CN208142152U - A kind of wafer and MASK are individually picked and placed and precise positioning mechanism - Google Patents
A kind of wafer and MASK are individually picked and placed and precise positioning mechanism Download PDFInfo
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- CN208142152U CN208142152U CN201820659882.6U CN201820659882U CN208142152U CN 208142152 U CN208142152 U CN 208142152U CN 201820659882 U CN201820659882 U CN 201820659882U CN 208142152 U CN208142152 U CN 208142152U
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- wafer
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- supporting element
- positioning
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Abstract
It is individually picked and placed the utility model discloses a kind of wafer and MASK and precise positioning mechanism, including the lifting shaft vertically gone up and down, wafer support plate, MASK, and positioning carrier, at least three support rods are provided at the top of lifting shaft, it is provided with the first supporting element that one is used to support wafer support plate on each support rod and one is located above first supporting element, it is used to support the second supporting element of MASK, it is provided on positioning carrier for support rod, first supporting element and the second supporting element vertically pass through the first resigning opening of positioning carrier, the second resigning opening that wafer support plate is vertically passed through for the second supporting element is additionally provided on wafer support plate.The utility model has the beneficial effects that：It solves the problems, such as wafer and MASK precise positioning in vacuum environment, also creatively devises double-layer lifting device, realize that wafer and the independent of MASK take, put.
Description
Technical field
The utility model relates to wafer processing techniques field, especially a kind of wafer is individually picked and placed with MASK and precise positioning
Mechanism.
Background technique
In semiconductor PVD, CVD technique, it is often necessary to be placed above wafer in vacuum environment of different shapes
MASK（Mask plate）, by figure specific on MASK, in the film of crystal column surface deposition specific function.For the essence for guaranteeing film
Degree, must be requested that wafer and MASK precise positioning.But that there are positioning accuracies is low for existing positioning mechanism, is difficult to quantity-produced technology
Problem.
Utility model content
The shortcomings that the purpose of the utility model is to overcome the prior arts, provides a kind of wafer and MASK is individually picked and placed and smart
Quasi- positioning mechanism may be implemented during continuous coating, the independent pick-and-place of wafer and MASK and precise positioning, thus in crystalline substance
The film that circular surfaces deposit special shape provides necessary condition.
Cooperate wafer manipulator, realize the precise locating function of wafer and MASK in vacuum environment, while guaranteeing wafer
It can individually be picked and placed with MASK, be convenient for continuous production
The purpose of this utility model is achieved through the following technical solutions：A kind of wafer and MASK individually picks and places and it is accurate calmly
Position mechanism, the lifting shaft including vertically going up and down, wafer support plate, MASK for containing wafer（Mask plate）, Yi Jigu
It is arranged and is used to support wafer support plate and the positioning carrier of MASK calmly, is provided at the top of lifting shaft horizontally extending
Connecting plate is provided at least three support rods being arranged in vertical at the top of connecting plate, is provided on each support rod
One the first supporting element for being used to support wafer support plate and one is located above first supporting element, is used to support the of MASK
Two supporting elements, wafer support plate is horizontally-supported by the first supporting element, and MASK is horizontally-supported by the second supporting element and is located at wafer support plate
Surface, when lifting arm is located at it is high-order when, positioning carrier is located at the lower section of MASK and wafer support plate, and the positioning carries
It is provided on disk for support rod, the first supporting element and the second supporting element vertically to pass through the first of positioning carrier and step down and open
Mouthful, position carrier on be additionally provided with multiple positioning pins extended in the vertical direction, be provided on the MASK with it is described fixed
The first positioning hole matched is sold in position, is provided with the second location hole matched with the positioning pin, wafer on wafer support plate
The second resigning opening that wafer support plate is vertically passed through for the second supporting element is additionally provided on plate.When lifting shaft from a high position to
Under when dropping to status, support rod is stepped down from first be open in vertical downward movement, the first supporting element first vertically to
Under step down opening across the first of positioning carrier, while the first positioning hole of wafer support plate is set on positioning pin, and final
Wafer support plate is supported by positioning carrier, support rod continues vertically downward, and the second supporting element is successively passed down through wafer support plate
Second the first resigning for stepping down opening and positioning carrier is open, meanwhile, the second vacancy hole of MASK is set on positioning pin, and
Final MASK is covered on wafer support plate.Support rod continuation completely disengages wafer support plate and MASK vertically downward.
