CN211284546U

CN211284546U - PCB acid etching solution cyclic regeneration and retrieve copper system

Info

Publication number: CN211284546U
Application number: CN202020052739.8U
Authority: CN
Inventors: 孙铁浩; 向可阳; 石远林
Original assignee: Shenzhen Jinghengyu Environmental Technology Co ltd
Current assignee: Shenzhen Jinghengyu Environmental Technology Co ltd
Priority date: 2020-01-10
Filing date: 2020-01-10
Publication date: 2020-08-18
Anticipated expiration: 2030-01-10

Abstract

The utility model discloses a PCB acid etching solution circulation regeneration and retrieve copper system, including etching machine, jet valve and gas-liquid reposition of redundant personnel baffle, etching machine one side bottom is provided with the circulating pump, circulating pump one side is connected with the transfer line, the jet valve is connected in the transfer line end, the jet valve bottom is provided with the efflux jar, gas-liquid reposition of redundant personnel baffle sets up inside the efflux jar, the vapour and liquid separator top is connected with the back flow, efflux jar one side bottom is connected with the transmission pipe. This acid etching solution circulation regeneration of PCB and recovery copper system vapour and liquid separator can filter the inside chlorine that remains of efflux jar, eliminates the moisture in the chlorine that remains, and the chlorine after the filtration is retrieved through the back flow and is transmitted to the chlorine intake pipe inside and recycle simultaneously, and liquid can flow back to inside the efflux jar, is favorable to reducing the use amount of etching medicament, can rationally recycle chlorine, is favorable to reducing discharging reduction hazardous waste water, has really reached the effect of resource saving type, environment-friendly type.

Description

PCB acid etching solution cyclic regeneration and retrieve copper system

Technical Field

The utility model relates to an electron environmental protection equipment technical field specifically is a PCB acid etching solution circulation regeneration and retrieve copper system.

Background

Along with the continuous increase of PCB enterprise, the country is bigger and bigger to the dynamics of environmental protection simultaneously, and more PCB enterprise begins to commence cleaner production, mainly in the supporting acid etching solution circulation regeneration of etching production line fluidic device and retrieve the copper system, thereby this system can carry out recycle to the etching solution and reach reduce cost's effect, avoids environmental pollution simultaneously.

The existing system for circularly regenerating and recycling the copper from the acidic etching solution can generate chlorine with moisture when in use, however, the chlorine is neutralized in a waste gas tower by using a large amount of sodium hydroxide in the traditional treatment mode, the treatment cost is huge, the effect control is not easy, and a large amount of waste water is easily generated after the chlorine is neutralized, so that the environmental pollution is easily caused.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a PCB acid etching liquid circulation regeneration and retrieve copper system to propose general acid etching liquid circulation regeneration and retrieve copper system and can produce the chlorine that has moisture when using in solving above-mentioned background art, however traditional treatment mode all is with a large amount of sodium hydroxide in the waste gas tower and go and handle chlorine, and the treatment cost is huge, and effect control is difficult, and easily can produce a large amount of waste water after the chlorine neutralizes, causes environmental pollution's problem easily.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a PCB acid etching solution circulation regeneration and retrieve copper system, includes etching machine, jet valve and gas-liquid reposition of redundant personnel baffle, etching machine one side bottom is provided with the circulating pump, and the inside first etching solution that has stored of etching machine, circulating pump one side is connected with the transfer line, the jet valve is connected in the transfer line end, and jet valve one side is connected with the chlorine intake pipe, the jet valve bottom is provided with the efflux jar, and the inside second etching solution that is provided with of efflux jar, gas-liquid reposition of redundant personnel baffle sets up inside the efflux jar, and efflux jar top is provided with vapour and liquid separator, the vapour and liquid separator top is connected with the back flow, efflux jar one side bottom is connected with the.

Preferably, the first etching solution forms a transmission structure through a circulating pump and a liquid conveying pipe, and the etching machine is fixedly connected with the circulating pump.

