CN208815104U - Solar heat reflecting film structure - Google Patents
Solar heat reflecting film structure Download PDFInfo
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- CN208815104U CN208815104U CN201821504453.8U CN201821504453U CN208815104U CN 208815104 U CN208815104 U CN 208815104U CN 201821504453 U CN201821504453 U CN 201821504453U CN 208815104 U CN208815104 U CN 208815104U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Abstract
A kind of solar heat reflecting film structure includes metal substrate, the first bombardment active layer, bonding bottom, the first bonding series of strata, dielectric series of strata, electrically conducting transparent adhesive layer, function reflecting layer, principal reflection layer, the second bonding series of strata, the second bombardment active layer and transparent protective layer from the inside to the outside.Such stabilized structure, has high light reflectivity at high reliablity.
Description
Technical field
The utility model relates to photothermal technique field, especially a kind of solar heat reflecting film structure.
Background technique
Existing solar heat energy reflection film base material is all made of glass, is easily broken, quality is big and not readily transportable, is mounted on
It is easy when outdoor by hail equivalent damage.Light reflectivity does not reach requirement if directlying adopt metal material.
Utility model content
In view of this, the present invention provides a kind of stabilized structure, high reliablity, the sunlight with high light reflectivity
Thermal reflecting coating structure, to solve the above problems.
A kind of solar heat reflecting film structure includes metal substrate (10), the first bombardment active layer (20), bonding from the inside to the outside
Bottom (30), the first bonding series of strata (40), dielectric series of strata (50), electrically conducting transparent adhesive layer (60), function reflecting layer (70), master are anti-
Penetrate layer (80), the second bonding series of strata (90), the second bombardment active layer (110) and transparent protective layer (120), the metal substrate
It (10) is strip mirror roll material, with a thickness of 0.3-0.4mm；It is described bonding bottom (30) with a thickness of 10nm；First bonding
The thickness of series of strata (40) is less than 1nm；The dielectric series of strata (50) with a thickness of 40nm；The conductive adhesion layer (60) with a thickness of
1nm；The function reflecting layer (70) with a thickness of 40nm；The thickness of the principal reflection layer (80) is greater than or equal to 100nm, described
The thickness of second bonding series of strata (90) is less than 1nm；The thickness of the transparent protective layer (120) is greater than or equal to 200nm.
Further, the principal reflection layer (80) with a thickness of 110-150nm.
Further, the transparent protective layer (120) with a thickness of 210-250nm.
Further, first bombardment active layer (20) is in vacuum ionic Pvd equipment by hollow cathode
Discharge assembly carries out aura to the side of metal substrate (10) and cleans to be formed.
Further, there is the first bombardment active layer to metal substrate (10) in vacuum ionic Pvd equipment
(20) side fine aluminium target simultaneously penetrates method preparation bonding bottom (30) using intermediate frequency line.
Further, in vacuum ionic Pvd equipment, titanium dioxide target is used simultaneously to bonding bottom (30)
Using the first bonding series of strata (40) of radio frequency sputtering method preparation.
Further, in vacuum ionic Pvd equipment, existed by titanium dioxide and silica alternating deposit
Dielectric series of strata (50) are formed in first bonding series of strata (40).
Further, in vacuum ionic Pvd equipment, with Al-Doped ZnO target and mid frequency sputtering is used
Method forms conductive adhesion layer (60) on dielectric series of strata (50).
Further, in vacuum ionic Pvd equipment, exist with electrolysis copper target material and using mid frequency sputtering method
Function reflecting layer (70) are formed on conductive adhesion layer (60).
Further, in vacuum ionic Pvd equipment, with fine silver target and using mid frequency sputtering method in function
Principal reflection layer (80) can be formed on reflecting layer (70).
Compared with prior art, the solar heat reflecting film structure of the utility model include from the inside to the outside metal substrate (10),
First bombardment active layer (20), bonding bottom (30), the first bonding series of strata (40), dielectric series of strata (50), electrically conducting transparent adhesive layer
(60), function reflecting layer (70), principal reflection layer (80), the second bonding series of strata (90), the second bombardment active layer (110) and transparent anti-
Sheath (120), the metal substrate (10) is strip mirror roll material, with a thickness of 0.3-0.4mm；The thickness of bonding bottom (30)
Degree is 10nm；The thickness of first bonding series of strata (40) is less than 1nm；The dielectric series of strata (50) with a thickness of 40nm；It is described
Conductive adhesion layer (60) with a thickness of 1nm；The function reflecting layer (70) with a thickness of 40nm；The thickness of the principal reflection layer (80)
Degree is greater than or equal to 100nm, and the thickness of second bonding series of strata (90) is less than 1nm；The thickness of the transparent protective layer (120)
More than or equal to 200nm.Such stabilized structure, has high light reflectivity at high reliablity.
Detailed description of the invention
The embodiments of the present invention are described below in conjunction with attached drawing, in which:
Fig. 1 is the schematic cross-section of solar heat reflecting film structure provided by the utility model.
Specific embodiment
Specific embodiment of the utility model is further elaborated below based on attached drawing.It should be understood that
The explanation of the utility model embodiment is not used to herein to limit the protection scope of the utility model.
Referring to FIG. 1, solar heat reflecting film structure provided by the utility model includes metal substrate 10, first from the inside to the outside
Bombard active layer 20, bonding bottom 30, first bonds series of strata 40, dielectric series of strata 50, electrically conducting transparent adhesive layer 60, function reflecting layer
70, principal reflection layer 80, second bonds the bombardment active layer 110 of series of strata 90, second and transparent protective layer 120.
Metal substrate 10 is strip mirror roll material, with a thickness of 0.3-0.4mm.
In vacuum ionic Pvd equipment, by hollow cathode discharge component to metal substrate 10 by surfacing into
Row aura cleaning so that metal substrate 10 by the surface cleaning of surfacing and establish the first bombardment active layer 20, increase its film base
Binding force, i.e., convenient in conjunction with other layer of structure.
In vacuum ionic Pvd equipment, there is the side of the first bombardment active layer 20 to use metal substrate 10
Fine aluminium target simultaneously penetrates method preparation bonding bottom 30 using intermediate frequency line, and the thickness of bonding bottom 30 is about 10nm.
In vacuum ionic Pvd equipment, to the bonding titanium dioxide (TiO of bottom 302) target and using penetrating
RF sputtering method preparation the first bonding series of strata 40.The film layer has the effect taken over from the past and set a new course for the future, i.e., has between Nian Jie bottom 30 good
Associativity, also have stronger affinity to subsequent film.The thickness of first bonding series of strata 40 is less than 1nm.
In vacuum ionic Pvd equipment, by titanium dioxide (TiO2) and silica (SiO2) alternating deposit
Dielectric series of strata 50 are formed in the first bonding series of strata 40.Oxygen reactive sputtering is led to by Titanium target and forms titanium dioxide, by monocrystalline
Silicon target leads to oxygen reactive sputtering and forms silica, to prevent target from aoxidizing and keeping high sputtering raste, in vacuum ionic physics gas
Equipped with spectrum control probe and target voltage controller in phase depositing device.The membrane system has the refractive index of very little and has antireflective effect,
For supplementing broader spectrum of light wave reflection rate.The thickness of dielectric series of strata 50 is about 40nm.
In vacuum ionic Pvd equipment, exist with Al-Doped ZnO (ZAO) target and using mid frequency sputtering method
Conductive adhesion layer 60 is formed in dielectric series of strata 50, which has anti-static electricity interference effect and increase the effect of broad-spectrum light reflection.
The thickness of conductive adhesion layer 60 is about 1nm.
