CN209286973U - A kind of gas absorption impurity removing equipment - Google Patents
A kind of gas absorption impurity removing equipment Download PDFInfo
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- CN209286973U CN209286973U CN201821506544.5U CN201821506544U CN209286973U CN 209286973 U CN209286973 U CN 209286973U CN 201821506544 U CN201821506544 U CN 201821506544U CN 209286973 U CN209286973 U CN 209286973U
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- gas
- adsorption section
- removing equipment
- impurity removing
- silk screen
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Abstract
The utility model discloses a kind of gas absorption impurity removing equipment, gas to be clean is passed through from gas access, successively pass through activated carbon adsorption section and resin adsorption section adsorption-edulcoration, activated carbon adsorption section can remove the water in gas to be clean, the solid particulate matters such as dust and liquefied impurity is easily pre-chilled, amphoteric ion-exchange resin particle is filled in the resin adsorption section, the cation and anion in gas to be clean can be adsorbed, gas impurity and purification can be completed by absorption, with dust removal rate height, gas space puts the low advantage of rate, improve gas effciency, reduce the cost of gas purification in enterprise's production.
Description
Technical field
The utility model relates to gas purifying device fields, and in particular to a kind of gas absorption impurity removing equipment.
Background technique
High-purity polycrystalline silicon is widely used in electronics and information industry and semiconductor IC industry, but domestic current industry
Polysilicon purity still reach to the requirement less than semiconductor integrated circuit, the major impurity boron and phosphorus in high-purity polycrystalline silicon contain
Amount is apparently higher than the impurity content of external industry.
Third generation improved Siemens are the mainstream technologys of current production polysilicon.The technology is with trichlorosilane and hydrogen
Raw material obtains polysilicon under high temperature environment.In the process, impurity boron chloride and phosphorus chloride, in a hydrogen atmosphere also with list
The form deposition of matter B and P on the polysilicon, reduce the purity of polysilicon.
Trichlorosilane is during reduction reaction, as hydrogen constantly recycles, enters boron and phosphorus with circulating hydrogen
Reduction furnace, to generate the influence of harm to polysilicon product purity and quality.
Existing general by pressure swing adsorption progress hydrogen purification in the industry, which is inhaled by active carbon
It is attached, there is certain refining effect, but there are still apparent trace impurity, is unable to satisfy polysilicon preparation work growing in industry
The purity requirement of skill.
Utility model content
In view of this, the application provides a kind of gas absorption impurity removing equipment, clean without pressure-variable adsorption, is only by absorption
Gas impurity and purification can be completed, it is high, with high purity to have the advantages that dust removal rate, and adsorbent material can reuse, reduces
The cost of gas purification in enterprise's production.
In order to solve the above technical problems, technical solution provided by the utility model is a kind of gas absorption impurity removing equipment, packet
Cylinder is included, the both ends of the cylinder are respectively arranged with gas access and gas vent, between the gas access and gas vent
The cylinder on be disposed with activated carbon adsorption section and resin adsorption section, special two are filled in the resin adsorption section
Property ion-exchange resin particles.
Preferably, the inner wall of the cylinder is covered with polytetrafluoroethylene ethylene layer.
Preferably, the axial ends of the activated carbon adsorption section and the resin adsorption section is respectively arranged with fixation kit,
The fixation kit is sealed between the adjacent flange.
Preferably, the fixation kit includes two silk screen pressing plates disposed in parallel, is distributed with hole on the silk screen pressing plate, and two
Compressing between silk screen pressing plate has silk screen.
Preferably, it is welded between the silk screen and the silk screen pressing plate.
Preferably, flow control valve is provided at the gas access.
Preferably, the first sample tap is provided between the gas access and the activated carbon adsorption section, the gas goes out
The second sample tap is provided between mouth and resin adsorption section.
Preferably, valve is provided on first sample tap and second sample tap.
