CN208436097U - A kind of mask substrate and the reservoir film comprising it - Google Patents

A kind of mask substrate and the reservoir film comprising it Download PDF

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Publication number
CN208436097U
CN208436097U CN201721490665.0U CN201721490665U CN208436097U CN 208436097 U CN208436097 U CN 208436097U CN 201721490665 U CN201721490665 U CN 201721490665U CN 208436097 U CN208436097 U CN 208436097U
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China
Prior art keywords
mask substrate
base
tapetum
substrate according
pure cellulose
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CN201721490665.0U
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Chinese (zh)
Inventor
邓喜艳
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Deng Xiyan
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Guangzhou Jiebao Nonwoven Products Co Ltd
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Priority to CN201721490665.0U priority Critical patent/CN208436097U/en
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Abstract

The utility model discloses a kind of mask substrate and the reservoir film comprising it, wherein, mask substrate includes base and the patch skin layers for being set to base side, and patch skin layers are tapetum, base and tapetum are integrally formed, and base is all made of pure cellulose fiber with tapetum and is made.The tapetum positioned at one side is integrally formed while forming base by using pure cellulose fiber, tapetum is used for the skin close to user, usage comfort can be promoted, tapetum can also effectively improve water lock effect, and not only soft also intensity is high for the mask substrate of pure cellulose fiber manufacture, is not susceptible to deform.The prior art is compared, the super thin and flexible patch skin of the mask substrate of the utility model is unlikely to deform, water lock effect is good.

