CN211208386U

CN211208386U - Correcting device for ion beam processing

Info

Publication number: CN211208386U
Application number: CN201922117737.2U
Authority: CN
Inventors: 王娇
Original assignee: Changchun Baina Optoelectronic Products Co ltd
Current assignee: Changchun Baina Optoelectronic Products Co ltd
Priority date: 2019-11-29
Filing date: 2019-11-29
Publication date: 2020-08-07
Anticipated expiration: 2029-11-29

Abstract

The utility model discloses a correcting unit of ion beam processing relates to ion beam processing technology field, correcting unit places between ion source and work piece, correcting unit includes support and a plurality of correction board, support one side is provided with a plurality of sockets, the one end of every correction board is provided with the interface, other positions of correction board are provided with cavity and lead to the groove, expose on the correction board outside the support cavity leads to the groove and forms the ion beam passageway. Adopt the utility model discloses, can improve the efficiency that physics sheltered from the device dismouting.

Description

Correcting device for ion beam processing

Technical Field

The utility model relates to an ion beam machining technical field, in particular to correcting unit of ion beam processing.

Background

After plasma is generated, the beam density of the ion beam is not uniform on an effective ion beam channel, but the optimal state is that the beam density of the ion beam is uniform when the ion beam is used for etching, so that an etching effect with good uniformity can be obtained, which is most important in various ion beam etching technologies.

The traditional methods for obtaining good beam density uniformity include two methods, one is to adjust the parameters and design structure of the ion source to make the ion beam led out from the ion source uniform, however, because the magnetic field of the ion beam is not uniform, and due to the mutual repulsion of the charged ions, it is difficult to ensure the absolute uniformity of the ion beam extracted from the ion source, and only relatively uniform ion beams can be obtained, when the ion beam uniformity of the ion source does not meet the etching requirement, a special-shaped physical shielding mechanism is required to be established between the ion source and an etching sample, and the special-shaped physical shielding mechanism is continuously counteracted with the ion beam density characteristic by adjusting the geometric shape of the physical shielding mechanism, when the physical shielding device is designed each time, the etching uniformity needs to be tested, and if the correction effect is not achieved, the geometric shape of the physical shielding device needs to be processed in a targeted manner. The existing physical shielding device adopts a fixed pressing plate to be connected with a support bolt so as to clamp the correction plate between the fixed pressing plate and the support bolt, so that the correction plate is fixed and an ion beam channel is formed, but the correction plate is not easy to disassemble and assemble in the mode, the disassembly can be completed by at least two technicians, and the mode of bolt connection is complex, so that the efficiency of disassembling and assembling the physical shielding device is reduced.

SUMMERY OF THE UTILITY MODEL

The utility model discloses a bayonet socket on the correction plate inserts support to this comes to fix the correction plate to the support, exposes the cavity logical groove formation ion beam passageway that sets up on the correction plate outside the support, has solved the inconvenient problem of correction plate dismouting among the prior art.

In order to achieve the above object, the embodiments of the present invention provide a correction device for ion beam processing,

the correcting device is placed between the ion source and a workpiece and comprises a support and a plurality of correcting plates, wherein a plurality of inserting seats are arranged on one side of the support, an inserting port is formed in one end of each correcting plate, hollow through grooves are formed in other positions of the correcting plates, and the hollow through grooves exposed out of the support on the correcting plates form ion beam channels.

Optionally, the socket disposed on the bracket is dumbbell-shaped, that is, the width of the cross section of the two sides of the socket is greater than the width of the central cross section of the socket.

Optionally, the ion beam is a ribbon ion beam.

Optionally, the correction plate is a rectangular ceramic plate.

Optionally, the bracket includes a mounting seat and a frame plate fixedly connected to the mounting seat, and a triangular reinforcing rib is disposed between the frame plate and the mounting seat.

The embodiment of the utility model provides a beneficial effect that technical scheme brought includes at least:

the utility model discloses in, insert the bayonet socket on the support through interface on the correction plate, fix the correction plate to the support on, expose the cavity that sets up on the correction plate outside the support and lead to the groove formation ion beam passageway, insert the degree of depth of bayonet socket through the adjustment interface, can adjust the cavity and lead to the area that the groove exposes, and then the size of adjustment ion beam passageway, moreover, the steam generator is simple in structure, it is convenient to make, the dismouting change of device is also very convenient, can make up in a flexible way and satisfy the physics that shelters from the requirement to the ion beam, the efficiency that the dismouting physics sheltered from the device is improved, and then the work efficiency of ion beam.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.

Fig. 1 is a schematic structural diagram of a correction apparatus for ion beam processing according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of a correction apparatus for ion beam processing according to an embodiment of the present invention;

fig. 3 is a schematic structural diagram of a correction apparatus for ion beam processing according to an embodiment of the present invention.

