CN209241644U - A kind of photoresist surge tank with Anti-bubble effect - Google Patents
A kind of photoresist surge tank with Anti-bubble effect Download PDFInfo
- Publication number
- CN209241644U CN209241644U CN201821921679.8U CN201821921679U CN209241644U CN 209241644 U CN209241644 U CN 209241644U CN 201821921679 U CN201821921679 U CN 201821921679U CN 209241644 U CN209241644 U CN 209241644U
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- surge tank
- photoresist
- fixedly installed
- limit sliding
- sliding rail
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Abstract
The utility model discloses a kind of photoresist surge tanks with Anti-bubble effect, including bottom plate, tilt mount is fixedly installed at the top of the bottom plate, surge tank is fixedly installed at the top of the tilt mount, bottom on the right side of the surge tank is fixedly installed with rubber hose, left side at the top of the surge tank, which is interted, is connected with exhaust pipe, right side at the top of the surge tank, which is interted, is connected with glue inlet tube, the inner surface of the surge tank is coated with lubricious, and the bottom of the glue inlet tube is fixedly installed with curved pipe.The photoresist surge tank with Anti-bubble effect, it is used cooperatively by tilt mount, glue inlet tube, curved pipe and lubricious, to make photoresist slowly slide along the inner wall of surge tank, to avoid photoresist from entering the buffer tank vertically to splash down, effectively prevent it from splashing down generation bubble, and then the bubble occurred on product when reducing production, product is abnormal caused by avoiding because of bubble, improves product quality.
Description
Technical field
The utility model relates to driving chip gold convex block encapsulation field, specifically a kind of photoresist with Anti-bubble effect
Surge tank.
Background technique
Photoresist is one of the critical material that Micropicture is processed in microelectric technique, especially extensive and super in recent years
The research and development and application of photoresist are even more greatly facilitated in the development of large scale integrated circuit.Printing industry is that photoresist is answered
Another key areas.Studying successful polyvinyl alcohol cinnamic acid rouge first by Minsk et al. is exactly to be used for printing industry
, it is just used for electronics industry later, photoresist to need first to be moved in surge tank from photoetching glue bottle before use.But it is existing at present
The surge tank of enforcement is to be disposed vertically, i.e., when photoresist is delivered to surge tank by photoetching glue bottle, vertically to splash down, is also easy to produce gas
Bubble, and photoetching gumminess is larger, bubble is not easy to be discharged, if eventually appearing on product by pipeline, Pump etc., will cause product
It is abnormal, influence product quality.
Utility model content
The purpose of this utility model is to provide a kind of photoresist surge tanks with Anti-bubble effect, to solve above-mentioned back
The problem of being proposed in scape technology.
To achieve the above object, the utility model provides the following technical solutions:
A kind of photoresist surge tank with Anti-bubble effect, including bottom plate are fixedly installed at the top of the bottom plate and incline
Oblique mounting base is fixedly installed with surge tank at the top of the tilt mount, and the bottom on the right side of the surge tank is fixedly installed with
Rubber hose, left side at the top of the surge tank is interspersed to be connected with exhaust pipe, the right side at the top of the surge tank is interspersed be connected with into
Sebific duct, the inner surface of the surge tank are coated with lubricious, and the bottom of the glue inlet tube is fixedly installed with curved pipe.
The outer surface of the surge tank is fixedly mounted there are two the second limit sliding rail, and the second limit sliding rail is slidably connected
There is matched ball, the ball slidably connects the first matched limit sliding rail, and first limit is slided
Rail is fixedly connected with buffing pad far from the side of ball, and the outer surface of the buffing pad offers placing groove, in the placing groove
The top and bottom on surface are fixedly installed with telescopic rod, and the movable end of the telescopic rod is fixedly installed with Crashworthy plate, described to stretch
The outer surface of contracting bar is socketed with buffer spring, is inlaid with limit sliding sleeve in the middle part of the Crashworthy plate inner surface, in the placing groove
Limit slide bar is fixedly installed in the middle part of surface, and the side for limiting slide bar extends to the inside of limit sliding sleeve.
As a further solution of the present invention: the limit slide bar is slidably connected with limit sliding sleeve, and limit slide bar
It is adapted with limit sliding sleeve.
The quantity one of the first limit sliding rail and the second limit sliding rail as a further solution of the present invention,
It causes, and the first limit sliding rail is consistent with the structure size of the second limit sliding rail.
The shape of the placing groove and Crashworthy plate is circle as a further solution of the present invention, and is placed
Slot is adapted with Crashworthy plate.
The inclined angle of the tilt mount is ten degree as a further solution of the present invention, the arc
The discharge port of pipe is leant against on the inner wall of the slightly lower side of surge tank.
