CN209352977U - The reaction chamber structure of plasma deposition furnace - Google Patents

The reaction chamber structure of plasma deposition furnace Download PDF

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Publication number
CN209352977U
CN209352977U CN201822095332.9U CN201822095332U CN209352977U CN 209352977 U CN209352977 U CN 209352977U CN 201822095332 U CN201822095332 U CN 201822095332U CN 209352977 U CN209352977 U CN 209352977U
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Prior art keywords
quartz tube
inductance coil
reaction chamber
layered quartz
plasma deposition
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CN201822095332.9U
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杨宝立
张勇
李时俊
伍波
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SHENZHEN S C NEW ENERGY EQUIPMENT CO Ltd
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SHENZHEN S C NEW ENERGY EQUIPMENT CO Ltd
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Abstract

The utility model discloses provide a kind of reaction chamber structure of plasma deposition furnace, comprising: layered quartz tube, the internal reaction chamber for for containing reaction gas;Outer layer quartz ampoule, set is outside layered quartz tube and coaxial with layered quartz tube, has spacing between outer layer quartz ampoule and layered quartz tube;For reaction gas to be ionized to the inductance coil for generating carbon atom, it is wrapped on layered quartz tube, and inductance coil, along the axially extending of layered quartz tube, inductance coil is connect with radio-frequency power supply.After the utility model inductance coil is passed through radio-frequency power supply, reaction gas ionization in reaction chamber is generated carbon atom by inductance coil, carbon atom can be fallen in layer on copper foil or aluminium foil in this way, and it can be connected together by chamical binding between carbon atom and carbon atom, to grow graphene on copper foil or aluminium foil, graphene has specific structure in this way, is more advantageous to the energy storage of lithium ion battery, so that the lithium ion battery be made to have higher energy density.

