CN208889619U - Cleaning device is used in a kind of wafer flow production - Google Patents

Abstract

The utility model relates to the technical fields of wafer flow production auxiliary equipment, more particularly to a kind of wafer flow production cleaning device, can facilitate and carry out using raising usability to alcohol；It is convenient simultaneously that the foul fallen after cleaning is cleared up, reduce labour degree；And can be fixed without hand by wafer flow, so that cleaning brush and cleaning cotton balls is carried out simultaneously using raising cleaning efficiency enhances using effect；Cotton balls is cleaned including workbench, holder, rack, cleaning brush and multiple groups；It further include Pressing pump, pressing pump output terminal is located at right above rack；It further include holding box and bearing piece, holding box top is provided with containing tank；It further include front supporting member and rear support, rack includes left regulating part, left fixing piece, left rotation shaft, right regulating part, right fixing piece and right rotation shafts, and left rotation shaft and right rotation shafts are inserted into respectively inside left link slot and right link slot.

Description

Cleaning device is used in a kind of wafer flow production

Technical field

It is raw more particularly to a kind of wafer flow the utility model relates to the technical field of wafer flow production auxiliary equipment Production cleaning device.

Background technique

It is well known that wafer flow production is that one kind is used in wafer flow production process with cleaning device, to wafer flow The ink of on piece contamination is cleaned, so as to the subsequent auxiliary device welded to it, in wafer flow production field It is widely used；Existing wafer flow production cleaning device include workbench, holder, rack, cleaning brush and Multiple groups clean cotton balls, and rack is arranged on the first half region of workbench top, and holder is arranged on rear side of workbench top, and puts It sets and is provided with placed cavity in box, and be contained with alcohol in placed cavity, holder top is provided with pick-and-place mouth, and on picking and placing mouth It is provided with door, cleaning brush and multiple groups cleaning cotton balls are both placed in workbench top；Existing wafer flow production cleaning dress Wafer flow need to be only placed on rack when setting use, then pressing wafer flow is fixed on the other hand, the other hand tweezer Sub-folder lives to clean cotton balls and picks the alcohol in holder, then by cleaning cotton balls and cleaning brush to the ink of wafer flow on piece It is cleaned；Existing wafer flow production is found in cleaning device use, to avoid alcohol from quickly volatilizing, cleans cotton Ball is both needed to be opened and closed door back and forth when picking alcohol every time, is more troublesome, usability is limited；And the foul washed down is easily direct It falls on workbench, causes to be more troublesome when subsequent cleaning, labour degree is higher；And clean when need to have on the other hand to wafer flow into Row pressing is fixed, and is caused cleaning brush and cleaning cotton balls that can only be used alone, cannot be carried out simultaneously using influencing cleaning efficiency, make It is limited with effect.

Utility model content

In order to solve the above technical problems, the utility model provide one kind can facilitate to alcohol carry out use, improve usability； It is convenient simultaneously that the foul fallen after cleaning is cleared up, reduce labour degree；And can be fixed without hand by wafer flow, Cleaning brush and cleaning cotton balls is set to be carried out simultaneously using raising cleaning efficiency, the wafer flow for enhancing using effect is produced with clear Cleaning device.

A kind of wafer flow the production cleaning device, including workbench, holder, rack, cleaning of the utility model Brush and multiple groups clean cotton balls, and rack is arranged on the first half region of workbench top, and holder is arranged on rear side of workbench top, And placed cavity being provided in holder, and alcohol is contained in placed cavity, holder top is provided with pick-and-place mouth；Further include by Press pump, the Pressing pump setting press pump output terminal and are located at right above rack on picking and placing mouth, and Pressing pump input terminal is located at In placed cavity；It further include holding box and bearing piece, the bearing piece is arranged on workbench top, and holding box bottom end is provided with slot, and The bearing piece top is inserted into inside slot, and holding box top is provided with containing tank；It further include front supporting member and rear support, institute Stating rack includes left regulating part, left fixing piece, left rotation shaft, right regulating part, right fixing piece and right rotation shafts, left regulating part and Right regulating part is separately positioned in workbench top left region and right areas, and left regulating part and right regulating part are located at At left and right sides of holding box, the left rotation shaft and right rotation shafts are separately positioned on left regulating part and right regulating part, left fixing piece Left link slot and right link slot are respectively arranged in the middle part of left end and in the middle part of right fixing piece right end, and the left rotation shaft and right-hand rotation are dynamic Axis is inserted into respectively inside left link slot and right link slot, on the outside of left fixing piece left end and right fixing piece right end outside respectively with a left side Regulating part and the contact of right regulating part, the front supporting member and rear support are separately positioned on workbench top first half region and later half On region.

