CN210109553U - Interference fringe locking control device - Google Patents
Interference fringe locking control device Download PDFInfo
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- CN210109553U CN210109553U CN201920855074.1U CN201920855074U CN210109553U CN 210109553 U CN210109553 U CN 210109553U CN 201920855074 U CN201920855074 U CN 201920855074U CN 210109553 U CN210109553 U CN 210109553U
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Abstract
The utility model belongs to the technical field of information optics, in order to solve the stripe drift problem in the holographic lithography system, propose an interference stripe locking control device, the first high-speed photodetector gathers the moire fringe light intensity signal on the surface of reference grating, and transmit the light intensity signal to singlechip and PID controller simultaneously; the second high-speed photoelectric detector monitors a light intensity signal of the laser through the light beam sampling grating, the light intensity signal is transmitted to the single chip microcomputer, and a signal output end of the PID controller is transmitted to a frequency modulation input end of the first ultrasonic generator; the PID controller outputs a feedback signal to the first ultrasonic generator, and the output end of the first ultrasonic generator is connected to the first acousto-optic modulator. The PID controller detects a moire fringe light intensity signal on the surface of the reference grating in real time, transmits a feedback signal to the first ultrasonic generator, and drives the phase of-1 st-order diffraction light of the first acousto-optic modulator to change, so that the phase of moire fringes is locked.
Description
This application is application number: 2018221721210, entitled "the product" on 2018, 12, and 24: divisional application of a fringe-locked holographic interference lithography system.
Technical Field
The utility model belongs to the technical field of the information optics, a stripe locking control device is related to.
Background
When a large-sized holographic grating is photographed, a long time of exposure is required because the photographing light intensity is weak. However, the relative phases of the object light and the reference light are changed by external vibration, air flow, temperature fluctuation and other factors, and interference fringes formed by the object light and the reference light are randomly shifted, so that the contrast of the recording fringes is reduced. The current holographic lithography system can not solve the problem of interference fringe drift in a long time, so for a long-time exposure situation, an active vibration isolation method is required to be adopted to control the drift of the interference fringe. The existing stripe locking method comprises the following steps: the invention patent with the patent number of 2006100399676 discloses a linear array CCD fitting fringe locking method, which adopts a linear array CCD to collect reference moire fringes, finds the wave troughs of the fringes through the fitting method, locks the phases of the fringes by controlling piezoelectric ceramics, and has the locking bandwidth of only 2-3 Hz; the invention patent with patent number 2013106933281 discloses a heterodyne fringe locking method, which utilizes a light splitting sheet to derive two sub-beams, respectively uses a phase receiver to receive signals, controls the frequency of a frequency conversion acousto-optic modulator through a man-machine interaction interface and software, and locks interference fringes in real time. Particularly, when the low-noise holographic grating is shot, the exposure recording plate needs to be moved at a low speed in the shooting process, and the vibration of the guide rail can cause the jitter of the interference fringes to change rapidly in the moving process.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problem of contrast reduction caused by fringe drift of the conventional holographic interference lithography system, the technical scheme is as follows:
an interference fringe lock control apparatus for use in a holographic interference lithography system, comprising: first acousto-optic modulator, first supersonic generator, second acousto-optic modulator, second supersonic generator still includes: the system comprises a first high-speed photoelectric detector, a second high-speed photoelectric detector, a PID controller and a single chip microcomputer; the single chip microcomputer is provided with a first input end, a second input end, a reference input end and an output end; the PID controller is provided with a correction signal input end, an input end and a PID signal output end; the first ultrasonic generator is provided with a frequency modulation input end and a frequency modulation output end; the second ultrasonic generator is provided with an output end; the first acousto-optic modulator and the second acousto-optic modulator are provided with input ends; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the first high-speed photoelectric detector collects a light intensity change signal of the grating substrate to be exposed and simultaneously transmits the light intensity change signal to a first input end of the single chip microcomputer and an input end of the PID controller; the second high-speed photoelectric detector collects light intensity change signals of the light source of the holographic interference lithography system, the light intensity signals are transmitted to the second input end of the single chip microcomputer, and the signal output end of the PID controller is connected with the frequency modulation input end of the first ultrasonic generator; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the reference input end of the singlechip inputs the target light intensity of the grating substrate to be exposed, and the output end of the singlechip is connected with the correction signal input end of the PID controller.
