CN210356064U - Flash distillation system buffer - Google Patents
Flash distillation system buffer Download PDFInfo
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- CN210356064U CN210356064U CN201921119554.8U CN201921119554U CN210356064U CN 210356064 U CN210356064 U CN 210356064U CN 201921119554 U CN201921119554 U CN 201921119554U CN 210356064 U CN210356064 U CN 210356064U
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Abstract
The application discloses a flash evaporation system buffering device which comprises an inlet pipeline, a blind plate end cover, an outlet pipeline, a wear-resistant hemisphere and supporting round steel; the wear-resistant hemispheres comprise a plurality of layers, and the number of the wear-resistant hemispheres at the uppermost layer is one; the quantity of supporting round steel equals with the quantity of the wear-resisting hemisphere of lower floor, and the wear-resisting hemisphere that is located lower floor corresponds the upper end that sets up at supporting round steel. Through supporting round steel welding wear-resisting hemisphere on the blind plate end cover in the embodiment of this application, wear-resisting hemisphere includes the multilayer, and the multilayer wear-resisting hemisphere piles up staggered arrangement, and spot welding is fixed between the wear-resisting hemisphere, makes black water outdated, cushions layer upon layer, and rivers spread to the circumferencial direction, have effectually slowed down black water and have washed away blind plate end cover axial.
Description
Technical Field
The application relates to the technical field of flash evaporation, in particular to a flash evaporation system buffering device.
Background
At present, the mainstream modern coal gasification market in China is an entrained flow bed gasification technology, and the gasification technologies such as a shell gasification furnace with dry coal powder, a siemens gasification furnace, an aerospace furnace, a Shenning furnace, a Qinghua furnace with coal water slurry, a Texaco, a multi-component slurry, a Jinhua furnace and a multi-nozzle are applied in a large quantity. Various gasification technologies generally consist of a coal grinding unit, a gasification unit and a black water treatment unit.
Black water generated by the existing gasification unit can be reused after being treated by the black water treatment unit, for example:
the black water generated at the bottom of the gasification unit is decompressed by an angle valve of a flash evaporation system and then enters a buffer device and then enters a flash evaporation tank. In the flash evaporation system, the temperature of the black water is reduced to be below 100 ℃ through decompression and evaporation of a one-stage or multi-stage flash evaporation tank, most of gas dissolved in the black water is released, and the black water is sent to a clarification tank for deslagging and recycling.
In addition, the black water of the gasification unit is decompressed by a decompression angle valve and then enters the flash tank through a buffer device, the pressure of the black water is reduced in a sectional manner, and the black water at the bottom outlet of each flash tank is sent to the flash tank at the lower section through a decompression valve. And the last flash tank section is a vacuum flash tank, and the black water discharged from the vacuum flash tank directly enters a settling tank for solid-liquid separation and reutilization.
In order to reduce the impact on the front pipe fitting of the flash tank and the baffle plate in the flash tank, a flash system buffer device is arranged before the black water flows through a pressure reduction angle valve and enters a black water inlet of the flash tank. The buffering device of the flash evaporation system conventionally adopts a pipeline and blind plate end cover structure, and solid particles in black water are washed, so that the end cover is easy to abrade, leakage is finally generated, the leaked black water causes pollution to the flash evaporation tank and the frame environment thereof, and the long-period stable operation of the system is restricted.
SUMMERY OF THE UTILITY MODEL
The application of this application aim at provides a flash distillation system buffer to solve among the prior art blind plate end cover and produce the abrasion easily, finally produce the problem of leaking.
The application provides a flash evaporation system buffering device which comprises an inlet pipeline, a blind plate end cover, an outlet pipeline, a wear-resistant hemisphere and supporting round steel;
a pressure reducing angle valve is arranged on the inlet pipeline;
the blind plate end cover is arranged at one end of the inlet pipeline;
the side wall of the inlet pipeline is vertically communicated with the outlet pipeline, and the outlet pipeline is positioned between the pressure reducing angle valve and the blind plate end cover;
the supporting round steel is vertically welded and fixed on the blind plate end cover;
the wear-resistant hemispheres comprise a plurality of layers, the number of the uppermost layer of wear-resistant hemispheres is one, the number of each layer of wear-resistant hemispheres below the uppermost layer of wear-resistant hemispheres is sequentially increased, the number of each layer of wear-resistant hemispheres is 3-N, and the wear-resistant hemispheres are fixed by spot welding;
the quantity of supporting the round steel equals with the quantity of the wear-resisting hemisphere of lower floor, and the wear-resisting hemisphere that is located lower floor corresponds the upper end that sets up at supporting the round steel, and the height of supporting the round steel can be adjusted according to actual technology operational aspect.
Further, wear-resistant linings are arranged on the inner walls of the inlet pipeline and the outlet pipeline.
Further, the side wall of the inlet pipeline is communicated with the outlet pipeline in a welding mode.
Further, the blind plate end cover is connected with one end of the inlet pipeline in a welding mode.
