CN210104081U - Development device for etching solution recycling technology - Google Patents
Development device for etching solution recycling technology Download PDFInfo
- Publication number
- CN210104081U CN210104081U CN201920727971.4U CN201920727971U CN210104081U CN 210104081 U CN210104081 U CN 210104081U CN 201920727971 U CN201920727971 U CN 201920727971U CN 210104081 U CN210104081 U CN 210104081U
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- copper
- tank
- electrolytic tank
- storage tank
- regeneration
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- 238000005530 etching Methods 0.000 title claims abstract description 46
- 238000005516 engineering process Methods 0.000 title claims description 15
- 238000004064 recycling Methods 0.000 title claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 64
- 229910052802 copper Inorganic materials 0.000 claims abstract description 62
- 239000010949 copper Substances 0.000 claims abstract description 62
- 238000007789 sealing Methods 0.000 claims abstract description 37
- 230000008929 regeneration Effects 0.000 claims abstract description 35
- 238000011069 regeneration method Methods 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 230000018109 developmental process Effects 0.000 claims abstract description 17
- 238000006243 chemical reaction Methods 0.000 claims abstract description 13
- 230000002146 bilateral effect Effects 0.000 claims abstract description 6
- 239000000243 solution Substances 0.000 claims description 48
- 238000003860 storage Methods 0.000 claims description 36
- 238000001556 precipitation Methods 0.000 claims description 12
- 239000010413 mother solution Substances 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 8
- 238000003756 stirring Methods 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 3
- 239000012452 mother liquor Substances 0.000 abstract description 21
- 238000005868 electrolysis reaction Methods 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 11
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract description 7
- 229910001431 copper ion Inorganic materials 0.000 abstract description 7
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 abstract description 3
- 239000003792 electrolyte Substances 0.000 abstract description 3
- 125000004122 cyclic group Chemical group 0.000 abstract description 2
- 239000007788 liquid Substances 0.000 description 23
- 238000002156 mixing Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 239000012492 regenerant Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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- ing And Chemical Polishing (AREA)
- Electrolytic Production Of Metals (AREA)
Abstract
The utility model discloses an etching solution cyclic regeneration technique's development device, including the electrolytic tank, a plurality of copper separating boxes are installed to the inside bilateral symmetry of electrolytic tank, the bottom face of electrolytic tank is run through to the bottom of separating the copper box, and bottom face and external intercommunication. The utility model discloses in, the mother liquor to high concentration copper ion carries out the electrolysis through the electrolysis incasement portion, non ferrous metal copper is not sensed to the metal inductor, the cylinder is in the state that inwards promotes the back cover baffle simultaneously, area through the back cover baffle is greater than the bottom face area of analysing the copper case, so electrolyte enters into to between two hole sealing baffles through the reaction hole of analysing the copper case, when the metal inductor senses copper, cylinder automatic start, pull back the back cover baffle, the copper free whereabouts that appears, hole sealing baffle seals the reaction hole, block the mother liquor circulation, thereby the automatic pickup of copper has been realized, the practicality and the convenience of development device are improved.
Description
Technical Field
The utility model relates to an etching solution regeneration technical field especially relates to a development device of etching solution circulation regeneration technique.
Background
The regeneration of the etching solution is actually a process of extracting copper ions from etching mother liquor discharged from an etching line of a Printed Circuit Board (PCB) by using a closed circulation system and returning the extracted copper ions to a production line through etching solution regeneration circulation equipment, a typical process for processing the Printed Circuit Board (PCB) adopts a 'pattern electroplating method', namely, a lead-tin corrosion resistant layer is pre-plated on a copper foil part (which is a pattern part of a circuit) needing to be reserved on the outer layer of the board, and then the rest copper foil is corroded by a chemical mode, which is called etching, and the regeneration of the etching solution is mostly applied to circuit board production enterprises, and compared with the production process of the circuit board production enterprises, the etching process can be divided into the following steps: alkaline etching, acid etching and micro etching.
