CN208922097U - A kind of electron beam sewage treatment monitoring system - Google Patents
A kind of electron beam sewage treatment monitoring system Download PDFInfo
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- CN208922097U CN208922097U CN201822064696.0U CN201822064696U CN208922097U CN 208922097 U CN208922097 U CN 208922097U CN 201822064696 U CN201822064696 U CN 201822064696U CN 208922097 U CN208922097 U CN 208922097U
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Abstract
The utility model discloses a kind of electron beam sewage treatment monitoring systems, for monitoring electron beam sewage disposal system, electron beam sewage disposal system is by sewage input unit, preparing pool component, pass in and out water assembly, the part such as electron beam irradiation processing component and coagulating basin forms, the electron beam sewage treatment monitoring system includes sewage input monitoring system, preparing pool monitoring system, water monitoring system, electron beam irradiation handles monitoring system, coagulating basin monitoring system and central controller, all monitoring systems acquire data by central controller controls, electron beam sewage treatment monitoring system further includes a storage control system, its collected data is all transferred to storage control system and carries out unified storage and monitoring by central controller, facilitate monitoring management.
Description
Technical field
The utility model relates to sewage disposal system technical fields, are more precisely related to a kind of electron beam sewage treatment prison
Control system.
Background technique
With process of industrialization, problem of environmental pollution is more serious, and it is also more important how effectively to handle pollutant.?
In multiple pollutant, the processing of sewage is particularly important, and wherein the concentration of harmful substance of trade effluent is higher, larger to bio-toxicity,
How it is effective and rapid be located in reason trade effluent be industry a great problem.Traditional sewage water treatment method can be divided into according to its effect
Physical method, bioanalysis and three kinds of chemical method, wherein physical method mainly utilizes the non-solubility substance in physical action separation sewage,
Do not change chemical property during processing, there are commonly Gravity Separation, centrifuge separation, reverse osmosis, air bearing etc., physical method processing
Relatively simple, economic, of less demanding suitable for the sewage treatment degree situation of structures；Bioanalysis mainly utilizes the new old of microorganism
Metabolic function will be oxidized to stable inorganic substances in the decomposition of the organic matter of dissolution or colloidal state in sewage, obtain sewage
Purification, there are commonly activated sludge process and biofilm etc., Biochemical method degree is higher than physical method, but can not still have
Realize the purification of trade effluent in effect ground；Chemical method is acted on using chemical reaction to handle or recycle the dissolution substance or glue of sewage
The method of body substance, is chiefly used in industrial wastewater, and there are commonly Coagulation Method, neutralisation, oxidation-reduction method, ion-exchanges etc., changes
Facture good purification is learned, but will use more chemical agent, be easy to cause secondary pollution, and the process is more complicated,
Higher cost.The electronic beam current for utilizing electron accelerator to generate as the new technology of sewage treatment, electron beam sewage water treatment method
Object processed is bombarded or irradiated, the physical chemistry and biologically for being difficult to cause under conventional approaches are brought it about, thus
Reaches the purpose of enhancing product performance, cleaning of substances, compared to traditional sewage water treatment method, electron beam sewage water treatment method energy
Enough the traditional wastewaters processing methods such as organic wastewater difficult to degrade, antibiotic waste water, waste water containing pathogenic bacteria are effectively handled to be difficult to
The waste water of processing is imitated, and higher using the treatment effeciency of electron beam sewage water treatment method, secondary pollution will not be generated.With electronics
Beam sewage water treatment method constantly improve, and market application range also constantly expands.Electron beam sewage disposal system generally by into
The subsystems such as outlet system, electron beam irradiation processing system collectively constitute, each son in existing electron beam sewage disposal system
System individually realizes monitoring control, cannot achieve the unified collection tube of all data in electron beam sewage disposal process
Control, user and environmental protection supervision unit can not easily be monitored and analyzed water sample.
