CN210110719U - Constant temperature liquid supply device - Google Patents
Constant temperature liquid supply device Download PDFInfo
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- CN210110719U CN210110719U CN201920839409.0U CN201920839409U CN210110719U CN 210110719 U CN210110719 U CN 210110719U CN 201920839409 U CN201920839409 U CN 201920839409U CN 210110719 U CN210110719 U CN 210110719U
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- 239000007788 liquid Substances 0.000 title claims abstract description 512
- 238000010438 heat treatment Methods 0.000 claims abstract description 54
- 238000003860 storage Methods 0.000 claims abstract description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 64
- 238000001914 filtration Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 72
- 239000003814 drug Substances 0.000 abstract description 48
- 239000000126 substance Substances 0.000 description 48
- 238000001039 wet etching Methods 0.000 description 14
- 238000005530 etching Methods 0.000 description 8
- 239000012530 fluid Substances 0.000 description 8
- 238000009529 body temperature measurement Methods 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 4
- 230000001276 controlling effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000008485 antagonism Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
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Abstract
The utility model provides a constant temperature supplies liquid device supplies with constant temperature liquid to liquid equipment, include: a reservoir for containing a liquid; a liquid supply pipeline for supplying liquid to the liquid using equipment, wherein one end of the liquid supply pipeline is connected with the liquid storage tank, and the other end of the liquid supply pipeline is connected with the liquid using equipment; the liquid return pipeline is used for receiving liquid returned from the liquid using equipment, one end of the liquid return pipeline is connected with the liquid storage tank, and the other end of the liquid return pipeline is connected with the liquid using equipment; the main heater is used for heating liquid in the liquid supply pipeline and is arranged on the liquid supply pipeline; and the branch pipeline is used for returning the liquid in the liquid supply pipeline to the liquid storage tank, one end of the branch pipeline is connected with the liquid storage tank, and the other end of the branch pipeline is connected to the liquid supply pipeline between the main heater and the liquid using equipment. The utility model discloses an introduce the tributary pipeline, make the wet process liquid medicine that reaches target temperature flow back to the reservoir in to through introducing auxiliary heater, unify the heating to the backward flow liquid medicine, make the liquid medicine temperature in the reservoir more be close target temperature, liquid medicine temperature control is more accurate steady, has reduced main heater's load.
Description
Technical Field
The utility model relates to a semiconductor integrated circuit makes the field, especially relates to a constant temperature supplies liquid device.
Background
In the manufacturing process of semiconductor integrated circuits, wet etching and cleaning are an important process. Since the temperature of the wet chemical solution has an important influence on the rate and uniformity of wet etching and other key process parameters, the requirement on the control accuracy of the temperature of the wet chemical solution is continuously increased along with the development of semiconductor manufacturing processes.
At present, in a wet chemical liquid supply device equipped in a single wafer wet etching machine, a heater is generally used to uniformly heat wet chemical liquid output from a chemical liquid tank to make the temperature of the wet chemical liquid reach a temperature required by a wet etching process, and the wet chemical liquid reflowing after use is recovered to the chemical liquid tank. The temperature control system of the wet chemical liquid supply device generally controls the operating state of the heater by a PID (proportional integral derivative) or DAC (demand predictive control) method or the like to ensure that the temperature of the output wet chemical liquid is maintained at a constant temperature.
However, since the wet chemical solution supply device often needs to supply liquid to a plurality of liquid usage units for different purposes, and the temperatures of the wet chemical solutions flowing back from the liquid usage units are different, the temperature of the wet chemical solution in the chemical solution tank fluctuates greatly during the operation of the equipment. When the temperature fluctuation range of the liquid medicine tank exceeds the temperature control capability of the system, the temperature of the output wet liquid medicine is fluctuated, so that overtemperature alarm is caused, and the equipment is abnormally shut down; in addition, along with the fluctuation of the temperature of the liquid medicine, the heater can be frequently started or stopped under the control of the temperature control system, the use load is increased, the service life of equipment parts such as the heater is greatly shortened, and the equipment maintenance cost is increased. The influence of the defects is more remarkable along with the increase of the number of the liquid using units, the improvement of the requirement of temperature control precision and the improvement of the target temperature of the wet-process liquid medicine.
Therefore, there is a need for a new constant temperature liquid supply device that solves the above problems.
