CN210511060U - Central liquid supply device for etching liquid - Google Patents
Central liquid supply device for etching liquid Download PDFInfo
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- CN210511060U CN210511060U CN201921196991.XU CN201921196991U CN210511060U CN 210511060 U CN210511060 U CN 210511060U CN 201921196991 U CN201921196991 U CN 201921196991U CN 210511060 U CN210511060 U CN 210511060U
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Abstract
The utility model discloses an etching liquid central authorities supply liquid device belongs to chemical production technical field. Comprises a case, a liquid tank, a host and a liquid supply pump; the front of the case is embedded with an operation board, the operation board comprises a key position port board and a display screen, the key position port board is composed of a keying circuit, the key position port board is embedded in the right end of the inner side of the operation board, the display screen is embedded in the left end of the inner side of the operation board, supporting legs are welded on four corners of the bottom end of the case, a liquid distribution groove is formed in the left side of the case, and a machine disc is hinged to the lower end of the front of the case; the liquid tank is embedded in the middle of the inner side of the case, the etching liquid is stored through the liquid tank, the liquid injection pipe and the liquid distribution pipe which are arranged respectively, and the liquid is automatically distributed by opening and closing the valve port and running the pump body of the liquid supply pump, wherein the case and the partition plate are arranged to effectively isolate the liquid supply area from the electric control area, the safety of electric equipment is ensured, and the problem of potential safety hazard of the existing liquid supply pipeline is solved.
Description
Technical Field
The utility model relates to a chemical production technical field, especially an etching liquid central authorities supply liquid device.
Background
In the wet etching cleaning process, the etching solution usually needs to be supplied and distributed by using an independent isolation pipeline due to the corrosion characteristic, however, the existing etching solution pipeline liquid supply method has the following disadvantages in the practical use process:
1. the existing etching liquid supply mode is conveyed through a pipeline, an operator is difficult to configure the pipeline liquid supply mode according to the condition of the pipeline, and a liquid supply pipeline cannot be effectively applied to complex and automatic cleaning equipment;
2. because the etching liquid has corrosivity, the existing liquid supply pipeline is easy to have local liquid leakage due to the corrosivity of the etching liquid, and the liquid is volatilized into the air and mixed into corrosive gas, so that potential safety hazards exist;
based on the problems, the central liquid supply system suitable for etching liquid cleaning in the current era needs to be researched, the existing liquid supply mode is realized through a complex pipeline, the liquid distribution work of the automatic cleaning process is difficult to effectively adapt, and meanwhile, the liquid supply pipeline is easy to cause equipment paralysis due to the diffusion of corrosive gas, so that the practicability of the gas sensor is influenced to a certain extent.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model aims at the above-mentioned problem, provide an etching liquid central authorities supply liquid device, through setting up the liquid jar and dividing the notes liquid pipe that is equipped with, joining in marriage the liquid pipe and preserve the etching liquid agent to utilize wherein opening, closed and the liquid feed pump body operation of valve port to come automatic ration liquid, wherein the machine case can effectively keep apart with the setting of baffle and supply liquid region and automatically controlled region, guarantees the electrical equipment safety, has solved the problem that there is the potential safety hazard in current liquid supply circuit.
In order to achieve the above purpose, the utility model adopts the technical proposal that: a central etching liquid supply device comprises:
comprises a case, a liquid tank, a host and a liquid supply pump; an operation board is embedded in the front of the case and comprises a key position port board and a display screen, the key position port board is composed of a key circuit, the key position port board is embedded in the right end of the inner side of the operation board, the display screen is embedded in the left end of the inner side of the operation board, supporting legs are welded on four corners of the bottom end of the case, a liquid distribution groove is formed in the left side of the case, and a machine disc is hinged to the lower end of the front of the case; the liquid tank is embedded in the middle of the inner side of the case, the liquid tank is clamped with the inner wall of the case, a liquid injection pipe and a pair of liquid distribution pipes are arranged on the left side of the bottom end of the liquid tank in a penetrating manner, the other ends of the liquid injection pipe and the liquid distribution pipes penetrate through the liquid distribution groove, the liquid injection pipe is arranged at the lower end of the liquid distribution pipe, an air pipe is arranged on the upper end of the liquid tank in a penetrating manner, a valve pipe is sleeved on the upper end of the air pipe, and; the host is embedded in the inner side of the machine disc and clamped with the inner wall of the machine case, a terminal is inserted at the upper end of the host, the input end of the terminal is electrically connected with the output end of the host, and the output end of the terminal is electrically connected with the input end of the operation panel; the liquid supply pump is sleeved on the left side of the valve port pipe, and the input end of the liquid supply pump is electrically connected with the output end of the terminal;
according to the specific scheme, a partition plate is arranged between the liquid tank and the host, the upper end and the lower end of the partition plate are welded with the inner wall of the case, and the partition plate and the inner wall of the case are made of polypropylene materials.
