CN210699459U - Chlorine treatment equipment of acid etching solution recovery system - Google Patents

Chlorine treatment equipment of acid etching solution recovery system Download PDF

Info

Publication number
CN210699459U
CN210699459U CN201921572125.6U CN201921572125U CN210699459U CN 210699459 U CN210699459 U CN 210699459U CN 201921572125 U CN201921572125 U CN 201921572125U CN 210699459 U CN210699459 U CN 210699459U
Authority
CN
China
Prior art keywords
absorption
ferrous chloride
spray
tank
chlorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201921572125.6U
Other languages
Chinese (zh)
Inventor
罗欢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Xinling Environmental Technology Co.,Ltd.
Original Assignee
Shanghai Baling Environmental Protection Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Baling Environmental Protection Technology Co ltd filed Critical Shanghai Baling Environmental Protection Technology Co ltd
Priority to CN201921572125.6U priority Critical patent/CN210699459U/en
Application granted granted Critical
Publication of CN210699459U publication Critical patent/CN210699459U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Treating Waste Gases (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

The utility model discloses an acid etching solution recovery system's chlorine treatment facility, the design point includes: the device comprises a dissolving and absorbing cylinder (1), a ferrous chloride absorbing device (2), a liquid caustic soda washing tower (3), a chlorine pipeline (6), a first ejector (7), a first gas pipeline (9), a second gas pipeline (10), a ferrous chloride regenerating device (4), a vacuum volatilizing device (5) and a second ejector (14). The utility model aims at providing a chlorine treatment facility of acid etching solution recovery system can handle chlorine effectively.

