CN210473531U - Adjusting and mounting mechanism for low-temperature plasma - Google Patents
Adjusting and mounting mechanism for low-temperature plasma Download PDFInfo
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- CN210473531U CN210473531U CN201921202039.6U CN201921202039U CN210473531U CN 210473531 U CN210473531 U CN 210473531U CN 201921202039 U CN201921202039 U CN 201921202039U CN 210473531 U CN210473531 U CN 210473531U
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Abstract
The utility model belongs to the technical field of air treatment equipment installation technique and specifically relates to an adjust installation mechanism for low temperature plasma. The utility model discloses an adjust installation mechanism for low temperature plasma is through the round platform type horizontal regulation seat of seting up bar gas guide port on the surface in main gas transmission pipeline inside, there is the inside assembly ring that is used for swing joint photocatalysis framework and plasma discharge frame at horizontal regulation seat right-hand member through annular adjustment groove swing joint, the mounted position of photocatalysis framework and plasma discharge frame is switched through rotatory inside assembly ring, the position of the inside spacing draw-in groove that the elasticity locking mechanism at utilization framework top inserted different positions comes the fixed framework, make whole processing apparatus's adjustable structure, it is convenient to adjust easy operation, utilize and strain a section of thick bamboo through the detachable metal of bolt fixedly connected with in horizontal regulation seat inside, thereby promote photoelectric reaction device work efficiency greatly.
Description
Technical Field
The utility model belongs to the technical field of air treatment equipment installation technique and specifically relates to an adjust installation mechanism for low temperature plasma.
Background
In recent years, the rapidly developing modern industry has led to a dramatic increase in toxic and harmful exhaust gases, and the amount of Volatile Organic Compounds (VOCs) produced thereby has increased dramatically, and VOCs have become one of the major gaseous pollutants afflicting countries around the world. With the increasing requirements of people on the environment and the quality of life, the discharge standard of VOCs is more and more strict. The conventional VOCs end treatment technology comprises the following steps: absorption, combustion, condensation, biological, and adsorption. In recent years, the development of low-temperature plasma and photocatalysis in the field of VOCs degradation is receiving general attention. But the fixed mode that is used for installing low temperature plasma and photocatalysis mechanism at present is single, and it is troublesome to adjust, can't switch over angle and position fast moreover, does not have pretreatment filtering mechanism yet, leads to more dust in the use, seriously influences low temperature plasma and photocatalysis's work efficiency.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model is: in order to solve the problems existing in the background technology, an improved adjusting and mounting mechanism for low-temperature plasma is provided, and the problems that the existing fixing mode for mounting the low-temperature plasma and a photocatalysis mechanism is single, the adjustment is troublesome, the angle and the position cannot be rapidly switched, and a pretreatment filtering mechanism is not provided, so that more dust is generated in the using process, and the working efficiency of the low-temperature plasma and the photocatalysis is seriously influenced are solved.
The utility model provides a technical scheme that its technical problem adopted is: an adjusting and installing mechanism for low-temperature plasma comprises a main gas transmission pipeline, a photocatalytic frame body and a plasma discharge frame, wherein the photocatalytic frame body and the plasma discharge frame are formed by an ultraviolet light source and two rows of metal nets with photocatalyst coatings, a circular truncated cone-shaped transverse adjusting seat with the outer diameter gradually reduced from left to right is arranged in the main gas transmission pipeline, a plurality of strip-shaped gas guide ports are formed in the arc-shaped surface of the outer side of the transverse adjusting seat, an annular adjusting groove is formed in the arc-shaped surface of the outer side of the right end of the transverse adjusting seat, an internal assembly ring is sleeved in the annular adjusting groove, an integrated connecting ring is arranged at the end, close to the internal assembly ring, of the photocatalytic frame body and the plasma discharge frame, the photocatalytic frame body and the plasma discharge frame are sleeved on the internal assembly ring through the connecting ring and movably connected with the internal assembly ring, an arc-shaped overturning limiting groove is formed in the periphery of the inner side surface of the, and elastic locking mechanisms are arranged at the top ends of the photocatalytic frame body and the plasma discharge frame.
Further, for convenient control and joint are fixed, elasticity locking mechanism including seting up at photocatalysis framework and plasma discharge frame and keeping away from the top flexible groove of the built-in elasticity stopper in go-between top, photocatalysis framework and plasma discharge frame lateral surface on set up the lateral control groove that communicates with the flexible groove in top mutually, elasticity stopper lateral surface be located the inside outside bellied lateral control piece that has of lateral control inslot, bar air guide mouth left side inner wall and the inboard arcwall face of arc upset spacing inslot all seted up with the inside spacing draw-in groove of elasticity stopper matched with.
Furthermore, for the convenience of elastic extrusion reset, the elastic limiting block comprises a telescopic insertion block positioned in the top telescopic groove and an extrusion spring elastically connected with the telescopic insertion block and the inner side surface of the top telescopic groove.