Preferably, the first etching solution forms a mixed structure with the chlorine gas inlet pipe through the jet valve, and an included angle between the jet valve and one end of the chlorine gas inlet pipe is 29 degrees.

Preferably, the liquid level height of the second etching solution is higher than that of the first etching solution, and the second etching solution passes through a circulating pump, a liquid conveying pipe and a jet cylinder to form a circulating structure.

Preferably, the jet cylinder forms a separation structure through a gas-liquid separation baffle, and the jet cylinder forms a filtering structure through a gas-liquid separator.

Preferably, the transmission pipe is arranged in a hook-shaped structure, and the jet cylinder forms a backflow prevention structure through the transmission pipe.

Compared with the prior art, the beneficial effects of the utility model are that: this PCB acid etching solution circulation regeneration and recovery copper system can be used to etching production line fluidic device, can filter the inside chlorine that remains of efflux jar through vapour and liquid separator, eliminate the moisture in remaining chlorine, the chlorine after filtering simultaneously retrieves through the back flow and transmits to inside the chlorine air inlet pipe and recycle, and the liquid that vapour and liquid separator filtered out can flow back to inside the efflux jar, this be provided with does benefit to the use amount that reduces the etching medicament, simultaneously can rationally recycle chlorine, thereby be favorable to reducing discharging reduction hazardous waste water, the resource saving type has really been reached, the effect of environment-friendly type.

This acidic etching solution circulation regeneration of PCB and recovery copper system circulating pump passes through the transfer line with the inside first etching solution of etching machine and transmits to inside the jet valve, chlorine gets into inside the jet valve through the chlorine intake pipe simultaneously and produces the second etching solution with first etching solution mixing reaction, first etching solution can improve the regeneration ability of first etching solution with the chlorine reaction, thereby reduction in production cost, and the contained angle between jet valve and chlorine intake pipe one end sets up to 29 and can prevents the chlorine backward flow, be favorable to improving homogeneous mixing between first etching solution and the chlorine.

This PCB acid etching liquid circulation regeneration and retrieve inside gas-liquid reposition of redundant personnel baffle that is provided with of copper system efflux jar, chlorine and first etching solution further react in the efflux jar and produce the second etching solution, and the second etching solution passes through gas-liquid reposition of redundant personnel baffle and slowly flows in efflux jar inside to be favorable to first etching solution and chlorine further reaction, be favorable to improving the volume of second etching solution.

Drawings

FIG. 1 is a schematic view of the front view of the internal structure of the present invention;

FIG. 2 is a schematic structural view of the gas-liquid diversion baffle of the present invention in an operating state;

fig. 3 is the schematic view of the work flow structure of the present invention.

In the figure: 1. an etching machine; 2. a circulation pump; 3. a first etching solution; 4. a transfusion tube; 5. a jet valve; 6. A chlorine gas inlet pipe; 7. a jet cylinder; 8. a second etching solution; 9. a gas-liquid diversion baffle; 10. a gas-liquid separator; 11. a return pipe; 12. and (4) conveying the tube.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides a technical solution: a PCB acid etching liquid circulation regeneration and copper recovery system comprises an etching machine 1, a jet valve 5 and a gas-liquid diversion baffle 9, wherein a circulating pump 2 is arranged at the bottom of one side of the etching machine 1, a first etching liquid 3 is stored in the etching machine 1, a liquid conveying pipe 4 is connected to one side of the circulating pump 2, the first etching liquid 3 passes through the circulating pump 2, the liquid conveying pipe 4 forms a transmission structure, the etching machine 1 is fixedly connected with the circulating pump 2, the jet valve 5 is connected to the tail end of the liquid conveying pipe 4, a chlorine gas inlet pipe 6 is connected to one side of the jet valve 5, a mixed structure is formed between the first etching liquid 3 and the chlorine gas inlet pipe 6 through the jet valve 5, an included angle between the jet valve 5 and one end of the chlorine gas inlet pipe 6 is set to be 29 degrees, the circulating pump 2 can be connected with the etching machine 1 through a flange, the improvement of, the circulating pump 2 transmits the first etching solution 3 in the etching machine 1 to the inside of the jet valve 5 through the liquid conveying pipe 4, meanwhile, chlorine enters the inside of the jet valve 5 through the chlorine inlet pipe 6 to be mixed and reacted with the first etching solution 3, the first etching solution 3 is reacted with the chlorine, the regeneration capacity of the first etching solution 3 can be improved, and therefore the production cost is reduced, the included angle between the jet valve 5 and one end of the chlorine inlet pipe 6 is set to be 29 degrees, the chlorine backflow can be prevented, and the uniform mixing between the first etching solution 3 and the chlorine can be improved;