When work, lifting shaft is risen into highest order, then wafer support plate is placed under elevating mechanism by manipulator
Layer, then elevating mechanism declines a distance, then MASK is placed to the upper layer of elevating mechanism by manipulator, can guarantee in this way
The independent pick-and-place of wafer and MASK.Pass through the first positioning hole and positioning carrying in the second location hole and MASK on wafer support plate
The cooperation of the positioning pin of disk, it is ensured that the location error of wafer and MASK are less than ± 0.1mm.The space reserved between support rod, side
Just manipulator disengaging picks and places wafer and MASK.There are four support rods for setting in the present embodiment.Preferably, it is arranged on the MASK
There is the third location hole matched with manipulator, the 4th positioning matched with manipulator is provided on the wafer support plate
Hole.
The driving device that the lifting axis connection drives it to go up and down, the driving device include the fixation of fixed setting
Flange is provided with the through-hole passed through for lifting shaft on mounting flange, and the bottom of mounting flange is successively fixedly installed with straight line mould group
The driving motor vertically gone up and down with the sliding block of driving straight line mould group, the bottom of lifting shaft is fixedly connected with a slide block.It is fixed
Flange and positioning carrier can be fixedly installed in rack.It is driven and is gone up and down by servo motor, accurately control lifting distance.
Preferably, it is equipped with and is set in outside lifting shaft, for sealing lifting shaft between the sliding block and mounting flange
Welding bellows.
The utility model has the following advantages that：
The utility model has well solved the problem of wafer is with MASK precise positioning in vacuum environment, also creatively
Double-layer lifting device is devised, realizes that wafer and the independent of MASK take, put.Therefore, wafer is only needed to change, continuous life can be reached
The purpose of production substantially increases production efficiency, while having saved cost.By the cooperation of pin hole, wafer and MASK are realized
Automatic and accurate positioning function guarantees that position error is less than ± 0.1mm.By the way that double-layer lifting mechanism is arranged, wafer and MASK are realized
Independent pick-and-place.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model.
Fig. 2 is the schematic perspective view of the utility model.
Fig. 3 is integrally-built schematic perspective view after the lifting shaft of the utility model declines.
Fig. 4 is the schematic diagram of wafer support plate and the first supporting element fit structure in the utility model one embodiment.
Fig. 5 is the schematic diagram of MASK and the second supporting element fit structure in the utility model one embodiment.
Fig. 6 is the structural schematic diagram that loading plate is positioned in the utility model one embodiment.
Specific embodiment
The utility model is further described with reference to the accompanying drawing：
As shown in figs 1 to 6, a kind of wafer and MASK are individually picked and placed and precise positioning mechanism, including are vertically gone up and down
Lifting shaft 1, wafer support plate 8, MASK for containing wafer（Mask plate）7 and fixed setting and be used to support wafer
The positioning carrier 4 of plate 8 and MASK7, the top of lifting shaft 1 are provided with horizontally extending connecting plate 2, connecting plate 2
Top is provided at least three support rods 3 being arranged in vertical, and is provided with one on each support rod 3 and is used to support crystalline substance
First supporting element 5 of circle support plate 8 and second supporting element 6 for being located at 5 top of the first supporting element, being used to support MASK7,
Wafer support plate 8 is horizontally-supported by the first supporting element 5, and MASK7 is horizontally-supported by the second supporting element 6 and is located at wafer support plate 8 just
Top, when lifting arm is located at a high position, positioning carrier 4 is located at the lower section of MASK7 and wafer support plate 8, the positioning carrying
It is provided on disk 4 and vertically passes through the first of positioning carrier 4 for support rod 3, the first supporting element 5 and the second supporting element 6
Resigning opening 15 positions and is additionally provided with multiple positioning pins 9 extended in the vertical direction on carrier 4, is arranged on the MASK7
There is the first positioning hole 10 matched with the positioning pin 9, matched with the positioning pin 9 is provided on wafer support plate 8
Two location holes 11 are additionally provided on wafer support plate 8 and vertically step down across the second of wafer support plate 8 for the second supporting element 6
Opening 12.When lifting shaft 1 is lowered down to status from a high position, the vertical downward movement out of first resigning opening 15 of support rod 3,
First supporting element 5 passes through the first of positioning carrier 4 vertically down first and steps down opening 15, while wafer support plate 8
First positioning hole 10 is set on positioning pin 9, and finally supports wafer support plate 8 by positioning carrier 4, and support rod 3 continues vertically
Downwards, the second supporting element 6 is successively passed down through the second resigning opening 12 of wafer support plate 8 and the first of positioning carrier 4 is stepped down
Opening 15, meanwhile, the second vacancy hole of MASK7 is set on positioning pin 9, and final MASK7 is covered on wafer support plate 8.Branch
The continuation of strut 3 completely disengages wafer support plate 8 and MASK7 vertically downward.
