CN208903972U - A kind of ion initiation electron impact ionization source - Google Patents
A kind of ion initiation electron impact ionization source Download PDFInfo
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- CN208903972U CN208903972U CN201822047093.XU CN201822047093U CN208903972U CN 208903972 U CN208903972 U CN 208903972U CN 201822047093 U CN201822047093 U CN 201822047093U CN 208903972 U CN208903972 U CN 208903972U
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Abstract
A kind of ion causes electron impact ionization source, it is characterised in that: including metal cavity, sets vacuum ultraviolet light source in the cavity and within the cavity along beam projecting direction is followed successively by photo-ionisation area, electronics generates area, electron impact ionization area；Vacuum ultraviolet light source is for generating vacuum ultraviolet photon, in carrying out photo-ionisation to the calibrating gas molecule of introducing in photo-ionisation area to generate primary ion；Primary ion generates area after electric field acceleration, into electronics, and the surface of bombardment electronics amplification microchannel plate generates a large amount of electronics；Electronics is after electric field acceleration, into electron impact ionization area, carries out electron impact ionization to the gas molecule of introducing, generates ion；Ion enters mass spectrographic mass analyzer through ion transmission range.The utility model has the beneficial effects that the electronics enlarge-effect of electronics amplification microchannel plate is utilized, it is greatly improved the electron number in electron impact ionization source, to improve the ionizing efficiency of ionization source.
Description
Technical field
The utility model belongs to mass spectral analysis field, in particular to a kind of ion causes electron impact ionization source.This method
Photo-ionisation is carried out to calibrating gas using vacuum ultraviolet photon, generates primary ion；Microchannel plate is amplified by ion bombardment electronics,
Generate electronics；After electronics is accelerated, for carrying out electron impact ionization to sample gas molecule.
Background technique
Electron impact ionization source is the ionization mode for gas molecule being most widely used at present.Its working principle
Be: under certain vacuum condition, when electric current passes through filament, the temperature of filament is up to 2000 DEG C, in filament free electron without
Regular motion aggravation can generate thermionic emission, the electronics of transmitting is ionizing when electronic kinetic energy is greater than metal surface work function
Accelerate to obtain energy under voltage, collision gas ionizes gas molecule.The advantages of ionization source, is that structure is simple, operation side
Just.The ionizing efficiency in electron impact ionization source and the electron amount of transmitting are directly related, and electron amount mainly has current strength
It determines.Too low current strength will have a direct impact on the ionizing efficiency of ionization source, and excessively high current strength then influences ionization source
Service life.
Summary of the invention
The purpose of this utility model is to develop a kind of ion initiation electron impact ionization source, using vacuum ultraviolet photon to mark
Quasi- gas carries out photo-ionisation, generates primary ion；Microchannel plate is amplified by ion bombardment electronics, generates electronics；Electronics is accelerated
Afterwards, for carrying out electron impact ionization to sample gas molecule.This process employs the electronics amplifications of electronics amplification microchannel plate
Effect, is greatly improved the electron number in electron impact ionization source, to improve ionizing efficiency.
The purpose of this utility model is achieved through the following technical solutions:
A kind of ion causes electron impact ionization source, including metal cavity, set vacuum ultraviolet light source in the cavity and
It is within the cavity to be followed successively by photo-ionisation area, electronics generation area, electron impact ionization area along beam projecting direction；
The junction that photo-ionisation area, electronics generate between area, electron impact ionization area is respectively equipped with air pressure difference mouth, photoelectricity
Area is generated from area, electronics and is respectively equipped with bleeding point, is connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplifies microchannel plate
Between be equipped with DC voltage, to form electric-force gradient；
It is equipped with calibrating gas sample introduction pipeline in photo-ionisation area, is equipped with sample feeding pipeline in electron impact ionization area；
Vacuum ultraviolet light source generates vacuum ultraviolet photon, in carrying out photoelectricity to the calibrating gas molecule of introducing in photo-ionisation area
From to generate primary ion, primary ion generates area, the table of bombardment electronics amplification microchannel plate after electric field acceleration, into electronics
Face generates a large amount of electronics, and electronics, into electron impact ionization area, carries out the gaseous sample molecule of introducing after electric field acceleration
Electron impact ionization generates ion.
The vacuum ultraviolet light source is that vacuum UV lamp or ultraviolet laser light source, photon energy should be higher than that calibrating gas
Ionization energy can carry out photo-ionisation to calibrating gas molecule.
Repeller electrode in photo-ionisation area, which is equipped with, can make ion acceleration enter the repulsion electrode that electronics generates area.Electronics amplification is micro-
It is equipped with DC voltage 500-800V between channel plate, forms 2.5 × 105-4×105The electric-force gradient of V/m.