Description

A kind of mask substrate and the reservoir film comprising it
Technical field
The utility model relates to a kind of mask substrate and include its reservoir film.
Background technique
It comes out so far from first patch type facial mask, mask substrate has rapidly developed more than ten years.As people live Horizontal raising, the requirement to mask substrate is higher and higher, and mask substrate has been needed towards the directions hair such as natural, patch skin, ultra-thin Exhibition.Existing mask substrate is primarily present following defect: 1, solid mask substrate, and change can be effectively prevented in this kind of mask substrate Shape, but mask substrate rough surface, influence using comfort, and the overstocked imbibition that can also reduce mask substrate of fibre matting Amount, water-retaining property and sticking nature, and then mask substrate quick-drying is made to harden, influence using effect;2, ultra-thin mask substrate, this kind of face Film base fabric, since its is relatively thin, is easily deformed than relatively soft patch skin, also will affect using effect.
Utility model content
The purpose of this utility model is to provide a kind of mask substrate and include its reservoir film, the soft patch of mask substrate Skin, and thinner thickness, water lock effect are good.
In order to achieve the above object, the utility model uses following technical scheme:
A kind of mask substrate is provided, including base and the patch skin layers for being set to the base side, the patch skin layers are suede Batt, the base and the tapetum are integrally formed, and the base and the tapetum are all made of pure cellulose fiber system At.
As a kind of preferred embodiment of mask substrate, the thickness of the tapetum is greater than the thickness of the base.
As a kind of preferred embodiment of mask substrate, the thickness of the tapetum is equal to two times of the thickness of the base.
As a kind of preferred embodiment of mask substrate, the base is equipped with multiple ventilative gaps.
As a kind of preferred embodiment of mask substrate, the diameter in the ventilative gap is not more than 0.01mm.
As a kind of preferred embodiment of mask substrate, multiple ventilative gaps are evenly distributed in the base.
As a kind of preferred embodiment of mask substrate, corresponded in the base user's face be arranged with facial T-type region, Forehead region, cheek region and chin area, wherein the diameter in the ventilative gap in the face T-type region is greater than described The diameter in the ventilative gap in forehead region, the forehead region, the cheek region and the chin area it is described The diameter in gas gap is consistent.
As a kind of preferred embodiment of mask substrate, the time of the mask substrate water lock is not less than 20min.
As a kind of preferred embodiment of mask substrate, the pure cellulose fiber is degreasing cotton fiber or degreasing silk.
On the other hand, a kind of reservoir film, including mask substrate as described above are provided.
It is located at the utility model has the beneficial effects that being integrally formed while forming base by using pure cellulose fiber The tapetum of one side, tapetum are used for the skin close to user, can promote usage comfort, tapetum can also be effective Water lock effect is improved, and not only soft also intensity is high for the mask substrate of pure cellulose fiber manufacture, is not susceptible to deform.Comparison is existing There is technology, the super thin and flexible patch skin of the mask substrate of the utility model is unlikely to deform, water lock effect is good.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the mask substrate of the utility model embodiment.
In figure:
1, mask substrate;11, base;12, tapetum.
Specific embodiment
Further illustrate the technical solution of the utility model below with reference to the accompanying drawings and specific embodiments.
As shown in Figure 1, the utility model embodiment provides a kind of mask substrate 1, this mask substrate 1 includes base 11 and sets The patch skin layers of 11 side of base are placed in, the patch skin layers are tapetum 12, the base 11 and 12 one of tapetum Molding, and the base 11 is all made of pure cellulose fiber with the tapetum 12 and is made.Exist by using pure cellulose fiber The tapetum 12 for being located at one side is integrally formed while forming base 11, tapetum 12 is used for the skin close to user, can To promote usage comfort, tapetum 12 can also effectively improve water lock effect, and the mask substrate 1 of pure cellulose fiber manufacture Not only soft also intensity is high, is not susceptible to deform.Compare the prior art, the mask substrate of the utility model 1 super thin and flexible patch Skin is unlikely to deform, and water lock effect is good.
Specifically, the thickness of the tapetum 12 is greater than the thickness of the base 11.In the present embodiment, the tapetum 12 thickness is equal to two times of the thickness of the base 11.The thickness of tapetum 12 is thicker, and representative protrudes from 11 surface of base The length of every villus is longer, and then tapetum 12 is made to can absorb more nutrient solution, improves the water lock effect of entire mask substrate 1 Fruit, and tapetum 12 is thicker, the feeling being fitted on human skin gets over soft comfortable, improves comfort.
In a preferred embodiment of the utility model, the base 11 is equipped with multiple ventilative gaps.Specifically, The diameter in the ventilative gap is not more than 0.01mm.By setting the diameter in ventilative gap to no more than 0.01mm, so that base Layer 11 improves the intensity of base 11 while guaranteeing good air permeability effect and water lock effect, prevents base 11 from deforming, Further promote using effect.
Further, multiple ventilative gaps are evenly distributed in the base 11.Equally distributed ventilative gap makes The air permeability effect for obtaining each position of mask substrate 1 is consistent.
In other embodiments, breathe freely gap can also uneven distribution, specifically, corresponding to user face in the base 11 Part is equipped with facial T-type region, forehead region, cheek region and chin area, wherein the face T-type region it is described The diameter in gas gap be greater than the forehead region the ventilative gap diameter, the forehead region, the cheek region and The diameter in the ventilative gap of the chin area is consistent.The T-type area of the face of user generally falls into water shortage critical regions, Therefore it sets larger for the ventilative gap in the facial T-type region of base 11, regional area enhancing gas permeability and benefit may be implemented Water effect, and such design will not reduce the intensity of entire mask substrate 1.
Further, the time of 1 water lock of mask substrate is not less than 20min.The Best Times of general face mask film are 15min, and the time of this 1 water lock of mask substrate is not less than 20min, it is seen that its water lock excellent.
In another preferred embodiment of the utility model, the pure cellulose fiber is degreasing cotton fiber or degreasing Silk.Degreasing cotton fiber and degreasing silk are the higher fiber of containing cellulose, the facial mask made using both fibers Base fabric 1 is not only more soft, and water lock effect is good, increases the intensity of mask substrate 1, is unlikely to deform, in addition, pure cellulose Fiber will not cause any sense of discomfort, be applicable to any skin and use, especially sensitive skin.
The following are the production technologies of the mask substrate 1 of the utility model embodiment:
In the production environment of constant temperature and humidity, pure cellulose fiber passes through removal of impurities shredding to complete soft fluffy state, through circling round Air-flow it is lossless it is free of contamination be transported in machine, then flocculence is polymerized to by high pressure gas pressure, then passes through thousands of diameters Just right no more than the soft silk of the alloy of 0.01mm not exclusively punctures.
This mask substrate 1 is with highdensity while keeping highly-breathable, it is most important that is made of above-mentioned technique Mask substrate 1 will not generate any injury to pure cellulose fiber itself, guarantee that every pure cellulose fiber can be played Its optimal effect.
The utility model embodiment also provides a kind of reservoir film comprising the mask substrate 1 of any embodiment as above.
In addition, reservoir film further includes nutrition liquid layer, this nutrition liquid layer is coated on mask substrate 1, in the present embodiment, institute Stating nutrition liquid layer is collagen oligopeptide layer.The main component of collagen oligopeptide layer is that the hydrophily collagen of small molecule is few Peptide, the function that there is supplement skin-nourishing, cell activity, help and promotion skin is promoted quickly to heal due to collagen oligopeptide Effect, and its molecular weight is lower than 500 dalton, it is affine to skin, non-stimulated, corium can be penetrated into fast strikethrough keratoderma Play a role, play moisturizing, it is crease-resistant, delay senescence, lighten the stain, whitening reparation and other effects.There is collagen oligopeptide as a result, The reservoir film of layer has preferable skin-protecting function.
Optionally, nutrition liquid layer further includes other skin care ingredients such as hyaluronic acid, seaweed essence and VE.
Nutrition liquid layer is not limited to above-mentioned material, can also select other materials according to actual needs.
It is to be understood that above-mentioned specific embodiment is only the preferred embodiment and institute's application technology of the utility model Principle, in technical scope disclosed in the utility model, what anyone skilled in the art was readily apparent that Change or replacement should all be covered within the protection scope of the present utility model.

