CN208642148U - One kind being used for organosilicon, production of polysilicon dust pelletizing system - Google Patents
One kind being used for organosilicon, production of polysilicon dust pelletizing system Download PDFInfo
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- CN208642148U CN208642148U CN201820449603.3U CN201820449603U CN208642148U CN 208642148 U CN208642148 U CN 208642148U CN 201820449603 U CN201820449603 U CN 201820449603U CN 208642148 U CN208642148 U CN 208642148U
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Abstract
One kind being used for organosilicon, production of polysilicon dust pelletizing system, including dry dust removal apparatus, heat exchanger, scrubbing tower, gas inlet pipeline connects dry dust removal apparatus gas inlet, dry dust removal apparatus gas outlet connects scrubbing tower gas inlet by outlet pipe, outlet pipe separately sets No.1 heat exchange air inlet pipe connection heat exchanger No.1 air inlet, heat exchanger No.1 gas outlet connects outlet pipe by No.1 heat exchange escape pipe, No. two gas outlets of heat exchanger connect the blowback system of dry dust removal apparatus by blowback pipeline, and No. two air inlets of heat exchanger connect methyl chloride gas pipeline.Organosilicon, the solid particle in polysilicon high-temperature synthesis gas can be effectively removed, the loss of high-boiling components is reduced, solves the problems, such as that conventional dry dust removal process small particles not can be removed and deduster service life is short.
Description
Technical field
The utility model relates to the dedustings of dust pelletizing system and processing method more particularly to a kind of organosilicon, production of polysilicon
Method and its production system.
Background technique
In organosilicon, polysilicon production process, the synthesis gas come out from fluidized-bed reactor contains fraction solids silicon powder
It needs to separate with catalyst, industrially generallys use that gas-solid phase materials are first passed through cyclone dust collectors and removed at present and most work as
The particulate matter for measuring diameter > 10 μm, then immediately proceeds to scrubbing tower, and tower top carries out wet dedusting using monomer, in gas-solid phase materials
The particulate matter not removed is removed by scrubbing tower, is mixed into slurry with the high-boiling components in monomer from scrubbing tower bottom and is exhausted, and high
Boiling object is the mixture that can be cracked into target product organochlorosilane monomer, and this method causes a large amount of high-boiling components damage
It loses, and increases the discharge of waste liquid.
Organosilicon synthesis gas temperature is high, and fine dust particles are more, and the corrosive media containing facile hydrolysis, dry dust removal
The method for mostly using cyclonic separation can remove the inexpungible molecule of cyclonic separation using filter element filtering, but for a long time
After operation, filter core can be blocked, and the selection of filter core material and blowback medium, the design of blowback system show most important.Blowback air
If body brings other foreign gases into, the energy consumption of subsequent product separation will increase；If bringing moisture into, acid corrosion can produce；Blowback air
The low partial condensation that will cause material of temperature, the resistance for increasing high-temperature dust removal will increase if individually increasing purge gas heat exchange
Energy consumption.
Utility model content
In view of the shortcomings of the prior art, the utility model provides one kind can effectively remove organosilicon, polysilicon high temperature
Solid particle in synthesis gas reduces the loss of high-boiling components, and solving conventional dry dust removal process small particles not can be removed and remove
The short problem of dirt device service life is used for organosilicon, production of polysilicon dust removal method and its production system.
To realize the utility model aim, provide following technical scheme: one kind is for organosilicon, production of polysilicon dedusting
Method, comprising the following steps: will be fluidized first with the slave organosilicon or polysilicon of gaseous phase materials and solid Si powder and catalyst
The synthesis gas of bed reactor discharge carries out dry dust removal by dry dust removal apparatus, is then discharged into the synthesis gas after dry dust removal
Wash mill carries out wet dedusting, it is characterised in that the temperature control in dry dust removal apparatus is at 250 DEG C ~ 350 DEG C, dry dust removal
Diameter≤1um of the solid particulate matter of synthesis gas afterwards.