Compared with prior art, detailed description are as follows by the application:
This application discloses a kind of gas absorption impurity removing equipment, the hydrogen of purification to be adsorbed successively passes through activated carbon adsorption section
With resin adsorption section, the activated carbon adsorption section is used to remove liquefied liquid trichlorosilane and solid particulate matter impurity to the cold,
The resin adsorption section is for removing the cation and anion mixed in hydrogen, and the hydrogen purity of acquisition is high, and impurity concentration is small
In 100 μ g/L.Amphoteric ion-exchange resin particle in the resin adsorption section can be reused after washing, have and repeat benefit
With the high advantage of rate.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model；
Fig. 2 is the structural schematic diagram of fixation kit (6) in Fig. 1；
Fig. 3 is the partial enlarged view in Fig. 1 at A.
Specific embodiment
In order to make those skilled in the art more fully understand the technical solution of the utility model, with reference to the accompanying drawing and have
The utility model is described in further detail for body embodiment.
As shown in Figure 1 to Figure 3, a kind of gas absorption impurity removing equipment, the cylinder (1) including cylinder, the cylinder (1)
Both ends are sealed with cover board, and gas access (2) and gas vent are respectively arranged on the cover board of the cylinder (1) two sides
(3), the gas access (2) is for being passed through purification gas to be adsorbed, and the gas vent (3) is for after sending out adsorption cleaning
Hydrogen.Activated carbon adsorption section is successively embedded in the cylinder (1) between the gas access (2) and gas vent (3)
(4) and resin adsorption section (5) active carbon particle, is filled in the activated carbon adsorption section (4), in the resin adsorption section (5)
Filled with amphoteric ion-exchange resin particle.The hydrogen of purification to be adsorbed successively passes through activated carbon adsorption section (4) and resin adsorption
Section (5), the activated carbon adsorption section (4) are described for removing liquefied liquid trichlorosilane and solid particulate matter impurity to the cold
Resin adsorption section (5) obtains hydrogen of the impurity concentration less than 100 μ g/L for removing the cation and anion mixed in hydrogen
Gas.Amphoteric ion-exchange resin particle in the resin adsorption section (5) can be reused after washing, have recycling rate of waterused
High advantage.
The axial ends of the activated carbon adsorption section (4) and the resin adsorption section (5) is respectively arranged with fixation kit
(6), fixed activated carbon adsorption section (4) and the resin adsorption section (5) are respectively used to.With fixation kit (6) any one in Fig. 1
For structure:
The fixation kit (6) includes two silk screen pressing plates (61) disposed in parallel, is distributed on the silk screen pressing plate (61)
Hole (62), compressing between two silk screen pressing plates (61) has silk screen (63), and the aperture in silk screen hole is less than active carbon on the silk screen (63)
Particle and amphoteric ion-exchange resin particle, the silk screen (63) is for preventing active carbon particle or amphoteric ion-exchange resin
Abscission, and can guarantee that gas passes through.The silk screen pressing plate (61) of silk screen (63) two sides is used to increase the knot of silk screen (63)
The intensity of structure, convenient for fixed, installation silk screen (63), convenient for guaranteeing the fixed installation between silk screen (63) and cylinder (1), meanwhile,
Hole (62) on silk screen pressing plate (61) can not only guarantee that gas passes through, and active carbon particle or amphoteric ion can also be avoided to hand over
It changes resin particle and directly contacts silk screen (63), silk screen (63) hole (62) on silk screen (63) is caused to block.
It is welded and fixed between the silk screen (63) and the silk screen pressing plate (61), and is sealed by layer (64), it is described solid
Determine component (6) axial ends face and be pressed on cylinder (1) by flange (13), the fixation kit (6) and the cylinder (1) it
Between also compress have gasket.
Cylinder (1) inner wall is covered with polytetrafluoroethylene ethylene layer (14), the polytetrafluoroethylene ethylene layer (14) for prevent to
Purification gas is contacted with the metal of cylinder (1) inner wall, prevents acid ion and metal in gas to be clean from reacting, into one
Step guarantees the purity of hydrogen.
It is provided with flow control valve (21) at the gas access (2), the flow control valve (21) is used for according to operating condition
Adjust the flow of purification gas to be adsorbed.
