CN210666261U

CN210666261U - Liquid crystal light adjusting film with pattern and/or character prepared by laser direct etching

Info

Publication number: CN210666261U
Application number: CN201921163534.0U
Authority: CN
Inventors: 李国增; 孙金礼; 汤立文
Original assignee: Zhuhai Singyes New Materials Technology Co ltd
Current assignee: Zhuhai Shuifa Xingye New Materials Technology Co ltd
Priority date: 2019-07-23
Filing date: 2019-07-23
Publication date: 2020-06-02
Anticipated expiration: 2029-07-23

Abstract

The utility model relates to a PDLC liquid crystal light adjusting film that has pattern and/or characters that laser direct etching prepared. The utility model discloses a product includes PET1 layer, ITO1 layer, PDLC layer, ITO2 layer and PET2 layer. The technical scheme of the utility model is that the ITO1 layer or the ITO2 layer is etched once by the laser etching machine, and the same etching line is formed at the same time; an ITO1 layer independent partition with the same shape and the same size is formed on the ITO1 layer and the ITO2 layer at the same time, and the ITO2 layer independent partition is formed on the ITO1 layer and the ITO2 layer. The PDLC light modulation film realizes the function of displaying patterns and/or characters by controlling the electrodes arranged on the independent partition of the ITO1 layer and the independent partition of the ITO2 layer respectively. The technical proposal of the utility model overcomes the defects of long process, difficult operation and low yield in the prior art; the operability of the technical scheme is improved, and an electrode control system is simplified. Under the conditions of realizing less electrodes and simple electrode control system, the display capability of patterns and characters of the product is improved.

Description

Liquid crystal light adjusting film with pattern and/or character prepared by laser direct etching

Technical Field

The utility model relates to a laser etching field, concretely relates to PDLC liquid crystal membrane that has pattern and/or characters that laser direct etching prepared.

Background

The PDLC Liquid Crystal film (Polymer Dispersed Liquid Crystal) is an optical film manufactured by the Liquid Crystal Polymer technology (PDLC) of the utility model. The technology mainly applies the switching of the macroscopic states of light transmission and light scattering by controlling the arrangement state of the liquid crystal through an electric field after the nematic liquid crystal and the molecular polymer are mixed so as to change the refractive index of the liquid crystal.

In the prior art, the preparation of the PDLC liquid crystal light modulation film generally comprises the steps of preparing an ITO coating on a PET film, producing a flexible, transparent and conductive PET-ITO film, uniformly coating a layer of Polymer Dispersed Liquid Crystal (PDLC) between the two PET-ITO films, and performing light or heat curing to prepare the PDLC light modulation film.

When the PDLC light adjusting film is electrified (in an ON state), liquid crystal molecules are orderly arranged under the action of an electric field, the refractive indexes of the molecular polymer and the liquid crystal material tend to be consistent, light scattering is greatly inhibited, and the PDLC light adjusting film is in a colorless and transparent state; when the PDLC light adjusting film is powered OFF (OFF state), liquid crystal molecules are in disordered orientation, the refractive indexes of the molecular polymer and the liquid crystal material are mismatched, the PDLC light adjusting film generates strong light scattering, and the appearance is milky white, colorful or black and is opaque.

When the PDLC liquid crystal dimming film is delivered from a dimming film manufacturer, for example, the new material science and technology company Limited in the Zhuhai industry, the PDLC liquid crystal dimming film is generally delivered in rolls, wherein each roll is 50-100 meters in length, and the maximum length is 1000 meters; the width is 1.2 meters to 2.0 meters. When the dimming film client uses, the dimming film of the roll-shaped incoming material is cut into a certain size, an electrode is made, the film is attached to glass or laminated into two layers of glass, and the whole piece of transparent and opaque switching is realized by electrifying. However, this does not satisfy the customer's requirement for a piece of light adjusting film to be partially transparent or opaque and display patterns in practical use.

Chinese patent application publication No. CN 108445667 a (an electronic louver film, glass, and control system based on PDLC liquid crystal dimming film), discloses a method for switching partial transparency or opacity of PDLC liquid crystal dimming film, in which an ITO1 layer and an ITO2 layer are respectively disposed on a flexible PET substrate, an etching line is disposed on one or two PET-ITO conductive films by using a laser etcher, the ITO1 layer and the ITO2 layer are divided into a plurality of pattern areas and background areas, then the two PET-ITO conductive films after being processed by etching process are mounted on a coating machine dedicated for PDLC liquid crystal dimming film, and bonded and cured by the PDLC layer to form a dimming film, electrodes are respectively disposed in each independent area on the ITO1 layer and the ITO2 layer of the dimming film, and after being powered on, the adjustment control and the pattern display control of transparency and the area opacity in any area can be realized.

The method for manufacturing the light adjusting film can realize partial transparency or non-transparency and pattern display control in one light adjusting film, but has the disadvantages of complex manufacturing process, large equipment investment and high cost, and restricts the use and the design of products.

SUMMERY OF THE UTILITY MODEL

In order to overcome the defects and the improvement technology in the prior art, the utility model provides a PDLC liquid crystal light adjusting film which is prepared by laser direct etching and has patterns and/or characters.

In order to realize the utility model, the utility model provides a following technical scheme:

the utility model discloses a technical scheme concretely relates to direct sculpture PDLC liquid crystal membrane of adjusting luminance of laser, the membrane of adjusting luminance that has pattern and/or characters of preparation. There is PDLC liquid crystal membrane product of adjusting luminance of pattern and/or characters to the product is kept flat and is taken as the example, adopts from last mode description down, includes: a PET1 layer, an ITO1 layer, a PDLC layer, an ITO2 layer, and a PET2 layer. In other words, the PET1 layer was the top layer, the ITO1 layer was adjacent to the PET1 layer; the PET2 layer is a bottom layer, and the ITO2 layer is adjacent to the PET2 layer; the middle layer is a PDLC layer which is respectively adjacent to the ITO1 layer and the ITO2 layer.

