CN209103707U - One kind is non-to lead mirror surface anti-fingerprint display panel - Google Patents
One kind is non-to lead mirror surface anti-fingerprint display panel Download PDFInfo
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- CN209103707U CN209103707U CN201822032342.8U CN201822032342U CN209103707U CN 209103707 U CN209103707 U CN 209103707U CN 201822032342 U CN201822032342 U CN 201822032342U CN 209103707 U CN209103707 U CN 209103707U
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- 230000003666 anti-fingerprint Effects 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 51
- 229910019714 Nb2O3 Inorganic materials 0.000 claims abstract description 21
- 239000011521 glass Substances 0.000 claims abstract description 19
- 239000012528 membrane Substances 0.000 claims abstract description 16
- 238000004544 sputter deposition Methods 0.000 claims description 36
- 238000005516 engineering process Methods 0.000 claims description 21
- 239000007789 gas Substances 0.000 claims description 21
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 21
- 238000004062 sedimentation Methods 0.000 claims description 21
- 239000012495 reaction gas Substances 0.000 claims description 18
- 239000003344 environmental pollutant Substances 0.000 abstract description 3
- 230000002209 hydrophobic effect Effects 0.000 abstract description 3
- 231100000719 pollutant Toxicity 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 240000002853 Nelumbo nucifera Species 0.000 description 1
- 235000006508 Nelumbo nucifera Nutrition 0.000 description 1
- 235000006510 Nelumbo pentapetala Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001550 time effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
Non- mirror surface anti-fingerprint display panel is led the utility model discloses a kind of, including electronic glass substrate and the overlaying function membrane system of glass substrate surface is set, the overlaying function membrane system includes according to first and second layer of Nb2O3 film layer of glass substrate surface, third and fourth layer of SIO2 film layer, five, the six layers of Nb2O3 film layer, the seven, the eight layers of SIO2 film layer, the nine, the ten layers of Nb2O3 film layer, eleventh floor SIO2 film layer, Floor 12 AF film layer.The utility model is by being superimposed SIO2 and AF nano-level thin-membrane layer on non-mirror surface display panel functional film system surface of leading, glass panel surface tension is set to be preferably minimized value, pollutant and panel surface contact area reduce 90%, make it have stronger hydrophobic, oil rub resistance, anti-fingerprint ability.To make non-mirror surface panel surface of leading keep bright and clean beautiful effect for a long time.The i.e. smooth feel of smooth degree of touch display panel is also improved simultaneously.
Description
Technical field
The utility model relates to electronic display technology field, more particularly to a kind of non-lead mirror surface anti-fingerprint display panel.
Background technique
Mirror surface display screen has initially entered people's lives and work at present, difficult as intelligent touch display screen panel
Exempt from screen picture clarity can be made to decline, especially as Mirror Surface Television, mirror surface teaching machine, mirror surface meeting by the pollution of finger-marks
View machine and intelligent touch display panel are easy to be covered by finger-marks, seriously affect video visual effect, touch to make to touch
Control panel can keep clean for a long time, be inspired by the non-sticky water principle of lotus leaf, in intelligent touch mirror surface display panel functional film system table
One layer of anti-fingerprint membrane system layer of superposition is arranged in face again, and panel surface tension is made to be preferably minimized value, has hydrophobic property, oil rub resistance, prevents
Fingerprint performance, therefore a kind of non-mirror surface anti-fingerprint display panel of leading comes into being.
Summary of the invention
Purpose of the utility model is to solve disadvantages existing in the prior art, and the non-mirror surface of leading of the one kind proposed is prevented
Fingerprint display panel.