Further, for the convenience of overturning, the overturning communicating port communicated with the inside of the annular adjusting groove is formed in the right side end of the strip-shaped air guide port.
Furthermore, in order to improve the internal supporting force and keep the assembly stability, the inner side arc-shaped surface of the transverse adjusting seat is fixedly welded with an inner side supporting rod below the strip-shaped air guide port.
Furthermore, in order to facilitate the pretreatment of dust, the inner side of the inner side supporting rod inside the transverse adjusting seat is fixedly connected with a metal filter cylinder with a circular truncated cone-shaped structure through a bolt.
The beneficial effects of the utility model are that, the utility model discloses a regulation installation mechanism for low temperature plasma is through the round platform type horizontal regulation seat of seting up bar gas guide port on the surface at main gas transmission pipeline inside, there is the inside assembly ring that is used for swing joint photocatalysis framework and plasma discharge frame at horizontal regulation seat right-hand member through annular adjustment groove swing joint, the mounted position of photocatalysis framework and plasma discharge frame is switched through rotatory inside assembly ring, the position of the inside spacing draw-in groove that utilizes the elasticity locking mechanism at framework top to insert different positions comes the fixed framework, make whole processing apparatus's adjustable in structure, it is simple and convenient to adjust the operation, utilize and strain a section of thick bamboo through the detachable metal of bolt fixedly connected with in horizontal regulation seat inside, thereby promote photoelectric reaction device work efficiency greatly.
Drawings
The present invention will be further explained with reference to the drawings and examples.
Fig. 1 is a schematic structural diagram of the present invention.
Fig. 2 is a partial schematic view of the connecting end of the horizontal adjusting seat of the present invention.
In the figure, the gas filter comprises a main gas transmission pipeline 1, a plasma discharge frame 2, a plasma discharge frame 3, a transverse adjusting seat 4, a strip-shaped gas guide port 5, an annular adjusting groove 6, an internal assembling ring 7, a connecting ring 8, an arc-shaped overturning limiting groove 9, an elastic limiting block 10, a top telescopic groove 11, a lateral control groove 12, a lateral control block 13, an internal limiting clamping groove 14, an internal supporting rod 15 and a metal filter cylinder 16.
Detailed Description
The present invention will now be described in further detail with reference to the accompanying drawings. These drawings are simplified schematic drawings and illustrate the basic structure of the present invention only in a schematic manner, and thus show only the components related to the present invention.
The adjusting and mounting mechanism for low-temperature plasma shown in fig. 1 and fig. 2 comprises a main gas transmission pipeline 1, a photocatalytic frame body 2 and a plasma discharge frame 3 which are formed by an ultraviolet light source and two rows of metal nets with photocatalyst coatings, wherein the main gas transmission pipeline 1 is internally provided with a circular table type transverse adjusting seat 4 with the outer diameter gradually reduced from left to right, the outer arc surface of the transverse adjusting seat 4 is provided with 2 strip-shaped gas guide ports 5, the outer arc surface of the right end of the transverse adjusting seat 4 is provided with an annular adjusting groove 6, the annular adjusting groove 6 is internally sleeved with an internal assembly ring 7, the photocatalytic frame body 2 and the plasma discharge frame 3 are provided with an integrated structure connecting ring 8 near the internal assembly ring 7, the photocatalytic frame body 2 and the plasma discharge frame 3 are sleeved on the internal assembly ring 7 through the connecting ring 8 and movably connected with the internal assembly ring 7, the inner side surface of the main gas transmission pipeline 1 is positioned at the periphery of the transverse adjusting seat 4 and is provided with an arc overturning limiting groove 9, elastic locking mechanisms are arranged at the top ends of the photocatalytic frame body 2 and the plasma discharge frame 3.
Further, for convenience of control and clamping fixation, the elastic locking mechanism comprises a top telescopic groove 11 which is arranged on the top ends of the photocatalytic frame body 2 and the plasma discharge frame 3 far away from the connecting ring 8 and is internally provided with an elastic limiting block 10, a lateral control groove 12 communicated with the top telescopic groove 11 is arranged on the outer side surfaces of the photocatalytic frame body 2 and the plasma discharge frame 3, the outer side surface of the elastic limiting block 10 is positioned in the lateral control groove 12 and is provided with a lateral control block 13 protruding outwards, the inner wall of the left side of the strip-shaped air guide port 5 and the inner arc surface of the arc-shaped overturning limiting groove 9 are both provided with an inner limiting clamping groove 14 matched with the elastic limiting block 10, further, for convenience of elastic extrusion reset, the elastic limiting block 10 comprises a telescopic inserting block positioned in the top telescopic groove and an extrusion spring for elastically connecting the telescopic inserting block and the inner side surface of, the right side end of the strip-shaped gas guide port 5 is provided with an overturning communicating port communicated with the inside of the annular adjusting groove 6, furthermore, in order to improve the internal supporting force and keep the assembly stability, the inner side arc surface of the transverse adjusting seat 4 is positioned below the strip-shaped gas guide port 5 and is fixedly welded with an inner side supporting rod 15, further, in order to facilitate the pretreatment of dust, the inner side of the inner side supporting rod 15 positioned inside the transverse adjusting seat 4 is fixedly connected with a circular table type structure metal filter cylinder 16 through bolts, the adjusting and installing mechanism for low-temperature plasma is characterized in that the circular table type transverse adjusting seat 4 with the strip-shaped gas guide port 5 arranged on the surface is arranged inside the main gas transmission pipeline 1, the right end of the transverse adjusting seat 4 is movably connected with an internal assembling ring 7 for movably connecting the photocatalysis frame body 2 and the plasma discharge frame 3 through the annular adjusting groove 6, and the installing positions of the photocatalysis frame body 2 and the plasma discharge frame 3 are switched through rotating the internal assembling ring 7, the position of the frame body is fixed by inserting the elastic locking mechanism at the top of the frame body into the internal limiting clamping grooves 14 at different positions, so that the structure of the whole processing device is adjustable, the adjusting operation is simple and convenient, the detachable metal filter cylinder 16 is fixedly connected with the inside of the transverse adjusting seat 4 through bolts, and the working efficiency of the photoelectric reaction device is greatly improved.
