CN208127246U - A kind of exposure mask plate framework - Google Patents
A kind of exposure mask plate framework Download PDFInfo
- Publication number
- CN208127246U CN208127246U CN201820780470.8U CN201820780470U CN208127246U CN 208127246 U CN208127246 U CN 208127246U CN 201820780470 U CN201820780470 U CN 201820780470U CN 208127246 U CN208127246 U CN 208127246U
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- China
- Prior art keywords
- mask plate
- frame
- exposure mask
- plate framework
- friction protrusion
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Abstract
The utility model relates to show equipment manufacturing technology field, disclose a kind of exposure mask plate framework, the exposure mask plate framework includes successively joining end to end to form multiple frames of closed ring structure, the top surface of each frame forms mask plate welding surface, and the bottom surface of each frame is formed with the friction protrusion of multiple protrusion bottom surfaces.The exposure mask plate framework by the bottom surface of frame setting favour bottom surface and with the bottom surface of frame formed angle in towards closed ring structure center position angle be acute angle friction protrusion, increase the frictional force between bottom surface and the microscope carrier for placing exposure mask plate framework and the opposite direction drag after the extruding force applied by positioning column on microscope carrier, it is squeezed the case where deformation occurs in placement process so as to improve, and then achievees the effect that improve product yield.
Description
Technical field
The utility model relates to show equipment manufacturing technology field, in particular to a kind of exposure mask plate framework.
Background technique
Existing organic vapor deposition plated film is carried out in vapor deposition chamber, using high-precision metal mask plate as mold, is had
It is penetrated after the volatilization of machine material at high temperature with material molecule state and realizes have on the effective vent vapor deposition to back-panel glass of metal mask plate
Machine shines.Wherein, metal mask plate is fixed by exposure mask plate framework, and back-panel glass is placed on metal mask plate, exposure mask sheet frame
Frame is placed on microscope carrier, and organic material is from crucible through on vaporization at high temperature to back-panel glass, forming effective pattern of pixels.In the prior art
Exposure mask plate framework be placed on microscope carrier after, be easy be in contact with the positioning column on microscope carrier, the position of positioning column be it is fixed,
Relative challenge power occurs for meeting and the exposure mask plate framework contacted with positioning column, so that exposure mask plate framework generates deformation, deformation such as Fig. 1 institute
Show, the position so as to cause the metal mask plate fixed with exposure mask plate framework shifts, and causes the bad generations such as vapor deposition colour mixture.
Utility model content
The utility model provides a kind of exposure mask plate framework, and above-mentioned exposure mask plate framework can improve in placement process by crowded
Pressure and the case where deformation occurs, and then achieve the effect that improve product yield.
In order to achieve the above objectives, the utility model provides following technical scheme：
A kind of exposure mask plate framework forms multiple frames of closed ring structure including successively joining end to end, each described
The top surface of frame forms mask plate welding surface, and the bottom surface of each frame is formed with the friction of multiple protrusion bottom surfaces
Protrusion.
Above-mentioned exposure mask plate framework includes successively joining end to end to form multiple frames of closed ring structure, wherein each side
The top surface of frame forms mask plate welding surface, and mask plate welding surface is used to solder mask plate, so that mask plate is fixed on multiple frames
Among the closed ring structure of formation, pass through mask plate region corresponding among closed ring structure after organic material vaporization at high temperature
After be deposited in back-panel glass；The bottom surface of each frame is formed with the friction protrusion of multiple protrusion bottom surfaces, friction
Protrusion can increase the friction between the surface that exposure mask plate framework is contacted with microscope carrier when exposure mask plate framework is placed on microscope carrier
Power reduces the deformation that exposure mask plate framework occurs because contacting with the positioning column on microscope carrier, to prevent from fixing with exposure mask plate framework
The position of metal mask plate shift, the hair of mixed color phenomenon is deposited caused by reducing due to metal mask plate positional shift
It is raw, to greatly improve vapor deposition yield.
Preferably, multiple grooves that there is at least one described frame opening to be located at bottom surface, it is described recessed per adjacent two
A friction protrusion is formed between slot.
Preferably, the bottom surface of each frame, which is formed with, is directed toward the frame center position along the frame outer edge
Multiple rows of friction protrusion of arrangement.
Preferably, the friction protrusion that each described frame has is in array distribution in the bottom surface of the frame.
Preferably, along the direction with the plane perpendicular of the frame, the height of each friction protrusion is 5 μm to 10
μm。
Preferably, the spacing between friction protrusion described in each adjacent two is 1mm to 5mm.
Preferably, the friction protrusion is obliquely installed the bottom surface shape in the bottom surface and the friction protrusion and the frame
At angle in towards the angle of the closed ring structure center position be acute angle.