Firstly, the alkaline solution has corrosivity, and an automatic copper plate picking structure is lacked after a copper plate is separated out, so that the intelligence and the convenience of the development device are reduced; secondly, the existing development device for the alkaline etching solution recycling technology occupies a large area, cannot fully utilize the space, and reduces the area utilization rate of the device.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide a: the device for developing the etching solution recycling technology is provided for solving the problems that a device for developing the alkaline etching solution recycling technology is short of an automatic pickup copper plate structure and large in occupied area.
In order to achieve the above purpose, the utility model adopts the following technical scheme:
the utility model provides an etching solution cyclic regeneration technique's development device, includes the electrolytic tank, a plurality of copper case of separating are installed to the inside bilateral symmetry of electrolytic tank, the bottom face of electrolytic tank is run through to the bottom of separating the copper case, and bottom face and external intercommunication, the outer wall both sides of separating the copper case all are rectangular array and have seted up a plurality of reaction holes, the inboard symmetry of separating the copper case is provided with two hole sealing baffles, two the bottom face of hole sealing baffle all extends to the bottom face of separating the copper case, two the bottom sealing baffle is all installed to the bottom face of hole sealing baffle, one side central point department of separating the copper case installs the metal inductor.
As a further description of the above technical solution:
the bottom end face central point department of electrolysis box installs driving motor, table wall central point department is provided with the stirring fan in the bottom of electrolysis box, driving motor's output shaft runs through the electrolysis box and is connected with the stirring fan transmission.
As a further description of the above technical solution:
the width of the hole sealing baffle plates is larger than the total width of the reaction hole array and smaller than the width of the inner side of the copper precipitation box, and the total area of the two bottom sealing baffle plates is larger than the area of the bottom end face of the copper precipitation box.
As a further description of the above technical solution:
a plurality of cylinders are symmetrically installed on two sides of the bottom end face of the electrolytic tank, one side, away from the copper precipitation tank, of the bottom sealing baffle plate is fixedly connected with the extending end of the cylinder, and the metal inductor is electrically connected with the cylinder through an electric wire.
As a further description of the above technical solution:
the top surface bilateral symmetry of electrolysis box installs regeneration sub-liquid blending tank and regeneration liquid storage tank, the mother liquor storage tank is installed at the top of regeneration sub-liquid blending tank and regeneration liquid storage tank, the etching machine is installed to the top surface of mother liquor storage tank, the support column is all installed to four corners in the bottom of electrolysis box.
As a further description of the above technical solution:
the bottom of the back cover baffle and the bottom of the hole sealing baffle are in a cross structure, and the minimum distance between the two back cover baffles is equal to the thickness of the separated copper.
As a further description of the above technical solution:
one side of the etching machine is communicated with a mother liquor storage tank through a communicating pipe, and one side of the mother liquor storage tank is communicated with an electrolytic tank through a communicating pipe.
As a further description of the above technical solution:
one side of the electrolytic tank is communicated with a regenerated liquid storage tank through a pump pipe, the regenerated liquid storage tank is communicated with a regenerated sub-liquid blending tank through the pump pipe, and the regenerated sub-liquid blending tank is communicated with the etching machine through the pump pipe.
To sum up, owing to adopted above-mentioned technical scheme, the beneficial effects of the utility model are that:
1. the utility model discloses in, the mother liquor to high concentration copper ion carries out the electrolysis through the electrolysis incasement portion, non ferrous metal copper is not sensed to the metal inductor, the cylinder is in the state that inwards promotes the back cover baffle simultaneously, area through the back cover baffle is greater than the bottom face area of analysing the copper case, so electrolyte enters into to between two hole sealing baffles through the reaction hole of analysing the copper case, when the metal inductor senses copper, cylinder automatic start, pull back the back cover baffle, the copper free whereabouts that appears, hole sealing baffle seals the reaction hole, block the mother liquor circulation, thereby the automatic pickup of copper has been realized, the practicality and the convenience of development device are improved.
