CN207811866U - Mask plate - Google Patents
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- CN207811866U CN207811866U CN201820276665.9U CN201820276665U CN207811866U CN 207811866 U CN207811866 U CN 207811866U CN 201820276665 U CN201820276665 U CN 201820276665U CN 207811866 U CN207811866 U CN 207811866U
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- convex block
- occlusion part
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Abstract
The utility model provides a kind of mask plate, including the first occlusion part and the second occlusion part, and first occlusion part is frame-type；The first end of second occlusion part is fixed on the first occlusion part, and second end extends towards first occlusion part middle part；Along the orientation of the first end and second end of second occlusion part, second occlusion part is divided into multiple blocked areas, and the weight in the unit area of the blocked area of the second occlusion part second end is more than the weight in the unit area of remaining each blocked area.What the utility model can improve the second occlusion part of mask plate upwarps phenomenon.
Description
Technical field
The utility model is related to show the production field of product, and in particular to a kind of mask plate.
Background technology
In organic EL display panel, encapsulated layer is provided on display base plate, for having on display base plate
Electroluminescence unit is packaged.Encapsulated layer includes two layers of inorganic layer and is clipped in organic layer between the two, wherein inorganic layer
The mode of generally use chemical vapor deposition (Chemical Vapor Deposition, CVD) is formed, and chemical gaseous phase is being carried out
When deposition, the region that need not be packaged is blocked using mask plate, and inorganic layer is formed in encapsulation region.
The function elements such as front camera, receiver, sensor are usually provided in mobile phone etc. shows product, in order to realize
Height screen accounting, as shown in Figure 1, needing the corresponding position of display panel 10 that notch V is arranged, to avoid above-mentioned function element.Accordingly
Ground, the structure for forming used mask plate 20 when the inorganic layer of encapsulated layer are as shown in Figure 2 comprising the first occlusion part of frame-type
21 and the second occlusion part 22 for being arranged on the first occlusion part 21, one end of the second occlusion part 22 is fixed on the first occlusion part 21
On, the other end is not fixed.Since the coefficient of thermal expansion of 20 different location of mask plate is not quite similar, chemical vapor deposition is being carried out
When mask plate different location temperature it is also variant, therefore, 22 loose one end of the second occlusion part is easy to upwarp,
Coverage area so as to cause the inorganic layer of formation increases, and then in follow-up cut, be easy to cause inorganic layer breakage, shadow
Packaging effect is rung, and increases the development difficulty of narrow frame product.
Utility model content
The utility model aims to solve at least one of the technical problems existing in the prior art, it is proposed that a kind of mask plate,
Second occlusion part to improve mask plate upwarps phenomenon.
In order to solve the above-mentioned technical problem one of, the utility model provides a kind of mask plate, including the first occlusion part and the
Two occlusion parts, first occlusion part are frame-type；The first end of second occlusion part is fixed on the first occlusion part, second end
Extend in the middle part of towards first occlusion part；Along the orientation of the first end and second end of second occlusion part, described
Two occlusion parts are divided into multiple blocked areas, the weight in the unit area of the blocked area of the second occlusion part second end
Amount is more than the weight in the unit area of remaining each blocked area.
Preferably, from the first end of second occlusion part to second end, the weight in the unit area of each blocked area
Gradually increase.
Preferably, size phase of each blocked area in the first end and second end orientation of second occlusion part
Together；From the first end of second occlusion part to second end, the weight of each blocked area gradually increases.
Preferably, second occlusion part includes shutter and the multirow convex block that is arranged on the shutter, multirow institute
The first end and second end orientation that convex block is stated along first occlusion part arranges, and often row convex block includes at least one described convex
Block；It is both provided with convex block described at least a line in each blocked area；
From the first end of second occlusion part to second end, the convex block total weight in each blocked area gradually increases.
Preferably, the density of each convex block is identical, from the first end of second occlusion part to second end, each blocked area
In convex block total volume gradually increase.
Preferably, the volume of each convex block is identical；From the first end of second occlusion part to second end, each blocked area
In number of slugs gradually increase.
Preferably, the volume of convex block positive correlation at a distance from the first end of the convex block to second occlusion part.
Preferably, the convex block is cylindricality；The height of each convex block is identical；
Projected area of the convex block on the shutter and the convex block to second occlusion part first end away from
From positive correlation.
Preferably, the convex block is cylindricality；Projected area of each convex block on the shutter is identical；
The positive correlation at a distance from the first end of the convex block to second occlusion part of the height of the convex block.