In light of the foregoing, it will be apparent to those skilled in the art from this disclosure that various changes and modifications can be made without departing from the spirit and scope of the invention. The technical scope of the present invention is not limited to the content of the specification, and must be determined according to the scope of the claims.
Claims (6)
1. The utility model provides an adjust installation mechanism for low temperature plasma, includes main gas transmission pipeline (1), constitutes photocatalysis framework (2) and plasma discharge frame (3) by ultraviolet source and two rows of metal mesh that have photocatalyst coating, characterized by: the inner part of the main gas transmission pipeline (1) is provided with a circular table type transverse adjusting seat (4) with the outer diameter gradually reduced from left to right, the outer arc surface of the outer side of the transverse adjusting seat (4) is provided with a plurality of strip-shaped gas guide ports (5), the outer arc surface of the right end of the transverse adjusting seat (4) is provided with an annular adjusting groove (6), an inner assembling ring (7) is sleeved in the annular adjusting groove (6), the end of the photocatalytic frame body (2) and the plasma discharge frame (3) close to the inner assembling ring (7) is provided with an integrated connecting ring (8), the photocatalytic frame body (2) and the plasma discharge frame (3) are sleeved on the inner assembling ring (7) through the connecting ring (8) and movably connected with the inner assembling ring (7), the inner side surface of the main gas transmission pipeline (1) is positioned at the periphery of the transverse adjusting seat (4) and is provided with an arc-shaped overturning limiting groove (9), and elastic locking mechanisms are arranged at the top ends of the photocatalytic frame body (2) and the plasma discharge frame (3).
2. The tuning mechanism for low temperature plasma as claimed in claim 1, wherein: elasticity locking mechanism keep away from top flexible groove (11) of built-in elasticity stopper (10) in go-between (8) top including seting up in photocatalysis framework (2) and plasma discharge frame (3), photocatalysis framework (2) and plasma discharge frame (3) lateral surface on offer lateral control groove (12) that are linked together with top flexible groove (11), elasticity stopper (10) lateral surface be located lateral control groove (12) inside outside bellied lateral control piece (13) have, bar air guide port (5) left side inner wall and arc upset spacing groove (9) inboard arcwall face all seted up with elasticity stopper (10) matched with inside spacing draw-in groove (14).
3. The tuning mechanism for low temperature plasma as claimed in claim 2, wherein: the elastic limiting block (10) comprises a telescopic insertion block positioned in the top telescopic groove (11) and an extrusion spring which is elastically connected with the inner side surface of the top telescopic groove (11).
4. The tuning mechanism for low temperature plasma as claimed in claim 1, wherein: the right side end of the strip-shaped air guide port (5) is provided with an overturning communicating port communicated with the inside of the annular adjusting groove (6).
5. The tuning mechanism for low temperature plasma as claimed in claim 1, wherein: the inner side arc surface of the transverse adjusting seat (4) is positioned below the strip-shaped air guide port (5) and is fixedly welded with an inner side support rod (15).
6. The tuning mechanism for low temperature plasma as claimed in claim 5, wherein: the inner side of the inner side supporting rod (15) in the transverse adjusting seat (4) is fixedly connected with a metal filter cylinder (16) with a circular truncated cone structure through bolts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921202039.6U CN210473531U (en) | 2019-07-26 | 2019-07-26 | Adjusting and mounting mechanism for low-temperature plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921202039.6U CN210473531U (en) | 2019-07-26 | 2019-07-26 | Adjusting and mounting mechanism for low-temperature plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210473531U true CN210473531U (en) | 2020-05-08 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921202039.6U Active CN210473531U (en) | 2019-07-26 | 2019-07-26 | Adjusting and mounting mechanism for low-temperature plasma |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210473531U (en) |
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2019
- 2019-07-26 CN CN201921202039.6U patent/CN210473531U/en active Active
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