Further, the number of the wear-resistant hemispheres of each layer is gradually increased from top to bottom.
Further, the material of the wear-resistant hemisphere is a wear-resistant material.
According to the technical scheme, the flash evaporation system buffering device comprises an inlet pipeline, a blind plate end cover, an outlet pipeline, a wear-resistant hemisphere and supporting round steel; a pressure reducing angle valve is arranged on the inlet pipeline; the blind plate end cover is arranged at one end of the inlet pipeline; the side wall of the inlet pipeline is vertically communicated with the outlet pipeline, and the outlet pipeline is positioned between the pressure reducing angle valve and the blind plate end cover; the supporting round steel is vertically welded and fixed on the blind plate end cover; the wear-resistant hemispheres comprise a plurality of layers, and the number of the wear-resistant hemispheres at the uppermost layer is one; the quantity of supporting round steel equals with the quantity of the wear-resisting hemisphere of lower floor, and the wear-resisting hemisphere that is located lower floor corresponds the upper end that sets up at supporting round steel. Through supporting round steel welding multilayer wear-resisting hemisphere on the blind plate end cover in the embodiment of this application, multilayer wear-resisting hemisphere piles up staggered arrangement, makes black water outdated, cushions layer upon layer, and rivers disperse to the circumferencial direction, and the effectual black water that has slowed down erodees blind plate end cover axial.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic diagram of a flash vaporization system buffering device provided herein;
FIG. 2 is a schematic diagram of the application position of a flash system buffering device provided by the present application in a process system;
FIG. 3 is a cross-sectional view A-A of FIG. 1 as provided herein.
Illustration of the drawings: 1-inlet pipeline, 11-pressure reducing angle valve, 2-blind plate end cover, 3-outlet pipeline, 4-wear-resistant hemisphere, 5-supporting round steel and 6-wear-resistant lining.
Detailed Description
Referring to fig. 1, a flash evaporation system buffering device provided by an embodiment of the present application is shown, and the flash evaporation system buffering device includes an inlet pipe 1, a blind end cover 2, an outlet pipe 3, a wear-resistant hemisphere 4, and support round steel 5;
the flash system buffering device is applied in the system shown in fig. 2.
A pressure reducing angle valve 11 is arranged on the inlet pipeline 1;
the blind plate end cover 2 is arranged at one end of the inlet pipeline 1;
the side wall of the inlet pipeline 1 is vertically communicated with the outlet pipeline 3, and the outlet pipeline 3 is positioned between the pressure reducing angle valve 11 and the blind plate end cover 2;
specifically, inlet pipe 1 connects with decompression angle valve 11, and inlet pipe 1's the lowest end seals through blind plate end cover 2, inlet pipe 1's lateral wall with outlet pipe 3 communicates. The inlet pipeline 1 and the outlet pipeline 3 form a T-shaped three-way structure which is turned by 90 degrees.
One end of the outlet pipeline 3, which is far away from the inlet pipeline 1, is communicated with a black water inlet of the flash tank, and the inlet pipeline 1 and the outlet pipeline 3 are both made of wear-resistant steel.
The supporting round steel 5 is vertically welded and fixed on the blind plate end cover 2;
as shown in fig. 3, the wear-resistant hemispheres 4 comprise a plurality of layers, the number of the wear-resistant hemispheres 4 on the uppermost layer is one, the number of the wear-resistant hemispheres on each layer below the wear-resistant hemispheres on the uppermost layer is sequentially increased, the number of the wear-resistant hemispheres on each layer is 3-N, and the wear-resistant hemispheres are fixed by spot welding;
the quantity of the supporting round steel 5 is equal to that of the wear-resistant hemispheres 4 at the lowermost layer, and the wear-resistant hemispheres 4 at the lowermost layer are correspondingly welded and fixed at the upper ends of the supporting round steel 5.
Specifically, the wear-resistant hemisphere 4 is connected with the blind plate end cover 2 through the supporting round steel 5.
It should be noted that the number of the wear-resistant hemispheres 4 on the uppermost layer is 1, the number of the wear-resistant hemispheres on each layer below the wear-resistant hemispheres on the uppermost layer is sequentially increased, and the number of the wear-resistant hemispheres on each layer is 3-N. Through the diameter of the wear-resisting hemisphere of reasonable setting upper and lower floor, and the wear-resisting hemisphere of upper and lower floor is along circumference staggered arrangement, when making black water flow through buffer, rivers direction layer diffuses to the circumferencial direction, slows down the direct impact of black water to blind plate end cover 2, prolongs this flash evaporation system buffer life, guarantees the long period running of system.
In some embodiments, the inner walls of the inlet and outlet pipes 1, 3 are provided with wear resistant linings 6.
Specifically, the wear-resistant lining 6 is made of wear-resistant materials, has the characteristics of scour resistance and wear resistance, and can effectively prolong the service life of the inlet pipeline 1 and the outlet pipeline 3.
