CN209531547U - A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder - Google Patents

A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder Download PDF

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Publication number
CN209531547U
CN209531547U CN201821496452.3U CN201821496452U CN209531547U CN 209531547 U CN209531547 U CN 209531547U CN 201821496452 U CN201821496452 U CN 201821496452U CN 209531547 U CN209531547 U CN 209531547U
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Prior art keywords
film
developing
clean plate
glass
glass surface
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CN201821496452.3U
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Chinese (zh)
Inventor
肖红星
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UNITECH OPTRONICS TECHNOLOGY (HUBEI) Co Ltd
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UNITECH OPTRONICS TECHNOLOGY (HUBEI) Co Ltd
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Abstract

The utility model relates to a kind of remaining platforms of developing a film of reduction glass surface polishing powder, including bracket and at least one device of developing a film, each device of developing a film includes clean plate and sparge pipe, the clean plate is obliquely installed on the bracket, the sparge pipe is horizontally set at the clean plate upper end and tube wall is equipped with the spout towards the clean plate plate face, water valve is installed on the sparge pipe, and setting is connected to water supplying pipe, multiple polishing pads are pasted on the clean plate, the polishing pad is strip and interval setting, interval trough is provided between the adjacent polishing pad, the clean plate lower end is provided with loading block;The finger of staff can be protruded into from interval trough to facilitate and pick up glass, the setting of interval trough can be further reduced the vacuum degree of glass behind, convenient for taking for glass, the utility model additionally provides a kind of including a kind of above-mentioned glass cleaning equipment for reducing the remaining platform of developing a film of glass surface polishing powder.

