CN209227056U - A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device - Google Patents
A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device Download PDFInfo
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- CN209227056U CN209227056U CN201822003929.6U CN201822003929U CN209227056U CN 209227056 U CN209227056 U CN 209227056U CN 201822003929 U CN201822003929 U CN 201822003929U CN 209227056 U CN209227056 U CN 209227056U
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- vacuum chamber
- winding
- film plating
- apparatus body
- miscellaneous gas
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Abstract
The utility model discloses a kind of miscellaneous gas of flexible winding filming equipment to clear up isolating device, including winding film plating apparatus body, the surface for being internally located at plated film drum of the winding film plating apparatus body is angularly equipped with six groups of magnetron sputtering chambers, and being internally located between every two groups of magnetron sputtering chambers for winding film plating apparatus body is equipped with vacuum chamber, overfall is equipped between the vacuum chamber and magnetron sputtering chamber, and check valve is installed in overfall, vacuum pump is installed on the outside of the vacuum chamber, and the inlet end of vacuum pump and the bleeding point of vacuum chamber are connected and fixed, the outlet side of the vacuum pump is fixedly connected with gas cleaning plant by pipeline.The apparatus structure designs advantages of simple, easy to operate, effectively prevents miscellaneous gas from spilling into other chambers, guarantees vacuum degree when winding film plating equipment uses, while convenient for handling miscellaneous gas, safety and stability is applied widely, is conducive to popularize.
Description
Technical field
The utility model belongs to miscellaneous gas Removal Technology field, and in particular to a kind of flexible winding filming equipment is cleared up with miscellaneous gas
Isolating device.
Background technique
Flexible transparent conductive film deposition technique is widely popularized in touch screen industry at present, and flexible transparent conducting film is logical
It crosses winding filming equipment to be coated with, but the sputtering chamber in flexible winding filming equipment is to flexible transparent conductive film substrate
Extra process gas is often had when sputtering into adjacent chamber, is influenced so as to cause different process gas mix
The quality that flexible transparent conductive film is coated with, entering other sputtering chambers simultaneously for miscellaneous gas also will affect in winding film plating equipment
The vacuum degree in portion influences the product stability of winding film plating equipment, is unfavorable for widely popularizing.
Utility model content
It is cleared up the purpose of this utility model is to provide a kind of flexible winding filming equipment with miscellaneous gas and isolating device, structure
Advantages of simple is designed, it is easy to operate, effectively prevent miscellaneous gas from spilling into other chambers, while convenient for handling miscellaneous gas, pacifying
It is complete to stablize, it is applied widely, to solve the problems mentioned in the above background technology.
To achieve the above object, the utility model provides the following technical solutions: a kind of miscellaneous gas of flexible winding filming equipment
Clear up isolating device, including winding film plating apparatus body, the surface for being internally located at plated film drum of the winding film plating apparatus body
Six groups of magnetron sputtering chambers are angularly equipped with, and winding film plating apparatus body is internally located between every two groups of magnetron sputtering chambers
It is equipped with vacuum chamber, overfall is equipped between the vacuum chamber and magnetron sputtering chamber, and is equipped in overfall unidirectional
Valve is equipped with vacuum pump on the outside of the vacuum chamber, and the inlet end of vacuum pump and the bleeding point of vacuum chamber are connected and fixed,
The outlet side of the vacuum pump is fixedly connected with gas cleaning plant by pipeline.
Preferably, what the two sides of the winding film plating apparatus body were connected separately with internal setting roller unreels room and winding
Room, and the inside of winding film plating apparatus body is equipped with the pump housing for vacuumizing.
Preferably, the check valve includes being welded in overfall and the indoor snorkel of vacuum chamber is protruded into one end, described
One end internal slide that snorkel protrudes into vacuum chamber is connected with stick harness, and one end extending aeration pipe integral type of stick harness is connected with
Baffle is fixedly installed with return spring between the baffle and snorkel, the end of the stick harness is equipped with to be connected to stick harness side
Through-hole, and snorkel protrudes into the end surface of vacuum chamber and is equipped with the stomata that matches with through-hole.