Meanwhile, etched lines are arranged on the ITO1 layer and the ITO2 layer. The PDLC light-adjusting film is etched once by a laser etching machine, etching lines are formed on the ITO1 layer and the ITO2 layer respectively, the etching lines are formed simultaneously, and the etching lines are identical in shape, equal in length and in an up-down overlapping corresponding relation. The ITO1 layer and the ITO2 layer are etched by laser, and simultaneously, an etching line is formed to divide the ITO1 layer or the ITO2 layer into mutually independent areas which are called independent partitions of the ITO1 layer or independent partitions of the ITO2 layer.

Wherein, the characteristic of the independent subarea of the ITO1 layer or the independent subarea of the ITO2 layer is that an independent area is formed around the independent subarea of the ITO1 layer or the independent subarea of the ITO2 layer by the etched lines and the edge of the ITO1 layer or the ITO2 layer; the ITO1 layer in the independent partition area of the ITO1 layer or the ITO2 layer in the independent partition area of the ITO2 layer are respectively connected into a whole body which can conduct electricity; and two adjacent layers of ITO1 are independently partitioned or two adjacent layers of ITO2 are independently partitioned, and are not electrically conductive or insulated from each other because they are completely isolated by the etched lines.

The ITO1 layer or the ITO2 layer is divided into independent partitions of the ITO1 layer or the ITO2 layer which are independent of each other by etching lines, wherein each independent partition of the ITO1 layer or each independent partition of the ITO2 layer is provided with an electrode, the electrodes are arranged on the edges close to the light modulation film, and the electrodes are connected with outgoing lines.

Wherein the etching line can be a straight line segment, a curved line segment, a broken line segment, a closed curve, a closed broken line or a combination thereof. The etch lines in the shape of closed curves or closed polylines are collectively referred to as closed etch lines.

And the PDLC light adjusting film is etched once by a laser etching machine, and completely same etching lines are formed on the ITO1 layer or the ITO2 layer at the same time. That is, after one or two times of etching, the ITO1 layer and the ITO2 layer simultaneously form an ITO1 layer independent partition and an ITO2 layer independent partition which have the same shape and the same size and are overlapped and corresponding up and down; meanwhile, the ITO1 layer independent subareas and the ITO2 layer independent subareas which have the same shape, the same size and the corresponding up-down overlapping are respectively provided with an electrode to form a pair of electrodes; by controlling the voltage of the pair of electrodes, the ITO1 layer independent partition and the ITO2 layer independent partition which are identical in shape, equal in size and corresponding in an up-down overlapping mode are controlled, and the purpose of controlling the optical characteristics of the PDLC light adjusting film is achieved.

Further, when the PDLC light-adjusting film is etched by a laser etching machine for one time and the formed etching line is a closed etching line, the closed etching line is in end-to-end connection, and the starting point and the end point coincide. The independent partitions of the ITO1 layer formed by one-time etching have the same shape and size as the independent partitions of the ITO2 layer, and are overlapped and correspond to each other. In this case, the etched ITO1 layer independent partition and the ITO2 layer independent partition are not provided with electrodes, and the pattern or characters thereof are displayed by controlling the background area with a pair of electrodes provided in the background area outside the pattern or characters.

Preferably, an electrode provided on the ITO1 layer or an electrode provided on the ITO2 layer is disposed on the same side of the PDLC liquid crystal dimming film; the same side refers to the left side, the right side, the upper side or the lower side of the PDLC light adjusting film. The electrodes are arranged so as to facilitate the fabrication of the common electrode; that is, several adjacent electrodes are connected to make a common electrode.

The technical scheme of the utility model, the preparation of PDLC liquid crystal membrane of adjusting luminance includes following step:

the method comprises the following steps: sputtering an ITO target onto the PET film through magnetic sputtering control equipment to prepare a PET-ITO conductive film;

step two: installing two PET-ITO conductive films on a special coating machine for a PDLC (polymer dispersed liquid crystal) dimming film, and coating and curing by using a prepared PDLC composition to prepare the PDLC dimming film;

step three: performing laser etching on the PDLC light adjusting film prepared in the step two by using a laser etching machine, and etching an etching line on the PDLC light adjusting film, wherein the depth of the etching line is based on cutting off the ITO conductive film;

step four: and preparing an electrode on each ITO1 layer independent subarea or each ITO2 layer independent subarea on the etched PDLC light adjusting film.

Further, the coating speed of the second step is set to be 10-50mm/s, and the UV curing power is adjusted to be 0.5mW/cm²～10mW/cm²(ii) a Preferably, the coating speed is 25-45mm/s, and the UV curing power is 3mW/cm²～ 8.5mW/cm²。

The electrodes are arranged in the area of each ITO1 layer independent partition or each ITO2 layer independent partition and are close to the edge of the PDLC light modulation film, the electrodes are arranged close to the edge of the light modulation film, so that the outgoing line can be connected and the outgoing line can be conveniently wired, meanwhile, the electrodes and the outgoing line can be covered by frames conveniently, and the attractiveness and safety of products are improved.

Furthermore, the technical scheme of the utility model, also can directly use the PDLC liquid crystal membrane of adjusting luminance that obtains from manufacture factory or market, through above-mentioned step three and step four, accomplish preparation.

