CN208880518U - A kind of polishing proof mechanism of water and polishing machine - Google Patents

A kind of polishing proof mechanism of water and polishing machine Download PDF

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Publication number
CN208880518U
CN208880518U CN201821615176.8U CN201821615176U CN208880518U CN 208880518 U CN208880518 U CN 208880518U CN 201821615176 U CN201821615176 U CN 201821615176U CN 208880518 U CN208880518 U CN 208880518U
Authority
CN
China
Prior art keywords
polishing
proof mechanism
water
cylindrical sidewall
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201821615176.8U
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Chinese (zh)
Inventor
邬兴国
黄诚
谭琼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Nuofeng Photoelectric Equipment Co Ltd
Original Assignee
Shenzhen Nuofeng Photoelectric Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Nuofeng Photoelectric Equipment Co Ltd filed Critical Shenzhen Nuofeng Photoelectric Equipment Co Ltd
Priority to CN201821615176.8U priority Critical patent/CN208880518U/en
Application granted granted Critical
Publication of CN208880518U publication Critical patent/CN208880518U/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Abstract

The utility model discloses a kind of polishing proof mechanism of water and polishing machines.The polishing proof mechanism of water includes the cylindrical sidewall and rotatable circular base plate of both ends open, is connected between the circular base plate and the lower ending opening of the cylindrical sidewall by rotary type sealing structure, and polishing room is formed;At least sucker opening is offered on the chassis, the sucker is open the sucker for polishing machine to be arranged.The polishing proof mechanism of water can limit the splashing of polishing fluid, and have good waterproof leakproof effect.

Description

A kind of polishing proof mechanism of water and polishing machine
Technical field
The utility model relates to polish waterproof field more particularly to a kind of polishing proof mechanism of water and polishing machine.
Background technique
The glass cover-plate of mobile phone has one of polishing process in process of production, and in polishing process, polishing machine is needed with suction Disk drives glass cover-plate to be rotated, and glass cover-plate is made constantly to rub with polishing disk in polishing fluid.
During the polishing process, polishing fluid meeting splashes cause to waste, if polishing fluid is splashed on some dead angle positions, Such as on four corners, then be difficult to clear up, even, polishing fluid can the gap between in the gap of mechanical organ be flowed into electricity The region of subcomponent corrodes electronic component, leads to the damage of polishing machine.
Utility model content
In order to solve above-mentioned the deficiencies in the prior art, the utility model provides a kind of polishing proof mechanism of water and polishing machine.It should Polishing proof mechanism of water can limit the splashing of polishing fluid, and have good waterproof leakproof effect.
Technical problem to be solved in the utility model is achieved by the following technical programs:
A kind of polishing proof mechanism of water, is installed in polishing machine, cylindrical sidewall and rotatable circle including both ends open Chassis is connected between the circular base plate and the lower ending opening of the cylindrical sidewall by rotary type sealing structure, and polishing is formed Room;At least sucker opening is offered on the chassis, the sucker is open the sucker for polishing machine to be arranged.
Further, the lower end of the cylindrical sidewall is provided with leading chute, and the major flow slot is circumferentially positioned at described It places in the lower end of cylindrical sidewall and is connected to outside.
Further, it is connected between the circular base plate and the leading chute by rotary type sealing structure.
Further, the leading chute is the incline structure tilted down towards the liquid outlet being connected to outside.
Further, an at least stragith edge is provided in the leading chute.
Further, outer place of at least sucker opening is surrounded with split flow slot, and the split flow slot is dominated with described Chute connection.
Further, the split flow slot is the bevelled junction tilted down towards the communication port being connected to the leading chute Structure.
Further, an at least window opening is offered in the cylindrical sidewall, on the window opening and polishing machine Form position is tightly connected.
Further, motor opening, the motor opening and the motor position on polishing machine are offered in the cylindrical sidewall It is tightly connected.
A kind of polishing machine, including above-mentioned polishing proof mechanism of water.
The utility model has the following beneficial effects: the polishing proof mechanism of water can limit the splashing of polishing fluid, polishing is saved Liquid can be avoided some dead angle positions that polishing fluid is splashed to polishing machine, be convenient to clean, and there is good waterproof leakproof to make With can be avoided the region that polishing fluid is flowed into electronic component from the gap of mechanical organ, protect polishing machine.
Detailed description of the invention
Fig. 1 is the schematic diagram of polishing machine provided by the utility model;
Fig. 2 is the cross-sectional view of polishing proof mechanism of water provided by the utility model;
Fig. 3 is enlarged drawing at the B of polishing proof mechanism of water shown in Fig. 2;
Fig. 4 is enlarged drawing cross-sectional view at another B of polishing proof mechanism of water shown in Fig. 2.
Specific embodiment
The utility model is described in detail with reference to the accompanying drawings and examples.
Embodiment one
As illustrated in fig. 1 and 2, a kind of polishing proof mechanism of water, is installed in polishing machine, the cylindrical sidewall 1 including both ends open With rotatable circular base plate 2, sealed between the circular base plate 2 and the lower ending opening of the cylindrical sidewall 1 by rotary type Structure connection, forms polishing room;At least sucker opening 21 is offered on the chassis, the sucker opening 21 is thrown for being arranged The sucker of ray machine.
When in use, liquid feed device supplies polishing fluid into polishing room by the upper end opening of the cylindrical sidewall 1, polishing When liquid splashes outward during the polishing process, understand under being kept off by the cylindrical sidewall 1, and flow to the institute of lower end along the cylindrical sidewall 1 It states on chassis, and is connected using rotary type sealing structure between the chassis and cylindrical sidewall 1, neither influence the chassis Rotation, can also prevent polishing fluid from flowing to outside polishing room.
The polishing proof mechanism of water can limit the splashing of polishing fluid, save polishing fluid, can be avoided polishing fluid and be splashed to polishing Some dead angle position A of machine, are convenient to clean, and have good waterproof leakproof effect, can be avoided polishing fluid from mechanical organ Gap in be flowed into the region of electronic component, protect polishing machine.
Some dead angle position A in polishing machine are located substantially on its four internal corner, in existing polishing machine, this Dead angle position A on four corners also belongs to a part of polishing room, the cylindrical sidewall 1 and circular base plate 2 formation of this case The generally cylindrical space of polishing room, the dead angle position A on four corners has been isolated.
The lower end of the cylindrical sidewall 1 is provided with leading chute 11, and the leading chute 11 is circumferentially positioned at the tubular It places in the lower end of side wall 1 and is connected to outside.
When in use, it by the polishing fluid under the cylindrical sidewall 1 gear, flows downstream into the leading chute 11, and with institute The guidance for stating leading chute 11 flow to external formation waste liquid from the liquid outlet on the leading chute 11.Connect on the liquid outlet It is connected with outlet tube 3.
The leading chute 11 is the incline structure tilted down towards the liquid outlet being connected to outside.
When in use, the polishing fluid in the leading chute 11 under the effect of gravity, along inclined direction flow to institute State liquid outlet.
It is connected between the circular base plate 2 and the leading chute 11 by rotary type sealing structure, it is preferable that described turn Dynamic formula sealing structure is labyrinth non-contact sealing structure.
Specifically, the periphery of the circular base plate 2 is turned down into the leading chute 11, formed and the leading chute 11 The opposite lower folding wall 24 of annular of internal ring wall 13.
In one embodiment, as shown in figure 3, the lower folding wall 24 of annular is towards being provided in the one side of the internal ring wall 13 First concaveconvex structure 241, the internal ring wall 13 is towards being provided with the second concaveconvex structure in the one side of the lower folding wall 24 of annular 131;It is adapted between first concaveconvex structure 241 and the second concaveconvex structure 131, so that first concaveconvex structure 241 is stretched Enter into second concaveconvex structure 131, and forms labyrinth gap 6 between second concaveconvex structure 131.
First concaveconvex structure 241 and the second concaveconvex structure 131 can be the waveform concaveconvex structure etc. being mutually adapted, It is not specifically limited herein.
In another embodiment, the first of at least one fold turns over as shown in figure 4, the lower folding wall 24 of the annular is formed Folded structure 242, the internal ring wall 13, which is formed, has the second turnover structure 132 at least turned down together;First turnover structure 242 and second are adapted between turnover structure 132, so that first turnover structure 242 extend into second turnover structure In 132, and labyrinth gap 6 is formed between second turnover structure 132.
First turnover structure 242 and the second turnover structure 132 can be the waveform turnover structure being mutually adapted or Rectangular-ambulatory-plane turnover structure etc., is not specifically limited herein.
Preferably, lubricating grease can be filled up in the labyrinth gap 6.
Outer place of at least sucker opening 21 is surrounded with annular retaining wall 211, and the annular retaining wall 211 is for blocking polishing Liquid prevents polishing fluid to be flowed into the sucker opening 21.
Preferably, an at least sucker opening 21 outer place be surrounded with split flow slot 22, the split flow slot 22 with it is described Leading chute 11 is connected to.
When in use, the polishing fluid near the sucker opening 21 can flow into the split flow slot 22, and with described point The guidance of diversion trench 22 flows into the leading chute 11 from the communication port on the split flow slot 22, avoids polishing fluid in institute Sucker opening 21 is stated to collect around.
The split flow slot 22 is the incline structure tilted down towards the communication port being connected to the leading chute 11.
When in use, the polishing fluid in the split flow slot 22 under the effect of gravity, along inclined direction flows into institute It states in leading chute 11.
Polishing fluid is solidliquid mixture, and the inside is mixed with the polishing powder of a large amount of sand-likes, during water conservancy diversion, polishing powder It may be deposited in the leading chute 11, therefore, an at least stragith edge 12 is provided in the leading chute 11, it is described to scrape Sand plate 12 is for manually or automatically scraping the polishing powder being deposited in the leading chute 11.
Outer place of the circular base plate 2 extends a ring segment 23, and the ring segment 23 protrudes on the stragith edge 12 In corresponding card slot, the stragith edge 12 is limited in the leading chute 11.
Form position and motor position are provided on the side of polishing machine, the form position is for installing glass door 4, to facilitate skill Art personnel check inside polishing machine that the motor position is for installing driving motor 5, to drive polishing disk to be rotated.
Therefore, an at least window opening, the form on the window opening and polishing machine are offered in the cylindrical sidewall 1 Position is tightly connected;Motor opening is offered in the cylindrical sidewall 1, the motor opening is sealed with the motor position on polishing machine to be connected It connects.
Specifically, the window opening and motor opening turn down form position and the motor for extending to the polishing machine outward It is connected and sealed on position.Preferably, it is open and the motor between the window opening and the form position with the motor It is also connected using non-contacting sealing structure between position, with easy to disassemble.
Embodiment two
A kind of polishing machine, including polishing proof mechanism of water described in embodiment one.
The above-mentioned embodiments merely express the embodiments of the present invention, and the description thereof is more specific and detailed, but simultaneously Therefore it cannot be interpreted as that a limitation on the scope of the patent of the present invention, as long as using the form institute of equivalent substitution or equivalent transformation The technical solution of acquisition, shall fall within the scope of the present invention.

