CN211220231U

CN211220231U - Unidirectional rotation platform of polishing

Info

Publication number: CN211220231U
Application number: CN201922194489.1U
Authority: CN
Inventors: 潘静声; 赵正荣; 熊乐云
Original assignee: Jiangxi Jin Cool Technology Co ltd
Current assignee: Jiangxi Jin Cool Technology Co ltd
Priority date: 2019-12-10
Filing date: 2019-12-10
Publication date: 2020-08-11
Anticipated expiration: 2029-12-10

Abstract

The utility model discloses an one-way rotation platform of polishing belongs to the platform field of polishing, and one-way rotation platform of polishing includes: a base; the supporting shaft is arranged on the base; the inner ring of the one-way bearing is sleeved on the support shaft; the connecting sleeve is sleeved on the outer ring of the one-way bearing; the platform is used for arranging the part to be polished and driving the part to be polished to rotate, and the platform is arranged on the connecting sleeve. The utility model discloses an unidirectional rotation platform of polishing can realize being convenient for the product rotation switching-over of in-process of polishing to one-way atress requirement when reaching to polish, thereby solve the transport problem of the process of polishing portably high-efficiently.

Description

Unidirectional rotation platform of polishing

Technical Field

The utility model relates to a platform field of polishing especially relates to an unidirectional rotation platform of polishing.

Background

Sheet metal product etc. need polish after the welding, and the product face of polishing has the multifaceted nature moreover, and each face all needs polish, and some products are heavier, and it is comparatively inconvenient when the in-process of actually polishing rotates, and efficiency is lower, consumes manpower and material resources.

The prior polishing platform is generally fixed, and needs manual moving when the polishing surface is replaced, which is troublesome and laborious. The existing rotating platform is not suitable for polishing products, the products are usually polished towards one direction when being placed on the rotating platform and polished, the products are stressed and can rotate along with the rotating platform, the existing rotating platform can rotate forwards and backwards, the rotation of the rotating platform is limited manually or limited by adopting other complex structures during polishing, and the product polishing machine is very inconvenient.

SUMMERY OF THE UTILITY MODEL

In order to overcome the not enough of prior art, the utility model aims to solve the technical problem that an one-way rotation platform of polishing is proposed to the rotation switching-over of the in-process of polishing of realization is convenient for, and reaches the one-way atress requirement when polishing, thereby solves the transport problem of the process of polishing portably high-efficiently.

The utility model adopts the technical proposal that:

the utility model provides a pair of unidirectional rotation platform of polishing, include: a base; the supporting shaft is arranged on the base; the inner ring of the one-way bearing is sleeved on the support shaft; the connecting sleeve is sleeved on the outer ring of the one-way bearing; the platform is used for arranging the part to be polished and driving the part to be polished to rotate, and the platform is arranged on the connecting sleeve.

As a further improvement of this solution, the inner wall of the inner ring is provided with a first key groove, the outer wall of the support shaft is provided with a first limiting member, and the first limiting member is used for being placed in the first key groove to limit the rotation of the inner ring relative to the support shaft.

As a further improvement of this scheme, the outer wall of outer lane is provided with the second keyway, be provided with the second locating part on the adapter sleeve, the second locating part is used for imbedding the second keyway and restriction the adapter sleeve rotates relatively the outer lane.

As a further improvement of the present solution, the support shaft includes: a first shaft portion provided on the base; a second shaft portion provided on the first shaft portion; the diameter of the second shaft part is smaller than that of the first shaft part, the inner ring is arranged on the second shaft part, and the lower end face of the inner ring abuts against the first shaft part.

As a further improvement of the scheme, a first snap spring is arranged on the second shaft portion and used for limiting the inner ring to move along the axial direction of the second shaft portion.

As a further improvement of the present solution, the platform comprises: the supporting plate is arranged at the top of the connecting sleeve; the panel for place wait to polish the piece, the panel set up in backup pad top.

