CN209210969U - A kind of sensor monocrystalline silicon etching device - Google Patents

A kind of sensor monocrystalline silicon etching device Download PDF

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Publication number
CN209210969U
CN209210969U CN201822199473.5U CN201822199473U CN209210969U CN 209210969 U CN209210969 U CN 209210969U CN 201822199473 U CN201822199473 U CN 201822199473U CN 209210969 U CN209210969 U CN 209210969U
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China
Prior art keywords
sensor
fixed
monocrystalline silicon
welded
rotation
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Expired - Fee Related
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CN201822199473.5U
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Chinese (zh)
Inventor
郑志霞
陈越
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Putian University
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Putian University
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Abstract

The utility model discloses a kind of sensor monocrystalline silicon etching devices, including sensor body, the inside top of the sensor body is welded with adapter, the lower end of adapter is welded with absolute pressure sensor, the lower end of absolute pressure sensor is welded with overload diaphragm, the lower surface of sensor body is fixed with etching mechanism, and the other side of sensor body and the upper surface of etching mechanism are fixed with cleaning mechanism;Shaft rotation is driven by the rotation of threephase asynchronous machine, the rotation of central axis is driven by the rotation of shaft, pass through the fixed flabellum of central axis lateral wall, flabellum rotation is driven by the rotation of central axis, air-breathing is carried out to suction hole by flabellum, measurement gas is subjected to sucking transmission, the impurity in air entry is filtered by filter screen by exhaust outlet, by the gas transport of filtering into process flange, it cannot result in blockage to reach process flange, the problem of solving generation deposit, forming blind area.

