CN211297111U - Water treatment low temperature plasma equipment - Google Patents

Abstract

The utility model relates to a water clarification plant technical field specifically discloses a simple structure's water treatment low temperature plasma equipment, it includes two at least low temperature plasma purification units, low temperature plasma purification unit includes the casing, power supply unit and two low temperature plasma tuber pipes, the income wind gap has been seted up to a terminal surface of casing, the air outlet has been seted up to another terminal surface of casing, power supply unit and low temperature plasma tuber pipe are acceptd respectively in the casing, power supply unit and two low temperature plasma tuber pipe electric connection, the low temperature plasma tuber pipe includes the bobbin and sets up the low temperature plasma reactor in the bobbin, the bobbin of two low temperature plasma tuber pipes is worn to establish the wind gap respectively with the bobbin one end and is used for and outside air pump intercommunication, the bobbin other end of two low temperature plasma tuber pipes is worn to go out the wind gap respectively and is used for and treats to purify. The low-temperature plasma reactor comprises a dielectric barrier, a first high-voltage pole, a first low-voltage pole, a high-voltage terminal, a low-voltage terminal and a mounting shell.

Description

Water treatment low temperature plasma equipment

Technical Field

The utility model relates to a water clarification plant technical field especially relates to a water treatment low temperature plasma equipment.

Background

In the water body purification operation, the ionic gas is conveyed into the water body, and the particle impurities, bacteria and viruses in the water body are removed by utilizing the sedimentation effect of the ionic gas on the impurities in the water body and the inactivation effect of the ionic gas discharge on the bacteria and viruses, so that the purpose of improving the water body quality is achieved. The water body is purified by the ionic gas, so that secondary pollution caused by chemicals in water body purification is avoided, and the safety and reliability of water body purification operation are improved.

However, the conventional water body purification ion generating equipment has a complex structure, and the large number of parts not only increases the assembly difficulty of the ion generating equipment, but also increases the production cost of the ion generating equipment, and is not beneficial to improving the market competitiveness of products; furthermore, the conventional ion generating device has a thin ion plate, which is easily broken down under high voltage, and the service life of the ion plate and thus the ion generating device is short.

SUMMERY OF THE UTILITY MODEL

In view of the above, it is necessary to provide a low temperature plasma device for water treatment, which has a complicated structure and a short service life.

A water treatment low-temperature plasma device comprises at least two low-temperature plasma purification units, wherein each low-temperature plasma purification unit is independently arranged and connected, each low-temperature plasma purification unit comprises a shell, a power supply device and two low-temperature plasma air pipes, the shell is provided with a containing space, one end surface of the shell is provided with an air inlet, the other end surface of the shell is provided with an air outlet, the air inlet and the air outlet are respectively communicated with the containing space, the power supply device and the two low-temperature plasma air pipes are respectively contained in the containing space, the input end of the power supply device is used for being electrically connected with an external power supply, the output end of the power supply device is respectively electrically connected with the two low-temperature plasma air pipes, each low-temperature plasma air pipe comprises a low-temperature plasma reactor and a pipe barrel, the low-temperature plasma reactor is arranged in the inner cavity of the pipe barrel, one end of the pipe barrel of the low-temperature plasma air pipe penetrates through the air inlet and is used for being communicated with an external air pump, the other end of the pipe barrel of the low-temperature plasma air pipe penetrates through the air outlet and is used for being communicated with a water body to be purified, one end of the pipe barrel of the other low-temperature plasma air pipe penetrates through the air inlet and is used for being communicated with the external air pump, the other end of the pipe barrel of the other low-temperature plasma air pipe penetrates through the air outlet and is used for being communicated with the water body to be purified, and the pipe barrels of the two low-temperature plasma air pipes are arranged. The low-temperature plasma reactor comprises a medium blocking piece, a first high-voltage pole, a first low-voltage pole, a high-voltage terminal, a low-voltage terminal and an installation shell, wherein the medium blocking piece is provided with a clamping groove, the first high-voltage pole is contained in the clamping groove, the first low-voltage pole surrounds the medium blocking piece, the high-voltage terminal is connected with the first high-voltage pole, the low-voltage terminal is connected with the first low-voltage pole, the high-voltage terminal and the low-voltage terminal are respectively arranged on the same side of the medium blocking piece and are respectively connected with the installation shell, the high-voltage terminal and the low-voltage terminal are respectively electrically connected with a power supply device, and the installation shell is connected with the medium blocking piece.

