CN209471040U - It is a kind of to address the FP spectral configuration surveyed and adjusted for wave spectrum - Google Patents
It is a kind of to address the FP spectral configuration surveyed and adjusted for wave spectrum Download PDFInfo
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- CN209471040U CN209471040U CN201920115337.5U CN201920115337U CN209471040U CN 209471040 U CN209471040 U CN 209471040U CN 201920115337 U CN201920115337 U CN 201920115337U CN 209471040 U CN209471040 U CN 209471040U
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Abstract
The utility model discloses a kind of to address the FP spectral configuration for surveying tune for wave spectrum for micro-imaging measurement, including successively the first anti-reflection film disposed in parallel, the first substrate, pattern electrode, the first liquid crystal alignment layer, liquid crystal layer, the second liquid crystal alignment layer, public electrode, the second substrate and the second anti-reflection film from top to bottom, pattern electrode and public electrode are arranged concentrically with respect to one another, and the two is used as highly reflecting films simultaneously, is made of metal material；Pattern electrode includes multiple rectangle sub-electrodes arranged in a symmetrical, is electrical isolation between each rectangle sub-electrode；Each rectangle sub-electrode is drawn by respective electric connection line from pattern electrode, and together with the electric connection line drawn from public electrode, is connected respectively to the both ends of each external control signal.The utility model has the advantages that compose that micro-imaging efficiency is high, target and light field adaptability are good, volume and quality are small, easy couples with other optical photoconductor mechanical structures.
Description
Technical field
The utility model belongs to optical microscopy imaging and control technology field, seeks more particularly, to one kind for wave spectrum
Fabry-Perot effect (Fabry-Perot effect, the abbreviation FP) spectral configuration adjusted is surveyed in location.
Background technique
So far, optical microscopy imaging technique mainly uses three kinds of modes, the first side in generation spectrogram image space face
Formula is that divided beams executes modal data measurement and parsing from imaging optical path, then executes spectrum data processing to micro-image, to obtain
Obtain the sequence spectrum microscopic image information of micro-nano target；The second way is held by constructing interference optical field on micro-imaging face
Row can the micro-interference imaging integrated with the map of spectrum is adjusted of timing survey spectrum；The third mode is to be divided to execute EO-1 hyperion by diffraction
Resolution ratio micro-imaging.
However, there are some technological deficiencies in generation spectrogram image space face in existing optical microscopy: above-mentioned first way
Complicated, spectrogram picture acquisition that there are optical paths does not have the shortcomings that real-time, and above-mentioned second way light source and imaging optical path configuration are multiple
Miscellaneous, structure and environmental stability and controllability to micro imaging system require height, the third above-mentioned mode then needs to configure knot
Structure and control the relative complex accurate follower of mode.
Utility model content
Aiming at the above defects or improvement requirements of the prior art, the utility model provides a kind of survey for wave spectrum addressing and adjusts
FP spectral configuration, it is intended that solving above-mentioned existing optical microscopy is generating above-mentioned technology existing for spectrogram image space face
Problem, and micro-imaging efficiency is high, target and light field adaptability are good, volume and quality are small, easy and other optical photoconductors with composing
The advantages of mechanical structure couples.
To achieve the above object, it according to the one aspect of the utility model, provides a kind of address for wave spectrum and surveys tune
FP spectral configuration, including successively the first anti-reflection film disposed in parallel, the first substrate, pattern electrode, the first liquid crystal are fixed from top to bottom
To layer, liquid crystal layer, the second liquid crystal alignment layer, public electrode, the second substrate and the second anti-reflection film, pattern electrode and common electrical
Pole is arranged concentrically with respect to one another, and the two simultaneously be used as highly reflecting films, be made of metal material, pattern electrode include from it is interior to
The round sub-electrode of one be arranged concentrically outside and multiple fan-shaped sub-electrodes, the multiple fan-shaped sub-electrodes being located on the same floor have
Identical central angle, and all fan-shaped sub-electrodes of same layer form a complete circle, number is the circle son electricity of (i, j)
Pole and each fan-shaped sub-electrode are drawn by respective electric connection line from pattern electrode, and are electrically connected with what is drawn from public electrode
Line together, is connected respectively to each external control signal UI, jBoth ends, for the FP spectral configuration by access optical path to
It when forming optical microscopy, realizes and is measured with addressable mode and adjust wave spectrum, wherein i indicates the sector sub-electrode in pattern electricity
Number of plies serial number in extremely, and have i ∈ (1, n), wherein n indicates the number of plies of pattern electrode, and j indicates the sector sub-electrode in pattern electricity
Serial number in i-th layer of pole, and have j ∈ (1, m), wherein m indicates the sum of fan-shaped sub-electrode included by each layer of pattern electrode.