According to the requirement, in order to obtain the display effect of ideal patterns or characters, the etching line can be drawn into a CAD graph, and necessary rounding processing is carried out on the peak part of the graph, so that the adjacent etching line segments are in smooth transition. In addition, the arrangement position of the electrodes is planned at the same time. If the pattern or character formed by etching the line does not need to be electrified and controlled, the position of the electrode can be temporarily ignored.

The utility model discloses a laser etching equipment directly carries out the sculpture to PDLC liquid crystal membrane of adjusting luminance, according to the pattern and/or the characters bandwagon effect of the product of predesign, prepares out the PDLC liquid crystal membrane of adjusting luminance that has pattern and/or characters.

In the technical scheme disclosed by the utility model, through the setting and the control to the laser etching machine, the operation of laser etching each time, ITO1 layer and ITO2 layer can be opened simultaneously, form the identical etching line in ITO1 layer and ITO2 layer simultaneously; therefore, the etching lines, such as the straight line segment, the curved line segment, the broken line segment, the closed curve and/or the closed broken line, are etched at one time by the laser, and the portions of the ITO1 layer and the ITO2 layer to be etched are opened at the same time. In order to ensure that patterns and/or characters and the like prepared by laser etching can be connected with a driving power supply, each independent ITO1 layer independent partition or each independent ITO2 layer independent partition on the ITO1 layer or the ITO2 layer is required to be provided with an electrode close to the edge of the dimming film; further, each pair of the ITO1 layer independent subareas and the ITO2 layer independent subareas which are formed simultaneously by one-time etching, have the same shape and size, are overlapped up and down and correspond to each other, and electrodes arranged on the independent subareas form a pair of electrodes; the voltage of the pair of electrodes is controlled by connecting a power supply control mechanism, the optical characteristics of the ITO1 layer independent subareas and the ITO2 layer independent subareas which have the same shape and size and are overlapped up and down correspondingly are controlled, and the purposes of controlling the optical characteristics of the PDLC light modulation film and controlling the display and hiding of patterns and characters on the PDLC light modulation film are achieved.

In the utility model, the thickness of the PET1 layer or the PET2 layer of the PDLC light adjusting film is 20-300 μm; preferably the thickness of the PET1 layer or the PET2 layer is 40-275 μm; more preferably the thickness of the layer of PET1 or PET2 is 90-220 μm; most preferably the layer of PET1 or PET2 has a thickness of 188 μm. The thickness of the ITO1 layer or the ITO2 layer of the PDLC light adjusting film is 20-110 nm; the thickness of the ITO1 layer or the ITO2 layer is preferably 50-100 nm; most preferably the thickness of the layer of ITO1 or ITO2 is 70-90 nm. The thickness of the PDLC layer of the PDLC light adjusting film is 5-200 μm; the thickness of the PDLC layer is preferably 8-120 μm; more preferably the thickness of the PDLC layer is 10-30 μm; most preferably, the thickness of the PDLC layer is 15-20 μm. The etching line width of the PDLC light adjusting film is 3-80 mu m; preferably, the width of the etching line is 5-65 μm; more preferably, the width of the etching line is 7 to 60 μm; most preferably, the etched line width is 10-15 μm.

Technical scheme in, between the pattern, between pattern and characters, between characters and characters, between pattern or characters and electrodes, be connected by narrow ITO layer, be called ITO layer joining region. For example, the ITO1 layer or ITO2 layer is etched multiple times by a laser etcher, and in some regions, for the purpose of conduction, a narrow ITO layer region is designed to be formed between two etched lines so as to make conduction between patterns, patterns and characters, characters and characters, and patterns or characters and electrodes, and these narrow ITO layer regions are collectively called ITO layer connection regions. In the PDLC light adjusting film, the width of an ITO layer connecting area of the PDLC light adjusting film is 0.1-2.0 mm; preferably, the width of the ITO layer connecting region is 0.2-1.0 mm; most preferably, the width of the ITO layer connecting region is 0.4-0.8 mm. The width of the ITO layer connection region varies according to the pattern area and the driving power voltage, and is generally designed to be as small as possible for the sake of the overall beauty.

In the technical scheme of the utility model, the laser etching machine is arranged on the marble substrate, and the PDLC liquid crystal dimming film is flatly fixed on the workbench distributed with vacuum pores by adopting a vacuum adsorption mode; the adopted solid/optical fiber laser can select one of 1064nm, 532nm or 355nm, and the line width is 20 microns +/-5 microns; the etching power is 5-30W adjustable; the laser head moves horizontally in XY direction relative to the etching object, the maximum horizontal moving speed is 600mm/S, and the maximum moving acceleration is 1G; the specific etching operation is set as follows: the laser light spot is focused on the ITO1 layer or the ITO2 layer and is 50-220 mu m away from the vertical distance of the base point of the equipment; the etching speed is 1000-4000mm/s, the frequency is 20-300KHZ, the pulse width is 5-50ns, and the spot etching time is 0.01-0.2 ms. The optimal maximum horizontal moving speed of the laser head is 550mm/S, and the maximum moving acceleration is 0.8G; the laser light spot is focused on the ITO1 layer or the ITO2 layer and is vertically 80-200 mu m away from the base point of the equipment; the etching speed is 1500-. More preferably, the horizontal moving speed of the laser head is 500mm/S, and the maximum moving acceleration is 0.65G; the laser light spot is focused on the ITO1 layer or the ITO2 layer, and the vertical distance from the equipment base point is 100-180 mu m; the etching speed is 1800-.