Utility model content
In view of this, being used for the main purpose of the utility model is to provide a kind of electron beam sewage treatment monitoring system
Electron beam sewage disposal system is monitored, electron beam sewage disposal system is by sewage input unit, preparing pool component, Inlet and outlet water group
The part such as part, electron beam irradiation processing component and coagulating basin forms, and the electron beam sewage treatment monitoring system includes that sewage is defeated
Enter monitoring system, preparing pool monitoring system, water monitoring system, electron beam irradiation processing monitoring system, coagulation cell monitoring system
System and central controller, all monitoring systems acquire data, electron beam sewage treatment monitoring system by central controller controls
It further include a storage control system, its collected data is all transferred to storage control system and carries out unification by central controller
Storage and monitoring.
Purpose according to the present utility model proposes a kind of electron beam sewage treatment monitoring system, with an electron beam sewage treatment
System combine setting, the electron beam sewage disposal system include sequentially connected sewage input unit, a preparing pool component,
One disengaging water assembly, an electron beam irradiation processing component and a coagulating basin, the electron beam sewage treatment monitoring system include
Several subsystems, the subsystem respectively with the sewage input unit, the preparing pool component, the disengaging water assembly, institute
It states electron beam irradiation processing component and the coagulating basin combines setting, monitoring duty.
Preferably, the subsystem includes that sewage input monitoring system, a preparing pool monitoring system, an Inlet and outlet water are supervised one by one
Control system, electron beam irradiation processing monitoring system, a coagulating basin monitoring system, a central controller and a storage control system
System, the sewage input monitoring system, the preparing pool monitoring system, the water monitoring system, the electron beam irradiation
Processing monitoring system, the coagulating basin monitoring system are electrically connected with the central controller, the sewage input monitoring system and
The sewage input unit combines setting, and the preparing pool monitoring system is arranged in conjunction with the preparing pool component, the disengaging
Water monitoring system is arranged in conjunction with the disengaging water assembly, the electron beam irradiation processing monitoring system and the electron beam irradiation
Processing component combines setting, and the coagulating basin monitoring system is arranged with the coagulating basin component in conjunction with, the central controller and
The storage control system electrical connection.
Preferably, the disengaging water assembly includes an at least intake pump and a water outlet pump, the water monitoring system packet
It includes a water inletting monitoring device and one and is discharged monitoring device, the water inletting monitoring device and the water outlet monitoring device and the center
Controller electrical connection, the water inletting monitoring device are arranged in conjunction with the intake pump, the water outlet monitoring device and the water outlet
Pump combines setting.
Preferably, if the preparing pool component includes siccative pump, several batch cans, several agitating devices and a preparing pool,
If the preparing pool monitoring system include siccative pump monitoring device, several batch can monitoring devices, several stirring monitoring devices and
One preparing pool monitoring device, the material pump monitoring device, the batch can monitoring device, the stirring monitoring device, the allotment
Cell monitoring device is electrically connected with the central controller, and the material pump monitoring device is combined setting, the batch can with material pump
Monitoring device is arranged in conjunction with the batch can, and the stirring monitoring device is arranged in conjunction with the agitating device, the preparing pool
Monitoring device is arranged in conjunction with the preparing pool.
Preferably, the electron beam irradiation processing component include a High-frequency machine, a refrigerator, a control cabinet, a water tank with
And an electron accelerator component, the electron beam irradiation processing monitoring system include that a High-frequency machine monitoring device, a refrigerator are supervised
Control device, a control monitoring device, a safety monitoring device and an auxiliary monitoring device, the High-frequency machine monitoring device, institute
State refrigerator monitoring device, the control monitoring device, the safety monitoring device, the auxiliary monitoring device and the center
Controller electrical connection, the High-frequency machine monitoring device is arranged in conjunction with the High-frequency machine, the refrigerator monitoring device with it is described
Refrigerator combines setting, and the control monitoring device is arranged in conjunction with the control cabinet, the safety monitoring device and the electricity
Beamlet processing component combines setting.
Preferably, the working condition of sewage input unit described in the sewage input monitoring system monitoring and sewage therein
Flow.
Preferably, the coagulating basin monitoring system monitors the state of the coagulating basin component, including the coagulating basin component
Liquid level, pH value and the COD information of middle liquid.