Preferably, often go in number of slugs be it is multiple, it is identical with the weight of each convex block in a line；In each row,
The distance between each adjacent two convex block is identical.
In the present invention, since the weight in the unit area of the blocked area of the second occlusion part second end is big
Weight in the unit area of remaining each blocked area, therefore, under larger gravity, the second occlusion part second end it is upper
Sticking up phenomenon can be eased, the distance between edge and cutting line to make the inorganic layer to be formed increase, with prevent by
The influence of heat is cut, and then ensures packaging effect；And be conducive to the realization of narrow frame.
Description of the drawings
Attached drawing is to be used to provide a further understanding of the present invention, an and part for constitution instruction, and following
Specific implementation mode be used to explain the utility model together, but do not constitute limitations of the present invention.In the accompanying drawings：
Fig. 1 is the vertical view for the display panel being applied at present in mobile phone；
Fig. 2 be the display panel in Fig. 1 encapsulated layer manufacturing process in the schematic diagram of mask plate that uses；
Fig. 3 is the encapsulated layer schematic diagram formed on display base plate motherboard；
Fig. 4 is the sectional view of the A-A ' lines along Fig. 3；
Fig. 5 is film-forming state schematic diagram when the second occlusion part of mask plate does not upwarp；
Fig. 6 is film-forming state schematic diagram when the second occlusion part of mask plate upwarps；
Fig. 7 is the structural schematic diagram of the mask plate provided in the utility model；
Fig. 8 is the convex block distribution schematic diagram on the second occlusion part in the utility model the first embodiment；
Fig. 9 is the sectional view of the B-B ' lines along Fig. 8；
Figure 10 is the convex block distribution schematic diagram on the second occlusion part in second of embodiment of the utility model；
Figure 11 is the sectional view of the B-B ' lines along Figure 10；
Figure 12 is the convex block distribution schematic diagram on the second occlusion part in the utility model the third embodiment；
Figure 13 is the sectional view of the C-C ' lines along Figure 12；
Figure 14 is the film-forming state schematic diagram of the second occlusion part of the mask plate of the utility model.
Wherein, reference numeral is：
10, display panel；V, notch；11, display base plate motherboard；12, encapsulated layer；121, inorganic layer；122, organic layer；
13, interlayer insulating film；13a, groove；20, mask plate；21, the first occlusion part；22, the second occlusion part；22a, blocked area；221、
Shutter；222, convex block.
Specific implementation mode
Specific embodiment of the present utility model is described in detail below in conjunction with attached drawing.It should be understood that herein
Described specific implementation mode is only used for describing and explaining the present invention, and is not intended to limit the utility model.
Fig. 1 is the vertical view for the display panel being applied at present in mobile phone, and Fig. 2 is the encapsulated layer of the display panel in Fig. 1
The schematic diagram of the mask plate used in manufacturing process；The encapsulated layer schematic diagram that Fig. 3 is formed on display base plate motherboard；Fig. 4 is edge
The sectional view of A-A ' lines in Fig. 3；As shown in Figure 3 and Figure 4, encapsulated layer 12 includes two layers of inorganic layer 121 and is clipped in therebetween
Organic layer 122, display base plate motherboard 11 is equipped with interlayer insulating film 13, is provided with multiple groove 13a on interlayer insulating film 13,
The impact force that groove 13a can prevent 13 edge of interlayer insulating film to be subject to spreads to middle part.In the manufacturing process of display panel 10,
The encapsulated layer 12 with notch V is formed on display base plate motherboard 11 using the mask plate 20 of Fig. 2, later to display base plate motherboard
11 are cut, to obtain having display base plate jaggy.Since the coefficient of thermal expansion of 20 different location of mask plate is not quite similar,
Also, when carrying out chemical vapor deposition, the temperature of 20 different location of mask plate is also variant, and therefore, the second occlusion part 22 is not
Fixed one end is easy to upwarp.Film-forming state when second occlusion part 22 is not upwarped and upwarped is respectively such as
It is certain due to existing during inorganic layer 121 deposits, between mask plate 20 and display base plate motherboard 11 shown in Fig. 5 and Fig. 6
Interval, therefore, the edge of inorganic layer 121 is not to be aligned with the edge of the second occlusion part 22, but some is inorganic
Layer 121 can be deposited on immediately below the second occlusion part 22, and when the second occlusion part 22 upwarps, it has greater area of inorganic
Layer 121 is located at immediately below the second occlusion part 22, the cutting line so as to cause the edge of inorganic layer 121 and when subsequently being cut it
Between apart from smaller, may result in the heat that cutting generates in this way and be easy to influence inorganic layer 121, and then reduce encapsulation effect
Fruit.