SUMMERY OF THE UTILITY MODEL
In view of the above shortcomings of the prior art, an object of the present invention is to provide a constant temperature liquid supply device for solving the problems of the prior art that the temperature fluctuation of the constant temperature liquid supply device is large, the heater is loaded, and the application of the multi-purpose liquid unit, the high temperature control precision and the high liquid temperature cannot be satisfied.
In order to achieve the above objects and other related objects, the present invention provides a constant temperature liquid supply device, which is characterized in that the constant temperature liquid supply device is connected to a liquid consumption device, and supplies liquid to the liquid consumption device, and receives the liquid from the liquid consumption device, the constant temperature liquid supply device includes:
a reservoir for containing the liquid;
a liquid supply pipeline for supplying the liquid to the liquid using equipment, wherein one end of the liquid supply pipeline is connected with the liquid storage tank, and the other end of the liquid supply pipeline is connected with the liquid using equipment;
the liquid return pipeline is used for receiving the liquid returned from the liquid using equipment, one end of the liquid return pipeline is connected with the liquid storage tank, and the other end of the liquid return pipeline is connected with the liquid using equipment;
a main heater for heating the liquid in the liquid supply pipeline, which is arranged on the liquid supply pipeline;
and the branch pipeline is used for returning the liquid in the liquid supply pipeline to the liquid storage tank, one end of the branch pipeline is connected with the liquid storage tank, and the other end of the branch pipeline is connected to the liquid supply pipeline between the main heater and the liquid using equipment.
As an alternative of the present invention, the constant temperature liquid supply device further comprises a heater for heating the liquid in the liquid return pipeline, and the auxiliary heater is arranged on the liquid return pipeline.
As an alternative of the present invention, the auxiliary heater is a water bath heater that heats by using constant-temperature circulating water as a heat source.
As an alternative of the present invention, the water bath heater comprises:
the heating pipe is used for circulating the circulating water and heating the liquid in the liquid return pipeline through heat exchange and is arranged on the liquid return pipeline; one end of the heating pipe is a liquid inlet end, the other end of the heating pipe is a liquid outlet end, and the circulating water flows into the heating pipe from the liquid inlet end of the heating pipe and flows out from the liquid outlet end of the heating pipe;
a hot water source for supplying the circulating water to the inlet end of the heating pipe and receiving the circulating water returned from the outlet end of the heating pipe;
the circulating water supply pipe is connected with the liquid inlet end of the heating pipe and the hot water source;
the circulating water return pipe is connected with the liquid outlet end of the heating pipe and the hot water source;
and the flow control valve is used for adjusting the flow of the circulating water and is arranged on the circulating water supply pipe.
As an alternative of the present invention, the auxiliary heater is an electric heater.
As an alternative of the present invention, the constant temperature liquid supply device further comprises a branch flow control valve for regulating the flow of the liquid in the branch flow pipeline, the branch flow control valve is arranged on the branch flow pipeline.
As an alternative of the present invention, the constant-temperature liquid supply device further includes:
the liquid storage tank temperature measuring unit is used for measuring the temperature of the liquid in the liquid storage tank and is arranged in the liquid storage tank;
and the main heater control unit is used for controlling the main heater to work according to the temperature of the liquid in the liquid storage tank and is connected with the liquid storage tank temperature measuring unit and the main heater.
As an alternative of the present invention, the constant temperature liquid supply device further comprises a liquid pump for pumping the liquid into the liquid storage tank, the liquid pump is disposed between the main heater and the liquid storage tank, and the liquid pump is disposed on the liquid supply pipeline.
As an alternative of the present invention, the constant temperature liquid supply device further includes a filter for filtering the liquid, and the branch pipe and the junction of the liquid supply pipe are defined as branch pipe connection points, and the filter is disposed between the main heater and the branch pipe connection points on the liquid supply pipe.
As an alternative of the present invention, the liquid supply pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid usage modules in the liquid usage equipment; the liquid return pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid using modules in the liquid using equipment.
As an alternative of the present invention, the liquid supply pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid usage units in the liquid usage module; the liquid return pipeline of the constant-temperature liquid supply device is connected to the plurality of liquid using units in the liquid using module.
As above, the utility model provides a constant temperature supplies liquid device through introducing the tributary pipeline, makes the wet process liquid medicine that reaches target temperature flow back to the reservoir in to through introducing auxiliary heater, carry out unified heating to the liquid medicine that flows back, make the liquid medicine temperature in the reservoir more be close target temperature, liquid medicine temperature control is more accurate steady, has reduced main heater's load.