The above stripe lockingThe working principle of the holographic interference photoetching system is as follows: in the same optical field, the phase information of the moire fringes reflects the real-time phase information of the interference fringes, and the phase of the moire fringes, that is, the phase of the interference fringes can be locked. The frequency of the second ultrasonic generator in the device is set to be f2, namely the input frequency of the second acousto-optic modulator is set to be a fixed value f2, the frequency f1 of the first ultrasonic generator is adjustable and is in an external signal frequency modulation working state, namely the input frequency f1 of the first acousto-optic modulator changes along with the change of an external signal, and by changing the frequency of the first ultrasonic generator, moire fringes can be moved, namely the phase of interference fringes changes continuously. The moire fringes are projected on the first high-speed photoelectric detector, the light intensity signals of the moire fringes are simultaneously transmitted to the first input end of the single chip microcomputer and the sensor signal input end of the PID controller, the moire fringes move by finely adjusting the frequency f1 of the first ultrasonic generator, and the single chip microcomputer obtains the variation range V of the light intensity signals of the first high-speed photoelectric detectorRmin～VRmaxTaking the median value of the light intensity signal 1/2 (V)Rmin+VRmax) And as a reference signal of the PID controller, the PID controller compares the reference signal with a light intensity signal detected by the first high-speed photoelectric detector in real time at a high speed, if the reference signal and the light intensity signal are different, the PID controller outputs a feedback signal to the first ultrasonic generator to change the output frequency, so that the phase of moire fringes is changed, the position of the moire fringes detected by the first high-speed photoelectric detector is changed, namely the detected light intensity signal is changed, the light intensity signal is input into the PID controller, the reference signal compared by the PID controller at a high speed with the light intensity signal detected by the first high-speed photoelectric detector in real time is repeatedly compared, and the PID outputs a feedback quantity until the reference signal is consistent with the light intensity signal detected by the first high-speed photoelectric detector in real time, and the moire fringes are locked at the moment.
The preferred embodiment described above is as follows: the center frequency f1 of the first ultrasonic generator is 105 MHz-115 MHz, and the frequency f2 of the second ultrasonic generator is 105 MHz-115 MHz; the working mode of the first ultrasonic generator is set as an external signal frequency modulation mode, the modulation frequency is 5KHz, and the input range of the external signal5V to 5V, and the frequency of the corresponding ultrasonic signal is changed to be f1-5KHz to f1+5 KHz; light intensity signal V of the first high-speed photodetectorSThe signal is transmitted to a sensor signal end of the PID controller, and the signal of the second high-speed photoelectric detector is transmitted to a second input end of the singlechip. The initial reference signal end of the singlechip is VR0(ii) a The singlechip executes division and multiplication to calculate a corrected reference signal value VR：VR＝(VR0/VS0)*VSWill VRThe signal is transmitted to a reference signal input end of the PID controller; PID controller real-time comparison VSAnd the output signal of the PID controller and the value of the VR are transmitted to the frequency modulation input end of the first ultrasonic generator, the ultrasonic frequency is changed, the corresponding frequency of the first acousto-optic modulator is changed, and the phase of the holographic interference fringe is controlled in real time.
If the reference signal of the PID controller is not corrected in time, the PID controller can mistakenly send a signal to drive the acousto-optic modulator, so that the stability of stripe locking can be influenced. Due to the use of the technical scheme, the reference signal of the PID controller is corrected in real time, so that the interference fringe locking is realized, the harsh requirements on the ring damping condition and the device structure damping condition are reduced, and the fringe quality is improved.
Drawings
FIG. 1 is a schematic diagram of a fringe-locked holographic interference lithography system;
FIG. 2 is a fringe lock control device;
FIG. 3 is an open loop closed loop error voltage;
FIG. 4 is a power spectral density of an open-loop closed-loop error voltage
Wherein: 1-laser, 2-beam sampling grating, 3-half-wave plate, 4-beam splitting prism, 5-first plane reflector, 6-second plane reflector, 7-third plane reflector, 8-first acousto-optic modulator, 9-second acousto-optic modulator, 10-first spatial filter, 11-second spatial filter, 12-first collimating lens, 13-second collimating lens, 14-grating substrate to be exposed, 15-reference grating, 16-Moire fringe, 17-first high-speed photoelectric detector, 18-second high-speed photoelectric detector, 19-single chip microcomputer, 20-PID controller, 21-first ultrasonic generator and 22-second ultrasonic generator.