Description

A kind of sensor monocrystalline silicon etching device
Technical field
The utility model belongs to the processing unit (plant) technical field of sensor monocrystalline silicon, and in particular to a kind of sensor monocrystalline Silicon etching device.
Background technique
Sensor module uses full welding technique, and inside possesses the overload diaphragm an of integration, a pressure sensor With a temperature sensor, reference value of the temperature sensor as temperature-compensating, the positive pressure side and sensor film of pressure sensor The high pressure chest of box is connected, and the suction side of sensor is connected with the low pressure chamber of sensor bellows, and pressure passes through isolation diaphragm and filling Liquid passes to the silicon chip in sensor, and the resistance value of the chip of pressure sensor is made to change, defeated so as to cause detection system Voltage change out, the output voltage is directly proportional to pressure change, then is converted to a normalized signal by adaptation unit and amplifier Output.
Existing technology has the following problems:
1, original sensor body is because installing not pair or having remaining liquid in filling liquid Guan Liyou survival gas or gas tube, Cause to be easy to produce deposit in transmitter process flange, forms blind area;
2, in use for a long time a certain amount of offset can occur for original horse, and etching effect is caused to be deteriorated.
Utility model content
To solve the problems mentioned above in the background art.The utility model provides a kind of sensor monocrystalline silicon etching dress It sets, has the characteristics that monocrystalline silicon etching and flange cleaning.
To achieve the above object, the utility model provides the following technical solutions: a kind of sensor monocrystalline silicon etching device, packet Sensor body is included, the inside top of the sensor body is welded with adapter, and the lower end of adapter is welded with absolute pressure sensing Device, the lower end of absolute pressure sensor are welded with overload diaphragm, and the lower surface of sensor body is fixed with etching mechanism, sensor body The other side and etching mechanism upper surface be fixed with cleaning mechanism, cleaning mechanism includes cleaning box, fixed frame, phase asynchronous electricity Machine, shaft, central axis, flabellum, air entry, filter screen and exhaust outlet, wherein the inner sidewall of cleaning mechanism is fixed with cleaning box, The inside top of cleaning box is welded with fixed frame, and the inner sidewall of fixed frame is fixed with threephase asynchronous machine, threephase asynchronous machine Lower surface rotation has a shaft, and the lower surface of shaft is fixed with central axis, and the lateral wall of central axis is fixed with flabellum, under cleaning box Surface is integrally formed with air entry, and the side of cleaning box is integrally formed with exhaust outlet.
As the optimal technical scheme of the utility model, the front surface rotation of the adapter has display screen.
As the optimal technical scheme of the utility model, the lower end center weld of the absolute pressure sensor has temperature sensing Device.
As the optimal technical scheme of the utility model, the lower surface of the absolute pressure sensor is fixed with process flange.
As the optimal technical scheme of the utility model, the rear surface of the sensor body is integrally formed with exhaust valve.
As the optimal technical scheme of the utility model, the etching mechanism include compression pump, gas cylinder, reaction chamber, it is micro- plus Work workbench, heating tube and vacuum pump, wherein the inner sidewall for etching mechanism is fixed with compression pump, and the side of compression pump is plugged with Gas cylinder, the other side of gas cylinder are plugged with reaction chamber, and reaction chamber inner sidewall is fixed with micro Process workbench, the top of micro Process workbench Portion's inside thread has heating tube, and the other side of reaction chamber is plugged with vacuum pump.
As the optimal technical scheme of the utility model, a kind of sensor monocrystalline silicon etching dress according to claim It sets, it is characterised in that: the inner sidewall screw thread of the air entry has filter screen.
Compared with prior art, the utility model has the beneficial effects that
1, the utility model, first will reaction by vacuum pump by being put into monocrystalline silicon in the micro Process platform inside reaction chamber Air in room is drained, and extraneous gas is carried out absorption compression by compression pump, compressed gas is transferred in gas cylinder, by adding Heat pipe heats reaction chamber, when monocrystalline silicon reaches fusing point, processing is performed etching by micro Process workbench, when processing At when reaction chamber arrive by compressed gas transmission again carry out qi of chong channel ascending adversely cooling, thus solve work long hours cause it is a certain amount of inclined The problem of moving, etching effect caused to be deteriorated;
2, the utility model is equipped with cleaning box by the sensor body other side, is equipped with phase asynchronous electricity inside cleaning box Machine drives shaft rotation by the rotation of threephase asynchronous machine, the rotation of central axis is driven by the rotation of shaft, passes through center Axis lateral wall fixes flabellum, drives flabellum rotation by the rotation of central axis, carries out air-breathing to air entry by flabellum, will measure Gas carries out sucking transmission, is filtered the impurity in air entry by filter screen, is passed the gas of filtering by exhaust outlet It is defeated into process flange, so that reaching process flange cannot result in blockage, solve generation deposit, form asking for blind area Topic.
Detailed description of the invention
Attached drawing is used to provide a further understanding of the present invention, and constitutes part of specification, practical with this Novel embodiment is used to explain the utility model together, does not constitute limitations of the present invention.In the accompanying drawings:
Fig. 1 is the sensor body front view and etching mechanism front view structural representation of the utility model;
Fig. 2 is sensor body the side view figure structure schematic representation of the utility model;
Fig. 3 is the cleaning mechanism structural schematic diagram in Fig. 1 of the utility model;
In figure: 1, sensor body;2, adapter;3, display screen;4, absolute pressure sensor;5, temperature sensor;6, process Flange;7, diaphragm is overloaded;8, exhaust valve;9, mechanism is etched;91, compression pump;92, gas cylinder;93, reaction chamber;94, micro Process works Platform;95, heating tube;96, vacuum pump;10, cleaning mechanism;101, cleaning box;102, fixed frame;103, threephase asynchronous machine; 104, shaft;105, central axis;106, flabellum;107, air entry;108, filter screen;109, exhaust outlet.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work Every other embodiment obtained, fall within the protection scope of the utility model.
Embodiment