In one embodiment, the mounting housing is provided with a support leg, the pipe barrel is provided with a limiting hole, and the support leg penetrates through the limiting hole and abuts against the inner surface of the limiting hole.

In one embodiment, the water treatment low-temperature plasma equipment further comprises an air inlet connector and an air outlet connector, wherein an input end of the air inlet connector is used for being communicated with the external air pump, an output end of the air inlet connector penetrates through the air inlet and is communicated with an input end of the pipe barrel, an input end of the air outlet connector penetrates through the air outlet and is communicated with an output end of the pipe barrel, and an output end of the air outlet connector is used for being communicated with the water body to be purified.

In one embodiment, the air inlet joint and the air outlet joint are respectively connected with the pipe barrel in a sealing manner.

In one embodiment, the water treatment low-temperature plasma equipment further comprises a power indicator lamp, wherein the power indicator lamp is installed on the shell and is connected with the power supply device in series.

In one embodiment, the housing includes a shell and a cover plate, and the cover plate is disposed at an opening of the shell and detachably connected to the shell.

In one embodiment, the cover plate of the low-temperature plasma purification unit is screwed with the cover plate of the adjacent low-temperature plasma purification unit.

In one embodiment, handles are respectively arranged on the top of the shell of the low-temperature plasma purification unit at two ends of the water treatment low-temperature plasma equipment.

In one embodiment, a plurality of rubber feet are arranged at the bottom of the shell of the low-temperature plasma purification unit.

In one embodiment, the water treatment low-temperature plasma equipment further comprises connecting plates, and the connecting plates are respectively connected with the low-temperature plasma purification units.

The water treatment low-temperature plasma equipment has a simple structure, the use amount of parts is less, the assembly difficulty and the production cost of the ion equipment are reduced, and the market competitiveness of the ion equipment product is improved; the first high-voltage electrode is accommodated in the clamping groove of the medium blocking piece, so that the first low-voltage electrode is surrounded on the outer side of the medium blocking piece, the thickness of the medium blocking piece can be properly increased, the thickness of the insulating layer is changed, the medium blocking piece is prevented from being broken down, and the service life of the low-temperature plasma reactor and even the service life of plasma equipment are prolonged.

Drawings

FIG. 1 is a schematic structural diagram of a water treatment low-temperature plasma apparatus according to an embodiment;

FIG. 2 is a schematic diagram of a low temperature plasma purification unit according to an embodiment;

FIG. 3 is a schematic cross-sectional view of the low temperature plasma purification unit in the embodiment of FIG. 2;

FIG. 4 is a schematic diagram of an exploded structure of a low temperature plasma purification unit in one embodiment;

FIG. 5 is a schematic view of the structure of a low-temperature plasma reactor in another embodiment;

FIG. 6 is an exploded view of a low temperature plasma reactor according to another embodiment;

FIG. 7 is a schematic diagram of the structure of the low temperature plasma duct in one embodiment;

FIG. 8 is a schematic structural diagram of another view of the low temperature plasma duct of the embodiment of FIG. 7;

FIG. 9 is a schematic view showing the structure of a low-temperature plasma reactor in still another embodiment;

fig. 10 is an exploded view of a low temperature plasma reactor in yet another embodiment.

Detailed Description

In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, as those skilled in the art will be able to make similar modifications without departing from the spirit and scope of the present invention.

