CN211086886U - Miniature projection device for microlithography - Google Patents

Miniature projection device for microlithography Download PDF

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Publication number
CN211086886U
CN211086886U CN201921912023.4U CN201921912023U CN211086886U CN 211086886 U CN211086886 U CN 211086886U CN 201921912023 U CN201921912023 U CN 201921912023U CN 211086886 U CN211086886 U CN 211086886U
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CN
China
Prior art keywords
cavity
wall
projection
power cavity
lens group
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Expired - Fee Related
Application number
CN201921912023.4U
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Chinese (zh)
Inventor
华平壤
姜城
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Tianjin Tongruan Information Technology Co ltd
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Tianjin Tongruan Information Technology Co ltd
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Priority to CN201921912023.4U priority Critical patent/CN211086886U/en
Application granted granted Critical
Publication of CN211086886U publication Critical patent/CN211086886U/en
Expired - Fee Related legal-status Critical Current
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Abstract

The utility model discloses a miniature projection arrangement for microlithography, including throwing cavity, curved surface mirror group, laser instrument, power cavity and concave surface mirror group, throw the inside central point of cavity and put the department and be equipped with concave surface mirror group, and the inside curved surface mirror group that is equipped with of the projection cavity of concave surface mirror group one side to curved surface mirror group keeps away from the inside positive lens group that is equipped with of projection cavity of concave surface mirror group one side, be fixed with the connection barrel on throwing the outer wall of cavity one side, the one end of connecting the barrel extends to the inside of throwing the cavity, and connects the barrel and keep away from and be fixed with power cavity on throwing the outer wall of cavity one side, and power cavity's one end is linked together with the one end of connecting the barrel to the inside one side of power cavity is equipped with the laser instrument. The utility model discloses not only ensured the projection effect when miniature projection arrangement uses, prolonged miniature projection arrangement's life, improved miniature projection arrangement's application scope moreover.

