CN208809520U - Resin adsorption impurity device - Google Patents
Resin adsorption impurity device Download PDFInfo
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- CN208809520U CN208809520U CN201821413669.3U CN201821413669U CN208809520U CN 208809520 U CN208809520 U CN 208809520U CN 201821413669 U CN201821413669 U CN 201821413669U CN 208809520 U CN208809520 U CN 208809520U
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Abstract
The utility model discloses a kind of resin adsorption impurity devices, are related to technical field of polysilicon production, and main purpose is to provide a kind of resin adsorption impurity device, and making resin avoid occurring when coming into operation, local temperature is excessively high leads to resin decomposition or deactivated risk.The main technical schemes of the utility model are as follows: a kind of resin adsorption impurity device, comprising: the top of tank body is arranged in feed pot, exhaust outlet, is used for the intracorporal gas of drain tank, and resin feed opening and nitrogen mouth are arranged on tank body, and sample tap is for sampling；Adsorption column, one end of connecting tube are connected to tank body, and the other end passes through cylinder and extends towards the bottom of cylinder, feed pipe is for being passed through silicon tetrachloride solution, and the bottom of cylinder is arranged in discharge gate, for waste material to be discharged, the top of cylinder is arranged in escape pipe, for gas to be discharged.The utility model is mainly used for removing trichlorosilane impurity.
Description
Technical field
The utility model relates to technical field of polysilicon production more particularly to a kind of resin adsorption impurity devices.
Background technique
In the production technology of production polysilicon, the quality of trichlorosilane products directly affects the product quality of polysilicon.
The coming into operation of trichlorosilane absorption resin is replaced after being usually filled into adsorption column through nitrogen, and 25 DEG C of trichlorine hydrogen is passed through after qualified
Silicon, carries out the soaking of resin, and soaking comes into operation after 24 hours.Due to the moisture in resin containing 1% or so, trichlorosilane with
Water in resin is chemically reacted in the local location of device, releases heat of reaction, and the temperature of local location can be up to 150
DEG C, high temperature causes part resin to lose activity, or even can exceed resin decomposition temperature, there is very high combustion explosion risk.
Utility model content
In view of this, the utility model embodiment provides a kind of resin adsorption impurity device, main purpose is to provide one kind
Resin adsorption impurity device, making resin avoid occurring when coming into operation, local temperature is excessively high leads to resin decomposition or deactivated
Risk.
In order to achieve the above objectives, the utility model mainly provides the following technical solutions:
The utility model embodiment provides a kind of resin adsorption impurity device, which includes:
Feed pot, the feed pot include tank body, resin feed opening, exhaust outlet, nitrogen mouth and sample tap, the exhaust outlet
The top of the tank body is set, for the intracorporal gas of the tank, the resin feed opening and nitrogen mouth setting to be discharged
On the tank body, the sample tap is for sampling；
Adsorption column, the adsorption column include cylinder, feed pipe, discharge gate, escape pipe and connecting tube, and the one of the connecting tube
End is connected to the tank body, and the other end passes through the cylinder and extends towards the bottom of the cylinder, and the feed pipe is for leading to
Enter silicon tetrachloride solution, the bottom of the cylinder is arranged in the discharge gate, and for waste material to be discharged, the escape pipe is arranged in institute
The top for stating cylinder, for gas to be discharged.
Further, the nitrogen mouth includes the first nitrogen mouth and the second nitrogen mouth, and the first nitrogen mouth is arranged in institute
The top of tank body is stated, the second nitrogen mouth is arranged in the connecting tube.
Further, charging valve, the charging valve is arranged between the second nitrogen mouth and the cylinder, and connects
In the connecting tube, the connecting tube is used to open or closed.
Further, the adsorption column further includes liquidometer, and the liquidometer is connected to the cylinder, described for measuring
The intracorporal liquid level of column.
Further, the liquidometer includes liquid level tube, the first control valve and the second control valve, and the liquid level tube is connected to
The cylinder, the liquid level tube have opposite first end and second end, and first control valve is arranged in the first end, institute
The second control valve is stated to be arranged in the second end.
