CN208562504U - Crucible cover and vapor deposition crucible is deposited - Google Patents
Crucible cover and vapor deposition crucible is deposited Download PDFInfo
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- CN208562504U CN208562504U CN201821211419.1U CN201821211419U CN208562504U CN 208562504 U CN208562504 U CN 208562504U CN 201821211419 U CN201821211419 U CN 201821211419U CN 208562504 U CN208562504 U CN 208562504U
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- vapor deposition
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- cleaning piece
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Abstract
The utility model relates to a kind of vapor deposition crucible cover and vapor deposition crucibles, which includes lid and the first cleaning piece；The lid is equipped with vapor deposition hole, the lid is connect with first cleaning piece, first cleaning piece has the first extending portion, first extending portion protrude into it is described vapor deposition hole in and close to it is described vapor deposition hole hole wall, first cleaning piece can be moved relative to the vapor deposition hole so that first extending portion is along the hole wall circumferential movement that hole is deposited, to which the first extending portion can strike off the evaporation material being attached on the hole wall in vapor deposition hole, be conducive to improve the rate stability of vapor deposition and at film uniformity, and guarantee being normally carried out for evaporation process.
Description
Technical field
The utility model relates to evaporation process technical fields, more particularly to a kind of vapor deposition crucible cover and vapor deposition crucible.
Background technique
Vacuum thermal evaporation is in pressure lower than 5*10-5Under the vacuum environment of Pa, by material by solid-state by way of heating
Become vapor state and high speed ascending motion reaches substrate, is allowed to the process that the deposition cure on substrate is solid film, can answer
For fields such as OLED organic film preparations.
Referring to Fig. 1, traditional vapor deposition crucible includes crucible body 20 and crucible cover part 30, crucible cover part 30, which is equipped with, to be steamed
Plated hole 31, crucible body 20 is for accommodating evaporation material 40.By heating, evaporation material 40 forms steam and escapes from vapor deposition hole 31
Out, it rises on substrate 50.However, vapor deposition hole 31 is easy to attachment evaporation material 40 during vapor deposition.Referring to Fig. 2, working as
When vapor deposition hole 31 is attached with more evaporation material 40, the material of 50 fringe region deposition cure of substrate is compared with 50 central area of substrate
It is few, lead into film uniformity and is deteriorated.Simultaneously as the aperture in vapor deposition hole 31 becomes smaller, material, which steams, to be become difficult, and leads to vapor deposition speed
Rate decline and bad stability.Moreover, if cleared up not in time can make that the blocking of hole 31 is deposited, material can not be steamed, and be deposited
Technique can not continue.
Utility model content
Based on this, it is necessary to provide vapor deposition crucible cover and steaming that one kind can clear up the evaporation material being attached in vapor deposition hole
Plate crucible.
A kind of vapor deposition crucible cover, including lid and the first cleaning piece；The lid is equipped with vapor deposition hole, first cleaning
Part is arranged on the lid, and first cleaning piece has the first extending portion, and the vapor deposition hole is protruded into first extending portion
In and close to it is described vapor deposition hole hole wall, first cleaning piece can relative to the vapor deposition hole movement so that described first stretches
Enter portion along the hole wall circumferential movement in the vapor deposition hole.
A kind of vapor deposition crucible, including Crucible body and the vapor deposition crucible cover.
Compared with prior art, the utility model has the following beneficial effects:
Above-mentioned vapor deposition crucible cover and vapor deposition crucible, on lid be equipped with the first cleaning piece, the first cleaning piece can move with
Make its first extending portion along the hole wall circumferential movement in vapor deposition hole, so as to clear up the vapor deposition material being attached on the hole wall in vapor deposition hole
Material is conducive to improve the rate stability of vapor deposition and at film uniformity, and guarantees being normally carried out for evaporation process.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of traditional vapor deposition crucible；
Fig. 2 is that the schematic diagram of evaporation material is adhered in the vapor deposition hole of vapor deposition crucible shown in FIG. 1；
Fig. 3 is the structural schematic diagram of the vapor deposition crucible of an embodiment；
Fig. 4 is cross-sectional view of the vapor deposition crucible shown in Fig. 3 on the direction A-A；
Fig. 5 is the structural schematic diagram of the main cover body in vapor deposition crucible shown in Fig. 3；
Fig. 6 is the structural schematic diagram of the rotor in vapor deposition crucible shown in Fig. 3.
Specific embodiment
The utility model is more fully retouched below with reference to relevant drawings for the ease of understanding the utility model,
It states.The preferred embodiment of the utility model is given in attached drawing.But the utility model can come in many different forms in fact
It is existing, however it is not limited to embodiment described herein.On the contrary, purpose of providing these embodiments is makes public affairs to the utility model
The understanding for opening content is more thorough and comprehensive.