Preferably, between round sub-electrode each fan-shaped sub-electrode adjacent thereto and each adjacent sector son electricity
It is electrical isolation between pole.
Preferably, the first anti-reflection film and the second anti-reflection film are made of normal optical anti-reflection film, and the two thickness is identical,
It is 100 nanometers to 700 nanometers.
Preferably, the first substrate and the second substrate are made of translucent material, and thickness is 1 millimeter to 5 millimeters.
Preferably, when the FP spectral configuration is used in optical microscopy, outermost sector sub-electrode corresponds to circular wheel
Wide diameter is greater than the photosensitive elemental size of light-sensitive array in optical microscopy.In general, contemplated by the utility model
Above technical scheme is compared with the prior art, it can achieve the following beneficial effects:
1, the utility model the FP spectral configuration that wave spectrum addressing survey is adjusted is used to be inserted directly into micro-imaging optical path
Realize optical microscopy, it is easy to operate, it is convenient, it does not need additional configuration structure and controls the relative complex accurate follower of mode
Structure.
2, the utility model is that can determine in real time spectrogram as in corresponding pattern electrode in a manner of addressing power-up
Specific location, and by adjust the particular locations external control signal, realization the wave spectrum of spectrogram picture is adjusted.
3, the utility model has the characteristics that imaging light field adaptability is good, and visible wide spectrum or infrared light, narrow spectrum can be used
Section is visual or the irradiation micro-nano target such as infrared LED wave beam, pulse or continuous laser executes micro-imaging operation, to significantly reduce
To image field light intensity and its spectrum requirement.
4, the utility model, which can be tuned into as wave spectrum by electric separation electricity, actively adapts to micro-nano structure its is special photic glimmering
Light radiation, and the specific region or micro-nano target that wave spectrum is accurately directed toward or regulates and controls onto pattern electrode can will be imaged, thus have
There is the advantages of efficient micro-imaging.
5, the utility model, which has, carries out space configuration and modulation to imaging wave spectrum, thus by imaging means to imaging substance
Influence significantly reduce even the advantages of thoroughly getting rid of.
6, the utility model can pass through the automatically controlled sky for executing micro-imaging wave spectrum based on priori knowledge or according to imaging contexts
Between configure and modulation, have the advantages that intelligence.
7, the utility model, which surveys the FP spectral configuration adjusted for wave spectrum addressing, has high structure, electricity and electric light ginseng
Several stability, and have the characteristics that control is with high accuracy.
8, the utility model for wave spectrum addressing survey adjust FP spectral configuration be conveniently inserted in micro-imaging optical path, easily with
Other optical photoconductor mechanical structures etc. are coupled.
Detailed description of the invention
Fig. 1 be according to a kind of embodiment of the utility model include for wave spectrum address survey adjust FP spectral configuration light
Learn microscopical configuration schematic diagram.
Fig. 2 be according to the utility model another embodiment include for wave spectrum address survey adjust FP spectral configuration
Optical microscopy configuration schematic diagram.
Fig. 3 is the schematic diagram that the utility model surveys the FP spectral configuration adjusted for wave spectrum addressing.
Fig. 4 is the schematic diagram that the utility model surveys pattern electrode in the FP spectral configuration adjusted for wave spectrum addressing.
Fig. 5 is the schematic diagram that the utility model surveys public electrode in the FP spectral configuration adjusted for wave spectrum addressing.
In all the appended drawings, identical appended drawing reference is used to denote the same element or structure, in which:
The first anti-reflection film of 1-, the first substrate of 2-, 3- pattern electrode, the first liquid crystal alignment layer of 4-, 5- liquid crystal layer, the second liquid of 6-
Brilliant oriented layer, 7- public electrode, the second substrate of 8-, the second anti-reflection film of 9-.
Specific embodiment
In order to make the purpose of the utility model, technical solutions and advantages more clearly understood, below in conjunction with attached drawing and implementation
Example, the present invention will be further described in detail.It should be appreciated that specific embodiment described herein is only used to explain
The utility model is not used to limit the utility model.In addition, institute in the various embodiments of the present invention described below
The technical characteristic being related to can be combined with each other as long as they do not conflict with each other.
