CN211005580U - Automatic vapor deposition device of batching - Google Patents
Automatic vapor deposition device of batching Download PDFInfo
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- CN211005580U CN211005580U CN201921832149.0U CN201921832149U CN211005580U CN 211005580 U CN211005580 U CN 211005580U CN 201921832149 U CN201921832149 U CN 201921832149U CN 211005580 U CN211005580 U CN 211005580U
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Abstract
An automatic batching vapor deposition device belongs to the technical field of material preparation and chemical synthesis, and comprises a temperature control mechanism, a reaction box, a reagent box and a pressure reduction assembly; the temperature control mechanism is arranged on the lower end face of the reaction box, the reagent box is arranged on the upper end face of the reaction box, the pressure reducing mechanism is arranged on one side of the reagent box, the pressure reducing mechanism is fixedly arranged on the upper end face of the reaction box, the reaction cavity is arranged in the reaction box in a hollow mode, the substrate and the gasification box are arranged in the reaction cavity, the gasification cavity is formed in the upper end face of the gasification box, the adjusting mechanism is arranged on the upper side of the gasification box, and the reagent box and the gasification box are communicated with each other through the adjusting mechanism; the utility model discloses simple structure, the overall arrangement is compact, and wherein, effectively realize vapor deposition's control through temperature-controlled mechanism and decompression subassembly, simultaneously, realize the reactant output of different doses through first proportion piece and second proportion piece, and be applicable to the different dose output of multiple reactant, possess stronger suitability.
Description
Technical Field
The utility model belongs to the technical field of material preparation and chemical synthesis, in particular to automatic batching's vapor deposition device.
Background
With the rapid development of science and technology, the material performance and the preparation process thereof become key factors restricting the further development of the manufacturing industry. The composite material has incomparable advantages compared with a single material, and becomes a new research hotspot of material science. The preparation methods of the composite material are various, and the composite material can be divided into a gas phase method, a liquid phase method and a solid phase method according to the substance reaction form. Compared with the liquid phase method and the solid phase method, the gas phase method is widely adopted due to the advantages of mild reaction conditions, controllable reaction process, uniform reaction products and the like.
The existing vapor deposition device manually controls the injection dosage when adding reactants, firstly mixes a plurality of reactants when facing the plurality of reactants, then carries out vapor deposition, and can only manually measure the dosages of different reactants in advance.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to overcoming the above-mentioned drawbacks and deficiencies and to providing an automatic dispensing vapor deposition apparatus.
In order to solve the technical problems, the following technical scheme is adopted:
an automatic batching vapor deposition device comprises a temperature control mechanism, a reaction box, a reagent box and a pressure reduction assembly; the reaction box comprises a reaction box body, a reaction box bottom end face and a reagent box bottom end face, wherein the reaction box bottom end face is provided with a temperature control mechanism, the reaction box top end face is provided with the reagent box, one side of the reagent box is provided with a pressure reduction assembly, a baffle is fixedly arranged inside the reagent box to divide the inside of the reagent box into two parts, a reagent inlet end is arranged inside the corresponding reagent box in a communicating mode, the pressure reduction assembly is fixedly arranged on the reaction box top end face, a reaction cavity is arranged in the reaction box in a hollow mode, a substrate and a gasification box are arranged inside the reaction cavity, the gasification cavity is formed in the gasification box top end face, an adjusting mechanism is arranged on the gasification box top side, and.
Preferably, the temperature control mechanism comprises a temperature sensor and a heating device, the temperature sensor is in signal connection with the heating device, and the heating device is a conventional heating device with a temperature control system.
Preferably, the decompression assembly comprises a vacuum pump and a detection meter; the vacuum pump output end software is connected with a connecting pipe, the connecting pipe penetrates through the upper end of the reaction box, a vacuum valve is fixedly arranged on the connecting pipe, and the detection meter is communicated with the reaction cavity.
Preferably, the adjusting mechanism comprises an adjusting box, a first cavity is arranged in the adjusting box in a hollow manner, a second cavity is arranged in the right end wall of the first cavity, a first proportional block is arranged in the first cavity in a sliding manner, a second proportional block is arranged in the second cavity, a stop pin is fixedly arranged on the upper side in the second cavity, a first pipeline is connected to the left end wall of the adjusting box, one end of the first pipeline is communicated with the first cavity, the other end of the first pipeline is communicated with the inside of the reagent box, a second pipeline is arranged on the lower side of the first pipeline, one end of the second pipeline is communicated with the first cavity, the other end of the second pipeline extends into the gasification cavity, a third pipeline is connected to the right end wall of the adjusting box, one end of the third pipeline is communicated with the first cavity, the other end of the third pipeline is communicated with the inside of the reagent box, and a fourth pipeline is arranged, one end of the fourth pipeline is communicated with the first cavity, and the other end of the fourth pipeline extends into the gasification cavity.