Claims (10)

1. a kind of mask substrate, which is characterized in that including base and the patch skin layers for being set to the base side, the patch skin layers For tapetum, the base and the tapetum are integrally formed, and the base and the tapetum are all made of pure cellulose fibre Dimension is made.
2. mask substrate according to claim 1, which is characterized in that the thickness of the tapetum is greater than the thickness of the base Degree.
3. mask substrate according to claim 2, which is characterized in that the thickness of the tapetum is equal to the thickness of the base Two times of degree.
4. mask substrate according to any one of claims 1 to 3, which is characterized in that the base is equipped with multiple ventilative Gap.
5. mask substrate according to claim 4, which is characterized in that the diameter in the ventilative gap is not more than 0.01mm.
6. mask substrate according to claim 5, which is characterized in that multiple ventilative gaps are evenly distributed on the base On layer.
7. mask substrate according to claim 5, which is characterized in that correspond to user's face in the base and be arranged with face Portion T-type region, forehead region, cheek region and chin area, wherein the ventilative gap in the face T-type region it is straight Diameter is greater than the diameter in the ventilative gap in the forehead region, the forehead region, the cheek region and the chin area The diameter in the ventilative gap in domain is consistent.
8. mask substrate according to any one of claims 1 to 3, which is characterized in that the time of the mask substrate water lock Not less than 20min.
9. mask substrate according to any one of claims 1 to 3, which is characterized in that the pure cellulose fiber is degreasing Cotton fiber or degreasing silk.
10. a kind of reservoir film, which is characterized in that including mask substrate as described in any one of claim 1 to 9.
CN201721490665.0U 2017-11-09 2017-11-09 A kind of mask substrate and the reservoir film comprising it Active CN208436097U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201721490665.0U CN208436097U (en) 2017-11-09 2017-11-09 A kind of mask substrate and the reservoir film comprising it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201721490665.0U CN208436097U (en) 2017-11-09 2017-11-09 A kind of mask substrate and the reservoir film comprising it

Publications (1)

Publication Number Publication Date
CN208436097U true CN208436097U (en) 2019-01-29

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Country Status (1)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111472091A (en) * 2020-05-07 2020-07-31 江苏伟创力新材料有限公司 Three-dimensional facial mask non-woven fabric and manufacturing method thereof
CN112315817A (en) * 2020-11-06 2021-02-05 何丽 Adaptive extension type efficient permeable mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111472091A (en) * 2020-05-07 2020-07-31 江苏伟创力新材料有限公司 Three-dimensional facial mask non-woven fabric and manufacturing method thereof
CN112315817A (en) * 2020-11-06 2021-02-05 何丽 Adaptive extension type efficient permeable mask
CN112315817B (en) * 2020-11-06 2022-03-29 广州妙龄化妆品有限公司 Adaptive extension type efficient permeable mask

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Date Code Title Description
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right

Effective date of registration: 20230117

Address after: No. 2301, Longxi Yunfeng Building, No. 20, Qide Road, Helong Street, Baiyun District, Guangzhou, Guangdong, 510000

Patentee after: Deng Xiyan

Address before: 3/F, Block A, No. 20, Hetai Road, Helong Street, Baiyun District, Guangzhou, Guangdong, 510000

Patentee before: GUANGZHOU JIEBAO NON-WOVEN PRODUCTS CO.,LTD.

TR01 Transfer of patent right