The invention mechanism or the course of work of the utility model are: the photon beam of vacuum ultraviolet light source is emitted directly toward photo-ionisation
Area, photo-ionisation area side are provided with calibrating gas sample introduction pipeline, can be quartz capillary or metal capillary；Calibrating gas pass through into
Sample pipeline enters photo-ionisation area, and reaches the beam area of vacuum-ultraviolet light, by vacuum ultraviolet photon to calibrating gas molecule into
Row photo-ionisation generates primary ion.The molecular ionization of calibrating gas can should be lower than the photon energy of vacuum-ultraviolet light, low-boiling
It is preferred to can be used as photon initiation electron impact ionization source for benzene homologues sensitivity with higher usually under photo-ionisation mode
Calibrating gas.The repeller electrode of ionized region is equipped with repulsion voltage, and the primary ion after calibrating gas can be made to ionize is in accelerating field
Under effect, accelerates into electronics and generate area.
Electronics, which generates, is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplify microchannel plate it
Between be equipped with DC voltage, to form electric-force gradient.Electronics amplification microchannel plate has the function of electronics gain amplifier, when there is ion
When bombarding the surface of first order electronics amplification microchannel plate, ion, with its impact several times, sputters a large amount of electronics in microchannel；
Then, electronics moves to the second level electronics amplification microchannel plate under the action of accelerating field, and electron amount is further magnified；
Amplify by multistage electronics, ultimately forms a large amount of electronics.Electronics accelerates to transport to electron ionization area under accelerating field effect
It is dynamic.
Electron ionization area side is provided with gas sample introduction pipeline, for introducing gaseous sample to be measured；Gaseous sample
Into in electron impact ionization area, the electronics of gas molecule and accelerated motion collides, and makes gas molecule that electron bombardment occur
Ionization.
The beneficial effects of the utility model are as follows: the utility model carries out photoelectricity to calibrating gas using vacuum ultraviolet photon
From generation primary ion；Microchannel plate is amplified by ion bombardment electronics, generates electronics；The use that electronics amplifies microchannel plate is big
The quantity using electronics is increased greatly, is conducive to provide the ionizing efficiency of ionization source.Compared to " one kind can photovoltaic mode switching
Vacuum UV lamp mass spectrum ionization source " (Patent No. 201721124168.9) introduced it is micro- logical using ultraviolet light direct irradiation
Guidance tape generates the mode of electronics, and the utility model is by the way of ion bombardment microchannel plate, due to the increasing in ion collision section
Greatly, it is greatly improved the generation efficiency of microchannel plate electronics, to make this ionization source ionizing efficiency with higher.
Detailed description of the invention
The schematic diagram of Fig. 1 the utility model ionization source.
1. metal cavity, 2. vacuum ultraviolet light sources, 3. photo-ionisation areas, 4. electronics generate area, the amplification of 5. electronics is micro- logical
Guidance tape, 6. electron impact ionization areas, 7. calibrating gas sample introduction pipelines, 8. gas sample introduction pipelines, 9. repeller electrodes, 10. air pressures
Difference mouth, 11. bleeding points.
Specific embodiment
The utility model is described further below in conjunction with figure embodiment:
A kind of ion causes electron impact ionization source as shown in Figure 1:, and including metal cavity 1, to set vacuum in the cavity purple
Outer light source 2 and it is within the cavity along beam projecting direction be followed successively by photo-ionisation area 4, electronics generate area 4, electron impact ionization area
6；
Photo-ionisation area 3 and electronics generate the connection between 4 between area, between electronics generation area 4 and electron impact ionization area 6
Place is respectively equipped with air pressure difference mouth 10, and photo-ionisation area 3, electronics generate area 4 and are respectively equipped with bleeding point 11, be connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate 5 in area 4, quantity is 3；Each electronics amplification microchannel plate it
Between be equipped with DC voltage 500V, formed 2.5 × 105The electric-force gradient of V/m.；
It is equipped with calibrating gas sample introduction pipeline 7 in photo-ionisation area 4, is equipped with gas sample introduction in electron impact ionization area 6
Pipeline 8；
The utility model is more specifically, the internal vacuum UV lamp filled with Krypton may be selected in vacuum ultraviolet light source 2, when it
When being excited by high pressure, vacuum ultraviolet photon can be projected by optical window, form photon beam.The energy of Krypton vacuum UV lamp transmitting photon
Amount is 10.6eV, higher than the ionization energy of most of volatile organic matters, is conducive to calibrating gas molecular ionization, formed it is primary from
Son.