Detailed Description
The following is further described in conjunction with the appended drawings:
examples
An interference fringe lock control apparatus for use in a holographic interference lithography system, as shown in fig. 2, comprising: first acousto-optic modulator, first supersonic generator, second acousto-optic modulator, second supersonic generator still includes: the system comprises a first high-speed photoelectric detector, a second high-speed photoelectric detector, a PID controller and a single chip microcomputer; the single chip microcomputer is provided with a first input end, a second input end, a reference input end and an output end; the PID controller is provided with a correction signal input end, an input end and a PID signal output end; the first ultrasonic generator is provided with a frequency modulation input end and a frequency modulation output end; the second ultrasonic generator is provided with an output end; the first acousto-optic modulator and the second acousto-optic modulator are provided with input ends; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the first high-speed photoelectric detector collects a light intensity change signal of the grating substrate to be exposed and simultaneously transmits the light intensity change signal to a first input end of the single chip microcomputer and an input end of the PID controller; the second high-speed photoelectric detector collects light intensity change signals of the light source of the holographic interference lithography system, the light intensity signals are transmitted to the second input end of the single chip microcomputer, and the signal output end of the PID controller is connected with the frequency modulation input end of the first ultrasonic generator; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the reference input end on the singlechip inputs the target light intensity of the grating substrate to be exposed, and the output end of the singlechip is connected with the correction signal input end of the PID controller; the center frequency of the first ultrasonic generator is f1 and is 105 MHz-115 MHz, and the frequency f2 of the second ultrasonic generator is 105 MHz-115 MHz; the working mode of the first ultrasonic generator is set to be an external signal frequency modulation mode, and the modulation frequencyThe rate is 5KHz, the input range of the external signal is-5V, and the frequency of the corresponding ultrasonic signal is changed into f1-5 KHz-f 1+5 KHz; light intensity signal V of the first high-speed photodetectorSThe signal is transmitted to a sensor signal end of the PID controller, and the signal of the second high-speed photoelectric detector is transmitted to a second input end of the singlechip.
The time domain and the frequency domain of the error voltage condition of the output voltage of the first high-speed photodetector and the reference signal when the open loop and the closed loop are locked are shown in the attached fig. 3 and 4. During moving exposure, interference fringes are subjected to random drift and serious vibration during open loop, the vibration of the interference fringes at each frequency is large under the moving exposure environment, and the interference fringes are stably locked during closed loop locking.
When the device is used for a fringe-locked holographic interference lithography system, as shown in fig. 1, a laser 1, a light beam sampling grating 2, a half-wave plate 3, a beam splitter prism 4, a first plane mirror 5, a second plane mirror 6, a third plane mirror 7, a first acousto-optic modulator 8, a first ultrasonic generator 21, a second acousto-optic modulator 9, a second ultrasonic generator 22, a first spatial filter 10, a second spatial filter 11, a first collimating lens 12, a second collimating lens 13, a grating substrate 14 to be exposed, a reference grating 15, a first high-speed photoelectric detector 17, a second high-speed photoelectric detector 18, a PID controller 20 and a single chip microcomputer 19; the reference grating is arranged on the grating substrate to be exposed, and the surface of the reference grating and the surface of the grating substrate to be exposed are in the same plane; light emitted by a laser passes through a beam sampling grating, 0-grade transmitted diffraction light enters a beam splitting prism and is divided into transmitted light beams and reflected light beams, wherein the transmitted light beams pass through a half-wave plate, then pass through a first plane reflector and a second plane reflector and enter a first acousto-optic modulator, the-1-grade diffracted light of the first acousto-optic modulator enters a first spatial filter, then passes through a first collimating lens and is expanded into parallel light, and finally the parallel light is projected onto a grating substrate to be exposed and a reference grating; the reflected light beam enters a second sound optical modulator through a third plane reflector, and-1 st-order diffracted light of the second sound optical modulator enters a second spatial filter, then passes through a second collimating lens, is expanded into parallel light and finally is projected onto a grating substrate to be