The etched product prepared by adopting the laser etching equipment has uniform line lines etched, and the linewidth difference in the same direction is less than or equal to 3 mu m; the lateral erosion of the lines is less than or equal to 3 mu m on a single side; no burr, no wave, no gap and no edge breakage; under the normal condition of the bonding force between the PDLC layer and the ITO1 layer and between the PDLC layer and the ITO2 layer, even if a large corner or a peak curve is etched, an explosion point cannot be generated, and the effect is better when the bonding force is larger.

In addition, the laser source may also be a picosecond pulse width laser with a frequency of 100kHz to 1000kHz, with ultrashort pulse widths sufficient to "cold" ablate material. Furthermore, the femtosecond laser has better effect.

Preferably, for a piece of PDLC (polymer dispersed liquid crystal) dimming film which is subjected to laser etching, the electrode arranged on the ITO1 layer is longitudinally arranged at the left edge of the dimming film, the electrode arranged on the ITO2 layer is longitudinally arranged at the right edge of the dimming film; more preferably, a plurality of electrodes arranged on the same side and adjacent to each other are formed as a common electrode.

The utility model discloses among the technical scheme, with independent subregion in every ITO1 layer and the independent subregion in ITO2 layer be connected the electrode, its preparation, including following step:

s1: on a piece of PDLC (polymer dispersed liquid crystal) dimming film subjected to laser etching, the position of an electrode on an independent partition of an ITO (indium tin oxide) 1 layer is determined, then a PET (polyethylene terephthalate) 2 layer and an ITO2 layer with the width of 8mm are cut at the position of the electrode, and the lower ITO1 layer is exposed;

s2: wiping off residues of the PDLC composition remained on the ITO1 layer by using a 99.99% ethanol solution, coating a silver paste on the ITO1 layer by using a screen printing method, and drying the coated silver paste by using a hot air blower;

s3: pasting a copper foil with the width of 5mm on the surface of the dried silver paste;

s4, determining the position of the electrode on the independent partition of the second ITO1 layer, and repeating the steps; until the electrodes corresponding to all the independent partitions of the ITO1 layer are manufactured;

s5: welding a lead-out wire on the surface of the copper foil; or, for convenience of operation, lead-out wires can be uniformly welded on the surfaces of all copper foils after the electrodes of the ITO2 layer are manufactured;

s6: determining the position of an electrode arranged in an independent partition on the ITO2 layer, and then cutting off a PET1 layer and an ITO1 layer with the width of 8mm at the position of the electrode to expose the lower ITO2 layer;

s7: wiping off residues of the PDLC composition remained on the ITO2 layer by using a 99.99% ethanol solution, coating a silver paste on the ITO2 layer by using a screen printing method, and drying the coated silver paste by using a hot air blower;

s8: pasting a copper foil with the width of 5mm on the surface of the dried silver paste;

s9, determining the position of the electrode on the independent partition of the second ITO2 layer, and repeating the operation until the electrodes corresponding to all the independent partitions of the ITO2 layer are manufactured;

s10: and welding the lead wire on the surface of the copper foil manufactured above.

Preferably, a laser etched PDLC light modulation film, all electrodes arranged on the ITO1 layer are arranged on the left side of the light modulation film and close to the edge of the film, and part of adjacent electrodes or all the electrodes are connected to form a common electrode; the electrode provided by the ITO2 layer film is arranged on the right side of the light adjusting film.

The technical proposal of the utility model also comprises the PDLC liquid crystal light adjusting film which is prepared by the above and has patterns and/or characters. The PDLC light adjusting film with patterns and/or characters comprises a PET1 layer, an ITO1 layer, a PDLC layer, an ITO2 layer and a PET2 layer.

And the ITO1 layer or the ITO2 layer is provided with etched lines, the PDLC light adjusting film is etched by a laser etching machine at one time, and the completely same etched lines are formed on the ITO1 layer or the ITO2 layer at the same time. The ITO1 layer or the ITO2 layer is divided into mutually independent areas through laser etching, and the areas are called an independent partition of the ITO1 layer and an independent partition of the ITO2 layer.

Further, in the ITO1 layer or ITO2 layer, the ITO1 layer independent partition or ITO2 layer independent partition is surrounded by the etched line in the ITO1 layer and the edge of ITO1 layer or the etched line in the ITO2 layer and the edge of ITO2 layer, forming an independent area; in the independent subarea area of the ITO1 layer or the independent subarea area of the ITO2 layer, the ITO1 layer or the ITO2 layer is connected into a conductive whole; and two adjacent layers of ITO1 are independently partitioned or two adjacent layers of ITO2 are independently partitioned, and are not electrically conductive or insulated from each other because they are completely isolated by the etched lines. The ITO1 layer or the ITO2 layer is divided into independent partitions of the ITO1 layer or the independent partitions of the ITO2 layer by etching lines on the ITO1 layer or the ITO2 layer, an electrode is arranged on each independent partition, the electrodes are arranged on the edges close to the light modulation film, and lead-out wires are connected to the electrodes.

Wherein, after one-time etching, completely same etching lines are formed on the ITO1 layer and the ITO2 layer; that is, after one or two times of etching, an independent partition of the ITO1 layer and an independent partition of the ITO2 layer which have the same shape and the same size are formed on the ITO1 layer and the ITO2 layer at the same time.

Preferably, an electrode provided on the ITO1 layer or an electrode provided on the ITO2 layer is disposed on the same side of the PDLC liquid crystal dimming film; the same side refers to the left side, the right side, the upper side or the lower side of the PDLC light adjusting film.

More preferably, several electrodes arranged on the same side are connected to form a common electrode.

Compared with the prior art, the utility model have following advantage:

1. the technical proposal of the utility model overcomes the defects of long process, difficult operation and low yield in the prior art; the operability of the technical scheme is improved, and an electrode control system is simplified.