Further, there is observation window, for observing the liquid level in the liquid level tube on the liquid level tube.
Further, the feed pipe includes the first feed pipe, the second feed pipe and the first filter screen, first charging
One end of pipe is connected to silicon tetrachloride solution container, and the other end passes through the inner wall of the cylinder and is connected to second charging
It manages, there are multiple first through hole on second feed pipe, first filter screen is wrapped on second feed pipe.
Further, the escape pipe includes the first escape pipe, the second escape pipe and the second filter screen, first outlet
One end of pipe passes through the top of the cylinder and is connected to second escape pipe, has multiple second on second escape pipe
Through-hole, second filter screen are wrapped on second escape pipe.
Compared with prior art, the utility model has the following technical effect that
In technical solution provided by the embodiment of the utility model, resin feed opening and nitrogen mouth are arranged on tank body, exhaust
The top of tank body is arranged in mouth, is used for the intracorporal gas of drain tank, sample tap is for sampling；One end of connecting tube is connected to tank
Body, the other end pass through cylinder and extend towards the bottom of cylinder, and feed pipe exists for being passed through silicon tetrachloride solution, discharge gate setting
The bottom of cylinder, for waste material to be discharged, the top of cylinder is arranged in escape pipe, for gas to be discharged, first by resin from resin
Feed opening is added in tank body, nitrogen is passed through tank body by nitrogen mouth, while opening exhaust outlet, replaces nitrogen to resin
Two days, the intracorporal resin of tank is sampled, if the water content of resin less than 0.5%, is closed exhaust outlet and nitrogen mouth, then passed through
Feed pipe is passed through silicon tetrachloride solution into cylinder, makes the liquid level of silicon tetrachloride solution more than the other end of connecting tube, opens out
Tracheae, and open connecting tube, enters tank intracorporal resin in the intracorporal silicon tetrachloride solution of column, in resin remaining moisture with
Silicon tetrachloride solution reaction, the heat for seething silicon tetrachloride solution, and reacting are absorbed by silicon tetrachloride solution, until tree
Oxygen and silicon tetrachloride solution in rouge impregnate the intracorporal resin of column 24 hours after completion of the reaction, are then passed through three from feed pipe
Chlorine hydrogen silicon replaces the intracorporal silicon tetrachloride of column, until can will adsorb when the content of the silicon tetrachloride of sampling is 0%
Column is incorporated to the normal flow of trichlorosilane absorption, compared with the existing technology, due to the moisture in resin containing 1% or so, trichlorine
Local location of the hydrogen silicon with the water in resin in device chemically reacts, and releases heat of reaction, the temperature meeting of local location
Up to 150 DEG C, high temperature causes part resin to lose activity, or even can exceed resin decomposition temperature, there is very high combustion explosion wind
Danger in the utility model, by the way that gradually resin is passed through in silicon tetrachloride solution, avoids that the intracorporal local temperature of column is excessively high to be led
The problem of causing resin to lose activity, also, since silicon tetrachloride chemical property is more stable, replace trichlorosilane to throw with silicon tetrachloride
Material, then with trichlorosilane displacement silicon tetrachloride, greatly reduce the risk for the trichlorosilane that directly comes into operation.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of resin adsorption impurity device provided by the embodiment of the utility model.
Specific embodiment
The utility model is described in further detail with reference to the accompanying drawings and examples.
As shown in Figure 1, the utility model embodiment provides a kind of resin adsorption impurity device, which includes:
Feed pot 1, feed pot 1 include tank body 11, resin feed opening 12, exhaust outlet 13, nitrogen mouth and sample tap 15, exhaust
The top of tank body 11, the gas for being discharged in tank body 11 is arranged in mouth 13, and resin feed opening 12 and nitrogen mouth are arranged in tank body
On 11, sample tap 15 is for sampling；
Adsorption column 2, adsorption column 2 include cylinder 21, feed pipe 22, discharge gate 23, escape pipe 24 and connecting tube 25, connecting tube
25 one end is connected to tank body 11, and the other end passes through cylinder 21 and extends towards the bottom of cylinder 21, and feed pipe 22 is for being passed through
The bottom of cylinder 21 is arranged in silicon tetrachloride solution, discharge gate 23, and for waste material to be discharged, the top of cylinder 21 is arranged in escape pipe 24
Portion, for gas to be discharged.