Description

The reaction chamber structure of plasma deposition furnace
Technical field
The utility model relates to plasma deposition furnace apparatus technical fields, more particularly to a kind of plasma Deposit the reaction chamber structure of furnace.
Background technique
Currently, with electric car, the extensive application of electric bicycle and photovoltaic power generation, the large-scale popularization of wind-power electricity generation, It is more and more to the energy storage device demand of electricity, and lithium ion battery is wherein good selection.Lithium ion battery is mainly by anode Piece, negative electrode tab and diaphragm composition, and graphite of the negative electrode tab therein by copper foil or aluminium foil and thereon forms.Currently, negative electrode tab Production be to be completed by coating machine, substantially technique is that slurry is made of graphite, binder, diluent and auxiliary agent, copper foil or Aluminium foil is put into coating machine in the form of coiled strip, after uncoiling, is applied and is covered on the surface of copper foil or aluminium foil by way of roller printing Graphite slurry, using baking and curing, last slitting forms the negative electrode tab of required width dimensions.But pass through coating machine next life When producing negative electrode tab, the graphite on copper foil or aluminium foil, which is only that graphite solid is short grained, to be piled up, and is unfavorable for the storage of lithium ion battery Can, so that lithium ion battery energy density is relatively low.
Utility model content
Negative electrode tab, which is produced, to solve the problems, such as existing by coating machine causes lithium ion battery energy density relatively low, The utility model provides a kind of reaction chamber structure of plasma deposition furnace, for producing negative electrode tab, so that lithium ion battery has There is higher energy density.
The technical solution of the utility model are as follows: a kind of reaction chamber structure of plasma deposition furnace is provided, comprising:
Layered quartz tube, the internal reaction chamber for for containing reaction gas;
Outer layer quartz ampoule, set is outside the layered quartz tube and coaxial with the layered quartz tube, the outer layer quartz There is spacing between pipe and the layered quartz tube;
For being wrapped in the inductance coil of reaction gas ionization generation carbon atom on the layered quartz tube, And the inductance coil, along the axially extending of the layered quartz tube, the inductance coil is connect with radio-frequency power supply.
The inductance coil is mounted on a bracket, and the support casing is on layered quartz tube.
The bracket includes two ring-type fixing plates and multiple insulating supportings for being located between described two ring-type fixing plates Bar, the multiple insulating support rod is parallel to each other and each insulating support rod is along the axially extending of layered quartz tube, inductor wire Circle is fixed between multiple insulating support rods.
The bracket further includes multiple connecting rods, and connecting rod is equal with insulating support rod quantity, and a connecting rod is threaded through One insulating support rod is connect with two ring-type fixing plates in one insulating support rod and described two ring-type fixing plates.
Multiple limiting grooves are equipped with along its axially spaced-apart on each insulating support rod, a circle coil of the inductance coil is set In in a limiting groove.
The inductance coil includes main paragraph and two extended segments for being respectively arranged on the main paragraph both ends, the main paragraph It is wrapped on layered quartz tube, two extended segments extend in the opposite direction, and each extended segment is equipped with and the radio-frequency power supply The electrode block of connection.
The inductance coil is hollow structure, and deionized water is walked in the inside of the inductance coil.
Axial one end of the layered quartz tube is equipped with annular intake pipe, on the annular intake pipe between it is axial uniformly Every equipped with multiple air inlets being connected to reaction chamber.
After the utility model inductance coil is passed through radio-frequency power supply, the reaction gas in reaction chamber is ionized and is generated by inductance coil Carbon atom, such carbon atom can be fallen in layer on copper foil or aluminium foil, and can pass through chemistry between carbon atom and carbon atom Bonded to be connected together, to grow graphene on copper foil or aluminium foil, such graphene has specific structure, is more advantageous to The energy storage of lithium ion battery, to make the lithium ion battery that there is higher energy density.
Detailed description of the invention
Fig. 1 is the construction profile of reaction chamber structure in the utility model embodiment.
Fig. 2 is sectional view along A-A in Fig. 1.
Fig. 3 is the thumbnail of Fig. 2.
Fig. 4 is the structure chart that inductance coil is rack-mount in the utility model embodiment.
Fig. 5 is the thumbnail of Fig. 4.
Fig. 6 is the schematic diagram seen on the right side of Fig. 4.
Fig. 7 be Fig. 6 in C-C to cross-sectional view.
Fig. 8 is the thumbnail of Fig. 7.
Fig. 9 is the enlarged drawing in Fig. 8 at D.
Figure 10 is B-B direction cross-sectional view in Fig. 1.
Figure 11 is the thumbnail of Figure 10.
Specific embodiment