When work, lifting shaft 1 is risen into highest order, wafer support plate 8 is then placed on by elevating mechanism by manipulator
Lower layer, then elevating mechanism declines a distance, then MASK7 is placed to the upper layer of elevating mechanism by manipulator, in this way
Guarantee the independent pick-and-place of wafer and MASK7.Pass through the second location hole 11 on wafer support plate 8 and the first positioning hole on MASK7
10 with positioning carrier 4 positioning pin 9 cooperation, it is ensured that the location error of wafer and MASK7 be less than ± 0.1mm.Support rod 3
Between the space reserved, facilitate manipulator disengaging to pick and place wafer and MASK7.There are four support rods 3 for setting in the present embodiment.It is preferred that
, the third location hole 13 matched with manipulator is provided on the MASK7, be provided on the wafer support plate 8 with
The 4th location hole 14 that manipulator matches.
The connection of lifting shaft 1 drives the driving device of its lifting, and the driving device includes consolidating for fixed setting
Determine flange 17, the through-hole passed through for lifting shaft 1 is provided on mounting flange 17, the bottom of mounting flange 17 is successively fixedly installed with
The driving motor 19 that the sliding block of straight line mould group 18 and driving straight line mould group 18 is vertically gone up and down, the bottom of lifting shaft 1 and cunning
Block is fixedly connected.Mounting flange 17 and positioning carrier 4 can be fixedly installed on rack（It is not shown in the figure）On.By servo motor
Driving lifting, accurately controls lifting distance.
Preferably, it is equipped with and is set in outside lifting shaft 1, for sealing lifting between the sliding block and mounting flange 17
The welding bellows 20 of axis 1.
Positioning carrier 4 is mounted on the surface of elevating mechanism, the intermediate hollow out of carrier 4 is positioned, convenient for elevating mechanism
Four support rods 3 are gone up and down.Three positioning pins 9 of disk circumference, position is consistent with the location hole of wafer support plate 8 and MASK7, protects
Positioning accuracy after card placement.
Supporting element is mounted on the support rod 3 of elevating mechanism, totally eight in the present embodiment, is divided into upper layer and lower layer, upper layer is used
Place MASK7, lower layer is used to place wafer support plate 8.By adjusting the position height of every supporting element, guarantee every layer of supporting element
Apparent height is consistent, by adjusting angle, guarantees the gap between supporting element and wafer support plate 8 and MASK7, while guaranteeing upper layer
Supporting element, which just can step down to be open from 12 from the second of wafer support plate 8, to be passed through.
MASK7 is circular flat plate structure, intermediate according to coating process needs, processes different pattern.MASK7 surrounding processing the
A positioning hole 10 and third location hole 13, first positioning hole 10 and the positioning pin 9 positioned on carrier 4 cooperate, guarantee and wafer
Position precision, the positioning pin 9 of third location hole 13 and mechanical paw on hand cooperates, and guarantees essence when manipulator picks and places MASK7
Degree.