Drawings
Fig. 1 is a schematic view illustrating a constant-temperature liquid supply device according to a first embodiment of the present invention.
Description of the element reference numerals
10 constant temperature liquid supply device
101 liquid storage tank
101a liquid storage tank temperature measuring unit
102 liquid supply pipeline
102a liquid supply pump
102b filter
103 liquid return pipeline
104 main heater
104a Main Heater control Unit
105 branch pipeline
105a branch control valve
106 auxiliary heater
106a heating pipe
106b hot water source
106c circulating water supply pipe
106d circulating water return pipe
106e flow control valve
20 liquid using equipment
201 first liquid module
201a flow meter
201b shunt pipeline valve
201c supply line valve
201d flushing unit
201e etching process unit
201f wafer carrying table
201g first liquid collecting device
201h second liquid collecting device
202 second liquid module
203 third liquid module
31 first temperature measuring point
32 second temperature measuring point
33 third temperature measuring point
34 fourth temperature measuring point
35 fifth temperature measuring point
36 sixth temperature measuring point
37 seventh temperature measuring point
38 eighth temperature measuring point
39 ninth temperature measuring point
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will be readily apparent to those skilled in the art from the disclosure herein. The present invention can also be implemented or applied through other different specific embodiments, and various details in the present specification can be modified or changed based on different viewpoints and applications without departing from the spirit of the present invention.
Please refer to fig. 1. It should be noted that the drawings provided in the present embodiment are only schematic and illustrative of the basic idea of the present invention, and although the drawings only show the components related to the present invention and are not drawn according to the number, shape and size of the components in actual implementation, the form, quantity and proportion of the components in actual implementation may be changed at will, and the layout of the components may be more complicated.
Example one
Referring to fig. 1, the present embodiment provides a constant temperature liquid supply apparatus 10, the constant temperature liquid supply apparatus being connected to a liquid device 20, supplying a liquid to the liquid device 20, and receiving the liquid flowing back from the liquid device 20, the constant temperature liquid supply apparatus 10 including:
a reservoir 101 for containing the liquid;
a liquid supply line 102 for supplying the liquid to the liquid consuming apparatus 20, one end of the liquid supply line being connected to the liquid tank 101, and the other end thereof being connected to the liquid consuming apparatus 20;
a liquid return pipeline 103 for receiving the liquid returned from the liquid using device 20, one end of the liquid return pipeline is connected with the liquid storage tank 101, and the other end of the liquid return pipeline is connected with the liquid using device 20;
a main heater 104 for heating the liquid in the liquid supply line 102, disposed on the liquid supply line 102;
a branch pipe 105 for returning the liquid in the liquid supply pipe 102 to the liquid storage tank 101, one end of which is connected to the liquid storage tank 101, and the other end of which is connected to the liquid supply pipe 102 between the main heater 104 and the liquid consuming device 20.
In FIG. 1, theThe constant-temperature liquid supply device 10 includes the reservoir 101 for storing wet-process liquid medicine, and the wet-process liquid medicine is supplied to the liquid using equipment 20 through the liquid supply pipeline 102 and flows back to the reservoir 101 through the liquid return pipeline 103. In this embodiment, the liquid-using device 20 is a single-wafer wet etching device, and the wet chemical liquid may be ST250, 49% HF, TMAH, or 86% H according to the requirements of the wet etching or cleaning process3PO4Or SPM, etc. According to different technological requirements of etching or cleaning, the wet-process liquid medicine can also adopt different standard technological temperatures. For example, the process temperature for ST250 is 40 deg.C, 49% HF is 60 deg.C, TMAH is 65 deg.C, 86% H3PO4The process temperature of (2) is 160 ℃ and the process temperature of SPM is 130 ℃. In the operation process of the single-wafer wet etching device, at different process stages, the temperature of the wet chemical liquid flowing back through the liquid return pipeline 103 fluctuates, so that the temperature of the wet chemical liquid stored in the liquid storage tank 101 fluctuates. The utility model discloses an introduce branch pipeline 105 will pass through the partial wet process liquid medicine of main heater 104 heating flows back extremely in the reservoir 101, and then makes the wet process liquid medicine temperature of reservoir 101 is more stable, reduces the negative effects that the temperature fluctuation of the wet process liquid medicine of liquid return pipeline 103 backward flow brought alleviate the work load that main heater 104 produced because of the undulant frequent switch of temperature. It should be noted that the present invention provides a constant temperature liquid supply device which is not limited to be used in a single wafer wet etching device, but can also be used in constant temperature liquid supply of a groove wet etching device or other types of liquid using devices in other embodiments.
