to retract into the partition plate 3 until the material guiding hole 31 is completely communicated, a vacuum suction mechanism is arranged in the reaction chamber 24 and comprises a fixing frame 51 fixedly connected with the inner wall of the reaction kettle 2 and a vacuum pump 52 arranged on the fixing frame 51, one end of the vacuum pump 52 faces the partition plate 3 and is connected with the material guiding hole 31 to form a suction pipe 521, the other end of the vacuum pump faces the bottom of the reaction chamber 24 to form an exhaust pipe 522, a material guiding plate 25 fixedly connected with the reaction kettle 2 is arranged in the feeding chamber 23, one end of the material guiding plate 25, make stock guide 25 by reation kettle 2 to the slope of feed hole 31 setting, feed hole 31 edge is equipped with brush 311, and the lower extreme of brush 311 contacts towards the one end of adding material chamber 23 with partition piece 44, and the outer peripheral face of partition piece 44 is equipped with the sealing washer, and reation kettle 2 outer wall is equipped with detects ladder 26, detects ladder 26 and sets up the one side that is close to charge valve 21 at reation kettle 2.
The reaction device of the utility model is in the process of feeding and reaction, the partition plate 44 completely seals the guide hole 31, in the process of actual use, a feeding worker pours copper powder into the feeding cavity 23 of the reaction kettle 2 from the feeding valve 21 through the detection ladder 26, the copper powder is gathered above the guide hole 31 through the guide plate 25 in the feeding cavity 23, at the moment, the guide hole 31 is completely shielded by the partition plate 44, harmful gas in the reaction cavity 24 can not enter the feeding cavity 23 from the guide hole 31, after the feeding worker finishes feeding, the feeding valve 21 is closed, the vacuum pump 52 is controlled to start to vacuumize outside, the driving motor 41 is controlled to reverse, the driving motor 41 drives the screw rod 42 to rotate, the screw rod 42 drives the external screw pipe 43 to retract, the partition plate 44 is recycled into the partition plate 3, the brush 311 also separates the copper powder on the partition plate 44 from the partition plate 44, the vacuum pump 52 sucks the copper powder through the suction pipe 521 and discharges the copper powder from the exhaust pipe 522, the entering time of copper powder with higher speed, inhale reaction chamber 24 in the lump with remaining copper powder simultaneously, because vacuum pump 52 has one from the suction that adds feed chamber 23 and transmit reaction chamber 24, when guide hole 31 is opened, harmful gas in the reaction chamber 24 also can not enter into in the feed chamber 23 through vacuum pump 52, after copper powder gets into reaction chamber 24 completely, driving motor 41 corotation drives the sealed guide hole 31 of partition piece 44, vacuum pump 52 stop work, chemical solution injects into reaction chamber 24 in through solution injection mouth 27 on reation kettle 2, the reaction is accomplished the back, harmful gas absorbs out through solution injection mouth 27, the ejection of compact of copper powder through bleeder valve 22 after the processing, accomplish copper powder processing technology.
Claims (8)
1. The utility model provides a copper powder processing has vacuum to inhale prevents leaking separator mechanism's reaction unit, including the base, be fixed with reation kettle on the base, the reation kettle top is equipped with the charge valve, and the bottom is equipped with bleeder valve, its characterized in that: the reaction kettle is internally provided with a partition plate fixedly connected with the inner wall of the reaction kettle, the partition plate divides the interior of the reaction kettle into a feeding cavity and a reaction cavity, one end of the reaction kettle, which is close to a feeding valve, is the feeding cavity, one end of the reaction kettle, which is close to a discharging valve, is the reaction cavity, the center of the partition plate is provided with a material guide hole for communicating the feeding cavity with the reaction cavity, and the partition plate is provided with a leakage-proof material separation mechanism for controlling whether the material guide hole is communicated or not.
2. The reaction device with the vacuum suction leakage prevention material separation mechanism for processing the copper powder as claimed in claim 1, wherein: prevent leaking material mechanism at a distance from including setting up driving motor on reation kettle, driving motor's drive shaft is towards the partition panel, be equipped with the screw rod with driving motor meshing in the partition panel, the outside cover of screw rod is equipped with the screwed pipe, the one end that the screwed pipe corresponds the stock guide is equipped with the partition piece, when driving motor one direction was rotated, the screwed pipe will drive the partition piece and stretch out the partition panel until totally airtight stock guide, and during driving motor antiport, the screwed pipe will drive the partition piece and return indentation partition panel and switch on completely until the stock guide.
3. The reaction device with the vacuum suction leakage-proof material-separating mechanism for processing the copper powder as claimed in claim 1 or 2, wherein: the reaction chamber is internally provided with a vacuum suction mechanism, the vacuum suction mechanism comprises a fixing frame fixedly connected with the inner wall of the reaction kettle and a vacuum pump arranged on the fixing frame, one end of the vacuum pump faces to the partition plate and is connected with the material guide hole to form a suction pipe, and the other end of the vacuum pump faces to the bottom of the reaction chamber to form an exhaust pipe.
4. The reaction device with the vacuum suction leakage-proof material-separating mechanism for processing the copper powder as claimed in claim 1 or 2, wherein: the feeding cavity is internally provided with a material guide plate fixedly connected with the reaction kettle, one end of the material guide plate is connected with the inner wall of the reaction kettle, and the other end of the material guide plate is connected with the material guide hole, so that the material guide plate is obliquely arranged from the reaction kettle to the material guide hole.
5. The reaction device with the vacuum suction leakage-proof material-separating mechanism for processing the copper powder as claimed in claim 1 or 2, wherein: the edge of the material guide hole is provided with a hairbrush, and the lower end of the hairbrush is in contact with one end, facing the feeding cavity, of the partition piece.
6. The reaction device with the vacuum suction leakage prevention material separation mechanism for processing the copper powder as claimed in claim 2, wherein: and the peripheral surface of the partition piece is provided with a sealing ring.
7. The reaction device with the vacuum suction leakage-proof material-separating mechanism for processing the copper powder as claimed in claim 1 or 2, wherein: the outer wall of the reaction kettle is provided with a detection ladder, and the detection ladder is arranged on one side, close to the feeding valve, of the reaction kettle.
8. The reaction device with the vacuum suction leakage prevention material separation mechanism for processing the copper powder as claimed in claim 3, wherein: the outer wall of the reaction kettle is provided with a detection ladder, and the detection ladder is arranged on one side, close to the feeding valve, of the reaction kettle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921818733.0U CN211339684U (en) | 2019-10-26 | 2019-10-26 | Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921818733.0U CN211339684U (en) | 2019-10-26 | 2019-10-26 | Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism |
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| CN211339684U true CN211339684U (en) | 2020-08-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201921818733.0U Active CN211339684U (en) | 2019-10-26 | 2019-10-26 | Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism |
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| CN (1) | CN211339684U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110699675A (en) * | 2019-10-26 | 2020-01-17 | 韩亚半导体材料(贵溪)有限公司 | Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism |
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2019
- 2019-10-26 CN CN201921818733.0U patent/CN211339684U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110699675A (en) * | 2019-10-26 | 2020-01-17 | 韩亚半导体材料(贵溪)有限公司 | Copper powder processing has vacuum to inhale and prevents leaking reaction unit who separates material mechanism |
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Assignee: Jiangxi Jiangnan New Material Technology Co.,Ltd. Assignor: Hanya semiconductor materials (Guixi) Co.,Ltd. Contract record no.: X2024980002331 Denomination of utility model: A reaction device for copper powder processing with a vacuum suction leak proof and isolation mechanism Granted publication date: 20200825 License type: Common License Record date: 20240228 |