Preferably, the second proportional block is made of a material with a small density and has a good buoyancy, a first hemispherical groove is formed in the lower end face of the second proportional block, a rotating groove is formed in the second proportional block in a hollow mode, the rotating groove is communicated with the first hemispherical groove, a telescopic mechanism is arranged in the rotating groove, and the lower end of the telescopic mechanism is fixedly arranged on the lower end wall of the second cavity.
Preferably, the telescopic mechanism comprises a first connecting rod, the first connecting rod is rotatably arranged in the rotating groove, a sliding rod is fixedly connected to the lower end face of the first connecting rod, a second connecting rod is slidably connected to the sliding rod, a fixing block is rotatably arranged at the lower end of the second connecting rod, and the lower end face of the fixing block is fixedly connected with the lower end wall of the second cavity.
Preferably, a second hemispherical groove is formed in the left end wall of the first proportional block, a spring is fixedly arranged on the upper end face of the first proportional block, and the upper end of the spring is fixedly connected with the upper end wall of the first cavity.
Preferably, a point projected downward from the center of the stopper pin and a point projected downward from the center of the second proportional block are spaced apart from each other on the same horizontal line.
Preferably, the reactants of the vapor deposition are liquid substances, and the components of the reactants are one or more of inorganic species.
Preferably, the substrate is a solid substance.
By adopting the technical scheme, the following beneficial effects are realized:
the utility model discloses simple structure, the overall arrangement is compact, and wherein, effectively realize vapor deposition's control through temperature-controlled mechanism and decompression subassembly, simultaneously, realize the reactant output of different doses through first proportion piece and second proportion piece, and be applicable to the different dose output of multiple reactant, possess stronger suitability.
Drawings
FIG. 1 is a schematic view of the overall structure of the utility model;
FIG. 2 is a schematic view of the structure in the direction "A-A" of FIG. 1;
FIG. 3 is an enlarged view of the structure at "B" in FIG. 1;
in the figure: 1-temperature control mechanism; 2-a reaction box; 3-a substrate; 4-a gasification box; 5-a reaction chamber; 6-temperature sensor; 7-an adjusting mechanism; 8-reagent box; 9-a pressure relief assembly; 10-a separator; 11-a regulating box; 12-a second conduit; 13-a third conduit; 14-a fourth conduit; 15-a first conduit; 16-first scale block; 17-a second proportion block; 18-a stop pin; 19-telescoping mechanism.
Detailed Description
The technical solution in the present embodiment will be clearly and completely described below with reference to the accompanying drawings in the present embodiment.
1-3, the automatic batching vapor deposition device comprises a temperature control mechanism 1, a reaction box 2, a reagent box 8 and a pressure reduction assembly 9;
the lower end face of the reaction box 2 is provided with a temperature control mechanism 1, the upper end face of the reaction box 2 is provided with a reagent box 8, a partition plate is fixedly arranged in the reagent box 8 to divide the interior of the reagent box 8 into two parts, and the corresponding reagent box 8 is internally communicated with a reagent inlet end, so that the gasification deposition reaction of various gasification reactants can be conveniently realized;
a pressure reducing assembly 9 is arranged on the left side of the reagent box 8, the pressure reducing assembly 9 is fixedly arranged on the upper end face of the reaction box 2, wherein the pressure reducing assembly 9 comprises a vacuum pump and a detection meter; the vacuum pump output end software is connected with a connecting pipe, the connecting pipe is arranged at the upper end of the reaction box 2 in a penetrating mode, a vacuum valve is fixedly arranged on the connecting pipe, the detection meter is communicated with the reaction cavity 5, the reaction cavity 5 is arranged in the reaction box 2 in a hollow mode, the substrate 3 and the gasification box 4 are arranged in the reaction cavity 5, the gasification cavity is formed in the upper end face of the gasification box 4, the adjusting mechanism 7 is arranged on the upper side of the gasification box 4, the reagent box 8 and the gasification box 4 are communicated with each other through the adjusting mechanism 7, the vacuum degree in the reaction cavity is adjusted through the vacuum pump, the reaction environment is improved, and the vapor deposition reaction is controlled conveniently.
Further, the temperature control mechanism 1 comprises a temperature sensor 6 and a heating device, the temperature sensor 6 is in signal connection with the heating device, and the heating device is a conventional heating device with a temperature control system.