2. By the utility model discloses a product that technical scheme prepared has realized the optical control of the independent subregion of each ITO that is formed by etching the line, needs electrode small in quantity, under the simple condition of electrode control system, has improved the display ability of product pattern and characters.

Drawings

Fig. 1 is a schematic diagram of an embodiment of a PDLC liquid crystal light modulation film according to the present invention;

fig. 2 is a schematic cross-sectional view of a PDLC liquid crystal light modulation film structure according to the present invention;

fig. 3 is a schematic diagram of another embodiment of the PDLC liquid crystal light modulation film according to the present invention.

Fig. 4 is a schematic diagram of another embodiment of the PDLC liquid crystal light modulation film according to the present invention;

fig. 5 is a schematic view of another embodiment of the PDLC liquid crystal light modulation film according to the present invention;

fig. 6 is a schematic view of another embodiment of the PDLC liquid crystal light modulation film according to the present invention;

fig. 7 is a schematic view of another embodiment of the PDLC liquid crystal light modulation film according to the present invention;

fig. 8 is a schematic diagram of another embodiment of the PDLC liquid crystal light modulation film according to the present invention.

The reference numbers in the above figures are as follows:

1, etching a line A; 2, etching a line B; 3, an electrode A;

4, an electrode B; 5, closing an etching line; 6 PET1 layer;

7 layers of ITO 1; 8 PDLC layer; 9 layers of ITO 2;

layer 10 PET2 layer 11 ITO layer connection region 12 common electrode.

In order to make the purpose and technical solution of the embodiments of the present invention clearer, the technical solution of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings and the implementation examples of the embodiments of the present invention. It is to be understood that the embodiments described are only some of the embodiments of the present invention, and not all of them. All other embodiments that can be made by a person skilled in the art without creative efforts based on the described embodiments of the present invention belong to the protection scope of the present invention.

Detailed Description

The following further describes a specific embodiment of the present invention with reference to the drawings by way of specific examples, which are intended to describe the technical solution in detail, but not to limit the technical solution.

Fig. 2 is a PDLC liquid crystal light modulation membrane structure cross section schematic diagram, as shown in fig. 2, PDLC liquid crystal light modulation membrane includes from last to down in proper order: PET1 layer 6, ITO1 layer 7, PDLC layer 8, ITO2 layer 9, and PET2 layer 10. Fig. 2 also shows electrode A3 disposed on ITO1 layer 7 and electrode B4 disposed on ITO2 layer 9.

Fig. 1 shows a specific embodiment of the technical solution of the present disclosure;

example 1

As shown in fig. 1, in this embodiment 1, three rows of patterns are etched on the PDLC liquid crystal dimming film from top to bottom, and each row of patterns is composed of two common leaf patterns and two maple leaf patterns, and four patterns are alternated.

Taking the uppermost row of patterns as an example, the patterns are composed of an etching line A1 and an etching line B2, and an electrode A3 and an electrode B4 are respectively arranged on the left side and the right side of the PDLC light modulation film; meanwhile, in this embodiment 1, the electrode a3 on the left side of the PDLC liquid crystal dimming film is provided commonly on the ITO1 layer 7, and the electrode B4 on the right side of the PDLC liquid crystal dimming film is provided commonly on the ITO2 layer 9.

In this embodiment, the thickness of the PDLC liquid crystal light adjusting film, PET1 layer 6 or PET2 layer 10 is 150 μm; the thickness of the ITO1 layer 7 or the ITO2 layer 9 is 40 nm; the thickness of the PDLC layer 8 is 20 μm; the width of the ITO layer connecting area 11 is 0.8 mm; the etched line width was 30 μm. The patterned PDLC light-adjusting film is prepared by the following steps:

the method comprises the following steps: and sputtering the ITO target onto the PET film through magnetic sputtering control equipment to prepare the PET-ITO conductive film.

Step two: installing two PET-ITO conductive films on a special coating machine for a PDLC (polymer dispersed liquid crystal) dimming film, and coating and curing by using a PDLC composition to prepare the PDLC dimming film; wherein the coating speed was set to 30mm/s and the UV curing power was adjusted to 2.5mW/cm²。

Step three: and D, performing laser etching on the PDLC light adjusting film prepared in the step two by using a laser etching machine, wherein the etching line depth is based on cutting off the ITO conductive film. Line a1 is etched and line B2 is etched in sequence. Repeating the operation to finish the three-row pattern etching.

Wherein, the PDLC light adjusting film is flatly fixed on a workbench distributed with vacuum pores in a vacuum adsorption mode; the adopted solid/optical fiber laser is 532nm type, and the laser head horizontally moves in XY directions relative to an etching object; the specific etching operation is set as follows: the laser light spot is focused on the ITO1 layer or the ITO2 layer and is 110 microns away from the base point of the equipment in a vertical mode; the etching speed is 2200mm/s, the frequency is 180KHz, the pulse width is 38ns, and the spot etching time is 0.02 ms.

Step four: near the film edge of the PDLC liquid crystal light adjusting film after etching, three electrodes a3 on the left side and three electrodes B4 on the right side were prepared in this order.