In technical solution provided by the embodiment of the utility model, resin feed opening 12 and nitrogen mouth are arranged on tank body 11,
The top of tank body 11 is arranged in exhaust outlet 13, the gas for being discharged in tank body 11, and sample tap 15 is for sampling；Connecting tube 25
One end is connected to tank body 11, and the other end passes through cylinder 21 and extends towards the bottom of cylinder 21, and feed pipe 22 is for being passed through tetrachloro
The bottom of cylinder 21 is arranged in SiClx solution, discharge gate 23, and for waste material to be discharged, the top of cylinder 21 is arranged in escape pipe 24,
For gas to be discharged, resin is added in tank body 11 from resin feed opening 12 first, nitrogen is passed through tank body 11 by nitrogen mouth,
Exhaust outlet 13 is opened simultaneously, nitrogen is made to carry out displacement two days to resin, the resin in tank body 11 is sampled, if the water of resin contains
Amount closes exhaust outlet 13 and nitrogen mouth less than 0.5%, is then passed through silicon tetrachloride solution into cylinder 21 by feed pipe 22,
So that the liquid level of silicon tetrachloride solution is opened escape pipe 24 more than the other end of connecting tube 25, and open connecting tube 25, makes tank body 11
Interior resin enters in the silicon tetrachloride solution in cylinder 21, and remaining moisture is reacted with silicon tetrachloride solution in resin, makes four
Silicon chloride solution seethes, and the heat reacted is absorbed by silicon tetrachloride solution, until oxygen and silicon tetrachloride in resin
After solution reaction, resin 24 hours in cylinder 21 are impregnated, then trichlorosilane are passed through from feed pipe 22, in cylinder 21
Silicon tetrachloride replaced, until sampling silicon tetrachloride content be 0% when, adsorption column 2 can be incorporated to trichlorosilane
The normal flow of absorption, compared with the existing technology, due to the moisture in resin containing 1% or so, in trichlorosilane and resin
Water is chemically reacted in the local location of device, releases heat of reaction, and the temperature of local location can be up to 150 DEG C, high temperature
Cause part resin to lose activity, or even resin decomposition temperature can be exceeded, there is very high combustion explosion risk, the utility model
In, by the way that gradually resin is passed through in silicon tetrachloride solution, avoid that the local temperature in cylinder 21 is excessively high to cause resin to lose
The problem of activity replaces trichlorosilane to feed intake also, since silicon tetrachloride chemical property is more stable with silicon tetrachloride, then with three
Chlorine hydrogen silicon displacement silicon tetrachloride, greatly reduces the risk for the trichlorosilane that directly comes into operation.