Preferably, the preparing pool monitoring device monitors the state of the preparing pool, including liquid in the preparing pool
Liquid level, pH value and COD information.
Preferably, the control monitoring device is monitored by parameters set by the control cabinet, including when operation
Between, the setting of energy value, line, the parameter informations such as dosage setting.
Compared with prior art, a kind of the advantages of electron beam sewage treatment monitoring system disclosed by the utility model, is:
The data in electron beam sewage disposal system are uniformly acquired using the electron beam sewage treatment monitoring system, and are concentrated
Storage and monitoring, facilitate regulatory analysis.
Detailed description of the invention
In order to illustrate the embodiment of the utility model or the technical proposal in the existing technology more clearly, below will be to embodiment
Or attached drawing needed to be used in the description of the prior art is briefly described, it should be apparent that, the accompanying drawings in the following description is only
It is some embodiments of the utility model, for those of ordinary skill in the art, in the premise not made the creative labor
Under, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is shown using a kind of electron beam sewage disposal system of electron beam sewage treatment monitoring system of the utility model
Schematic diagram.
Fig. 2 is shown using a kind of electron beam sewage disposal system of electron beam sewage treatment monitoring system of the utility model
Preparing pool component schematic diagram.
Fig. 3 is shown using a kind of electron beam sewage disposal system of electron beam sewage treatment monitoring system of the utility model
Electron beam irradiation processing component schematic diagram.
Fig. 4 show a kind of schematic diagram of electron beam sewage treatment monitoring system of the utility model.
Specific embodiment
As shown in Figure 1, for using a kind of electron beam sewage treatment of electron beam sewage treatment monitoring system of the utility model
The schematic diagram of system, the electron beam sewage disposal system include a sewage input unit 1, a preparing pool component 2, an Inlet and outlet water
Component 3, an electron beam irradiation processing component 4 and a coagulating basin 5, wherein disengaging water assembly 3 includes 31 He of an at least intake pump
One water outlet pump 32.The sewage input unit 1, the preparing pool component 2, the intake pump 31, electron beam irradiation processing
Component 4, the water outlet pump 32, the coagulating basin 5 are sequentially connected, and sewage after the sewage input unit 1 input by successively leading to
It crosses and above-mentioned is partially completed sewage treatment.The sewage input unit 1 controls the start and stop of sewage input, and also control sewage is defeated
The flow that the flow entered, i.e. control sewage enter the electron beam sewage disposal system.
If specifically, the preparing pool component 2 is as shown in Fig. 2, the preparing pool component 2 includes if that siccative pumps 21, siccative
Tank 22, several agitating devices 23 and a preparing pool 24, several batch cans 22 are connected by pipeline and the preparing pool 24 respectively
It connects, the material pump 21 is identical as 22 quantity of batch can, and material pump 21 is arranged in institute correspondingly with the batch can 22
It states on the pipeline that batch can 22 is connect with the preparing pool 24, can the material in the 21 control batch can 22 of material pump enter institute
Preparing pool 24 is stated, and controls the flow that material enters the preparing pool 24.The agitating device 23 is arranged in the preparing pool
Inside 24, in 23 course of work of agitating device in the preparing pool 24 sewage and material mixed solution be stirred,
It is uniformly mixed it.The preparing pool 24 is connect by pipeline with the electron beam irradiation processing component 4, and the intake pump 31 is set
Set on the pipeline between the preparing pool 24 and the electron beam irradiation processing component 4, control mixed material after sewage into
Enter inside the electron beam irradiation processing component 4, and controls the flow that sewage enters the electron beam irradiation processing component 4.