Referring to fig. 1 to 8, the present invention provides a water treatment low temperature plasma device 10, the water treatment low temperature plasma device 10 includes at least two low temperature plasma purification units 100, each low temperature plasma purification unit 100 is independently disposed and connected, the low temperature plasma purification unit 100 includes a housing 200, a power supply device 300 and two low temperature plasma wind pipes 400, the housing 200 has a receiving space 210, an air inlet 220 is disposed on one end surface of the housing 200, an air outlet 230 is disposed on the other end surface of the housing 200, the air inlet 220 and the air outlet 230 are respectively communicated with the receiving space 210, the power supply device 300 and the two low temperature plasma wind pipes 400 are respectively received in the receiving space 210, an input end of the power supply device 300 is used for electrically connecting with an external power supply, an output end of the power supply device 300 is respectively electrically connected with the two low temperature plasma wind pipes 400, the low temperature plasma wind pipes 400 includes a low temperature plasma reactor 410 and a pipe barrel 420, the low-temperature plasma reactor 410 is installed in the inner cavity of the tube 420, one end of the tube 420 of one low-temperature plasma air duct 400 penetrates through the air inlet 220 and is used for being communicated with an external air pump, the other end of the tube 420 of one low-temperature plasma air duct 400 penetrates through the air outlet 230 and is used for being communicated with a water body to be purified, one end of the tube 420 of the other low-temperature plasma air duct 400 penetrates through the air inlet 220 and is used for being communicated with the external air pump, the other end of the tube 420 of the other low-temperature plasma air duct 400 penetrates through the air outlet 230 and is used for being communicated with the water body to be purified, and the tube 420 of the. The low-temperature plasma reactor 410 includes a dielectric barrier 411, a first high voltage pole 412, a first low voltage pole 413, a high voltage terminal 414, a low voltage terminal 415, and an installation housing 416, wherein the dielectric barrier 411 is provided with a slot 417, the first high voltage pole 412 is accommodated in the slot 417, the first low voltage pole 413 surrounds the dielectric barrier 411, the high voltage terminal 414 is connected with the first high voltage pole 412, the low voltage terminal 415 is connected with the first low voltage pole 413, the high voltage terminal 414 and the low voltage terminal 415 are respectively disposed on the same side of the dielectric barrier 411 and are respectively connected with the installation housing 416, the high voltage terminal 414 and the low voltage terminal 415 are respectively electrically connected with the power supply device 300, and the installation housing 416 is connected with the dielectric barrier 411.

The water treatment low-temperature plasma equipment 10 is simple in structure, the using amount of parts is small, the assembly difficulty and the production cost of the ion equipment are reduced, and the market competitiveness of ion equipment products is improved; by accommodating the first high voltage electrode 412 in the slot 417 of the dielectric barrier 411 and surrounding the first low voltage electrode 413 outside the dielectric barrier 411, the thickness of the dielectric barrier 411 can be increased appropriately to change the thickness of the insulating layer, so as to prevent the dielectric barrier 411 from being broken down, thereby prolonging the service life of the low temperature plasma reactor 410 and thus the plasma equipment.

The working principle of the water treatment low-temperature plasma equipment is as follows: after the power supply device 300 is connected to an external power source, the power supply device 300 is respectively connected to the high voltage terminal 414 and the low voltage terminal 415 of the low temperature plasma reactor 410, so that the low temperature plasma reactor 410 receives current. Under the condition, the first high voltage pole 412 of the low temperature plasma reactor 410 excites electrons under the action of current, the electrons enter the reaction gas between the first high voltage pole 412 and the first low voltage pole 413 through the pores of the dielectric barrier 411, migrate in the reaction gas and further move towards the first low voltage pole 413, so that an electric field is formed, and when the voltage of the electric field reaches the discharge voltage of the reaction gas, the reaction gas is broken down to generate the mixed gas consisting of high energy electrons, ions, atoms and free radicals. Because the input end of the pipe 420 is communicated with the external air pump, the external air pump continuously blows air into the pipe 420, the air forms airflow in the pipe 420 and entrains the high-energy electron, ion, atom and free radical mixed gas generated by the low-temperature plasma reactor 410, and the mixed gas is sent into the external water body to be purified. It should be noted that, in the actual use process, the output end of the pipe 420 is required to be extended below the liquid level of the water body to be purified, so when the mixed gas enters the water body, micro bubbles are generated due to the hydraulic action, the interior of the micro bubbles contains a large amount of high-energy electrons and free radicals, the bubbles rise and break continuously under the action of buoyancy and air pressure in the water body, and the high-energy electrons and free radicals react with pollutants in the water body in the process, so that pollutant molecules are decomposed in a very short time, and the purpose of degrading the pollutants is achieved.