As a further improvement of the scheme, a through hole is formed in the supporting plate, the connecting sleeve is located on the periphery of the through hole, and the inner diameter of the through hole is smaller than that of the connecting sleeve, so that the top of the outer ring is abutted to the supporting plate.

As a further improvement of the scheme, a second clamping spring is arranged on the inner wall of the connecting sleeve and used for limiting the outer ring to move along the axial direction of the connecting sleeve.

As a further improvement of this solution, the panel is detachably provided on the support plate by a fastener.

As a further improvement of the scheme, the unidirectional rotation polishing platform further comprises at least two universal balls for supporting the platform, and the at least two universal balls are arranged on the base around the supporting shaft in an evenly distributed mode.

Compared with the prior art, the beneficial effects of the utility model are that:

the utility model provides a pair of unidirectional rotation platform of polishing through setting up base, back shaft, one-way bearing, adapter sleeve and platform to make the inner circle cover of one-way bearing locate on the back shaft, the adapter sleeve sets up on the outer lane of one-way bearing, and the platform sets up on the adapter sleeve, adapter sleeve supporting platform, back shaft in order to support one-way bearing, adapter sleeve and platform. Therefore, the platform can rotate unidirectionally relative to the base, when a workpiece to be polished is placed on the platform, the platform can drive the workpiece to be polished to rotate unidirectionally, so that the product can be prevented from being carried in the polishing process, the unidirectional stress requirement during polishing can be met, and the carrying problem of the product polishing process is solved simply, conveniently and efficiently.

Drawings

Fig. 1 is a schematic front view of a unidirectional rotation polishing platform according to an embodiment of the present invention;

fig. 2 is a schematic top view of a grinding platform with unidirectional rotation according to an embodiment of the present invention;

fig. 3 is a schematic top view of a unidirectional rotation polishing platform according to an embodiment of the present invention after a panel is removed;

fig. 4 is a schematic view of a partially enlarged structure a in fig. 1 according to an embodiment of the present invention;

fig. 5 is a schematic structural view of a one-way bearing provided in an embodiment of the present invention.

In the figure:

1. a base; 2. a support shaft; 3. a one-way bearing; 31. an inner ring; 4. connecting sleeves; 32. an outer ring; 5. a platform; 310. a first keyway; 6. a first limit piece; 320. a second keyway; 7. a second limiting member; 21. a first shaft portion; 22. a second shaft portion; 8. a first clamp spring; 51. a support plate; 52. a panel; 510. a through hole; 9. a second clamp spring; 10. and a ball transfer unit.

Detailed Description

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings and technical solutions needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.

The present invention will be further explained with reference to the accompanying drawings.

As shown in fig. 1 to 5, the one-way rotating polishing platform provided in this embodiment includes: base 1, back shaft 2, one-way bearing 3, adapter sleeve 4, back shaft 2 sets up on base 1, and back shaft 2 is located to one-way bearing 3's inner circle 31 cover, and adapter sleeve 4 cover is located on one-way bearing 3's outer lane 32, and platform 5 is used for settling to treat to polish and drive and treats to polish a rotation, and platform 5 sets up on adapter sleeve 4, and adapter sleeve 4 supporting platform 5, back shaft 2 are in order to support one-way bearing 3, adapter sleeve 4 and platform 5. Thereby make platform 5 can for base 1 unidirectional rotation, treat when polishing and place on platform 5, can drive through platform 5 and treat polishing unidirectional rotation, realize treating the convenient rotation of polishing when platform 5 rotates towards a direction, reverse atress platform 5 then can't rotate, can bear the one-way atress when polishing. Therefore, the unidirectional rotation polishing platform provided by the embodiment can avoid the carrying of products in the polishing process, can meet the unidirectional stress requirement during polishing, and simply, conveniently and efficiently solves the carrying problem of the product polishing process.