Further, the adjusting mechanism 7 comprises an adjusting box 11, a first cavity is arranged in the adjusting box 11 in a hollow manner, a second cavity is arranged in the right end wall of the first cavity, a first proportional block 16 is arranged in the first cavity in a sliding manner, a second proportional block 17 is arranged in the second cavity, a stop pin 18 is fixedly arranged on the upper side in the second cavity, the left end wall of the adjusting box 11 is connected with a first pipeline 15, one end of the first pipeline 15 is communicated with the first cavity, the other end of the first pipeline is communicated with the inside of the reagent box 8, a second pipeline 12 is arranged on the lower side of the first pipeline 15, one end of the second pipeline 12 is communicated with the first cavity, the other end of the second pipeline extends into the gasification cavity, a third pipeline 13 is connected to the right end wall of the adjusting box 11, one end of the third pipeline 13 is communicated with the first cavity, and the other end of the third pipeline is communicated with the inside, and a fourth pipeline 14 is arranged on the upper side of the third pipeline 13, one end of the fourth pipeline 14 is communicated with the first cavity, and the other end of the fourth pipeline extends into the gasification cavity.
Further, a first hemispherical groove is formed in the lower end face of the second proportion block 17, a rotation groove is formed in the second proportion block 17 in a hollow mode, the rotation groove is communicated with the first hemispherical groove, a telescopic mechanism is arranged in the rotation groove, and the lower end of the telescopic mechanism is fixedly arranged on the lower end wall of the second cavity.
Furthermore, the second proportional block 17 is a substance with a smaller density, and has better buoyancy.
Further, telescopic machanism includes first connecting rod, first connecting rod rotates and sets up in rotating the inslot, just the lower terminal surface fixedly connected with slide bar of first connecting rod, slide bar sliding connection has the second connecting rod, the lower extreme of second connecting rod rotates and is provided with the fixed block, terminal surface and the lower terminal wall fixed connection of second cavity under the fixed block.
Further, a second hemispherical groove is formed in the left end wall of the first proportional block 16, a spring is fixedly arranged on the upper end face of the first proportional block 16, and the upper end of the spring is fixedly connected with the upper end wall of the first cavity.
Further, a point projected downwards from the center of the stop pin 18 and a point projected downwards from the center of the second proportional block 17 are spaced at a certain interval on the same horizontal line.
Further, the reactants of the vapor deposition are liquid substances, and the components of the reactants are one or more of inorganic species.
Further, the substrate 3 is a solid substance.
The utility model discloses a theory of operation: if only one reactant is available, when the equipment works, the vacuum pump is started, the vacuum degree in the reaction chamber 5 is adjusted to meet the requirement, then the vacuum valve is closed, at the moment, the reactant in the reagent box 8 enters the corresponding cavity in the adjusting box 11 through the first pipeline 15 or the third pipeline 13, then, after the proportional block is pushed to slide to a certain position, the reactant is discharged into the gasification chamber from the second pipeline 12 or the fourth pipeline 14, at the moment, the reactant in the gasification chamber is gasified in an accelerated manner and fills the whole reaction chamber 5 due to the higher vacuum degree in the reaction chamber 5, and the gasified reactant is deposited on the surface of the substrate along with the flow rate of time, wherein the controllability of vapor deposition is enhanced by combining the temperature control mechanism 1. If the reactants are various, the reactants flow into the corresponding pipelines to drive the corresponding proportion blocks to enter the gasification cavity to carry out the vapor deposition reaction in the same way.
In the description of the present invention, it is to be understood that the terms "center", "lateral", "up", "down", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", "third", "fourth" may explicitly or implicitly include one or more of the features. In the description of the present invention, "a plurality" means two or more unless otherwise specified. Furthermore, the term "comprises" and any variations thereof is intended to cover non-exclusive inclusions.
The present invention has been described in terms of embodiments, and a number of variations and improvements can be made without departing from the present principles. It should be noted that all the technical solutions obtained by means of equivalent substitution or equivalent transformation fall within the protection scope of the present invention.
Claims (9)
1. An automatic batching's vapor deposition device which characterized in that: comprises a temperature control mechanism (1), a reaction box (2), a reagent box (8) and a pressure reduction component (9); the temperature control mechanism (1) is arranged on the lower end face of the reaction box (2), the reagent box (8) is arranged on the upper end face of the reaction box (2), the pressure reducing assembly (9) is arranged on one side of the reagent box (8), the pressure reducing assembly (9) is fixedly arranged on the upper end face of the reaction box (2), the reaction cavity (5) is arranged in the reaction box (2) in a hollow mode, the substrate (3) and the gasification box (4) are arranged in the reaction cavity (5), the gasification cavity is formed in the upper end face of the gasification box (4), the adjusting mechanism (7) is arranged on the upper side of the gasification box (4), and the reagent box (8) and the gasification box (4) are communicated with each other through the adjusting mechanism (7).