In order to solve the technical problems existing in the prior art, the utility model provides a kind of mask plate 20, extremely in conjunction with Fig. 7
Shown in Figure 13, which includes the first occlusion part 21 and the second occlusion part 22.First occlusion part 21 is frame-type；Second blocks
The first end in portion 22 is fixed on the first occlusion part 21, and second end extends towards 21 middle part of the first occlusion part.Wherein, it is hidden along second
The orientation (upper and lower directions i.e. in Fig. 8, Figure 10 and Figure 12) of the first end and second end of stopper 22,22 quilt of the second occlusion part
Multiple blocked area 22a are divided into, the weight in the unit area of the blocked area 22a of 22 second end of the second occlusion part is more than
Weight in the unit area of remaining each blocked area 22a.Wherein, the weight in the unit area of any blocked area 22a refers to being somebody's turn to do
The ratio between the area (that is, perpendicular to cross-sectional area of thickness direction) of the total weight of blocked area 22a and blocked area 22a.
Since the weight in the unit area of the blocked area 22a of 22 second end of the second occlusion part is more than remaining each screening
Keep off area 22a unit area in weight, therefore, compared to the prior art, in the utility model, the second occlusion part 22 it is close
The region weight bigger of second end, under larger gravity, 22 second end of the second occlusion part upwarps phenomenon and can obtain
Alleviate, the distance between edge and cutting line to make the inorganic layer to be formed 121 increase, to prevent the shadow by cutting heat
It rings, and then ensures packaging effect, and be conducive to the realization of narrow frame.
Preferably, from the first end of the second occlusion part 22 to second end, the weight in the unit area of each blocked area 22a
Gradually increase, it is convex or recessed to prevent the central region of the second occlusion part 22 from occurring, to improve the flat of the second occlusion part 22
Whole property.
In general, the region that the second occlusion part 22 is blocked can be rectangular, that is, the first end width of the second occlusion part 22
(size of left and right directions along Fig. 7) and second end are of same size；Or second the region blocked of occlusion part 22 it is trapezoidal, and
Second end width is slightly less than first end width.At this point, in order to further prevent the second end of the second occlusion part 22 to upwarp, can make
It is identical to obtain sizes of each blocked area 22a in the first end and second end orientation of the second occlusion part 22, and hide from second
To second end, the weight of each blocked area 22a gradually increases the first end of stopper 22.
Specifically, the second occlusion part 22 includes shutter 221 and the multirow convex block 222 being arranged on shutter 221.Multirow
Convex block 222 is arranged along the first end and second end orientation of the first occlusion part 21, and often row convex block 222 includes at least one convex block
222；It is both provided at least a line convex block 222 in each blocked area 22a.From the first end of the second occlusion part 22 to second end, respectively
222 total weight of convex block in a blocked area 22a gradually increases, so that the quality of each blocked area 22a gradually increases, to carry
Planarization of high second occlusion part 22 during film deposition, as shown in figure 14.Wherein, from the first end of the second occlusion part 22
To second end, weight of the shutter 221 in each blocked area 22a can gradually increase, can also remain unchanged, can also be by
It is decrescence small, as long as the weight of convex block 222 and the total weight of shutter 221 gradually increase in the 22a of blocked area.
Wherein, it may include a bar shaped convex block 222 extended along line direction in often going, can also include being arranged along line direction
Multiple convex blocks 222 of row.Specifically, in the utility model, often row convex block 222 includes the multiple convex blocks 222 arranged along line direction.
Also, it is identical with the weight of each convex block 222 in a line；In per a line, the distance between each adjacent two convex block 222 is identical, with
So that different location distribution of force is uniform on the second occlusion part 22, so that the second occlusion part 22 is more smooth.It should be understood that
It is that line direction refers to the perpendicular direction of first end and second end orientation that block 22 is blocked with second；Correspondingly, row side
The orientation for the first end and second end for blocking block 22 to as second.
Wherein, at least the second end in the second occlusion part 22 is arranged in a line convex block 222, in this way, even if the second occlusion part 22
Second end occur it is certain upwarp, convex block 222 can also play the role of it is certain block, to prevent being formed using mask plate 20
Inoranic membrane get too close to the secant to be cut on display base plate motherboard in the position corresponding to the second occlusion part 22.
For the ease of the making of mask plate 20, the utility model changes not same district by fixing the density of convex block 222
The mode of 222 total volume of convex block in domain changes 222 total weight of convex block of different zones, that is, the density phase of each convex block 222
Together, from the first end of the second occlusion part 22 to second end, 222 total volume of convex block of each blocked area 22a gradually increases, to make
222 total weight of convex block obtained in the closer blocked area 22a of distance 22 first ends of the second occlusion part is smaller, the second occlusion part of distance 22
222 total weight of convex block in the remoter blocked area 22a of first end is bigger.
More specifically, the utility model can realize 222 total weight of convex block in each blocked area 22a in several ways
It gradually changes.
In the first specific implementation mode, as shown in Figure 8 and Figure 9, the volume of each convex block 222 is identical, specifically, respectively
Frontal projected area of the convex block 222 on shutter 221 is identical, and the height of each convex block 222 is also identical.Also, from the second occlusion part
22 first end is to second end, and 222 quantity of convex block in each blocked area 22a gradually increases, specifically, from the second occlusion part 22
First end to second end, be gradually reduced per the distance between adjacent rows convex block 222.It is of course also possible to by other means
So that 222 quantity of convex block in each blocked area 22a gradually increases, for example, from the first end of the second occlusion part 22 to second end, respectively
222 quantity of convex block in row convex block 222 gradually increases, that is, two neighboring in the closer row of distance 22 second ends of the second occlusion part
The gap of convex block 222 is smaller.
In fig. 8, the convex block 222 of each blocked area 22a can be configured according to following parameter：Second occlusion part 22 divides
For three blocked area 22a, 7 row convex blocks 222 are provided on shutter 221, each convex block 222 is along the size of line direction
1.1mm, each convex block 222 are 0.45mm along the size of column direction；It is per the distance between adjacent two row convex block 222
0.98mm；The height of all convex blocks 222 is identical.From the first end of the second occlusion part 22 to second end, per adjacent rows convex block 222
The distance between be gradually reduced (specifically be respectively 0.65mm, 0.55mm, 0.45mm, 0.35mm, 0.25mm, 0.15mm), to
So that 222 line number of convex block being arranged in three blocked area 22a gradually increases (being respectively a line, two rows, four rows), three blocked areas
222 quantity of convex block being arranged in 22a also correspondingly gradually increases.
It in the second embodiment, as shown in Figure 10 and Figure 11, can phase per the distance between adjacent rows convex block 222
Together, the volume of each convex block 222 positive correlation at a distance from the first end of the convex block 222 to second occlusion part 22, so as to appoint
It anticipates in two row convex blocks 222,222 total volume of convex block in the closer a line of distance 22 second ends of the second occlusion part is more than distance second
222 total volume of convex block in a line of 22 second end of occlusion part farther out, so that distance 22 second ends of the second occlusion part are closer
Blocked area 22a in 222 total volume of convex block it is bigger.
Specifically, each convex block 222 is cylindricality；The height of each convex block 222 is identical；Convex block 222 is on shutter 221
Projected area positive correlation at a distance from the first end of 222 to the second occlusion part of convex block 22, that is, the second occlusion part of distance 22
The volume of the closer convex block 222 in two ends is bigger.
In Fig. 10, the convex block 222 of each blocked area 22a can be configured according to following parameter：The second of mask plate 20
Occlusion part 22 is divided into three blocked area 22a, from the first end of the second occlusion part 22 to second end, is set in three blocked area 22a
222 line number of convex block set is respectively three rows, two rows, two rows.In the 7 row convex block, per the distance between adjacent rows convex block 222
For 0.43mm；Often in row convex block 222, the distance between two neighboring convex block 222 is 0.98mm；From the first of the second occlusion part 22
Hold second end, the size of the convex block 222 of each row in a column direction be respectively 0.15mm, 0.25mm, 0.35mm, 0.45mm,
0.55mm, 0.65mm, 0.75mm, the size of each convex block 222 in the row direction is 1.1mm, the height phase of all convex blocks 222
Together.
In the same manner with second of embodiment, in the third embodiment, and will be per between adjacent rows convex block 222
Distance be set as identical, in conjunction with shown in Figure 12 and Figure 13, the volume of convex block 222 and 222 to the second occlusion part of convex block 22
First end apart from positive correlation；And convex block 222 is cylindricality.Difference lies in the third embodiment party with second of embodiment
In formula, projected area of each convex block 222 on shutter 221 is identical；The height of convex block 222 hides with the convex block 222 to the second
The first end of stopper 22 apart from positive correlation.