The utility model a kind of wafer flow production use cleaning device, the front supporting member include two groups of preceding thread pipes, Two groups of preceding thread bars, ball bearing and front end panel before two groups are provided in the left front region in workbench top and right forefoot area Preceding mounting groove, before ball bearing is separately positioned on two groups before two groups in mounting groove, two groups of preceding thread tube bottom end is inserted into respectively Before to two groups inside ball bearing, two groups of preceding thread bar bottom ends are inserted into respectively and are screwed on inside two groups of preceding thread tube top ends, institute It states front end panel to be located above holding box, and is connect respectively with two groups of preceding thread bar tops at left and right sides of front end panel bottom end.

The utility model a kind of wafer flow production use cleaning device, the rear support include two groups of rear thread pipes, Two groups of rear thread bars, ball bearing and rear bearing sheet after two groups are provided in the left back region in workbench top and right rear region Mounting groove afterwards, after ball bearing is separately positioned on two groups after two groups in mounting groove, two groups of rear thread tube bottom end is inserted into respectively After to two groups inside ball bearing, two groups of rear thread bar bottom ends are inserted into respectively and are screwed on inside two groups of rear thread tube top ends, institute It states rear bearing sheet to be located above holding box, and is connect respectively with two groups of rear thread bar tops at left and right sides of rear bearing sheet bottom end.

A kind of wafer flow production cleaning device of the utility model, the left regulating part includes left-hand thread pipe, left spiral shell Rasp bar, left ball bearing and left bearing piece, left mounting groove is provided in the left area of workbench top, and left ball bearing is arranged on a left side In mounting groove, left-hand thread tube bottom end is inserted into the pearl Bearing inner that rolls left, and left-hand thread bar bottom end is inserted into and is screwed on left-hand thread Inside tube top end, on left-hand thread bar top, left rotation shaft is arranged in left bearing piece right end for the left bearing piece setting.

A kind of wafer flow production cleaning device of utility model, the left fixing piece include left link block, upper left company Fishplate bar, lower-left connecting plate, the first threaded rod, the first rotating block and the first fixed plate, the left link block left end outside and left branch The outer side contacts of block right end, upper left connecting plate and lower-left connecting plate are separately positioned on left link block top and bottom end, the upper left It is provided with first through hole on connecting plate, and is provided with internal thread structure on first through hole inner sidewall, and first threaded rod Bottom end passes through and is screwed in first through hole, and first fixed plate is located at below the connecting plate of upper left, and the first fixed plate top It is connect with the first threaded rod bottom end, first rotating block is arranged in the first threaded rod tip.

A kind of wafer flow production cleaning device of the utility model, the right regulating part includes right-hand thread pipe, right spiral shell Rasp bar, right ball bearing and right bearing piece, right mounting groove is provided on the right half area of workbench top, and right ball bearing is arranged on the right side In mounting groove, right-hand thread tube bottom end is inserted into inside right ball bearing, and right-hand thread bar bottom end is inserted into and is screwed on right-hand thread Inside tube top end, on right-hand thread bar top, right rotation shafts are arranged in right bearing piece right end for the right bearing piece setting.

A kind of wafer flow production cleaning device of the utility model, the right fixing piece includes right link block, upper right Connecting plate, bottom right connecting plate, the second threaded rod, the second rotating block and the second fixed plate, the right link block right end outside and the right side Side contacts outside bearing piece left end, upper right connecting plate and bottom right connecting plate are separately positioned on right link block top and bottom end, the right side It is provided with the second through-hole on upper junction plate, and is provided with internal thread structure in the second inner side wall of through hole, second threaded rod Bottom end passes through and is screwed on the second through-hole, and second fixed plate is located at below upper right connecting plate, and the second fixed plate top It is connect with the second threaded rod bottom end, second rotating block is arranged in the second threaded rod tip.

A kind of wafer flow production cleaning device of the utility model, further includes two group of first antiskid plate and two group second Antiskid plate, two group of first antiskid plate are separately positioned on lower-left connecting plate top and bottom right connecting plate top, and two group second Antiskid plate is separately positioned on the first fixed plate bottom end and the second fixed plate bottom end.

