CN207694518U - A kind of low temperature plasma cloud poison exhaust treatment system - Google Patents
A kind of low temperature plasma cloud poison exhaust treatment system Download PDFInfo
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- CN207694518U CN207694518U CN201721687083.1U CN201721687083U CN207694518U CN 207694518 U CN207694518 U CN 207694518U CN 201721687083 U CN201721687083 U CN 201721687083U CN 207694518 U CN207694518 U CN 207694518U
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Abstract
A kind of low temperature plasma cloud poison exhaust treatment system, preposition spray equipment, cloud cancellation element, decomposition apparatus, air-introduced machine, postposition spray equipment are sequentially connected in series by pipeline；It is characterized in that：Temperature monitor and concentration of toxic gases monitor are additionally provided on the pipeline；The cloud cancellation element and decomposition apparatus both sides are equipped with bypass duct；The temperature monitor and concentration of toxic gases monitor are successively set between spray equipment and cloud cancellation element, and are arranged at the bypass duct with pipeline connection place close to spray equipment one end；The preposition spray equipment and postposition spray equipment are directly coupled by water pipe；Water pump is equipped in the water pipe；The preposition spray equipment inner bottom is equipped with water outlet；The bypass duct centre position is additionally provided with the first valve；The preposition spray equipment is equipped with air intake vent；The postposition spray equipment is equipped with air outlet and water inlet；Decomposition apparatus outlet air position is equipped with the second valve.
Description
Technical field
The present invention relates to exhaust treatment systems, and in particular to a kind of low temperature plasma cloud poison exhaust treatment system.
Background technology
With the high speed development of modernization, atmosphere pollution has made the living environment of people, the physical health of human body and society
The Faced In Sustainable Development of meeting serious challenge.In atmosphere pollution plastidome, gaseous pollutant accounts for the whole world and discharges every year
75% or more, wherein organic pollution（VOCs is that is, malicious）It occupies the majority, in addition also contains flue dust, dust, mist, total suspended particles
(TSP) etc. graininess pollutant etc., complicated component causes damages to health, ecological environment.Single exhaust-gas treatment mode
Exhaust gas that can not be pair simultaneously containing dirt, mist, poison is effectively removed, it is therefore desirable to which comprehensive different exhaust-gas treatment mode carries out
Collaboration is handled.
Lower temperature plasma technology is a kind of efficient, quick abatement of pollution technology, in terms of handling gaseous pollutant because
With treatment effeciency height, and before the advantages of can operating at normal temperatures and pressures shows good development in exhaust-gas treatment field
Scape.The discharge type that conventional use of technology for treating low temperature plasma waste gas uses is dielectric barrier discharge
(Dielectric Barrier Discharge, abbreviation DBD), with discharge temp is low, treatment effeciency is high, is not easy to light easily
The advantages that firing explosion hazard gases.In addition medium blocking discharge electrode is not direct is in contact with discharge gas, so as to avoid electrode
Etching problem, but the electrode structure be easy by liquid water（Non- steam）, the pollution of particles such as dust and tar and can not be just
Often electric discharge.Therefore, it is necessary to be filtered cleaning to pending exhaust gas, the gaseous environment of dry cleansing is built for DBD electric discharges.It passes
The filter method one side windage of system is larger, and another aspect filtrate weatherability is poor, easy firing, has secondary pollution, is easily saturated, needing
The shortcomings of regularly replacing is unfavorable for on-line continuous processing, is not suitable for plasma discharge prefilter, it is therefore desirable to draw
Enter Novel filter device.
Ozone, NO are will produce in the reaction process of plasma degradation VOCs exhaust gasxAnd the secondary pollutions such as other halide
Object, and more deep theory analysis and the research of corresponding kinetic model are lacked to VOCs degradation reaction processes both at home and abroad, though
So at present laboratory research more effectively realize effective degradation of contaminant under low energy consumption, and eliminate secondary pollution mode be etc.
The shortcomings of gas ions are catalyzed coupled modes, but mode process structure is complicated, and catalyst has selectivity, and cost is higher, engineering
It realizes that difficulty is big, therefore, the feasible mode plasma exhaust-gas treatment of more simple and effective engineering need to be used to carry out subsequent
Supplement process.
Atmospheric pressure plasma exhaust treatment system belongs to electrion equipment, highly concentrated for low concentration gas long-term accumulated
Inflammable and explosive exhaust gas is spent, plasma system has certain security risk in processing procedure, appropriate therefore, it is necessary to be done to system
Safeguard procedures.
When being flowed without gas in the pipe-line systems such as air-introduced machine failure, non-exhaust emission, if atmospheric pressure plasma is useless
Gas processing system continues to run with, not only meaningless to exhaust-gas treatment, and empty energization consumption can also damage discharge electrode, increase
Add pipe temperature, so that firing generation, therefore, how to avoid such nothing from air-drying electric discharge phenomena imperative.
Invention content
The technical problem to be solved by the present invention for the above-mentioned state of the art is to provide applied widely, simple possible,
Low energy consumption, the safe and reliable processing that is suitable for contain dirt, mist, malicious low temperature plasma exhaust-gas treatment combined system.
Technical solution is used by the present invention solves above-mentioned technical problem：
A kind of low temperature plasma cloud poison exhaust treatment system, preposition spray equipment, cloud cancellation element, degradation dress
It sets, air-introduced machine, postposition spray equipment are sequentially connected in series by pipeline；It is characterized in that：It is additionally provided with temperature monitor on the pipeline
With concentration of toxic gases monitor；The cloud cancellation element and decomposition apparatus both sides are equipped with bypass duct；The monitoring temperature
Device and concentration of toxic gases monitor are successively set between spray equipment and cloud cancellation element, and are arranged at the bypass
Pipeline is with pipeline connection place close to spray equipment one end；The preposition spray equipment and postposition spray equipment are directly joined by water pipe
It connects；Water pump is equipped in the water pipe；The preposition spray equipment inner bottom is equipped with water outlet；The bypass duct centre position
It is additionally provided with the first valve；The preposition spray equipment is equipped with air intake vent；The postposition spray equipment is equipped with air outlet and water inlet；
Decomposition apparatus outlet air position is equipped with the second valve.
Further, the cloud cancellation element is the charged discharge plasma cloud cancellation element of pulse.
Still further, the decomposition apparatus is dielectric barrier discharge low-temperature plasma exhaust gas decomposition apparatus.
The beneficial effects of the invention are as follows：
1. dielectric barrier discharge low-temperature plasma exhaust gas decomposition apparatus front end has disposed charged discharge plasma cloud
The operation principle of cancellation element, the device is：Achieve the purpose that remove particle by the method for the charged trapping of pulse.When containing
When charged through the extra pulse reaction of low temperature plasma area of the air-flow of particle, these particles will be charged.Flowing over behind
Cheng Zhong, these may be agglomerated by charged particle, and particle diameter is made to increase, and by the property of its charge to two electrodes
Movement, is finally attracted on corresponding electrode.It is currently by charged low temperature of pulse etc. to improve the arresting efficiency of particle
Plasma discharge increases the carrying capacity of particle, and then electricity consumption field offset promotes the trapping of particle.The charged low-temperature plasma of pulse
Also contain the extremely strong free radicals of oxidisability such as a certain amount of high energy electron, excited state particle, atom in body.These active particles have
There are higher energy, some even bond energy of also higher than certain gas molecules.When tail gas passes through plasma reaction area, in addition to
It can capture outside the particles such as PM, aerosol, moreover it is possible to cause a series of physical and chemical reaction, to reach to noxious emission
There is certain purification purpose.The device compensates for the deficiency of traditional filtering purification exhaust device, and electrode structure is simple, and operation can
It leans on, windage is small, not afraid of water, dust and tar pollution, can not only be that subsequent exhaust gas decomposition apparatus builds clean Ring
Border increases equipment service life and stability, additionally it is possible to useless for subsequent dielectric barrier discharge low-temperature plasma（Poison）Gas drops
Solution device plays the role of certain pretreatment and activation phenomenon, so that dielectric barrier discharge is easier, is more stable, will produce simultaneously
A large amount of ozone, make the oxidative degradation of system significantly improve at the time of increased ozone oxidation degradation exhaust gas.
2. the reasonable introducing of spray equipment.Security of system is increased, the degradation of spray equipment itself is enhanced, is mended
The degradation effect for having filled plasma treatment procedure, having improved overall system.Spray equipment in the present system specific act as：
Water in preposition spray equipment first pre-processes high-concentration waste gas, fully absorbs volatile organic compounds, reduces cloud, if
Occurs pipeline attachment combustion phenomena in subsequent process, the water in spray equipment can prevent to strile-back, and increase system safety.Simultaneously
Exhaust gas can be humidified, has certain steam that will generate certain density hydroxyl in corona treatment, plasma exhaust gas can be enhanced
Degradation.Exhaust gas will produce certain ozone and other a large amount of active particles after corona treatment, original not soluble in water
Pollutant be cracked into water-soluble substance or active particle, postposition spray equipment on the one hand can absorb part ozone and
Active particle increases the oxidisability of water, reduces the discharge of final ozone and secondary pollution；It on the other hand can be by ozone and activity
Particle is fully dissolved into water, not only increases the effect of overall process in this way, the strong oxidizing property of ozone is also further utilized
To residual gas, the reaction was continued, and plasma exhaust-gas treatment plays supplementary function.In this way, spray liquid in spray equipment without
Chemical agent need to be used, operating cost is greatly reduced, reduces secondary pollution.Water in postposition spray equipment is extracted into preposition spray again
In shower device, water-saving purpose is not only played, and the water in postposition spray equipment has certain oxidisability and chemistry
Reactivity can play pretreating effect more better than pure water.
3. bypass duct configures, the reliability of system is further enhanced.If the device failure of front end needs more
It changes or plasma process system all breaks down, production discharge cannot but stop, and exhaust gas cannot be allowed to enter processing at this time
System needs to close processing system channel, opens simultaneously bypass channel, direct emission exhaust gas is to make emergent need.
Description of the drawings
Fig. 1 is the structural schematic diagram of the present invention.
Description of the drawings：Preposition spray equipment 1, cloud cancellation element 2, decomposition apparatus 3, air-introduced machine 4, postposition spray equipment 5,
Air intake vent 6, air outlet 7, temperature monitor 8, concentration of toxic gases monitor 9, bypass duct 10, the first valve 11, the second valve
Door 12, water outlet 13, water pipe 14, water inlet 16, water pump 17.
Specific implementation mode
The embodiment of the present invention is described in further detail below in conjunction with attached drawing.
As shown in Figure 1, a kind of low temperature plasma cloud poison exhaust treatment system, preposition spray equipment 1, cloud eliminate dress
2, decomposition apparatus 3, air-introduced machine 4, postposition spray equipment 5 is set to be sequentially connected in series by pipeline；It is characterized in that：It is also set on the pipeline
There are temperature monitor 8 and concentration of toxic gases monitor 9；The cloud cancellation element 2 and 3 both sides of decomposition apparatus are equipped with shunt valve
Road 10；The temperature monitor 8 and concentration of toxic gases monitor 9 be successively set on spray equipment 1 and cloud cancellation element 2 it
Between, and the bypass duct 10 is arranged at pipeline connection place close to 1 one end of spray equipment；1 He of preposition spray equipment
Postposition spray equipment 5 is directly coupled by water pipe 14；Water pump 17 is equipped in the water pipe 14；Inside the preposition spray equipment 1
Bottom end is equipped with water outlet 13；10 centre position of the bypass duct is additionally provided with the first valve 11；The preposition spray equipment 1 is equipped with
Air intake vent 6；The postposition spray equipment 5 is equipped with air outlet 7 and water inlet 16；3 outlet air position of the decomposition apparatus is equipped with second
Valve 12.
Further, the cloud cancellation element 2 is the charged discharge plasma cloud cancellation element of pulse.
Still further, the decomposition apparatus 3 is dielectric barrier discharge low-temperature plasma exhaust gas decomposition apparatus.
Bypass duct 10 around cloud cancellation element 2 and decomposition apparatus 3, is directly connected to 4 entrance of air-introduced machine, first simultaneously
Valve 11 is mounted on 10 intermediate any position of bypass duct, and the second valve 12 is installed on 3 outlet air position of decomposition apparatus.Normal work
When the first valve 11 close, the second valve 12 open；The first valve 11 is opened when emergent discharge, and the second valve 12 is closed.
Water inlet 16 connects with running water pipe, is led to water in preposition spray equipment 1 by water pump 17 in water pipe 14, finally
Waste water drains into cesspool or sewer by the water outlet 13 of 1 bottom end of preposition spray equipment.Water outlet 13 and the adjusting of water inlet 16
Match, makes two spray equipment water level inside normal tables.
The above is only the preferred embodiment of the present invention, protection scope of the present invention is not limited merely to above-described embodiment,
All technical solutions belonged under thinking of the present invention all belong to the scope of protection of the present invention.It should be pointed out that for the art
For those of ordinary skill, several improvements and modifications without departing from the principles of the present invention should be regarded as the protection of the present invention
Range.
Claims (3)
1. a kind of low temperature plasma cloud poison exhaust treatment system, preposition spray equipment（1）, cloud cancellation element（2）, degradation
Device（3）, air-introduced machine（4）, postposition spray equipment（5）It is sequentially connected in series by pipeline；It is characterized in that：It is additionally provided on the pipeline
Temperature monitor（8）With concentration of toxic gases monitor（9）；The cloud cancellation element（2）And decomposition apparatus（3）Both sides are equipped with
Bypass duct（10）；The temperature monitor（8）With concentration of toxic gases monitor（9）It is successively set on preposition spray equipment
（1）With cloud cancellation element（2）Between, and it is arranged at the bypass duct（10）It is filled close to preposition spray with pipeline connection place
It sets（1）One end；The preposition spray equipment（1）With postposition spray equipment（5）Pass through water pipe（14）Directly couple；The water pipe
（14）It is interior to be equipped with water pump（17）；The preposition spray equipment（1）Inner bottom is equipped with water outlet（13）；The bypass duct（10）
Centre position is additionally provided with the first valve（11）；The preposition spray equipment（1）Equipped with air intake vent（6）；The postposition spray equipment
（5）Equipped with air outlet（7）And water inlet（16）；The decomposition apparatus（3）Outlet air position is equipped with the second valve（12）.
2. a kind of low temperature plasma cloud poison exhaust treatment system as described in claim 1, it is characterised in that：The cloud
Cancellation element（2）For the charged discharge plasma cloud cancellation element of pulse.
3. a kind of low temperature plasma cloud poison exhaust treatment system as described in claim 1, it is characterised in that：The degradation
Device（3）For dielectric barrier discharge low-temperature plasma exhaust gas decomposition apparatus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721687083.1U CN207694518U (en) | 2017-12-07 | 2017-12-07 | A kind of low temperature plasma cloud poison exhaust treatment system |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721687083.1U CN207694518U (en) | 2017-12-07 | 2017-12-07 | A kind of low temperature plasma cloud poison exhaust treatment system |
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| CN207694518U true CN207694518U (en) | 2018-08-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109893941A (en) * | 2017-12-07 | 2019-06-18 | 南京苏曼等离子科技有限公司 | A kind of low temperature plasma cloud poison exhaust treatment system |
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2017
- 2017-12-07 CN CN201721687083.1U patent/CN207694518U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109893941A (en) * | 2017-12-07 | 2019-06-18 | 南京苏曼等离子科技有限公司 | A kind of low temperature plasma cloud poison exhaust treatment system |
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