the bottom of the jet valve 5 is provided with a jet cylinder 7, a second etching solution 8 is arranged inside the jet cylinder 7, the liquid level of the second etching solution 8 is higher than that of the first etching solution 3, the second etching solution 8 forms a circulating structure with the jet cylinder 7 through a circulating pump 2 and a liquid conveying pipe 4, a gas-liquid dividing baffle 9 is arranged inside the jet cylinder 7, the top of the jet cylinder 7 is provided with a gas-liquid separator 10, the jet cylinder 7 forms a separation structure through the gas-liquid dividing baffle 9, the jet cylinder 7 forms a filtering structure through the gas-liquid separator 10, chlorine further reacts with the first etching solution 3 in the jet cylinder 7 to generate the second etching solution 8, the second etching solution 8 slowly flows inside the jet cylinder 7 through the gas-liquid dividing baffle 9, so that the first etching solution 3 further reacts with chlorine, the amount of the second etching solution 8 is improved, and residual chlorine inside the jet cylinder 7 can be filtered through the gas-liquid separator 10, the water in the residual chlorine is eliminated, meanwhile, the filtered chlorine is recycled and transmitted to the interior of the chlorine inlet pipe 6 for reuse, and the liquid filtered by the gas-liquid separator 10 flows back to the interior of the jet flow cylinder 7, so that the arrangement is favorable for reducing the use amount of etching agents, and simultaneously, the chlorine can be reasonably recycled, thereby being favorable for reducing emission of dangerous waste water and really achieving the effects of resource conservation and environmental friendliness;

the gas-liquid separator 10 top is connected with back flow pipe 11, jet cylinder 7 one side bottom is connected with transmission pipe 12, transmission pipe 12 itself sets up to hook type structure, and jet cylinder 7 constitutes anti-reflux structure through transmission pipe 12, because the liquid level height of second etching liquid 8 is higher than the liquid level height of first etching liquid 3, second etching liquid 8 flows into etching machine 1 inside through transmission pipe 12, second etching liquid 8 uses as first etching liquid 3 this moment, and transmission pipe 12 itself sets up to hook type structure can prevent that second etching liquid 8 from taking place the backward flow phenomenon, rethread circulating pump 2 continues the transmission of first etching liquid 3 with chlorine reaction production second etching liquid 8, be favorable to reduction in production cost.