It should be noted that it can directly on the other element when element is referred to as " being fixed on " another element
Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it, which can be, is directly connected to
To another element or it may be simultaneously present centering elements.
Unless otherwise defined, all technical and scientific terms used herein are led with the technology for belonging to the utility model
The normally understood meaning of the technical staff in domain is identical.Terminology used in the description of the utility model herein only be
The purpose of description specific embodiment, it is not intended that in limitation the utility model.Term as used herein "and/or" includes
Any and all combinations of one or more related listed items.
As illustrated in figures 3-6, the vapor deposition crucible 10 of an embodiment of the present invention, including Crucible body 100 and vapor deposition crucible
Lid 200, for Crucible body 100 for holding evaporation material and being heated, vapor deposition crucible cover 200 is covered on the crucible of Crucible body 100
On mouth.
Wherein, vapor deposition crucible cover 200 includes lid and the first cleaning piece 240.Lid is equipped with vapor deposition hole 222.Lid with
The connection of first cleaning piece 240.First cleaning piece 240 have the first extending portion, the first extending portion protrude into vapor deposition hole 222 in and close to
The hole wall in hole 222 is deposited.First cleaning piece 240 can be moved relative to the vapor deposition hole so that the first extending portion is along vapor deposition hole
222 hole wall circumferential movement, so that the first extending portion can strike off the evaporation material on the hole wall for being attached to vapor deposition hole 222.
Incorporated by reference to Fig. 3 and Fig. 4, lid is equipped with detent slot 223 in one of the embodiments, and Crucible body 100 is in phase
It answers position to be equipped with the main body protrusion 120 for carrying out clamping matching with detent slot 223, Crucible body 100 and vapor deposition earthenware can be limited
The relative position of crucible lid 200, limitation relatively rotate.Preferably, detent slot 224 and raised 120 shape and size of main body are corresponding,
It is allowed to fit closely.Further, Crucible body 100 is integrally formed with main body protrusion 120 in one of the embodiments, material
Matter is identical.It is appreciated that in other embodiments, detent protrusion can also be arranged on lid, Crucible body 100 is in corresponding positions
Set the body groove for being equipped with and carrying out clamping matching with detent protrusion.
Optionally, the material for crucible 10 being deposited can be but not limited to stainless steel and titanium etc..
It is equipped with the mounting groove of annular, the first cleaning piece 240 on lid around vapor deposition hole 222 in one of the embodiments,
Also there is the embedded division connecting with the first extending portion, embedded division activity is embedded in mounting groove.In the present embodiment, the first cleaning piece
240 embedded division can be moved along mounting groove, to make the first extending portion along the hole wall circumferential movement in vapor deposition hole 222.
In another embodiment, lid includes main cover body 224 and rotor 226.Wherein, main cover body 224 is set for covering
In on the mouth of pot of Crucible body 100.Vapor deposition hole 222 is located on main cover body 224.Rotor 226 is arranged on main cover body 224 simultaneously
And connect with the first cleaning piece 240, rotor 226 can be rotated relative to main cover body 224 to drive the first cleaning piece 240 to transport
It is dynamic.The vapor deposition crucible 10 of the present embodiment drives the movement of the first cleaning piece 240 by the way that rotor 226 is arranged on main cover body 224,
To make the first extending portion have the advantages of simple structure and easy realization along the hole wall circumferential movement in vapor deposition hole 222.
Further, in one of the embodiments, between main cover body 224 and rotor 226 by cricoid limiting slot and
Activity is embedded the mating connection of the retention bead in limiting slot, the process that can prevent rotor 226 from rotating relative to main cover body 224
It is middle to misplace, so that rotor 226 is rotated by particular form relative to main cover body 224 to guarantee that the first cleaning piece 240 is complete
At cleaning work.In a specific embodiment, main cover retention bead 2242 is set on main cover body 224, in rotor 226
The rotary spacing slot 2262 of upper corresponding position setting annular, 2242 activity of main cover retention bead are embedded at rotary spacing slot 2262
In.Preferably, main cover retention bead 2242 and rotary spacing slot 2262 can be bonded completely, and contact surface is smooth, is conducive to
The motion accuracy of the first cleaning piece 240 is improved, and the resistance that rotor 226 and main cover body 224 relatively rotate can be reduced.
It is appreciated that in other embodiments, the main cover limiting slot of annular can also be arranged on main cover body 224, turning
Corresponding position setting rotary spacing protrusion, rotary spacing protrusion activity are embedded in main cover limiting slot on kinetoplast 226.