The low-temperature plasma purification unit 100 is a basic unit of a water treatment low-temperature plasma device, and is used for generating high-energy electrons and free radicals under an electrified condition so as to be beneficial to purifying a water body. It should be noted that, the utility model discloses a water treatment low temperature plasma equipment contains two at least low temperature plasma purification unit 100 mutual independence settings, but the autonomous working, that is to say, only single low temperature plasma purification unit 100 can realize producing high energy electron and free radical equally, purifies the purpose to the water. The utility model discloses an increase low temperature plasma purification unit 100 and promote the production of high energy electron and free radical in the unit interval, and then improve plasma equipment to the purifying effect of water, certainly, under the better condition of quality of water of treating the water purification, water treatment low temperature plasma equipment only contains a low temperature plasma purification unit 100 also the utility model discloses an within the protection scope, no longer describe herein. In one embodiment, the low temperature plasma purification units 100 of the water treatment low temperature plasma apparatus are arranged side by side, and the housings 200 of the low temperature plasma purification units 100 are connected in sequence. Of course, in actual production, each low-temperature plasma purification unit 100 may be stacked, and the arrangement of each low-temperature plasma purification unit 100 may be adjusted according to production habits, which is not described herein again. It should be further noted that, in the actual use process, a user may select all or part of the low-temperature plasma purification units 100 to be respectively communicated with the external air pump and the water body to be purified according to the quality condition of the water body, in other words, each low-temperature plasma purification unit 100 of the water treatment low-temperature plasma device may work cooperatively or partially, so that the power consumption of the plasma device may be reduced while the water body purification efficiency is ensured.

In one embodiment, the water treatment low temperature plasma apparatus further includes connection plates 500, and the connection plates 500 are respectively connected to the low temperature plasma purification units 100. Through setting up connecting plate 500, under the prerequisite that adjacent low temperature plasma purification unit 100 is connected, realized the secondary connection of each low temperature plasma purification unit 100, improved the stability that each low temperature plasma purification unit 100 connects, and then improved the stability of water treatment low temperature plasma equipment structure.

The housing 200 is used for accommodating the power supply device 300 and the low-temperature plasma duct 400, and the power supply device 300 and the low-temperature plasma duct 400 are fixedly arranged, so that the power supply device 300 and the low-temperature plasma duct 400 are integrated into a whole, the overall volume of the plasma equipment is reduced, and the power supply device 300 and the low-temperature plasma duct 400 are protected. In one embodiment, the housing 200 includes a casing 240 and a cover plate 250, wherein the cover plate 250 covers an opening of the casing 240 and is detachably connected to the casing 240. Preferably, the cover plate 250 is bolted to the housing 240. By detachably connecting the cover plate 250 to the housing 240, when the low-temperature plasma purification unit 100 fails, the cover plate 250 can be opened to overhaul components in the housing 240, thereby reducing the difficulty in overhauling the plasma equipment. In one embodiment, the cover plate 250 of the low temperature plasma purification unit 100 is screwed with the cover plate 250 of the adjacent low temperature plasma purification unit 100. Through the apron 250 that makes low temperature plasma purification unit 100 and the apron 250 screw connection of adjacent low temperature plasma purification unit 100, improved the fastness that adjacent low temperature plasma purification unit 100 connects, and then promoted the stability of plasma equipment structure.