To achieve the goals above, the utility model adopts the technical scheme that
One kind is non-to lead mirror surface anti-fingerprint display panel, and including electronic glass substrate and glass substrate surface setting is arranged in
Functional film system and the anti-fingerprint membrane system that the superposition of functional film system level is set, which is characterized in that the functional film system is according to glass table
Face first and second layer of Nb2O3 film layer from inside to outside, third and fourth layer of SIO2 film layer, the five, the six layers of Nb2O3 film layer,
Seven, eight layers of SIO2 film layer, the nine, the ten layers of Nb2O3 film layer, the anti-fingerprint film layer of the functional film system level superposition is according to function
Energy membrane system level first layer SIO2 film layer, second layer AF film layer.
Further, first and second layer of 1.2Nb2O3 film layer of the functional film system, using MF reactive magnetron sputtering technology,
Sputtering work is 28KW, and sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 54 μm, sputters reaction gas
02 flow 150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
Further, third and fourth 3.4 SIO2 film layer of layer of the functional film system, using MF reactive magnetron sputtering technology,
Sputtering work is 22KW, and sputtering sedimentation sputters working gas Ar flow 150ml/min with a thickness of 36 μm, sputters reaction gas
02 flow 200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
Further, the five, the six layers of 5.6Nb2O3 film layer of the functional film system, using MF reactive magnetron sputtering technology,
Sputtering work is 20KW, and sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 32 μm, sputters reaction gas
02 flow 150ml/min, 240 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
Further, the seven, the eight layers of 7.8SIO2 film layer of the functional film system are splashed using MF reactive magnetron sputtering technology
Penetrating work is 18KW, and sputtering sedimentation sputters working gas Ar flow 150ml/min with a thickness of 31 μm, sputters reaction gas 02
Flow 200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
Further, the nine, the ten layer of 9.10 Nb2O3 film layer of the functional film system, using MF reactive magnetron sputtering skill
Art, sputtering work are 21KW, and sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 32 μm, sputters reaction gas
Body 02 flow 150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-
3Pa。
Further, the functional film system eleventh floor 11SIO2 film layer, using MF reactive magnetron sputtering technology, sputtering
Work is 12KW, and sputtering sedimentation sputters working gas Ar flow 150ml/min with a thickness of 22 μm, and sputtering reaction gas 02 flows
Measure 200ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
Further, the functional film system Floor 12 12AF film layer sputters work using MF reactive magnetron sputtering technology
Work is 48KW, and sputtering sedimentation sputters working gas Ar flow 220ml/min, splash 200 °C of substrate temperature, base with a thickness of 35 μm
Piece loading frame rate travel 1.2m/min, background vacuum 3X10-3PA.
Compared with prior art, the utility model proposes it is a kind of it is non-lead mirror surface anti-fingerprint display panel, having following has
Beneficial effect:
The utility model by it is non-lead mirror surface display panel functional film system surface be superimposed SIO2 and AF nano-level thin-membrane layer,
Glass panel surface tension is set to be preferably minimized value, pollutant and panel surface contact area reduce 90%, make it have stronger dredge
Water, oil rub resistance, anti-fingerprint ability.To make non-mirror surface panel surface of leading keep bright and clean beautiful effect for a long time.Simultaneously
Improve the i.e. smooth feel of smooth degree of touch display panel.
Detailed description of the invention
Fig. 1 be the utility model proposes the non-whole structural schematic diagram for leading mirror surface anti-fingerprint display panel of one kind.
In figure: 13 electronic glass substrates, 1-10 functional film system, 11-12 anti-fingerprint membrane system, 1-2 Nb2O3 film layer, SIO2
Film layer 3-4,5-6 Nb2O3 film layer, 7-8 SIO2 film layer, 9-10 Nb2O3 film layer, 11 SIO2 film layers, 12 AF
Film layer.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
In the description of the present invention, it should be understood that term " on ", "lower", "front", "rear", "left", "right",
The orientation or positional relationship of the instructions such as "top", "bottom", "inner", "outside" is to be based on the orientation or positional relationship shown in the drawings, and is only
For ease of description the utility model and simplify description, rather than the device or element of indication or suggestion meaning must have it is specific
Orientation, be constructed and operated in a specific orientation, therefore should not be understood as limiting the present invention.