Please refer to Fig. 1-3, the utility model the following technical schemes are provided: a kind of sensor monocrystalline silicon etching device, including Sensor body 1, the inside top of sensor body 1 are welded with adapter 2, and adapter 2 is welded and fixed with sensor body 1, The lower end of adapter 2 is welded with absolute pressure sensor 4, and absolute pressure sensor 4 is welded and fixed with adapter 2, the lower end of absolute pressure sensor 4 It is welded with overload diaphragm 7, overload diaphragm 7 is welded and fixed with absolute pressure sensor 4, and the lower surface of sensor body 1 is fixed with etching Mechanism 9, etching mechanism 9 are fixedly connected with sensor body 1, and the other side of sensor body 1 and the upper surface of etching mechanism 9 are solid Surely there is cleaning mechanism 10, cleaning mechanism 10 is fixedly connected with sensor body 1 and etching mechanism 9, and cleaning mechanism 10 includes cleaning Case 101, fixed frame 102, threephase asynchronous machine 103, shaft 104, central axis 105, flabellum 106, air entry 107, filter screen 108 With exhaust outlet 109, wherein the inner sidewall of cleaning mechanism 10 is fixed with cleaning box 101, and cleaning box 101 and cleaning mechanism 10 are fixed Connection, the inside top of cleaning box 101 are welded with fixed frame 102, and fixed frame 102 is welded and fixed with cleaning box 101, fixed frame 102 inner sidewall is fixed with threephase asynchronous machine 103, and threephase asynchronous machine 103 is fixedly connected with fixed frame 102, phase asynchronous The lower surface rotation of motor 103 has shaft 104, and shaft 104 and threephase asynchronous machine 103 are rotatablely connected, the lower surface of shaft 104 It is fixed with central axis 105, central axis 105 is fixedly connected with shaft 104, and the lateral wall of central axis 105 is fixed with flabellum 106, fan Leaf 106 is fixedly connected with central axis 105, and the lower surface of cleaning box 101 is integrally formed with air entry 107, air entry 107 and cleaning Case 101 is integrally formed, the side of cleaning box 101 integrally formed with exhaust outlet 109, exhaust outlet 109 and 101 one of cleaning box at Type.
With the aid of the technical scheme, adapter 2 is by showing that measurement numerical value is by display screen 3 for the gas of acquisition It is no exceeded, pressure is transmitted into absolute pressure sensor 4 by the measurement pressure of absolute pressure sensor 4 by overload diaphragm 7, is passed by temperature Whether the measurement temperature height of sensor 5 is up to standard, when the measurement is finished, prevents process flange 6 from being blocked, will by process flange 6 Liquid or gas carry out transmission measurement, discharge it gas or liquid by exhaust valve 8.
In addition, in the present embodiment, have for display screen 3 for the rotation of the front surface of above-mentioned adapter 2, display screen 3 with Adapter 2 is rotatablely connected;Show whether measurement numerical value is exceeded by display screen 3 using the program.
In addition, in the present embodiment, have for temperature sensor 5 for the lower end center weld of above-mentioned absolute pressure sensor 4, Temperature sensor 5 is welded and fixed with absolute pressure sensor 4;Pressure is measured by absolute pressure sensor 4 using the program, is passed by temperature Whether sensor 5 measures temperature height up to standard.
In addition, in the present embodiment, being fixed with for process flange 6 for the lower surface of above-mentioned absolute pressure sensor 4, process Flange 6 is fixedly connected with absolute pressure sensor 4;Liquid or gas are carried out by process flange 6 by transmission measurement using the program.
In addition, in the present embodiment, for the rear surface of the sensor ontology 1 is integrally formed with exhaust valve 8, row Air valve 8 and sensor body 1 are integrally formed;When the measurement is finished using the program, it is discharged it by exhaust valve 8.
In addition, in the present embodiment, for above-mentioned etching mechanism 9 include compression pump 91, gas cylinder 92, reaction chamber 93, it is micro- plus Work workbench 94, heating tube 95 and vacuum pump 96, wherein the inner sidewall of etching mechanism 9 is fixed with compression pump 91, compression pump 91 Mechanism 9 is fixedly connected with etching, and the side of compression pump 91 is plugged with gas cylinder 92, and gas cylinder 92 is plugged and fixed with compression pump 91, gas cylinder 92 other side is plugged with reaction chamber 93, and reaction chamber 93 is plugged and fixed with gas cylinder 92, and 93 inner sidewall of reaction chamber is fixed with micro Process Workbench 94, micro Process workbench 94 are fixedly connected with reaction chamber 93, and the inside top screw thread of micro Process workbench 94 has heating Pipe 95, heating tube 95 are threadedly coupled with micro Process workbench 94, and the other side of reaction chamber 93 is plugged with for vacuum pump 96, vacuum Pump 96 is plugged and fixed with reaction chamber 93;Work is performed etching to monocrystalline silicon by etching mechanism 9 using the program.
In addition, in the present embodiment, having for filter screen 108 for the inner sidewall screw thread of above-mentioned air entry 107, filter screen 108 are threadedly coupled with air entry 107;The impurity in air entry is filtered by filter screen 108 using the program.
In conclusion adapter 2 passes through the gas that will be acquired by showing by means of the above-mentioned technical proposal of the utility model Whether display screen 3 is exceeded to show measurement numerical value, transmits pressure into absolute pressure sensor 4 by absolute pressure sensing by overload diaphragm 7 Device 4 measure pressure, by temperature sensor 5 measure temperature height it is whether up to standard, when the measurement is finished, prevent process flange 6 into Liquid or gas are carried out transmission measurement by process flange 6, discharge it gas or liquid by exhaust valve 8, lead to by row blocking It crosses in the micro Process platform that monocrystalline silicon is put into inside reaction chamber 93, is first drained the air in reaction chamber by vacuum pump 96, lead to Extraneous gas is carried out absorption compression by overcompression pump 91, and compressed gas is transferred in gas cylinder 92, is reacted by 95 on tos on to of heating tube Room 93 is heated, and when monocrystalline silicon reaches fusing point, is performed etching processing by micro Process workbench 94, is led to when processing is completed Overcompression gas transport arrives reaction chamber again and carries out qi of chong channel ascending adversely cooling, leads to a certain amount of offset to solve and work long hours, makes The problem of being deteriorated at etching effect is equipped with cleaning box 101 by 1 other side of sensor body, is equipped with three-phase inside cleaning box 101 Asynchronous machine 103 drives shaft 104 to rotate by the rotation of threephase asynchronous machine 103, by the rotation drive of shaft 104 The rotation of mandrel 105 drives 106 turns of flabellum by the rotation of central axis 105 by the fixed flabellum 106 of 105 lateral wall of central axis It is dynamic, air-breathing is carried out to air entry 107 by flabellum 106, measurement gas is subjected to sucking transmission, by filter screen 108 by air-breathing Impurity in mouthfuls 107 is filtered, by exhaust outlet 109 by the gas transport of filtering into process flange 6, to reach process The problem of flange 6 cannot result in blockage, and solve generation deposit, form blind area.
Finally, it should be noted that the above descriptions are merely preferred embodiments of the present invention, it is not limited to this Utility model, although the utility model is described in detail with reference to the foregoing embodiments, for those skilled in the art For, it is still possible to modify the technical solutions described in the foregoing embodiments, or to part of technical characteristic It is equivalently replaced.Within the spirit and principle of the utility model, any modification, equivalent replacement, improvement and so on, It should be included within the scope of protection of this utility model.