Rotor 226 is equipped with rotor through-hole 228, and the rotor through-hole 228 and master in one of the embodiments,
Vapor deposition hole 222 on lid 224 is isometrical and is coaxially disposed.In the present embodiment, vapor deposition crucible cover 200 further includes the second cleaning piece
260, the second cleaning piece 260 is connected to main cover body 224, and the second cleaning piece 260 has the second extending portion, and the second extending portion, which is protruded into, to be turned
In kinetoplast through-hole 228 and when relatively rotating close to the hole wall of rotor through-hole 228, rotor 226 and main cover body 224, second stretches
The evaporation material being attached on the hole wall of rotor through-hole 228 can be struck off by entering portion.
Further, in one of the embodiments, the first cleaning piece 240 be it is rod-shaped, one end of the first cleaning piece 240 is fixed
On the hole wall of rotor through-hole 228, the other end of the first cleaning piece 240 is at least stretched at the lower ending opening in vapor deposition hole 222,
More preferably, the other end of the first cleaning piece 240 protrudes into and is pierced by vapor deposition hole 222；And/or second cleaning piece 260 be it is rod-shaped, the
One end of two cleaning pieces 260 is fixed on the hole wall in vapor deposition hole 222, and it is logical that the other end of the second cleaning piece at least stretches to rotor
At the upper end opening in hole 228, more preferably, the other end of the second cleaning piece 240 protrudes into and is pierced by rotor through-hole 228.
Optionally, the cross sectional shape radially of the first extending portion and the second extending portion in vapor deposition hole 222 can be but not
It is limited to linear, round or polygon etc..Steaming for evaporation material is caused in order to reduce the first extending portion and the second extending portion
Influence, vapor deposition hole 222 radially, the thickness of the first extending portion and the second extending portion is no more than the vapor deposition hole 222
The 1/5 of radius.
Optionally, the first cleaning piece 240 and the second cleaning piece 260 may each be one or more.
Vapor deposition crucible cover 200 further includes rotary driver 280 in one of the embodiments, rotary driver 280 with turn
The connection of kinetoplast 226 is to drive rotor 226 to rotate main cover body 224.By the way that rotary driver 280 is arranged, in vapor deposition process
In, evaporated device cavity is opened without cooling down, the cleaning work in vapor deposition hole 222 can be realized, avoids reducing production efficiency or drag
Slow experiment progress.Rotary driver 280 can choose servo motor, be able to drive 226 main story of rotor or reversion.
Above-mentioned vapor deposition crucible 10 and its vapor deposition crucible cover 200, are equipped with the first cleaning piece 240, the first cleaning piece on lid
240 can move so that its first extending portion is attached to vapor deposition hole along the hole wall circumferential movement in vapor deposition hole 222 so as to clear up
Evaporation material on 222 hole wall is conducive to improve the rate stability of vapor deposition and at film uniformity, and guarantees evaporation process
It is normally carried out.
Each technical characteristic of embodiment described above can be combined arbitrarily, for simplicity of description, not to above-mentioned reality
It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, all should be considered as described in this specification.
Above-described embodiments merely represent several embodiments of the utility model, the description thereof is more specific and detailed,
But it cannot be understood as the limitations to utility model patent range.It should be pointed out that for the common skill of this field
For art personnel, without departing from the concept of the premise utility, various modifications and improvements can be made, these are belonged to
The protection scope of the utility model.Therefore, the scope of protection shall be subject to the appended claims for the utility model patent.
Claims (10)
1. a kind of vapor deposition crucible cover, which is characterized in that including lid and the first cleaning piece；The lid is equipped with vapor deposition hole, institute
It states the first cleaning piece to be arranged on the lid, first cleaning piece has the first extending portion, and first extending portion is protruded into
In the vapor deposition hole and close to it is described vapor deposition hole hole wall, first cleaning piece can relative to the vapor deposition hole movement so that
Hole wall circumferential movement of first extending portion along the vapor deposition hole.
2. vapor deposition crucible cover as described in claim 1, which is characterized in that be equipped with annular around the vapor deposition hole on the lid
Mounting groove, first cleaning piece also has the embedded division connecting with first extending portion, and the embedded division activity is embedded
In the mounting groove.
3. vapor deposition crucible cover as described in claim 1, which is characterized in that the lid includes main cover body and rotor, described
Main cover body is used to be covered on the mouth of pot of Crucible body, and the vapor deposition hole is located on the main cover body, the rotor setting
On the main cover body, the rotor is connect with first cleaning piece, and the rotor can be relative to the main cover body
Rotation is to drive first cleaning piece to move.