In order to prevent the inner ring 31 from rotating relative to the supporting shaft 2, further, a first key groove 310 is formed in the inner wall of the inner ring 31 along the axial direction of the inner ring 31, a first limiting member 6 is arranged on the outer wall of the supporting shaft 2, the first limiting member 6 is preferably an inner hexagonal flat end set screw, one end of the inner hexagonal flat end set screw is screwed into a threaded hole formed in the side wall of the supporting shaft 2, one end of the inner hexagonal flat end set screw protruding out of the side wall of the supporting shaft 2 is placed into the first key groove 310, the first limiting member 6 is used for being placed into the first key groove 310 to limit the inner ring 31 from rotating relative to the supporting shaft 2, and the connection stability between.

In order to prevent the outer ring 32 and the connecting sleeve 4 from rotating relatively, further, a second key groove 320 is formed in the outer wall of the outer ring 32 along the axial direction of the outer ring 32, a second limiting member 7 is arranged on the connecting sleeve 4, the second limiting member 7 penetrates through a threaded hole in the side wall of the connecting sleeve 4 and is placed in the second key groove 320, the second limiting member 7 is placed in the second key groove 320 to limit the connecting sleeve 4 to rotate relative to the outer ring 32, and the stability of connection between the outer ring 32 and the connecting sleeve 4 is improved.

In order to facilitate the installation of the inner ring 31 on the support shaft 2, further, the support shaft 2 includes a first shaft portion 21 and a second shaft portion 22 that are coaxially disposed, a bottom of the first shaft portion 21 is perpendicular and fixedly disposed on the base 1, the second shaft portion 22 is disposed on the first shaft portion 21, the first shaft portion 21 and the second shaft portion 22 are integrally disposed, the first limiting member 6 is disposed on the second shaft portion 22, wherein a diameter of the second shaft portion 22 is smaller than a diameter of the first shaft portion 21, the inner ring 31 is sleeved on the second shaft portion 22, and a lower end surface of the inner ring 31 abuts against the first shaft portion 21, so that the inner ring 31 is supported on the support shaft 2.

Further, a first annular groove is formed in the upper portion of the outer wall of the second shaft portion 22, a first snap spring 8 is arranged in the first annular groove, and the first snap spring 8 is used for limiting the axial movement of the inner ring 31 along the second shaft portion 22, so that the inner ring 31 is limited between the first shaft portion 21 and the first snap spring 8, and is prevented from being disengaged.

In order to facilitate the replacement of platforms 5 with different sizes to adapt to different members to be polished, further, the platform 5 includes a supporting plate 51 and a panel 52, the supporting plate 51 is fixedly disposed on the top of the connecting sleeve 4, the panel 52 is used for placing the members to be polished, and the panel 52 is disposed above the supporting plate 51. Panel 52 sets up on backup pad 51 through fastener detachably, and the fastener is preferably the countersunk screw, runs through panel 52 and with backup pad 51 fixed connection through the countersunk screw, the installation and the dismantlement between backup pad 51 and the panel 52 of being convenient for to can change different panels 52 according to the not equidimension specification of waiting to polish, extensive applicability.

In order to facilitate the matching between the support plate 51 and the outer ring 32, further, the support plate 51 is provided with a through hole 510, the connection sleeve 4 is located at the periphery of the through hole 510, the top of the second shaft portion 22 extends into the through hole 510, the arrangement of the through hole 510 can avoid the influence on the rotation of the support plate 51 caused by the contact between the second shaft portion 22 and the support plate 51, and the inner diameter of the through hole 510 is smaller than the inner diameter of the connection sleeve 4, so that the top of the outer ring 32 is abutted against the support plate 51, the support plate 51 is supported on the outer ring 32, and the connection stability between the support plate 51 and the connection sleeve.

Further, a second annular groove is formed in the lower portion of the inner wall of the connecting sleeve 4, a second snap spring 9 is arranged inside the second annular groove, so that the outer ring 32 is limited between the supporting plate 51 and the second snap spring 9, and the second snap spring 9 is used for limiting the outer ring 32 to move along the axial direction of the connecting sleeve 4 and preventing the outer ring from being separated from the connecting sleeve 4.