Preferably, carrying out pulsed blowback using filter core of the methyl chloride gas to high temperature too cotton deduster, will need to carry out
At 250 DEG C ~ 350 °, pressure control is 0.1 MPa (G) ~ 1 MPa (G) for the temperature control of the methyl chloride gas of recoil.Chloromethanes is
One of component in organosilicon or polysilicon synthesis gas, ensure that in organosilicon or polysilicon synthesis gas and is not mixed into other impurity,
The moisture for generating acid corrosion factor will not be brought into simultaneously, equipment corrosion is avoided the occurrence of, extend cleaner service life.
To realize the utility model aim, provide a kind of for organosilicon, the production system of production of polysilicon dust removal method
System, it is characterised in that including dry dust removal apparatus, heat exchanger, scrubbing tower, gas inlet pipeline connects dry dust removal apparatus flue gas
Import, dry dust removal apparatus gas outlet by outlet pipe connect scrubbing tower gas inlet, outlet pipe separately set No.1 exchange heat into
Tracheae connects heat exchanger No.1 air inlet, and heat exchanger No.1 gas outlet connects outlet pipe, heat exchange by No.1 heat exchange escape pipe
No. two gas outlets of device connect the blowback system of dry dust removal apparatus by blowback pipeline, and No. two air inlets of heat exchanger connect chloromethanes
Gas pipeline.The thermal energy of organosilicon or polysilicon synthesis gas is made full use of, does not increase additional energy expenditure, while can heat
Purge gas reaches target process temperature, avoids purge gas temperature is too low monomer in synthesis gas is caused to condense, increases high temperature and remove
The resistance of dirt solves the problems, such as that deduster causes efficiency of dust collection to reduce because of moisture condensation.
Preferably, dry dust removal apparatus is the group of high temperature too cotton deduster or cyclone dust collectors and high temperature too cotton deduster
It closes.
Preferably, high temperature too cotton deduster includes shell, upper part of the housing is cylindrical shape, and lower part is taper flue-dust retainer, shell
Setting fixed plate divides housing 135 into clean area and lower flue dust area in vivo, and several tubular types being uniformly distributed are provided in fixed plate
Filter core, tubular type filter core be the closed hollow body of the other end open at one end, open end plug be fixed in fixed plate and with it is upper clean
Net Qu Liantong, closed end are located in lower flue dust area, and taper flue-dust retainer bottom end is provided with valve, and housing tip is provided with outlet flue,
Gas inlet is provided on lower flue dust area side wall.Material inlet is at the high temperature too middle part of cotton deduster and extends to housing central section,
Export direction is that downward, outlet is provided with centrum shape guiding device, is directly entered heavy particle cone-shaped
Flue-dust retainer；The top of equipment is arranged in material inlet.
Preferably, tubular type filter core is high temperature-resistant acid-resistant base material, high temperature-resistant acid-resistant base material includes by slurry by adopting
It is manufactured with known Vacuum forming techniques, slurry includes 60% ~ 75% wollastonite, 20% ~ 45% mineral fibres by mass percentage
And 5% ~ 10% adhesive.High temperature-resistant acid-resistant base material is formed using low density porous medium made of granular inorganic matter is bonded,
High temperature resistant can remove the particulate matter of equivalent diameter > 1 μm in gas-solid phase, filtering accuracy is high, mistake up to 1600 DEG C at high operating temperatures
Filter efficiency can reach 99.9% or more, and long service life can achieve 10 years or more.
Preferably, blowback system monitors the inside and outside differential pressure of each group filter core by differential manometer, when the interior external pressure of certain group filter core
When differential pressure drop reaches design pressure drop, pressure drop may be configured as 0.1 MPa (G) ~ 1 MPa (G), starts blowback system, utilizes chloromethanes
The dirt cake for being adsorbed on tubular type filter core outer surface is disposed in high-temperature gas contra-injection.
Preferably, taper flue-dust retainer is equipped with Impulsive tank, gases used Impulsive tank is methyl chloride gas.For cooperating high temperature
Too cotton deduster lower part material discharging is conducive to effectively shake off the dust put up a bridge in deduster cone wall into dust arrester.