Description

Chlorine treatment equipment of acid etching solution recovery system
Technical Field
The utility model relates to an etching production line field, more specifically say, especially relate to an acid etching solution recovery system's chlorine treatment facility.
Background
With the rapid development of the acid etching solution copper recovery and cyclic regeneration industry, more and more PCB enterprises are provided with etching solution copper recovery and regeneration equipment, and in the operation process of the equipment, chlorine generated by electrolysis is absorbed by etching solution in a dissolution absorption cylinder, and because the absorption of the etching solution is limited, part of the chlorine is still discharged after being treated. However, the waste water treatment station has a limited demand and cannot completely consume the generated ferric trichloride liquid, so that the treatment of redundant ferric trichloride is difficult, and for this reason, it is necessary to develop a chlorine absorption treatment system device which can absorb chlorine without generating other products.
Disclosure of Invention
The utility model aims to provide a chlorine treatment facility of acid etching solution recovery system to the not enough of above-mentioned prior art.
The technical scheme of the utility model is realized like this:
chlorine treatment equipment of an acid etching solution recovery system comprises: the device comprises a dissolving absorption cylinder (1), a ferrous chloride absorption device (2), a liquid caustic soda washing tower (3), a chlorine pipeline (6), a first ejector (7), a first gas pipeline (9) and a second gas pipeline (10);
the dissolution absorption cylinder (1) is used for storing acid etching liquid, the first ejector (7) is inserted into the dissolution absorption cylinder (1), and the chlorine pipeline (6) is connected with a gas injection port of the first ejector; a liquid injection port of the first ejector (7) is provided with liquid pipelines which are provided with pumps and are connected with a liquid outlet at the bottom of the dissolution absorption cylinder (1);
the dissolution absorption cylinder (1) is connected with the ferrous chloride absorption device (2) through a first gas pipeline (9);
wherein the ferrous chloride absorption device (2) comprises: a first recovery tank (2-1) at the lower part and a first spray absorption tank (2-2) at the upper part; the first spraying absorption groove (2-2) at the upper part is at least 1 layer; the first spray absorption tank (2-2) includes: a spray head (2-2-1) at the top of the first spray absorption tank and a discrete filler (2-2-2) at the lower part of the first spray absorption tank; the top of the first spraying absorption tank at the topmost layer of the ferrous chloride absorption device is provided with an air outlet which is connected with a second gas pipeline (10); air communication is carried out between the tank bodies of all layers in the ferrous chloride absorption device (2);
the second gas pipeline connects the ferrous chloride absorption device (2) with the liquid caustic soda washing tower (3);
wherein the liquid caustic washing column (3) comprises: a second recovery tank (3-1) at the lower part and a second spray absorption tank (3-2) at the upper part; the second spraying absorption groove (3-2) at the upper part is at least 1 layer; the second spray absorption tank (3-2) includes: a spray head at the top of the second spray absorption tank and a discrete filler at the lower part of the second spray absorption tank; and the top of the second spraying absorption groove at the topmost layer is provided with an air outlet for discharging waste gas.
Furthermore, air extraction devices are arranged in the first gas pipeline (9) and the second gas pipeline (10).
Further, still include: a ferrous chloride regeneration device (4), a vacuum volatilization device (5) and a second ejector (14);
the second ejector (14) is inserted into the dissolving and absorbing cylinder (1), liquid pipelines are arranged at a liquid injection port of the second ejector (14), and are provided with pumps and connected with a liquid outlet at the bottom of the dissolving and absorbing cylinder (1);
wherein the ferrous chloride regenerating device (4) comprises: a ferrous chloride regeneration device shell (4-1), a cation membrane (4-2), a cathode plate (4-3) and an anode plate (4-4); the shell (4-1) of the ferrous chloride regeneration device is divided into a cathode chamber and an anode chamber by a cation membrane (4-2); a cathode plate (4-3) is arranged in the cathode chamber, an anode plate (4-4) is arranged in the anode chamber, and the cathode plate and the anode plate are connected with the cathode and the anode of a power supply; the cathode chamber is used for containing a mixed solution of ferric chloride and ferrous chloride; the anode chamber is used for containing sulfuric acid solution;