Claims (7)

1. a kind of sensor monocrystalline silicon etching device, including sensor body (1), it is characterised in that: the sensor body (1) Inside top be welded with adapter (2), the lower end of adapter (2) is welded with absolute pressure sensor (4), absolute pressure sensor (4) Lower end is welded with overload diaphragm (7), and the lower surface of sensor body (1) is fixed with etching mechanism (9), sensor body (1) The other side and the upper surface of etching mechanism (9) are fixed with cleaning mechanism (10), and cleaning mechanism (10) includes cleaning box (101), consolidates Determine frame (102), threephase asynchronous machine (103), shaft (104), central axis (105), flabellum (106), air entry (107), filtering Net (108) and exhaust outlet (109), wherein the inner sidewall of cleaning mechanism (10) is fixed with cleaning box (101), cleaning box (101) Inside top is welded with fixed frame (102), and the inner sidewall of fixed frame (102) is fixed with threephase asynchronous machine (103), phase asynchronous The lower surface rotation of motor (103) has shaft (104), and the lower surface of shaft (104) is fixed with central axis (105), central axis (105) lateral wall is fixed with flabellum (106), and the lower surface of cleaning box (101) is integrally formed with air entry (107), cleaning box (101) side is integrally formed with exhaust outlet (109).
2. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the adapter (2) Front surface rotation has display screen (3).
3. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the absolute pressure sensor (4) lower end center weld has temperature sensor (5).
4. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the absolute pressure sensor (4) lower surface is fixed with process flange (6).
5. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the sensor body (1) rear surface is integrally formed with exhaust valve (8).
6. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the etching mechanism (9) Including compression pump (91), gas cylinder (92), reaction chamber (93), micro Process workbench (94), heating tube (95) and vacuum pump (96), Wherein, the inner sidewall for etching mechanism (9) is fixed with compression pump (91), and the side of compression pump (91) is plugged with gas cylinder (92), gas cylinder (92) the other side is plugged with reaction chamber (93), and reaction chamber (93) inner sidewall is fixed with micro Process workbench (94), micro Process work The inside top screw thread for making platform (94) has heating tube (95), and the other side of reaction chamber (93) is plugged with vacuum pump (96).
7. a kind of sensor monocrystalline silicon etching device according to claim 1, it is characterised in that: the air entry (107) Inner sidewall screw thread have filter screen (108).
CN201822199473.5U 2018-12-26 2018-12-26 A kind of sensor monocrystalline silicon etching device Expired - Fee Related CN209210969U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201822199473.5U CN209210969U (en) 2018-12-26 2018-12-26 A kind of sensor monocrystalline silicon etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201822199473.5U CN209210969U (en) 2018-12-26 2018-12-26 A kind of sensor monocrystalline silicon etching device

Publications (1)

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CN209210969U true CN209210969U (en) 2019-08-06

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022057325A1 (en) * 2020-09-16 2022-03-24 长鑫存储技术有限公司 Temperature control method and apparatus for etching working platform, and electronic device and storage medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022057325A1 (en) * 2020-09-16 2022-03-24 长鑫存储技术有限公司 Temperature control method and apparatus for etching working platform, and electronic device and storage medium
US11915952B2 (en) 2020-09-16 2024-02-27 Changxin Memory Technologies, Inc. Temperature control method, apparatus, electronic device and storage medium for etching workbench

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Granted publication date: 20190806

Termination date: 20191226