Preferably, the gas cleaning plant includes reactor tank, and the top of reactor tank is fixedly installed with tank by flange
Lid, the side of the cover is interspersed with the connecting tube that reactor tank inner bottom is protruded into bottom end, and the top of connecting tube and vacuum pump
Outlet side be connected and fixed by pipeline, the bottom of the reactor tank is equipped with the discharge nozzle with valve, and the inner bottom of reactor tank
The outside that end is located at discharge nozzle is embedded with electric heating tube, and the side top of the reactor tank is welded with the feed pipe with end cap, institute
The top other side for stating cover is welded with escape pipe, and the bottom of cover is located at and is equipped with filling active carbon on the outside of escape pipe
Filter bag.
Preferably, the inner bottom of the reactor tank is the curved surface camber of opening upwards, and the surface of reactor tank is equipped with band
The observation window of scale.
Compared with prior art, the utility model has the beneficial effects that
1, it can prevent miscellaneous gas from entering different magnetron sputtering chambers by the way that vacuum chamber is arranged between magnetron sputtering chamber
Interior, while the indoor check valve of vacuum chamber may be implemented only so that miscellaneous gas enters vacuum chamber, and miscellaneous gas cannot be made from true
Plenum chamber flows back into magnetron sputtering chamber；
2, it can be extracted out in vacuum chamber, while also can guarantee true the indoor miscellaneous gas of vacuum chamber is overflowed to using vacuum pump
The indoor vacuum degree of cavity, and miscellaneous pneumatic transmission enter in the reactor tank in gas cleaning plant with solution occur displacement react, effectively
Can reuse or rarer substance is separated, at the same electric heating tube when needed can to solution into
Row heating improves the efficiency of displacement reaction, and the filter bag for filling active carbon is effectively filtered the gas generated after displacement, subtracts
Few environmental pollution.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model；
Fig. 2 is the cross-sectional view of the utility model vacuum chamber；
Fig. 3 is the cross-sectional view of the utility model check valve；
Fig. 4 is the cross-sectional view of the utility model gas cleaning plant.
In figure: 1 winding film plating apparatus body, 2 magnetron sputtering chambers, 3 vacuum chambers, 4 overfalls, 5 check valves, 51 ventilations
Pipe, 52 stick harnesses, 53 baffles, 54 return springs, 55 through-holes, 56 stomatas, 6 bleeding points, 7 vacuum pumps, 8 gas cleaning plants, 81 are instead
Answer tank, 82 covers, 83 connecting tubes, 84 discharge nozzles, 85 escape pipes, 86 filter bags, 87 feed pipes, 88 electric heating tubes.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
The utility model provides a kind of flexible winding filming equipment as shown in Figs 1-4 and clears up isolating device with miscellaneous gas,
Including winding film plating apparatus body 1, the surface for being internally located at plated film drum of the winding film plating apparatus body 1 is angularly equipped with six
Group magnetron sputtering chamber 2, and being internally located between every two groups of magnetron sputtering chambers 2 for winding film plating apparatus body 1 is equipped with very
Plenum chamber 3 is equipped with overfall 4, and is equipped with check valve 5 in overfall 4 between the vacuum chamber 3 and magnetron sputtering chamber 2,
The outside of the vacuum chamber 3 is equipped with vacuum pump 7, and the inlet end of vacuum pump 7 is connect admittedly with the bleeding point 6 of vacuum chamber 3
Fixed, the outlet side of the vacuum pump 7 is fixedly connected with gas cleaning plant 8 by pipeline.
Specifically, the two sides of the winding film plating apparatus body 1 be connected separately with internal setting roller unreel room and receipts
Room is rolled up, and the inside of winding film plating apparatus body 1 is equipped with the pump housing for vacuumizing.
