CN210993427U - Gas purification device - Google Patents

Gas purification device Download PDF

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Publication number
CN210993427U
CN210993427U CN201921457037.1U CN201921457037U CN210993427U CN 210993427 U CN210993427 U CN 210993427U CN 201921457037 U CN201921457037 U CN 201921457037U CN 210993427 U CN210993427 U CN 210993427U
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CN
China
Prior art keywords
pipeline
dust
chamber
filter screen
medicament
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Expired - Fee Related
Application number
CN201921457037.1U
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Chinese (zh)
Inventor
赵德峰
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Kaiyang Tonghui Gas Co ltd
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Kaiyang Tonghui Gas Co ltd
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Priority to CN201921457037.1U priority Critical patent/CN210993427U/en
Application granted granted Critical
Publication of CN210993427U publication Critical patent/CN210993427U/en
Expired - Fee Related legal-status Critical Current
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  • Separation Of Particles Using Liquids (AREA)
  • Treating Waste Gases (AREA)

Abstract

The utility model discloses a gas purification device belongs to the gaseous purifier of industry, and the device includes the dust removal chamber, set up the dust collection chamber in dust removal chamber bottom, with the reaction chamber of dust removal chamber intercommunication, set up the collecting tank in the reaction chamber bottom, hold the medicament pond of holding different medicaments and with the pump body of medicament pond intercommunication, the utility model discloses a dust removal chamber has adopted the spiral scheme of admitting air, and this scheme of admitting air has obvious advantage with traditional gas distribution pipe scheme, and the air input is big and even, and filterable dust is difficult for falling into admission line, has configured the second grade filter screen simultaneously and has made the effect of straining dust, straining dust obvious, and this reaction chamber has adopted to spray, atomizing technical scheme, can multiple harmful gas's processing and purification through configuration different reaction medicaments.