Description

A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder
Technical field
The utility model relates to glass cleaning fields, and in particular to a kind of remaining platform of developing a film of reduction glass surface polishing powder And glass cleaning equipment.
Background technique
Polishing powder is usually made of components such as cerium oxide, aluminium oxide, silica, iron oxide, zirconium oxides, different materials it is hard Degree, chemical property in water are also different.Currently, being widely used in glass polishing.Manufacturer, which can add dispersing agent in right amount and improve, hangs Floating rate;Guarantee the uniform efficient of process.The powder particle of polishing powder has certain lattice form, is formed when broken sharp keen Wedge angle, polishing efficiency can be improved and have suitable hardness and density, have good wellability and suspension with water.Due to throwing The influence of light powder particles shape characteristic and interior dispersing agent, suspending agent, polishing fluid easily remains to glass baseplate surface and naked eyes can not See, it need to be reflective visible under specific yellow light light irradiation.In filming process when semiconductor crystal film is attached to product surface, Local overlay film NG caused by being blocked because of the remaining subtle polishing powder particles of glass substrate.
In the prior art, glass surface polishing powder residual is reduced generally using being placed on glass on horizontal table top with grinding Grinding fluid cleaning, due to after the back side is soaked in water, will form vacuum and being attracted on table top, taking during simultaneously glass cleaning When be usually used and lift from two sides by glass, since middle part vacuum state is not abolished, cause to lift, often will lead to Glass rupture, scrap of the product.
Utility model content
The utility model provides a kind of remaining platform of developing a film of reduction glass surface polishing powder, solves above-described skill Art problem.
The scheme that the utility model solves above-mentioned technical problem is as follows: a kind of reduction glass surface polishing powder is remaining to develop a film Platform, including bracket and at least one device of developing a film, each device of developing a film includes clean plate and sparge pipe, and the clean plate inclines It is tiltedly arranged on the bracket, the sparge pipe is horizontally set at the clean plate upper end and tube wall is equipped with towards the clean plate The spout of plate face is equipped with water valve on the sparge pipe, and is connected to setting with water supplying pipe, and multiple throwings are pasted on the clean plate Light pad, the polishing pad are strip and interval setting, are provided with interval trough between the adjacent polishing pad, under the clean plate End is provided with loading block.
The beneficial effects of the utility model are: in the process of cleaning, glass to be cleaned is placed on loading block, simultaneously By being set on the polishing pad, water valve is opened, sparge pipe is sprayed water to clean plate, since clean plate is obliquely installed in the bracket On, glass is also to be obliquely installed, and after the completion of cleaning, since the polishing pad is strip and interval setting, adjacent is described Interval trough is provided between polishing pad, the finger of staff can be protruded into from interval trough to facilitate and pick up glass, interval trough The vacuum degree that glass behind can be further reduced is set, convenient for taking for glass.
The above description is merely an outline of the technical solution of the present invention, in order to better understand the skill of the utility model Art means, and can be implemented in accordance with the contents of the specification, below on the preferred embodiment of the present invention and the accompanying drawings in detail It describes in detail bright as after.Specific embodiment of the present utility model is shown in detail by following embodiment and its attached drawing.
Detailed description of the invention
Attached drawing described herein is used to provide a further understanding of the present invention, and is constituted part of this application, The exemplary embodiment of the utility model and the description thereof are used to explain the utility model, does not constitute to the improper of the utility model It limits.In the accompanying drawings:
Fig. 1 is a kind of remaining platform of developing a film of reduction glass surface polishing powder provided by the embodiment of the utility model;
Fig. 2 is a-quadrant partial enlarged view in Fig. 1;
Fig. 3 is a kind of structural schematic diagram of aqueous vapor rifle provided by the embodiment of the utility model.
Specific embodiment
The principles of the present invention and feature are described below in conjunction with attached drawing 1-3, example is served only for explaining this Utility model is not intended to limit the scope of the utility model.In the following passage by way of example more specifically referring to attached drawing The utility model is described.According to following explanation and claims, will be become apparent from feature the advantages of the utility model.It needs to illustrate , attached drawing is all made of very simplified form and using non-accurate ratio, only conveniently, lucidly to aid in illustrating originally The purpose of utility model embodiment.
As depicted in figs. 1 and 2, the utility model provides a kind of remaining platform of developing a film of reduction glass surface polishing powder, packet Bracket 1 and two devices 2 of developing a film are included, the number of the device 2 of developing a film is two, and positioned opposite to each other on the bracket 1.
Each device 2 of developing a film includes clean plate 21 and sparge pipe 22, and the clean plate 21 is obliquely installed in the branch On frame 1, it is preferred that two 21 upper ends of clean plate are drawn close to form A font, and the sparge pipe 22 is horizontally set at the clean plate 21 Upper end and tube wall are equipped with the spout towards 21 plate face of clean plate, are equipped with water valve 23 on the sparge pipe 22, and with water supply The connection setting of pipe 24.
The water that sparge pipe sprays under the effect of gravity, flows downward naturally after being rinsed to glass surface, and sprays water The lasting water spray of pipe can make water stain thoroughly to be washed away.
Glass is obliquely installed, staff cleaning when can standing operation, without bending as being operated in planar table Waist, be beneficial to the physical and mental health of staff.
Multiple polishing pads 211 are pasted on the clean plate 21, the polishing pad 211 is strip and interval is arranged, adjacent The polishing pad 211 between be provided with interval trough 212.
As shown in Fig. 2, 21 lower end of clean plate is provided with loading block 213.
Rhone 11 is provided on the bracket 1, the rhone 11 is looped around two pieces of 21 lower ends of clean plate, described 11 bottom of rhone is connected to setting with drainage pipeline 12.
In the prior art, water (flow) direction is irregular when planar table is cleaned, water stain from each place outflow of estrade, drenches ground Face, is unfavorable for the clean and tidy of workshop, and the water stain same drainage pipeline that is drained to can be discharged, make to produce vehicle by the setting of rhone Between keep neatly and clean.
Preferably, the clean plate 21 is rectangle and upper end side and lower end side are horizontally disposed, 211 edge of polishing pad It is attached on the clean plate 21 perpendicular to the 21 lower end side of clean plate.
Polishing pad attaches along perpendicular to clean plate lower end side and interval trough can be made to be vertically arranged, what sparge pipe sprayed Water can flow to glass behind along interval trough, clean the spot of glass behind.
Uniform intervals are provided with multiple grooves 214 on each polishing pad 21, and the setting of groove can be further reduced glass The vacuum degree of glass behind, it is more convenient to be that glass is taken.
As shown in Fig. 2, a kind of glass cleaning equipment, including a kind of above-mentioned remaining platform of developing a film of reduction glass surface polishing powder With aqueous vapor rifle 200, the aqueous vapor rifle 200 has at least one water regulating valve 210 and at least one air volume regulating valve 220.
Glass surface is washed away with aqueous vapor rifle, is wiped than in the prior art with hand, cleaning efficiency is higher, more time saving and energy saving, water Adjustable valve and air volume regulating valve can regulate and control amount of water sprayed and jet amount.
In the process of cleaning, glass to be cleaned is placed on loading block, while by being set on the polishing pad, opened Water valve, sparge pipe are sprayed water to clean plate, and since clean plate is obliquely installed on the bracket, glass is also to be obliquely installed, clearly When washing, it is directed at glass sparge with aqueous vapor rifle, is rinsed with aqueous vapor rifle, surface moisturizing can be made and cleaned immediately, significantly Reduce the remaining ratio of polishing powder;After the completion of cleaning, since the polishing pad is strip and interval setting, the adjacent throwing Interval trough is provided between light pad, the finger of staff can be protruded into from interval trough to facilitate and pick up glass, and interval trough is set The vacuum degree that can be further reduced glass behind is set, convenient for taking for glass.
The above, the only preferred embodiment of the utility model not make in any form the utility model Limitation;The those of ordinary skill of all industry can be shown in by specification attached drawing and described above and swimmingly to implement this practical It is novel;But all those skilled in the art are not departing within the scope of technical solutions of the utility model, using being taken off above The technology contents shown and the equivalent variations of a little variation, modification and evolution made, are the equivalent embodiment of the utility model; Meanwhile it the change of all substantial technological any equivalent variationss to the above embodiments according to the utility model, modifying and drilling Become etc., within the protection scope for still falling within the technical solution of the utility model.