wherein the vacuum volatilization device (5) comprises: a third recovery tank (5-1) at the lower part and a third spray absorption tank (5-2) at the upper part; the third spraying absorption groove (5-2) at the upper part is at least 1 layer; the third spray absorption tank (5-2) includes: a spray head at the top of the third spray absorption tank and a discrete filler at the lower part of the third spray absorption tank; the spray head sprays the solution in the lower third recovery tank (5-1);
wherein a pipeline is arranged between the first recovery tank (2-1) at the lower part of the ferrous chloride absorption device (2) and the cathode chamber of the ferrous chloride regeneration device (4) for connecting so as to convey the solution of the ferrous chloride absorption device (2) to the cathode chamber of the ferrous chloride regeneration device (4);
wherein the cathode chamber of the ferrous chloride regenerating device (4) is connected with a third recovery tank at the lower part of the vacuum volatilizing device (5) through a pipeline;
wherein, the third spray absorption groove at the topmost layer of the vacuum volatilization device (5) is provided with an air outlet which is connected with a pipeline and then connected with an air inlet of the second jet device;
the third recovery tank (5-1) at the lower part of the vacuum volatilization device (5) is also provided with a pipeline and a pump, and the solution in the third recovery tank (5-1) at the lower part is sent to the first recovery tank (2-1) at the lower part of the ferrous chloride absorption device (2).
Furthermore, a spray head of a third spray absorption tank (5-2) at the upper part of the vacuum volatilization device (5) is communicated with a third recovery tank (5-1) at the lower part through a pump and a pipeline.
Further, a liquid outlet and a liquid outlet pipeline are arranged at the bottom of the dissolution absorption cylinder (1), and the liquid outlet pipeline returns the acidic etching liquid to the etching production line.
Furthermore, the cathode plate (4-3) is a titanium alloy plate, and the anode plate (4-4) is a rare metal coating titanium plate.
Further, still include: the device comprises a controller (17), a chlorine concentration sensor (18), a ferrous chloride regenerating device power module (19), a ferrous chloride absorbing device spray head speed regulating module (20) and a vacuum volatilizing device spray head speed regulating module (21);
the output end of the chlorine concentration sensor (18) is connected with the input end of the controller (17);
the output end of the controller (17) is connected with the output ends of a ferrous chloride regenerating device power module (19), a ferrous chloride absorbing device spray head speed regulating module (20) and a vacuum volatilizing device spray head speed regulating module (21).
Namely a chlorine concentration sensor (18) is used for detecting the concentration of the chlorine;
the ferrous chloride regeneration device power module (19) is used for controlling the current of the cathode plate and the anode plate of the ferrous chloride regeneration device;
the ferrous chloride absorption device spray head speed regulating module (20) is used for controlling the spray speed of a spray head of a first spray absorption tank of the ferrous chloride absorption device;
and the vacuum volatilization device spray head speed regulating module (21) is used for controlling the spray speed of a spray head of a third spray absorption groove of the vacuum volatilization device.
The working method of the chlorine treatment equipment of the acid etching solution recovery system comprises the following steps:
chlorine gas generated in the electrolytic cell enters the dissolution absorption cylinder (1) through a chlorine gas pipeline, gas-liquid mixing is carried out under the vacuum effect generated by the first ejector, the chlorine gas reacts with acidic etching liquid containing cuprous chloride in the dissolution absorption cylinder to generate cupric chloride, and the etching liquid is returned back to the etching line for production and use after the reaction;
after the etching solution in the dissolution absorption cylinder is absorbed, chlorine which is not completely absorbed is absorbed by a ferrous chloride solution in a ferrous chloride absorption device, under the condition of solution spraying, the liquid is fully contacted with gas, and ferrous iron and chlorine react to generate a ferric trichloride solution;
and (3) treating the tail gas by using a ferrous chloride absorption device, then, treating the tail gas in an alkali washing tower, wherein the tail gas is discharged after reaching the standard after the gas is fully contacted and reacted with alkali liquid under the spraying condition.
The utility model has the advantages that:
(1) chlorine gas passes through the following steps: the dissolving and absorbing cylinder 1, the ferrous chloride absorbing device 2 and the liquid caustic soda washing tower 3 achieve the aim of processing chlorine; in particular, the ferrous chloride absorption device 2 and the liquid caustic soda washing tower 3 adopt the design of a multi-layer spraying recovery tank.
(2) The utility model provides a: the design of the ferrous chloride regenerating device 4 and the vacuum volatilizing device 5 ensures the regeneration of the solution of the ferrous chloride absorbing device 2, and can ensure that the production lines of the dissolving absorption cylinder 1, the ferrous chloride absorbing device 2 and the liquid caustic soda washing tower 3 are circularly operated, thereby reducing the production cost.
(3) The utility model discloses control system and control method have still been given to make "dissolve absorption jar 1, ferrous chloride absorbing device 2, liquid caustic soda scrubbing tower 3, ferrous chloride regenerating unit 4, the device 5" production line intelligent operation volatilizees in vacuum.
Drawings
The present invention will be described in further detail with reference to the following examples, which are not intended to limit the invention.
FIG. 1 is a schematic view showing the connection of chlorine treatment facilities of the acid etching solution recovery system according to the first embodiment.
FIG. 2 is a schematic diagram showing the structure of a chlorine gas treatment facility of the acid etching solution recovery system according to the first embodiment.
Fig. 3 is a schematic design diagram of the control system according to the first embodiment.
Detailed Description
In one embodiment, a chlorine treatment apparatus of an acid etching solution recovery system includes: the device comprises a dissolving absorption cylinder 1, a ferrous chloride absorption device 2, a liquid caustic soda washing tower 3, a ferrous chloride regeneration device 4, a vacuum volatilization device 5, a chlorine pipeline 6, a first ejector 7 and a second ejector 14;
the dissolution absorption cylinder 1 is used for storing acid etching liquid, the first ejector 7 and the second ejector 14 are inserted into the dissolution absorption cylinder 1, and the chlorine pipeline 6 is connected with a gas injection port of the first ejector;
liquid injection ports of the first ejector 7 and the second ejector 14 are respectively provided with a liquid pipeline, and the liquid pipelines are provided with pumps and are connected with liquid outlet ports at the bottom of the dissolution absorption cylinder 1;
a liquid outlet and a liquid outlet pipeline are arranged at the bottom of the dissolution absorption cylinder 1, and the liquid outlet pipeline returns the acidic etching liquid to the etching production line;
the dissolution absorption cylinder 1 is connected with the ferrous chloride absorption device 2 through a first gas pipeline 9;
the ferrous chloride absorption device 2 includes: a first recovery tank 2-1 at the lower part and a first spray absorption tank 2-2 at the upper part; the first spray absorption groove 2-2 at the upper part is at least 1 layer, as shown in figure 2, a double layer is adopted;
the first spray absorption tank 2-2 includes: a spray head 2-2-1 at the top of the first spray absorption tank and a discrete filler 2-2-2 (such as a sphere) at the lower part of the first spray absorption tank; a large number of gaps exist among the discrete fillers, so that the gas can rise; the spray head sprays the ferrous chloride solution, so that chlorine gas is in more sufficient contact with the ferrous chloride solution, and the chlorine gas is fully absorbed.
The bottom support plate of the first spraying absorption groove on the upper layer is provided with a plurality of through holes so as to facilitate the rising of chlorine.
The top of the first spray absorption groove at the topmost layer is provided with an air outlet which is connected with a second gas pipeline 10;
air extraction devices are arranged in the first air pipeline 9 and the second air pipeline 10.
The second gas pipeline connects the ferrous chloride absorption device 2 with the liquid caustic soda washing tower 3;
the liquid caustic washing column 3 comprises: a second recovery tank 3-1 at the lower part and a second spray absorption tank 3-2 at the upper part; the second spraying absorption groove 3-2 at the upper part is at least 1 layer, and as shown in figure 2, three layers are adopted;
the second spray absorption tank 3-2 includes: a spray head at the top of the second spray absorption tank, and a discrete filler (such as a sphere) at the lower part of the second spray absorption tank; a large number of gaps exist among the discrete fillers, so that the gas can rise; the spray head sprays the sodium hydroxide solution, so that chlorine gas is in more sufficient contact with the sodium hydroxide solution, and the chlorine gas is fully absorbed.