In some embodiments, the side wall of the inlet duct 1 communicates with the outlet duct 3 by welding.
In some embodiments, the blind end cap 2 is connected to one end of the inlet pipe 1 by welding.
Specifically, the sealing performance of the buffer device can be ensured by connecting the blind plate end cover 2 and one end of the inlet pipeline 1 in a welding mode. In addition, in the operation process, the thickness of the inlet pipeline 1 and the blind plate end cover 2 is measured by means of ultrasonic waves and the like at regular intervals, and whether the buffer device is maintained or replaced is determined according to the measurement result.
In some embodiments, the number of wear resistant hemispheres 4 per layer increases from top to bottom.
In some embodiments, the material of the wear resistant hemisphere 4 is a wear resistant material. The multi-layer wear-resistant hemisphere 4 is made of wear-resistant materials and has scour resistance and wear resistance.
According to the technical scheme, the flash evaporation system buffering device comprises an inlet pipeline, a blind plate end cover, an outlet pipeline, a wear-resistant hemisphere and supporting round steel; a pressure reducing angle valve is arranged on the inlet pipeline; the blind plate end cover is arranged at one end of the inlet pipeline; the side wall of the inlet pipeline is vertically communicated with the outlet pipeline, and the outlet pipeline is positioned between the pressure reducing angle valve and the blind plate end cover; the supporting round steel is vertically welded and fixed on the blind plate end cover; the wear-resistant hemispheres comprise a plurality of layers, and the number of the wear-resistant hemispheres at the uppermost layer is one; the quantity of supporting round steel equals with the quantity of the wear-resisting hemisphere of lower floor, and the wear-resisting hemisphere that is located lower floor corresponds the upper end that sets up at supporting round steel. Through supporting round steel welding multilayer wear-resisting hemisphere on the blind plate end cover in the embodiment of this application, multilayer wear-resisting hemisphere piles up staggered arrangement, makes black water outdated, cushions layer upon layer, and rivers disperse to the circumferencial direction, and the effectual black water that has slowed down erodees blind plate end cover axial.
Other embodiments of the present application will be apparent to those skilled in the art from consideration of the specification and practice of the application disclosed herein. This application is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the application and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the application being indicated by the following claims.
It will be understood that the present application is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the application is limited only by the appended claims.
Claims (6)
1. A flash evaporation system buffering device is characterized by comprising an inlet pipeline (1), a blind plate end cover (2), an outlet pipeline (3), a wear-resistant hemisphere (4) and supporting round steel (5);
a pressure reducing angle valve (11) is arranged on the inlet pipeline (1);
the blind plate end cover (2) is arranged at one end of the inlet pipeline (1);
the side wall of the inlet pipeline (1) is vertically communicated with the outlet pipeline (3), and the outlet pipeline (3) is positioned between the pressure reducing angle valve (11) and the blind plate end cover (2);
the supporting round steel (5) is vertically welded and fixed on the blind plate end cover (2);
the wear-resistant hemispheres (4) comprise a plurality of layers, the number of the wear-resistant hemispheres (4) on the uppermost layer is one, the number of the wear-resistant hemispheres on each layer below the wear-resistant hemispheres on the uppermost layer is sequentially increased, the number of the wear-resistant hemispheres on each layer is 3-N, and the wear-resistant hemispheres are fixed by spot welding;
the quantity of supporting round steel (5) equals with the quantity of the wear-resisting hemisphere (4) of lower floor, and the wear-resisting hemisphere (4) that is located the lower floor corresponds the upper end that sets up at supporting round steel (5).
2. A flash system buffering device according to claim 1, characterized in that the inlet pipe (1) and the outlet pipe (3) are provided with wear resistant lining (6) on their inner walls.
3. A flash system buffer device according to claim 1, wherein the side wall of the inlet pipe (1) communicates with the outlet pipe (3) by means of welding.
4. A flash system buffering device according to claim 1, wherein the blind end cap (2) is connected to one end of the inlet pipe (1) by welding.
5. A flash evaporation system buffer device according to claim 1, wherein the number of wear resistant hemispheres (4) of each layer increases from top to bottom.
6. A flash system buffering device according to claim 1, wherein the material of the wear resistant hemisphere (4) is a wear resistant material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921119554.8U CN210356064U (en) | 2019-07-17 | 2019-07-17 | Flash distillation system buffer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921119554.8U CN210356064U (en) | 2019-07-17 | 2019-07-17 | Flash distillation system buffer |
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| CN210356064U true CN210356064U (en) | 2020-04-21 |
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| CN201921119554.8U Active CN210356064U (en) | 2019-07-17 | 2019-07-17 | Flash distillation system buffer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110251979A (en) * | 2019-07-17 | 2019-09-20 | 宁夏神耀科技有限责任公司 | A kind of flash system buffer unit |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110251979A (en) * | 2019-07-17 | 2019-09-20 | 宁夏神耀科技有限责任公司 | A kind of flash system buffer unit |
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