Specifically, the check valve 5 includes being welded in overfall 4 and snorkel 51 in vacuum chamber 3 is protruded into one end,
One end internal slide that the snorkel 51 protrudes into vacuum chamber 3 is connected with stick harness 52, and one end extending aeration pipe of stick harness 52
51 integral types are connected with baffle 53, and return spring 54, the stick harness 52 are fixedly installed between the baffle 53 and snorkel 51
End be equipped with the through-hole 55 that be connected to 52 side of stick harness, and snorkel 51 protrudes into the end surface of vacuum chamber 3 and is equipped with and leads to
The stomata 56 that hole 55 matches.
Specifically, the gas cleaning plant 8 includes reactor tank 81, and the top of reactor tank 81 is fixedly mounted by flange
There is cover 82, the side of the cover 82 is interspersed with the connecting tube 83 that 81 inner bottom of reactor tank is protruded into bottom end, and connecting tube 83
Top and the outlet side of vacuum pump 7 be connected and fixed by pipeline, the bottom of the reactor tank 81 is equipped with the discharge nozzle with valve
84, and the inner bottom of reactor tank 81 is located at the outside of discharge nozzle 84 embedded with electric heating tube 88, the side of the reactor tank 81
Top is welded with the feed pipe 87 with end cap, and the top other side of the cover 82 is welded with escape pipe 85, and the bottom of cover 82
The outside that portion is located at escape pipe 85 is equipped with the filter bag 86 of filling active carbon.
Specifically, the inner bottom of the reactor tank 81 is the curved surface camber of opening upwards, and the surface of reactor tank 81 is set
There is observation window with a scale.
Target in six groups of magnetron sputtering chambers 2 is followed successively by silicon target, niobium target, silicon target, silicon target, silicon target and ITO target, so right
The reaction solution filled in reactor tank 81 in gas cleaning plant 8 is selected according to the difference of reaction target, such as gas silicon
Compound silicon tetrahydride can react in potassium hydroxide basic solution generates potassium silicate crystallization and hydrogen, and niobium (Nb) pentafluoride steam is directly logical
Entering will deliquesce in water as niobium pentaoxide hydrate gelatinous precipitate and hydrogen fluoride gas.
The electric elements occurred in this article are electrically connected with extraneous main controller and 220V alternating current, and main controller can be meter
Calculation machine etc. plays the conventionally known equipment of control action.
Working principle: in use, vacuum chamber 3 is arranged between magnetron sputtering chamber 2, can to prevent miscellaneous gas from entering different
Check valve 5 in magnetron sputtering chamber 2, while in vacuum chamber 3 may be implemented only so that miscellaneous gas enters vacuum chamber 3, and
Miscellaneous gas cannot be made to flow back into magnetron sputtering chamber 2 from vacuum chamber 3, vacuum pump 7 can be miscellaneous in vacuum chamber 3 overflowing to
Gas is extracted out in vacuum chamber 3, while also can guarantee the vacuum degree in vacuum chamber 3, and miscellaneous pneumatic transmission enters in gas cleaning plant 8
Displacement occurs with solution in reactor tank 81 to react, effectively can reuse or rarer substance is separated,
Electric heating tube 88 can carry out the efficiency that heating improves displacement reaction to solution when needed simultaneously, fill the filter of active carbon
Bag 86 is effectively filtered the gas generated after displacement, reduces environmental pollution.
Finally, it should be noted that the above descriptions are merely preferred embodiments of the present invention, it is not limited to this
Utility model, although the utility model is described in detail with reference to the foregoing embodiments, for those skilled in the art
For, it is still possible to modify the technical solutions described in the foregoing embodiments, or to part of technical characteristic
It is equivalently replaced, within the spirit and principle of the utility model, any modification, equivalent replacement, improvement and so on,
It should be included within the scope of protection of this utility model.
