CN210458363U - Heating device for MOCVD reaction chamber and MOCVD reaction chamber - Google Patents
Heating device for MOCVD reaction chamber and MOCVD reaction chamber Download PDFInfo
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- CN210458363U CN210458363U CN201920975363.5U CN201920975363U CN210458363U CN 210458363 U CN210458363 U CN 210458363U CN 201920975363 U CN201920975363 U CN 201920975363U CN 210458363 U CN210458363 U CN 210458363U
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Abstract
The utility model provides a heating device and MOCVD reaction chamber for MOCVD reaction chamber. The heating device is positioned in a cylindrical substrate carrying platform of the MOCVD reaction chamber and is connected with the cylindrical substrate carrying platform, and the heating device comprises: a first heating assembly comprising a plurality of first heating structures connected to the cylindrical substrate carrier; the second heating assembly is positioned on one side of the first heating assembly along the axis direction of the cylindrical substrate carrying platform and comprises a plurality of second heating structures connected with the cylindrical substrate carrying platform; and/or a third heating assembly, the third heating assembly is positioned at the other side of the first heating assembly along the axial direction of the cylindrical substrate carrying platform, and the third heating assembly comprises a plurality of third heating structures connected with the cylindrical substrate carrying platform; wherein the first heating assembly and/or the second heating assembly and/or the third heating assembly run synchronously. The utility model provides an among the prior art heating device have the difference in temperature, influence the problem of battery substrate deposit effect.
Description
Technical Field
The utility model relates to a semiconductor technology field particularly, relates to a heating device and MOCVD reaction chamber for MOCVD reaction chamber.
Background
At present, in the production process of gallium arsenide solar cells, a metal polymer film layer needs to be formed on a cell substrate by using an MOCVD reaction chamber.
However, in the prior art, the heater of the MOCVD reaction chamber is of an integrated structure, and the temperature difference exists between the middle area and the outer edge area of the cylindrical substrate carrier, so that the deposition effect of the middle area and the outer edge area of the battery substrate is different, and the battery performance is affected.
SUMMERY OF THE UTILITY MODEL
The utility model discloses a main aim at provides a heating device and MOCVD reaction chamber for MOCVD reaction chamber to there is the difference in temperature heating device among the solution prior art, influences the problem of battery substrate deposit effect.
In order to achieve the above object, according to an aspect of the present invention, there is provided a heating device for an MOCVD reaction chamber, the heating device being located in a cylindrical substrate stage of the MOCVD reaction chamber and being connected to the cylindrical substrate stage, the heating device comprising: the first heating assembly comprises a plurality of first heating structures, and the first heating structures are connected with the inner surface of the cylindrical substrate carrying platform; the second heating assembly is positioned on one side of the first heating assembly along the axis direction of the cylindrical substrate carrying platform and comprises a plurality of second heating structures, and the plurality of second heating structures are connected with the inner surface of the cylindrical substrate carrying platform; and/or a third heating assembly, the third heating assembly is positioned at the other side of the first heating assembly along the axial direction of the cylindrical substrate carrying platform, the third heating assembly comprises a plurality of third heating structures, and the plurality of third heating structures are connected with the inner surface of the cylindrical substrate carrying platform; the first heating assembly and/or the second heating assembly and/or the third heating assembly synchronously operate to heat the cylindrical substrate carrier.
Furthermore, a plurality of first heating structures are arranged at intervals along the inner circumference of the cylindrical substrate carrying platform; and/or the plurality of first heating structures are arranged at intervals along the axial direction of the cylindrical substrate carrying platform.
Further, when the plurality of first heating structures are provided at intervals along the inner circumferential direction of the cylindrical substrate carrier, the extending direction of each first heating structure is provided in parallel with the axial direction of the cylindrical substrate carrier.
Furthermore, a plurality of second heating structures are arranged at intervals along the inner circumference of the cylindrical substrate carrying platform; and/or a plurality of second heating structures are arranged at intervals along the axial direction of the cylindrical substrate carrier.
Further, when the plurality of second heating structures are arranged at intervals along the axial direction of the cylindrical substrate carrier, each second heating structure is an annular structure and is arranged coaxially with the cylindrical substrate carrier.
Furthermore, a plurality of third heating structures are arranged at intervals along the inner circumference of the cylindrical substrate carrying platform; and/or a plurality of third heating structures are arranged at intervals along the axial direction of the cylindrical substrate carrier.