In one embodiment, handles 600 are respectively disposed on the top of the housings 240 of the low temperature plasma purification unit 100 at both ends of the water treatment low temperature plasma apparatus. By arranging the handle 600 at the top of the housing 240 of the low-temperature plasma purification unit 100, when the plasma equipment is carried, the plasma equipment can be carried only by pulling up the handle 600 and lifting the plasma equipment by the handle 600, so that the carrying difficulty of the plasma equipment is reduced. In one embodiment, the bottom of the housing 240 of the low temperature plasma purification unit 100 is provided with a plurality of rubber feet 241. Set up a plurality of rubber feet 241 through the bottom at low temperature plasma purification unit 100's shell 240, when plasma equipment placed on ground or workstation, increased the distance between plasma equipment's bottom and ground or the workstation mesa, so, the surface of avoiding water stain and the oil stain on face or the workstation to spill over plasma equipment has reduced because of the work load that frequently washs plasma equipment surface production, has reduced plasma equipment's the maintenance degree of difficulty. In addition, through setting up rubber foot 241, avoided removing the plasma equipment in-process, because of the wearing and tearing that ground or workstation and plasma equipment's bottom direct contact caused, be favorable to prolonging plasma equipment's life.

The power supply device 300 is used for accessing an external power supply and converting the current and voltage of the external power supply into a current value and a voltage value which are adaptive to the low-temperature plasma reactor 410, so as to ensure the effective use of the low-temperature plasma reactor 410, in other words, the power supply device 300 is actually a power supply conversion device which reduces the voltage value input from the outside to a voltage value which can be used for the normal operation of the low-temperature plasma reactor 410 through the voltage reduction effect on the external power supply, so as to ensure the safety of the use of the equipment. In one embodiment, the water treatment low temperature plasma apparatus further includes a power indicator lamp 700, and the power indicator lamp 700 is installed in the housing 200 and connected in series with the power supply device 300. Through set up power indicator 700 on casing 200, when low temperature plasma purification unit 100 was in the on state, power indicator 700 lighted, when low temperature plasma purification unit 100 and external power source disconnection, power indicator 700 extinguishes, so, the user can judge the operating condition of equipment according to the light and shade condition of power indicator 700 to do benefit to in time discovering plasma equipment trouble, be convenient for overhaul the maintenance to equipment.

The low-temperature plasma air duct 400 is used for receiving current from the power supply device 300 and exciting high-energy electrons and free radicals under the action of the current so as to be beneficial to purifying water. It should be noted that, the utility model discloses a set up two independent low temperature plasma tuber pipes 400 in casing 200, but low temperature plasma reactor 410 independent work in two low temperature plasma tuber pipes 400 produces high energy electron and free radical, avoided because of setting up two low temperature plasma reactor 410 in same bobbin 420, a large amount of high energy electrons and free radical fiercely collide and discharge and annihilate in bobbin 420, the high energy electron that lets in the water that causes and free radical quantity reduction problem, when guaranteeing low temperature plasma purification unit 100 reliability, the purifying effect of plasma equipment to the water has been improved.

The low temperature plasma reactor 410 is used to generate high energy electrons and free radicals under power-on condition, so as to purify the water body. The dielectric barrier 411 is used to separate the reactant gas from the first high voltage electrode 412 and the first low voltage electrode 413, so as to prevent the reactant gas from corroding the first high voltage electrode 412 and the first low voltage electrode 413, thereby prolonging the service life of the first high voltage electrode 412 and the first low voltage electrode 413, and ensuring effective use of the reactor. In one embodiment, dielectric barrier 411 is made of ceramic. The dielectric barrier 411 made of ceramic has many pores, so that after the reactor is connected with current, electrons excited by the first high voltage electrode 412 can smoothly penetrate through the pores of the dielectric barrier 411 and move to the first low voltage electrode 413 through the reaction gas, thereby forming an electric field. It should be noted that, in practical production practice, the dielectric barrier 411 may be made of glass or epoxy resin according to production conditions, and details are not described herein.

The first high voltage pole 412 is used to excite high energy electrons in case of switching on current, and the high energy electrons move to the first low voltage pole 413 through the reaction air between the first high voltage pole 412 and the first low voltage pole 413, thereby forming an electric field. Specifically, as the voltage of the external power supply gradually increases, the voltage of the electric field between the first high voltage pole 412 and the first low voltage pole 413 gradually increases, that is, the current flowing through the reaction air gradually increases, and when the voltage between the first high voltage pole 412 and the first low voltage pole 413 reaches the breakdown voltage of the reaction gas, the electric field can provide larger energy for the molecules of the reaction gas to break down and generate radicals and excimer molecules, thereby achieving the ionization of the air.