As an example, as shown in fig. 1, the constant-temperature liquid supply device 10 further includes an auxiliary heater 106 for heating the liquid in the liquid return pipeline 103, and the auxiliary heater is disposed on the liquid return pipeline 103. Optionally, the auxiliary heater 106 is a water bath heater that heats with constant temperature circulating water as a heat source. Because water has a large specific heat capacity as a heat exchange medium, when the heat is heated by the water bath method, the influence caused by temperature fluctuation of the wet method liquid medicine in the liquid return pipeline 103 is small, and the heat can be heated to a preset target temperature, namely the standard process temperature of each wet method liquid medicine, at a uniform water bath heating temperature. The utility model discloses an introduce auxiliary heater 106, to the via return liquid pipeline 103 flows back extremely the wet process liquid medicine of reservoir 101 preheats, has further reduced the temperature fluctuation of the wet process liquid medicine of backward flow, and then alleviates main heater 104 is because of the work load that the undulant frequent switch of temperature produced. The constant temperature of the circulating water in the water bath heater can be set according to the liquid medicine used in the wet process and the process temperature thereof.
As an example, as shown in fig. 1, the water bath heater includes:
a heating pipe 106a for circulating the circulating water and heating the liquid in the liquid return pipeline by heat exchange is arranged on the liquid return pipeline 103; one end of the heating pipe 106a is a liquid inlet end, and the other end is a liquid outlet end, and the circulating water flows into the heating pipe 106a from the liquid inlet end of the heating pipe 106a and flows out from the liquid outlet end of the heating pipe 106 a; alternatively, the heating pipe 106a may be a metal spiral pipe disposed around the liquid return pipe 103, and contacts the liquid return pipe 103 to exchange heat with the wet chemical in the liquid return pipe 103.
A hot water source 106b for supplying the circulating water to the inlet end of the heating pipe 106a and receiving the circulating water returned from the outlet end of the heating pipe; optionally, the hot water source 106b provides heated deionized water that removes ionic impurities that tend to cause fouling, reducing the frequency of maintenance of the water bath heater. The hot water source 106b may be supplied with deionized water from the plant side and generate heated deionized water by the heating device.
A circulating water supply pipe 106c connecting a liquid inlet end of the heating pipe 106a and the hot water source 106 b;
a circulating water return pipe 106d connecting the liquid outlet end of the heating pipe 106a and the hot water source 106 b; the circulating water supply pipe 106c and the circulating water return pipe 106d may be formed of a heat insulating material to improve the thermal efficiency of the circulating water bath.
A flow control valve 106e for adjusting the flow rate of the circulating water is provided in the circulating water supply pipe 106 c. The flow control valve 106e can control the flow of the circulating water, so as to control the heat exchange process between the heating pipe 106a and the liquid return pipeline 103, and avoid overheating or overcooling of the wet chemical liquid in the liquid return pipeline 103.
The utility model discloses an in other embodiments, auxiliary heater also can select uses electric heater, through set up temperature measuring device on the liquid return pipeline, electric heater basis the temperature of temperature measuring device feedback is right wet process liquid medicine in the liquid return pipeline heats.
As an example, as shown in fig. 1, the constant-temperature liquid supply device 10 further includes a branch control valve 105a for adjusting the liquid flow rate in the branch pipeline 105, and the branch control valve 105a is disposed on the branch pipeline 105. The flow rate of the wet process chemical liquid returned to the reservoir 101 via the branch line 105 can be controlled by the branch control valve 105 a. By controlling the flow rate, the robustness of the system against temperature fluctuation can be further improved.
As an example, as shown in fig. 1, the constant-temperature liquid supply device 10 further includes:
the liquid storage tank temperature measuring unit 101a is used for measuring the temperature of the liquid in the liquid storage tank 101 and is arranged in the liquid storage tank 101; optionally, the reservoir temperature measuring unit 101a includes a temperature sensor, and is disposed on a sidewall of the reservoir 101, and contacts with the wet chemical liquid in the tank to measure the temperature of the wet chemical liquid in real time.