Fig. 1 is please referred to, the non-mirror surface anti-fingerprint display panel, including electronic glass substrate and setting of leading of one kind is in glass substrate
The functional film system of surface setting and the anti-fingerprint membrane system that the superposition of functional film system level is set, which is characterized in that the functional membrane
System is according to glass surface first and second layer of Nb2O3 film layer from inside to outside, third and fourth layer of SIO2 film layer, the five, the six layers of Nb2O3
Film layer, the seven, the eight layers of SIO2 film layer, the nine, the ten layers of Nb2O3 film layer, the anti-fingerprint of the functional film system level superposition
Film layer is according to functional film system level first layer SIO2 film layer, second layer AF film layer.
It is equal to sputter work using MF reactive magnetron sputtering technology for first and second layer of 1.2Nb2O3 film layer of the functional film system
For 28KW, sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 54 μm, sputters 02 flow of reaction gas
150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
It is equal to sputter work using MF reactive magnetron sputtering technology for third and fourth 3.4 SIO2 film layer of layer of the functional film system
For 22KW, sputtering sedimentation sputters working gas Ar flow 150ml/min with a thickness of 36 μm, sputters 02 flow of reaction gas
200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
It is equal to sputter work using MF reactive magnetron sputtering technology for the five, the six layers of 5.6Nb2O3 film layer of the functional film system
For 20KW, sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 32 μm, sputters 02 flow of reaction gas
150ml/min, 240 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
It is equal to sputter work using MF reactive magnetron sputtering technology for the seven, the eight layers of 7.8SIO2 film layer of the functional film system
For 18KW, sputtering sedimentation sputters working gas Ar flow 150ml/min with a thickness of 31 μm, sputters 02 flow of reaction gas
200ml/min, 220 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
The nine, the ten layer of 9.10 Nb2O3 film layer of the functional film system sputters work using MF reactive magnetron sputtering technology
It is 21KW, sputtering sedimentation sputters working gas Ar flow 100ml/min with a thickness of 32 μm, sputters 02 flow of reaction gas
150ml/min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
The functional film system eleventh floor 11SIO2 film layer, using MF reactive magnetron sputtering technology, sputtering work is
12KW, sputtering sedimentation sputter working gas Ar flow 150ml/min with a thickness of 22 μm, sputter 02 flow 200ml/ of reaction gas
Min, 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
The functional film system Floor 12 12AF film layer, using MF reactive magnetron sputtering technology, sputtering work is
48KW, sputtering sedimentation sputter working gas Ar flow 220ml/min with a thickness of 35 μm, splash 200 °C of substrate temperature, substrate loads
Frame rate travel 1.2m/min, background vacuum 3X10-3PA.
In the utility model, in use, electronic glass substrate and the overlaying function membrane system of glass substrate surface is set, institute
Stating overlaying function membrane system includes according to first and second layer of Nb2O3 film layer of glass substrate surface, third and fourth layer of SIO2 film layer
Five, six layers of Nb2O3 film layer, the seven, the eight layers of SIO2 film layer, the nine, the ten layers of Nb2O3 film layer, eleventh floor SIO2 film
Layer, Floor 12 AF film layer.The utility model is by being superimposed SIO2 and AF on non-mirror surface display panel functional film system surface of leading
Nano-level thin-membrane layer, makes glass panel surface tension be preferably minimized value, and pollutant and panel surface contact area reduce 90%, make
It is with stronger hydrophobic, oil rub resistance, anti-fingerprint ability.To make non-mirror surface panel surface of leading keep bright and clean beautiful for a long time
Effect.The i.e. smooth feel of smooth degree of touch display panel is also improved simultaneously.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art,
It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired
Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.
Claims (8)
1. it is a kind of it is non-lead mirror surface anti-fingerprint display panel, including electronic glass substrate and the function of glass substrate surface setting is set
Energy membrane system and the anti-fingerprint membrane system that the superposition of functional film system level is set, which is characterized in that the functional film system is according to glass surface
First and second layer of Nb2O3 film layer from inside to outside, third and fourth layer of SIO2 film layer, the five, the six layers of Nb2O3 film layer, the 7th,
Eight layers of SIO2 film layer, the nine, the ten layers of Nb2O3 film layer, the anti-fingerprint film layer of the functional film system level superposition is according to functional membrane
It is level first layer SIO2 film layer, second layer AF film layer.
2. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
One, two layers of 1.2Nb2O3 film layer, using MF reactive magnetron sputtering technology, sputtering work is 28KW, sputtering sedimentation with a thickness of
54 μm, sputter working gas Ar flow 100ml/min, sputter 02 flow 150ml/min of reaction gas, 200 °C of substrate temperature, base
Piece loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
3. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Three, four layer of 3.4 SIO2 film layer, using MF reactive magnetron sputtering technology, sputtering work is 22KW, sputtering sedimentation with a thickness of
36 μm, sputter working gas Ar flow 150ml/min, sputter 02 flow 200ml/min of reaction gas, 220 °C of substrate temperature, base
Piece loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
4. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Five, six layers of 5.6Nb2O3 film layer, using MF reactive magnetron sputtering technology, sputtering work is 20KW, sputtering sedimentation with a thickness of
32 μm, sputter working gas Ar flow 100ml/min, sputter 02 flow 150ml/min of reaction gas, 240 °C of substrate temperature, base
Piece loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
5. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Seven, eight layers of 7.8SIO2 film layer, using MF reactive magnetron sputtering technology, sputtering work is 18KW, and sputtering sedimentation is with a thickness of 31
μm, sputter working gas Ar flow 150ml/min, sputter 02 flow 200ml/min of reaction gas, 220 °C of substrate temperature, substrate
Loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
6. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Nine, ten layer of 9.10 Nb2O3 film layer, using MF reactive magnetron sputtering technology, sputtering work is 21KW, sputtering sedimentation thickness
Be 32 μm, sputter working gas Ar flow 100ml/min, sputter 02 flow 150ml/min of reaction gas, 200 °C of substrate temperature,
Substrate loading frame rate travel 1.2m/min, background vacuum 3X10-3Pa.
7. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Eleventh floor 11SIO2 film layer, using MF reactive magnetron sputtering technology, sputtering work is 12KW, and sputtering sedimentation is with a thickness of 22 μ
M, sputter working gas Ar flow 150ml/min, sputter 02 flow 200ml/min of reaction gas, 200 °C of substrate temperature, substrate
Loading frame rate travel 1.2m/min, background vacuum 2X10-3Pa.
8. one kind according to claim 1 is non-to lead mirror surface anti-fingerprint display panel, which is characterized in that the functional film system
Floor 12 12AF film layer, using MF reactive magnetron sputtering technology, sputtering work is 48KW, sputtering sedimentation with a thickness of 35 μm,
Working gas Ar flow 220ml/min is sputtered, splashes 200 °C of substrate temperature, substrate loading frame rate travel 1.2m/min, background is true
Reciprocal of duty cycle 3X10-3PA.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822032342.8U CN209103707U (en) | 2018-12-05 | 2018-12-05 | One kind is non-to lead mirror surface anti-fingerprint display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822032342.8U CN209103707U (en) | 2018-12-05 | 2018-12-05 | One kind is non-to lead mirror surface anti-fingerprint display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN209103707U true CN209103707U (en) | 2019-07-12 |
Family
ID=67162475
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201822032342.8U Expired - Fee Related CN209103707U (en) | 2018-12-05 | 2018-12-05 | One kind is non-to lead mirror surface anti-fingerprint display panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN209103707U (en) |
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2018
- 2018-12-05 CN CN201822032342.8U patent/CN209103707U/en not_active Expired - Fee Related
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190712 |
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| CF01 | Termination of patent right due to non-payment of annual fee |