2. A self-dispensing vapor deposition apparatus as recited in claim 1, wherein: reagent case (8) inside fixed baffle that is provided with will reagent case (8) internal partitioning becomes two parts, and the inside intercommunication of reagent case (8) that just corresponds is provided with the reagent entry end.
3. A self-dispensing vapor deposition apparatus as recited in claim 1, wherein: the temperature control mechanism (1) comprises a temperature sensor (6) and heating equipment, the temperature sensor (6) is in signal connection with the heating equipment, and the heating equipment is conventional heating equipment with a temperature control system.
4. A self-dispensing vapor deposition apparatus as recited in claim 1, wherein: the decompression assembly (9) comprises a vacuum pump and a detection meter; the vacuum pump output end software is connected with a connecting pipe, the connecting pipe penetrates through the upper end of the reaction box (2), a vacuum valve is fixedly arranged on the connecting pipe, and the detection meter is communicated with the reaction cavity (5).
5. A self-dispensing vapor deposition apparatus as recited in claim 1, wherein: the adjusting mechanism (7) comprises an adjusting box (11), a first cavity is arranged in the adjusting box (11) in a hollow mode, a second cavity is arranged in the right end wall of the first cavity, a first proportional block (16) is arranged in the first cavity in a sliding mode, a second proportional block (17) is arranged in the second cavity, a stop pin (18) is fixedly arranged on the upper side of the inner portion of the second cavity, a first pipeline (15) is connected to the left end wall of the adjusting box (11), one end of the first pipeline (15) is communicated with the first cavity, the other end of the first pipeline is communicated with the inner portion of the reagent box (8), a second pipeline (12) is arranged on the lower side of the first pipeline (15), one end of the second pipeline (12) is communicated with the first cavity, the other end of the second pipeline extends into the gasification cavity, and a third pipeline (13) is connected to the right end wall of the adjusting box (, one end of the third pipeline (13) is communicated with the first cavity, the other end of the third pipeline is communicated with the inside of the reagent box (8), a fourth pipeline (14) is arranged on the upper side of the third pipeline (13), one end of the fourth pipeline (14) is communicated with the first cavity, and the other end of the fourth pipeline extends into the gasification cavity.
6. A self-dispensing vapor deposition apparatus as recited in claim 5, wherein: the lower end face of the second proportion block (17) is provided with a first hemispherical groove, the lower end face of the second proportion block (17) is provided with a rotating groove, the rotating groove is communicated with the first hemispherical groove, a telescopic mechanism is arranged in the rotating groove, and the lower end of the telescopic mechanism is fixedly arranged on the lower end wall of the second cavity.
7. A self-dispensing vapor deposition apparatus as recited in claim 6, wherein: telescopic machanism includes first connecting rod, first connecting rod rotates and sets up in rotating the inslot, just the lower terminal surface fixedly connected with slide bar of first connecting rod, slide bar sliding connection has the second connecting rod, the lower extreme of second connecting rod rotates and is provided with the fixed block, terminal surface and the lower terminal wall fixed connection of second cavity under the fixed block.
8. A self-dispensing vapor deposition apparatus as recited in claim 5, wherein: the left end wall of the first proportional block (16) is provided with a second hemispherical groove, a spring is fixedly arranged on the upper end face of the first proportional block (16), and the upper end of the spring is fixedly connected with the upper end wall of the first cavity.
9. A self-dispensing vapor deposition apparatus as recited in claim 5, wherein: the downward projection point of the center of the stop pin (18) and the downward projection point of the center of the second proportional block (17) have a certain interval on the same horizontal line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921832149.0U CN211005580U (en) | 2019-10-29 | 2019-10-29 | Automatic vapor deposition device of batching |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921832149.0U CN211005580U (en) | 2019-10-29 | 2019-10-29 | Automatic vapor deposition device of batching |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN211005580U true CN211005580U (en) | 2020-07-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921832149.0U Active CN211005580U (en) | 2019-10-29 | 2019-10-29 | Automatic vapor deposition device of batching |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN211005580U (en) |
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2019
- 2019-10-29 CN CN201921832149.0U patent/CN211005580U/en active Active
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