The electron beam irradiation processing component 4 is as shown in figure 3, the electron beam irradiation processing component 4 includes a High-frequency machine
41, a refrigerator 42, a control cabinet 43, a water tank 46 and an electron accelerator component 47, the control cabinet 43 and the height
Frequency machine 41, the refrigerator 42 and the electron accelerator component 47 electrical connection, control the High-frequency machine 41, the refrigerator 42
And the working condition of the electron accelerator component 47.The electron accelerator component 47 is combined setting, institute with the water tank 46
Electron accelerator component 47 is stated during the work time to handle the sewage in the water tank 46.The water tank 46 passes through pipeline
It is connect with the preparing pool 24, the intake pump 31 is arranged on the pipeline between the water tank 46 and the preparing pool 24, control
Sewage after mixed material processed enters inside the water tank 46, and controls the flow that sewage enters the water tank 46.The water
Case 46 is also connect by pipeline with the coagulating basin 5, and the water outlet pump 32 is arranged between the water tank 46 and the coagulating basin 5
Pipeline on, control treated water enters the coagulating basin 5, and controls the flow that water enters the coagulating basin 5.
If a kind of electron beam sewage treatment monitoring system of Fig. 4, the application include several subsystems, specifically include: one is dirty
Water input monitoring system 10, a preparing pool monitoring system 20, a water monitoring system 30, electron beam irradiation processing monitoring system
40, one coagulating basin monitoring system 50 of system, a central controller 60 and a storage control system 70.Sewage input monitoring system
System 10, the preparing pool monitoring system 20, the water monitoring system 30, the electron beam irradiation processing monitoring system 40,
The coagulating basin monitoring system 50 is electrically connected with the central controller 60.Wherein, the sewage input monitoring system 10 with
The sewage input unit 1 combines setting, and the sewage input monitoring system 10 monitors the work shape of the sewage input unit 1
State and the discharge of sewage therein, and the work state information of the sewage input unit 1 is transferred to institute in a manner of electric signal
State central controller 60.The preparing pool monitoring system 20 is combined setting, the allotment cell monitoring system with the preparing pool component 2
The working condition of the 20 monitoring preparing pool component 2 of system, and by the work state information of the preparing pool component 2 with electric signal
Mode is transferred to the central controller 60.The water monitoring system 30 includes a water inletting monitoring device 301 and a water outlet
Monitoring device 302, the water inletting monitoring device 301 and the water outlet monitoring device 302 are electrically connected with the central controller 60
It connects, the water inletting monitoring device 301 is combined setting with the intake pump 31, and the water inletting monitoring device 301 monitors the water inlet
The working condition of pump 31 and the discharge of sewage flowed through, and monitoring information is transferred to the central controller in a manner of electric signal
60；The water outlet monitoring device 302 is combined setting with the water outlet pump 32, and the water outlet monitoring device 302 monitors the water outlet
The working condition of pump 32 and the discharge of sewage flowed through, and monitoring information is transferred to the central controller in a manner of electric signal
60.The electron beam irradiation processing monitoring system 40 is combined setting, the electron beam spoke with the electron beam irradiation processing component 4
The working condition of the electron beam irradiation processing component 4 is monitored according to processing monitoring system 40, and by monitoring information with electric signal
Mode is transferred to the central controller 60.The coagulating basin monitoring system 50 is combined setting with the coagulating basin component 5, described
Coagulating basin monitoring system 50 monitors the state of the coagulating basin component 5, specifically includes the liquid of liquid in the coagulating basin component 5
The information such as position, pH value and COD, and the information monitored is transferred to the central controller in a manner of electric signal
60.The central controller 60 is electrically connected with the storage control system 70, and the central controller 60 is by received prison
Control information is all transferred to the storage control system 70, is stored and is shown by the storage control system 70.The storage control
System 70 is made of industrial computer and display device, and the industrial computer is for storing processing monitoring information, the display
Device is for showing monitoring information.