In figure 12 and figure 13, the convex block 222 of each blocked area 22a can be configured according to following parameter：Mask plate 20
The second occlusion part 22 be divided into 5 blocked area 22a, each blocked area 22a is provided with a line convex block 222, and each convex block 222 exists
Size on line direction is 1.1mm, and the size of each convex block 222 in a column direction is 0.55mm.From the second occlusion part 22
First end to second end, the height of the convex block 222 of each row is respectively 30 μm, 35 μm, 40 μm, 45 μm, 50 μm.
It should be understood that in above-mentioned three kinds of embodiments to the line space and column pitch of 222 size of convex block, convex block 222,
The setting of blocked area 22a quantity is only to schematically illustrate, in actual production, can also be according to concrete technology demand to each parameter
It is configured.
In the present invention, convex block 222 and shutter 221 can be integrally formed.Photoetching composition work specifically may be used
Skill is made, i.e., by photoresist coating, exposure, development, etching and photoresist lift off, to form mask plate 20.
It is understood that embodiment of above is merely to illustrate that the principles of the present invention and uses exemplary
Embodiment, however the utility model is not limited thereto.For those skilled in the art, this is not being departed from
In the case of the spirit and essence of utility model, various changes and modifications can be made therein, these variations and modifications are also considered as this reality
With novel protection domain.
Claims (10)
1. a kind of mask plate, including the first occlusion part and the second occlusion part, first occlusion part is frame-type；Described second blocks
The first end in portion is fixed on the first occlusion part, and second end extends towards first occlusion part middle part；It is characterized in that, along institute
The orientation of the first end and second end of the second occlusion part is stated, second occlusion part is divided into multiple blocked areas, near
Weight in the unit area of the blocked area of the nearly second occlusion part second end is more than in the unit area of remaining each blocked area
Weight.
2. mask plate according to claim 1, which is characterized in that from the first end of second occlusion part to second end,
Weight in the unit area of each blocked area gradually increases.
3. mask plate according to claim 2, which is characterized in that first end of each blocked area in second occlusion part
It is identical with the size in second end orientation；From the first end of second occlusion part to second end, the weight of each blocked area
Amount gradually increases.
4. mask plate according to claim 3, which is characterized in that second occlusion part includes shutter and is arranged in institute
The multirow convex block on shutter is stated, convex block is arranged along the first end and second end orientation of first occlusion part described in multirow
Row, often row convex block includes at least one convex block；It is both provided with convex block described at least a line in each blocked area；
From the first end of second occlusion part to second end, the convex block total weight in each blocked area gradually increases.
5. mask plate according to claim 4, which is characterized in that the density of each convex block is identical, is blocked from described second
To second end, the convex block total volume in each blocked area gradually increases the first end in portion.
6. mask plate according to claim 5, which is characterized in that the volume of each convex block is identical；It is blocked from described second
To second end, the number of slugs in each blocked area gradually increases the first end in portion.
7. mask plate according to claim 5, which is characterized in that the volume of the convex block hides with the convex block to described second
The first end of stopper apart from positive correlation.
8. mask plate according to claim 7, which is characterized in that the convex block is cylindricality；The height of each convex block is identical；
Projected area of the convex block on the shutter at a distance from the first end of the convex block to second occlusion part just
It is related.
9. mask plate according to claim 7, which is characterized in that the convex block is cylindricality；Each convex block is blocked described
Projected area on plate is identical；
The positive correlation at a distance from the first end of the convex block to second occlusion part of the height of the convex block.
10. the mask plate according to any one of claim 4 to 9, which is characterized in that the number of slugs in often going is more
It is a, it is identical with the weight of each convex block in a line；In each row, the distance between each adjacent two convex block is identical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820276665.9U CN207811866U (en) | 2018-02-27 | 2018-02-27 | Mask plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201820276665.9U CN207811866U (en) | 2018-02-27 | 2018-02-27 | Mask plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207811866U true CN207811866U (en) | 2018-09-04 |
Family
ID=63321369
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201820276665.9U Active CN207811866U (en) | 2018-02-27 | 2018-02-27 | Mask plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207811866U (en) |
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2018
- 2018-02-27 CN CN201820276665.9U patent/CN207811866U/en active Active
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