And the top of the second spraying absorption groove at the topmost layer is provided with an air outlet for discharging waste gas.
The ferrous chloride regenerating unit 4 includes: 4-1 parts of a ferrous chloride regeneration device shell, 4-2 parts of a cationic membrane, 4-3 parts of a cathode plate and 4-4 parts of an anode plate;
the shell 4-1 of the ferrous chloride regeneration device is divided into a cathode chamber and an anode chamber by the cationic membrane 4-2;
a cathode plate 4-3 is arranged in the cathode chamber, an anode plate 4-4 is arranged in the anode chamber, and the cathode plate and the anode plate are connected with the cathode and the anode of a power supply;
further, the cathode plate 4-3 is a titanium alloy plate, and the anode plate 4-4 is a rare metal coating titanium plate;
the cathode chamber is used for containing a mixed solution of ferric chloride and ferrous chloride, and a titanium alloy is used as an electrode; the anode chamber is used for containing sulfuric acid solution, and a rare metal coating titanium plate is used as an electrode.
A pipeline is arranged between the first recovery tank 2-1 at the lower part of the ferrous chloride absorption device 2 and the cathode chamber of the ferrous chloride regeneration device 4 to convey the solution of the ferrous chloride absorption device 2 to the cathode chamber of the ferrous chloride regeneration device 4.
The cathode chamber of the ferrous chloride regenerating device 4 is connected with a third recovery tank at the lower part of the vacuum volatilizing device 5 through a pipeline;
the vacuum volatilization device 5 comprises: a third recovery tank 5-1 at the lower part and a third spray absorption tank 5-2 at the upper part; the third spraying absorption groove 5-2 at the upper part is at least 1 layer, and 2 layers are adopted as shown in figure 2;
the third spray absorption tank 5-2 includes: a spray head at the top of the third spray absorption tank, and a discrete filler (such as a sphere) at the lower part of the third spray absorption tank; a large number of gaps exist among the discrete fillers, so that the gas can rise; the spray head sprays the solution in the lower third recovery tank 5-1 (the spray head is communicated with the lower third recovery tank 5-1 through a pump and a pipeline).
And the third spraying absorption groove at the topmost layer is provided with an air outlet which is connected with a pipeline and then connected with an air inlet of the second ejector.
The third recovery tank 5-1 at the lower part is also provided with a pipeline and a pump, and the solution in the third recovery tank 5-1 at the lower part is sent to the first recovery tank 2-1 at the lower part of the ferrous chloride absorption device 2.
The working principle of the utility model is as follows:
chlorine generated in the electrolytic cell enters the dissolution absorption cylinder 1 through a chlorine pipeline, gas-liquid mixing is carried out under the vacuum effect generated by the first ejector, the chlorine reacts with acidic etching liquid containing cuprous chloride (monovalent copper) in the dissolution absorption cylinder to generate cupric chloride (second-order copper), the etching liquid returns to an etching line for production and use after reaction, and the cuprous chloride generated after use flows to the dissolution absorption cylinder to be continuously and circularly absorbed.
The reaction formula is as follows: 2CuCl + Cl2=2CuCl2;CuCl2+Cu=2CuCl。
After the etching solution in the dissolution absorption cylinder is absorbed, the chlorine which is not completely absorbed is absorbed by a ferrous chloride solution (second-order iron) in a ferrous chloride absorption device, under the condition of solution spraying, the liquid is fully contacted with the gas, and the ferrous iron and the chlorine react to generate a ferric trichloride (ferric iron) solution.
The reaction formula is as follows: 2FeCl2+Cl2=2FeCl3
The tail gas treated by the ferrous chloride absorption device enters an alkali washing tower for treatment, and under the condition of spraying, the gas is fully contacted with alkali liquor for reaction (Cl2+2NaOH is NaCl + NaClO + H)2O), and the tail gas reaches the standard and is discharged.
It should be noted that: in order to continuously absorb the chlorine, a ferrous chloride regeneration device is needed to change the ferric chloride solution into ferrous chloride (namely, ferric iron is reduced into ferrous iron).