The preparing pool monitoring system 20 further comprises material pump monitoring device 201, a batch can monitoring device 202, one
Monitoring device 203 and a preparing pool monitoring device 204 are stirred, the material pumps monitoring device 201, the batch can monitoring device
202, the stirring monitoring device 203, the preparing pool monitoring device 204 are electrically connected with the central controller 60.It is described
Material pump monitoring device 201 is combined setting with material pump 21, and the material pump monitoring device 201 monitors the work shape of the material pump 21
State information, and the work state information monitored is transferred to the central controller 60 in a manner of electric signal.The batch can
Monitoring device 202 is combined setting with the batch can 22, and the batch can monitoring device 202 monitors the working condition letter of the batch can 22
Breath, including batch can liquid level etc., the batch can monitoring device 202 transmit the work state information monitored in a manner of electric signal
To the central controller 60.The stirring monitoring device 203 is combined setting, the stirring monitoring dress with the agitating device 23
The work state information of the 203 monitoring agitating device 23 is set, and by the work state information monitored in a manner of electric signal
It is transferred to the central controller 60.The preparing pool monitoring device 204 is combined setting, the preparing pool with the preparing pool 24
Monitoring device 204 monitors the state of the preparing pool 24, specifically includes liquid level, pH value and the chemistry of liquid in the preparing pool 24
The information such as oxygen demand, and the information monitored is transferred to the central controller 60 in a manner of electric signal.
The electron beam irradiation processing monitoring system 40 further comprises a High-frequency machine monitoring device 401, refrigerator prison
It controls device 402, one and controls monitoring device 403, a safety monitoring device 404 and an auxiliary monitoring device 405, the High-frequency machine
Monitoring device 401, the refrigerator monitoring device 402, the control monitoring device 403, the safety monitoring device 404, institute
Auxiliary monitoring device 405 is stated to be electrically connected with the central controller 60.The High-frequency machine monitoring device 401 and the High-frequency machine
41 combine setting, monitor the working condition of the High-frequency machine 41, and the work state information monitored is transferred to the center
Controller 60.The refrigerator monitoring device 402 is combined setting with the refrigerator 42, monitors the work shape of the refrigerator 42
State, and the work state information monitored is transferred to the central controller 60.The control monitoring device 403 and the control
Cabinet 43 processed combines setting, and monitoring passes through parameters set by the control cabinet 43, including runing time, energy value, line
The parameter informations such as setting, dosage setting, the information that the control monitoring device 403 will monitor are transferred in a manner of electric signal
The central controller 60.The safety monitoring device 404 is combined setting with the electron beam treatment component 4, monitors the electricity
Every security set information in beamlet processing component 4, and the information monitored is transferred to the center in a manner of electric signal
Controller 60.The auxiliary monitoring device 405 is combined setting with the electron beam treatment component 4, monitors the electron beam treatment
Every auxiliary setting information in component 4, and the information monitored is transferred to the central controller 60 in a manner of electric signal.
Every operation data in the electron beam sewage disposal system is transferred to described deposit by the central controller 60
Control system 70 is stored up, is stored by the storage control system 70, user can be right by the storage control system 70
The operations such as data are inquired, counted, analysis management, it is convenient and efficient.
The foregoing description of the disclosed embodiments can be realized professional and technical personnel in the field or using originally practical new
Type.Various modifications to these embodiments will be readily apparent to those skilled in the art, and determine herein
The General Principle of justice can be realized in other embodiments without departing from the spirit or scope of the present utility model.Cause
This, the present invention will not be limited to the embodiments shown herein, and is to fit to and principles disclosed herein
The widest scope consistent with features of novelty.
Claims (9)
1. a kind of electron beam sewage treatment monitoring system is arranged, which is characterized in that institute in conjunction with an electron beam sewage disposal system
Stating electron beam sewage disposal system includes sequentially connected sewage input unit, a preparing pool component, disengaging a water assembly, one
Electron beam irradiation processing component and a coagulating basin, the electron beam sewage treatment monitoring system includes several subsystems, described
Subsystem is handled with the sewage input unit, the preparing pool component, the disengaging water assembly, the electron beam irradiation respectively
Component and the coagulating basin combine setting, monitoring duty.
2. electron beam sewage treatment monitoring system as described in claim 1, which is characterized in that the subsystem includes dirty one by one
Water input monitoring system, a preparing pool monitoring system, a water monitoring system, an electron beam irradiation handle monitoring system, one
Coagulating basin monitoring system, a central controller and a storage control system, the sewage input monitoring system, the preparing pool
Monitoring system, the water monitoring system, electron beam irradiation processing monitoring system, the coagulating basin monitoring system and institute
Central controller electrical connection is stated, the sewage input monitoring system is arranged in conjunction with the sewage input unit, the preparing pool
Monitoring system is arranged in conjunction with the preparing pool component, and the water monitoring system is arranged in conjunction with the disengaging water assembly,
The electron beam irradiation processing monitoring system is arranged in conjunction with the electron beam irradiation processing component, the coagulating basin monitoring system
It is arranged in conjunction with the coagulating basin component, the central controller is electrically connected with the storage control system.