2. The utility model discloses in, install regeneration liquid storage tank and the son liquid of regeneration allotment jar in proper order through the top of electrolysis box, mother liquor storage tank and etching machine, thereby through make full use of high space, the required occupation space of development device has been practiced thrift greatly, the space usage rate of other devices has been improved, through etching machine and mother liquor storage tank intercommunication, mother liquor storage tank and electrolysis box intercommunication, mother liquor recovery unit has been accomplished, after the copper is gone out through electrolysis box electrolysis, discharge the regeneration liquid storage tank with solution, the regeneration liquid storage tank conveys the son liquid of regeneration allotment jar and allots, the etching machine is delivered to at last, thereby the recycle of mother liquor has been realized, the feature of environmental protection has been improved greatly, economy and practicality.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the embodiments of the present invention will be briefly described below. It is obvious that the drawings described below are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be obtained from these drawings without inventive effort.
FIG. 1 is a top view of an electrolytic tank of a device for developing a recycling technique of etching solution in accordance with the present invention;
FIG. 2 is a schematic front view of the development apparatus for the etching solution recycling technology of the present invention;
FIG. 3 is a bottom view of an electrolytic tank of a device for developing a recycling technique of etching solution according to the present invention;
FIG. 4 is a schematic view of a partial cross-sectional structure of an electrolytic tank of a device for developing a recycling technique of etching solution according to the present invention.
In the figure: 1. an etching machine; 2. a mother liquor storage tank; 3. an electrolytic tank; 4. a regenerated liquid storage tank; 5. a regenerant solution blending tank; 6. a copper precipitation box; 7. a metal inductor; 8. hole sealing baffles; 9. a bottom sealing baffle plate; 10. a cylinder; 11. a reaction well; 12. a drive motor; 13. a stirring fan.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.
Wherein the showings are for the purpose of illustration only and are shown by way of illustration only and not in actual form, and are not to be construed as limiting the present patent; for a better understanding of the embodiments of the present invention, some parts of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product; it will be understood by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The same or similar reference numerals in the drawings of the embodiments of the present invention correspond to the same or similar parts; in the description of the present invention, it should be understood that if the terms "upper", "lower", "left", "right", "inner", "outer", etc. are used to indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, it is only for convenience of description and simplification of description, but it is not indicated or implied that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and therefore, the terms describing the positional relationship in the drawings are used only for illustrative purposes and are not to be construed as limiting the present patent, and the specific meaning of the terms will be understood by those skilled in the art according to the specific circumstances.
In the description of the present invention, unless otherwise explicitly specified or limited, the term "connected" or the like, if appearing to indicate a connection relationship between the components, is to be understood broadly, for example, as being either a fixed connection, a detachable connection, or an integral part; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or may be connected through one or more other components or may be in an interactive relationship with one another. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Referring to fig. 1-4, the present invention provides a technical solution: the utility model provides an etching solution circulation regeneration technology's development device, including electrolytic tank 3, a plurality of copper case 6 of separating out are installed to the inside bilateral symmetry of electrolytic tank 3, the bottom face of electrolytic tank 3 is run through to the bottom of separating out copper case 6, and bottom face and external intercommunication, be convenient for later stage copper free fall after appearing, the outer wall both sides of separating out copper case 6 all are rectangular array and seted up a plurality of reaction holes 11, the circulation of electrolyte has been guaranteed, the inboard symmetry of separating out copper case 6 is provided with two hole sealing baffles 8, the bottom face of two hole sealing baffles 8 all extends to the bottom face of separating out copper case 6, bottom sealing baffle 9 is all installed to the bottom face of two hole sealing baffles 8, one side central point department of separating out copper case 6 installs metal inductor 7, utilize metal inductor 7 can respond to the non ferrous metal copper, thereby learn the copper state of separating out between hole sealing baffle 8.
Specifically, as shown in fig. 1-3, a driving motor 12 is installed at the center of the bottom end surface of the electrolytic tank 3, a stirring fan 13 is installed at the center of the inner surface wall of the bottom of the electrolytic tank 3, an output shaft of the driving motor 12 penetrates through the electrolytic tank 3 and is in transmission connection with the stirring fan 13, and the rotation of the stirring fan 13 is utilized to accelerate the electrolysis efficiency in the electrolytic tank 3.
Specifically, as shown in fig. 4, the width of the hole sealing baffle 8 is greater than the total width of the array of the reaction holes 11 and less than the inner width of the copper precipitation tank 6, and the total area of the two bottom sealing baffles 9 is greater than the area of the bottom end surface of the copper precipitation tank 6, so that when the copper plate falls, the reaction holes 11 are sealed by the hole sealing baffle 8, and the mother liquor is prevented from running off.