It should be noted that, in the present invention, the first high voltage pole 412 is accommodated in the clamping groove 417 and the first low voltage pole 413 surrounds the medium blocking member 411, that is, the connection between the first high voltage pole 412 and the first low voltage pole 413 and the medium blocking member 411 is realized, and the connection between the first high voltage pole 412 and the first low voltage pole 413 and the medium blocking member 411 is stable and not easy to be broken, so as to improve the stability of the reactor structure. In addition, the high-voltage terminal 414 and the low-voltage terminal 415 are adopted to replace leads, and in the process of disassembling the low-temperature plasma reactor 410, the connection between the low-temperature plasma reactor 410 and the power supply device 300 can be disconnected only by respectively pulling out the high-voltage terminal 414 and the low-voltage terminal 415 from the power supply device 300.

The high voltage terminal 414 is used for connecting the first high voltage pole 412 with an external power supply, the low voltage terminal 415 is used for connecting the first low voltage pole 413 with the external power supply, and the connection between the first high voltage pole 412 and the external power supply and the connection between the first low voltage pole 413 and the external power supply can be realized by arranging the high voltage terminal 414 and the low voltage terminal 415. That is, the high voltage terminal 414 and the low voltage terminal 415 actually function as the conducting wires in the circuit, and all of them are used to provide a current path for the circuit, so that the first high voltage pole 412 and the first low voltage pole 413 are powered on, thereby generating an electric field.

The mounting housing 416 is used for protecting the high voltage terminal 414 and the low voltage terminal 415, and pressing the connection between the high voltage terminal 414 and the first high voltage pole 412 and the connection between the low voltage terminal 415 and the first low voltage pole 413, so as to further improve the stability of the connection between the high voltage terminal 414 and the first high voltage pole 412 and the connection between the low voltage terminal 415 and the first low voltage pole 413.

The pipe barrel 420 is used for installing the low-temperature plasma reactor 410 and providing a passage for the flow of high-energy electrons and free radicals generated by the low-temperature plasma reactor 410, so that the high-energy electrons and free radicals are prevented from irregularly escaping in the accommodating space 210 of the shell 200, in other words, the generation and the flow of the high-energy electrons and free radicals are limited in a small space through the pipe barrel 420, so that the air flow blown by an external air pump has large impact force on the high-energy electrons and free radicals, thus the air flow wrapped with the high-energy electrons and free radicals has large impact on the water body after entering the water body, the air flow is easier to form a large amount of micro bubbles, the contact area between the high-energy electrons and free radicals and harmful substances in the water body is increased, and the purification effect of the plasma equipment on the water body is improved.

Referring to fig. 7 and 8, in an embodiment, the mounting housing 416 has a supporting leg 418, the tube 420 has a limiting hole 421, and the supporting leg 418 passes through the limiting hole 421 and abuts against an inner surface of the limiting hole 421. The support legs 418 are arranged on the mounting shell 416, the limiting holes 421 are formed in the pipe barrel 420, and the support legs 418 are only required to penetrate through the limiting holes 421 and abut against the inner surfaces of the limiting holes 421, so that the low-temperature plasma reactor 410 and the pipe barrel 420 can be connected. Thus, when the airflow blown by the external air pump impacts the low-temperature plasma reactor 410, the support legs 418 on the mounting shell 416 are always abutted against the inner surface of the limiting hole 421, and the connection between the low-temperature plasma reactor 410 and the pipe barrel 420 is not easy to loosen, so that the effective use of the plasma equipment is ensured.