And the main heater control unit 104a is used for controlling the main heater to work according to the temperature of the liquid in the liquid storage tank 101 and is connected with the liquid storage tank temperature measuring unit 101a and the main heater 104. The main heater control unit 104a reads the measured temperature of the reservoir temperature measuring unit 101a, and controls the working state of the main heater 104 by PID (proportional integral derivative control) or DAC (demand predictive control) or other methods, so as to ensure that the temperature of the wet process chemical liquid output from the liquid supply pipeline 102 is kept at a constant temperature.
As an example, as shown in fig. 1, the constant-temperature liquid supply device 10 further includes a liquid supply pump 102a for drawing the liquid in the reservoir 101 into the liquid supply pipeline 102, and the liquid supply pump 102a is disposed on the liquid supply pipeline 102 between the main heater 104 and the reservoir 101. In the present invention, since the branch pipe 105 is additionally provided on the liquid supply pipe 102, the working power of the liquid supply pump 102a should be appropriately increased to ensure that the performance of supplying the wet chemical liquid to the liquid using device 20 is not affected.
As an example, as shown in fig. 1, the constant-temperature liquid supply device 10 further includes a filter 102b for filtering the liquid, a connection point of the branch pipe 105 and the liquid supply pipe 102 is defined as a branch pipe connection point, and the filter 102b is disposed on the liquid supply pipe 102 between the main heater 104 and the branch pipe connection point. The filter is crucial for controlling the granularity of wet etching or cleaning equipment, and the utility model discloses an install filter 102b before the branch pipeline 105 with the tie point of liquid supply pipeline 102, its filterable wet process liquid medicine not only to supply with liquid equipment 20, also through branch pipeline 105 flows back to in the reservoir 101. This means that during the operation of the constant-temperature liquid supply device, the wet-process chemical liquid stored in the reservoir tank 101 passes through the loop formed by the liquid supply pipeline 102, the filter 102b and the branch pipeline 105, and is continuously purified through circulation filtration. This has undoubtedly promoted the cleanliness factor of wet process liquid medicine by a wide margin, has reduced the granule pollution risk.
As an example, as shown in fig. 1, the liquid supply pipeline 102 of the constant-temperature liquid supply device 10 is connected to a plurality of liquid usage modules in the liquid usage equipment 20; the liquid return pipeline 103 of the constant-temperature liquid supply device 10 is connected to a plurality of liquid using modules in the liquid using equipment. In this embodiment, the liquid using apparatus 20 is a single wafer wet etching apparatus, and includes a plurality of etching modules capable of accommodating a single wafer for wet etching, such as a first liquid module 201, a second liquid module 202, and a third liquid module 203 in fig. 1. It should be noted that fig. 1 only shows the specific structure of the first fluid module 201, and the second fluid module 202 and the third fluid module 203 are only indicated schematically. The liquid using device 20 may be equipped with more liquid using modules, and is not limited to the three shown in the present embodiment. The liquid using module is not limited to the same etching process, and the utility model can be used for supplying the same liquid medicine in different etching processes. Furthermore, the structure of the fluid consuming device 20 in fig. 1 is also only schematically indicated, and the individual fluid consuming modules and the individual components thereof may vary from device to device.
As an example, as shown in fig. 1, the liquid supply pipeline 102 of the constant-temperature liquid supply device 10 is connected to a plurality of liquid usage units in the liquid usage module; the liquid return pipeline 103 of the constant-temperature liquid supply device 10 is connected to a plurality of liquid using units in the liquid using module. Optionally, in fig. 1, the liquid using unit in the first liquid module 201 includes a rinsing unit 201d, an etching process unit 201e, and the like, and the dark arrows indicate the flowing direction of the wet process chemical liquid. In addition, the second fluid module 202 and the third fluid module 203 also include respective fluid usage units, which are not shown in fig. 1.
In order to clarify the technical effects achieved by the present invention in detail, several temperature measuring points from the first temperature measuring point 31 to the ninth temperature measuring point 39 are defined in the positions indicated in fig. 1. It should be noted that the temperature measuring point may be measured by a temperature measuring unit actually existing in the device, for example, the temperature of the liquid storage tank represented by the first temperature measuring point 31 may be measured in real time by the liquid storage tank temperature measuring unit 101 a; or real-time temperature measurement is not required, and the method is only used for conceptual representation.