Further, when the plurality of third heating structures are arranged at intervals in the axial direction of the cylindrical substrate carrier, each third heating structure is an annular structure and is arranged coaxially with the cylindrical substrate carrier.
Further, the heating device further includes: the first detection module is connected with the first heating assembly and used for detecting the heating temperature of the first heating assembly; the first control module is connected with the first detection module and the first heating assembly, the first detection module transmits a detection temperature value to the first control module, and the first control module controls the heating temperature or the heating power of the first heating assembly according to the detection temperature value.
Further, the heating device further includes: the second detection module is connected with the second heating assembly and used for detecting the heating temperature of the second heating assembly; the second control module is connected with the second detection module and the second heating assembly, the second detection module transmits the detected temperature value to the second control module, and the second control module controls the heating temperature or the heating power of the second heating assembly according to the detected temperature value; and/or a third detection module connected with the third heating assembly, wherein the third detection module is used for detecting the heating temperature of the third heating assembly; and the third control module is connected with the third detection module and the third heating assembly, the third detection module transmits the detection temperature value to the third control module, and the third control module controls the heating temperature or the heating power of the third heating assembly according to the detection temperature value.
According to another aspect of the utility model, a MOCVD reaction chamber is provided, which comprises a cover body, a gas spraying structure, a cylindrical substrate carrying platform and a heating device, wherein the gas spraying structure, the cylindrical substrate carrying platform and the heating device are all positioned in the cover body, and the cylindrical substrate carrying platform is positioned in the gas spraying structure and is provided with an installation cavity used for installing a battery substrate between the cylindrical substrate carrying platform and the gas spraying structure; wherein, the heating device is the heating device for the MOCVD reaction chamber.
Use the technical scheme of the utility model, heating device includes first heating element, second heating element and/or third heating element. Along the axis direction of the cylindrical substrate carrying platform, the second heating assembly is positioned on one side of the first heating assembly, and the third heating assembly is positioned on the other side of the first heating assembly. The temperature of the middle area of the cylindrical substrate carrying platform is adjusted through the first heating component, the temperature of the outer edge area of the cylindrical substrate carrying platform is adjusted through the second heating component and/or the third heating component, and then the temperature of the middle area and the temperature of the outer edge area of the cylindrical substrate carrying platform can be controlled respectively, so that the temperature difference between the middle area and the outer edge area is reduced, so that the temperature distribution of the middle area and the outer edge area is more uniform and consistent, the deposition effect of the battery substrate is further improved, the problem that the temperature difference exists in a heating device in the prior art, and the deposition effect of the battery substrate is influenced is solved.
Drawings
The accompanying drawings, which form a part of the present application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 shows a schematic perspective view of an embodiment of a heating device for an MOCVD reactor according to the present invention;
fig. 2 is a schematic perspective view of a first heating assembly of the heating apparatus for an MOCVD reactor in fig. 1;
figure 3 shows a cross-sectional view of an embodiment of an MOCVD reactor according to the present invention; and
fig. 4 shows a schematic perspective view of the MOCVD reactor in fig. 3.
Wherein the figures include the following reference numerals:
10. a cylindrical substrate stage; 20. a first heating assembly; 21. a first heating structure; 30. a second heating assembly; 31. a second heating structure; 40. a third heating assembly; 41. a third heating structure; 50. a gas spraying structure; 60. a cover body; 61. an air inlet duct.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
It is noted that, unless otherwise indicated, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
In the present invention, unless otherwise specified, the use of directional words such as "upper and lower" is generally in reference to the orientation shown in the drawings, or to the vertical, perpendicular or gravitational orientation; likewise, for ease of understanding and description, "left and right" are generally to the left and right as shown in the drawings; the terms "inner and outer" refer to the inner and outer relative to the profile of the respective component itself, but the above directional terms are not intended to limit the present invention.
In order to solve the problem that the temperature difference exists in a heating device in the prior art and the deposition effect of a battery substrate is influenced, the application provides the heating device for the MOCVD reaction chamber and the MOCVD reaction chamber.