Referring to fig. 9 and 10, in another embodiment, the low temperature plasma reactor 410 includes a second high voltage electrode 431, a first dielectric barrier sheet 432, a second low voltage electrode 433, a second dielectric barrier sheet 434 and a third low voltage electrode 435, the second high voltage electrode 431 is electrically connected to the power supply device, the first dielectric barrier sheet 432 is connected to one surface of the second high voltage electrode 431 in a sintered manner, one surface of the first dielectric barrier sheet 432 facing away from the second high voltage electrode 431 is connected to the second low voltage electrode 433 in a sintered manner, the second low voltage electrode 433 is electrically connected to the power supply device, the second dielectric barrier sheet 434 is connected to the other surface of the second high voltage electrode 431 in a sintered manner, one surface of the second dielectric barrier sheet 434 facing away from the second high voltage electrode 431 is connected to the third low voltage electrode 435 in a sintered manner, and the third low voltage electrode 435 is electrically connected to the power supply device.

In the low-temperature plasma reactor 410 of the embodiment, the second high-voltage electrode 431, the first dielectric barrier sheet 432 and the second low-voltage electrode 433 are respectively connected in a sintering manner in sequence, and the second high-voltage electrode 431, the second dielectric barrier sheet 434 and the third low-voltage electrode 435 are connected in a sintering manner in sequence, so that the problem of glue failure caused by glue is avoided, the structural stability of the low-temperature plasma reactor 410 is improved, and the service life of the low-temperature plasma reactor 410 is prolonged; the low-temperature plasma reactor 410 is composed of only five components, namely a second high-voltage electrode 431, a first medium blocking sheet 432, a second low-voltage electrode 433, a second medium blocking sheet 434 and a third low-voltage electrode 435, and the like, has a simple structure, avoids a complex assembly mode, and further improves the production efficiency of the low-temperature plasma reactor 410.

In one embodiment, the first dielectric barrier sheet 432 is a ceramic sheet, and the second low voltage electrode 433 and the second high voltage electrode 431 are respectively connected to the first dielectric barrier sheet 432 by printing and sintering. Specifically, the metal paste material is printed on the ceramic sheet, and the ceramic sheet and the metal are co-sintered under the protection of hydrogen at a temperature of centigrade after hot-pressing lamination, so that the printing sintering of the second low-voltage electrode 433 on the first dielectric barrier sheet 432 or the printing sintering of the second high-voltage electrode 431 on the first dielectric barrier sheet 432 is realized. After printing and sintering, ohmic contact is formed between the second low-voltage electrode 433 and the first dielectric barrier sheet 432 and between the second high-voltage electrode 431 and the first dielectric barrier sheet 432, so that the insulation strength of the low-temperature plasma reactor 410 is improved, and the connection firmness between the second low-voltage electrode 433 and the first dielectric barrier sheet 432 and the connection firmness between the second high-voltage electrode 431 and the first dielectric barrier sheet 432 are improved.

It should be noted that, in actual production, can also choose the longer ionic piece of life who sells for use to replace two kinds of low temperature plasma reactor 410 enumerated in the utility model discloses, only need satisfy water treatment low temperature plasma equipment simple structure and low temperature plasma reactor 410 long service life can, no longer describe herein.

In an embodiment, the water treatment low-temperature plasma device further includes an air inlet connector 800 and an air outlet connector 900, an input end of the air inlet connector 800 is used for being communicated with an external air pump, an output end of the air inlet connector 800 penetrates through the air inlet 220 and is communicated with an input end of the tube 420, an input end of the air outlet connector 900 penetrates through the air outlet 230 and is communicated with an output end of the tube 420, and an output end of the air outlet connector 900 is used for being communicated with a water body to be purified. Preferably, the air inlet connector 800 and the air outlet connector 900 are respectively connected to the pipe 420 in a sealing manner. Through setting up into wind joint 800 in the income wind gap 220 department at casing 200 respectively, set up the air-out at the air outlet 230 department of casing 200 and connect 900, can connect 800 the input and the output that the air-out connects 900 at the income wind respectively according to the actual use condition of equipment and install the tuber pipe additional, with the distance between extension plasma equipment and outside air pump and the water of treating purifying, after avoiding shutting down, water flows backwards under the negative pressure effect and gets into bobbin 420, and then the emergence of the low temperature plasma reactor 410 electric leakage damage problem that arouses, with security and the reliability of improve equipment use.