The effect of above-mentioned feed pot 1 is to provide the place of resin substitution, feed pot 1 include tank body 11, resin feed opening 12,
The top of tank body 11 is arranged in exhaust outlet 13, nitrogen mouth and sample tap 15, exhaust outlet 13, the gas for being discharged in tank body 11,
Resin feed opening 12 and nitrogen mouth are arranged on tank body 11, and sample tap 15 is for sampling；The effect of adsorption column 2 be to provide resin with
The place of silicon tetrachloride solution reaction, adsorption column 2 include cylinder 21, feed pipe 22, discharge gate 23, escape pipe 24 and connecting tube
25, one end of connecting tube 25 is connected to tank body 11, and the other end passes through cylinder 21 and extends towards the bottom of cylinder 21, feed pipe 22
For being passed through silicon tetrachloride solution, the bottom of cylinder 21 is arranged in discharge gate 23, and for waste material to be discharged, escape pipe 24 is arranged in column
The top of body 21 resin is added in tank body 11 from resin feed opening 12 first, tank body 11 is in seal shape for gas to be discharged
State, and connecting tube 25 is in close state, and nitrogen is passed through tank body 11 by nitrogen mouth, while opening exhaust outlet 13, is made nitrogen
Gas carries out displacement two days to resin, samples to the resin in tank body 11, sample tap 15 can be arranged in the side of tank body 11, convenient
Resin is sampled, if the water content of resin less than 0.5%, closes exhaust outlet 13 and nitrogen mouth, then passes through feed pipe
22 are passed through silicon tetrachloride solution into cylinder 21, make the liquid level of silicon tetrachloride solution more than the other end of connecting tube 25, open out
Tracheae 24, and connecting tube 25 is opened, meanwhile, nitrogen mouth is opened, the pressure in tank body 11 is improved to 0.3MPa, is made in tank body 11
Resin enter in the silicon tetrachloride solution in cylinder 21, remaining moisture is reacted with silicon tetrachloride solution in resin, makes tetrachloro
SiClx solution seethes, at this point, the reaction temperature of silicon tetrachloride solution is in 60 degree hereinafter, losing so as to avoid high temperature to resin
The problem of activity, and the heat reacted is absorbed by silicon tetrachloride solution, until oxygen and silicon tetrachloride solution in resin
After completion of the reaction, resin 24 hours in cylinder 21 are impregnated, then trichlorosilane are passed through from feed pipe 22, to four in cylinder 21
Silicon chloride is replaced, until adsorption column 2 can be incorporated to trichlorosilane absorption when the content of the silicon tetrachloride of sampling is 0%
Normal flow, in the present embodiment, by the way that gradually resin is passed through in silicon tetrachloride solution, avoid the part temperature in cylinder 21
The problem of height causes resin to lose activity is spent, also, since silicon tetrachloride chemical property is more stable, replaces three with silicon tetrachloride
Chlorine hydrogen silicon feeds intake, then with trichlorosilane displacement silicon tetrachloride, greatly reduces the risk for the trichlorosilane that directly comes into operation.
Further, as shown in Figure 1, nitrogen mouth includes the first nitrogen mouth 141 and the second nitrogen mouth 142, the first nitrogen mouth
141 are arranged in the top of tank body 11, and the second nitrogen mouth 142 is arranged in connecting tube 25.In the present embodiment, nitrogen is further defined
The top of tank body 11 is arranged in port, the first nitrogen mouth 141, and main function is to lead to after the opening of connecting tube 25 into tank body 11
Enter nitrogen, to reach the technical effect for increasing the pressure of tank body 11, the second nitrogen mouth 142 is arranged in connecting tube 25, mainly
Effect is that resin is made to carry out displacement reaction in tank body 11, to reach the technical effect for reducing the oxygen content in resin.
Further, as shown in Figure 1, increasing charging valve 3, the setting of charging valve 3 the second nitrogen mouth 142 and cylinder 21 it
Between, and it is connected to connecting tube 25, it is used to open or closes connecting tube 25.In the present embodiment, charging valve 3 is increased, is fed
The effect of valve 3 is to control being turned on or off for connecting tube 25, it is generally the case that the position of tank body 11 is higher than cylinder 21, tank body
Resin in 11 can enter in cylinder 21 under gravity, also, the position of charging valve 3 cannot influence the second nitrogen mouth
142 normal work, therefore, charging valve 3 are arranged between the second nitrogen mouth 142 and cylinder 21, can either the effective company of control
Adapter tube 25 is turned on or off, while will not be influenced the second nitrogen mouth 142 and be injected nitrogen into tank body 11.
Further, as shown in Figure 1, adsorption column 2 further includes liquidometer, liquidometer is connected to cylinder 21, is used for measurement column
Liquid level in body 21.The present embodiment or can, further define adsorption column 2, the effect of liquidometer is in measurement cylinder 21
Liquid level, therefore, liquidometer is generally arranged at the side of cylinder 21, convenient that liquid level is observed and measured, it is generally the case that
The liquid level of silicon tetrachloride liquid is in 50% or so of cylinder 21, also, liquid level is higher than the position of the other end of connecting tube 25,
That is, the liquid level of silicon tetrachloride liquid needs not cross the nozzle of connecting tube 25.
Further, as shown in Figure 1, liquidometer includes liquid level tube 261, the first control valve 262 and the second control valve 263,
Liquid level tube 261 is connected to cylinder 21, and liquid level tube 261 has an opposite first end and second end, and the setting of the first control valve 262 is the
One end, the second control valve 263 are arranged in second end.In the present embodiment, liquidometer is further defined, liquid level tube 261 is connected to
Cylinder 21, liquid level tube 261 have opposite first end and second end, and the first control valve 262 is arranged in first end, the second control valve
263 are arranged in second end, it is generally the case that first end is close to the bottom of cylinder 21, and second end is close to the top of cylinder 21, when four
The liquid level of chlorination silicon liquid is in 50% or so of cylinder 21, closes feed pipe 22, and at the same time closing 262 He of the first control valve
Second control valve 263, preventing resin from entering liquid level tube 261 causes liquid level tube 261 to block, optionally, can be on liquid level tube 261
Observation window or graduation mark are set, and for observing the liquid level in liquid level tube 261, silicon tetrachloride liquid enters liquid level tube 261, can
Staff is facilitated to detect and measure the liquid level of silicon tetrachloride liquid.
Further, feed pipe 22 include the first feed pipe, the second feed pipe and the first filter screen, the one of the first feed pipe
End is connected to silicon tetrachloride solution container, and the other end passes through the inner wall of cylinder 21 and is connected to the second feed pipe, the second feed pipe
Upper to have multiple first through hole, the first filter screen is wrapped on the second feed pipe.In the present embodiment, feed pipe is further defined
22, one end of the first feed pipe is connected to silicon tetrachloride solution container, and the other end passes through the inner wall of cylinder 21 and is connected to second
Feed pipe, that is to say, that the second feed pipe is in cylinder 21, has multiple first through hole, first through hole on the second feed pipe
Effect be that uniformly silicon tetrachloride solution is passed through in cylinder 21, the first filter screen is wrapped on the second feed pipe, in order to anti-
Only resin enters in feed pipe 22, the second feed pipe outside wrap up 60 mesh filter screen, can effectively prevent resin into
Enter the second feed pipe, to reach the technical effect of protection feed pipe 22.
Further, escape pipe 24 include the first escape pipe, the second escape pipe and the second filter screen, the one of the first escape pipe
It holds the top across cylinder 21 and is connected to the second escape pipe, there is multiple second through-holes, the second filter screen on the second escape pipe
It is wrapped on the second escape pipe.In the present embodiment, escape pipe 24 is further defined, one end of the first escape pipe passes through cylinder 21
Top and be connected to the second escape pipe, that is to say, that the second escape pipe be arranged in cylinder 21, on the second escape pipe have it is more
A second through-hole, the effect of the second through-hole are the gas being discharged in cylinder 21, and the second filter screen is wrapped on the second escape pipe, are
It prevents resin from flowing out cylinder 21 with trichlorosilane, wraps up the filter screen of 60 mesh in the outside of the second escape pipe, it can be effective
Prevent resin with trichlorosilane flow out cylinder 21, thus reach protection feed pipe 22 technical effect.
Above description is only a specific implementation of the present invention, but the protection scope of the utility model is not limited to
In this, anyone skilled in the art within the technical scope disclosed by the utility model, can readily occur in variation
Or replacement, it should be covered within the scope of the utility model.Therefore, the protection scope of the utility model should be with the power
Subject to the protection scope that benefit requires.