It is seldom by the high temperature too organosilicon of cotton deduster, the particulate matter in polysilicon synthesis gas, it is needed in scrubbing tower
Liquid spray flow substantially reduce, therefore reduce the overhead reflux amount of scrubbing tower, reduce the energy consumption of scrubbing tower, and reduce
The loss of high-boiling components reduces the discharge of slurry amount, increases economic efficiency.
The utility model is the utility model has the advantages that the utility model can effectively remove organosilicon under high temperature environment, polysilicon closes
At the solid particulate matter in gas, reduce the discharge amount of scrubbing tower institute's deslagging slurry, and then reduces the loss of high-boiling components in slurry, drop
Low scrubbing tower energy consumption, helps to improve economic benefit；It, will not using the circulation methyl chloride gas of monomer synthesis as purge gas
It brings other gases such as the moisture for generating acid corrosion factor into, avoids and reduce the corrosion of cleaner；By utilizing synthesis gas pair
Purge gas heating avoids protecting due to the resistance of the too low partial condensation for causing material of purge gas temperature, increase high-temperature dust removal
The dust removal performance for demonstrate,proving high temperature too cotton deduster, prolongs the service life.Meanwhile by being heated using synthesis gas to purge gas, fill
The energy that synthesis gas has is utilized to division reason, not will increase this system energy consumption, avoid enterprise to heat blowback
Gas and additionally increase production cost.
With stabilization, succinct, energy-saving and environmental protection distinguishing feature, the dedusting produced suitable for organosilicon, polysilicon synthesis gas
System.
Detailed description of the invention
Fig. 1 is the system schematic of the utility model embodiment 1.
Fig. 2 is the system schematic of the utility model embodiment 2.
Specific embodiment
Embodiment 1: a kind of for organosilicon, the production system of production of polysilicon dust removal method, including high temperature too cotton dedusting
Device 1, heat exchanger 2, scrubbing tower 3, gas inlet pipeline 4 connect high temperature too 1 gas inlet 1.1 of cotton deduster, high temperature too cotton dedusting
1 gas outlet 1.2 of device connects 3 gas inlet 3.1 of scrubbing tower by outlet pipe 5, and outlet pipe 5 separately sets No.1 heat exchange air inlet pipe 6
2 No.1 air inlet 2.1 of heat exchanger is connected, heat exchanger No.1 gas outlet 2.2 connects outlet pipe 5 by No.1 heat exchange escape pipe 8,
No. two gas outlets 2.3 of heat exchanger connect the blowback system of high temperature too cotton deduster 1, No. two air inlets of heat exchanger by blowback pipeline 9
Mouth 2.4 connects methyl chloride gas pipelines 10.High temperature too cotton deduster 1 includes shell, and upper part of the housing is cylindrical shape, and lower part is taper
Flue-dust retainer, the interior setting fixed plate of shell divide housing 135 into clean area and lower flue dust area, several are provided in fixed plate and is evenly distributed with
The tubular type filter core 1.3 of distribution, tubular type filter core 1.3 are the closed hollow body of the other end open at one end, and open end, which plugs, to be fixed in
It is connected in fixed plate and with upper clean area, closed end is located in lower flue dust area, and taper flue-dust retainer bottom end is provided with valve, shell top
End is provided with outlet flue, is provided with gas inlet on lower flue dust area side wall.Tubular type filter core 1.3 is high temperature-resistant acid-resistant base material, resistance to
The acidproof base material of high temperature includes being manufactured by slurry by using known Vacuum forming techniques, and slurry includes by mass percentage
60% ~ 75% wollastonite, 20% ~ 45% mineral fibres and 5% ~ 10% adhesive.Blowback system monitors each group filter core by differential manometer
Inside and outside differential pressure, when certain group filter core inside and outside differential pressure pressure drop reach design pressure drop when, pressure drop may be configured as 0.1 MPa (G) ~ 1
MPa (G) starts blowback system using chloromethanes high-temperature gas contra-injection and disposes the dirt for being adsorbed on tubular type filter core outer surface
Cake.Taper flue-dust retainer is equipped with Impulsive tank 13, and gases used Impulsive tank 13 is methyl chloride gas.For cooperating high temperature too cotton deduster
Lower part material discharging is conducive to effectively shake off the dust put up a bridge on high temperature too 1 cone wall of cotton deduster into dust arrester 11.