Description

Miniature projection device for microlithography
Technical Field
The utility model relates to a miniature projection arrangement technical field specifically is a miniature projection arrangement for microlithography.
Background
A projection device is a device that modulates light from a light source in accordance with a video signal in a display element such as a liquid crystal panel to form an optical image, and projects the formed optical image onto an irradiated surface such as an external screen or a wall surface via a projection lens or a projection mirror.
The miniature projection devices on the market are various in types and can basically meet the use requirements of people, but certain defects still exist, and the following problems exist.
(1) The traditional miniature projection device is inconvenient to protect the positive lens group, so that external dust is easy to corrode the positive lens group, and the projection effect of the traditional miniature projection device is influenced;
(2) the traditional miniature projection device has general heat dissipation performance, is difficult to carry out high-efficiency heat dissipation on a laser, causes the phenomenon that the laser is easy to damage due to high temperature, and has short service life;
(3) the traditional miniature projection device is inconvenient for adjusting the distance between the laser and the concave mirror group, is difficult to carry out corresponding adjustment according to specific requirements, and has certain limitation.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a miniature projection arrangement for microlithography to it is not convenient for protect the positive lens group to solve among the above-mentioned background art, heat dispersion generally and is not convenient for adjust the problem of interval between laser instrument and the concave mirror group to provide miniature projection arrangement.
In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a miniature projection arrangement for microlithography, is including throwing cavity, curved mirror group, laser instrument, power cavity and concave mirror group, the inside central point of throwing the cavity puts the department and is equipped with concave mirror group, and the inside curved mirror group that is equipped with of the cavity of throwing of concave mirror group one side is organized to the curved mirror to the inside positive lens group that is equipped with of the cavity of throwing that concave mirror group one side was kept away from is organized to the curved mirror, be fixed with the connection barrel on the outer wall of throwing cavity one side, the one end of connecting the barrel extends to the inside of throwing the cavity, and connects the barrel and keep away from and be fixed with the power cavity on the outer wall of throwing cavity one side, the one end of power cavity is linked together with the one end of connecting the barrel to the inside one side of power cavity is equipped with the laser instrument, be.
Preferably, helical structure's inside is equipped with set nut, spiral handle and hob in proper order, it has the hob to articulate on the outer wall of laser instrument one side, and the one end of hob extends to the outside of power cavity, and the hob is kept away from the one end of laser instrument and is installed the hob to threaded connection has set nut, set nut's one end and power cavity's inner wall fixed connection on the power cavity inner wall on hob surface.
Preferably, heat collecting plates are fixed on the inner walls of the power cavity at the two ends of the spiral structure, heat radiating fins are fixed on the outer wall of one side of each heat collecting plate, one ends, far away from the heat collecting plates, of the heat radiating fins extend to the outside of the power cavity, and two groups of heat radiating fin rings are wound inside the power cavity on the surfaces of the heat radiating fins.
Preferably, all be equipped with the spacing groove on the power cavity inner wall at laser instrument both ends, and one side of spacing inslot portion is equipped with the stopper, the one end of stopper extend to the outside of spacing groove and with the outer wall fixed connection of laser instrument.
Preferably, the outer wall of the power cavity, which is close to one side of the connecting cylinder, is provided with two groups of heat dissipation through holes, and the centers of the heat dissipation through holes are provided with dust screens.
Preferably, two sets of limiting rings are arranged on the inner wall of the projection cavity on one side, far away from the curved lens group, of the positive lens group, positioning frames are fixed on the inner wall of the projection cavity on one side, far away from the positive lens group, of the limiting rings, dustproof wafers are arranged inside the projection cavity between the adjacent positioning frames, and fit grooves are formed in two sides of each dustproof wafer.
Compared with the prior art, the beneficial effects of the utility model are that: the miniature projection device for microlithography not only ensures the projection effect when the miniature projection device is used, prolongs the service life of the miniature projection device, but also improves the application range of the miniature projection device;
(1) the positioning frame, the dustproof wafer, the limiting ring and the fit groove are arranged, the fit groove is aligned to the positioning frame, the dustproof wafer is pressed and rotated, the dustproof wafer is limited by the limiting ring and then is installed to one end of the projection cavity, so that the positive lens group is protected, external dust is prevented from corroding the positive lens group, and the projection effect of the miniature projection device in use is ensured;
(2) the heat collecting plate, the heat radiating fin ring and the heat radiating fin column are arranged, the heat energy generated by the laser is collected through the heat collecting plate, the heat energy is guided to the outside of the power cavity through the heat radiating fin column, and meanwhile, the heat conducting efficiency of the heat radiating fin column is further enhanced through the heat radiating fin ring, so that the laser can be subjected to efficient heat radiating treatment, the phenomenon that the laser is damaged due to high temperature is avoided, and the service life of the micro projection device is prolonged;
(3) through being provided with set nut, spiral handle and hob, through rotatory hob, make it drive the hob rotation and at set nut's inside translation, the stopper then can carry on spacingly at the inside synchronous motion of spacing groove to the laser instrument, makes the laser instrument along with hob synchronous motion to adjust the interval between laser instrument and the concave mirror group according to specific demand, thereby improved miniature projection arrangement's application scope.
Drawings
Fig. 1 is a schematic front view of a cross-sectional structure of the present invention;