Description

Gas purification device
Technical Field
The utility model relates to an electronic component handles technical field, specifically is a gas purification device.
Background
In factories and production plants, gas purification devices are generally provided for purifying gases in the environment, and the purification process is to purify not only harmful gases but also dust and oil stains in the gases. In the prior art, gas purification methods include physical methods and chemical methods, the physical methods are mostly used for activated carbon adsorption or filtering with a filter screen, the chemical methods usually adopt a reaction tank or a reaction kettle, and the traditional purification methods have the following technical problems: 1) the adsorption scheme of activated carbon and biological membrane is adopted, the filter material needs to be replaced at regular time, and the cost is high; 2) the traditional filter screen is adopted for filtering, so that the filter screen is easy to accumulate dust. Regular cleaning is needed, and the maintenance cost is high; 3) adopt traditional washing mode to purify, equipment volume is great on the one hand, and on the other hand needs to dispose different reation kettle or reaction tank to different gas, and is with high costs.
SUMMERY OF THE UTILITY MODEL
To the technical problem, the utility model discloses a dust removal chamber has adopted the spiral scheme of admitting air, and this scheme of admitting air has obvious advantage with traditional gas distribution pipe scheme, and the air input is big and even, and filterable dust is difficult for falling into admission line, and it makes the effect of straining the ash, straining the dirt to have configured the second grade filter screen simultaneously obvious, and this reaction chamber has adopted the technical scheme that sprays, can multiple harmful gas's processing and purification through configuring different reaction medicament.
The specific scheme is as follows:
the utility model provides a gas purification device, includes the dust removal chamber, set up the dust collection chamber in dust removal chamber bottom, with the reaction chamber of dust removal chamber intercommunication, set up the liquid trap in the reaction chamber bottom, hold the medicament pond of holding the medicament and with the pump body of medicament pond intercommunication, wherein: the dust removal cavity comprises a plurality of air inlet pipelines, a bottom channel, a first-stage filter screen and a second-stage filter screen which are positioned in the middle, and a first communication pipeline positioned on the upper part, wherein the number of the air inlet pipelines is multiple, the air inlet pipelines are symmetrically arranged, the air inlet pipelines are upwards inclined by 10-15 degrees in a vertical plane, the air inlet pipelines are inclined by 30-60 degrees to the same side in a horizontal plane, the bottom channel is connected with the dust collection cavity, the first-stage filter screen and the second-stage filter screen are of conical table structures and are suspended in the dust removal cavity, the vertical projection of the second-stage filter screen falls in the first-stage filter screen, and the tail end of the first communication pipeline is provided with a connecting; a dust exhaust pipe is arranged at the bottom of the dust collection cavity, and a dust exhaust valve is arranged on the dust exhaust pipe; the reaction cavity comprises a second communicating pipeline and an air outlet pipeline which are positioned on two sides of the upper part, a partition plate positioned in the reaction cavity, a drain outlet positioned at the bottom and a spray pipe positioned on the inner surface, the second communicating pipeline is connected with the first communicating pipeline through a flange, the partition plate divides the interior of the reaction cavity into a left cavity and a right cavity which are only communicated with the bottom, the drain outlet is communicated with the liquid collecting pool, the spray pipes are arranged symmetrically, and a plurality of spray heads are uniformly arranged on the spray pipes; a liquid discharge pipe is arranged at the bottom of the liquid collecting pool, and a liquid discharge valve is arranged on the liquid discharge pipe; the medicament pool comprises a plurality of independent spaces for containing different medicaments; the pump body conveys the medicament in the medicament pool to the spray pipe in a high-pressure mode through a pipeline.
Preferably, a plurality of filter screen installation platforms are arranged in the reaction cavity.
Preferably, the range of mesh hole diameters of the primary filter screens is 800-1.5 mm, and the range of mesh hole diameters of the secondary filter screens is 200-500 μm.
Preferably, the first-stage filter screen and the second-stage filter screen are both provided with electromagnetic vibration exciters.
Preferably, a cleaning spray head is arranged at the top of the dust removing cavity.
Preferably, the dust exhaust pipe is used for communicating the dust collection chamber and the liquid collecting tank.
Preferably, the pipeline is including wasing pipeline and medicament pipeline, the one end of wasing the pipeline and the one end of medicament pipeline all through tee bend intercommunication pump body delivery outlet, washs the one end intercommunication washing shower nozzle in addition of pipeline, and the other end intercommunication spray tube of medicament pipeline, be provided with the purge valve on the washing pipeline, be provided with the medicament valve on the medicament pipeline.
Compared with the prior art, the beneficial effects of the utility model are as follows:
(1) the dust removal chamber has adopted the spiral scheme of admitting air, waste gas is connected simultaneously to a plurality of admission lines, when the admission line leaned up, still unified to a lateral tilt, can form the air current that circles round, this admission scheme has obvious advantage with traditional gas distribution pipe scheme, the air input is big and even, simultaneously, this admission scheme no longer need set up the intake pipe bottom the filter screen, gas distribution pipe etc., avoided filterable dust to fall into the condition of admission line, the admission line entry just is covered by the filter screen mount table and can avoid the condition that the dust blockked up the pipeline.
(2) The dust removal chamber has adopted the second grade filtration scheme, and this filtration scheme progressively reduces and filters the aperture, and simultaneously, has configured self-cleaning electromagnetic vibration exciter, and the filterable dust of second grade filter screen can directly fall into bottom dust collection chamber through the first grade filter screen after the electromagnetic vibration exciter starts.
(3) The top of the dust removal cavity is also provided with a cleaning spray head for periodic cleaning and impurity removal.
(4) Reaction chamber inside has adopted the isolating construction, mainly is in order to increase the circulation distance of waste gas, abundant and medicament combine, should spray the scheme and can adopt atomizer, adopt corresponding medicament to different waste gases, and application scope is wide.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a structural diagram of the arrangement of the air inlet pipe in the present invention;
FIG. 3 is a schematic view of the arrangement of the middle nozzle and the nozzle of the present invention;