As shown in figure 3, it includes successively parallel from top to bottom that the utility model, which surveys the FP spectral configuration adjusted for wave spectrum addressing,
The first anti-reflection film 1, the first substrate 2, pattern electrode 3, the first liquid crystal alignment layer 4, the liquid crystal layer 5, the second liquid crystal alignment layer being arranged
6, public electrode 7, the second substrate 8 and the second anti-reflection film 9.
First anti-reflection film 1 and the second anti-reflection film 9 are made of normal optical anti-reflection film, and the two thickness is identical, is 100
Nanometer is to 700 nanometers.
First substrate 2 and the second substrate 8 are made of translucent material (quartz, glass etc.), and thickness is 1 milli
Rice is to 5 millimeters.
Pattern electrode 3 and public electrode 7 are arranged concentrically with respect to one another, and the two is used as highly reflecting films simultaneously, is by metal
Material (such as gold, aluminium, silver etc.) is made,
Fig. 4 shows the structure of the pattern electrode of the utility model, which includes being arranged concentrically from inside to outside
One round sub-electrode and multiple fan-shaped sub-electrodes, between round sub-electrode each fan-shaped sub-electrode adjacent thereto and
It is electrical isolation between each adjacent fan-shaped sub-electrode.
The multiple fan-shaped sub-electrodes central angle having the same being located on the same floor, and all fan-shaped sub-electrode groups of same layer
At one complete round (each layer has 8 fan-shaped sub-electrodes in the figure).
The number of fan-shaped sub-electrode indicates that wherein i indicates the number of plies of the sector sub-electrode in patterned electrodes with (i, j)
Serial number (from inside to outside), and have i ∈ (1, n), wherein n indicates the number of plies of patterned electrodes, and j indicates the sector sub-electrode in pattern
Serial number in i-th layer of polarizing electrode, and have j ∈ (1, m), wherein m indicates the son electricity of sector included by each layer of patterned electrodes
The sum of pole.
For Fig. 4, the round sub-electrode of innermost layer, zone number be (1,1), the circle sub-electrode outer layer it is each
It is a sector sub-electrode, zone number be (2,1), (2,2) ..., (2,8).
Zone number is that the round sub-electrode of (i, j) and each fan-shaped sub-electrode pass through respective electric connection line from patterning
Electrode 3 is drawn, and together with from the electric connection line that public electrode 7 is drawn, is connected respectively to each external control signal UI, jTwo
End.
Due to each external voltage signal be it is corresponding with round sub-electrode and each specific fan-shaped sub-electrode, because
And the FP spectral configuration adjusted is surveyed by access optical path when the utility model is used for wave spectrum addressing, thus when forming optical microscopy, energy
Enough realize measures with addressable mode and adjusts wave spectrum.
Be evenly arranged with multiple micropores on round sub-electrode and each fan-shaped sub-electrode, the aperture of micropore at 10 microns extremely
Between 100 microns, the shape of micropore can be round or rectangle.
It should be noted that for the sake of the convenience of signal, illustrate only in Fig. 4 and put down single annular sub-electrode
It is divided into the fan-shaped sub-electrode obtained behind 8 parts, but it does not constitute the restriction to the utility model sub-electrode quantity.
In the present embodiment, the upper limit of the number of plies n of patterned electrodes is 20, and single annular sub-electrode obtains after being divided
The upper limit of fan-shaped sub-electrode sum m be 16.
When being used in optical microscopy using the FP spectral configuration for surveying tune for wave spectrum addressing of this patterned electrodes, most
Outside sector sub-electrode corresponds to size of the diameter slightly larger than photosensitive member in light-sensitive array of circular contour.
Fig. 5 shows the multiple electric connection lines drawn from the public electrode of the utility model.
Fig. 1 shows the optical microscopy according to the first embodiment of the utility model comprising successively sets along optical axis
The first object lens, the second object lens, the FP spectral configuration and light-sensitive array as described above that tune is surveyed for wave spectrum addressing set,
Middle determinand is placed on side of first object lens far from the second object lens.