In vacuum ionic Pvd equipment, with electrolysis copper target material and using mid frequency sputtering method in conductive adhesion layer
Function reflecting layer 70 is formed on 60, for supplementing the film layer defect and auxiliary long-wave band light reflection of principal reflection layer 80.Function reflection
The thickness of layer 70 is about 40nm.
In vacuum ionic Pvd equipment, with fine silver target and using mid frequency sputtering method in function reflecting layer 70
Upper formation principal reflection layer 80, because silver all has high reflectivity, price and relatively reasonable (only price of gold lattice to visible spectrum
1%).By the reflectivity curve to light it is found that aluminium film is advantageous in lower frequency of light wave section, and in hot spectrum segment (the long glistening light of waves
Spectral coverage) it is more silver-colored differ greatly, though copper and Jin Re spectrum segment have a comparativity, much narrower than silver of reflection frequency range, it means that
Much lower is wanted to the utilization rate of photothermal reflectance, and the price of gold is prohibitively expensive.The thickness of principal reflection layer 80 is greater than or equal to
100nm, preferably 110-150nm.
In vacuum ionic Pvd equipment, to the titanium dioxide (TiO of principal reflection layer 802) target and using penetrating
RF sputtering legal system prepares standby second bonding series of strata 90, and effect is similar to the first bonding series of strata 40.The thickness of second bonding series of strata 90
Degree is less than 1nm.
In vacuum ionic Pvd equipment, aura cleaning is carried out to a side of the second bonding series of strata 90,
So that second bonds 90 surface cleaning of series of strata and establish the second bombardment active layer 110, increase its film-substrate cohesion.
Transparent protective layer 120 is made using aluminium oxide and using electron beam evaporation method, with preferable hardness, protective
Can, transparency is higher, improves light through effect even not reducing, self-cleaning is preferable, and adhesiveness is small.The thickness of transparent protective layer 120
Degree is greater than or equal to 200nm, preferably 210-250nm.For transparent protective layer 120 when with a thickness of 150-250nm, transmitance is good,
Friction test proof can substantially meet the protection effect to silverskin, and when with a thickness of 200-300nm, light transmittance is enhanced, and prevent
It is more preferable to protect effect, then effect increases unobvious, apprentice's increasing cost when being greater than 300nm.Electron beam evaporation method makes transparent protective layer 120
Method specifically: form a film on the aluminium sheet of 1500 breadth, select 2 vacuum chambers, 7 electron beam guns arranged side by side that interlock whole to obtain
The uniformity of breadth film layer, electron gun power are 10000~30000V/1~3A, and every 20~50KW, evaporation rate is up to 3-
15u grades.In order to the film layer of required thickness is matched and obtained with the speed of travel, being controlled by plating angle for substrate is controlled.
Compared with prior art, the solar heat reflecting film structure of the utility model includes metal substrate 10, from the inside to the outside
One bombardment active layer 20, bonding bottom 30, first bond series of strata 40, dielectric series of strata 50, electrically conducting transparent adhesive layer 60, function reflection
Layer 70, principal reflection layer 80, second bond series of strata 90, second and bombard active layer 110 and transparent protective layer 120, the metal substrate
10 be strip mirror roll material, with a thickness of 0.3-0.4mm；It is described bonding bottom 30 with a thickness of 10nm；The first bonding series of strata
40 thickness is less than 1nm；The dielectric series of strata 50 with a thickness of 40nm；The conductive adhesion layer 60 with a thickness of 1nm；The function
Can reflecting layer 70 with a thickness of 40nm；The thickness of the principal reflection layer 80 is greater than or equal to 100nm, the second bonding series of strata 90
Thickness be less than 1nm；The thickness of the transparent protective layer 120 is greater than or equal to 200nm.Learn that there is above-mentioned layer by actual measurement
Shape structure and the solar heat reflecting film structure in corresponding thickness range, stabilized structure, high reliablity simultaneously have high light
Reflectivity.
The above is only the preferred embodiments of the utility model, are not used to the limitation protection scope of the utility model, any
Modification, equivalent replacement or improvement within the spirit of the present invention etc. are all covered in the scope of the claims of the utility model.
Claims (10)
1. a kind of solar heat reflecting film structure, it is characterised in that: from the inside to the outside include metal substrate (10), the first bombardment active layer
(20), bottom (30), the first bonding series of strata (40), dielectric series of strata (50), electrically conducting transparent adhesive layer (60), function reflecting layer are bonded
(70), principal reflection layer (80), the second bonding series of strata (90), the second bombardment active layer (110) and transparent protective layer (120), it is described
Metal substrate (10) is strip mirror roll material, with a thickness of 0.3-0.4mm；It is described bonding bottom (30) with a thickness of 10nm；It is described
The thickness of first bonding series of strata (40) is less than 1nm；The dielectric series of strata (50) with a thickness of 40nm；The conductive adhesion layer (60)
With a thickness of 1nm；The function reflecting layer (70) with a thickness of 40nm；The thickness of the principal reflection layer (80) is greater than or equal to
The thickness of 100nm, second bonding series of strata (90) are less than 1nm；The thickness of the transparent protective layer (120) is greater than or equal to
200nm。
2. solar heat reflecting film structure as described in claim 1, it is characterised in that: the principal reflection layer (80) with a thickness of
110-150nm。
3. solar heat reflecting film structure as described in claim 1, it is characterised in that: the thickness of the transparent protective layer (120)
For 210-250nm.
4. solar heat reflecting film structure as described in claim 1, it is characterised in that: first bombardment active layer (20) is true
Aura is carried out by side of the hollow cathode discharge component to metal substrate (10) in empty ionized physical vapor deposition equipment and cleans shape
At.
5. solar heat reflecting film structure as described in claim 1, it is characterised in that: in vacuum ionic Pvd equipment
In there is the side fine aluminium target of the first bombardment active layer (20) to metal substrate (10) and to penetrate method preparation using intermediate frequency line viscous
Connect bottom (30).
6. solar heat reflecting film structure as described in claim 1, it is characterised in that: in vacuum ionic Pvd equipment
In, to bonding bottom (30) titanium dioxide target and using the first bonding series of strata (40) of radio frequency sputtering method preparation.
7. solar heat reflecting film structure as described in claim 1, it is characterised in that: in vacuum ionic Pvd equipment
In, dielectric series of strata (50) are formed in the first bonding series of strata (40) by titanium dioxide and silica alternating deposit.
8. solar heat reflecting film structure as described in claim 1, it is characterised in that: in vacuum ionic Pvd equipment
In nano material making apparatus, formed on dielectric series of strata (50) with Al-Doped ZnO target and using mid frequency sputtering method conductive viscous
It ties layer (60).
9. solar heat reflecting film structure as described in claim 1, it is characterised in that: in vacuum ionic Pvd equipment
In, function reflecting layer (70) are formed on conductive adhesion layer (60) with electrolysis copper target material and using mid frequency sputtering method.
10. solar heat reflecting film structure as described in claim 1, it is characterised in that: set in vacuum ionic physical vapour deposition (PVD)
In standby, principal reflection layer (80) are formed on function reflecting layer (70) with fine silver target and using mid frequency sputtering method.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201821504453.8U CN208815104U (en) | 2018-09-14 | 2018-09-14 | Solar heat reflecting film structure |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201821504453.8U CN208815104U (en) | 2018-09-14 | 2018-09-14 | Solar heat reflecting film structure |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108977768A (en) * | 2018-09-14 | 2018-12-11 | 嘉兴岱源真空科技有限公司 | Solar heat reflecting film structure |
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2018
- 2018-09-14 CN CN201821504453.8U patent/CN208815104U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108977768A (en) * | 2018-09-14 | 2018-12-11 | 嘉兴岱源真空科技有限公司 | Solar heat reflecting film structure |
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