Specifically, as shown in fig. 2, a plurality of cylinders 10 are symmetrically installed on two sides of the bottom end surface of the electrolytic tank 3, one side of the bottom sealing baffle plate 9, which is far away from the copper precipitation tank 6, is fixedly connected with the extending end of the cylinder 10, and the metal inductor 7 is electrically connected with the cylinder 10 through an electric wire, so that the stability of pulling back and pushing out the bottom sealing baffle plate 9 is ensured.
Specifically, as shown in fig. 2, the top end face bilateral symmetry of electrolytic tank 3 installs regeneration sub-liquid blending tank 5 and regeneration liquid storage tank 4, and mother liquor storage tank 2 is installed at the top of regeneration sub-liquid blending tank 5 and regeneration liquid storage tank 4, and etching machine 1 is installed to the top end face of mother liquor storage tank 2, and the support column is all installed to four corners in bottom of electrolytic tank 3, through make full use of high space, has reduced development device's overall space occupancy, has improved development device's practicality.
Specifically, as shown in fig. 2-4, the bottom of the back cover baffle 9 and the bottom of the hole sealing baffle 8 are in a cross structure, and the minimum distance between the two back cover baffles 9 is equal to the thickness of the copper analysis, so that the sealing performance of the bottom end face of the copper analysis box 6 in the copper analysis process is ensured.
Specifically, as shown in fig. 2, one side of the etching machine 1 is communicated with the mother liquor storage tank 2 through a communicating pipe, and one side of the mother liquor storage tank 2 is communicated with the electrolytic tank 3 through a communicating pipe, so that the recovery of the mother liquor is realized.
Specifically, as shown in fig. 2, one side of the electrolytic tank 3 is communicated with a regenerated liquid storage tank 4 through a pump pipe, the regenerated liquid storage tank 4 is communicated with a regenerated sub-liquid preparation tank 5 through a pump pipe, and the regenerated sub-liquid preparation tank 5 is communicated with the etching machine 1 through a pump pipe, so that the stability of the regeneration and the utilization of the mother liquid after copper precipitation is ensured.
The working principle is as follows: when the copper plate automatic picking device is used, a high-concentration copper ion solution is stored in a mother solution storage tank 2 through an etching machine 1, the mother solution is conveyed to an electrolytic tank 3 through the mother solution of the high-concentration copper ions by the mother solution storage tank 2, the mother solution of the high-concentration copper ions is electrolyzed through the inside of the electrolytic tank 3, a metal sensor 7 does not sense nonferrous metal copper, a cylinder 10 is in a state of pushing a bottom sealing baffle plate 9 inwards, the bottom end face of a copper precipitation tank 6 is kept sealed, when the metal sensor 7 senses copper, the cylinder 10 is automatically started, the bottom sealing baffle plate 9 is pulled back, the precipitated copper plate falls freely, a hole sealing baffle plate 8 seals a reaction hole 11 to block the circulation of the mother solution, so that the automatic picking of the copper plate is realized, then the solution in the electrolytic tank 3 is discharged to a regeneration solution storage tank 4, the regeneration solution storage tank 4 is conveyed to a regeneration sub solution preparation tank 5 for preparation, economy and practicality.
It should be understood that the above-described embodiments are merely illustrative of the preferred embodiments of the present invention and the technical principles thereof. It will be understood by those skilled in the art that various modifications, equivalents, changes, and the like can be made to the present invention. However, these modifications are within the scope of the present invention as long as they do not depart from the spirit of the present invention. In addition, certain terms used in the specification and claims of the present application are not limiting, but are used merely for convenience of description.