A kind of wafer flow production cleaning device of the utility model, further includes two group of first stop collar, two group second Stop collar and two groups of third stop collars are provided with first annular groove on the overseas side wall of two groups of preceding threads pipe bottom half, Two group of first stop collar is set in two groups of first annular grooves, and two group of first stop collar Basolateral respectively with work The left front region in platform top is connected with right forefoot area, and the second annular is provided on the overseas side wall of two groups of rear threads pipe bottom half Groove, two group of second stop collar are set in two groups of second annular grooves, and two group of second stop collar Basolateral difference It connect with the left back region in workbench top and right rear region, is all provided on the left-hand thread pipe and the overseas side wall of right-hand thread pipe bottom half It is equipped with third annular groove, two groups of third stop collars are set on two groups of third annular grooves, and two groups of third stop collars Basolateral is connect with workbench top left area and right half area respectively.

A kind of wafer flow production cleaning device of the utility model, further includes storage box and knob, the workbench Placing groove is provided on the upper half area of front end, storage box is placed in placing groove, and the storage box top is provided with accommodating groove, clearly It scrubs and is both placed in accommodating groove with multiple groups cleaning cotton balls, the knob setting shakes hands to be located at placing groove in storage box front end It is interior.

Compared with prior art the utility model has the following beneficial effects: it can make it will be in holder by pushing Pressing pump Alcohol extract out and pass through its output end and spray, so that convenient use to alcohol, improve usability；It simultaneously can be by holding Box is collected the foul fallen after cleaning, and by removing holding box from workbench, so that convenient carry out it clearly Reason reduces labour degree；And wafer flow can be fixed by left fixing piece and right fixing piece, wafer is pressed without hand Flow is fixed, and cleaning brush and cleaning cotton balls is enable to be carried out simultaneously using improving cleaning efficiency, while by controlling left adjusting Part and right regulating part are adjusted left fixing piece and right fixing piece position, after fixing according to demand to wafer flow Position is adjusted, and enhances using effect.

Detailed description of the invention

Fig. 1 is the structural schematic diagram of the utility model；

Fig. 2 is the right view of Fig. 1；

Fig. 3 is the portion the A partial enlarged view of Fig. 1；

Fig. 4 is the portion the B partial enlarged view of Fig. 1；

It is attached marked in the figure: 1, workbench；2, holder；3, cleaning brush；4, cotton balls is cleaned；5, holding box；6, bearing piece；7, after Supporting element；8, left regulating part；9, left rotation shaft；10, right fixing piece；11, preceding thread bar；12, preceding ball bearing；13, front support Plate；14, rear thread pipe；15, rear bearing sheet；16, left-hand thread pipe；17, left ball bearing；18, upper left connecting plate；19, lower-left connects Fishplate bar；20, the first rotating block；21, the first fixed plate；22, right-hand thread bar；23, right bearing piece；24, right link block；25, the second spiral shell Rasp bar；26, the first antiskid plate；27, the second antiskid plate；28, the first stop collar；29, storage box；30, Pressing pump.

Specific embodiment

With reference to the accompanying drawings and examples, specific embodiment of the present utility model is described in further detail.Below Embodiment is not intended to limit the scope of the present invention for illustrating the utility model.