The reference numerals include:

1. a support; 11. a socket; 12. a mounting seat; 13. a frame plate; 14. reinforcing ribs; 2. a correction plate; 21. an interface; 22. a hollow through groove.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention clearer, embodiments of the present invention will be described in further detail below with reference to the accompanying drawings.

It will be understood that when an element is referred to as being "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "secured to" another element, it can be directly connected to the other element or intervening elements may also be present.

In the present invention, unless otherwise specified, the terms of orientation such as "up, down, left, and right" used generally refer to up, down, left, and right as shown in fig. 1. "inner and outer" refer to the inner and outer portions of a particular contour. "distal and proximal" refer to distal and proximal relative to a component.

As shown in fig. 1, an embodiment of the present invention provides a correction device for ion beam processing, the correction device is disposed between an ion source and a workpiece, and is used for shielding and correcting an ion beam emitted by the ion source. Correcting unit includes support 1 and a plurality of correction board 2, and support 1 is used for placing and supporting correction board 2, and 1 one side of support is provided with a plurality of bayonet sockets 11, and bayonet socket 11 is used for fixed correction board 2. One end of each correction plate 2 is provided with a plug-in port 21, the width of the plug-in socket 11 is smaller than that of the correction plate 2, and the correction plate 2 can be fixed on the support 1 by inserting the plug-in port 21 of the correction plate 2 into the plug-in socket 11. Socket 11 can be the cuboid, and interface 21 is the rectangle breach that the width slightly is greater than socket 11 width for interface 21, and preferably, interface 21's width is 1 ~ 3 millimeters bigger than socket 11's width. In order to fix the correction plate 2 on the bracket 1 more firmly, it is preferable that the socket 11 is formed in a dumbbell shape, that is, a shape in which the width of the cross section of both sides is larger than the width of the cross section of the center of the socket 11, as shown in fig. 2, the socket 11 is formed in a shape in which the upper side and the lower side are wide and the middle is narrow, and correspondingly, the width of the socket 21 is slightly wider than the middle width of the socket 11, so that the socket 11 can better catch the correction plate 2 and fix the correction plate 2 on the bracket 1 more firmly.

Other positions of the correction plate 2 are provided with a hollow through groove 22, and the hollow through groove 22 can be arranged at the central position of the correction plate 2 or at the other end far away from the socket 21. The hollow through groove 22 of the correction plate 2 exposed out of the support 1 forms an ion beam passage. The area of the hollow through groove 22 of the correction plate 2 exposed out of the bracket 1 can be adjusted by the width of the socket 21 of the correction plate 2 inserted into the socket 11.

Alternatively, the ion source may be a bar-type ion source and the support 1 may be made of metal, which may greatly reduce the production cost of the support 1. The correction plate 2 may be a rectangular ceramic plate.

Optionally, as shown in fig. 3, the bracket 1 includes a mounting seat 12 and a frame plate 13 fixedly connected to the mounting seat, and a triangular reinforcing rib 14 is disposed between the frame plate 13 and the mounting seat 12. The mounting seat 12 can facilitate the mounting of the bracket 1 in a vacuum chamber, and the frame plate 13 has a hollow structure, so that the material consumption can be saved, the cost can be reduced, and in addition, the weight of the bracket 1 can be effectively reduced. The reinforcing ribs 14 arranged between the mounting seat 12 and the frame plate 13 can ensure the structural strength.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

It will be understood by those skilled in the art that all or part of the steps for implementing the above embodiments may be implemented by hardware, or may be implemented by a program instructing relevant hardware, where the program may be stored in a computer-readable storage medium, and the above-mentioned storage medium may be a read-only memory, a magnetic disk or an optical disk, etc.

The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included within the protection scope of the present invention.

Claims

1. The correction device for ion beam processing is characterized by being placed between an ion source and a workpiece and comprising a support and a plurality of correction plates, wherein one side of the support is provided with a plurality of plug sockets, one end of each correction plate is provided with a plug socket, other positions of each correction plate are provided with hollow through grooves, and the hollow through grooves exposed out of the support on the correction plates form ion beam channels; the plug socket arranged on the support is dumbbell-shaped, namely the width of the sections on the two sides of the plug socket is larger than that of the central section of the plug socket.

2. The ion beam processing correction apparatus of claim 1, wherein the ion beam is a ribbon ion beam.

3. The correction device for ion beam processing as claimed in claim 1, wherein said correction plate is a rectangular ceramic plate.

4. The ion beam machining correction device of claim 1, wherein the bracket comprises a mounting base and a frame plate fixedly connected with the mounting base, and a triangular reinforcing rib is arranged between the frame plate and the mounting base.