Claims (6)

1. a kind of remaining platform of developing a film of reduction glass surface polishing powder, which is characterized in that including bracket and at least one dress of developing a film It sets, each device of developing a film includes clean plate and sparge pipe, and the clean plate is obliquely installed on the bracket, the water spray Pipe is horizontally set at the clean plate upper end and tube wall is equipped with the spout towards the clean plate plate face, installs on the sparge pipe There is water valve, and be connected to setting with water supplying pipe, multiple polishing pads are pasted on the clean plate, the polishing pad is strip and interval It is arranged, is provided with interval trough between the adjacent polishing pad, the clean plate lower end is provided with loading block.
2. a kind of remaining platform of developing a film of reduction glass surface polishing powder according to claim 1, which is characterized in that described to wash The number of sheet devices be two, and it is positioned opposite to each other on the bracket, the clean plate upper end for device of developing a film described in two is leaned on Hold together to be formed A font.
3. a kind of remaining platform of developing a film of reduction glass surface polishing powder according to claim 2, which is characterized in that the branch Rhone is provided on frame, the rhone is looped around two pieces of clean plate lower ends, the draining trench bottom and drainage pipeline Connection setting.
4. a kind of remaining platform of developing a film of reduction glass surface polishing powder according to claim 2, which is characterized in that described clear Board-washing is rectangle and upper section side and lower end side are horizontally disposed, and the polishing pad is pasted along perpendicular to clean plate lower end side It invests on the clean plate.
5. a kind of remaining platform of developing a film of reduction glass surface polishing powder according to claim 2, which is characterized in that described every Uniform intervals are provided with multiple grooves on one polishing pad.
6. a kind of glass cleaning equipment, which is characterized in that including a kind of reduction glass table as described in any one in claim 1-5 Face polishing powder remaining develop a film platform and aqueous vapor rifle, the aqueous vapor rifle have at least one water regulating valve and at least one tolerance tune Save valve.
CN201821496452.3U 2018-09-13 2018-09-13 A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder Active CN209531547U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821496452.3U CN209531547U (en) 2018-09-13 2018-09-13 A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821496452.3U CN209531547U (en) 2018-09-13 2018-09-13 A kind of remaining platform and glass cleaning equipment of developing a film of reduction glass surface polishing powder

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CN209531547U true CN209531547U (en) 2019-10-25

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113441473A (en) * 2021-07-02 2021-09-28 中国科学院长春光学精密机械与物理研究所 Cleaning tool
CN113985639A (en) * 2021-11-12 2022-01-28 湖北优尼科光电技术股份有限公司 Automatic cleaning device for liquid crystal substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113441473A (en) * 2021-07-02 2021-09-28 中国科学院长春光学精密机械与物理研究所 Cleaning tool
CN113985639A (en) * 2021-11-12 2022-01-28 湖北优尼科光电技术股份有限公司 Automatic cleaning device for liquid crystal substrate

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