Preferably, each described frame has step structure, institute away from the side at the closed ring structure center
The cascaded surface of step structure is stated away from the bottom surface of the frame and parallel with the top surface of the frame.
Preferably, the maximum distance between the bottom surface of the frame and the mask plate welding surface is 20mm to 30mm,
Described in the distance between cascaded surface and the mask plate welding surface be 10mm to 20mm.
Preferably, the frame includes multiple positioning mechanisms.
Detailed description of the invention
Fig. 1 is exposure mask plate framework deformation schematic diagram in the prior art；
Fig. 2 is a kind of mask plate frame schematic bottom view provided in the utility model；
Fig. 3 is that the exposure mask plate framework provided in the utility model is directed toward frame center position along perpendicular to frame outer edge
Schematic cross-section；
Fig. 4 is that the exposure mask plate framework provided in the utility model shows along the section that frame outer edge is directed toward frame center position
It is intended to.
Icon：
1- frame；2- mask plate welding surface；3- friction protrusion；4- groove；5- positioning mechanism.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Fig. 2, Fig. 3 and Fig. 4 are please referred to, the utility model provides a kind of exposure mask plate framework, including successively joins end to end with shape
At multiple frames 1 of closed ring structure, the top surface of each frame 1 forms mask plate welding surface 2, and the bottom of each frame 1
Face is formed with the friction protrusion 3 of multiple protrusion bottom surfaces.
Above-mentioned exposure mask plate framework includes successively joining end to end to form multiple frames 1 of closed ring structure, wherein each
The top surface of frame 1 forms mask plate welding surface 2, and mask plate welding surface 2 is used to solder mask plate so that mask plate be fixed on it is multiple
Among the closed ring structure that frame 1 is formed, pass through exposure mask corresponding among closed ring structure after organic material vaporization at high temperature
Behind plate region on vapor deposition to back-panel glass；The bottom surface of each frame 1 is formed with the friction protrusion 3 of multiple protrusion bottom surfaces, friction
Protrusion 3 can increase the friction between the surface that exposure mask plate framework is contacted with microscope carrier when exposure mask plate framework is placed on microscope carrier
Power reduces the deformation that exposure mask plate framework occurs because contacting with the positioning column on microscope carrier, to prevent from fixing with exposure mask plate framework
The position of metal mask plate shift, the hair of mixed color phenomenon is deposited caused by reducing due to metal mask plate positional shift
It is raw, to greatly improve vapor deposition yield.
Specifically, at least one frame 1 has opening between multiple grooves 4 of bottom surface, every two adjacent grooves 4
Form a friction protrusion 3.
Friction protrusion 3 is formed by setting groove 4, forms a friction protrusion 3 between every two adjacent grooves 4,
The manufacture craft of groove 4 can be made of milling machine, can also be formed using carving the modes such as aperture, groove 4 at least formed on
The bottom surface of one frame 1, in order to increase the frictional force of each 1 bottom surface of frame, groove 4 can be formed in the bottom surface of each frame 1 with
Reach better effect.
Specifically, the bottom surface of each frame 1, which is formed with, is directed toward the more of 1 center position of frame arrangement along 1 outer edge of frame
Arrange friction protrusion 3.
Multiple rows of friction protrusion 3 is formed in the bottom surface of each frame 1, the frictional force of 1 bottom surface of frame can be increased, subtracted as far as possible
The generation of few mask plate deformation, reaches better evaporation effect.
Specifically, as shown in Fig. 2, the friction protrusion 3 that has of each frame 1 in the bottom surface of frame 1 in array distribution.
Friction protrusion 3 is in array distribution in the bottom surface of frame 1, can simplify processing technology, reduces process time.
Specifically, along the direction with the plane perpendicular of frame 1, the height of each friction protrusion 3 is 5 μm to 10 μm.
To guarantee the flatness after exposure mask plate framework is placed into microscope carrier surface, the bulge quantity of friction protrusion 3 is controlled at 5 μm extremely
10 μm, overall flat degree is nor affected on while increasing frictional resistance, is covered with guaranteeing that back-panel glass can be flatly placed in
On diaphragm plate, so that evaporation effect is more preferable.
Specifically, the spacing between each adjacent two friction protrusion 3 is 1mm to 5mm.
Spacing between each adjacent two friction protrusion 3 is controlled in 1mm to 5mm, can be on the basis of adapting to border width
Increase frictional force.
Specifically, as shown in figure 4, friction protrusion 3 is obliquely installed in the formation of the bottom surface of bottom surface and friction protrusion 3 and frame
It towards the angle of closed ring structure center position is acute angle in angle.
