CN209114023U - A kind of electroplating pool anode current baffle arrangement - Google Patents
A kind of electroplating pool anode current baffle arrangement Download PDFInfo
- Publication number
- CN209114023U CN209114023U CN201821790733.XU CN201821790733U CN209114023U CN 209114023 U CN209114023 U CN 209114023U CN 201821790733 U CN201821790733 U CN 201821790733U CN 209114023 U CN209114023 U CN 209114023U
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- China
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- electric current
- baffle
- electroplating pool
- current baffle
- plating
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Abstract
The utility model relates to a kind of electroplating pool anode current baffle arrangements；It is characterized by comprising electric current baffle and electric current baffle plate setting is between plating rack and galvanic anode；The both ends of the electric current baffle are erected on electroplating pool, and the bottom end of the electric current baffle extends to the one third in the electroplate liquid of electroplating pool and being no more than electroplate liquid depth；An electric current baffle arrangement is arranged in later period in the utility model in plating between plating rack and galvanic anode, so that the electric current that galvanic anode generates strikes on electric current baffle, reduces the electric current that galvanic anode generates and punctures injury caused by the plated item on plating rack；The discharge column being arranged on electric current baffle reduces galvanic anode electric current and sends out Jiao Xianxiang to the jaundice that the phase generates after plating of the plated item on plating rack using point effect.
Description
Technical field
The utility model relates to field of electroplating more particularly to a kind of electroplating pool anode current baffle arrangements.
Background technique
General electroplating pool when close to the plating later period, the plating in electroplating pool consumes a large amount of plating block, plating
In the later period that pond terminates in plating, the region of the plating following one third of liquid level, which is easy to produce a large amount of electric current, to cause on plating rack
Plated item is easy breakdown；Therefore, the breakdown needs of the plated item of upper section add on phase plating rack after plating in order to prevent
Add baffle equipment, the breakdown for reducing electric current guarantees the quality of product.
Utility model content
The technical problem to be solved by the present invention is to provide a kind of electroplating pool anode current baffle arrangements, are able to solve
The problem of general electroplating pool the phenomenon that upper section is easy to produce electric current breakdown on phase plating rack after plating.
In order to solve the above technical problems, the technical solution of the utility model are as follows: a kind of electroplating pool anode current baffle knot
Structure, including electroplating pool, plating rack and galvanic anode；The two sides of electroplating pool are arranged in galvanic anode, and plating is provided on plating rack
Part is placed in the middle position of electroplating pool, is provided with electroplate liquid in electroplating pool；Its innovative point is: including electric current baffle and electric current is kept off
Plate is arranged between plating rack and galvanic anode；The both ends of the electric current baffle are erected on electroplating pool, the electric current baffle
Bottom end extends to the one third in the electroplate liquid of electroplating pool and being no more than electroplate liquid depth；
The electric current baffle includes hanging rod, baffle frame and electric current baffle；The hanging rod along electroplating pool extending direction
Across the top in electroplating pool, the baffle frame is in rectangular configuration, and the top of baffle frame is provided with the extension with hanging rod cooperation
Pawl, baffle frame extend in electroplating pool, and the electric current baffle is set in qually spaced on baffle frame；It is set on the electric current baffle
It is equipped with the discharge column of the gap bending between electric current baffle；The discharge column blocks between the gap of adjacent current baffle.
Further, spacing is no more than 20mm between the adjacent electric current baffle.
Utility model has the advantages that
1) an electric current baffle arrangement is arranged in the later period in the utility model in plating between plating rack and galvanic anode, makes
It obtains the electric current that galvanic anode generates to strike on electric current baffle, reduces the electric current of galvanic anode generation to the plated item on plating rack
Caused by puncture injury；The discharge column being arranged on electric current baffle reduces galvanic anode electric current on plating rack using point effect
Plated item after plating the phase generate jaundice send out Jiao Xianxiang.
Detailed description of the invention
Utility model will be further described in detail below with reference to the attached drawings and specific embodiments.