Claims (10)

1. a kind of polishing proof mechanism of water, which is characterized in that be installed in polishing machine, the cylindrical sidewall including both ends open and can revolve The circular base plate turned, is connected between the circular base plate and the lower ending opening of the cylindrical sidewall by rotary type sealing structure, Form polishing room;At least sucker opening is offered on the chassis, the sucker is open the sucker for polishing machine to be arranged.
2. polishing proof mechanism of water according to claim 1, which is characterized in that the lower end of the cylindrical sidewall is provided with leading Chute, the major flow slot, which is circumferentially positioned in the lower end of the cylindrical sidewall, to be placed and is connected to outside.
3. polishing proof mechanism of water according to claim 2, which is characterized in that the circular base plate and the leading chute it Between connected by rotary type sealing structure.
4. polishing proof mechanism of water according to claim 2, which is characterized in that the leading chute is to be connected to towards with outside The incline structure that liquid outlet tilts down.
5. polishing proof mechanism of water according to claim 2, which is characterized in that be provided at least one in the leading chute and scrape Sand plate.
6. according to the polishing proof mechanism of water any in claim 2-5, which is characterized in that the periphery of at least sucker opening On be surrounded with split flow slot, the split flow slot is connected to the leading chute.
7. polishing proof mechanism of water according to claim 6, which is characterized in that the split flow slot is court and the major flow The incline structure that the communication port of slot connection tilts down.
8. polishing proof mechanism of water according to claim 1, which is characterized in that offer at least one view in the cylindrical sidewall Window opening, the window opening are tightly connected with the form position on polishing machine.
9. polishing proof mechanism of water according to claim 1 or 8, which is characterized in that offer motor in the cylindrical sidewall Opening, the motor opening are tightly connected with the motor position on polishing machine.
10. a kind of polishing machine, which is characterized in that including the polishing proof mechanism of water any in claim 1-9.
CN201821615176.8U 2018-09-30 2018-09-30 A kind of polishing proof mechanism of water and polishing machine Expired - Fee Related CN208880518U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201821615176.8U CN208880518U (en) 2018-09-30 2018-09-30 A kind of polishing proof mechanism of water and polishing machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201821615176.8U CN208880518U (en) 2018-09-30 2018-09-30 A kind of polishing proof mechanism of water and polishing machine

Publications (1)

Publication Number Publication Date
CN208880518U true CN208880518U (en) 2019-05-21

Family

ID=66515064

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201821615176.8U Expired - Fee Related CN208880518U (en) 2018-09-30 2018-09-30 A kind of polishing proof mechanism of water and polishing machine

Country Status (1)

Country Link
CN (1) CN208880518U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109227397A (en) * 2018-09-30 2019-01-18 深圳市诺峰光电设备有限公司 A kind of polishing proof mechanism of water and polishing machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109227397A (en) * 2018-09-30 2019-01-18 深圳市诺峰光电设备有限公司 A kind of polishing proof mechanism of water and polishing machine

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CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20190521