Compared with prior art, the utility model has the beneficial effects that
Originally practical to be used cooperatively by tilt mount, glue inlet tube, curved pipe and lubricious, to make photoresist edge
The inner wall of surge tank slowly slide, so that photoresist be avoided to enter the buffer tank vertically to splash down, effectively prevent it from splashing down
The bubble occurred on product when generating bubble, and then reducing production, product is abnormal caused by avoiding because of bubble, improves product
Quality, when Crashworthy plate is hit, can make to prevent by being used cooperatively for the first limit sliding rail, the second limit sliding rail and ball
Plate rotation is hit, so as to keep extraneous rammer mobile to side, avoids rammer from further being contacted with surge tank, thus real
Now surge tank is protected, while passing through the first limit sliding rail, the second limit sliding rail, ball, buffing pad, placing groove, anticollision
Being used cooperatively for plate and buffer spring, when Crashworthy plate is hit, is buffered by buffer spring, reduces its kinetic-potential
Can, the protection to surge tank is further realized, improves the protecting effect to it, and protecting effect is good.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the photoresist surge tank with Anti-bubble effect.
Fig. 2 is the top view of the photoresist surge tank with Anti-bubble effect.
Fig. 3 is the cross-sectional view of surge tank in the photoresist surge tank with Anti-bubble effect.
Fig. 4 is the cross-sectional view of buffing pad in the photoresist surge tank with Anti-bubble effect.
In figure: bottom plate 1, tilt mount 2, surge tank 3, Crashworthy plate 4, placing groove 5, buffing pad 6, exhaust pipe 7, glue inlet tube
8, the first limit sliding rail 9, second limits sliding rail 10, ball 11, curved pipe 12, lubricious 13, buffer spring 14, telescopic rod
15, sliding sleeve 16, limit slide bar 17, rubber hose 18 are limited.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Please refer to Fig. 1~4, in the utility model embodiment, a kind of photoresist surge tank with Anti-bubble effect, including
Bottom plate 1, the top of bottom plate 1 are fixedly installed with tilt mount 2, and the top of tilt mount 2 is fixedly installed with surge tank 3, delay
The bottom for rushing 3 right side of tank is fixedly installed with rubber hose 18, and the left side at 3 top of surge tank is interspersed to be connected with exhaust pipe 7, surge tank 3
The right side at top is interspersed to be connected with glue inlet tube 8, and the inner surface of surge tank 3 is coated with lubricious 13, the fixed peace in the bottom of glue inlet tube 8
Equipped with curved pipe 12.
The outer surface of surge tank 3 is fixedly mounted there are two the second limit sliding rail 10, and the second limit sliding rail 10 slidably connects
Matched ball 11, ball 11 slidably connect the first matched limit sliding rail 9, and the first limit sliding rail 9 is remote
Side from ball 11 is fixedly connected with buffing pad 6, and the outer surface of buffing pad 6 offers placing groove 5,5 inner surface of placing groove
Top and bottom are fixedly installed with telescopic rod 15, and the movable end of telescopic rod 15 is fixedly installed with Crashworthy plate 4, telescopic rod 15 it is outer
Surface is socketed with buffer spring 14, and limit sliding sleeve 16, the middle part of 5 inner surface of placing groove are inlaid in the middle part of 4 inner surface of Crashworthy plate
It is fixedly installed with limit slide bar 17, and the side for limiting slide bar 17 extends to the inside of limit sliding sleeve 16, limit slide bar 17 and limit
Position sliding sleeve 16 is slidably connected, and limits slide bar 17 and be adapted with limit sliding sleeve 16, the first limit sliding rail 9 and the second limit sliding rail 10
Quantity it is consistent, and the first limit sliding rail 9 is consistent with the structure size of the second limit sliding rail 10, placing groove 5 and Crashworthy plate 4
Shape is circle, and placing groove 5 is adapted with Crashworthy plate 4, and the inclined angle of tilt mount 2 is ten degree, curved pipe 12
Discharge port is leant against on the inner wall of the slightly lower side of surge tank 3.