The process adopts an ionic membrane electrolysis process, an electrolytic cell is divided into a cathode chamber and an anode chamber by a cationic membrane, the cathode chamber is a mixed solution of ferric chloride and ferrous chloride, and a titanium alloy is used as an electrode; the anode chamber is sulfuric acid solution, and a rare metal coating titanium plate is used as an electrode; under the action of direct current, ferric trichloride (ferric iron) in the cathode chamber obtains electrons and is changed into ferrous chloride (ferrous iron); the obtained OH-in the anode chamber loses electrons and becomes oxygen. As the water in the anode chamber reacts, the water is gradually reduced, the concentration of the sulfuric acid is increased, and tap water needs to be supplemented. The electrode reaction is as follows:
reaction in the anode chamber: 2H2O-4e=O2(gas) +4H+
The cathode chamber reacts: FeCl3+e=FeCl2+Cl-
H in the sulfuric acid solution in the anode chamber due to the action of the current+Penetrating through the ionic membrane and entering into the cathode chamber, wherein the solution in the cathode chamberThe concentration of the medium HCl gradually increases, and side reactions (2H) occur when the concentration reaches a certain degree++2e=H2) The concentration is gradually increased, so that the regenerated ferrous chloride solution needs to be sent to a vacuum volatilization device for HCl absorption.
The vacuum volatilization device is a closed device and is connected with a gas inlet of a first ejector arranged on the dissolution absorption cylinder through a closed pipeline, the vacuum volatilization device generates vacuum degree under the high-speed ejection of a jet pump, HCl in the regenerated ferrous chloride is promoted to volatilize and enter the pipeline, the first ejector is mixed with the acidic etching solution for absorption, and the HCl is dissolved into the etching solution and returns to the etching line for production and use; and (4) sending the regenerated ferrous chloride with the HCl reduced back to a ferrous chloride absorption device for recycling.
The control system of the first embodiment:
the apparatus of example one is used to recover chlorine, however, in operation, the chlorine is not constant and therefore, it is necessary to use automated control.
The control system includes: the device comprises a controller 17, a chlorine concentration sensor 18, a ferrous chloride regenerating device power module 19, a ferrous chloride absorbing device spray head speed regulating module 20 and a vacuum volatilizing device spray head speed regulating module 21;
the output end of the chlorine concentration sensor 18 is connected with the input end of the controller 17;
the output end of the controller 17 is connected with the output ends of a ferrous chloride regenerating unit power module 19, a ferrous chloride absorbing device spray head speed regulating module 20 and a vacuum volatilizing device spray head speed regulating module 21.
Namely, the chlorine concentration sensor 18 is used for detecting the concentration of the chlorine; the ferrous chloride regeneration device power module 19 is used for controlling the current (voltage) of the cathode plate and the anode plate of the ferrous chloride regeneration device;
the ferrous chloride absorption device spray head speed regulating module 20 is used for controlling the spray speed of a spray head of a first spray absorption tank of the ferrous chloride absorption device;
the vacuum volatilization device spray head speed regulating module 21 is used for controlling the spray speed of a spray head of a third spray absorption groove of the vacuum volatilization device.
According to the control system, the current (voltage) of the cathode plate and the anode plate of the ferrous chloride regeneration device, the spraying speed of the spray head of the first spraying absorption tank of the ferrous chloride absorption device and the spraying speed of the spray head of the third spraying absorption tank of the vacuum volatilization device are adjusted according to the concentration of chlorine, so that the chlorine recovery strength is realized.
Particularly, when the concentration of chlorine is high, the current of the ferrous chloride regeneration device is increased at any time, so that the speed of reducing ferric chloride into ferrous chloride is increased; the flow velocity of the spray head of the ferrous chloride absorption device is increased, and the chlorine gas is promoted to be absorbed in the working procedure, so that the chlorine gas is controlled to enter the alkali washing tower, and the consumption cost of the liquid alkali absorption liquid is saved.
The above embodiment is the preferred embodiment of the present invention, which is only used to facilitate the explanation of the present invention, it is not right to the present invention, which makes the restriction on any form, and any person who knows commonly in the technical field can use the present invention to make the equivalent embodiment of local change or modification without departing from the technical features of the present invention.