Claims (8)
1. a kind of resin adsorption impurity device characterized by comprising
Feed pot, the feed pot include tank body, resin feed opening, exhaust outlet, nitrogen mouth and sample tap, the exhaust outlet setting
At the top of the tank body, for the intracorporal gas of the tank to be discharged, the resin feed opening and the nitrogen mouth are arranged in institute
It states on tank body, the sample tap is for sampling；
Adsorption column, the adsorption column include cylinder, feed pipe, discharge gate, escape pipe and connecting tube, and one end of the connecting tube connects
It is connected to the tank body, the other end passes through the cylinder and extends towards the bottom of the cylinder, and the feed pipe is for being passed through four
The bottom of the cylinder is arranged in silicon chloride solution, the discharge gate, and for waste material to be discharged, the escape pipe is arranged in the column
The top of body, for gas to be discharged.
2. resin adsorption impurity device according to claim 1, which is characterized in that
The nitrogen mouth includes that the top of the tank body is arranged in the first nitrogen mouth and the second nitrogen mouth, the first nitrogen mouth,
The second nitrogen mouth is arranged in the connecting tube.
3. resin adsorption impurity device according to claim 2, which is characterized in that further include:
Charging valve, the charging valve is arranged between the second nitrogen mouth and the cylinder, and is connected to the connecting tube,
It is used to open or closes the connecting tube.
4. resin adsorption impurity device according to claim 1, which is characterized in that
The adsorption column further includes liquidometer, and the liquidometer is connected to the cylinder, for measuring the intracorporal liquid level of the column.
5. resin adsorption impurity device according to claim 4, which is characterized in that
The liquidometer includes liquid level tube, the first control valve and the second control valve, and the liquid level tube is connected to the cylinder, described
Liquid level tube has opposite first end and second end, and first control valve is arranged in the first end, second control valve
It is arranged in the second end.
6. resin adsorption impurity device according to claim 5, which is characterized in that
There is observation window, for observing the liquid level in the liquid level tube on the liquid level tube.
7. resin adsorption impurity device according to any one of claims 1 to 6, which is characterized in that
The feed pipe includes the first feed pipe, the second feed pipe and the first filter screen, and one end of first feed pipe connects
In silicon tetrachloride solution container, the other end passes through the inner wall of the cylinder and is connected to second feed pipe, described second into
There are multiple first through hole, first filter screen is wrapped on second feed pipe in expects pipe.
8. resin adsorption impurity device according to any one of claims 1 to 6, which is characterized in that
The escape pipe includes the first escape pipe, the second escape pipe and the second filter screen, and one end of first escape pipe passes through
The top of the cylinder is simultaneously connected to second escape pipe, has multiple second through-holes on second escape pipe, and described the
Two filter screens are wrapped on second escape pipe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821413669.3U CN208809520U (en) | 2018-08-30 | 2018-08-30 | Resin adsorption impurity device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821413669.3U CN208809520U (en) | 2018-08-30 | 2018-08-30 | Resin adsorption impurity device |
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| Publication Number | Publication Date |
|---|---|
| CN208809520U true CN208809520U (en) | 2019-05-03 |
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ID=66275202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821413669.3U Active CN208809520U (en) | 2018-08-30 | 2018-08-30 | Resin adsorption impurity device |
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| Country | Link |
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| CN (1) | CN208809520U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110613955A (en) * | 2019-09-30 | 2019-12-27 | 新疆协鑫新能源材料科技有限公司 | Chlorosilane adsorption resin filling device and resin filling method |
| CN114653136A (en) * | 2022-04-21 | 2022-06-24 | 四川科伦药业股份有限公司 | Filtering method and filtering device for fat emulsion injection |
-
2018
- 2018-08-30 CN CN201821413669.3U patent/CN208809520U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110613955A (en) * | 2019-09-30 | 2019-12-27 | 新疆协鑫新能源材料科技有限公司 | Chlorosilane adsorption resin filling device and resin filling method |
| CN114653136A (en) * | 2022-04-21 | 2022-06-24 | 四川科伦药业股份有限公司 | Filtering method and filtering device for fat emulsion injection |
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