As shown in fig. 1, the temperature of the reservoir tank 101 measured by the first temperature measurement point 31 represents the temperature of the wet chemical stored therein. Since the temperature may not reach the temperature required by the wet process, when the wet chemical liquid enters the liquid supply pipeline 102, the main heater 104 is required to heat the liquid supply temperature measured at the second temperature measurement point 32 to reach the temperature required by the wet process. Part of the wet chemical liquid flows back to the reservoir 101 through the branch line 105. Since the wet-process liquid medicine is heated by the main heater 104, the temperature of the liquid medicine measured at the seventh temperature measuring point 37 is in accordance with the temperature standard required by the wet-process technology, and after the liquid medicine flows back into the reservoir 101, the wet-process liquid medicine in the reservoir 101 is heated. This will make the temperature control of the wet process liquid medicine in the whole system more stable, reduce the disturbance of the external medium to the system temperature, lighten the work load of the said main heater 104.
The wet chemical liquid meeting the temperature required by the wet process is supplied to the liquid using device 20 through the liquid supply pipeline 102. As an example, the liquid using apparatus 20 shown in fig. 1 has three liquid using modules, namely a first liquid using module 201, a second liquid using module 202 and a third liquid using module 203. In the first liquid module 201, the wet chemical liquid is supplied to a plurality of different liquid units. The temperature of the finally returned wet process chemical liquid will be different according to the process difference of the plurality of liquid using units, that is, the temperature of the fourth temperature measuring point 34, the fifth temperature measuring point 35 and the sixth temperature measuring point 36 in fig. 1 has a large difference. The wet chemical solution is also supplied to each of the liquid using units in the second liquid using module 202 and the third liquid using module 203, and has a backflow wet chemical solution having different temperatures, which will not be described herein. This causes the temperature of the returned wet chemical liquid in the liquid return pipe 103, i.e., the temperature of the third temperature measuring point 33 in fig. 1, to fluctuate greatly depending on the liquid usage of each liquid usage unit. For example, in the first liquid module 201, when wet etching is not performed, all wet chemical liquid is controlled in flow by the flow meter 201a and flows back to the liquid return line 103 through the shunt line valve 201b of the shunt line. Neglecting the cooling caused by pipeline transportation, at this time, the wet process chemical liquid temperature of the third temperature measurement point 33 is substantially equal to the wet process chemical liquid temperature of the fourth temperature measurement point 34, and is also substantially equal to the liquid supply temperature of the second temperature measurement point 32 in the liquid supply pipeline 102. When the first liquid module 201 loads the wafer on the wafer carrying table 201f and performs wet etching, the wet chemical liquid is supplied to the rinsing unit 201d and the etching process unit 201e through the supply pipeline valve 201 c. After the process is completed, the wet-process liquid medicine is recovered through the first liquid collecting device 201g and the second liquid collecting device 201h, and flows back to the liquid return pipeline 103. In the etching process, the wet process liquid medicine contacts the wafer and the equipment component, and the temperature of the wet process liquid medicine is obviously reduced, that is, the liquid supply temperature of the second temperature measuring point 32 in the liquid supply pipeline 102 is obviously reduced compared with the temperature of the fifth temperature measuring point 35 and the sixth temperature measuring point 36, which causes the temperature of the wet process liquid medicine of the third temperature measuring point 33 to be reduced. Therefore, it can be seen that the wet process chemical liquid temperature of the third temperature measuring point 33 will fluctuate continuously according to the process variation of the first liquid module 201. In addition, the temperature of the wet process chemical liquid at the third temperature measuring point 33 will fluctuate more frequently in consideration of the temperature fluctuations of the returned wet process chemical liquid in the second liquid module 202 and the third liquid module 203. The utility model discloses an introduce auxiliary heater 106, it is right the wet process liquid medicine of backward flow carries out constant temperature heating in the return line 103. Optionally, the auxiliary heater 106 is a water bath heater, and the temperature of the wet chemical liquid flowing back in the liquid return pipeline 103 after being heated in a water bath, that is, the temperature of the wet chemical liquid at the eighth temperature measuring point 38, is maintained to meet the temperature standard required by the wet process, that is, the temperature required to be maintained by the wet chemical liquid in the reservoir 101, by the water bath heating temperature at the ninth temperature measuring point 39 provided by the auxiliary heater 106. By heating with the water bath heater, the temperature of the wet chemical liquid flowing back in the liquid return pipeline 103 is maintained at a relatively stable level without frequent and large fluctuation. This will also maintain the wet chemical in the reservoir 101 in a stable temperature range, thereby reducing the workload of the main heater 104 by reducing the fluctuating output of the output power of the main heater 104, making the temperature control of the wet chemical more accurate and stable, and reducing the risk of over-temperature alarm of the device.