As shown in Figures 1 to 4, a kind of wafer flow production cleaning device of the utility model, including workbench 1, put It sets box 2, rack, cleaning brush 3 and multiple groups cleaning cotton balls 4, rack to be arranged on the first half region of workbench top, holder is set It sets on rear side of workbench top, and is provided with placed cavity in holder, and be contained with alcohol in placed cavity, holder top is set It is equipped with pick-and-place mouth；Further include Pressing pump 30, Pressing pump setting on picking and placing mouth, and press pump output terminal be located at rack just on Side, Pressing pump input terminal are located in the placement cavity；It further include holding box 5 and bearing piece 6, bearing piece is arranged in workbench top, holding box Bottom end is provided with slot, and bearing piece top is inserted into inside slot, and holding box top is provided with containing tank；It further include front supporting member With rear support 7, rack includes left regulating part 8, left fixing piece, left rotation shaft 9, right regulating part, right fixing piece 10 and turns right Moving axis, left regulating part and right regulating part are separately positioned in workbench top left region and right areas, and left regulating part and Right regulating part is located at left and right sides of holding box, and left rotation shaft and right rotation shafts are separately positioned on left regulating part and right regulating part On, left link slot and right link slot, and left rotation shaft are respectively arranged in the middle part of left fixing piece left end and in the middle part of right fixing piece right end It is inserted into respectively with right rotation shafts inside left link slot and right link slot, on the outside of left fixing piece left end and on the outside of right fixing piece right end Contacted respectively with left regulating part and right regulating part, front supporting member and rear support be separately positioned on workbench top first half region and On later half region；It can make it extract the alcohol in holder out and pass through its output end to spray by pushing Pressing pump, thus It is convenient that alcohol is carried out to use raising usability；The foul fallen after cleaning can be collected by holding box, and led to simultaneously It crosses and removes holding box from workbench, so that convenient clear up it, reduce labour degree；And can by left fixing piece and Wafer flow is fixed in right fixing piece, is fixed without hand by wafer flow, enables cleaning brush and cleaning cotton balls It is carried out simultaneously using improving cleaning efficiency, while by controlling left regulating part and right regulating part to left fixing piece and right fixing piece Position is adjusted, and so as to be adjusted according to demand to position of the wafer flow after fixed, enhances using effect.

A kind of wafer flow production cleaning device of the utility model, front supporting member includes two groups of preceding thread pipes, two groups Ball bearing 12 and front end panel 13 before 11, two groups of preceding thread bar are respectively provided in the left front region in workbench top and right forefoot area There is preceding mounting groove, before ball bearing is separately positioned on two groups before two groups in mounting groove, two groups of preceding thread tube bottom ends are inserted into respectively Before two groups inside ball bearing, two groups of preceding thread bar bottom ends are inserted into respectively and are screwed on inside two groups of preceding thread tube top ends, preceding branch Fagging is located above holding box, and connect respectively with two groups of preceding thread bar tops at left and right sides of front end panel bottom end；It can pass through Helicitic texture makes two groups of preceding thread bars by two groups of preceding thread control of rotation simultaneously and front end panel is driven to move up and down, with Just front supporting member height is adjusted according to demand, improves adaptability.

A kind of wafer flow production cleaning device of the utility model, rear support includes two groups of rear thread pipes 14, two Group rear thread bar, ball bearing and rear bearing sheet 15 after two groups are provided in the left back region in workbench top and right rear region Mounting groove afterwards, after ball bearing is separately positioned on two groups after two groups in mounting groove, two groups of rear thread tube bottom ends are inserted into two respectively After group inside ball bearing, two groups of rear thread bar bottom ends are inserted into respectively and are screwed on inside two groups of rear thread tube top ends, rear support Plate is located above holding box, and connect respectively with two groups of rear thread bar tops at left and right sides of rear bearing sheet bottom end；It can pass through spiral shell Line structure makes two groups of rear thread bars by two groups of rear thread control of rotation simultaneously and rear bearing sheet is driven to move up and down, so as to Rear support height is adjusted according to demand, improves adaptability.

A kind of wafer flow production cleaning device of the utility model, left regulating part includes left-hand thread pipe 16, left-hand thread Bar, left ball bearing 17 and left bearing piece, left mounting groove is provided in the left area of workbench top, and left ball bearing is arranged on a left side In mounting groove, left-hand thread tube bottom end is inserted into the pearl Bearing inner that rolls left, and left-hand thread bar bottom end is inserted into and is screwed on left-hand thread tube top End is internal, and on left-hand thread bar top, left rotation shaft is arranged in left bearing piece right end for left bearing piece setting；It can be led to by helicitic texture The overwinding screwed pipe control left-hand thread bar that turns left drives left fixing piece to move up and down, so as to according to demand to left fixing piece height It is adjusted, improves adaptability.

A kind of wafer flow production cleaning device of utility model, left fixing piece includes left link block, upper left connecting plate 18, lower-left connecting plate 19, the first threaded rod, the first rotating block 20 and the first fixed plate 21, left link block left end outside and left branch The outer side contacts of block right end, upper left connecting plate and lower-left connecting plate are separately positioned on left link block top and bottom end, upper left connection It is provided with first through hole on plate, and is provided with internal thread structure on first through hole inner sidewall, and the first threaded rod bottom end passes through And be screwed in first through hole, the first fixed plate is located at below the connecting plate of upper left, and the first fixed plate top and the first threaded rod Bottom end connection, the first rotating block are arranged in the first threaded rod tip；It can be by being inserted into upper left connection for wafer flow left end It between plate and lower-left connecting plate, then rotates the first rotating block and the first threaded rod is driven to move down, thus fixed by first Plate is fixed wafer flow left end.

