CN210388851U - Alarm device for polishing solution leakage in silicon wafer polishing process - Google Patents
Alarm device for polishing solution leakage in silicon wafer polishing process Download PDFInfo
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- CN210388851U CN210388851U CN201921139718.3U CN201921139718U CN210388851U CN 210388851 U CN210388851 U CN 210388851U CN 201921139718 U CN201921139718 U CN 201921139718U CN 210388851 U CN210388851 U CN 210388851U
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- alarm
- mounting plate
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- peristaltic pump
- alarm device
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Abstract
The utility model provides an alarm device for leakage of polishing solution in the process of polishing silicon wafers, wherein a peristaltic pump is adopted to supply polishing solution in the process of polishing silicon wafers, a hose is sleeved on the periphery of a roller of the peristaltic pump, the alarm device comprises a collecting box, an alarm mechanism and a mounting plate arranged in the vertical direction, the peristaltic pump, the collecting box and the alarm mechanism are all arranged on the mounting plate, and the mounting plate is provided with a test hole; the mounting plate is provided with a convex fixture block, the collecting box comprises a box body, the upper end of the box body is provided with an opening for collecting leakage liquid, and the box body is provided with a clamping groove matched with the fixture block; one side of the box body close to the mounting plate is provided with a through hole; the alarm mechanism comprises an installation frame, an alarm, a controller and a water leakage sensor, and the device can give an alarm in time when the peristaltic pump pipeline is damaged and slightly leaks, so as to remind an operator to maintain and replace the peristaltic pump pipeline.
Description
Technical Field
The utility model relates to a semiconductor manufacturing technical field, concretely relates to polishing solution leaks and uses alarm device among silicon chip polishing process.
Background
In the production of polished single crystal silicon wafers, a multi-step polishing process is used: namely, the whole polishing process is divided into rough polishing and fine polishing, and in the fine polishing step, because the removal amount is small, the requirements on the cleanliness and the fineness of the polishing solution are high, so that the polishing solution is supplied by a peristaltic pump without generating particles. The polymer plastic pipe used by the peristaltic pump is a consumable material in use, and in practice, the peristaltic pump plastic pipe is continuously extruded and finally broken under the action of alternating load of rollers of the peristaltic pump, so that polishing solution is leaked, and the production environment is polluted.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to overcome prior art's is not enough, provides a polishing solution leaks and uses alarm device in silicon chip polishing process, and the device can in time produce the warning when the peristaltic pump pipeline is damaged to take place slightly to leak, reminds operating personnel to maintain and change.
The utility model discloses a solve the technical scheme that above-mentioned technical problem adopted and be: an alarm device for leakage of polishing solution in the process of polishing a silicon wafer is characterized in that a peristaltic pump is adopted to supply polishing solution in the process of polishing the silicon wafer, a hose is sleeved on the periphery of a roller of the peristaltic pump, the alarm device comprises a collecting box, an alarm mechanism and a mounting plate arranged in the vertical direction, the peristaltic pump, the collecting box and the alarm mechanism are all mounted on the mounting plate, and a test hole is formed in the mounting plate;
the collecting box is arranged right below the roller, the mounting plate is provided with a convex clamping block, the collecting box comprises a box body, the upper end of the box body is provided with an opening for collecting leakage liquid, and the box body is provided with a clamping groove matched with the clamping block; a through hole is formed in one side, close to the mounting plate, of the box body;
alarm mechanism includes mounting bracket, alarm, controller and leakage sensor, and alarm and controller all set up the below at the mounting panel through the mounting bracket, and this alarm links to each other with the output of controller, and the input of controller links to each other with the leakage sensor, and the leakage sensor setting is in the bottom of collecting the box and the detection end of leakage sensor pass in proper order the test hole with set up behind the through-hole in the box body.
Further, the test hole is arranged right below the roller.
Further, the central axis of the through hole coincides with the central axis of the test hole.
Furthermore, the bottom of mounting panel is provided with the stopper that is used for restricting the box body and slides downwards.
Further, the mounting frame is detachably mounted below the mounting plate.
The beneficial effects of the utility model are mainly expressed in the following aspect:
1. the device can give an alarm in time when the peristaltic pump pipeline is damaged and slightly leaks, so as to remind an operator to maintain and replace the peristaltic pump pipeline;
2. the leaked polishing solution is recovered by the collecting box, so that the production environment is prevented from being polluted;
3. the alarm and the collecting box are separately installed, so that leaked polishing solution can be conveniently treated and recovered.
Drawings
Fig. 1 is a schematic structural diagram of the present invention;
fig. 2 is a schematic structural view of the mounting plate of the present invention;
fig. 3 is a schematic structural view of the collecting box of the present invention;
the labels in the figure are: 1. mounting panel, 101, stopper, 102, test hole, 103, fixture block, 2, gyro wheel, 3, hose, 4, box body, 401, draw-in groove, 402, through-hole, 5, mounting bracket, 6, alarm mechanism.
Detailed Description
The embodiments of the present invention will be described in detail with reference to the accompanying drawings, and the present embodiment is based on the technical solution of the present invention and provides a detailed implementation manner and a specific operation process, but the scope of the present invention is not limited to the following embodiments.