Claims (7)

1. Chlorine treatment equipment of acid etching solution recovery system, characterized by including: the device comprises a dissolving absorption cylinder (1), a ferrous chloride absorption device (2), a liquid caustic soda washing tower (3), a chlorine pipeline (6), a first ejector (7), a first gas pipeline (9) and a second gas pipeline (10);
the dissolution absorption cylinder (1) is used for storing acid etching liquid, the first ejector (7) is inserted into the dissolution absorption cylinder (1), and the chlorine pipeline (6) is connected with a gas injection port of the first ejector; a liquid injection port of the first ejector (7) is provided with liquid pipelines which are provided with pumps and are connected with a liquid outlet at the bottom of the dissolution absorption cylinder (1);
the dissolution absorption cylinder (1) is connected with the ferrous chloride absorption device (2) through a first gas pipeline (9);
wherein the ferrous chloride absorption device (2) comprises: a first recovery tank (2-1) at the lower part and a first spray absorption tank (2-2) at the upper part; the first spraying absorption groove (2-2) at the upper part is at least 1 layer; the first spray absorption tank (2-2) includes: a spray head (2-2-1) at the top of the first spray absorption tank and a discrete filler (2-2-2) at the lower part of the first spray absorption tank; the top of the first spraying absorption tank at the topmost layer of the ferrous chloride absorption device is provided with an air outlet which is connected with a second gas pipeline (10); air communication is carried out between the tank bodies of all layers in the ferrous chloride absorption device (2);
the second gas pipeline connects the ferrous chloride absorption device (2) with the liquid caustic soda washing tower (3);
wherein the liquid caustic washing column (3) comprises: a second recovery tank (3-1) at the lower part and a second spray absorption tank (3-2) at the upper part; the second spraying absorption groove (3-2) at the upper part is at least 1 layer; the second spray absorption tank (3-2) includes: a spray head at the top of the second spray absorption tank and a discrete filler at the lower part of the second spray absorption tank; and the top of the second spraying absorption groove at the topmost layer is provided with an air outlet for discharging waste gas.
2. The chlorine treatment equipment of the acid etching solution recovery system according to claim 1, wherein the first gas pipe (9) and the second gas pipe (10) are provided with air extraction devices.
3. The chlorine treatment facility of the acidic etching solution recovery system of claim 1, further comprising: a ferrous chloride regeneration device (4), a vacuum volatilization device (5) and a second ejector (14);
the second ejector (14) is inserted into the dissolving and absorbing cylinder (1), liquid pipelines are arranged at a liquid injection port of the second ejector (14), and are provided with pumps and connected with a liquid outlet at the bottom of the dissolving and absorbing cylinder (1);
wherein the ferrous chloride regenerating device (4) comprises: a ferrous chloride regeneration device shell (4-1), a cation membrane (4-2), a cathode plate (4-3) and an anode plate (4-4); the shell (4-1) of the ferrous chloride regeneration device is divided into a cathode chamber and an anode chamber by a cation membrane (4-2); a cathode plate (4-3) is arranged in the cathode chamber, an anode plate (4-4) is arranged in the anode chamber, and the cathode plate and the anode plate are connected with the cathode and the anode of a power supply; the cathode chamber is used for containing a mixed solution of ferric chloride and ferrous chloride; the anode chamber is used for containing sulfuric acid solution;
wherein the vacuum volatilization device (5) comprises: a third recovery tank (5-1) at the lower part and a third spray absorption tank (5-2) at the upper part; the third spraying absorption groove (5-2) at the upper part is at least 1 layer; the third spray absorption tank (5-2) includes: a spray head at the top of the third spray absorption tank and a discrete filler at the lower part of the third spray absorption tank; the spray head sprays the solution in the lower third recovery tank (5-1);
wherein a pipeline is arranged between the first recovery tank (2-1) at the lower part of the ferrous chloride absorption device (2) and the cathode chamber of the ferrous chloride regeneration device (4) for connecting so as to convey the solution of the ferrous chloride absorption device (2) to the cathode chamber of the ferrous chloride regeneration device (4);
wherein the cathode chamber of the ferrous chloride regenerating device (4) is connected with a third recovery tank at the lower part of the vacuum volatilizing device (5) through a pipeline;
wherein, the third spray absorption groove at the topmost layer of the vacuum volatilization device (5) is provided with an air outlet which is connected with a pipeline and then connected with an air inlet of the second jet device;
the third recovery tank (5-1) at the lower part of the vacuum volatilization device (5) is also provided with a pipeline and a pump, and the solution in the third recovery tank (5-1) at the lower part is sent to the first recovery tank (2-1) at the lower part of the ferrous chloride absorption device (2).
4. The chlorine treatment equipment of the acid etching solution recovery system according to claim 3, wherein the spray head of the upper third spray absorption tank (5-2) of the vacuum volatilization device (5) is communicated with the lower third recovery tank (5-1) through a pump and a pipeline.
5. The chlorine treatment equipment of the acid etching solution recovery system according to any one of claims 1 to 4, wherein a solution outlet and a solution outlet pipeline are arranged at the bottom of the dissolution absorption cylinder (1), and the solution outlet pipeline returns the acid etching solution to the etching production line.
6. The chlorine treatment equipment of the acid etching solution recovery system according to claim 1, wherein the cathode plate (4-3) is a titanium alloy plate, and the anode plate (4-4) is a rare metal coated titanium plate.
7. The chlorine treatment facility of the acidic etching solution recovery system of claim 1, further comprising: the device comprises a controller (17), a chlorine concentration sensor (18), a ferrous chloride regenerating device power module (19), a ferrous chloride absorbing device spray head speed regulating module (20) and a vacuum volatilizing device spray head speed regulating module (21);
the output end of the chlorine concentration sensor (18) is connected with the input end of the controller (17);
the output end of the controller (17) is connected with the output ends of a ferrous chloride regenerating device power module (19), a ferrous chloride absorbing device spray head speed regulating module (20) and a vacuum volatilizing device spray head speed regulating module (21);
the chlorine concentration sensor (18) is used for detecting the concentration of the chlorine;
the power module (19) of the ferrous chloride regeneration device is used for controlling the current of the cathode plate and the anode plate of the ferrous chloride regeneration device;
the ferrous chloride absorption device spray head speed regulating module (20) is used for controlling the spray speed of a spray head of a first spray absorption tank of the ferrous chloride absorption device;
and the vacuum volatilization device spray head speed regulating module (21) is used for controlling the spray speed of a spray head of a third spray absorption groove of the vacuum volatilization device.
CN201921572125.6U 2019-09-20 2019-09-20 Chlorine treatment equipment of acid etching solution recovery system Active CN210699459U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921572125.6U CN210699459U (en) 2019-09-20 2019-09-20 Chlorine treatment equipment of acid etching solution recovery system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921572125.6U CN210699459U (en) 2019-09-20 2019-09-20 Chlorine treatment equipment of acid etching solution recovery system