A kind of wafer flow production cleaning device of the utility model, right regulating part includes right-hand thread pipe, right-hand thread bar 22, right ball bearing and right bearing piece 23, right mounting groove is provided on the right half area of workbench top, and right ball bearing is arranged on the right side In mounting groove, right-hand thread tube bottom end is inserted into inside right ball bearing, and right-hand thread bar bottom end is inserted into and is screwed on right-hand thread tube top End is internal, and on right-hand thread bar top, right rotation shafts are arranged in right bearing piece right end for right bearing piece setting；It can be led to by helicitic texture The overwinding screwed pipe control right-hand thread bar that turns right drives right fixing piece to move up and down, so as to according to demand to right fixing piece height It is adjusted, improves adaptability.

A kind of wafer flow production cleaning device of the utility model, right fixing piece include right link block 24, upper right company Fishplate bar, bottom right connecting plate, the second threaded rod 25, the second rotating block and the second fixed plate, right link block right end outside and right bearing piece Side contacts outside left end, upper right connecting plate and bottom right connecting plate are separately positioned on right link block top and bottom end, upper right connecting plate On be provided with the second through-hole, and internal thread structure is provided in the second inner side wall of through hole, the second threaded rod bottom end passes through and spiral shell On the second through-hole, the second fixed plate is located at below upper right connecting plate, and the second fixed plate top and the second threaded rod bottom end Connection, the second rotating block are arranged in the second threaded rod tip；It can by by wafer flow right end be inserted into upper right connecting plate and Between the connecting plate of bottom right, then rotates the second rotating block and the second threaded rod is driven to move down, by the second fixed plate to wafer Flow right end is fixed.

A kind of wafer flow production cleaning device of the utility model further includes two group of first antiskid plate 26 and two groups the Two antiskid plates 27, two group of first antiskid plate are separately positioned on lower-left connecting plate top and bottom right connecting plate top, and two group second Antiskid plate is separately positioned on the first fixed plate bottom end and the second fixed plate bottom end；It can increase frictional force, enhance to wafer flow The fixed effect of piece.

A kind of wafer flow production cleaning device of the utility model further includes two group of first stop collar 28, two groups the Two stop collars and two groups of third stop collars, are provided with first annular groove on two groups of overseas side walls of preceding thread pipe bottom half, and two Group the first stop collar be set in two groups of first annular grooves, and two group of first stop collar Basolateral respectively with workbench The left front region in top is connected with right forefoot area, is provided with second annular groove on two groups of overseas side walls of rear thread pipe bottom half, Two group of second stop collar is set in two groups of second annular grooves, and two group of second stop collar Basolateral respectively with work The left back region in platform top is connected with right rear region, is provided with third ring on left-hand thread pipe and the overseas side wall of right-hand thread pipe bottom half Connected in star, two groups of third stop collars are set on two groups of third annular grooves, and two groups of third stop collar Basolaterals point It is not connect with workbench top left area and right half area；It can enhance preceding thread pipe, rear thread pipe, left-hand thread pipe and right spiral shell Stability between line pipe and workbench.

A kind of wafer flow production cleaning device of the utility model further includes storage box 29 and is shaken hands, before workbench End is provided with placing groove on upper half area, and storage box is placed in placing groove, and storage box top is provided with accommodating groove, cleaning brush and Multiple groups cleaning cotton balls is both placed in accommodating groove, and knob setting shakes hands to be located in placing groove in storage box front end；It can facilitate Storage placement is carried out to cleaning brush and multiple groups cleaning cotton balls, improves usability.