As shown in Figures 2 and 3, the reaction chamber structure of the plasma deposition furnace proposed in the utility model embodiment, packet Layered quartz tube 1, outer layer quartz ampoule 2 and inductance coil 3 are included, is reaction chamber 4 inside layered quartz tube 1, reaction chamber 4 is for containing Reaction gas, reaction gas are methane, produce copper foil used in negative electrode tab or aluminium foil is placed in reaction chamber 4.Outer layer quartz ampoule 2 Cover it is outer in layered quartz tube 1 and coaxial with layered quartz tube 1, with spacing between outer layer quartz ampoule 2 and layered quartz tube 1.Electricity Feel coil 3 to be used to ionizing reaction gas into generation carbon atom, inductance coil 3 is wrapped on layered quartz tube 1, and inductance coil 3 Along the axially extending of layered quartz tube 1, inductance coil 3 connect forming circuit with radio-frequency power supply.
After inductance coil 3 is passed through radio-frequency power supply, the reaction gas ionization in reaction chamber is generated carbon atom by inductance coil 3, Carbon atom can be fallen in layer on copper foil or aluminium foil in this way, and can be by being chemically bonded between carbon atom and carbon atom Together, to grow graphene on copper foil or aluminium foil, such graphene has specific structure, is more advantageous to lithium-ion electric The energy storage in pond, to make the lithium ion battery that there is higher energy density.
Reaction chamber structure further includes counter flange 10, third before counter flange 8, inlet flange 9, second before furnace body 5, first Mistake after counter flange 15, third after counter flange 14, second after preceding counter flange 11, front shoe 12, rear fixed plate 13, first Cross flange 16, tail flange 17, interior thermocouples tube 20, fire door 6, fire door hot baffle 7, the first stainless steel housing, the second stainless steel screen Cover set, furnace body stainless steel case, third stainless steel housing, the 4th stainless steel housing, furnace tail hot baffle 17 and annular intake pipe 19。
Counter flange 11, front shoe before counter flange 10, third before counter flange 8, inlet flange 9, second before first 12, counter flange 16, tail flange after counter flange 15, third after counter flange 14, second after furnace body 5, rear fixed plate 13, first 17, successively from front to back along the axial direction setting of layered quartz tube 1.It is counter flange 11 before third, front shoe 12, furnace body 5, rear solid Counter flange 14 covers on outer layer quartz ampoule 2 after fixed board 13, first, and is sequentially connected.Before second including 10 sets of counter flange It is connect on layer quartz ampoule 1 and with counter flange 11 before third, inlet flange 9 is connect with counter flange 10 before second, mistake before first Flange 8 is crossed to connect with inlet flange 9.
Furnace body stainless steel valve jacket is at the intermediate position of furnace body 5, and the second stainless steel housing is covered in 5 front of furnace body, and third is stainless Steel housing is at 5 rear portion of furnace body.The shielding of first stainless steel is set on before third between counter flange 11 and front shoe 12, the The shielding of four stainless steels is set on after rear fixed plate 13 and first between counter flange 14, and stainless steel case set is for being electromagnetically shielded.
Before fire door 6 is mounted on first on counter flange 8, fire door hot baffle 7 is fixed on the medial surface of fire door 6.Fire door 6 with The first sealing ring 21 is equipped with before first between counter flange 8, it is close that second is equipped between counter flange 8 and inlet flange 9 before first Seal 22 is equipped with third sealing ring 23, counter flange 10 and third before second before inlet flange 9 and second between counter flange 10 The 4th sealing ring 24 is equipped between preceding counter flange 11.
It is equipped with the 5th sealing ring 25, counter flange after second after first after counter flange 14 and second between counter flange 15 15 and third after the 6th sealing ring 26 is equipped between counter flange 16, the is equipped with after third between counter flange 16 and tail flange 17 Seven sealing rings 27.
It should be noted that third sealing ring 23 is equipped with before inlet flange 9 and second between counter flange 10, mistake before second It crosses and is equipped with the 4th sealing ring 24 before flange 10 and third between counter flange 11, transition method after counter flange 14 and second after first It is equipped with the 5th sealing ring 25 between orchid 15, is equipped with the 6th sealing ring between counter flange 16 after counter flange 15 and third after second 26, realize the vacuum environment of layered quartz tube 1 and outer layer quartz ampoule 2.
Annular intake pipe 19 is fixed on the inside of inlet flange 9, and annular intake pipe 19 is set to the axial direction of layered quartz tube 1 Front end is equipped with multiple air inlets 191 being connected to reaction chamber 4 along its axial uniform intervals on annular intake pipe 19, with realization to It is uniformly supplied in reaction chamber 4.
Interior thermocouples tube 20 is located in reaction chamber 4, and one end of interior thermocouples tube 20 is stretched out from tail flange 17, and interior thermocouples tube 20 is used Temperature in control reaction chamber.
As shown in figure 3, inductance coil 3 is mounted on a bracket 28,28 sets of bracket on layered quartz tube 1.
As shown in Figure 4 and Figure 5, in the present embodiment, bracket includes that two ring-type fixing plates 281 are fixed with two annulars are located at Multiple insulating support rods 282 between plate 281, multiple insulating support rods 282 are parallel to each other and the equal edge of each insulating support rod 282 Layered quartz tube it is axially extending, inductance coil is fixed between multiple insulating support rods.