Example two
In this embodiment, compared with the first embodiment, the difference of the constant temperature liquid supply apparatus is that a liquid supply pipeline of the constant temperature liquid supply apparatus is connected with a plurality of liquid using devices and supplies liquid to the plurality of liquid using devices.
Because the existing constant-temperature liquid supply device only controls the main heater by means of PID or DAC to realize constant-temperature heating liquid supply, the existing constant-temperature liquid supply device is limited to the working capacity of the main heater and frequent switching caused by temperature fluctuation of returned wet-process liquid medicine, and the number of liquid supply units is greatly limited. Meanwhile, the maximum upper limit of the liquid supply temperature of the constant-temperature liquid supply also exists, because the higher the liquid supply temperature is, the more remarkable the influence caused by the temperature fluctuation of the reflux wet-process liquid medicine is. This greatly limits the scale of integration of existing constant temperature liquid supply devices. For a plurality of liquid-using devices, a plurality of constant-temperature liquid supply devices are required to be correspondingly configured, which not only increases the equipment cost and the occupied space of a factory, but also increases the labor and time cost consumed during equipment maintenance.
The utility model discloses in introduced be used for with the auxiliary heater of the wet process liquid medicine in the branch pipeline of heated wet process liquid medicine backward flow to the reservoir and being arranged in heating the liquid return pipeline in the liquid supply pipeline, this has improved the undulant ability of system's antagonism backward flow liquid medicine temperature by a wide margin, has not only reduced the load of the frequent switch of main heater by a wide margin, also makes constant temperature supply liquid device more accurate steady to thermostatic control. Adopt the utility model provides a constant temperature supplies liquid device can supply liquid to more liquid units, and the maximum liquid temperature that supplies of constant temperature liquid also can obtain promoting by a wide margin. Alternatively, the constant-temperature liquid supply device may be integrated with liquid supply devices of a plurality of liquid utilization devices, or even used as a total supply source of a certain constant-temperature wet-process liquid medicine. The device not only can save the occupied space of a plurality of liquid supply devices, improve the liquid supply uniformity of wet-process liquid medicine of a plurality of devices, but also can reduce the maintenance cost of the constant-temperature liquid supply device.
To sum up, the utility model provides a constant temperature supplies liquid device, constant temperature supplies liquid device to connect and uses liquid equipment, to with liquid equipment supplies with liquid, and the receipt is followed with liquid equipment backward flow liquid, constant temperature supplies liquid device to include: a reservoir for containing the liquid; a liquid supply pipeline for supplying the liquid to the liquid using equipment, wherein one end of the liquid supply pipeline is connected with the liquid storage tank, and the other end of the liquid supply pipeline is connected with the liquid using equipment; the liquid return pipeline is used for receiving the liquid returned from the liquid using equipment, one end of the liquid return pipeline is connected with the liquid storage tank, and the other end of the liquid return pipeline is connected with the liquid using equipment; a main heater for heating the liquid in the liquid supply pipeline, which is arranged on the liquid supply pipeline; and the branch pipeline is used for returning the liquid in the liquid supply pipeline to the liquid storage tank, one end of the branch pipeline is connected with the liquid storage tank, and the other end of the branch pipeline is connected to the liquid supply pipeline between the main heater and the liquid using equipment. The utility model discloses an introduce the tributary pipeline, make the wet process liquid medicine that reaches target temperature flow back to the reservoir in to through introducing auxiliary heater, unify the heating to the backward flow liquid medicine, make the liquid medicine temperature in the reservoir more be close target temperature, liquid medicine temperature control is more accurate steady, has reduced main heater's load.