Claims (8)
1. The utility model provides an etching solution circulation regeneration technology's development device, includes electrolytic tank (3), its characterized in that, a plurality of copper case (6) of separating are installed to the inside bilateral symmetry of electrolytic tank (3), the bottom face of electrolytic tank (3) is run through to the bottom of separating copper case (6), and bottom face and external intercommunication, the outer wall both sides of separating copper case (6) all are rectangular array and have seted up a plurality of reaction holes (11), the inboard symmetry of separating copper case (6) is provided with two hole sealing baffle (8), two the bottom face of hole sealing baffle (8) all extends to the bottom face of separating copper case (6), two bottom sealing baffle (9) are all installed to the bottom face of hole sealing baffle (8), metal inductor (7) are installed to one side central point department of separating copper case (6).
2. The developing device of the etching solution recycling technology as claimed in claim 1, wherein a driving motor (12) is installed at the center of the bottom end surface of the electrolytic tank (3), a stirring fan (13) is installed at the center of the inner surface wall of the bottom of the electrolytic tank (3), and an output shaft of the driving motor (12) penetrates through the electrolytic tank (3) and is in transmission connection with the stirring fan (13).
3. The development device of the etching solution recycling technology as claimed in claim 1, wherein the width of the hole sealing baffle (8) is larger than the total width of the reaction hole (11) array and smaller than the inner width of the copper precipitation tank (6), and the total area of the two bottom sealing baffles (9) is larger than the area of the bottom end face of the copper precipitation tank (6).
4. The developing device of the etching solution circulation and regeneration technology as claimed in claim 1, wherein a plurality of cylinders (10) are symmetrically installed on two sides of the bottom end surface of the electrolytic tank (3), one side of the bottom sealing baffle plate (9) far away from the copper precipitation tank (6) is fixedly connected with the extending end of the cylinder (10), and the metal inductor (7) is electrically connected with the cylinder (10) through an electric wire.
5. The developing device of the etching solution circulation regeneration technology according to claim 1, wherein the top end surface of the electrolytic tank (3) is symmetrically provided with a regenerated sub-solution preparation tank (5) and a regenerated solution storage tank (4) at two sides, the top of the regenerated sub-solution preparation tank (5) and the regenerated solution storage tank (4) is provided with a mother solution storage tank (2), the top end surface of the mother solution storage tank (2) is provided with the etching machine (1), and the bottom of the electrolytic tank (3) is provided with support columns at four corners.
6. The development device of the etching solution circulation regeneration technology according to claim 1, wherein the bottoms of the back cover baffles (9) and the hole sealing baffles (8) are in a crisscross structure, and the minimum distance between the two back cover baffles (9) is equal to the thickness of the separated copper.
7. The developing device of the etching solution circulation and regeneration technology as claimed in claim 5, wherein one side of the etching machine (1) is communicated with the mother solution storage tank (2) through a communicating pipe, and one side of the mother solution storage tank (2) is communicated with the electrolytic tank (3) through a communicating pipe.
8. The development device of the etching solution circulation regeneration technology according to claim 5, wherein one side of the electrolytic tank (3) is communicated with a regeneration solution storage tank (4) through a pump pipe, the regeneration solution storage tank (4) is communicated with a regeneration sub-solution preparation tank (5) through a pump pipe, and the regeneration sub-solution preparation tank (5) is communicated with the etching machine (1) through a pump pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920727971.4U CN210104081U (en) | 2019-05-21 | 2019-05-21 | Development device for etching solution recycling technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920727971.4U CN210104081U (en) | 2019-05-21 | 2019-05-21 | Development device for etching solution recycling technology |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210104081U true CN210104081U (en) | 2020-02-21 |
Family
ID=69561461
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920727971.4U Active CN210104081U (en) | 2019-05-21 | 2019-05-21 | Development device for etching solution recycling technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN210104081U (en) |
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2019
- 2019-05-21 CN CN201920727971.4U patent/CN210104081U/en active Active
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Effective date of registration: 20240909 Address after: No. 31 Pengju Road, Guangde Economic Development Zone, Xuancheng City, Anhui Province, 242200 Patentee after: Anhui Zhanbang Electronic Technology Co.,Ltd. Country or region after: China Address before: 325016 No.75, Fuquan Road, Xiayu Industrial Zone, Guoxi street, Ouhai District, Wenzhou City, Zhejiang Province Patentee before: ZHEJIANG ZAPON ELECTRONIC TECHNOLOGY Co.,Ltd. Country or region before: China |