As shown in fig. 1 to 4, the heating apparatus for the MOCVD reactor is located inside the cylindrical substrate stage 10 of the MOCVD reactor and connected to the cylindrical substrate stage 10, and includes a first heating assembly 20, a second heating assembly 30, and a third heating assembly 40. The first heating assembly 20 includes a plurality of first heating structures 21, and the plurality of first heating structures 21 are connected to the inner surface of the cylindrical substrate carrier 10. The second heating unit 30 is located along the axial direction of the cylindrical substrate carrier 10, the second heating unit 30 is located at one side of the first heating unit 20, the second heating unit 30 includes a plurality of second heating structures 31, and the plurality of second heating structures 31 are connected to the inner surface of the cylindrical substrate carrier 10. The third heating unit 40 is located along the axial direction of the cylindrical substrate carrier 10, the third heating unit 40 is located on the other side of the first heating unit 20, the third heating unit 40 includes a plurality of third heating structures 41, and the plurality of third heating structures 41 are connected to the inner surface of the cylindrical substrate carrier 10. The first heating unit 20, the second heating unit 30, and the third heating unit 40 operate synchronously to heat the cylindrical substrate carrier 10.
With the technical solution of the present embodiment, the heating device includes a first heating assembly 20, a second heating assembly 30 and a third heating assembly 40. The second heating unit 30 is located on one side of the first heating unit 20, and the third heating unit 40 is located on the other side of the first heating unit 20 in the axial direction of the cylindrical substrate carrier 10. The temperature of the middle area of the cylindrical substrate carrying table 10 is adjusted through the first heating component 20, the temperature of the outer edge area of the cylindrical substrate carrying table 10 is adjusted through the second heating component 30 and the third heating component 40, and then the temperature of the middle area and the temperature of the outer edge area of the cylindrical substrate carrying table 10 can be controlled respectively, so that the temperature difference between the middle area and the outer edge area is reduced, so that the temperature distribution of the middle area and the outer edge area is more uniform and consistent, and further the deposition effect of the battery substrate is improved.
In this embodiment, MOCVD is an acronym for Metal-organic Chemical Vapor Deposition, which is one of the important techniques for preparing semiconductor thin film materials.
In the present embodiment, the second heating unit 30 and the third heating unit 40 are respectively located on both sides of the first heating unit 20 in the axial direction of the cylindrical substrate carrier 10 to respectively heat both edge areas of the cylindrical substrate carrier 10.
In other embodiments not shown in the figures, the heating means comprise a first heating assembly and a second heating assembly. The first heating assembly and the second heating assembly operate synchronously to heat the cylindrical substrate carrier. Specifically, the heating device includes a first heating assembly and a second heating assembly. The second heating assembly is located on one side of the first heating assembly along the axial direction of the cylindrical substrate carrier. The temperature of the middle area of the cylindrical substrate carrying platform is adjusted through the first heating component, the temperature of the outer edge area of the cylindrical substrate carrying platform is adjusted through the second heating component, and then the temperature of the middle area and the temperature of the outer edge area of the cylindrical substrate carrying platform can be controlled respectively, so that the temperature difference between the middle area and the outer edge area is reduced, the temperature distribution of the middle area and the temperature distribution of the outer edge area are more uniform and consistent, the deposition effect of the battery substrate is further improved, and the problems that the temperature difference exists in a heating device in the prior art and the deposition effect of the battery substrate is influenced are solved.
In other embodiments not shown in the figures, the heating means comprise a first heating assembly and a third heating assembly. The first heating assembly and the third heating assembly run synchronously to heat the cylindrical substrate carrier. The heating device comprises a first heating assembly and a third heating assembly. The third heating assembly is located on one side of the first heating assembly along the axial direction of the cylindrical substrate carrier. The temperature of the middle area of the cylindrical substrate carrying platform is adjusted through the first heating component, the temperature of the outer edge area of the cylindrical substrate carrying platform is adjusted through the third heating component, and then the temperature of the middle area and the temperature of the outer edge area of the cylindrical substrate carrying platform can be controlled respectively, so that the temperature difference between the middle area and the outer edge area is reduced, the temperature distribution of the middle area and the temperature distribution of the outer edge area are more uniform and consistent, the deposition effect of the battery substrate is further improved, and the problems that the temperature difference exists in a heating device in the prior art and the deposition effect of the battery substrate is influenced are solved.