fig. 4 is a schematic diagram of the structure of the middle pipeline of the present invention.
In the figure: 1-a dust removal cavity, 101-an air inlet pipeline, 102-a first-stage filter screen, 103-a second-stage filter screen, 104-a first communicating pipeline, 105-a bottom channel, 106-a filter screen mounting table, 107-an electromagnetic vibration exciter, 108-a cleaning spray head, 2-a dust collection cavity, 201-a dust exhaust pipe, 202-a dust exhaust valve, 3-a reaction cavity, 301-a second communicating pipeline, 302-a partition plate, 303-a sewage discharge outlet, 304-an air outlet pipeline, 305-a spray pipe, 306-a spray head, 4-a liquid collecting tank, 401-a liquid discharge pipe, 402-a liquid discharge valve, 5-a medicament tank, 6-a pump body, 7-a pipeline, 701-a cleaning pipeline, 702-a medicament pipeline, 703-a cleaning valve and 704-a medicament valve.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
As shown in fig. 1, a gas purification apparatus includes a dust removing chamber 1, a dust collecting chamber 2 disposed at the bottom of the dust removing chamber 1, a reaction chamber 3 communicated with the dust removing chamber 1, a liquid collecting tank 4 disposed at the bottom of the reaction chamber 3, a chemical tank 5 for containing a chemical, and a pump body 6 communicated with the chemical tank 5, wherein the dust removing chamber 1 is used for removing particles, dust, etc. in exhaust gas, and the reaction chamber 3 is used for removing harmful substances in the exhaust gas by reaction, for example: deodorization, desulfurization, etc.
Specifically, dust removal chamber 1 includes inlet channel 101 and bottom passageway 105 of lower part in fig. 1, the one-level filter screen 102 and the second grade filter screen 103 that are located the middle part, the first communicating pipe 104 that is located upper portion, and reaction chamber 3 is inside to be provided with a plurality of filter screen mount tables 106, and filter screen mount table 106 is located inlet channel 101's top, can support on the one hand and install filter screen, on the other hand and avoid the dust to fall into inlet channel.
In fig. 1, the dust collecting chamber 1 is connected to the dust collecting chamber 2 through the bottom passage 105, a dust exhaust pipe 201 is arranged at the bottom of the dust collecting chamber 2, a dust exhaust valve 202 is mounted on the dust exhaust pipe 201, and the dust exhaust pipe 201 is used for communicating the dust collecting chamber 2 with the liquid collecting tank 4.
In fig. 1, the first-stage filter screen 102 and the second-stage filter screen 103 are of a tapered platform structure and are suspended inside the dust removal cavity 1, the vertical projection of the second-stage filter screen 103 falls inside the first-stage filter screen 102, a second-stage filtering scheme is adopted in the dust removal cavity, the filtering aperture is gradually reduced by the filtering scheme, meanwhile, an electromagnetic vibration exciter 107 with automatic cleaning is configured, dust filtered by the second-stage filter screen can directly fall into the bottom dust collection cavity through the first-stage filter screen after the electromagnetic vibration exciter is started, specifically, the range of the mesh aperture of the first-stage filter screen 102 is 800 μm-1.5 mm, the range of the mesh aperture of the second-stage filter screen 103 is 200 μm-500 μm, a biological membrane adsorption filter screen can be adopted, and other physical filter screens can also be.
It should be noted that the top of the dust removing chamber 1 is provided with a cleaning nozzle 108 for periodic cleaning and removing impurities.
As shown in fig. 2, the number of the air inlet pipes 101 is 4, the 4 air inlet pipes 101 are symmetrically arranged, the 4 air inlet pipes 101 are all inclined upwards by 15 degrees in a vertical plane, the 4 air inlet pipes 101 are all inclined to the same side by 55 degrees in a horizontal plane, and the 4 air inlet pipes are simultaneously connected to the exhaust gas pipe, and as can be seen from fig. 2, the air inlet pipes 101 can form an upward swirling airflow.
In fig. 1, the reaction chamber 3 includes a second communicating pipe 301 and an air outlet pipe 304 which are located at two sides of the upper portion, a partition plate 302 which is located inside, a sewage outlet 303 which is located at the bottom and a spray pipe 305 which is located on the inner surface, the second communicating pipe 301 is connected with the first communicating pipe 104 through a flange, the partition plate 302 divides the inside of the reaction chamber 3 into a left cavity and a right cavity which are only communicated with the bottom, the purpose of setting the partition plate 302 is to increase the gas flowing distance, the atomized reaction medicament is fully purified, the sewage outlet 303 is communicated with the liquid collecting tank 4, the number of the spray pipes 305 is multiple, the spray pipes 305 are symmetrically arranged, and a plurality of spray heads 306 are uniformly arranged on the spray pipes 305, as shown in fig. 3, the spray pipes 305 comprise 6 symmetrically. A liquid discharge pipe 401 is arranged at the bottom of the liquid collecting pool 4, and a liquid discharge valve 402 is arranged on the liquid discharge pipe 401; the medicament pool 5 comprises a plurality of independent spaces for containing different medicaments; the pump body 6 delivers the medicament from the reservoir 5 to the nozzle 305 in high pressure through the line 7. As shown in fig. 4, the pipeline 7 includes a cleaning pipeline 701 and a chemical pipeline 702, one end of the cleaning pipeline 701 and one end of the chemical pipeline 702 are both communicated with an output port of the pump body 6 through a tee joint, an input port of the pump body (6) is communicated with the inside of the chemical pool 5, the other end of the cleaning pipeline 701 is communicated with the cleaning nozzle 108, the other end of the chemical pipeline 702 is communicated with the spray pipe 305, a cleaning valve 703 is arranged on the cleaning pipeline 701, and a chemical valve 704 is arranged on the chemical pipeline 702. In actual operation, the cleaning nozzle 108 can be used to clean the dust removing chamber 1 periodically, and at this time, only the cleaning valve 703 needs to be opened, and the sewage automatically flows into the liquid collecting tank 4.
When the device works specifically, waste gas is divided into four paths through 3 three-way valves and is connected into the gas inlet pipeline 101, the waste gas can sequentially pass through the first-stage filter screen 102 and the second-stage filter screen 103 to be subjected to dust removal and impurity removal in a physical mode, then the waste gas enters the reaction chamber 3, the pump body 6 starts to work at the moment, atomized chemicals are formed in the reaction chamber 3, the waste gas needs to move from top to bottom and then from bottom to top due to the division of the partition plates 302, the waste gas is ensured to be fully contacted with the chemicals, the liquid level of the liquid collecting tank 4 can be lifted certainly and is higher than the bottom of the partition plates 302, the waste gas enters the liquids and is further fully contacted, and the waste gas after reaction is conveyed to the next working chamber for further treatment.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (6)

