CN208995597U - The winding device of atomic layer deposition continous way double-sided coating - Google Patents
The winding device of atomic layer deposition continous way double-sided coating Download PDFInfo
- Publication number
- CN208995597U CN208995597U CN201821863927.8U CN201821863927U CN208995597U CN 208995597 U CN208995597 U CN 208995597U CN 201821863927 U CN201821863927 U CN 201821863927U CN 208995597 U CN208995597 U CN 208995597U
- Authority
- CN
- China
- Prior art keywords
- handling system
- gas handling
- area
- roller
- winding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004804 winding Methods 0.000 title claims abstract description 50
- 238000000231 atomic layer deposition Methods 0.000 title claims abstract description 41
- 239000011248 coating agent Substances 0.000 title claims abstract description 19
- 238000000576 coating method Methods 0.000 title claims abstract description 19
- 230000007704 transition Effects 0.000 claims abstract description 53
- 239000006247 magnetic powder Substances 0.000 claims description 20
- 238000002955 isolation Methods 0.000 claims description 10
- 238000007789 sealing Methods 0.000 claims description 9
- 230000005540 biological transmission Effects 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 abstract description 14
- 239000007789 gas Substances 0.000 description 67
- 239000010408 film Substances 0.000 description 18
- 239000002243 precursor Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 9
- 230000001360 synchronised effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 4
- 229910052744 lithium Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 208000035126 Facies Diseases 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010523 cascade reaction Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000011244 liquid electrolyte Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of winding devices of atomic layer deposition continous way double-sided coating, including cabinet, first area is disposed in cabinet, second area and third region, let off roll is provided in first area, First Transition roller, first gas handling system and primary heater, the second gas handling system is provided in second area, third is provided with wind-up roll in region, second transition roller, third gas handling system and secondary heater, let off roll and wind-up roll are respectively to unreel and wind base band, First Transition roller and the second transition roller are supported to the deflecting position to base band, first gas handling system, second gas handling system and third gas handling system include protruding into the intracorporal even tracheae of case, first area, gas outlet is provided on second area and the cabinet in third region.The utility model can be such that gas is uniformly distributed when being passed through in cabinet, to improve reaction efficiency, make atomic layer deposition more evenly by the way that even tracheae is arranged.
Description
Technical field
The utility model relates to technique for atomic layer deposition fields, more particularly to a kind of two-sided plating of atomic layer deposition continous way
The winding device of film.
Background technique
Atomic layer deposition (Atomic layer deposition, abbreviation ALD) is that one kind can be by substance with monatomic film
The method for being plated in substrate surface of form in layer.Atomic layer deposition and common chemical deposition have similarity.But in original
In sublayer deposition process, the chemical reaction of new one layer of atomic film is that directly preceding layer is associated therewith, and this mode makes every time
Reaction only deposits one layer of atom.
In recent years due to the preparation demand of nano-device, ALD has and more and more grinds gradually by the attention of industrial circle
Study carefully investment.ALD is inhaled using caused by precursor gas and matrix surface from limited reactions and collective surface generation chemical monolayer
Attached, reaction gas does not react with surface, so growth thickness can control in an angstrom grade, and uniformity is splendid.Therefore
ALD technique is gradually applied in environment and energy field, microelectronic field, catalytic field etc. in recent years.
ALD is a kind of to form the heavy of thin film from limiting surface saturated reaction by a series of under conditions of controllable-rate
Product technology, since it is easy to operate, has repeatability, deposition film uniform, so right and wrong are often with potential deposition technique.
The feature of ALD technique maximum is from the reaction of the surface of limitation, and surface reaction is made of two half-reactions from limitation, this makes
ALD is in terms of the film preparation by many advantages: 1) each circulate in the surface sedimentary facies of matrix with quantity material with before
Drive object gas number it is unrelated, as long as the dosage of predecessor be higher than saturated reaction, so ALD has good step coverage
And large area the thickness uniformity；2) thickness of film depends on cycle-index, so the available accurate control of thickness；3) before
Driving object is alternately to be passed through reaction chamber, can accurately control thin film composition, avoid the pollution of harmful substance；4) tandem reaction sequence
The film made is pin-free, and density is high.
With the development of social actual demand and ALD technique, ALD technique is shown in terms of large-area substrates and successive sedimentation
Huge application prospect is shown.Such as in field of solar energy, the Al of ALD technique manufacture2O3Passivation of the film as solar battery
Layer, can mention 20% or more for the efficiency of cells convert luminous energy.In flexible electronic field, the ALD film of Nano grade thickness
It can be effectively isolated water and oxygen around electronic device, to greatly improve the service life of flexible electronic device and reliable
Property.With technique for atomic layer deposition in anode material for lithium-ion batteries coated with uniform Al2O3,ZrO2Equal substances can increase material
The stability for expecting surface subtracts in the contact for not influencing to be effectively isolated positive electrode with electrolyte under the premise of ion-electron transmission
The decomposition of few electrolyte, to improve the chemical property of material；It, can be in lithium metal surface shape in terms of negative electrode of lithium ion battery
At one layer of effective inorganic or organic protective film, to avoid directly contacting and react for lithium metal and liquid electrolyte；In addition,
This layer of protective film also functions to the effective effect for inhibiting lithium metal dendritic growth, to improve the security performance of lithium battery.
In the prior art, although atomic layer deposition system can be realized the plated film of base band, but not can guarantee the tension of base band
With the uniformity of plated film, plated film precision is high.
Utility model content
The purpose of the utility model is to provide a kind of winding devices of atomic layer deposition continous way double-sided coating, to realize
The intermittent double-sided coating of base band completes large area atomic layer deposition, and improves the uniformity of plated film.
To achieve the above object, the utility model provides following scheme:
It is described the utility model discloses a kind of winding device of atomic layer deposition continous way double-sided coating, including cabinet
Be disposed with first area, second area and third region in cabinet, the second area pass through respectively isolation board with it is described
First area and the third region separate, and are provided with the through-hole passed through for base band on the isolation board, in the first area
It is provided with let off roll, First Transition roller, the first gas handling system and primary heater, is provided with the second air inlet in the second area
System is provided with wind-up roll, the second transition roller, third gas handling system and secondary heater in the third region, described to unreel
Roller and the wind-up roll are respectively to unreel and wind base band, and the First Transition roller and second transition roller are to base band
Deflecting position be supported, first gas handling system, second gas handling system and the third gas handling system include
Protrude into the intracorporal even tracheae of the case, on the cabinet of the first area, the second area and the third region
It is provided with gas outlet.
Preferably, first gas handling system, second gas handling system and the third gas handling system further include high temperature
Valve and sealing flange, the high-temperature valve are set to the outside of the cabinet and are connected to one end of the even tracheae, the even gas
Pipe is connect across the cabinet and by the sealing flange with the box sealing.
Preferably, the let off roll is connect with servo motor transmission is unreeled, it is described unreel to be provided on servo motor unreel
Magnetic powder cluth.
Preferably, the wind-up roll is connect with winding servo motor transmission, is provided with winding on the winding servo motor
Magnetic powder cluth.
Preferably, unwinding tension test roller is additionally provided on the cabinet of the first area, the third region
Winding tension test roller, the position of the unwinding tension test roller and winding tension test roller were additionally provided on the cabinet
Set adjustable, unwinding tension test roller and winding tension test roller are to be tensioned base band.
Preferably, the First Transition roller and second transition roller rotate synchronously.
Preferably, the First Transition roller and second transition roller are spaced setting on the length direction of the cabinet.
Preferably, the first area, the second area and the third region are from top to bottom set gradually, and described
One heater is set to the lower section of the First Transition roller, and the secondary heater is set to the top of second transition roller.
Preferably, first gas handling system, second gas handling system and the third gas handling system be respectively TMA into
Gas system, N2Gas handling system and H2O gas handling system.
The utility model achieves following technical effect compared with the existing technology:
First gas handling system, the second gas handling system and third gas handling system of the utility model include that protrude into case intracorporal
Even tracheae can be such that gas is uniformly distributed when being passed through in cabinet, to improve reaction efficiency, make atomic layer by the way that even tracheae is arranged
Deposition is more evenly；Unwinding system includes let off roll, unreels servo motor and unreel magnetic powder cluth, and winding system includes winding
Roller, winding servo motor and winding magnetic powder cluth, magnetic powder cluth are to transmit torque using magnetic powder according to electromagnetic principle, are led to
Cross the tensile force that control unreels magnetic powder cluth and winds the controllable base band of magnetic powder cluth；It is also set up on the cabinet of first area
There is unwinding tension to test roller, can further control the tensile force of base band.
Detailed description of the invention
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Needed in attached drawing be briefly described, it should be apparent that, the accompanying drawings in the following description is only the utility model
Some embodiments for those of ordinary skill in the art without creative efforts, can also be according to this
A little attached drawings obtain other attached drawings.
Fig. 1 is the structural schematic diagram of the winding device of the utility model atomic layer deposition continous way double-sided coating；
Fig. 2 is the partial structure diagram of the overlook direction of Fig. 1；
Fig. 3 is the structural schematic diagram of the first gas handling system；
Fig. 4 is the structural schematic diagram of unwinding system；
Fig. 5 is the structural schematic diagram of winding system；
Description of symbols: the first gas handling system of 1-；The second gas handling system of 2-；3- third gas handling system；4- unwinding system；
5- winding system；6- First Transition roller；The first gas outlet 7-；8- cabinet；The second gas outlet 9-；The second transition roller of 10-；11- is put
Roll up tension test roller；The first isolation board of 12-；The second isolation board of 13-；14- winding tension tests roller；15- heater；16- transition
Roller motor synchronous belt device；17- high-temperature valve；18- sealing flange；The even tracheae of 19-；20- unreels magnetic powder cluth；21-, which is unreeled, to be watched
Take motor；22- let off roll；23- winds magnetic powder cluth；24- winds servo motor；25- wind-up roll.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
The purpose of the utility model is to provide a kind of winding devices of atomic layer deposition continous way double-sided coating, to realize
The intermittent double-sided coating of base band completes large area atomic layer deposition, and improves the uniformity of plated film.
To keep the above objects, features, and advantages of the utility model more obvious and easy to understand, with reference to the accompanying drawing and have
Body embodiment is described in further detail the utility model.
As shown in Figs. 1-5, the present embodiment provides a kind of winding devices of atomic layer deposition continous way double-sided coating, including case
Body 8 and the first gas handling system 1 being integrated on cabinet 8, the second gas handling system 2, third gas handling system 3, unwinding system 4 and receipts
Volume system 5.
First area, second area and third region, second area is from top to bottom disposed in cabinet 8 to pass through respectively
First isolation board 12 and the second isolation board 13 separate with first area and third region, the first isolation board 12 and the second isolation board 13
On be provided with the through-hole passed through for base band.In the settable flexible wipers in the through hole, to limit the gas flowing of adjacent area.
First gas handling system 1 is to be passed through the first precursor gas into first area, and the second gas handling system 2 is to second
Inert gas is passed through in region, third gas handling system 3 is to be passed through the second precursor gas into third region.
In use, the first precursor gas and the second precursor gas are introduced between first area and third region, connect
Back and forth guide base band to pass through second area between first area and third region, make the serpentine-like winding of base band, the one of base band
End is connected with unwinding system 4, and the other end of base band is connected with winding system 5, and base band is made to move to winding system by unwinding system 4
System 5 simultaneously keeps being tensioned.
First gas handling system 1, the second gas handling system 2 and third gas handling system 3 include even tracheae 19, high-temperature valve 17 and sealing
Flange 18, high-temperature valve 17 are set to the outside of cabinet 8 and are connected to one end of even tracheae 19, and the other end of even tracheae 19 protrudes into case
Body 8, even tracheae 19 are tightly connected by sealing flange 18 and cabinet 8.Wherein, the first gas handling system 1,2 and of the second gas handling system
The even tracheae 19 of third gas handling system 3 is respectively protruding into first area, second area and third region, and along first area,
The length direction in two regions and third region extends.It is corresponding, on the cabinet 8 at first area, second area and third region
It is respectively arranged with the first gas outlet 7 and the second gas outlet 9, the first gas outlet 7 and the second gas outlet 9 can be connected with extraction sector,
Supplied gas discharge.It is evenly distributed with venthole on even tracheae 19, by the way that even tracheae 19 is arranged, gas can be made to be passed through in cabinet 8
When be uniformly distributed, to improve reaction efficiency, make atomic layer deposition more evenly.
Unwinding system 4 include let off roll 22, unreel servo motor 21 and unreel magnetic powder cluth 20, let off roll 22 with unreel
Servo motor 21 is sequentially connected, and unreels magnetic powder cluth 20 and is set to and unreels on servo motor 21.Winding system 5 includes wind-up roll
25, servo motor 24 and winding magnetic powder cluth 23 are wound, wind-up roll 25 and winding servo motor 24 are sequentially connected, and wind magnetic powder
Clutch 23 is set on winding servo motor 24.Magnetic powder cluth is to transmit torque using magnetic powder according to electromagnetic principle, is led to
Cross the tensile force that control unreels magnetic powder cluth 20 and winding magnetic powder cluth 23 can control base band.It unreels servo motor 21 and receives
Servo motor 24 is rolled up to control the revolving speed of let off roll 22 and wind-up roll 25, to control feeding and the rolling speed of base band.
Let off roll 22, First Transition roller 6 and heater 15 are provided in first area, third is provided with wind-up roll in region
25, the second transition roller 10 and heater 15, let off roll 22 and wind-up roll 25 are respectively to unreel and wind base band, First Transition roller
6 and second transition roller 10 be supported to the deflecting position to base band, heater 15 is corresponding region to be heated to reacting
Temperature.
Be loaded into cabinet 8 and after being heated to required treatment temperature by base band, by the first gas handling system 1, second into
Gas system 2 and third gas handling system 3 introduce the first precursor gas, inert gas and the second precursor gas.First precursor gas is inhaled
It is attached on base band surface to form monofilm, the base band discharged at let off roll 22 is moved downward and worn around after First Transition roller 6
Second area is crossed, base band is rinsed by the inert gas not reacted with the first precursor gas, removes volatile reaction product, the
The molecule of two precursor gas is reacted with the molecule of the first precursor gas, forms the film of the first precursor gas and the second precursor gas
Product.After base band bypasses the second transition roller 10, second area is moved upwards and again passed through, volatility is removed by inert gas
Reaction product, this is a reaction cycle.After several reaction cycles, atomic layer deposition thickness reaches required thickness in base band
Degree stops cyclic process and takes out base band.
In order to further control the tension of base band, in the present embodiment, unwinding tension is additionally provided on the cabinet 8 of first area
Roller 11 is tested, winding tension test roller 14 was additionally provided on the cabinet 8 in third region, unwinding tension tests roller 11 and winding
The position that power tests roller 14 is adjustable, and unwinding tension tests roller 11 and winding tension test roller 14 to be tensioned base band.
In order to enable First Transition roller 6 and the second transition roller 10 to rotate synchronously, the friction of base band and roller is avoided, to keep away
Exempt from the damage of film layer, the present embodiment is additionally provided with transition roller motor synchronous belt device 16, including transition roller motor and synchronous belt, mistake
Roller motor is crossed to drive synchronous belt to rotate, synchronous belt is sheathed on the edge of First Transition roller 6 and the second transition roller 10, to band
Dynamic First Transition roller 6 and the second transition roller 10 rotate synchronously.The set-up mode of synchronous belt is the conventional means of this field, herein not
It repeats again.
The effect of First Transition roller 6 and the second transition roller 10 is to provide support for the deflecting of base band, and distribution mode can root
It is selected according to actual needs.For example, second is passed down through after base band can be made to bypass two First Transition rollers 6 in first area
Region can also make base band around 6 rear steering of First Transition roller；It can make contour, second transition roller 10 of First Transition roller 6 etc.
Height can also make it not contour.In the present embodiment, First Transition roller 6 and the second transition roller 10 are spaced on the length direction of cabinet 8
Setting, and First Transition roller 6 is contour, the second transition roller 10 is contour.
The heater 15 of first area is preferably the lower section for being set to First Transition roller 6, and the heater 15 of second area is excellent
It is selected as being set to the top of the second transition roller 10, to make position of the heater 15 between base band, convenient near baseband
Temperature controlled, improve reaction efficiency.
In the present embodiment, the first gas handling system 1, the second gas handling system 2 and third gas handling system 3 are respectively TMA air inlet system
System, N2Gas handling system and H2O gas handling system, those skilled in the art can also be adjusted according to production needs.
It applies specific case in this specification to be expounded the principles of the present invention and embodiment, the above reality
The explanation for applying example is merely used to help understand the method and its core concept of the utility model；Meanwhile for the general of this field
Technical staff, based on the idea of the present invention, there will be changes in the specific implementation manner and application range.To sum up institute
It states, the content of the present specification should not be construed as a limitation of the present invention.
Claims (9)
1. a kind of winding device of atomic layer deposition continous way double-sided coating, which is characterized in that including cabinet, in the cabinet according to
Secondary to be provided with first area, second area and third region, the second area passes through isolation board and the first area respectively
Separate with the third region, is provided with the through-hole passed through for base band on the isolation board, is provided with and puts in the first area
Winding up roller, First Transition roller, the first gas handling system and primary heater are provided with the second gas handling system, institute in the second area
It states and is provided with wind-up roll, the second transition roller, third gas handling system and secondary heater in third region, the let off roll and described
Wind-up roll is respectively to unreel and wind base band, and the First Transition roller and second transition roller are to the deflecting position to base band
Set and be supported, first gas handling system, second gas handling system and the third gas handling system include protrude into it is described
Case intracorporal even tracheae is provided with out on the cabinet of the first area, the second area and the third region
Port.
2. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
One gas handling system, second gas handling system and the third gas handling system further include high-temperature valve and sealing flange, the high temperature
Valve is set to the outside of the cabinet and is connected to one end of the even tracheae, and the even tracheae passes through the cabinet and passes through institute
Sealing flange is stated to connect with the box sealing.
3. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described to put
Winding up roller is connect with servo motor transmission is unreeled, it is described unreel to be provided on servo motor unreel magnetic powder cluth.
4. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that the receipts
Winding up roller is connect with winding servo motor transmission, is provided with winding magnetic powder cluth on the winding servo motor.
5. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
It is additionally provided with unwinding tension test roller on the cabinet in one region, was additionally provided with receipts on the cabinet in the third region
Tension test roller is rolled up, the position that the unwinding tension test roller and the winding tension test roller is adjustable, and the unwinding tension is surveyed
Roller and winding tension test roller are tried to be tensioned base band.
6. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
One transition roller and second transition roller rotate synchronously.
7. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
One transition roller and second transition roller are spaced setting on the length direction of the cabinet.
8. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
One region, the second area and the third region are from top to bottom set gradually, and the primary heater is set to described
The lower section of one transition roller, the secondary heater are set to the top of second transition roller.
9. the winding device of atomic layer deposition continous way double-sided coating according to claim 1, which is characterized in that described
One gas handling system, second gas handling system and the third gas handling system are respectively TMA gas handling system, N2Gas handling system and H2O
Gas handling system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821863927.8U CN208995597U (en) | 2018-11-13 | 2018-11-13 | The winding device of atomic layer deposition continous way double-sided coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821863927.8U CN208995597U (en) | 2018-11-13 | 2018-11-13 | The winding device of atomic layer deposition continous way double-sided coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208995597U true CN208995597U (en) | 2019-06-18 |
Family
ID=66807630
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821863927.8U Active CN208995597U (en) | 2018-11-13 | 2018-11-13 | The winding device of atomic layer deposition continous way double-sided coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208995597U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109082648A (en) * | 2018-11-13 | 2018-12-25 | 北京工业大学 | The winding device of atomic layer deposition continous way double-sided coating |
-
2018
- 2018-11-13 CN CN201821863927.8U patent/CN208995597U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109082648A (en) * | 2018-11-13 | 2018-12-25 | 北京工业大学 | The winding device of atomic layer deposition continous way double-sided coating |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20240204162A1 (en) | Methods, systems, and compositions for the liquid-phase deposition of thin films onto the surface of battery electrodes | |
| CN101507022B (en) | Battery, electrode, and current collector used therefor | |
| CN105779968B (en) | A kind of quantum dot film preparation method | |
| CN103904357A (en) | Stretchable linear lithium ion battery and preparation method thereof | |
| CN109440126A (en) | A kind of pucherite photo-anode film and preparation method thereof | |
| CN208995597U (en) | The winding device of atomic layer deposition continous way double-sided coating | |
| US11746429B2 (en) | Method for decomposing water into H2 and O2 | |
| CN105655610A (en) | Ultrathin catalytic layer attached to anion exchange membrane, preparation and application thereof | |
| CN109411789A (en) | Roll-to-roll coating system for fuel cell membrane electrode preparation | |
| Riyanto et al. | A review of atomic layer deposition for high lithium-ion battery performance | |
| US20220149342A1 (en) | Solution-phase deposition of thin films on conversion anodes in lithium-ion batteries | |
| CN109082648A (en) | The winding device of atomic layer deposition continous way double-sided coating | |
| CN104616911A (en) | Preparation method of vertical carbon nanotube array/ metal oxide composite material | |
| CN106207147A (en) | A kind of two-dimensional nano-film lithium ion battery negative material and preparation method thereof | |
| CN208995596U (en) | A kind of winding device of the intermittent double-sided coating of atomic layer deposition | |
| CN110518224A (en) | A kind of preparation method of lithium ion battery carbon silicon anode material | |
| CN109295437B (en) | Winding device for atomic layer deposition intermittent double-sided coating and working method thereof | |
| Auer et al. | Optimized Design Principles for Silicon‐Coated Nanostructured Electrode Materials and their Application in High‐Capacity Lithium‐Ion Batteries | |
| CN207452250U (en) | Aerodynamic reaction device | |
| CN105908151B (en) | A kind of atomic layer deposition quantitative modeling method of nano thin-film | |
| CN104867696B (en) | CuO@NiCo for electrode of super capacitor2O4Nano material and preparation method thereof | |
| CN110042391A (en) | The nickel array approach of pucherite nano particle package based on anodic oxidation aluminium formwork | |
| CN108281288B (en) | A kind of quantum dot sensitized solar battery is to electrode and its preparation method and application | |
| CN105779974A (en) | Method for in-situ preparation of bismuth oxide film | |
| CN106601873B (en) | A kind of spin coating device for CZTS films and the method for preparing CZTS batteries |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20231113 Address after: Factory Building No. 4, 487 Chengdongxing Road, Tonglu County, Hangzhou City, Zhejiang Province, 311599 Patentee after: Zhejiang Qiyue Technology Co.,Ltd. Address before: 100 000 Pingle Garden Village, Chaoyang District, Beijing Patentee before: Beijing University of Technology |