Bracket further includes multiple connecting rods 283, and connecting rod 283 is equal with 282 quantity of insulating support rod, a connecting rod 283 are threaded through an insulating support rod 282 and two annulars in an insulating support rod 282 and two ring-type fixing plates 281 Fixed plate 281 connects.
It should be noted that each insulating support rod is made of more piece, the cross-sectional shape of insulating support rod is in T shape.
Inductance coil includes main paragraph 301 and two extended segments for being respectively arranged on 301 both ends of main paragraph, is described for convenience Two extended segments are set to preceding extended segment 301 and rear extended segment 302.The main paragraph 301 of inductance coil is fixed on multiple exhausted Between edge support rod 282, main paragraph 32 is wrapped on layered quartz tube, and two extended segments 32 extend in the opposite direction,
As shown in Figure 7 to 9, it is equipped with for fixed inductance coil, on each insulating support rod 282 along its axially spaced-apart more One circle coil of a limiting groove 2821, inductance coil is placed in a limiting groove 2821, so that inductance coil is fixed on On bracket.It is that a circle coil of the main paragraph 301 of inductance coil is placed in a limiting groove 2821 in the present embodiment.
As shown in Figure 10 and Figure 11, electrode block is designed on each extended segment, the electrode block on one of extended segment with Radio-frequency power supply connects, the electrode block ground connection on another extended segment.The electrode block being mounted on preceding extended segment 302 is preceding electrode block 30, the electrode block being mounted on rear extended segment 303 is rear electrode block 37.
Counter flange extendes back reaction before counter flange, inlet flange and first before preceding extended segment 302 sequentially passes through second Outside cell structure, counter flange and tail flange extend back reaction chamber after counter flange, third after rear extended segment 303 sequentially passes through second Outside structure.30 sets of stretching out on the outer wall of the part outside reaction chamber structure in preceding extended segment 302 of preceding electrode block, 37 sets of rear electrode block In stretching out on the outer wall of the part outside reaction chamber structure for rear extended segment 303.
The first ceramic insulation set 28 and the second ceramic insulation set 29, the first ceramic insulation set 28 are cased on preceding extended segment 302 For the insulation between counter flange before inductance coil and second, the second ceramic insulation set 29 is for inductance coil and air inlet method Insulation before orchid, first between counter flange.Preceding extended segment 302, which is equipped with, is located at the first ceramic insulation set 28 and the second ceramics absolutely The 8th sealing ring between edge set 29, is equipped with the 9th sealing ring between counter flange before the first ceramic insulation covers 29 and second.
Third ceramic insulation set 35 and the 4th ceramic insulation set 36, third ceramic insulation set 35 are cased on extended segment 303 afterwards For the insulation between counter flange after inductance coil and second, the 4th ceramic insulation set 36 is for mistake after inductance coil and third Cross the insulation between method, blue tail flange.Extended segment 303, which is equipped with, afterwards is located at third ceramic insulation set 35 and the 4th ceramic insulation set The tenth sealing ring between 36 is equipped with the 11st sealing ring between counter flange after third ceramic insulation covers 35 and second.
Inductance coil is hollow structure, and deionized water is walked in the inside of inductance coil, for cooling down to inductance coil.
The end of preceding extended segment 302 is connected with water outlet connector 31, and water outlet connector 31 is connect with water outlet rubber tube 32, preceding electrode Block 30 and the periphery of water outlet connector 31 are equipped with the first bakelite insulation booth 33, and for insulating, 33 periphery of the first bakelite insulation booth is equipped with the One stainless steel shielding box 34.The end of extended segment 303 is connected with water supply connector 38 afterwards, and water supply connector 38 and water inlet rubber tube 39 connect It connects, rear electrode block 37 and 38 periphery of water supply connector are equipped with the second bakelite insulation booth 40, for insulating, outside the second bakelite insulation booth 40 It encloses and is equipped with the second stainless steel shielding box 41.
Counter flange is equipped with the first water channel 42 before first, and inlet flange is equipped with the second water channel 43, transition method before second Orchid is equipped with third water channel 44, and counter flange is equipped with the 4th water channel 45 before third, and counter flange is equipped with the 5th water after first Road 46, counter flange is equipped with the 6th water channel 47 after second, and counter flange is equipped with the 7th water channel 48 after third.
In the utility model, the pressure in reaction chamber is 10-25pa, temperature is 800 degree, gas flow 1-15SLM.
Only to illustrate the design of the utility model, those skilled in the art's above specific embodiment exist Various deformation and variation can be made under the design of the utility model, these are deformed and variation is included in the guarantor of the utility model Within the scope of shield.