Towards mask plate frame center direction in the angle that the inclined direction of friction protrusion 3 and the bottom surface of frame 1 are formed
Angle is acute angle, and design in this way can further enhance the frictional force between friction protrusion 3 and microscope carrier.
Specifically, as shown in figure 4, each frame 1 has step structure, ladder away from the side at ring structure center
The cascaded surface of shape structure is away from the bottom surface of frame 1 and parallel with the top surface of frame 1.
The width of mask plate welding surface 2 is less than the maximum width of frame 1 to form step structure.
Be also formed on mask plate welding surface 2 it is multiple keep away a hole, be used to place the manipulator of back-panel glass to avoid so that
Back-panel glass can be flat be placed on mask plate.
Specifically, the maximum distance between the bottom surface of frame 1 and mask plate welding surface 2 is 20mm to 30mm, wherein ladder
The distance between face and mask plate welding surface 2 are 10mm to 20mm.
Specifically, frame 1 includes multiple positioning mechanisms 5.
Positioning mechanism 5 includes being formed in contraposition through-hole between 1 cascaded surface of frame and bottom surface, as shown in figure 3, convenient to covering
The position of diaphragm plate frame is determined.
Obviously, those skilled in the art the utility model embodiment can be carried out various modification and variations without departing from
The spirit and scope of the utility model.In this way, if these modifications and variations of the present invention belong to the utility model right
It is required that and its within the scope of equivalent technologies, then the utility model is also intended to include these modifications and variations.
Claims (10)
1. a kind of exposure mask plate framework, which is characterized in that multiple frames of closed ring structure are formed including successively joining end to end,
The top surface of each frame forms mask plate welding surface, and the bottom surface of each frame is formed with multiple protrusion bottoms
The friction protrusion in face.
2. exposure mask plate framework according to claim 1, which is characterized in that there is at least one described frame opening to be located at bottom
Multiple grooves in face often form a friction protrusion between two adjacent grooves.
3. exposure mask plate framework according to claim 1, which is characterized in that the bottom surface of each frame is formed with along institute
State multiple rows of friction protrusion that frame outer edge is directed toward the frame center position arrangement.
4. exposure mask plate framework according to claim 3, which is characterized in that the friction protrusion that each described frame has exists
The bottom surface of the frame is in array distribution.
5. exposure mask plate framework according to claim 1, which is characterized in that the direction on edge and the plane perpendicular of the frame,
The height of each friction protrusion is 5 μm to 10 μm.
6. exposure mask plate framework according to claim 1, which is characterized in that between friction protrusion described in each adjacent two
Away from for 1mm to 5mm.
7. exposure mask plate framework according to claim 1, which is characterized in that the friction protrusion is obliquely installed in the bottom surface
And towards the angle of the closed ring structure center position in the angle of the bottom surface of the friction protrusion and frame formation
For acute angle.
8. exposure mask plate framework according to claim 1, which is characterized in that each described frame deviates from the closed ring
The side of structure centre has a step structure, the cascaded surface of the step structure away from the frame bottom surface and with institute
The top surface for stating frame is parallel.
9. exposure mask plate framework according to claim 8, which is characterized in that the bottom surface of the frame and the mask plate weld
Maximum distance between face is 20mm to 30mm, wherein the distance between the cascaded surface and the mask plate welding surface are 10mm
To 20mm.
10. exposure mask plate framework according to claim 1, which is characterized in that the frame includes multiple positioning mechanisms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820780470.8U CN208127246U (en) | 2018-05-23 | 2018-05-23 | A kind of exposure mask plate framework |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820780470.8U CN208127246U (en) | 2018-05-23 | 2018-05-23 | A kind of exposure mask plate framework |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208127246U true CN208127246U (en) | 2018-11-20 |
Family
ID=64185515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820780470.8U Active CN208127246U (en) | 2018-05-23 | 2018-05-23 | A kind of exposure mask plate framework |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN208127246U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111244328A (en) * | 2018-11-28 | 2020-06-05 | 三星显示有限公司 | Mask frame assembly |
| CN113355635A (en) * | 2021-06-15 | 2021-09-07 | 京东方科技集团股份有限公司 | Mask frame, mask module and evaporation equipment |
-
2018
- 2018-05-23 CN CN201820780470.8U patent/CN208127246U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111244328A (en) * | 2018-11-28 | 2020-06-05 | 三星显示有限公司 | Mask frame assembly |
| CN113355635A (en) * | 2021-06-15 | 2021-09-07 | 京东方科技集团股份有限公司 | Mask frame, mask module and evaporation equipment |
| CN113355635B (en) * | 2021-06-15 | 2023-01-10 | 京东方科技集团股份有限公司 | Mask frame, mask module and evaporation equipment |
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