In example 1, the preparation of the electrode a3 and the electrode B4 includes:

s11: cutting off a PET2 layer 10 thin film and an ITO2 layer 9 with the width of 8mm at the position of an electrode A3 on the PDLC light modulation film subjected to laser etching in the third step, and exposing the lower ITO1 layer 7; as shown on the left side of fig. 2;

s12: wiping off residues of the PDLC composition remaining on the ITO1 layer 7 using a 99.99% ethanol solution, coating a silver paste on the ITO1 layer 7 using a screen printing method, and then drying the coated silver paste using a hot air blower;

s13: pasting a copper foil with the width of 5mm on the surface of the dried silver paste;

s14, determining the position of the electrode on the second ITO1 layer independent partition, repeating the steps, and finishing the manufacture of the electrodes corresponding to all the ITO1 layer independent partitions on the left side of the PDLC light adjusting film;

s15: welding outgoing lines on the surface of the manufactured copper foil to finish the manufacturing of an electrode with an ITO1 layer;

s16: determining the position of an electrode B4 arranged in an independent partition on the ITO2 layer 9, and then cutting off a PET1 layer 6 with the width of 8mm and an ITO1 layer 7 at the position of an electrode B4 to expose the ITO2 layer 9 below; as shown on the right side of fig. 2;

s17: wiping off residues of the PDLC composition remained on the ITO2 layer 9 by using a 99.99% ethanol solution, coating silver paste on the ITO2 layer 9 by using a screen printing method, and drying the coated silver paste by using a hot air blower;

s18: pasting a copper foil with the width of 5mm on the surface of the dried silver paste;

s19, determining the position of the electrode B4 on the independent partition of the second ITO2 layer, and repeating the operation until the electrodes corresponding to all the independent partitions of the ITO2 layer are manufactured;

s20: and welding the lead wire on the surface of the copper foil manufactured above.

As can be seen from fig. 1, each row of patterns is formed by two etching lines, and after two times of etching, the ITO1 layer 7 and the ITO2 layer 9 are simultaneously formed with the same shape and size, and are overlapped up and down with the corresponding ITO1 layer independent partition and the ITO2 layer independent partition, so as to form a common leaf pattern and a maple leaf pattern. Then, each ITO1 layer independent partition or each ITO2 layer independent partition is provided with an electrode which is respectively positioned at the left side and the right side of the product. The row of patterns is transparent and opaque, and is controlled by the two electrodes.

The second and third row patterns, their design principles and electrical manipulation modes, are exactly the same as the first row. In practical use of the product, three electrodes A3 on the left side and the same position on an ITO1 layer 7 and three electrodes B4 on the right side and the same position on an ITO2 layer 9 are controlled, so that the three rows of patterns respectively generate light transmission and light non-transmission effects, and the purpose of displaying the patterns is achieved.

Specifically, through different control schemes of the electrodes, various visual effects such as simultaneous transparency of three rows of patterns, sequential transparency of three rows of patterns, linkage of a first row of patterns and a third row of patterns and the like can be realized; according to the visual effect design scheme, the method is realized by controlling each electrode.

Example 2

Fig. 3 shows another embodiment 2 of the technical solution disclosed in the present invention; wherein the three electrodes on the left side are prepared as one common electrode 12. In this example 2, exactly the same materials and parameters as in example 1 were used.

The procedure of example 1 was repeated, wherein the step of S11: on the PDLC liquid crystal light-adjusting film subjected to laser etching, at the positions of three electrodes a3, a PET2 layer 10 thin film having a width of 8mm and an ITO2 layer 9 were cut out, and the underlying ITO1 layer 7 was exposed.

In example 2, a common electrode 12 was fabricated on the left ITO1 layer 7 of the laser etched PDLC liquid crystal film to unify the electrically controlled operation of the ITO1 layer 7. That is, by controlling the voltages of the three electrodes on the right ITO2 layer 9 and the left common electrode 12, respectively, the optical characteristics of the three-row pattern can be controlled, respectively.

Example 3

Fig. 4 shows example 3 in the technical solution of the present invention, in this example, the thickness of the PDLC liquid crystal light modulation film, the PET1 layer 6 or the PET2 layer 10 is 300 μm; the thickness of the ITO1 layer 7 or the ITO2 layer 9 is 80 nm; the thickness of the PDLC layer 8 is 120 μm; the width of the ITO layer connecting area 11 is 1.0 mm; the etched line width was 80 μm.

As shown in fig. 4, three rows of patterns are etched on the PDLC liquid crystal dimming film, each row is composed of three letter patterns, which are respectively three letter patterns of english letters B, M and W. The difference from embodiment 1 is that each letter is composed of two separate etching lines, etching line a1 and etching line B2 are etched by two times of etching, a pair of letter patterns which are composed of independent partitions of ITO1 layer and independent partitions of ITO2 layer, have the same shape, the same size and overlap, and one electrode A3 is disposed on ITO1 layer 7 on the left side and one electrode B4 is disposed on ITO2 layer 9 on the right side, respectively, for the pair of letter patterns, and the letter patterns are controlled by the two electrodes.

The procedure of example 1 was repeated except that the coating speed in the second step was set to 50mm/s and the UV curing power was adjusted to 10mW/cm²(ii) a In the third step, nine letters in the scheme are etched in sequence from left to right and from top to bottom; the adopted solid/optical fiber laser is 1064nm in model, the laser spot is focused on an ITO1 layer or an ITO2 layer, and the vertical distance from the laser spot to a base point of the equipment is 220 microns; the etching speed is 4000mm/s, the frequency is 300KHZ, the pulse width is 45ns, and the spot etching time is 0.2 ms.

According to the characteristics described above and shown in fig. 4, it can be seen that the nine letter patterns of the product are respectively controlled by a pair of electrodes, so that the overall pattern can be designed in various changes by utilizing the two states of transparency and opacity of each pattern, and the generation and duration of each changed pattern can be realized by controlling the nine pairs of electrodes.

In example 3, the preparation of the letter pattern is given, and similarly, other letter patterns can be realized by the same principle and in a similar manner.