A kind of wafer flow production cleaning device of the utility model, when in use by wafer flow left and right ends point It is not inserted between upper left connecting plate and lower-left connecting plate and upper right connecting plate and bottom right connecting plate, then rotates the first rotation Block drives the first threaded rod to move down, and is fixed by the first fixed plate to wafer flow left end, then rotates the Two rotating blocks drive the second threaded rod to move down, and are fixed by the second fixed plate to wafer flow right end, later Left-hand thread pipe is rotated simultaneously and right-hand thread manages left-hand thread bar and right-hand thread bar processed and a wafer flow left side is driven to move up and down, with Just the left height of wafer flow is adjusted according to demand, Pressing pump is pushed after adjusting extracts it by the alcohol in holder out And wafer flow on piece is ejected by its output end, then the ink of wafer flow on piece is carried out by cleaning cotton balls and cleaning brush Cleaning；Rotatable wafer flow makes left rotation shaft and right rotation shafts respectively in left link slot and right link slot in the above process It is inside rotated, overturn or be adjusted its angle to wafer flow, and two groups can be rotated simultaneously after the adjustment Preceding thread pipe and two groups of rear thread control two groups of preceding thread bars of system and two groups of rear thread bars drive front end panel and rear support respectively Plate moves up and down, and contacts front end panel and rear bearing sheet with wafer flow bottom end front and rear sides respectively, thus to wafer Flow is supported fixation；The foul fallen after cleaning can be collected by holding box in cleaning process, and by that will contain It puts box to remove from workbench, so that convenient clear up it, reduces labour degree.

A kind of wafer flow production cleaning device of the utility model, mounting means, connection type or set-up mode It is common mechanical mode, is implemented as long as the equal of its advantages can be reached；And the model of above-mentioned each component is not Limit, is implemented as long as can reach the equal of its advantages.

The above is only the preferred embodiment of the utility model, it is noted that for the common skill of the art For art personnel, without deviating from the technical principle of the utility model, several improvements and modifications can also be made, these change It also should be regarded as the protection scope of the utility model into modification.

Claims (10)

1. a kind of wafer flow production cleaning device, including workbench (1), holder (2), rack, cleaning brush (3) and more Group cleaning cotton balls (4), rack are arranged on the first half region of workbench top, and holder is arranged on rear side of workbench top, and It is provided with placed cavity in holder, and is contained with alcohol in placed cavity, holder top is provided with pick-and-place mouth；Its feature exists In further including Pressing pump (30), Pressing pump setting presses pump output terminal and be located at right above rack on picking and placing mouth, presses It is located in the placement cavity to pump input terminal；It further include holding box (5) and bearing piece (6), bearing piece is arranged in workbench top, holding box bottom end It is provided with slot, and bearing piece top is inserted into inside slot, holding box top is provided with containing tank；It further include front supporting member with after Supporting element (7), rack include left regulating part (8), left fixing piece, left rotation shaft (9), right regulating part, right fixing piece (10) and Right rotation shafts, left regulating part and right regulating part are separately positioned in workbench top left region and right areas, and left adjusting Part and right regulating part are located at left and right sides of holding box, and left rotation shaft and right rotation shafts are separately positioned on left regulating part and right tune It saves on part, left link slot and right link slot is respectively arranged in the middle part of left fixing piece left end and in the middle part of right fixing piece right end, and turn left Moving axis and right rotation shafts are inserted into respectively inside left link slot and right link slot, left fixing piece left end outside and right fixing piece right end Outside is contacted with left regulating part and right regulating part respectively, and front supporting member and rear support are separately positioned on workbench top first half area On domain and later half region.

2. a kind of wafer flow production cleaning device as described in claim 1, which is characterized in that the front supporting member includes Two groups of preceding thread pipes, two groups of preceding thread bars (11), ball bearing (12) and front end panel (13), workbench top are left front before two groups Preceding mounting groove, before ball bearing is separately positioned on two groups before two groups in mounting groove, two groups are provided on region and right forefoot area Before preceding thread tube bottom end is inserted into two groups respectively inside ball bearing, two groups of preceding thread bar bottom ends are inserted into respectively and are screwed on two groups Inside preceding thread tube top end, front end panel is located above holding box, and at left and right sides of front end panel bottom end respectively with two groups before spiral shell The connection of rasp bar top.

3. a kind of wafer flow production cleaning device as claimed in claim 2, which is characterized in that the rear support includes Two groups of rear thread pipes (14), two groups of rear thread bars, ball bearing and rear bearing sheet (15) after two groups, the left back region in workbench top With rear mounting groove is provided in right rear region, after ball bearing is separately positioned on two groups after two groups in mounting groove, spiral shell after two groups After line tube bottom end is inserted into two groups respectively inside ball bearing, spiral shell after two groups of rear thread bar bottom ends are inserted into respectively and are screwed on two groups Inside line tube top end, rear bearing sheet is located above holding box, and at left and right sides of rear bearing sheet bottom end respectively with two groups of rear thread bars Top connection.