Claims (8)

1. a kind of reaction chamber structure of plasma deposition furnace characterized by comprising
Layered quartz tube (1), the internal reaction chamber (4) for for containing reaction gas;
Outer layer quartz ampoule (2), set the layered quartz tube (1) outside and with the layered quartz tube (1) coaxially, the outer layer There is spacing between quartz ampoule (2) and the layered quartz tube (1);
For the reaction gas to be ionized to the inductance coil (3) for generating carbon atom, it is wrapped in the layered quartz tube (1) On, and the inductance coil (3) connects along the axially extending of the layered quartz tube (1), the inductance coil (3) and radio-frequency power supply It connects.
2. the reaction chamber structure of plasma deposition furnace according to claim 1, which is characterized in that the inductance coil (3) it is mounted on a bracket (28), the bracket (28) covers on layered quartz tube (1).
3. the reaction chamber structure of plasma deposition furnace according to claim 2, which is characterized in that bracket (28) packet The multiple insulating support rods (282) for including two ring-type fixing plates (281) and being located between described two ring-type fixing plates (281), The multiple insulating support rod (282) is parallel to each other and axial direction of each insulating support rod (282) along layered quartz tube (1) is prolonged It stretches, inductance coil (3) is fixed between multiple insulating support rods (282).
4. the reaction chamber structure of plasma deposition furnace according to claim 3, which is characterized in that the bracket (28) is also Including multiple connecting rods (283), connecting rod (283) is equal with insulating support rod (282) quantity, and a connecting rod (283) wears By one insulating support rod (282) and two in an insulating support rod (282) and described two ring-type fixing plates (281) A ring-type fixing plate (281) connection.
5. the reaction chamber structure of plasma deposition furnace according to claim 3, which is characterized in that each insulating support rod (282) multiple limiting grooves (2821) are equipped with along its axially spaced-apart on, a circle coil of the inductance coil (3) is placed in a limit In position groove (2821).
6. the reaction chamber structure of plasma deposition furnace according to claim 1, which is characterized in that the inductance coil It (3) include main paragraph (301) and two extended segments for being respectively arranged on the main paragraph (301) both ends, the main paragraph (301) twines It being wound on layered quartz tube (1), two extended segments extend in the opposite direction, it is designed on each extended segment and electrode block, In electrode block on an extended segment connect with radio-frequency power supply, the electrode block ground connection on another extended segment.
7. the reaction chamber structure of plasma deposition furnace according to claim 1, which is characterized in that the inductance coil It (3) is hollow structure, deionized water is walked in the inside of the inductance coil (3).
8. the reaction chamber structure of plasma deposition furnace according to claim 1, which is characterized in that the layered quartz tube (1) axial one end is equipped with annular intake pipe (19), along its axial uniform intervals equipped with multiple on the annular intake pipe (19) The air inlet (191) being connected to reaction chamber (4).
CN201822095332.9U 2018-12-13 2018-12-13 The reaction chamber structure of plasma deposition furnace Active CN209352977U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109371384A (en) * 2018-12-13 2019-02-22 深圳市捷佳伟创新能源装备股份有限公司 The reaction chamber structure of plasma deposition furnace

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109371384A (en) * 2018-12-13 2019-02-22 深圳市捷佳伟创新能源装备股份有限公司 The reaction chamber structure of plasma deposition furnace

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