Example 4

Fig. 5 shows another embodiment 4 of the disclosed solution; in this embodiment 4, three electrodes positioned on the left side of the middle row letter pattern are prepared as one common electrode 12. In this example 4, exactly the same materials and technical parameters as in example 3 were used.

The procedure of example 3 was repeated to complete the fabrication of the scheme shown in FIG. 5.

Example 5

In this embodiment, the thickness of the PDLC liquid crystal light adjusting film, PET1 layer 6 or PET2 layer 10 is 20 μm; the thickness of the ITO1 layer 7 or the ITO2 layer 9 is 20 nm; the thickness of the PDLC layer 8 is 10 μm; the width of the ITO layer connecting area 11 is 0.2 mm; the etched line width was 8 μm.

Accordingly, the coating speed was set to 10mm/s, and the UV curing power was adjusted to 1.0mW/cm². The horizontal moving speed of the laser head is 500mm/S, and the maximum moving acceleration is 0.65G; the laser light spot is focused on the ITO1 layer or the ITO2 layer and is 150 microns away from the base point of the equipment in a vertical mode; the etching speed is 3500mm/s, the frequency is 100KHZ, the pulse width is 10ns, and the spot etching time is 0.05 ms.

The procedure of example 1 was repeated to complete the fabrication of the scheme shown in FIG. 6.

The difference is that, as shown in fig. 6, each pattern is formed by a closed curve or a closed broken line, that is, after one-time etching by using a laser etcher, an ITO1 layer and an ITO2 layer are respectively formed by an ITO1 layer independent partition and an ITO2 layer independent partition by one closed etching line 5; in addition, in the present example 5, in the background region on the left side of the PDLC liquid crystal light adjusting film, one electrode was formed on each of the ITO1 layer and the ITO2 layer, and the electrodes were named as electrode A3 and electrode B4; by controlling the pair of electrodes, electrode A3 and electrode B4, the optical state of the background area is manipulated to achieve the effect of showing or hiding the pattern formed by the closed etching lines 5.

Example 6

In this embodiment, the thickness of the PDLC liquid crystal light adjusting film, PET1 layer 6 or PET2 layer 10 is 188 μm; the thickness of the ITO1 layer 7 or the ITO2 layer 9 is 50 nm; the thickness of the PDLC layer 8 is 20 μm; the width of the ITO layer connecting area 11 is 0.6 mm; the etched line width was 10 μm.

Accordingly, the 355nm type can be selected as the solid/fiber laser, the coating speed is set to 35mm/s, and the UV curing power is adjusted to 8.6mW/cm². The maximum horizontal moving speed of the laser head is 500mm/S, and the maximum moving acceleration is 0.8G; the laser light spot is focused on the ITO1 layer or the ITO2 layer and is 120 mu m away from the base point of the equipment in a vertical way; the etching speed is 1800mm/s, the frequency is 120KHZ, the pulse width is 5ns, and the point etching is carried out0.15ms in between.

As shown in fig. 7, this scheme designs nine letter patterns each composed of one closed etched line 5, respectively. The procedure described in example 5 was repeated to complete the preparation of the solution shown in FIG. 7; the difference is that the positions of the electrode A3 and the electrode B4 are respectively arranged at the middle positions of the left side and the right side of the PDLC light adjusting film. Like embodiment 5, the product of this embodiment 6 also realizes the displaying or hiding effect of the letter pattern by manipulating the optical state of the background area.

Example 7

FIG. 8 shows a product design comprising a landscape design, in this example, the PDLC film, PET1 layer 6 or PET2 layer 10 is 188 μm thick; the thickness of the ITO1 layer 7 or the ITO2 layer 9 is 80 nm; the thickness of the PDLC layer 8 is 20 μm; the width of the etched line is 15 μm

The preparation operation is as follows:

the procedure of example 1 was repeated except that the first and second steps were omitted, and in example 6, the finished PDLC liquid crystal film was used as it is.

An electrode A3 disposed on the ITO1 layer, disposed on the left or bottom; the electrode B4, which was separately fabricated and disposed on the ITO2 layer, was disposed on the right side or bottom. Wherein, the third step: the adopted solid/optical fiber laser is 532nm type, the laser spot is focused on an ITO1 layer 7 or an ITO2 layer 9, and the vertical distance from the device base point is 50 mu m; the etching speed is 1000mm/s, the frequency is 50KHZ, the pulse width is 5ns, and the spot etching time is 0.01 ms.

As shown in fig. 8, the upper half shows two shell patterns including a rainbow represented by a circular arc etching line, two shell patterns composed of a curved etching line and a broken line etching line, and a sea wave line represented by a curved etching line; the lower half is a LOGO pattern formed by a broken line etching line and a circular arc line etching line. As shown in fig. 8, the ITO1 layer independent partition and the ITO2 layer independent partition located at the upper and lower sides are respectively defined by the edge of the PDLC liquid crystal dimming film and an etching line; the multiple independent partitions of ITO1 layer and ITO2 layer in the middle are defined by two etched lines and the ITO edge of PDLC liquid crystal dimming film, respectively. For each independent partition of the ITO1 layer or ITO2 layer, one electrode is disposed on each of the ITO1 layer 7 or ITO2 layer 9, forming a pair of electrodes.

In fig. 8, as an example, etching lines constituting two shell patterns are denoted as etching lines a 1; represents the etched line of the sea wave line, labeled etched line B2; ITO1 layer 7 and ITO2 layer 9 between etched line a1 and etched line B2, with electrode A3 on the left and electrode B4 on the right, respectively; by controlling the voltage between electrode A3 and electrode B4, the optical properties of the region between the shell pattern etch line a1 and the sea wave line etch line B2 were manipulated.