The photon beam of vacuum ultraviolet light source 2 is emitted directly toward photo-ionisation area 3,3 side of photo-ionisation area be provided with calibrating gas into
Sample pipeline 7 can be quartz capillary；Calibrating gas enters photo-ionisation area 3 through sample introduction pipeline, and reaches the light beam of vacuum-ultraviolet light
Region carries out photo-ionisation to calibrating gas molecule by vacuum ultraviolet photon, generates primary ion.The molecular ionization energy of calibrating gas
Should be lower than vacuum-ultraviolet light photon energy, the sensitivity with higher usually under photo-ionisation mode of low-boiling benzene homologues,
It can be used as photon and cause the preferred calibrating gas in electron impact ionization source.The repeller electrode 9 in photo-ionisation area 3 is equipped with repulsion voltage,
Primary ion after calibrating gas can be made to ionize accelerates into electronics and generates area 4 under the action of accelerating field.
Electronics generates the combination that electronics amplification microchannel plate 5 is provided in area 4, and quantity is 3；Electronics amplifies microchannel plate
DC voltage is equipped between 5, to form electric-force gradient.Electronics amplification microchannel plate 5 has the function of electronics gain amplifier, when having
When ion bombardment first order electronics amplifies the surface of microchannel plate 5, ion, with its impact several times, sputters a large amount of in microchannel
Electronics；Then, electronics moves to second level electronics amplification microchannel plate 5 under the action of accelerating field, and electron amount is by into one
Step amplification；Amplify by multistage electronics, ultimately forms a large amount of electronics.Electronics accelerates under accelerating field effect to electronics
Ionized region 6 is bombarded to move.
6 side of electron impact ionization area is provided with gas sample introduction pipeline 8, for introducing gaseous sample to be measured；Gas
Body sample enters in electron impact ionization area 6, and the electronics of gas molecule and accelerated motion collides, and makes gas molecule that electricity occur
Son bombardment ionization.
In the ionization source, the junction that photo-ionisation area 3, electronics generate between area 4, electron impact ionization area 6 is respectively equipped with
Air pressure difference mouth 10, photo-ionisation area 3, electronics generate area 4 and are respectively equipped with bleeding point 11, be connected with vacuum pump, to adjust difference
The vacuum degree in region.
Claims (4)
1. a kind of ion causes electron impact ionization source, it is characterised in that: including metal cavity, set vacuum ultraviolet in the cavity
Light source and it is within the cavity along beam projecting direction be followed successively by photo-ionisation area, electronics generate area, electron impact ionization area；
The junction that photo-ionisation area, electronics generate between area, electron impact ionization area is respectively equipped with air pressure difference mouth, photo-ionisation
Area, electronics generate area and are respectively equipped with bleeding point, are connected with vacuum pump；
It is generated in electronics and is provided with electronics amplification microchannel plate combination in area, quantity is 2-4 piece；Electronics amplifies between microchannel plate
Equipped with DC voltage, to form electric-force gradient；
It is equipped with calibrating gas sample introduction pipeline in photo-ionisation area, is equipped with sample feeding pipeline in electron impact ionization area.
2. ion according to claim 1 causes electron impact ionization source, it is characterised in that: the vacuum ultraviolet light source is
Vacuum UV lamp or ultraviolet laser light source, photon energy should be higher than that the ionization energy of calibrating gas, can to calibrating gas molecule into
Row photo-ionisation.
3. ion according to claim 1 causes electron impact ionization source, it is characterised in that: the repeller electrode in photo-ionisation area
Equipped with the repulsion electrode that ion acceleration can be made to enter electronics generation area.
4. ion according to claim 1 causes electron impact ionization source, it is characterised in that: electronics amplify microchannel plate it
Between be equipped with DC voltage 500-800V, formed 2.5 × 105-4×105The electric-force gradient of V/m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201822047093.XU CN208903972U (en) | 2018-12-07 | 2018-12-07 | A kind of ion initiation electron impact ionization source |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201822047093.XU CN208903972U (en) | 2018-12-07 | 2018-12-07 | A kind of ion initiation electron impact ionization source |
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| CN208903972U true CN208903972U (en) | 2019-05-24 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109461642A (en) * | 2018-12-07 | 2019-03-12 | 中国烟草总公司郑州烟草研究院 | A kind of ion initiation electron impact ionization source |
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2018
- 2018-12-07 CN CN201822047093.XU patent/CN208903972U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109461642A (en) * | 2018-12-07 | 2019-03-12 | 中国烟草总公司郑州烟草研究院 | A kind of ion initiation electron impact ionization source |
| CN109461642B (en) * | 2018-12-07 | 2024-04-02 | 中国烟草总公司郑州烟草研究院 | Ion-initiated electron bombardment ionization source |
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