Wafer support plate 8 is circular flat plate structure, intermediate to process wafer carrying table top according to wafer size.The processing of wafer surrounding
Second location hole 11 and the 4th location hole 14, third location hole 13 and positioning carrier 4 on positioning pin 9 cooperate, guarantee with
The position precision of MASK7, the 4th location hole 14 cooperates with the positioning pin 9 of mechanical paw on hand, when guaranteeing that manipulator picks and places wafer
Precision.Meanwhile the second resigning of 8 surrounding of wafer support plate processing opening 12, position is consistent with the second supporting element 6, guarantees placement
When MASK7, the second supporting element 6 will not interfere with wafer support plate 8.
Claims (4)
1. a kind of wafer and MASK are individually picked and placed and precise positioning mechanism, it is characterised in that：Including the liter vertically gone up and down
It drop axis, the wafer support plate for containing wafer, MASK and fixed setting and is used to support the positioning of wafer support plate and MASK and holds
Load plate is provided with horizontally extending connecting plate at the top of lifting shaft, and at least three are provided at the top of connecting plate along hanging down
Histogram is provided with the first supporting element and one that one is used to support wafer support plate on each support rod to the support rod of setting
Above first supporting element, it is used to support the second supporting element of MASK, wafer support plate is horizontally-supported by the first supporting element,
MASK is horizontally-supported by the second supporting element and is located at the surface of wafer support plate, when lifting arm is located at a high position, positions carrier
Positioned at the lower section of MASK and wafer support plate, it is provided on the positioning carrier for support rod, the first supporting element and second
Support member vertically pass through positioning carrier first step down opening, position carrier on be additionally provided with it is multiple vertically
The positioning pin of extension is provided with the first positioning hole matched with the positioning pin on the MASK, is arranged on wafer support plate
There is the second location hole matched with the positioning pin, is additionally provided on wafer support plate and is vertically passed through for the second supporting element
The second of wafer support plate, which is stepped down, to be open.
2. a kind of wafer according to claim 1 and MASK are individually picked and placed and precise positioning mechanism, it is characterised in that：It is described
MASK on be provided with the third location hole matched with manipulator, be provided on the wafer support plate and matched with manipulator
The 4th location hole.
3. a kind of wafer according to claim 1 and MASK are individually picked and placed and precise positioning mechanism, it is characterised in that：It is described
Lifting axis connection drive its go up and down driving device, the driving device include fixed setting mounting flange, fixation
The through-hole passed through for lifting shaft is provided on orchid, the bottom of mounting flange is successively fixedly installed with straight line mould group and driving straight line mould
The driving motor that the sliding block of group is vertically gone up and down, the bottom of lifting shaft is fixedly connected with a slide block.
4. a kind of wafer according to claim 3 and MASK are individually picked and placed and precise positioning mechanism, it is characterised in that：It is described
Sliding block and mounting flange between the welding bellows being set in outside lifting shaft, for sealing lifting shaft is installed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820659882.6U CN208142152U (en) | 2018-05-04 | 2018-05-04 | A kind of wafer and MASK are individually picked and placed and precise positioning mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820659882.6U CN208142152U (en) | 2018-05-04 | 2018-05-04 | A kind of wafer and MASK are individually picked and placed and precise positioning mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208142152U true CN208142152U (en) | 2018-11-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820659882.6U Active CN208142152U (en) | 2018-05-04 | 2018-05-04 | A kind of wafer and MASK are individually picked and placed and precise positioning mechanism |
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| CN (1) | CN208142152U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108389821A (en) * | 2018-05-04 | 2018-08-10 | 成都华聚科技有限公司 | A kind of wafer individually picks and places and precise positioning mechanism with MASK |
| CN109624109A (en) * | 2019-02-20 | 2019-04-16 | 广州安特激光技术有限公司 | A kind of plummer of wafer cutter device |
-
2018
- 2018-05-04 CN CN201820659882.6U patent/CN208142152U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108389821A (en) * | 2018-05-04 | 2018-08-10 | 成都华聚科技有限公司 | A kind of wafer individually picks and places and precise positioning mechanism with MASK |
| CN109624109A (en) * | 2019-02-20 | 2019-04-16 | 广州安特激光技术有限公司 | A kind of plummer of wafer cutter device |
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