By controlling each pair of electrodes, the optical control of the pattern is realized, and the effect of showing the design of the overall pattern is achieved. It is also possible to exhibit an optical display effect of a specific region different from that of other portions by controlling the region.

It should be noted that, in the description of the present invention, the orientation or positional relationship indicated by the terms "center", "above", "below", "front", "rear", "upper left, lower left", "upper right", "lower right", "left side", "right side", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc. is the orientation or positional relationship shown based on the drawings, which is only for convenience of description of the present invention, and is not used to indicate or imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention.

The terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implying any number of technical features to be referred to. Thus, a feature defined by "first," "second," etc. may be explicitly or implicitly indicated as including one or more of such features. In the description of the present invention, "a plurality" means two or more unless otherwise specified.

In the description herein, the particular features, structures, materials, or characteristics disclosed may be combined in any suitable manner in any one or more embodiments or examples.

A specific embodiment of the present invention is further described above with reference to the accompanying drawings, and the specific embodiment is intended to describe the technical solution in detail, but not to limit the technical solution. The above-mentioned specific embodiments are only described for the preferred embodiments of the present invention, and are not intended to limit the technical concept and the protection scope of the present invention, and various modifications and improvements made by those skilled in the art to the technical scheme should fall into the protection scope of the present invention without departing from the design concept of the present invention.

Claims

1. A liquid crystal light adjusting film with patterns and/or characters prepared by laser direct etching sequentially comprises a PET1 layer (6), an ITO1 layer (7), a PDLC layer (8), an ITO2 layer (9) and a PET2 layer (10); the ITO layer 1 (7) and the ITO layer 2 (9) are provided with etching lines, and the ITO1 layer (7) or the ITO layer 2 (9) is divided into independent partitions of the ITO layer 1 or the ITO layer 2 which are mutually independent through laser etching;

the ITO film is characterized in that an ITO1 layer (7) or an ITO2 layer (9) in the independent subarea area of the ITO1 layer or the independent subarea area of the ITO2 layer are connected into a conductive whole; two adjacent ITO1 layers are independently partitioned or two adjacent ITO2 layers are independently partitioned, and are completely separated by the etched lines and mutually insulated; and simultaneously forming two identical etching lines on the ITO1 layer (7) and the ITO2 layer (9) by one-time etching of a laser etcher.

2. The liquid crystal dimming film with patterns and/or characters prepared by the laser direct etching according to claim 1, which is characterized in that after one or two times of etching by a laser etching machine, ITO1 layer (7) and ITO2 layer (9) are simultaneously formed with ITO1 layer independent subareas and ITO2 layer independent subareas which have the same shape and size and are overlapped and corresponding up and down; each independent ITO1 layer independent subarea or each independent ITO2 layer subarea is respectively provided with an electrode, the electrodes are arranged at the edge close to the light modulation film, and the electrodes are connected with outgoing lines.

3. The laser direct etching patterned and/or written liquid crystal light adjusting film according to claim 1, characterized in that the electrode a (3) disposed on the ITO1 layer (7) or the electrode B (4) disposed on the ITO2 layer (9) is disposed on the same side of the liquid crystal light adjusting film; the same side refers to the left side, the right side, the upper side or the lower side of the liquid crystal dimming film.

4. The laser direct etched patterned and/or written liquid crystal light adjusting film according to any of claims 1 to 3, characterized in that the thickness of the PET1 layer (6) or the PET2 layer (10) is 20-300 μm; the thickness of the ITO1 layer (7) or the ITO2 layer (9) is 20-110 nm; the thickness of the PDLC layer (8) is 5-200 mu m; the width of the etching line is 3-80 μm; the width of the ITO layer connection region (11) is 0.1-2.0 mm.

5. The laser direct etch patterned and/or written liquid crystal light film according to claim 4, characterized in that the thickness of the PET1 layer (6) or PET2 layer (10) is 40-275 μm; the thickness of the ITO1 layer (7) or the ITO2 layer (9) is 50-100 nm; the thickness of the PDLC layer (8) is 8-120 mu m; the width of the etching line is 5-65 μm; the width of the ITO layer connecting region is 0.2-1.0 mm.

6. The laser direct etching patterned and/or written liquid crystal light adjusting film according to claim 4, wherein the thickness of the PET1 layer (6) or the PET2 layer (10) is 90-220 μm; the thickness of the ITO1 layer (7) or the ITO2 layer (9) is 70-90 nm; the thickness of the PDLC layer (8) is 10-30 mu m; the width of the etching line is 7-60 μm; the width of the ITO layer connecting region is 0.4-0.8 mm.

7. A patterned and/or written liquid crystal dimming film prepared by laser direct etching according to any of claims 1 to 3, characterized in that several electrodes arranged on the same side are connected to make a common electrode (12).

8. The liquid crystal dimming film with patterns and/or characters prepared by the laser direct etching according to claim 1 or 2, wherein the etching line is a straight line segment, a curved line segment, a broken line segment, a closed curve, a closed broken line or a combination thereof.

9. The laser direct etching patterned and/or written liquid crystal light adjusting film according to any one of claims 1 to 3, characterized in that for a piece of liquid crystal light adjusting film that has been subjected to laser etching, the electrode A (3) disposed on the ITO1 layer (7) is disposed longitudinally at the left edge of the light adjusting film, and the electrode B (4) disposed on the ITO2 layer (9) is disposed longitudinally at the right edge of the light adjusting film.

10. The laser direct etching patterned and/or written liquid crystal light adjusting film according to any one of claims 1 to 3, wherein the etching line is a closed curve or a closed folding line, collectively referred to as a closed etching line (5).