1. The utility model provides a gas purification device, its characterized in that, including dust removal chamber (1), set up dust collection chamber (2) in dust removal chamber (1) bottom, reaction chamber (3) with dust removal chamber (1) intercommunication, set up collecting tank (4) in reaction chamber (3) bottom, hold medicament pond (5) of holding medicament and pump body (6) with medicament pond (5) intercommunication, wherein:
the dust removal cavity (1) comprises a lower air inlet pipeline (101), a bottom channel (105), a first-stage filter screen (102) and a second-stage filter screen (103) which are positioned in the middle and a first communicating pipeline (104) which is positioned on the upper portion, the air inlet pipelines (101) are multiple in number, the air inlet pipelines (101) are symmetrically arranged, the air inlet pipelines (101) are inclined upwards by 10-15 degrees in a vertical plane, the air inlet pipelines (101) are inclined 30-60 degrees to the same side in a horizontal plane, the bottom channel (105) is connected with the dust collection cavity (2), the first-stage filter screen (102) and the second-stage filter screen (103) are of conical table structures and are suspended in the dust collection cavity (1), the vertical projection of the second-stage filter screen (103) falls in the first-stage filter screen (102), and the tail end of the first communicating pipeline (104) is provided with a connecting flange;
a dust exhaust pipe (201) is arranged at the bottom of the dust collection cavity (2), and a dust exhaust valve (202) is arranged on the dust exhaust pipe (201);
the reaction cavity (3) comprises a second communicating pipeline (301) and an air outlet pipeline (304) which are positioned on two sides of the upper part, a partition plate (302) positioned inside, a drain outlet (303) positioned at the bottom and spray pipes (305) positioned on the inner surface, the second communicating pipeline (301) is connected with the first communicating pipeline (104) through a flange, the partition plate (302) divides the inside of the reaction cavity (3) into a left cavity and a right cavity which are only communicated with the bottom, the drain outlet (303) is communicated with the liquid collecting tank (4), the spray pipes (305) are multiple in number, the spray pipes (305) are symmetrically arranged, and the spray pipes (305) are uniformly provided with multiple spray heads (306);
a liquid discharge pipe (401) is arranged at the bottom of the liquid collecting pool (4), and a liquid discharge valve (402) is arranged on the liquid discharge pipe (401);
the medicament pool (5) comprises a plurality of independent spaces for containing different medicaments;
the pump body (6) conveys the medicament in the medicament pool (5) to the spray pipe (305) in a high-pressure mode through a pipeline (7).
2. A gas cleaning device according to claim 1, characterized in that a plurality of screen mounting platforms (106) are provided inside the reaction chamber (3).
3. A gas cleaning device according to claim 2, characterized in that the primary filter (102) and the secondary filter (103) are provided with electromagnetic exciters (107).
4. A gas cleaning device according to claim 3, characterized in that the top of the dust-removing chamber (1) is provided with a cleaning shower (108).
5. A gas cleaning device according to claim 4, characterized in that the dust exhaust pipe (201) is used for communicating the dust collecting chamber (2) and the liquid collecting tank (4).
6. The gas purification device according to claim 5, wherein the pipeline (7) comprises a cleaning pipeline (701) and a chemical pipeline (702), one end of the cleaning pipeline (701) and one end of the chemical pipeline (702) are both communicated with the output port of the pump body (6) through a tee joint, the other end of the cleaning pipeline (701) is communicated with the cleaning nozzle (108), the other end of the chemical pipeline (702) is communicated with the spray pipe (305), a cleaning valve (703) is arranged on the cleaning pipeline (701), and a chemical valve (704) is arranged on the chemical pipeline (702).
CN201921457037.1U 2019-09-04 2019-09-04 Gas purification device Expired - Fee Related CN210993427U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921457037.1U CN210993427U (en) 2019-09-04 2019-09-04 Gas purification device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921457037.1U CN210993427U (en) 2019-09-04 2019-09-04 Gas purification device

Publications (1)

Publication Number Publication Date
CN210993427U true CN210993427U (en) 2020-07-14

Family

ID=71483377

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921457037.1U Expired - Fee Related CN210993427U (en) 2019-09-04 2019-09-04 Gas purification device

Country Status (1)

Country Link
CN (1) CN210993427U (en)

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20200714

CF01 Termination of patent right due to non-payment of annual fee