4. a kind of wafer flow production cleaning device as claimed in claim 3, which is characterized in that the left regulating part includes Left-hand thread pipe (16), left-hand thread bar, left ball bearing (17) and left bearing piece are provided with left installation in the left area of workbench top Slot, left ball bearing are arranged in left mounting groove, and left-hand thread tube bottom end is inserted into the pearl Bearing inner that rolls left, and left-hand thread bar bottom end is inserted Enter and be screwed on inside left-hand thread tube top end, on left-hand thread bar top, left rotation shaft is arranged in left bearing piece right end for left bearing piece setting.

5. a kind of wafer flow production cleaning device as claimed in claim 4, which is characterized in that the left fixing piece includes Left link block, upper left connecting plate (18), lower-left connecting plate (19), the first threaded rod, the first rotating block (20) and the first fixed plate (21), with the outer side contacts of left bearing piece right end on the outside of left link block left end, upper left connecting plate and lower-left connecting plate are separately positioned on a left side On link block top and bottom end, first through hole is provided on the connecting plate of upper left, and interior spiral shell is provided on first through hole inner sidewall Line structure, and the first threaded rod bottom end passes through and is screwed in first through hole, the first fixed plate is located at below the connecting plate of upper left, and First fixed plate top is connect with the first threaded rod bottom end, and the first rotating block is arranged in the first threaded rod tip.

6. a kind of wafer flow production cleaning device as claimed in claim 5, which is characterized in that the right regulating part includes Right-hand thread pipe, right-hand thread bar (22), right ball bearing and right bearing piece (23), workbench top are provided with right installation on right half area Slot, right ball bearing are arranged in right mounting groove, and right-hand thread tube bottom end is inserted into inside right ball bearing, and right-hand thread bar bottom end is inserted Enter and be screwed on inside right-hand thread tube top end, on right-hand thread bar top, right rotation shafts are arranged in right bearing piece right end for right bearing piece setting.

7. a kind of wafer flow production cleaning device as claimed in claim 6, which is characterized in that the right fixing piece includes Right link block (24), upper right connecting plate, bottom right connecting plate, the second threaded rod (25), the second rotating block and the second fixed plate, right company It connects with side contacts outside right bearing piece left end on the outside of block right end, upper right connecting plate and bottom right connecting plate are separately positioned on right link block top On bottom end, the second through-hole is provided on upper right connecting plate, and internal thread structure is provided in the second inner side wall of through hole, second Threaded rod bottom end passes through and is screwed on the second through-hole, and the second fixed plate is located at below upper right connecting plate, and the second fixed plate top End is connect with the second threaded rod bottom end, and the second rotating block is arranged in the second threaded rod tip.

8. a kind of wafer flow production cleaning device as claimed in claim 7, which is characterized in that further include two group first anti- Slide plate (26) and two group of second antiskid plate (27), two group of first antiskid plate are separately positioned on lower-left connecting plate top and connect with bottom right On plate top, two group of second antiskid plate is separately positioned on the first fixed plate bottom end and the second fixed plate bottom end.

9. a kind of wafer flow production cleaning device as claimed in claim 8, which is characterized in that described further includes two groups the One stop collar (28), two group of second stop collar and two groups of third stop collars are all provided on two groups of overseas side walls of preceding thread pipe bottom half It is equipped with first annular groove, two group of first stop collar is set in two groups of first annular grooves, and two group of first stop collar Basolateral is connect with the left front region in workbench top and right forefoot area respectively, on two groups of overseas side walls of rear thread pipe bottom half It is provided with second annular groove, two group of second stop collar is set in two groups of second annular grooves, and two group of second limit Ring Basolateral is connect with the left back region in workbench top and right rear region respectively, and left-hand thread pipe and right-hand thread pipe bottom half are overseas Third annular groove is provided on side wall, two groups of third stop collars are set on two groups of third annular grooves, and two groups Third stop collar Basolateral is connect with workbench top left area and right half area respectively.

10. a kind of wafer flow production cleaning device as claimed in claim 9, which is characterized in that described further includes storage Box (29) and knob, workbench front end are provided with placing groove on upper half area, and storage box is placed in placing groove, storage box top It is provided with accommodating groove, cleaning brush and multiple groups cleaning cotton balls are both placed in accommodating groove, and knob setting is shaken hands in storage box front end In placing groove.