3. electron beam sewage treatment monitoring system as claimed in claim 2, which is characterized in that the disengaging water assembly includes extremely
A few intake pump and a water outlet pump, the water monitoring system include a water inletting monitoring device and a water outlet monitoring device, institute
State water inletting monitoring device and the water outlet monitoring device be electrically connected with the central controller, the water inletting monitoring device with it is described
Intake pump combines setting, and the water outlet monitoring device is arranged in conjunction with the water outlet pump.
4. electron beam sewage treatment monitoring system as claimed in claim 2, which is characterized in that if the preparing pool component includes
Siccative pump, several batch cans, several agitating devices and a preparing pool, if the preparing pool monitoring system includes siccative pump monitoring dress
It sets, several batch can monitoring devices, several stirring monitoring devices and a preparing pool monitoring device, the material pump monitoring device, institute
Batch can monitoring device, the stirring monitoring device, the preparing pool monitoring device is stated to be electrically connected with the central controller, it is described
Material pump monitoring device is combined setting with material pump, and the batch can monitoring device is arranged in conjunction with the batch can, the stirring prison
Control device is arranged in conjunction with the agitating device, and the preparing pool monitoring device is arranged in conjunction with the preparing pool.
5. electron beam sewage treatment monitoring system as claimed in claim 2, which is characterized in that the electron beam irradiation processing group
Part includes a High-frequency machine, a refrigerator, a control cabinet, a water tank and an electron accelerator component, at the electron beam irradiation
Managing monitoring system includes a High-frequency machine monitoring device, a refrigerator monitoring device, control a monitoring device, a safety monitoring device
And an auxiliary monitoring device, the High-frequency machine monitoring device, the refrigerator monitoring device, the control monitoring device, institute
State safety monitoring device, the auxiliary monitoring device is electrically connected with the central controller, the High-frequency machine monitoring device and institute
It states High-frequency machine and combines setting, the refrigerator monitoring device is arranged in conjunction with the refrigerator, the control monitoring device and institute
It states control cabinet and combines setting, the safety monitoring device is arranged in conjunction with the electron beam treatment component.
6. electron beam sewage treatment monitoring system as claimed in claim 2, which is characterized in that the sewage input monitoring system
Monitor the working condition and the discharge of sewage therein of the sewage input unit.
7. electron beam sewage treatment monitoring system as claimed in claim 2, which is characterized in that the coagulating basin monitoring system prison
The state for controlling the coagulating basin component, liquid level, pH value and COD information including liquid in the coagulating basin component.
8. electron beam sewage treatment monitoring system as claimed in claim 4, which is characterized in that the preparing pool monitoring device prison
The state for controlling the preparing pool, including the liquid level of liquid, pH value and COD information in the preparing pool.
9. electron beam sewage treatment monitoring system as claimed in claim 5, which is characterized in that the control monitoring device monitoring
Believed by parameters such as parameters set by the control cabinet, including the setting of runing time, energy value, line, dosage setting
Breath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822064696.0U CN208922097U (en) | 2018-12-10 | 2018-12-10 | A kind of electron beam sewage treatment monitoring system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201822064696.0U CN208922097U (en) | 2018-12-10 | 2018-12-10 | A kind of electron beam sewage treatment monitoring system |
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| CN208922097U true CN208922097U (en) | 2019-05-31 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109613864A (en) * | 2018-12-10 | 2019-04-12 | 中广核达胜加速器技术有限公司 | A kind of electron beam sewage treatment monitoring system |
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2018
- 2018-12-10 CN CN201822064696.0U patent/CN208922097U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109613864A (en) * | 2018-12-10 | 2019-04-12 | 中广核达胜加速器技术有限公司 | A kind of electron beam sewage treatment monitoring system |
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