In the present embodiment, the plurality of first heating structures 21 are provided at intervals along the inner circumferential direction of the cylindrical substrate stage 10. In this way, the above arrangement of the first heating structure 21 makes the heating temperature of the heating device to the middle area of the cylindrical substrate carrier 10 more uniform and uniform along the axial direction of the cylindrical substrate carrier 10, and further makes the deposition effect of the middle area of the battery substrate on the cylindrical substrate carrier 10 more uniform. Meanwhile, the structure is simple, and the processing and the realization are easy.
In other embodiments not shown in the drawings, the plurality of first heating structures are provided at intervals in the axial direction of the cylindrical substrate stage. In this way, each first heating structure is provided coaxially with the cylindrical substrate carrier to heat the intermediate area of the cylindrical substrate carrier. Meanwhile, the structure is simple, and the processing and the realization are easy.
In other embodiments not shown in the drawings, a part of the first heating structures 21 is provided at intervals along the inner circumference of the cylindrical substrate carrier 10, and another part of the first heating structures 21 is provided at intervals along the axial direction of the cylindrical substrate carrier 10. Thus, the arrangement of the first heating structure 21 is more flexible and convenient, and the labor intensity of workers is reduced.
In the present embodiment, the extending direction of each first heating structure 21 is provided in parallel with the axial direction of the cylindrical substrate stage 10. Thus, the arrangement makes the installation of each first heating structure 21 and the cylindrical substrate carrier 10 easier and simpler, and makes the temperature of the middle area of the cylindrical substrate carrier 10 more uniform and consistent, thereby improving the heating effect of the first heating assembly 20.
Alternatively, the plurality of first heating structures 21 are disposed at equal intervals. Thus, the arrangement further enables the heating temperature of the first heating assembly 20 to the cylindrical substrate carrier 10 to be more uniform and consistent, thereby ensuring the deposition uniformity of the battery substrate and enabling the layer thickness of the metal polymer film layer deposited on the battery substrate to be uniform.
In the present embodiment, the plurality of second heating structures 31 are provided at intervals in the axial direction of the cylindrical substrate stage 10. In this way, each of the second heating structures 31 is an annular structure and is provided coaxially with the cylindrical substrate stage 10, and the plurality of second heating structures 31 are provided at equal intervals along the axial direction of the cylindrical substrate stage 10. The arrangement makes the heating temperature of the heating device to the side edge area of the cylindrical substrate carrier 10 more uniform and consistent, and further makes the deposition effect of the side edge area of the battery substrate on the cylindrical substrate carrier 10 more consistent. Meanwhile, the structure is simple, and the processing and the realization are easy.
Specifically, the first heating assembly 20 heats the middle area of the cylindrical substrate carrier 10, and the second heating assembly 30 heats one side edge area of the cylindrical substrate carrier 10, so that the temperatures of the middle area and the one side edge area of the cylindrical substrate carrier 10 can be controlled respectively, the temperatures of the middle area and the one side edge area of the cylindrical substrate carrier 10 are consistent, and the deposition effect of the battery substrate is improved.
In other embodiments not shown in the drawings, a plurality of second heating structures are provided at intervals along the inner circumference of the cylindrical substrate stage. Specifically, the extending direction of each second heating structure is arranged in parallel to the axial direction of the cylindrical substrate stage. Therefore, the arrangement makes the installation of each second heating structure and the cylindrical substrate carrying platform easier and simpler, and makes the temperature of the edge area at one side of the cylindrical substrate carrying platform more uniform and consistent, thereby improving the heating effect of the second heating assembly.
In other embodiments not shown in the drawings, part of the second heating structures are provided at intervals along the inner circumference of the cylindrical substrate carrier, and the remaining part of the second heating structures are provided at intervals along the axial direction of the cylindrical substrate carrier. Like this, above-mentioned setting makes second heating element's setting more nimble, and is simple and convenient, has reduced staff's intensity of labour.
In the present embodiment, the plurality of third heating structures 41 are provided at intervals in the axial direction of the cylindrical substrate stage 10. In this way, each third heating structure 41 has an annular structure and is provided coaxially with the cylindrical substrate stage 10, and the plurality of third heating structures 41 are provided at equal intervals along the axial direction of the cylindrical substrate stage 10. The arrangement makes the heating temperature of the heating device to the other side edge area of the cylindrical substrate carrier 10 more uniform and consistent, and further makes the deposition effect of the other side edge area of the battery substrate on the cylindrical substrate carrier 10 more consistent. Meanwhile, the structure is simple, and the processing and the realization are easy.
