CN211219971U - Polishing device for ceramic tile processing - Google Patents
Polishing device for ceramic tile processing Download PDFInfo
- Publication number
- CN211219971U CN211219971U CN201922165051.0U CN201922165051U CN211219971U CN 211219971 U CN211219971 U CN 211219971U CN 201922165051 U CN201922165051 U CN 201922165051U CN 211219971 U CN211219971 U CN 211219971U
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- CN
- China
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- moving mechanism
- clamping rod
- ceramic tile
- axis moving
- workbench
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Abstract
The utility model belongs to the technical field of the ceramic tile processingequipment technique and specifically relates to a burnishing device for ceramic tile processing, comprises a workbench, a plurality of landing legs of bottom welding of workstation, the both sides of workstation are equipped with Z axle moving mechanism, Z axle moving mechanism is equipped with the support frame, the top of support frame is equipped with X axle moving mechanism, one side of X axle moving mechanism is equipped with Y axle moving mechanism, Y axle moving mechanism keeps away from one side of X axle moving mechanism is equipped with the motor, and this a burnishing device for ceramic tile processing compares the burnishing device of current ceramic tile processing advantage in can fixing the ceramic tile of equidimension not, can carry out comprehensive polishing to the ceramic tile, has improved the quality of ceramic tile.
Description
Technical Field
The utility model relates to a ceramic tile processing technology field especially relates to a burnishing device for ceramic tile processing.
Background
The ceramic tile is a building or decoration material of acid and alkali resistant porcelain or stone and the like formed by grinding, mixing, pressing, glazing and sintering refractory metal oxides and semimetal oxides, and is generally called as a ceramic tile.
SUMMERY OF THE UTILITY MODEL
The utility model aims at solving and having existing ceramic tile polisher can't press from both sides tightly the ceramic tile of equidimension not among the prior art, can't carry out comprehensive polishing to the surface of ceramic tile, reduced the shortcoming of the off-the-shelf quality of ceramic tile, and the burnishing device who is used for ceramic tile processing who proposes.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
a polishing device for processing ceramic tiles is designed, and comprises a workbench, wherein a plurality of supporting legs are welded at the bottom of the workbench, Z-axis moving mechanisms are arranged on two sides of the workbench, each Z-axis moving mechanism is provided with a supporting frame, an X-axis moving mechanism is arranged at the top of each supporting frame, a Y-axis moving mechanism is arranged on one side of each X-axis moving mechanism, a motor is arranged on one side, away from the X-axis moving mechanism, of each Y-axis moving mechanism, the output end of each motor is positioned at the bottom and fixedly provided with a polishing sheet, limiting plates are fixedly arranged on two adjacent sides of the top of the workbench, a first rail is arranged on one side of the inner surface of each limiting plate, a second rail is arranged on one side, adjacent to the first rail, of the inner surface of each limiting plate, a first chute is arranged on one side of the top of the workbench, a second, the top of workstation is equipped with first clamping bar, the shifting chute has been seted up to the bottom of first clamping bar, first clamping bar is located the fixed first slider of assorted that is equipped with in one side of second spout, first clamping bar is located the orbital one end of second is fixed and is equipped with the assorted second slider, the workstation top is equipped with the second clamping bar, the second clamping bar is located consequently and the fixed assorted third slider that is equipped with of first spout, the second clamping bar is located the fixed assorted fourth slider that is equipped with of first orbital one end.
Preferably, the landing leg is four and distributes for the four corners, the universal wheel is connected to the equal bearing in bottom of landing leg, limiting plate, first clamping bar, the relative one side of second clamping bar all are equipped with the rubber pad.
Preferably, one side of the limiting plate opposite to the first clamping rod is fixedly provided with a first electric telescopic rod, and the output end of the limiting plate is fixedly connected with the first clamping rod, one side of the limiting plate opposite to the second clamping rod is fixedly provided with a second electric telescopic rod, and the output end of the limiting plate is fixedly connected with the second clamping rod.
Preferably, the bottom of workstation is equipped with the power supply box, surface one side of workstation is equipped with control switch, and passes through the line connection Z axle moving mechanism, X axle moving mechanism, Y axle moving mechanism, motor, first electric telescopic handle, second electric telescopic handle.