The above embodiments are merely illustrative of the principles and effects of the present invention, and are not to be construed as limiting the invention. Modifications and variations can be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which may be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (11)
1. A constant-temperature liquid supply apparatus that is connected to a liquid-using device, supplies a liquid to the liquid-using device, and receives the liquid returned from the liquid-using device, the constant-temperature liquid supply apparatus comprising:
a reservoir for containing the liquid;
a liquid supply pipeline for supplying the liquid to the liquid using equipment, wherein one end of the liquid supply pipeline is connected with the liquid storage tank, and the other end of the liquid supply pipeline is connected with the liquid using equipment;
the liquid return pipeline is used for receiving the liquid returned from the liquid using equipment, one end of the liquid return pipeline is connected with the liquid storage tank, and the other end of the liquid return pipeline is connected with the liquid using equipment;
a main heater for heating the liquid in the liquid supply pipeline, which is arranged on the liquid supply pipeline;
and the branch pipeline is used for returning the liquid in the liquid supply pipeline to the liquid storage tank, one end of the branch pipeline is connected with the liquid storage tank, and the other end of the branch pipeline is connected to the liquid supply pipeline between the main heater and the liquid using equipment.
2. The constant-temperature liquid supply device according to claim 1, further comprising an auxiliary heater arranged on the liquid return pipeline for heating the liquid in the liquid return pipeline.
3. The constant-temperature liquid supply device according to claim 2, wherein the auxiliary heater is a water bath heater which heats by using constant-temperature circulating water as a heat source.
4. The apparatus of claim 3, wherein the water bath heater comprises:
the heating pipe is used for circulating the circulating water and heating the liquid in the liquid return pipeline through heat exchange and is arranged on the liquid return pipeline; one end of the heating pipe is a liquid inlet end, the other end of the heating pipe is a liquid outlet end, and the circulating water flows into the heating pipe from the liquid inlet end of the heating pipe and flows out from the liquid outlet end of the heating pipe;
a hot water source for supplying the circulating water to the inlet end of the heating pipe and receiving the circulating water returned from the outlet end of the heating pipe;
the circulating water supply pipe is connected with the liquid inlet end of the heating pipe and the hot water source;
the circulating water return pipe is connected with the liquid outlet end of the heating pipe and the hot water source;
and the flow control valve is used for adjusting the flow of the circulating water and is arranged on the circulating water supply pipe.
5. The apparatus of claim 2, wherein the auxiliary heater is an electric heater.
6. The constant-temperature liquid supply device according to claim 1, further comprising a branch control valve for adjusting the liquid flow in the branch pipeline, wherein the branch control valve is disposed on the branch pipeline.
7. The constant temperature liquid supply apparatus of claim 1, further comprising:
the liquid storage tank temperature measuring unit is used for measuring the temperature of the liquid in the liquid storage tank and is arranged in the liquid storage tank;
and the main heater control unit is used for controlling the main heater to work according to the temperature of the liquid in the liquid storage tank and is connected with the liquid storage tank temperature measuring unit and the main heater.
8. A constant temperature liquid supply device according to claim 1, further comprising a liquid supply pump for drawing the liquid in the reservoir into the liquid supply line, the liquid supply pump being disposed on the liquid supply line between the main heater and the reservoir.
9. The constant-temperature liquid supply device according to claim 1, further comprising a filter for filtering the liquid, wherein a junction between the branch line and the liquid supply line is defined as a branch line connection point, and the filter is disposed on the liquid supply line between the main heater and the branch line connection point.
10. The constant-temperature liquid supply device according to claim 1, wherein the liquid supply pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid using modules in the liquid using equipment; the liquid return pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid using modules in the liquid using equipment.
11. The constant-temperature liquid supply device according to claim 10, wherein the liquid supply pipeline of the constant-temperature liquid supply device is connected to a plurality of liquid using units in the liquid using module; the liquid return pipeline of the constant-temperature liquid supply device is connected to the plurality of liquid using units in the liquid using module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920839409.0U CN210110719U (en) | 2019-06-04 | 2019-06-04 | Constant temperature liquid supply device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920839409.0U CN210110719U (en) | 2019-06-04 | 2019-06-04 | Constant temperature liquid supply device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023051121A1 (en) * | 2021-09-29 | 2023-04-06 | 盛美半导体设备(上海)股份有限公司 | Substrate treatment apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2023051121A1 (en) * | 2021-09-29 | 2023-04-06 | 盛美半导体设备(上海)股份有限公司 | Substrate treatment apparatus |
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