fig. 2 is an enlarged schematic structural view of a point a in fig. 1 according to the present invention;
FIG. 3 is a schematic view of the cross-sectional enlarged structure of the spiral structure of the present invention;
FIG. 4 is a side view of the dustproof wafer according to the present invention;
fig. 5 is a schematic view of the power cavity side view enlarging structure of the present invention.
In the figure: 1. a projection cavity; 2. a curved lens group; 3. connecting the cylinder body; 4. a dust screen; 5. a limiting block; 6. a limiting groove; 7. a helical structure; 701. positioning a nut; 702. a screw shank; 703. a screw rod; 8. a laser; 9. a heat dissipating through hole; 10. a power cavity; 11. a concave lens group; 12. a positive lens group; 13. a positioning frame; 14. a dust-proof wafer; 15. a limiting ring; 16. a heat collecting plate; 17. a heat dissipation fin ring; 18. a heat dissipation fin column; 19. a fitting groove; 20. an interface.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-5, the present invention provides an embodiment: a miniature projection device for microlithography comprises a projection cavity 1, a curved mirror group 2, a laser 8, a power cavity 10 and a concave mirror group 11, wherein the concave mirror group 11 is arranged at the central position inside the projection cavity 1, the curved mirror group 2 is arranged inside the projection cavity 1 at one side of the concave mirror group 11, a positive lens group 12 is arranged inside the projection cavity 1 at one side of the curved mirror group 2, which is far away from the concave mirror group 11, two sets of limiting rings 15 are arranged on the inner wall of the projection cavity 1 at one side of the positive lens group 12, which is far away from the curved mirror group 2, and positioning frames 13 are fixed on the inner wall of the projection cavity 1 at one side of the limiting rings 15, dustproof wafers 14 are arranged inside the projection cavity 1 between the adjacent positioning frames 13, and both sides of the dustproof wafers 14 are provided with fitting grooves 19 so as to protect the positive lens group;
a connecting cylinder 3 is fixed on the outer wall of one side of the projection cavity 1, one end of the connecting cylinder 3 extends into the projection cavity 1, a power cavity 10 is fixed on the outer wall of one side, away from the projection cavity 1, of the connecting cylinder 3, one end of the power cavity 10 is communicated with one end of the connecting cylinder 3, two groups of heat dissipation through holes 9 are formed in the outer wall of one side, close to the connecting cylinder 3, of the power cavity 10, and a dustproof net 4 is arranged in the center of the interior of each heat dissipation through hole 9 so as to dissipate heat energy in the power cavity 10;
a laser 8 is arranged on one side inside the power cavity 10, the type of the laser 8 can be FU650AD50-GD16, the inner walls of the power cavity 10 at the two ends of the laser 8 are both provided with a limiting groove 6, a limiting block 5 is arranged on one side inside the limiting groove 6, one end of the limiting block 5 extends to the outside of the limiting groove 6 and is fixedly connected with the outer wall of the laser 8, so that the moving amplitude of the laser 8 is limited;
the outer wall of one side of the laser 8 is provided with a spiral structure 7, a positioning nut 701, a spiral handle 702 and a spiral rod 703 are sequentially arranged inside the spiral structure 7, the outer wall of one side of the laser 8 is hinged with the spiral rod 703, one end of the spiral rod 703 extends to the outside of the power cavity 10, the end, away from the laser 8, of the spiral rod 703 is provided with the spiral handle 702, the positioning nut 701 is connected with the inner wall of the power cavity 10 on the surface of the spiral rod 703 in a threaded manner, and one end of the positioning nut 701 is fixedly connected with the inner wall of the power cavity 10;
the screw handle 702 is rotated to drive the screw rod 703 to rotate and translate in the positioning nut 701, the limiting block 5 can synchronously move in the limiting groove 6 to limit the laser 8, so that the laser 8 synchronously moves along with the screw rod 703, the distance between the laser 8 and the concave lens group 11 can be adjusted according to specific requirements, and the application range of the miniature projection device is widened;
the inner walls of the power cavity 10 at the two ends of the spiral structure 7 are both fixed with heat collecting plates 16, the outer wall of one side of each heat collecting plate 16 is fixed with a heat radiating fin column 18, one end of each heat radiating fin column 18 far away from the heat collecting plate 16 extends to the outside of the power cavity 10, and two groups of heat radiating fin rings 17 are wound inside the power cavity 10 on the surface of each heat radiating fin column 18 so as to radiate the laser 8 efficiently; and the outer walls of the power cavities 10 on both sides of the spiral structure 7 are provided with interfaces 20.
The working principle is as follows: when the miniature projection device is used, firstly, an external power cable is externally connected with an interface 20, so that a laser 8 emits laser beams after being electrified, the laser beams are subjected to projection processing after being sequentially processed by the concave lens group 11, the curved lens group 2 and the positive lens group 12, the screw stem 703 is driven to rotate and translate in the positioning nut 701 by rotating the screw handle 702, the limiting block 5 can synchronously move in the limiting groove 6 to limit the laser 8, the laser 8 synchronously moves along with the screw stem 703, so that the distance between the laser 8 and the concave lens group 11 is adjusted according to specific requirements, the application range of the miniature projection device is improved, then, heat energy generated by the laser 8 is collected by the heat collecting plate 16, the heat energy is guided to the outside of the power cavity 10 by the heat radiating fin column 18, and the heat conducting efficiency of the heat radiating fin column 18 is further enhanced by the heat radiating fin ring 17, so as to carry out high-efficient heat dissipation to laser instrument 8 and handle, avoid it to appear the phenomenon of damage because of the high temperature, the life of extension miniature projection arrangement, at last through agreeing with groove 19 alignment locating frame 13, press dustproof wafer 14 and rotate it, carry out spacing back to dustproof wafer 14 through spacing ring 15, install dustproof wafer 14 to the one end of throwing cavity 1, so as to protect positive lens group 12, avoid external dust to lead to the fact the erosion to positive lens group 12, ensure the projection effect when miniature projection arrangement uses, thereby accomplish miniature projection arrangement's use.
It is obvious to a person skilled in the art that the invention is not restricted to details of the above-described exemplary embodiments, but that it can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.