The working principle of the utility model is:
In use, being used cooperatively by tilt mount 2, glue inlet tube 8, curved pipe 12 with lubricious 13, due to inclining
The oblique inclined angle of mounting base 2 is ten degree, to keep surge tank 3 inclined, and the discharge port of curved pipe 12 lean against it is slow
Rush on the inner wall of the slightly lower side of tank 3, so that photoresist be made slowly to slide along the inner wall of surge tank 3, thus avoid photoresist into
Entering is vertically to splash down in surge tank 3, the gas occurred on product when effectively preventing it from splashing down generation bubble, and then reducing production
Bubble, product is abnormal caused by avoiding because of bubble, improves product quality, limits sliding rail 10 by the first limit sliding rail 9, second
Crashworthy plate 4 can be made to rotate, so as to make extraneous rammer to one when Crashworthy plate 4 is hit with being used cooperatively for ball 11
Side is mobile, and rammer is avoided further to be contacted with surge tank 3, protects to realize to surge tank 3, while passing through the
One limit sliding rail 9, second, which limits sliding rail 10, ball 11, buffing pad 6, placing groove 5, Crashworthy plate 4 and the cooperation of buffer spring 14, to be made
With, when Crashworthy plate 4 is hit, buffered by buffer spring 14, reduce its move potential energy, further realize to buffering
The protection of tank 3 improves the protecting effect to it, and protecting effect is good.
Although the utility model is described in detail with reference to the foregoing embodiments, come for those skilled in the art
Say, it is still possible to modify the technical solutions described in the foregoing embodiments, or to part of technical characteristic into
Row equivalent replacement, within the spirit and principle of the utility model, any modification, equivalent replacement, improvement and so on should all
It is included within the scope of protection of this utility model.
Claims (5)
1. a kind of photoresist surge tank with Anti-bubble effect, including bottom plate (1), which is characterized in that the top of the bottom plate (1)
Portion is fixedly installed with tilt mount (2), is fixedly installed with surge tank (3), the buffering at the top of the tilt mount (2)
Bottom on the right side of tank (3) is fixedly installed with rubber hose (18), and the left side at the top of the surge tank (3) is interspersed to be connected with exhaust pipe
(7), the right side at the top of the surge tank (3) is interspersed is connected with glue inlet tube (8), and the inner surface of the surge tank (3) is coated with smooth
The bottom of coating (13), the glue inlet tube (8) is fixedly installed with curved pipe (12)；
There are two the second limit sliding rail (10), second limits sliding rail (10) for the outer surface fixed installation of the surge tank (3)
It slidably connects matched ball (11), the ball (11) slidably connects the first matched limit sliding rail
(9), first limit sliding rail (9) is fixedly connected with buffing pad (6) far from the side of ball (11), the buffing pad (6)
Outer surface offers placing groove (5), and the top and bottom of placing groove (5) inner surface are fixedly installed with telescopic rod (15),
The movable end of the telescopic rod (15) is fixedly installed with Crashworthy plate (4), and the outer surface of the telescopic rod (15) is socketed with buffering elastic
Spring (14) is inlaid with limit sliding sleeve (16), the middle part of placing groove (5) inner surface in the middle part of Crashworthy plate (4) inner surface
It is fixedly installed with limit slide bar (17), and the side for limiting slide bar (17) extends to the inside of limit sliding sleeve (16).
2. the photoresist surge tank according to claim 1 with Anti-bubble effect, which is characterized in that the limit slide bar
(17) it is slidably connected with limit sliding sleeve (16), and limits slide bar (17) and be adapted with limit sliding sleeve (16).
3. the photoresist surge tank according to claim 1 with Anti-bubble effect, which is characterized in that first limit
Sliding rail (9) is consistent with the second limit quantity of sliding rail (10), and the structure of the first limit sliding rail (9) and the second limit sliding rail (10)
Size is consistent.
4. the photoresist surge tank according to claim 1 with Anti-bubble effect, which is characterized in that the placing groove
It (5) is circle with the shape of Crashworthy plate (4), and placing groove (5) is adapted with Crashworthy plate (4).
5. the photoresist surge tank according to claim 1 with Anti-bubble effect, which is characterized in that the inclination installation
Seat (2) inclined angle is ten degree, and the discharge port of the curved pipe (12) is leant against on the inner wall of surge tank (3) slightly lower side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821921679.8U CN209241644U (en) | 2018-11-21 | 2018-11-21 | A kind of photoresist surge tank with Anti-bubble effect |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821921679.8U CN209241644U (en) | 2018-11-21 | 2018-11-21 | A kind of photoresist surge tank with Anti-bubble effect |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209241644U true CN209241644U (en) | 2019-08-13 |
Family
ID=67530155
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821921679.8U Active CN209241644U (en) | 2018-11-21 | 2018-11-21 | A kind of photoresist surge tank with Anti-bubble effect |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209241644U (en) |
-
2018
- 2018-11-21 CN CN201821921679.8U patent/CN209241644U/en active Active
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| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 230000 in Hefei Comprehensive Bonded Zone, Xinzhan District, Hefei City, Anhui Province Patentee after: Hefei xinhuicheng Microelectronics Co.,Ltd. Address before: 230000 in Hefei Comprehensive Bonded Zone, Xinzhan District, Hefei City, Anhui Province Patentee before: Hefei Xinhuicheng Microelectronics Co.,Ltd. |