The first sample tap (7), the gas are provided between the gas access (2) and the activated carbon adsorption section (4)
It is provided with the second sample tap (8) between outlet (3) and resin adsorption section (5), first sample tap (7) and second sampling
Valve (9) are provided on mouth (8).In hydrogen purification process, adsorbed gas sample detection can be treated by the first sample tap (7)
Impurity component and density of hydrogen can also be sampled the hydrogen after adsorption-edulcoration by the second sample tap (8), and hydrogen is detected
Whether purity reaches requirement, further, it is also possible to which the sampling by the second sample tap (8) is determined whether to activated carbon adsorption section
(4) or the resin adsorption section (5) is replaced.
Above are merely preferred embodiments of the utility model, it is noted that above-mentioned preferred embodiment should not regard
For limitations of the present invention, the protection scope of the utility model should be defined by the scope defined by the claims..For
For those skilled in the art, without departing from the spirit and scope of the utility model, it can also make several
Improvements and modifications, these improvements and modifications also should be regarded as the protection scope of the utility model.
Claims (8)
1. a kind of gas absorption impurity removing equipment, including cylinder (1), which is characterized in that the both ends of the cylinder (1) are respectively arranged with
Gas access (2) and gas vent (3), on the cylinder (1) between the gas access (2) and gas vent (3) successively
It is provided with activated carbon adsorption section (4) and resin adsorption section (5), is set in the resin adsorption section (5) filled with amphoteric ion exchange
Rouge particle.
2. a kind of gas absorption impurity removing equipment according to claim 1, which is characterized in that the inner wall of the cylinder (1) covers
It is stamped polytetrafluoroethylene ethylene layer (14).
3. a kind of gas absorption impurity removing equipment according to claim 1, which is characterized in that the activated carbon adsorption section (4)
It is respectively arranged with fixation kit (6) with the axial ends of the resin adsorption section (5), the fixation kit (6) is sealed at
Between adjacent flange (13).
4. a kind of gas absorption impurity removing equipment according to claim 3, which is characterized in that the fixation kit (6) includes
Two silk screen pressing plates (61) disposed in parallel are distributed with hole (62) on the silk screen pressing plate (61), press between two silk screen pressing plates (61)
Tightly there are silk screen (63).
5. a kind of gas absorption impurity removing equipment according to claim 4, which is characterized in that the silk screen (63) and the silk
Net pressing plate is welded between (61).
6. a kind of gas absorption impurity removing equipment according to claim 1, which is characterized in that set at the gas access (2)
It is equipped with flow control valve (21).
7. a kind of gas absorption impurity removing equipment according to claim 1, which is characterized in that the gas access (2) and institute
It states and is provided between activated carbon adsorption section (4) the first sample tap (7), set between the gas vent (3) and resin adsorption section (5)
It is equipped with the second sample tap (8).
8. a kind of gas absorption impurity removing equipment according to claim 7, which is characterized in that first sample tap (7) and
Valve (9) are provided on second sample tap (8).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821506544.5U CN209286973U (en) | 2018-09-14 | 2018-09-14 | A kind of gas absorption impurity removing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821506544.5U CN209286973U (en) | 2018-09-14 | 2018-09-14 | A kind of gas absorption impurity removing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209286973U true CN209286973U (en) | 2019-08-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821506544.5U Active CN209286973U (en) | 2018-09-14 | 2018-09-14 | A kind of gas absorption impurity removing equipment |
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| Country | Link |
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| CN (1) | CN209286973U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111686860A (en) * | 2020-05-12 | 2020-09-22 | 李建华 | Waste residue collection device for waste incineration and use method thereof |
| CN117582781A (en) * | 2024-01-17 | 2024-02-23 | 联仕新材料(苏州)股份有限公司 | Electronic grade ammonia water preparation device and preparation method thereof |
-
2018
- 2018-09-14 CN CN201821506544.5U patent/CN209286973U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111686860A (en) * | 2020-05-12 | 2020-09-22 | 李建华 | Waste residue collection device for waste incineration and use method thereof |
| CN117582781A (en) * | 2024-01-17 | 2024-02-23 | 联仕新材料(苏州)股份有限公司 | Electronic grade ammonia water preparation device and preparation method thereof |
| CN117582781B (en) * | 2024-01-17 | 2024-05-17 | 联仕新材料(苏州)股份有限公司 | Electronic grade ammonia water preparation device and preparation method thereof |
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