According to the attached drawings, a peristaltic pump is adopted to supply polishing solution in the silicon wafer polishing process, a hose 3 is sleeved on the periphery of a roller 2 of the peristaltic pump, the alarm device comprises a collecting box, an alarm mechanism 6 and a mounting plate 1 arranged in the vertical direction, the peristaltic pump, the collecting box and the alarm mechanism 6 are all mounted on the mounting plate 1, and a test hole 102 is formed in the mounting plate 1; the test hole 102 is arranged right below the roller 2; the mounting plate 1 is provided with a test hole 102 for mounting a water leakage sensor and positioning a collection box;
the collecting box is arranged under the roller 2, the mounting plate 1 is provided with a convex fixture block 103, the fixture block 103 is cylindrical, the outer ring of the fixture block 103 is sleeved with a limiting ring, the limiting ring is arranged at one end of the fixture block 103 close to the box body 4, the limiting ring is a rubber ring,
the collecting box comprises a box body 4, an opening for collecting leakage liquid is formed in the upper end of the box body 4, and a clamping groove 401 matched with the clamping block 103 is formed in the box body 4; the clamping groove 401 is concave, a clamping ring is arranged at the port of the clamping groove 401, and the limiting ring of the clamping block 103 is clamped into the clamping groove 401 from the clamping ring; when leakage liquid in the box body 4 is collected, the box body 4 is taken down from the fixture block 103 on the mounting plate 1;
the bottom end of the mounting plate 1 is provided with a limiting block 101 for limiting the box body 4 to slide downwards; a through hole 402 is formed in one side, close to the mounting plate 1, of the box body 4; the central axis of the through hole 402 coincides with the central axis of the test hole 102;
the alarm mechanism 6 comprises a mounting frame 5, an alarm, a controller and a water leakage sensor, wherein the alarm and the controller are arranged below the mounting plate 1 through the mounting frame 5, and the mounting frame 5 is detachably mounted below the mounting plate 1 through bolts; the alarm is connected with the output end of the controller, the input end of the controller is connected with the water leakage sensor, the water leakage sensor is arranged at the bottom end of the collecting box, and the detection end of the water leakage sensor sequentially penetrates through the test hole 102 and the through hole 402 and then is arranged in the box body 4.
When the hose 3 of peristaltic pump breaks, liquid drips into the box body 4 of collecting the box in, is perceived by the sensor that leaks of collecting the box bottom, and after the signal passed to the controller, the controller was given the alarm with signal transmission, and the alarm sounded, production operating personnel can know polishing solution peristaltic pump pipeline leakage at once, can in time handle.
The device can give an alarm in time when the peristaltic pump pipeline is damaged and slightly leaks, so as to remind an operator to maintain and replace the peristaltic pump pipeline; the leaked polishing solution is recovered by the collecting box, so that the production environment is prevented from being polluted; the alarm and the collecting box are separately installed, so that leaked polishing solution can be conveniently treated and recovered.
It is further noted that relational terms such as i, ii, and iii may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
Claims (5)
1. The utility model provides a silicon chip polishing in-process polishing solution leaks and uses alarm device, adopts the peristaltic pump to supply polishing solution among the silicon chip polishing process, and the cover is equipped with hose (3) on the periphery of this peristaltic pump's gyro wheel (2), its characterized in that: the alarm device comprises a collecting box, an alarm mechanism (6) and a mounting plate (1) arranged in the vertical direction, wherein the peristaltic pump, the collecting box and the alarm mechanism (6) are all mounted on the mounting plate (1), and a test hole (102) is formed in the mounting plate (1);
the collecting box is arranged under the roller (2), the mounting plate (1) is provided with a convex clamping block (103), the collecting box comprises a box body (4), the upper end of the box body (4) is provided with an opening for collecting leakage liquid, and the box body (4) is provided with a clamping groove (401) matched with the clamping block (103); a through hole (402) is formed in one side, close to the mounting plate (1), of the box body (4);
alarm mechanism (6) are including mounting bracket (5), alarm, controller and water leakage sensor, and alarm and controller all set up the below in mounting panel (1) through mounting bracket (5), and this alarm links to each other with the output of controller, and the input of controller links to each other with water leakage sensor, and water leakage sensor sets up in the bottom of collecting the box and water leakage sensor's sense terminal pass test hole (102) in proper order with set up behind through-hole (402) in box body (4).
2. The alarm device for the leakage of the polishing solution in the silicon wafer polishing process according to claim 1, wherein: the test hole (102) is arranged right below the roller (2).
3. The alarm device for the leakage of the polishing solution in the silicon wafer polishing process according to claim 1, wherein: the central axis of the through hole (402) coincides with the central axis of the test hole (102).
4. The alarm device for the leakage of the polishing solution in the silicon wafer polishing process according to claim 1, wherein: the bottom of mounting panel (1) is provided with stopper (101) that are used for restricting box body (4) gliding downwards.
5. The alarm device for the leakage of the polishing solution in the silicon wafer polishing process according to claim 1, wherein: the mounting rack (5) is detachably mounted below the mounting plate (1).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201921139718.3U CN210388851U (en) | 2019-07-19 | 2019-07-19 | Alarm device for polishing solution leakage in silicon wafer polishing process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201921139718.3U CN210388851U (en) | 2019-07-19 | 2019-07-19 | Alarm device for polishing solution leakage in silicon wafer polishing process |
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Publication Number | Publication Date |
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CN210388851U true CN210388851U (en) | 2020-04-24 |
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CN201921139718.3U Active CN210388851U (en) | 2019-07-19 | 2019-07-19 | Alarm device for polishing solution leakage in silicon wafer polishing process |
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2019
- 2019-07-19 CN CN201921139718.3U patent/CN210388851U/en active Active
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Address after: 471000 No. 99 Binhe North Road, Luoyang hi tech Industrial Development Zone, Henan Patentee after: Mesk Electronic Materials Co., Ltd Address before: 471000 No. 99 Binhe North Road, Luoyang hi tech Industrial Development Zone, Henan Patentee before: MCL ELECTRONIC MATERIALS Ltd. |
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