Fig. 1 is a kind of electroplating pool anode current baffle arrangement assembling front view of the utility model.
Fig. 2 is a kind of electroplating pool anode current baffle arrangement device side view of the utility model.
Specific embodiment
The following examples can make professional and technical personnel that the utility model be more fully understood, but therefore will not
The utility model is limited among the embodiment described range.
Such as a kind of Fig. 1 electroplating pool anode current baffle arrangement shown in Fig. 2, including electroplating pool 1, plating rack 2 and plating
Anode 3；The two sides of electroplating pool 1 are arranged in galvanic anode 3, and the interposition that plated item is placed in electroplating pool 1 is provided on plating rack 2
It sets, is provided with electroplate liquid in electroplating pool 1；Including electric current baffle 4 and the setting of electric current baffle 4 plating rack 2 and galvanic anode 3 it
Between；The both ends of the electric current baffle 4 are erected on electroplating pool 1, and the bottom end of the electric current baffle 4 extends to the plating of electroplating pool 1
One third in liquid and no more than electroplate liquid depth.
Electric current baffle 4 includes hanging rod 41, baffle frame 42 and electric current baffle 43；The prolonging along electroplating pool 1 of hanging rod 41
Direction is stretched across the top in electroplating pool 1, and the baffle frame 42 is in rectangular configuration, and the top of baffle frame 42 is provided with and hangs
The extension pawl that bar 41 cooperates, baffle frame 42 extend in electroplating pool 1, and the electric current baffle 43 is set in qually spaced in baffle frame 42
On；The discharge column 44 of the gap bending between electric current baffle 43 is provided on the electric current baffle 43；The discharge column 44 blocks
Between the gap of adjacent current baffle 43.
Spacing is no more than 20mm between adjacent electric current baffle 43.
It should be understood by those skilled in the art that the present utility model is not limited to the above embodiments, above-described embodiment and
Only illustrate the principles of the present invention described in specification, on the premise of not departing from the spirit and scope of the utility model,
The utility model also has various changes and improvements, these changes and improvements both fall within the scope of the claimed invention
It is interior.The protection scope of the present invention is defined by the appended claims and their equivalents.
Claims (2)
1. a kind of electroplating pool anode current baffle arrangement, including electroplating pool, plating rack and galvanic anode；Galvanic anode setting exists
The two sides of electroplating pool are provided with the middle position that plated item is placed in electroplating pool on plating rack, are provided with electroplate liquid in electroplating pool；Its
Be characterized in that: including electric current baffle and electric current baffle plate setting is between plating rack and galvanic anode；The both ends of the electric current baffle
It is erected on electroplating pool, the bottom end of the electric current baffle extends in the electroplate liquid of electroplating pool and is no more than the three of electroplate liquid depth
/ mono-；
The electric current baffle includes hanging rod, baffle frame and electric current baffle；The hanging rod along electroplating pool extending direction across
In the top of electroplating pool, the baffle frame is in rectangular configuration, and the top of baffle frame is provided with the extension pawl with hanging rod cooperation, gear
Stream frame extends in electroplating pool, and the electric current baffle is set in qually spaced on baffle frame；It is provided on the electric current baffle
To the discharge column of gap bending between electric current baffle；The discharge column blocks between the gap of adjacent current baffle.
2. a kind of electroplating pool anode current baffle arrangement according to claim 1, it is characterised in that: the adjacent electricity
It flows spacing between baffle and is no more than 20mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821790733.XU CN209114023U (en) | 2018-11-01 | 2018-11-01 | A kind of electroplating pool anode current baffle arrangement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821790733.XU CN209114023U (en) | 2018-11-01 | 2018-11-01 | A kind of electroplating pool anode current baffle arrangement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209114023U true CN209114023U (en) | 2019-07-16 |
Family
ID=67203371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821790733.XU Active CN209114023U (en) | 2018-11-01 | 2018-11-01 | A kind of electroplating pool anode current baffle arrangement |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209114023U (en) |
-
2018
- 2018-11-01 CN CN201821790733.XU patent/CN209114023U/en active Active
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