exposed and a reference grating; the transmitted light beam and the reflected light beam interfere on the surface of the grating substrate to be exposed, and meanwhile, an interference light field of the transmitted light beam and the reflected light beam forms a virtual grating on the reference grating, and the virtual grating and the reference grating form Moire fringes 16; the moire fringes are projected onto a first high-speed photoelectric detector, and light intensity signals of the moire fringes are simultaneously transmitted to a first input end of a single chip microcomputer and a sensor signal input end of a PID controller; the light emitted by the laser passes through the light beam sampling grating, the 1 st-order reflected diffraction light enters the second high-speed photoelectric detector, the light intensity signal of the second high-speed photoelectric detector is transmitted to the second input end of the singlechip, and the signal output end of the PID controller is transmitted to the frequency modulation input end of the first ultrasonic generator; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator. When the light intensity signal transmitted to the first high-speed photoelectric detector in the PID controller is changed, the PID controller outputs a feedback signal to the first ultrasonic generator, the frequency of the first ultrasonic generator is correspondingly changed, and the phase of-1 st-order diffraction light of the first acousto-optic modulator is changed, so that the phase of moire fringes is locked, namely the phase of holographic interference fringes is locked.
In the scheme, the high-speed photoelectric detector is used for detecting the light intensity signal of the middle point of the reference moire fringe, the other high-speed photoelectric detector is used for detecting the fluctuation of light emitted by the laser in real time, the reference signal of the PID is corrected in real time, software is not required to be relied on, the whole locking system is guaranteed by hardware, the response speed is high, and the locking precision is high.
Claims (2)
1. An interference fringe lock control device for a holographic interference lithography system, comprising: first acousto-optic modulator, first supersonic generator, second acousto-optic modulator, second supersonic generator still includes: the system comprises a first high-speed photoelectric detector, a second high-speed photoelectric detector, a PID controller and a single chip microcomputer; the single chip microcomputer is provided with a first input end, a second input end, a reference input end and an output end; the PID controller is provided with a correction signal input end, an input end and a PID signal output end; the first ultrasonic generator is provided with a frequency modulation input end and a frequency modulation output end; the second ultrasonic generator is provided with an output end; the first acousto-optic modulator and the second acousto-optic modulator are provided with input ends; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the first high-speed photoelectric detector collects a light intensity change signal of the grating substrate to be exposed and simultaneously transmits the light intensity change signal to a first input end of the single chip microcomputer and an input end of the PID controller; the second high-speed photoelectric detector collects light intensity change signals of the light source of the holographic interference lithography system, the light intensity signals are transmitted to the second input end of the single chip microcomputer, and the signal output end of the PID controller is connected with the frequency modulation input end of the first ultrasonic generator; the output end of the first ultrasonic generator is connected with the input end of the first acousto-optic modulator, and the output end of the second ultrasonic generator is connected with the input end of the second acousto-optic modulator; the reference input end of the singlechip inputs the target light intensity of the grating substrate to be exposed, and the output end of the singlechip is connected with the correction signal input end of the PID controller.
2. The fringe lock control device according to claim 1, wherein the center frequency f1 of the first ultrasonic generator is 105MHz to 115MHz, and the frequency f2 of the second ultrasonic generator is 105MHz to 115 MHz; the working mode of the first ultrasonic generator is an external signal frequency modulation mode, the modulation frequency is 5KHz, the input range of the external signal is-5V, and the frequency of the corresponding ultrasonic signal is f1-5 KHz-f 1+5 KHz.
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| CN201920855074.1U CN210109553U (en) | 2018-12-24 | 2018-12-24 | Interference fringe locking control device |
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| CN201920855074.1U CN210109553U (en) | 2018-12-24 | 2018-12-24 | Interference fringe locking control device |
| CN201822172121.0U CN209167579U (en) | 2018-12-24 | 2018-12-24 | Stripe lock fixed pattern holographic interference lithography system |
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