The utility model provides a burnishing device for ceramic tile processing, beneficial effect lies in: through first electric telescopic handle, the shrink of second electric telescopic handle, make first clamping bar, second clamping bar and limiting plate fix the ceramic tile, can make the piece of polishing to polish and carry out comprehensive polishing to the ceramic tile through being equipped with Z axle moving mechanism, X axle moving mechanism, Y axle moving mechanism, and this a burnishing device for ceramic tile processing can fix the ceramic tile of equidimension not, can carry out comprehensive polishing to the ceramic tile, has improved the quality of ceramic tile.
Drawings
Fig. 1 is a schematic top view of a polishing device for processing ceramic tiles according to the present invention;
fig. 2 is a schematic view of the bottom view structure of the polishing device for processing ceramic tiles of the present invention.
In the figure: the device comprises a workbench 1, supporting legs 2, a Z-axis moving mechanism 3, a supporting frame 4, an X-axis moving mechanism 5, a Y-axis moving mechanism 6, a motor 7, a polishing sheet 8, a limiting plate 9, a first rail 10, a second rail 11, a first sliding groove 12, a second sliding groove 13, a first clamping rod 14, a moving groove 15, a first sliding block 16, a second sliding block 17, a second clamping rod 18, a third sliding block 19, a fourth sliding block 20, a first electric telescopic rod 21 and a second electric telescopic rod 22.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments.
Referring to fig. 1-2, a polishing device for processing ceramic tiles comprises a workbench 1, wherein a plurality of support legs 2 are welded at the bottom of the workbench 1, Z-axis moving mechanisms 3 are arranged at two sides of the workbench 1, each Z-axis moving mechanism 3 is provided with a support frame 4, an X-axis moving mechanism 5 is arranged at the top of each support frame 4, a Y-axis moving mechanism 6 is arranged at one side of each X-axis moving mechanism 5, a motor 7 is arranged at one side of each Y-axis moving mechanism 6 far away from the X-axis moving mechanism 5, the output end of each motor 7 is positioned at the bottom and is fixedly provided with a polishing sheet 8, a limiting plate 9 is fixedly arranged at two adjacent sides of the top of the workbench 1, a first rail 10 is arranged at one side of the inner surface of the limiting plate 9, a second rail 11 is arranged at one adjacent side of the first rail 10 at the inner surface of the limiting plate 9, a first chute 12 is arranged at one, the top of the workbench 1 is provided with a first clamping bar 14, the bottom of the first clamping bar 14 is provided with a moving groove 15, one side of the first clamping bar 14, which is located on the second sliding groove 13, is fixedly provided with a first slider 16 matched with the first clamping bar 14, one end of the first clamping bar 14, which is located on the second track 11, is fixedly provided with a second slider 17 matched with the second clamping bar, the top of the workbench 1 is provided with a second clamping bar 18, the second clamping bar 18, which is located on the first sliding groove 12, is fixedly provided with a third slider 19 matched with the second clamping bar 18, and one end of the second clamping bar 18, which is located on the first track 10, is fixedly provided with a fourth slider 20 matched.
The four supporting legs 2 are distributed in four corners, universal wheels are connected to the bottoms of the supporting legs 2 through bearings, a limiting plate 9, a first clamping rod 14 and one side, opposite to a second clamping rod 18, of the limiting plate 9 are respectively provided with a rubber pad, damage to tiles is prevented, a first electric telescopic rod 21 is fixedly arranged on one side, opposite to the first clamping rod 14, of the limiting plate 9, the output end of the first electric telescopic rod is fixedly connected with the first clamping rod 14, a second electric telescopic rod 22 is fixedly arranged on one side, opposite to the second clamping rod 18, of the limiting plate 9, the output end of the second electric telescopic rod is fixedly connected with the second clamping rod 18, movement is more stable, a power supply box is arranged at the bottom of the workbench 1, a control switch is arranged on one side of the outer surface of the workbench 1, the control switch is connected with the Z-axis moving mechanism 3, the X, The shrink of second electric telescopic handle 22 makes first clamping bar 14, second clamping bar 18 and limiting plate 9 fix the ceramic tile, can make the piece 8 of polishing carry out comprehensive polishing to the ceramic tile through being equipped with Z axle moving mechanism 3, X axle moving mechanism 5, Y axle moving mechanism 6, and this a burnishing device for ceramic tile processing can fix the ceramic tile of equidimension not, can carry out comprehensive polishing to the ceramic tile, has improved the quality of ceramic tile.