The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.

The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims (10)

1. The water treatment low-temperature plasma equipment is characterized by comprising at least two low-temperature plasma purification units, wherein each low-temperature plasma purification unit is independently arranged and connected,

the low-temperature plasma purification unit comprises a shell, a power supply device and two low-temperature plasma air pipes, wherein the shell is provided with an accommodating space, one end surface of the shell is provided with an air inlet, the other end surface of the shell is provided with an air outlet, the air inlet and the air outlet are respectively communicated with the accommodating space, the power supply device and the two low-temperature plasma air pipes are respectively accommodated in the accommodating space, the input end of the power supply device is used for being electrically connected with an external power supply, the output end of the power supply device is respectively electrically connected with the two low-temperature plasma air pipes, the low-temperature plasma air pipes comprise low-temperature plasma reactors and pipe barrels, the low-temperature plasma reactors are arranged in the inner cavities of the pipe barrels, one end of the pipe barrels of one low-temperature plasma air pipe penetrates through the air inlet and is used for being, the other end of the tube barrel of one low-temperature plasma air pipe penetrates through the air outlet and is used for being communicated with a water body to be purified, one end of the tube barrel of the other low-temperature plasma air pipe penetrates through the air inlet and is used for being communicated with an external air pump, the other end of the tube barrel of the other low-temperature plasma air pipe penetrates through the air outlet and is used for being communicated with the water body to be purified, and the tube barrels of the two low-temperature plasma air pipes are arranged in parallel;

the low-temperature plasma reactor comprises a medium blocking piece, a first high-voltage pole, a first low-voltage pole, a high-voltage terminal, a low-voltage terminal and an installation shell, wherein the medium blocking piece is provided with a clamping groove, the first high-voltage pole is contained in the clamping groove, the first low-voltage pole surrounds the medium blocking piece, the high-voltage terminal is connected with the first high-voltage pole, the low-voltage terminal is connected with the first low-voltage pole, the high-voltage terminal and the low-voltage terminal are respectively arranged on the same side of the medium blocking piece and are respectively connected with the installation shell, the high-voltage terminal and the low-voltage terminal are respectively electrically connected with a power supply device, and the installation shell is connected with the medium blocking piece.

2. The water treatment low-temperature plasma equipment according to claim 1, wherein a support leg is arranged on the mounting shell, a limiting hole is formed in the pipe barrel, and the support leg penetrates through the limiting hole and abuts against the inner surface of the limiting hole.

3. The water treatment low-temperature plasma equipment according to claim 1, further comprising an air inlet joint and an air outlet joint, wherein an input end of the air inlet joint is used for communicating with the external air pump, an output end of the air inlet joint penetrates through the air inlet and is communicated with an input end of the pipe barrel, an input end of the air outlet joint penetrates through the air outlet and is communicated with an output end of the pipe barrel, and an output end of the air outlet joint is used for communicating with the water body to be purified.

4. The water treatment low-temperature plasma equipment according to claim 3, wherein the air inlet joint and the air outlet joint are respectively connected with the pipe barrel in a sealing manner.

5. The water treatment low temperature plasma apparatus of claim 1, further comprising a power indicator lamp installed at the housing and connected in series with the power supply device.

6. The water treatment low temperature plasma device according to claim 1, wherein the housing comprises a housing and a cover plate, the cover plate is covered on an opening of the housing and detachably connected with the housing.

7. The water treatment low temperature plasma apparatus of claim 6, wherein the cover plate of the low temperature plasma purification unit is screw-coupled with the cover plate of the adjacent low temperature plasma purification unit.

8. The water treatment low temperature plasma device according to claim 6, wherein handles are respectively provided at the top of the housings of the low temperature plasma purification units at both ends of the water treatment low temperature plasma device.

9. The water treatment low-temperature plasma equipment according to claim 6, wherein the bottom of the housing of the low-temperature plasma purification unit is provided with a plurality of rubber feet.

10. The water treatment low temperature plasma device according to claim 1, further comprising connection plates connected to each of the low temperature plasma purification units, respectively.

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