Specifically, the first heating assembly 20 heats the middle area of the cylindrical substrate carrier 10, the second heating assembly 30 heats the edge area of one side of the cylindrical substrate carrier 10, and the third heating assembly 40 heats the edge area of the other side of the cylindrical substrate carrier 10, so that the temperatures of the middle area and the edge areas of the two sides of the cylindrical substrate carrier 10 can be respectively controlled, the temperatures of the middle area and the edge areas of the two sides of the cylindrical substrate carrier 10 are consistent, and the deposition effect of the battery substrate is improved.
In other embodiments not shown in the drawings, a plurality of third heating structures are provided at intervals along the inner circumference of the cylindrical substrate stage. Specifically, the extending direction of each third heating structure is arranged in parallel to the axial direction of the cylindrical substrate stage. Therefore, the third heating structures and the cylindrical substrate carrying platform are easier and simpler to mount through the arrangement, the temperature of the edge area at the other side of the cylindrical substrate carrying platform is more uniform and consistent, and the heating effect of the third heating assembly is improved.
In other embodiments not shown in the drawings, a plurality of third heating structures are provided at intervals along the inner periphery of the cylindrical substrate stage, and a plurality of third heating structures are provided at intervals along the axial direction of the cylindrical substrate stage. Therefore, the third heating assembly is more flexible and convenient to set by the arrangement, and the labor intensity of workers is reduced.
In this embodiment, the heating device further includes a first detection module and a first control module. The first detection module is connected to the first heating assembly 20, and the first detection module is configured to detect a heating temperature of the first heating assembly 20. The first control module is connected with the first detection module and the first heating assembly 20, the first detection module transmits a detection temperature value to the first control module, and the first control module controls the heating temperature or the heating power of the first heating assembly 20 according to the detection temperature value. In this way, the first detection module is used for detecting the heating temperature of the first heating assembly 20 and feeding the detection result back to the first control module, so as to control the heating temperature or the heating power of the first heating assembly 20 through the first control module, and further perform accurate temperature control on the first heating assembly 20, so that the temperature control of the middle area of the cylindrical substrate carrier 10 is easier and simpler.
In this embodiment, the heating device further includes a second detection module and a second control module. The second detection module is connected to the second heating assembly 30, and the second detection module is configured to detect a heating temperature of the second heating assembly 30. The second control module is connected with the second detection module and the second heating assembly 30, the second detection module transmits the detection temperature value to the second control module, and the second control module controls the heating temperature or the heating power of the second heating assembly 30 according to the detection temperature value. In this way, the second detection module is used for detecting the heating temperature of the second heating assembly 30 and feeding the detection result back to the second control module, so as to control the heating temperature or the heating power of the second heating assembly 30 through the second control module, and further perform accurate temperature control on the second heating assembly 30, so that the temperature control of the edge area on one side of the cylindrical substrate carrier 10 is easier and simpler.
In this embodiment, the heating device further includes a third detection module and a third control module. The third detection module is connected to the third heating assembly 40, and the third detection module is configured to detect a heating temperature of the third heating assembly 40. The third control module is connected with the third detection module and the third heating assembly 40, the third detection module transmits the detected temperature value to the third control module, and the third control module controls the heating temperature or the heating power of the third heating assembly 40 according to the detected temperature value. In this way, the third detection module is used for detecting the heating temperature of the third heating assembly 40 and feeding the detection result back to the third control module, so as to control the heating temperature or the heating power of the third heating assembly 40 through the third control module, and further perform accurate temperature control on the third heating assembly 40, so that the temperature control of the edge area at the other side of the cylindrical substrate carrier 10 is easier and simpler.
In the present embodiment, the first heating structure 21 is a cylindrical lamp tube, and the second heating structure 31 and the third heating structure 41 are circular lamp tubes. The structure is simple, the processing and the realization are easy, and the processing cost of the heating device is reduced. Meanwhile, the heating device is more convenient and easier to assemble and maintain due to the arrangement, and the labor intensity of workers is reduced.