According to the specific scheme, the inner sides of the liquid injection pipe and the liquid distribution pipe are respectively embedded with an electromagnetic valve port, and the input end of the electromagnetic valve port is electrically connected with the output end of the host machine.
In a specific scheme, the valve port of the valve port pipe is an electromagnetic valve port, the input end of the valve port pipe is electrically connected with the output end of the host, and the valve port pipe is made of PFA plastic.
According to the specific scheme, the upper end of the core plate is embedded with an alarm lamp, and the liquid supply pump is a diaphragm pump.
Due to the adoption of the technical scheme, the utility model discloses following beneficial effect has:
1. the utility model discloses etching liquid central solution feed device, through liquid agent jar and liquid injection pipe, liquid distribution pipe pipeline etc. that communicate with liquid agent jar, utilize the opening and closing of wherein pipeline valve body and the operation of feed pump, accomplish the automatic supply of etching liquid, improved the suitability of this solution feed system;
2. the etching liquid central liquid supply device utilizes the modular structural design, utilizes the case shell to seal the liquid supply module and the electric control module, and simultaneously isolates the space in the case by the partition plate, thereby effectively avoiding the occurrence of corrosive gas and the damage of electric equipment.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a schematic view of the front view of the internal structure of the present invention.
Fig. 3 is a schematic diagram of the side view internal structure of the present invention.
In the attached drawing, 1-case, 2-operation board, 3-machine plate, 4-liquid distribution tank, 5-liquid injection pipe, 6-liquid distribution pipe, 7-key position port board, 8-liquid tank, 9-air pipe, 10-main machine, 11-terminal, 12-partition board, 13-display screen, 14-valve port pipe and 15-liquid supply pump.
Detailed Description
The following detailed description of the embodiments of the invention will be made with reference to the accompanying drawings
The utility model relates to an etching liquid central liquid supply device, as shown in figures 1 to 3, comprising a case 1, a liquid tank 8, a host machine 10 and a liquid supply pump 15; the front of the case 1 is embedded with an operation board 2, the operation board 2 comprises a key position port board 7 and a display screen 13, the key position port board 7 is composed of a keying circuit, the key position port board 7 is embedded and arranged at the right end of the inner side of the operation board 2, the display screen 13 is embedded and arranged at the left end of the inner side of the operation board 2, supporting legs are welded at four corners of the bottom end of the case 1, a liquid distribution groove 4 is arranged in a groove at the left side of the case 1, and a machine disc 3 is hinged at the lower end of the front; the liquid tank 8 is embedded in the middle of the inner side of the case 1, the liquid tank 8 is clamped with the inner wall of the case 1, the left side of the bottom end of the liquid tank 8 is provided with a liquid injection pipe 5 and a pair of liquid distribution pipes 6 in a penetrating way, the other ends of the liquid injection pipe 5 and the liquid distribution pipes 6 penetrate through the liquid distribution tank 4, the liquid injection pipe 5 is arranged at the lower end of the liquid distribution pipe 6, the upper end of the liquid tank 8 is provided with an air pipe 9 in a penetrating way, the upper end of the air pipe 9 is sleeved; the host 10 is embedded in the inner side of the machine disc 3, the host 10 is clamped with the inner wall of the case 1, the upper end of the host 10 is inserted with a terminal 11, the input end of the terminal 11 is electrically connected with the output end of the host 10, and the output end of the terminal 11 is electrically connected with the input end of the operation panel 2; the liquid supply pump 15 is sleeved on the left side of the valve port pipe 14, and the input end of the liquid supply pump 15 is electrically connected with the output end of the terminal 11; the user operates the liquid supply system through the operation panel 2, the liquid supply system is controlled by the host computer 10, wherein the control mode of the host computer 10 is based on a PLC control system, the user closes the valve port pipe 14 through the operation panel 2, and opens the liquid supply pump 15, the liquid supply pump 15 pumps air pressure to act on the liquid agent tank 8 along with the air pipe 9, when the user butt joints an etching liquid source with the liquid injection pipe 5, the etching liquid flows into the liquid agent tank 8 along the pipeline of the liquid injection pipe 5 until the liquid agent in the liquid agent tank 8 is full of, the liquid supply is pushed out of the liquid distribution pipe 6 by the etching liquid in the liquid agent tank 8 after being operated by the liquid supply pump 15, and the liquid supply.