Claims (5)
1. a kind of flexible winding filming equipment clears up isolating device, including winding film plating apparatus body (1) with miscellaneous gas, feature exists
In: the surface for being internally located at plated film drum of the winding film plating apparatus body (1) is angularly equipped with six groups of magnetron sputtering chambers
(2), and being internally located between every two groups of magnetron sputtering chambers (2) for winding film plating apparatus body (1) is equipped with vacuum chamber
(3), overfall (4) are equipped between the vacuum chamber (3) and magnetron sputtering chamber (2), and are equipped in overfall (4) unidirectional
Valve (5) is equipped with vacuum pump (7) on the outside of the vacuum chamber (3), and the inlet end of vacuum pump (7) and vacuum chamber (3)
Bleeding point (6) is connected and fixed, and the outlet side of the vacuum pump (7) is fixedly connected with gas cleaning plant (8) by pipeline.
2. a kind of flexible winding filming equipment according to claim 1 clears up isolating device with miscellaneous gas, it is characterised in that: institute
What the two sides for stating winding film plating apparatus body (1) were connected separately with internal setting roller unreels room and winding room, and winding film plating
The inside of apparatus body (1) is equipped with the pump housing for vacuumizing.
3. a kind of flexible winding filming equipment according to claim 1 clears up isolating device with miscellaneous gas, it is characterised in that: institute
Stating check valve (5) includes being welded in overfall (4) and snorkel (51) in vacuum chamber (3), the ventilation are protruded into one end
One end internal slide that pipe (51) protrudes into vacuum chamber (3) is connected with stick harness (52), and one end extending aeration pipe of stick harness (52)
(51) integral type is connected with baffle (53), is fixedly installed with return spring (54) between the baffle (53) and snorkel (51),
The end of the stick harness (52) is equipped with the through-hole (55) being connected to stick harness (52) side, and snorkel (51) protrudes into vacuum chamber
(3) end surface is equipped with the stomata (56) matched with through-hole (55).
4. a kind of flexible winding filming equipment according to claim 1 clears up isolating device with miscellaneous gas, it is characterised in that: institute
Stating gas cleaning plant (8) includes reactor tank (81), and the top of reactor tank (81) is fixedly installed with cover (82) by flange,
The side of the cover (82) is interspersed with the connecting tube (83) that reactor tank (81) inner bottom is protruded into bottom end, and connecting tube (83)
The outlet side on top and vacuum pump (7) is connected and fixed by pipeline, and the bottom of the reactor tank (81) is equipped with the discharging with valve
It manages (84), and the inner bottom of reactor tank (81) is located at the outside of discharge nozzle (84) embedded with electric heating tube (88), the reaction
The side top of tank (81) is welded with the feed pipe (87) with end cap, and the top other side of the cover (82) is welded with escape pipe
(85), and the bottom of cover (82) is located at the filter bag (86) that filling active carbon is equipped on the outside of escape pipe (85).
5. a kind of flexible winding filming equipment according to claim 4 clears up isolating device with miscellaneous gas, it is characterised in that: institute
The inner bottom for stating reactor tank (81) is the curved surface camber of opening upwards, and the surface of reactor tank (81) is equipped with observation with a scale
Window.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822003929.6U CN209227056U (en) | 2018-12-01 | 2018-12-01 | A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822003929.6U CN209227056U (en) | 2018-12-01 | 2018-12-01 | A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209227056U true CN209227056U (en) | 2019-08-09 |
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ID=67505662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201822003929.6U Active CN209227056U (en) | 2018-12-01 | 2018-12-01 | A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device |
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| CN (1) | CN209227056U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109252144A (en) * | 2018-12-01 | 2019-01-22 | 安徽方兴光电新材料科技有限公司 | A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device |
| CN112013137A (en) * | 2020-08-11 | 2020-12-01 | 武汉摩擦力信息技术有限公司 | High vacuum one-way valve |
-
2018
- 2018-12-01 CN CN201822003929.6U patent/CN209227056U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109252144A (en) * | 2018-12-01 | 2019-01-22 | 安徽方兴光电新材料科技有限公司 | A kind of flexible winding filming equipment miscellaneous gas cleaning isolating device |
| CN112013137A (en) * | 2020-08-11 | 2020-12-01 | 武汉摩擦力信息技术有限公司 | High vacuum one-way valve |
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