As shown in fig. 3 and 4, the present application further provides an MOCVD reaction chamber, which includes a cover body 60, a gas spraying structure 50, a cylindrical substrate carrier 10, and a heating device, wherein the gas spraying structure 50, the cylindrical substrate carrier 10, and the heating device are all located in the cover body 60, and the cylindrical substrate carrier 10 is located in the gas spraying structure 50, and an installation cavity for installing a battery substrate is provided between the cylindrical substrate carrier 10 and the gas spraying structure 50. Wherein, the heating device is the heating device for the MOCVD reaction chamber. In this way, the heating device can respectively heat the middle area and the two side edge areas of the cylindrical substrate carrier 10, so that the temperatures of the first heating assembly 20, the second heating assembly 30 and the third heating assembly 40 are consistent, the temperature distribution on the cylindrical substrate carrier 10 is further uniform, and the deposition effect on the battery substrate is more uniform.
Specifically, the cover 60 is provided with a plurality of air inlet pipes 61, and each air inlet pipe 61 extends into the cover 60 and is communicated with the gas spraying structure 50. The battery substrate is arranged on the cylindrical substrate carrier 10 and positioned in the mounting cavity, in the running process of the MOCVD reaction chamber, gas enters the cover body 60 from a plurality of gas inlet pipelines 61 which are transversely and longitudinally arranged and enters between the gas spraying structure 50 and the cylindrical substrate carrier 10, the cylindrical substrate carrier 10 and the battery substrate arranged on the cylindrical substrate carrier 10 are heated by the heating device, and after the gas reacts in the cover body 60, a metal polymer film layer is formed on the battery substrate through deposition
From the above description, it can be seen that the above-mentioned embodiments of the present invention achieve the following technical effects:
the heating device comprises a first heating assembly, a second heating assembly and/or a third heating assembly. Along the axis direction of the cylindrical substrate carrying platform, the second heating assembly is positioned on one side of the first heating assembly, and the third heating assembly is positioned on the other side of the first heating assembly. The temperature of the middle area of the cylindrical substrate carrying platform is adjusted through the first heating component, the temperature of the outer edge area of the cylindrical substrate carrying platform is adjusted through the second heating component and/or the third heating component, and then the temperature of the middle area and the temperature of the outer edge area of the cylindrical substrate carrying platform can be controlled respectively, so that the temperature difference between the middle area and the outer edge area is reduced, so that the temperature distribution of the middle area and the outer edge area is more uniform and consistent, the deposition effect of the battery substrate is further improved, the problem that the temperature difference exists in a heating device in the prior art, and the deposition effect of the battery substrate is influenced is solved.
It is obvious that the above described embodiments are only some of the embodiments of the present invention, and not all of them. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall belong to the protection scope of the present invention.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular is intended to include the plural unless the context clearly dictates otherwise, and it should be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of features, steps, operations, devices, components, and/or combinations thereof.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are capable of operation in sequences other than those illustrated or described herein.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A heating device for an MOCVD reaction chamber, the heating device being located inside a cylindrical substrate carrier (10) of the MOCVD reaction chamber and being connected to the cylindrical substrate carrier (10), characterized by comprising:
a first heating unit (20) including a plurality of first heating structures (21), the plurality of first heating structures (21) being connected to an inner surface of the cylindrical substrate stage (10);
a second heating assembly (30), wherein the second heating assembly (30) is positioned at one side of the first heating assembly (20) along the axial direction of the cylindrical substrate carrier (10), the second heating assembly (30) comprises a plurality of second heating structures (31), and the plurality of second heating structures (31) are connected with the inner surface of the cylindrical substrate carrier (10); and/or
A third heating assembly (40), wherein the third heating assembly (40) is positioned at the other side of the first heating assembly (20) along the axial direction of the cylindrical substrate carrier (10), the third heating assembly (40) comprises a plurality of third heating structures (41), and the plurality of third heating structures (41) are connected with the inner surface of the cylindrical substrate carrier (10);
wherein the first heating assembly (20) and/or the second heating assembly (30) and/or the third heating assembly (40) operate synchronously to heat the tubular substrate carrier (10).
2. The heating device for MOCVD reaction chamber according to claim 1,
the first heating structures (21) are arranged at intervals along the inner circumference of the cylindrical substrate carrying platform (10); and/or
The plurality of first heating structures (21) are arranged at intervals along the axial direction of the cylindrical substrate carrier (10).