In order to support the platform and enable the platform to rotate smoothly, the unidirectional rotation polishing platform further comprises at least two universal balls 10, the universal balls 10 are used for supporting the platform 5, and the at least two universal balls 10 are uniformly distributed on the base 1 around the supporting shaft 2. In this embodiment, it is preferred that the universal ball 10 is provided with four, and use back shaft 2 as center evenly distributed, and the support stability of counterplate 52 is high, and universal ball 10 includes the ball seat and sets up the ball on the ball seat, and on the ball seat was fixed in base 1, ball and panel 52 rolling contact to the counterplate supported the bearing capacity of guaranteeing that it treats the piece of polishing, and guaranteed that it can rotate smoothly.

The above description is only for the specific embodiments of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that are not thought of through the creative work should be covered within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the protection scope defined by the claims.

Claims

1. The utility model provides a unidirectional rotation platform of polishing which characterized in that includes:

a base (1);

the supporting shaft (2) is arranged on the base (1);

the inner ring (31) of the one-way bearing (3) is sleeved on the support shaft (2);

the connecting sleeve (4) is sleeved on an outer ring (32) of the one-way bearing (3);

the platform (5) is used for arranging the part to be polished and driving the part to be polished to rotate, and the platform (5) is arranged on the connecting sleeve (4).

2. A unidirectional rotation sanding platform as defined in claim 1, wherein:

the inner wall of the inner ring (31) is provided with a first key groove (310);

the outer wall of the supporting shaft (2) is provided with a first limiting piece (6), and the first limiting piece (6) is used for being placed into the first key groove (310) to limit the inner ring (31) to rotate relative to the supporting shaft (2).

3. A unidirectional rotation sanding platform as defined in claim 1, wherein:

the outer wall of the outer ring (32) is provided with a second key groove (320);

the connecting sleeve (4) is provided with a second limiting part (7), and the second limiting part (7) is used for being placed into the second key groove (320) to limit the connecting sleeve (4) to rotate relative to the outer ring (32).

4. A unidirectional rotation sanding platform according to claim 1, wherein the support shaft (2) comprises:

a first shaft portion (21) provided on the base (1);

a second shaft portion (22) provided on the first shaft portion (21);

the diameter of the second shaft part (22) is smaller than that of the first shaft part (21), the inner ring (31) is arranged on the second shaft part (22), and the lower end face of the inner ring (31) is abutted against the first shaft part (21).

5. A unidirectional rotation sanding platform as defined in claim 4, wherein:

the second shaft part (22) is provided with a first clamp spring (8), and the first clamp spring (8) is used for limiting the inner ring (31) to move along the axial direction of the second shaft part (22).

6. A unidirectional rotation sanding platform according to claim 1, characterized in that the platform (5) comprises:

the supporting plate (51) is arranged at the top of the connecting sleeve (4);

the panel (52) is used for placing a piece to be polished, and the panel (52) is arranged above the supporting plate (51).

7. A unidirectional rotation sanding platform as defined in claim 6, wherein:

a through hole (510) is formed in the supporting plate (51), and the connecting sleeve (4) is positioned on the periphery of the through hole (510);

the inner diameter of the through hole (510) is smaller than that of the connecting sleeve (4), so that the top of the outer ring (32) is abutted against the supporting plate (51).

8. A unidirectional rotation sanding platform as defined in claim 7, wherein:

the inner wall of the connecting sleeve (4) is provided with a second clamping spring (9), and the second clamping spring (9) is used for limiting the outer ring (32) to move along the axial direction of the connecting sleeve (4).

9. A unidirectional rotation sanding platform as defined in claim 6, wherein:

the panel (52) is detachably provided on the support plate (51) by a fastener.

10. A unidirectional rotational sharpening platform according to any of claims 1 to 9, further comprising:

the platform comprises at least two universal balls (10) used for supporting the platform (5), and the at least two universal balls (10) are uniformly distributed on the base (1) around the supporting shaft (2).