Wherein, a partition plate 12 is arranged between the liquid agent tank 8 and the main machine 10, the upper end and the lower end of the partition plate 12 are welded with the inner wall of the case 1, the partition plate 12 and the inner wall of the case 1 are both made of polypropylene, the space between the liquid agent tank 8 and the main machine 10 is isolated by the partition plate 12, the periphery of the liquid agent tank 8 is effectively isolated by the material of the partition plate 12, and the main machine 10 is prevented from being corroded by corrosive gas.
Wherein, annotate liquid pipe 5 and join in marriage the inboard of liquid pipe 6 pipeline and all scarf joint and have the electromagnetism valve port, electromagnetism valve port input and host computer 10 output electric connection, control through host computer 10 annotates the switching of liquid pipe 5 and join in marriage liquid pipe 6 pipeline.
Wherein, the valve port of the valve port pipe 14 is an electromagnetic valve port, the input end of the valve port pipe 14 is electrically connected with the output end of the host 10, the pipeline of the valve port pipe 14 is made of PFA plastic, and the material of the valve port pipe 14 can effectively avoid the erosion of acid-base liquid agent.
The liquid supply pump 15 is a diaphragm pump.
The utility model discloses the equipment that uses includes:
the model of the terminal is TJ 1;
the model of the display screen is STL 4.5;
the liquid supply pump is 6666120 and 324;
the model of the electromagnetic valve is 2W-45;
the above description is for the detailed description of the preferred possible embodiments of the present invention, but the embodiments are not intended to limit the scope of the present invention, and all equivalent changes or modifications accomplished under the technical spirit suggested by the present invention should fall within the scope of the present invention.
Claims (5)
1. A central liquid supply device for etching liquid is characterized in that:
comprises a case, a liquid tank, a host and a liquid supply pump; an operation board is embedded in the front of the case and comprises a key position port board and a display screen, the key position port board is composed of a key circuit, the key position port board is embedded in the right end of the inner side of the operation board, the display screen is embedded in the left end of the inner side of the operation board, supporting legs are welded on four corners of the bottom end of the case, a liquid distribution groove is formed in the left side of the case, and a machine disc is hinged to the lower end of the front of the case; the liquid tank is embedded in the middle of the inner side of the case, the liquid tank is clamped with the inner wall of the case, a liquid injection pipe and a pair of liquid distribution pipes are arranged on the left side of the bottom end of the liquid tank in a penetrating manner, the other ends of the liquid injection pipe and the liquid distribution pipes penetrate through the liquid distribution groove, the liquid injection pipe is arranged at the lower end of the liquid distribution pipe, an air pipe is arranged on the upper end of the liquid tank in a penetrating manner, a valve pipe is sleeved on the upper end of the air pipe, and; the host is embedded in the inner side of the machine disc and clamped with the inner wall of the machine case, a terminal is inserted at the upper end of the host, the input end of the terminal is electrically connected with the output end of the host, and the output end of the terminal is electrically connected with the input end of the operation panel; the liquid supply pump is sleeved on the left side of the valve port pipe, and the input end of the liquid supply pump is electrically connected with the output end of the terminal.
2. The central etching liquid supply device as claimed in claim 1, wherein: a partition plate is arranged between the liquid tank and the main machine, the upper end and the lower end of the partition plate are welded with the inner wall of the case, and the partition plate and the inner wall of the case are made of polypropylene materials.
3. The central etching liquid supply device as claimed in claim 1, wherein: the inner sides of the liquid injection pipe and the liquid distribution pipe are respectively embedded with an electromagnetic valve port, and the input end of the electromagnetic valve port is electrically connected with the output end of the host.
4. The central etching liquid supply device as claimed in claim 1, wherein: the valve port pipe is an electromagnetic valve port, the input end of the valve port pipe is electrically connected with the output end of the host, and the pipeline of the valve port pipe is made of PFA plastic.
5. The central etching liquid supply device as claimed in claim 1, wherein: the fluid supply pump is a diaphragm pump.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921196991.XU CN210511060U (en) | 2019-07-26 | 2019-07-26 | Central liquid supply device for etching liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921196991.XU CN210511060U (en) | 2019-07-26 | 2019-07-26 | Central liquid supply device for etching liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210511060U true CN210511060U (en) | 2020-05-12 |
Family
ID=70586124
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921196991.XU Active CN210511060U (en) | 2019-07-26 | 2019-07-26 | Central liquid supply device for etching liquid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210511060U (en) |
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2019
- 2019-07-26 CN CN201921196991.XU patent/CN210511060U/en active Active
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