3. The heating device for an MOCVD reaction chamber according to claim 1, wherein when a plurality of the first heating structures (21) are provided at intervals along an inner circumferential direction of the cylindrical substrate stage (10), an extending direction of each of the first heating structures (21) is provided in parallel with an axial direction of the cylindrical substrate stage (10).
4. The heating device for MOCVD reaction chamber according to claim 1,
the second heating structures (31) are arranged at intervals along the inner circumference of the cylindrical substrate carrying platform (10); and/or
The plurality of second heating structures (31) are provided at intervals along the axial direction of the cylindrical substrate carrier (10).
5. The heating apparatus for an MOCVD reaction chamber according to claim 1, wherein when a plurality of the second heating structures (31) are provided at intervals in an axial direction of the cylindrical substrate stage (10), each of the second heating structures (31) is a ring-shaped structure and is provided coaxially with the cylindrical substrate stage (10).
6. The heating device for MOCVD reaction chamber according to claim 1,
the third heating structures (41) are arranged at intervals along the inner circumference of the cylindrical substrate carrier (10); and/or
The plurality of third heating structures (41) are provided at intervals in the axial direction of the cylindrical substrate carrier (10).
7. The heating device for an MOCVD reaction chamber according to claim 1, wherein when a plurality of the third heating structures (41) are provided at intervals in the axial direction of the cylindrical substrate stage (10), each of the third heating structures (41) is a ring-shaped structure and is provided coaxially with the cylindrical substrate stage (10).
8. The heating device for the MOCVD reaction chamber according to claim 1, characterized in that said heating device further comprises:
the first detection module is connected with the first heating assembly (20) and is used for detecting the heating temperature of the first heating assembly (20);
the first control module is connected with the first detection module and the first heating assembly (20), the first detection module transmits a detection temperature value to the first control module, and the first control module controls the heating temperature or the heating power of the first heating assembly (20) according to the detection temperature value.
9. The heating device for the MOCVD reaction chamber according to claim 1, characterized in that said heating device further comprises:
the second detection module is connected with the second heating assembly (30) and is used for detecting the heating temperature of the second heating assembly (30);
the second control module is connected with the second detection module and the second heating assembly (30), the second detection module transmits a detected temperature value to the second control module, and the second control module controls the heating temperature or the heating power of the second heating assembly (30) according to the detected temperature value; and/or
The third detection module is connected with the third heating assembly (40) and is used for detecting the heating temperature of the third heating assembly (40);
and the third control module is connected with the third detection module and the third heating assembly (40), the third detection module transmits a detection temperature value to the third control module, and the third control module controls the heating temperature or the heating power of the third heating assembly (40) according to the detection temperature value.
10. An MOCVD reaction chamber is characterized by comprising a cover body (60), a gas spraying structure (50), a cylindrical substrate carrier (10) and a heating device, wherein the gas spraying structure (50), the cylindrical substrate carrier (10) and the heating device are all positioned in the cover body (60), the cylindrical substrate carrier (10) is positioned in the gas spraying structure (50), and an installation cavity for installing a battery substrate is arranged between the cylindrical substrate carrier and the gas spraying structure (50); wherein the heating device is the heating device for the MOCVD reaction chamber as claimed in any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920975363.5U CN210458363U (en) | 2019-06-26 | 2019-06-26 | Heating device for MOCVD reaction chamber and MOCVD reaction chamber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920975363.5U CN210458363U (en) | 2019-06-26 | 2019-06-26 | Heating device for MOCVD reaction chamber and MOCVD reaction chamber |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210458363U true CN210458363U (en) | 2020-05-05 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920975363.5U Active CN210458363U (en) | 2019-06-26 | 2019-06-26 | Heating device for MOCVD reaction chamber and MOCVD reaction chamber |
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| CN (1) | CN210458363U (en) |
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2019
- 2019-06-26 CN CN201920975363.5U patent/CN210458363U/en active Active
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Effective date of registration: 20210129 Address after: Unit 611, unit 3, 6 / F, building 1, yard 30, Yuzhi East Road, Changping District, Beijing 102208 Patentee after: Zishi Energy Co.,Ltd. Address before: Room a129-1, No. 10, Zhongxing Road, science and Technology Park, Changping District, Beijing Patentee before: DONGTAI HI-TECH EQUIPMENT TECHNOLOGY Co.,Ltd. |