Publications (1)

Publication Number Publication Date
CN210699459U true CN210699459U (en) 2020-06-09

Family

ID=70961152

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921572125.6U Active CN210699459U (en) 2019-09-20 2019-09-20 Chlorine treatment equipment of acid etching solution recovery system

Country Status (1)

Country Link
CN (1) CN210699459U (en)

Similar Documents

Publication Publication Date Title
CN105177583B (en) A kind of zero-emission acidic etching waste liquid circulation regeneration method and system
CN110496502A (en) The chlorine treatment device of acidic etching liquid recovery system, working method, control system, control method
CN111394726B (en) Acid etching solution recycling process
CN208279686U (en) Acidity etching liquid recycling system
CN204417598U (en) A kind of cupric micro-etched waste liquid recycling device
CN202492581U (en) Acid etching solution cyclic regeneration unit for printed wiring board
CN205867960U (en) Device is administered to ammonia nitrogen wastewater and acid etching liquid film electrolytic process chlorine
CN115135806A (en) Method and equipment for regenerating and recycling alkaline etching waste liquid
CN109943850B (en) System and method for improving regeneration and reuse rate of acidic etching solution
CN102560499A (en) Device for recycling printed circuit board acidic etching solution
CN105441950A (en) Regeneration and recycling technology for acid copper chloride etching waste liquid
CN210699459U (en) Chlorine treatment equipment of acid etching solution recovery system
CN104060270A (en) Circuit board etching and etching solution regeneration complete plant
CN204162793U (en) A kind of circuit board etching and etching solution regeneration complete equipment
CN210765518U (en) Acid etching solution cyclic regeneration system
CN112064030A (en) Printed circuit board alkaline etching solution suitable for copper extraction through electrolysis
CN111394727A (en) Acid etching solution cyclic regeneration system
CN202272952U (en) Device for cyclically regenerating micro-etching solution and recovering copper
CN213896005U (en) Electrochemical oxidation treatment device
CN106702387A (en) On-line alkaline ammonium sulfate etching waste liquid cyclic regeneration system
CN209836312U (en) System for improving regeneration and reuse rate of acidic etching solution
CN211612176U (en) Hydrogen chloride tail gas absorbing device of by-product high concentration hydrochloric acid
CN210674740U (en) Combined chlorine absorption device
CN209412325U (en) A kind of device of efficient activated acid etching solution
CN106086896A (en) Based on the wiring board acidity etching liquid recycling system in heavy metal containing wastewater treatment

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20220113

Address after: 518000 5b, Yingxie building, No. 6027, Binhe Avenue, Haibin community, Futian street, Futian District, Shenzhen, Guangdong Province

Patentee after: Guangdong Xinling Environmental Technology Co.,Ltd.

Address before: 201806 zone B, floor 2, building 1, No. 85, Hengle Road, Waigang Town, Jiading District, Shanghai

Patentee before: SHANGHAI BALING ENVIRONMENTAL PROTECTION TECHNOLOGY CO.,LTD.