The specific steps are that: first by slave organosilicon or polysilicon stream with gaseous phase materials and solid Si powder and catalyst
The synthesis gas that fluidized bed reactor 13 is discharged carries out dry dust removal by high temperature too cotton deduster 1, then by the conjunction after dry dust removal
Wash mill is discharged at gas and carries out wet dedusting, and the temperature in dry dust removal apparatus is controlled at 250 DEG C ~ 350 DEG C, after dry dust removal
Synthesis gas solid particulate matter diameter≤1um.Pulse is carried out using filter core of the methyl chloride gas to high temperature too cotton deduster
Formula blowback, by the temperature control for the methyl chloride gas that need to be recoiled at 250 DEG C ~ 350 °, pressure control is 0.1 MPa (G) ~ 1
MPa(G)。
Embodiment 2: referring to embodiment 1, settable cyclone dust collectors 12 before high temperature too cotton deduster 1 will have gas first
The synthesis gas of the slave organosilicon or polysilicon fluidized-bed reactor of phase materials and solid Si powder and catalyst discharge first passes through whirlwind
Deduster 12 pre-processes, and then enters back into high temperature too cotton deduster 1 and carries out dry dust removal.
Claims (4)
1. one kind is used for organosilicon, production of polysilicon dust pelletizing system, it is characterised in that including dry dust removal apparatus, heat exchanger, wash
Tower is washed, gas inlet pipeline connects dry dust removal apparatus gas inlet, and dry dust removal apparatus gas outlet is connected by outlet pipe
Scrubbing tower gas inlet, outlet pipe separately set No.1 heat exchange air inlet pipe connection heat exchanger No.1 air inlet, heat exchanger No.1 outlet
Mouth connects outlet pipe by No.1 heat exchange escape pipe, and No. two gas outlets of heat exchanger connect dry dust removal apparatus by blowback pipeline
Blowback system, No. two air inlets of heat exchanger connect methyl chloride gas pipelines.
2. according to claim 1 a kind of for organosilicon, production of polysilicon dust pelletizing system, it is characterised in that dry dust removal
Device is the combination of high temperature too cotton deduster or cyclone dust collectors and high temperature too cotton deduster.
3. according to claim 2 a kind of for organosilicon, production of polysilicon dust pelletizing system, it is characterised in that high temperature too cotton
Deduster includes shell, and upper part of the housing is cylindrical shape, and lower part is taper flue-dust retainer, and setting fixed plate divides housing 135 into shell
Clean area and lower flue dust area, several tubular type filter cores being uniformly distributed are provided in fixed plate, and tubular type filter core is open at one end another
Hollow body closed at one end, open end, which plugs, to be fixed in fixed plate and is connected to upper clean area, and closed end is located at lower flue dust
In area, taper flue-dust retainer bottom end is provided with valve, and housing tip is provided with outlet flue, be provided on lower flue dust area side wall flue gas into
Mouthful.
4. according to claim 3 a kind of for organosilicon, production of polysilicon dust pelletizing system, it is characterised in that taper collection ash
Bucket is equipped with Impulsive tank, and gases used Impulsive tank is methyl chloride gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820449603.3U CN208642148U (en) | 2018-04-02 | 2018-04-02 | One kind being used for organosilicon, production of polysilicon dust pelletizing system |
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|---|---|---|---|
| CN201820449603.3U CN208642148U (en) | 2018-04-02 | 2018-04-02 | One kind being used for organosilicon, production of polysilicon dust pelletizing system |
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| CN208642148U true CN208642148U (en) | 2019-03-26 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113018995A (en) * | 2021-02-25 | 2021-06-25 | 四川思达能环保科技有限公司 | Method for preventing condensation of filter element in dust collector back flushing and dust collector back flushing device |
-
2018
- 2018-04-02 CN CN201820449603.3U patent/CN208642148U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113018995A (en) * | 2021-02-25 | 2021-06-25 | 四川思达能环保科技有限公司 | Method for preventing condensation of filter element in dust collector back flushing and dust collector back flushing device |
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