4. vapor deposition crucible cover as claimed in claim 3, which is characterized in that the main cover body is equipped with main cover retention bead, described
Rotor is equipped with cricoid rotary spacing slot, and the main cover retention bead activity is embedded in the rotary spacing slot；Alternatively,
The main cover body is equipped with cricoid main cover limiting slot, and the rotor is equipped with rotary spacing protrusion, and the rotary spacing is convex
The activity of rising is embedded in the main cover limiting slot.
5. as claimed in claim 3 vapor deposition crucible cover, which is characterized in that the rotor be equipped with rotor through-hole, described turn
Kinetoplast through-hole is isometrical with the vapor deposition hole and is coaxially disposed, and the vapor deposition crucible cover further includes the second cleaning piece, and described second is clear
Reason part is connected to the main cover body, and second cleaning piece has the second extending portion, and the rotation is protruded into second extending portion
In body through-hole and close to the hole wall of the rotor through-hole.
6. vapor deposition crucible cover as claimed in claim 5, which is characterized in that first cleaning piece be it is rod-shaped, described first is clear
One end of reason part is fixed on the hole wall of the rotor through-hole, and the other end of first cleaning piece at least stretches to the steaming
At the lower ending opening of plated hole；And/or
Second cleaning piece be it is rod-shaped, one end of second cleaning piece is fixed on the hole wall in the vapor deposition hole, described the
The other end of two cleaning pieces at least stretches at the upper end opening of the rotor through-hole.
7. as claimed in claim 5 vapor deposition crucible cover, which is characterized in that the vapor deposition hole radially, described first stretches
Enter 1/5 of thickness no more than the radius that hole is deposited of portion and second extending portion.
8. such as the described in any item vapor deposition crucible covers of claim 3~7, which is characterized in that it further include rotary driver, described turn
Dynamic driver is connect to drive the rotor to rotate relative to the main cover body with the rotor.
9. a kind of vapor deposition crucible, which is characterized in that including Crucible body and vapor deposition as described in any one of claims 1 to 8
Crucible cover.
10. vapor deposition crucible as claimed in claim 9, which is characterized in that the lid is equipped with detent slot, the Crucible body
Equipped with the main body protrusion with the detent slot clamping matching；Alternatively,
The lid is equipped with detent protrusion, and the Crucible body is equipped with the body groove with the detent protrusion clamping matching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821211419.1U CN208562504U (en) | 2018-07-27 | 2018-07-27 | Crucible cover and vapor deposition crucible is deposited |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821211419.1U CN208562504U (en) | 2018-07-27 | 2018-07-27 | Crucible cover and vapor deposition crucible is deposited |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208562504U true CN208562504U (en) | 2019-03-01 |
Family
ID=65448788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821211419.1U Active CN208562504U (en) | 2018-07-27 | 2018-07-27 | Crucible cover and vapor deposition crucible is deposited |
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| Country | Link |
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| CN (1) | CN208562504U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111206228A (en) * | 2020-02-28 | 2020-05-29 | 苏州泓沵达仪器科技有限公司 | High-efficiency nano vacuum evaporation source |
| CN114075649A (en) * | 2020-12-24 | 2022-02-22 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device, and evaporation device |
| CN114427078A (en) * | 2022-01-26 | 2022-05-03 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source device and vacuum evaporation equipment |
| CN115369361A (en) * | 2021-08-26 | 2022-11-22 | 广东聚华印刷显示技术有限公司 | Evaporation crucible, evaporation equipment and evaporation method |
-
2018
- 2018-07-27 CN CN201821211419.1U patent/CN208562504U/en active Active
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111206228A (en) * | 2020-02-28 | 2020-05-29 | 苏州泓沵达仪器科技有限公司 | High-efficiency nano vacuum evaporation source |
| CN114075649A (en) * | 2020-12-24 | 2022-02-22 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device, and evaporation device |
| CN114075649B (en) * | 2020-12-24 | 2023-12-19 | 广东聚华印刷显示技术有限公司 | Crucible nozzle structure, crucible device and evaporation device |
| CN115369361A (en) * | 2021-08-26 | 2022-11-22 | 广东聚华印刷显示技术有限公司 | Evaporation crucible, evaporation equipment and evaporation method |
| CN115369361B (en) * | 2021-08-26 | 2023-12-22 | 广东聚华印刷显示技术有限公司 | Vapor deposition crucible, vapor deposition apparatus, and vapor deposition method |
| CN114427078A (en) * | 2022-01-26 | 2022-05-03 | 深圳市华星光电半导体显示技术有限公司 | Evaporation source device and vacuum evaporation equipment |
| CN114427078B (en) * | 2022-01-26 | 2024-02-02 | 深圳市华星光电半导体显示技术有限公司 | Vapor deposition source device and vacuum vapor deposition apparatus |
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