Claims (6)

1. The utility model provides a miniature projection arrangement for microlithography, includes projection cavity (1), curved mirror group (2), laser instrument (8), power cavity (10) and concave mirror group (11), its characterized in that: a concave lens group (11) is arranged at the central position inside the projection cavity (1), and a curved lens group (2) is arranged in the projection cavity (1) at one side of the concave lens group (11), and a positive lens group (12) is arranged inside the projection cavity (1) at one side of the curved lens group (2) far away from the concave lens group (11), a connecting cylinder (3) is fixed on the outer wall of one side of the projection cavity (1), one end of the connecting cylinder (3) extends into the projection cavity (1), a power cavity (10) is fixed on the outer wall of one side of the connecting cylinder body (3) far away from the projection cavity (1), one end of the power cavity (10) is communicated with one end of the connecting cylinder body (3), a laser (8) is arranged on one side inside the power cavity (10), a spiral structure (7) is arranged on the outer wall of one side of the laser (8), and the outer walls of the power cavities (10) at the two sides of the spiral structure (7) are provided with interfaces (20).
2. A miniature projection apparatus for microlithography according to claim 1, characterized in that: the inside of helical structure (7) is equipped with set nut (701), spiral handle (702) and hob (703) in proper order, it has hob (703) to articulate on the outer wall of laser instrument (8) one side, and the one end of hob (703) extends to the outside of power cavity (10), and hob (703) are kept away from the one end of laser instrument (8) and are installed hob (702) to threaded connection has set nut (701) on power cavity (10) inner wall on hob (703) surface, the one end of set nut (701) and the inner wall fixed connection of power cavity (10).
3. A miniature projection apparatus for microlithography according to claim 1, characterized in that: the heat collecting plate (16) is fixed on the inner wall of the power cavity (10) at two ends of the spiral structure (7), the heat radiating fin column (18) is fixed on the outer wall of one side of the heat collecting plate (16), one end, far away from the heat collecting plate (16), of the heat radiating fin column (18) extends to the outside of the power cavity (10), and two groups of heat radiating fin rings (17) are wound inside the power cavity (10) on the surface of the heat radiating fin column (18).
4. A miniature projection apparatus for microlithography according to claim 1, characterized in that: all be equipped with spacing groove (6) on power cavity (10) inner wall at laser instrument (8) both ends, and one side of spacing groove (6) inside is equipped with stopper (5), the one end of stopper (5) extend to the outside of spacing groove (6) and with the outer wall fixed connection of laser instrument (8).
5. A miniature projection apparatus for microlithography according to claim 1, characterized in that: the power cavity (10) is provided with two groups of heat dissipation through holes (9) on the outer wall close to one side of the connecting cylinder body (3), and the dust screen (4) is arranged at the central position inside the heat dissipation through holes (9).
6. A miniature projection apparatus for microlithography according to claim 1, characterized in that: the inner wall of the projection cavity (1) on one side, far away from the curved lens group (2), of the positive lens group (12) is provided with two sets of limiting rings (15), the inner wall of the projection cavity (1) on one side, far away from the positive lens group (12), of the limiting rings (15) is fixedly provided with positioning frames (13), the projection cavity (1) between the adjacent positioning frames (13) is internally provided with dustproof wafers (14), and both sides of the dustproof wafers (14) are provided with matching grooves (19).
CN201921912023.4U 2019-11-07 2019-11-07 Miniature projection device for microlithography Expired - Fee Related CN211086886U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921912023.4U CN211086886U (en) 2019-11-07 2019-11-07 Miniature projection device for microlithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921912023.4U CN211086886U (en) 2019-11-07 2019-11-07 Miniature projection device for microlithography

Publications (1)

Publication Number Publication Date
CN211086886U true CN211086886U (en) 2020-07-24

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ID=71628141

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921912023.4U Expired - Fee Related CN211086886U (en) 2019-11-07 2019-11-07 Miniature projection device for microlithography

Country Status (1)

Country Link
CN (1) CN211086886U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112635366A (en) * 2020-12-24 2021-04-09 江苏汇成光电有限公司 UV machine wafer chase positioner

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112635366A (en) * 2020-12-24 2021-04-09 江苏汇成光电有限公司 UV machine wafer chase positioner
CN112635366B (en) * 2020-12-24 2024-03-12 江苏汇成光电有限公司 UV machine wafer iron frame positioner

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CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20200724

Termination date: 20211107