The working principle is as follows: when the PCB acidic etching solution circulation regeneration and copper recovery system is used, firstly, a first etching solution 3 in an etching machine 1 is conveyed to the inside of a jet valve 5 through a liquid conveying pipe 4 by a circulating pump 2, the model of the circulating pump 2 is PW-200E, meanwhile, chlorine enters the inside of the jet valve 5 through a chlorine gas inlet pipe 6 and is mixed and reacted with the first etching solution 3 to generate a second etching solution 8, the first etching solution 3 reacts with the chlorine gas to improve the regeneration capacity of the first etching solution 3, so that the production cost is reduced, the included angle between the jet valve 5 and one end of the chlorine gas inlet pipe 6 is set to be 29 degrees to prevent the chlorine gas from flowing back, so that the uniform mixing between the first etching solution 3 and the chlorine gas is improved, then the second etching solution 8 flows into a jet cylinder 7, the second etching solution 8 slowly flows in the jet cylinder 7 through a gas-liquid flow dividing baffle 9, so that the first etching solution 3 and the, the quantity of the second etching solution 8 is favorably improved, the residual chlorine rises and enters the gas-liquid separator 10 through the gas-liquid diversion baffle 9, the model of the gas-liquid separator 10 is RA-206, the gas-liquid separator 10 can filter the residual chlorine in the jet cylinder 7 to eliminate the moisture in the residual chlorine, the filtered chlorine is recycled and transmitted to the chlorine inlet pipe 6 through the return pipe 11 for reuse, the liquid filtered by the gas-liquid separator 10 can flow back to the inside of the jet cylinder 7, the arrangement is favorable for reducing the use amount of etching agents, and simultaneously, the chlorine can be reasonably recycled, so that the emission reduction of dangerous waste water is favorably realized, the effects of resource saving and environmental friendliness are really realized, and finally, because the liquid level of the second etching solution 8 is higher than that of the first etching solution 3, the second etching solution 8 flows into the etching machine 1 through the transmission pipe 12, at this time, the second etching solution 8 is used as the first etching solution 3, the transmission pipe 12 is designed to be a hook-shaped structure so as to prevent the second etching solution 8 from refluxing, and the first etching solution 3 is transmitted by the circulating pump 2 to continue to react with chlorine to generate the second etching solution 8, which is beneficial to reducing the production cost.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. The utility model provides a PCB acid etching solution circulation regeneration and retrieve copper system, includes etching machine (1), fluidic valve (5) and gas-liquid reposition of redundant personnel baffle (9), its characterized in that: etching machine (1) one side bottom is provided with circulating pump (2), and etching machine (1) inside storage has first etching liquid (3), circulating pump (2) one side is connected with transfer line (4), jet valve (5) are connected in transfer line (4) end, and jet valve (5) one side is connected with chlorine intake pipe (6), jet valve (5) bottom is provided with jet cylinder (7), and jet cylinder (7) inside is provided with second etching liquid (8), gas-liquid reposition of redundant personnel baffle (9) set up inside jet cylinder (7), and jet cylinder (7) top is provided with vapour and liquid separator (10), vapour and liquid separator (10) top is connected with back flow (11), jet cylinder (7) one side bottom is connected with transmission pipe (12).

2. The PCB acid etching solution recycling and copper recovering system according to claim 1, wherein: the first etching solution (3) forms a transmission structure through the circulating pump (2) and the infusion tube (4), and the etching machine (1) is fixedly connected with the circulating pump (2).

3. The PCB acid etching solution recycling and copper recovering system according to claim 1, wherein: the first etching solution (3) forms a mixed structure with the chlorine gas inlet pipe (6) through the jet valve (5), and an included angle between the jet valve (5) and one end of the chlorine gas inlet pipe (6) is set to be 29 degrees.

4. The PCB acid etching solution recycling and copper recovering system according to claim 1, wherein: the liquid level height of the second etching solution (8) is higher than that of the first etching solution (3), and the second etching solution (8) forms a circulating structure through the circulating pump (2), the infusion tube (4) and the jet cylinder (7).

5. The PCB acid etching solution recycling and copper recovering system according to claim 1, wherein: the jet flow cylinder (7) forms a separation structure through a gas-liquid flow dividing baffle (9), and the jet flow cylinder (7) forms a filtering structure through a gas-liquid separator (10).

6. The PCB acid etching solution recycling and copper recovering system according to claim 1, wherein: the transmission pipe (12) is arranged to be a hook-shaped structure, and the jet flow cylinder (7) forms a backflow prevention structure through the transmission pipe (12).