As shown in Figure 1, the utility model, which surveys the FP spectral configuration adjusted for wave spectrum addressing, to be arranged in the second object lens and light
Between sensitive array, the wave spectrum of determinand is detected in a time-sequential manner, when the wave spectrum for detecting determinand occurs abnormal, first with can
The mode of addressing, which is determined, surveys the specific region in the FP spectral configuration adjusted on pattern electrode for wave spectrum addressing, and to the specific area
Domain applies external control signal and is adjusted, and adjusts to realize to the addressable of wave spectrum, so that being located at light at image focus
On the focus-A of sensitive array, and obtain the micro-image of sharpening.
Fig. 2 shows the optical microscopies according to second of embodiment of the utility model comprising successively sets along optical axis
It is setting, as described above to survey FP spectral configuration, the first object lens, the second object lens and the light-sensitive array adjusted for wave spectrum addressing,
Middle determinand, which is placed on, addresses side of the FP spectral configuration far from the first object lens surveyed and adjusted for wave spectrum.
As shown in Fig. 2, the utility model, which surveys the FP spectral configuration adjusted for wave spectrum addressing, to be arranged in determinand and first
Between object lens, the wave spectrum of determinand is detected in a time-sequential manner, when the wave spectrum for detecting determinand occurs abnormal, first can seek
The mode of location, which is determined, surveys the specific region in the FP spectral configuration adjusted on pattern electrode for wave spectrum addressing, and to the specific region
Apply external control signal to be adjusted, the addressable of wave spectrum is adjusted to realize, so that being located at image focus photosensitive
On the focus-B of array, and then obtain the micro-image of sharpening.
As it will be easily appreciated by one skilled in the art that the above is only the preferred embodiment of the utility model only, not
To limit the utility model, any modification made within the spirit and principle of the present invention, equivalent replacement and change
Into etc., it should be included within the scope of protection of this utility model.
Claims (5)
1. it is a kind of for wave spectrum address survey adjust FP spectral configuration, including from top to bottom successively the first anti-reflection film disposed in parallel,
First substrate, pattern electrode, the first liquid crystal alignment layer, liquid crystal layer, the second liquid crystal alignment layer, public electrode, the second substrate and
Second anti-reflection film, which is characterized in that
Pattern electrode and public electrode are arranged concentrically with respect to one another, and the two is used as highly reflecting films simultaneously, is by metal material system
At；
Pattern electrode includes the round sub-electrode and multiple fan-shaped sub-electrodes being arranged concentrically from inside to outside；
The multiple fan-shaped sub-electrodes central angle having the same being located on the same floor, and all fan-shaped sub-electrode compositions one of same layer
A complete circle；
Number is that the round sub-electrode of (i, j) and each fan-shaped sub-electrode are drawn by respective electric connection line from pattern electrode,
And together with the electric connection line drawn from public electrode, it is connected respectively to each external control signal UI, jBoth ends, in institute
State FP spectral configuration by access optical path to form optical microscopy when, realize with addressable mode measure and adjust wave spectrum,
Middle i indicates number of plies serial number of the sector sub-electrode in pattern electrode, and has i ∈ (1, n), and wherein n indicates the layer of pattern electrode
Number, j indicates serial number of the sector sub-electrode in i-th layer of pattern electrode, and has j ∈ (1, m), and wherein m indicates that pattern electrode is every
The sum of fan-shaped sub-electrode included by one layer.
2. FP spectral configuration according to claim 1, which is characterized in that round sub-electrode each fan-shaped son adjacent thereto
It is electrical isolation between electrode and between each adjacent fan-shaped sub-electrode.
3. FP spectral configuration according to claim 1, which is characterized in that the first anti-reflection film and the second anti-reflection film are by normal
Rule optical anti-reflective film is made, and the two thickness is identical, is 100 nanometers to 700 nanometers.
4. FP spectral configuration according to claim 1, which is characterized in that the first substrate and the second substrate are by light transmission material
Material is made, and thickness is 1 millimeter to 5 millimeters.
5. FP spectral configuration according to claim 1, which is characterized in that when the FP spectral configuration is used in optical microphotograph
When mirror, the diameter that outermost sector sub-electrode corresponds to circular contour is greater than the photosensitive elemental size of light-sensitive array in optical microscopy.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111122508A (en) * | 2019-11-08 | 2020-05-08 | 桂林电子科技大学 | Dual-wavelength common-path phase microscopic imaging measurement system based on F-P interferometer |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111122508A (en) * | 2019-11-08 | 2020-05-08 | 桂林电子科技大学 | Dual-wavelength common-path phase microscopic imaging measurement system based on F-P interferometer |
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