The above, only be the concrete implementation of the preferred embodiment of the present invention, but the protection scope of the present invention is not limited thereto, and any person skilled in the art is in the technical scope of the present invention, according to the technical solution of the present invention and the utility model, the concept of which is equivalent to replace or change, should be covered within the protection scope of the present invention.
Claims (4)
1. The polishing device for processing the ceramic tiles comprises a workbench (1) and is characterized in that a plurality of support legs (2) are welded at the bottom of the workbench (1), Z-axis moving mechanisms (3) are arranged on two sides of the workbench (1), a support frame (4) is arranged on each Z-axis moving mechanism (3), an X-axis moving mechanism (5) is arranged at the top of each support frame (4), a Y-axis moving mechanism (6) is arranged on one side of each X-axis moving mechanism (5), a motor (7) is arranged on one side, far away from each X-axis moving mechanism (5), of each motor (7), an output end of each motor (7) is located at the bottom and fixedly provided with a polishing piece (8), limiting plates (9) are fixedly arranged on two adjacent sides of the top of the workbench (1), and a first track (10) is arranged on one side of the inner surface of each limiting plate (9), the inner surface of the limiting plate (9) is provided with a second track (11) at one side adjacent to the first track (10), one side of the top of the workbench (1) is provided with a first sliding groove (12), one side of the top of the workbench (1) adjacent to the first sliding groove (12) is provided with a second sliding groove (13), the top of the workbench (1) is provided with a first clamping rod (14), the bottom of the first clamping rod (14) is provided with a moving groove (15), one side of the first clamping rod (14) located at the second sliding groove (13) is fixedly provided with a first sliding block (16) matched with the first clamping rod, one end of the first clamping rod (14) located at the second track (11) is fixedly provided with a second sliding block (17) matched with the second clamping rod (18), the second clamping rod (18) is located at the first sliding groove (12) and is fixedly provided with a third sliding block (19) matched with the second clamping rod, one end of the second clamping rod (18) positioned on the first track (10) is fixedly provided with a fourth sliding block (20) matched with the first clamping rod.
2. The polishing device for processing ceramic tiles according to claim 1, wherein the number of the supporting legs (2) is four, the supporting legs are distributed at four corners, the bottom of each supporting leg (2) is connected with a universal wheel through a bearing, and rubber pads are arranged on the opposite sides of the limiting plate (9), the first clamping rod (14) and the second clamping rod (18).
3. The polishing device for ceramic tile processing as claimed in claim 1, wherein a first electric telescopic rod (21) is fixedly arranged on one side of the limiting plate (9) opposite to the first clamping rod (14), and the output end of the first electric telescopic rod is fixedly connected with the first clamping rod (14), a second electric telescopic rod (22) is fixedly arranged on one side of the limiting plate (9) opposite to the second clamping rod (18), and the output end of the second electric telescopic rod is fixedly connected with the second clamping rod (18).
4. The polishing device for ceramic tile processing as claimed in claim 1, wherein a power supply box is arranged at the bottom of the working table (1), and a control switch is arranged on one side of the outer surface of the working table (1) and is connected with the Z-axis moving mechanism (3), the X-axis moving mechanism (5), the Y-axis moving mechanism (6), the motor (7), the first electric telescopic rod (21) and the second electric telescopic rod (22) through lines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922165051.0U CN211219971U (en) | 2019-12-06 | 2019-12-06 | Polishing device for ceramic tile processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201922165051.0U CN211219971U (en) | 2019-12-06 | 2019-12-06 | Polishing device for ceramic tile processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211219971U true CN211219971U (en) | 2020-08-11 |
Family
ID=71940917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201922165051.0U Expired - Fee Related CN211219971U (en) | 2019-12-06 | 2019-12-06 | Polishing device for ceramic tile processing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211219971U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115302383A (en) * | 2022-08-05 | 2022-11-08 | 安徽省亚欧陶瓷有限责任公司 | Polishing device with polishing grinding heads arranged in multiple rows of ceramic tiles |
-
2019
- 2019-12-06 CN CN201922165051.0U patent/CN211219971U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115302383A (en) * | 2022-08-05 | 2022-11-08 | 安徽省亚欧陶瓷有限责任公司 | Polishing device with polishing grinding heads arranged in multiple rows of ceramic tiles |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200811 Termination date: 20211206 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |