CN208985973U - Gas nozzle structure - Google Patents
Gas nozzle structure Download PDFInfo
- Publication number
- CN208985973U CN208985973U CN201821527709.7U CN201821527709U CN208985973U CN 208985973 U CN208985973 U CN 208985973U CN 201821527709 U CN201821527709 U CN 201821527709U CN 208985973 U CN208985973 U CN 208985973U
- Authority
- CN
- China
- Prior art keywords
- gas nozzle
- opening
- top surface
- wafer cassette
- fixinig plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A kind of gas nozzle structure, it is made of metal, the circumferential surface of the gas nozzle is convexly equipped with a fixinig plate of larger outer diameter, on the fixinig plate there are several combined holes can pass through respectively for several bolts and its screw lock is incorporated on a platform, there is an air flue among the gas nozzle, the air flue one end extends to top surface and forms one first opening for being connected with the docking section of a wafer cassette, the other end then extends to circumferential surface and forms one second opening with for one air inlet pipe of connection or an escape pipe, and second opening is located at the lower section of the fixinig plate, the top surface of the gas nozzle is convexly equipped with section and is arc-shaped and in several ring convex ribs of concentric circles for abutting for the docking section with the wafer cassette；Wafer cassette can be made not have excessive height change by above structure, and will not also be stained with generated impurity in glutinous silicon wafer process.
Description
Technical field
The utility model relates to a kind of gas nozzle structure of wafer cassette air charging system, espespecially a kind of crystalline substance that can make to put thereon
Circle box do not have excessive height change and make mechanical arm transport wafer into and out of when do not have any influence, and also will not
It is stained with the gas nozzle structure of generated impurity in glutinous silicon wafer process.
Background technique
Refering to Figure 1, for a kind of structural schematic diagram of known wafer cassette air charging system, the wafer cassette air charging system 10
It is mainly set to for specific gas (such as dry air, nitrogen) to be charged into a wafer cassette 11 in a silicon wafer process equipment,
Make to remove or avoid wafer 12 to generate oxidation the moisture of the wafer 12 in the wafer cassette 11 in processing procedure or after processing procedure.The crystalline substance
Circle box air charging system 10 mainly comprising a platform 13 for carrying the wafer cassette 11, the platform 13 be equipped with several gas nozzles 14 for
It docks and is connected with the docking section 15 in the wafer cassette 11 respectively, which is rubber or silica gel material, and is distinguished
It is connected with several air inlet pipe 16 and several escape pipes 17, for for introducing gas into or exporting respectively.The docking of the wafer cassette 11
Portion 15 is an one-way valve structures, i.e., only inwardly can unidirectionally be filled with gas by outside or only gas can be discharged by inside is unidirectional outward
Body, this is known and common structure, and it is not the scope to be protected of this creation, therefore is only shown in a simple manner in schema
Meaning, practical detailed construction do not repeat still further, this conjunction is first chatted bright.
Please refer to shown in Fig. 1-Fig. 3, due to rubber or the gas nozzle of silica gel material 14 can be generated when bearing weight compared with
Big deflection, so the wafer cassette 11 will be with relative to the height of the platform 13 when the wafer cassette 11 is put thereon
The quantity of wafer 12 in the wafer cassette 11 change at any time, and its variable quantity is not also small, therefore works as the mechanical arm
18 when sending out or being sent into the wafer cassette 11 wafer 12, can not will accurately be placed in wafer 12 because of the variation of its height
It appropriate location in the wafer cassette 11 or accurately takes out.Such as shown in Fig. 2, when there is no wafer 12 in the wafer cassette 11,
Height H1 then between the wafer cassette 11 and platform 13 is larger, when the mechanical arm 18 as shown in Figure 3 sequentially transports wafer 12
When entering among the wafer cassette 11, the gas nozzle 14 will due to the weight of receiving increases compressive deformation, lead to the wafer cassette 11 and flat
Height H2 between platform 13 declines to a great extent；Conversely, when the wafer 12 in the wafer cassette 11 of fully loaded wafer 12 is gradually by the manipulator
When arm 18 transports, the height between the wafer cassette 11 and platform 13 can also be reduced due to elasticity raising because of the weight that gas nozzle 14 is born.
And so significantling change for height will seriously affect the transport disengaging of wafer 12 of mechanical arm 18 wafer cassette 11.Furthermore due to
The material of the known gas nozzle 14 is rubber or silica gel, therefore is very easy to be stained with and is sticked generated impurity (such as PI, PBO, carbon in journey
Equal particles), and this is stained with glutinous impurity and is also not easy to be blown off by the excessive air-flow that dissipates of the gas nozzle 14.
In view of this, this creator be in view of the above-mentioned problems, and deeply conceive, and actively research improvement have a fling at and develop and set
Count out this creation.
Utility model content
The main purpose of the utility model is that for easy in processing procedure present in known rubber or the gas nozzle of silica gel material
In so that wafer cassette is generated excessive height change and then influence the disengaging that mechanical arm transports wafer, and be easily stained with glutinous silicon wafer process
In generated impurity the problems such as, and provide a kind of gas nozzle structure.
To solve the above problems, the technical scheme adopted by the utility model is a kind of gas nozzle structure, the circumferential surface of the gas nozzle
Be convexly equipped with a fixinig plate of larger outer diameter, have on the fixinig plate several combined holes can pass through respectively for several bolts and by its spiral shell
Lock be incorporated on a platform, among the gas nozzle have an air flue, the air flue one end extend to top surface and formed one first opening can
For being connected with the docking section of a wafer cassette, the other end then extends to circumferential surface and forms one second opening with for connecting an air inlet
Pipe or an escape pipe, and second opening is located at the lower section of the fixinig plate, which is characterized in that the gas nozzle is made of metal, the gas
The top surface of mouth is convexly equipped with section and is arc-shaped and in several ring convex ribs of concentric circles for supporting for the docking section with the wafer cassette
It connects.
In several ring convex ribs, the height of the ring convex rib of gas nozzle inside top surface is higher than the ring convex rib in outside.The ring convex
The quantity of rib is 2.
In this way, gas nozzle structure provided by this creation, when being provided thereon the wafer cassette pressure, no matter the crystalline substance in the wafer cassette
Whether circle increases, which will not all deform because of compression, and the height of the opposite wafer cassette neither has too big from beginning to end
Variation, therefore mechanical arm transport wafer pass in and out the wafer cassette when just will not be affected.Moreover, metal material
The gas nozzle is also not easy to be stained with generated impurity in glutinous silicon wafer process, even if there especially have a small amount of impurity to be stained with to be glutinous, can even more fill
It can be blown off by the excessive air-flow that dissipates of the gas nozzle due to surface of the gas nozzle is relatively smooth while deflation.
The utility model provides a kind of gas nozzle structure, including an ontology simultaneously, and the circumferential surface of the ontology is convexly equipped with larger outer diameter
A fixinig plate, there are several combined holes can pass through respectively for several bolts and its screw lock is incorporated in a platform on the fixinig plate
On, among the ontology have an air flue, the air flue one end extend to top surface and formed one first opening for a wafer cassette
Docking section is connected, and the other end then extends to circumferential surface and forms one second opening with for a connection one air inlet pipe or escape pipe,
And second opening is located at the lower section of the fixinig plate, which is characterized in that the gas nozzle further includes an O shape cushion rubber, and the ontology is by metal
It is made, the top surface of the ontology is equipped with a circular groove slot around first opening；O shape cushion rubber is embedded among the circular groove slot, and
Upside protrudes out one height of top surface of the ontology.
The section configuration of the circular groove slot is trapezoidal.
The height that the body top surface is protruded out on the upside of the O shape cushion rubber is less than 0.1mm.
The O shape cushion rubber is rubber material or is silica gel material.
In this way, good sealing effect can be made it have by the O shape cushion rubber, and and make the wafer cassette and platform it
Between maximum height variation to protrude out the height of the body top surface on the upside of O shape cushion rubber, therefore make the wafer cassette and platform it
Between height change be controlled to it is acceptable within the scope of, and then so that it will not influence mechanical arm transport wafer into
Out, and the ontology of the metal material can also to effectively reduce being stained with for impurity glutinous.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of known wafer cassette air charging system.
Fig. 2 is the first pressured state schematic diagram of known gas nozzle.
Fig. 3 is second of pressured state schematic diagram of known gas nozzle.
Fig. 4 is the stereoscopic schematic diagram of the utility model.
Fig. 5 is the diagrammatic cross-section of the utility model.
Fig. 6 is the utility model use state diagram.
Fig. 7 is the perspective exploded view of another embodiment of the utility model.
Fig. 8 is the Three-dimensional combination diagram of another embodiment of the utility model.
Fig. 9 is the combination diagrammatic cross-section of another embodiment of the utility model.
Figure 10 is action schematic diagram when another embodiment of the utility model is not pressurized.
Figure 11 be another embodiment of the utility model by maximum pressure when action schematic diagram.
Label declaration:
10 wafer cassette air charging system, 11 wafer cassette
12 wafer, 13 platform
14 gas nozzle, 15 docking section
16 air inlet pipe, 17 escape pipe
18 mechanical arms
20 gas nozzle, 21 fixinig plate
22 combined hole, 23 air flue
24 first opening, 25 second opening
26 air inlet pipe, 27 escape pipe
28 ring convex rib, 30 platform
31 wafer cassette, 32 docking section
40 gas nozzle, 41 ontology
42 fixinig plate, 43 combined hole
44 air flues 45 first opening
46 second 47 air inlet pipe of opening
48 escape pipe, 49 circular groove slot
50 O shape cushion rubbers.
Specific embodiment
It please refers to shown in Fig. 4-Fig. 6, shows gas nozzle structure described in the utility model, be made of metal material, the gas
The circumferential surface of mouth 20 is convexly equipped with a fixinig plate 21 of larger outer diameter, has several combined holes 22 can be respectively for several on the fixinig plate 21
Bolt (not shown) passes through and screw lock is incorporated on a platform 30.There is an air flue 23, the air flue 23 1 among the gas nozzle 20
End extends to top surface and forms one first opening 24 for being connected with the docking section 32 of a wafer cassette 31, and the other end then extends to
Circumferential surface and form one second opening 25 with for a connection one air inlet pipe 26 or escape pipe 27, and second opening 25 is solid positioned at this
The lower section of stator 21.The top surface of the gas nozzle 20 is convexly equipped with section and is arc-shaped and in several ring convex ribs 28 of concentric circles for being used for
It is abutted with the docking section 32 of the wafer cassette 31, the height of the ring convex rib 28 of inside is higher than the ring convex rib 28 in outside.In this implementation
In example, the quantity of the ring convex rib 28 is 2.
In this way, when the wafer cassette 31 pressure is set on the gas nozzle 20 of metal material, no matter the wafer in the wafer cassette 31
Whether increase, which will not all deform because of compression, and the height H3 between the opposite wafer cassette 31 and platform 30 is from beginning
It all will not change too much variation to whole, therefore mechanical arm just not will receive any shadow when transporting wafer and passing in and out the wafer cassette 31
It rings, as shown in Figure 6.Moreover, the gas nozzle 20 of metal material is also not easy to be stained with generated impurity in glutinous silicon wafer process, especially it is
Make to there is a small amount of impurity to be stained with it is glutinous, even more can while inflation/deflation because the surface of the gas nozzle 20 is relatively smooth can be by the gas nozzle 20
Excessive air-flow is dissipated to blow off.
It please refers to shown in Fig. 7-Figure 11, is another embodiment of gas nozzle structure described in the utility model, is shown in the present embodiment
Show that the gas nozzle 40 includes an ontology 41 and an O shape cushion rubber 50.Wherein:
The ontology 41, is made of metal material, and the circumferential surface of the ontology 41 is convexly equipped with a fixinig plate 42 of larger outer diameter, this is solid
On stator 42 there are several combined holes 43 can pass through respectively for several bolt (not shown) and screw lock is incorporated on a platform 30.
Among the ontology 41 have an air flue 44,44 one end of air flue extend to top surface and formed one first opening 45 for a wafer
The docking section 32 of box 31 is connected, and the other end then extends to circumferential surface and forms one second opening 46 with for one air inlet pipe 47 of connection
Or an escape pipe 48, and second opening 46 is located at the lower section of the fixinig plate 42.The top surface of the ontology 41 is in first opening 45
Around be equipped with the trapezoidal circular groove slot 49 of section.
The O shape cushion rubber 50 is rubber or silica gel material, and is embedded among the circular groove slot 49 that upside simultaneously protrudes out this
Top surface one the height H4, H4 < 0.1mm of body 41.
In this way, when the wafer cassette 31 is placed on the gas nozzle 40, the O shape cushion rubber 50 will compressive deformation, and make its tool
There is preferable leakproofness, and when the wafer in the wafer cassette 31 gradually increases, it can be because the weight of the wafer cassette 31 increases
And so that the O shape cushion rubber 50 is increased deformation, and then make the decline of the wafer cassette 31, until the bottom surface of the wafer cassette 31 touches metal
When the top surface of the ontology 41 of material, just can not be further continued for declining, so just can be effectively controlled the maximum decline of the wafer cassette 31 away from
Within the acceptable range from maintenance, it therefore can avoid influencing mechanical arm transport wafer disengaging, such as Figure 10, Tu11Suo
Show, furthermore, the ontology 41 of metal material is not easy to be stained with generated impurity in glutinous silicon wafer process, and what O shape cushion rubber 50 manifested
Area is also little, so to be stained with glutinous situation also considerably less for impurity.
In conclusion since the utility model has the above advantages and practical value, and be showed no in similar product
There is similar product to deliver, therefore met the application important document of new patent, is filing an application in accordance with the law.
Claims (8)
1. a kind of gas nozzle structure, the circumferential surface of the gas nozzle is convexly equipped with a fixinig plate of larger outer diameter, has several knots on the fixinig plate
Closing hole can pass through respectively for several bolts and its screw lock is incorporated on a platform, have an air flue, the air flue among the gas nozzle
One end extends to top surface and forms one first opening for being connected with the docking section of a wafer cassette, and the other end then extends to circumferential surface
And one second opening is formed with for a connection one air inlet pipe or escape pipe, and second opening is located at the lower section of the fixinig plate,
It is characterized in that, the gas nozzle is made of metal, the top surface of the gas nozzle is convexly equipped with section and is arc-shaped and in the several of concentric circles
Ring convex rib for the docking section with the wafer cassette for abutting.
2. gas nozzle structure as described in claim 1, which is characterized in that in several ring convex ribs, the ring of gas nozzle inside top surface
The height of fin is higher than the ring convex rib in outside.
3. gas nozzle structure as claimed in claim 2, which is characterized in that the quantity of the ring convex rib is 2.
4. a kind of gas nozzle structure, including an ontology, the circumferential surface of the ontology is convexly equipped with a fixinig plate of larger outer diameter, on the fixinig plate
It can be passed through respectively for several bolts with several combined holes and its screw lock is incorporated on a platform, there is a gas among the ontology
Road, the air flue one end extend to top surface and form one first opening for being connected with the docking section of a wafer cassette, and the other end is then
It extends to circumferential surface and forms one second opening with for a connection one air inlet pipe or escape pipe, and second opening is fixed positioned at this
The lower section of piece, which is characterized in that the gas nozzle further includes an O shape cushion rubber, which is made of metal, the top surface of the ontology in this
A circular groove slot is equipped with around one opening；O shape cushion rubber is embedded among the circular groove slot, and upside protrudes out the top surface one of the ontology
Highly.
5. gas nozzle structure as claimed in claim 4, which is characterized in that the section configuration of the circular groove slot is trapezoidal.
6. gas nozzle structure as claimed in claim 4, which is characterized in that protrude out the body top surface on the upside of the O shape cushion rubber
Height is less than 0.1mm.
7. gas nozzle structure as claimed in claim 4, which is characterized in that the O shape cushion rubber is rubber material.
8. gas nozzle structure as claimed in claim 4, which is characterized in that the O shape cushion rubber is silica gel material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821527709.7U CN208985973U (en) | 2018-09-19 | 2018-09-19 | Gas nozzle structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821527709.7U CN208985973U (en) | 2018-09-19 | 2018-09-19 | Gas nozzle structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208985973U true CN208985973U (en) | 2019-06-14 |
Family
ID=66784629
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821527709.7U Expired - Fee Related CN208985973U (en) | 2018-09-19 | 2018-09-19 | Gas nozzle structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208985973U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116564854A (en) * | 2023-05-16 | 2023-08-08 | 弥费科技(上海)股份有限公司 | Cleaning equipment, air tap device, air channel device and control method thereof |
-
2018
- 2018-09-19 CN CN201821527709.7U patent/CN208985973U/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116564854A (en) * | 2023-05-16 | 2023-08-08 | 弥费科技(上海)股份有限公司 | Cleaning equipment, air tap device, air channel device and control method thereof |
| CN116564854B (en) * | 2023-05-16 | 2024-03-19 | 弥费科技(上海)股份有限公司 | Cleaning equipment, air tap device, air channel device and control method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190614 Termination date: 20200919 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |